SiC power semiconductor device integrated with schottky diode

CN116845092BActive Publication Date: 2026-08-28QINGDAO ZHONGWEIXIN ELECTRONICS CO LTD
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Patent Information

Application Number
CN202310883401.5
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-07-18
Publication Date
2026-08-28
Estimated Expiration
2043-07-18

AI Technical Summary

Technical Problem

与此同时,通过结构设计实现高密度沟道时,将引入可靠性能力及短路能力下降的问题,如何实现高导通性能、高可靠性以及强短路能力的SiCMOSFET器件是如今从业人员需要思考的问题

Benefits of technology

[0034]本发明的优点:利用设置于有源区内的第二类导电沟道,可提升有源区内的沟道密度,在有源区内同时设置第一类导电沟道以及第二类导电沟道后,在保持功率半导体器件导通效率的情况下,有效降低沟道电阻,并可降低电场集中效率,提高栅极的可靠性;

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Abstract

The application relates to a SiC power semiconductor device integrated with a Schottky diode, and belongs to the technical field of power semiconductor devices. A first type of conductive channel and a second type of conductive channel are in ohmic contact with a front first electrode metal above a SiC substrate, so as to simultaneously form a current channel of the power semiconductor device by using the first type of conductive channel and the second type of conductive channel; the front first electrode metal is also in Schottky contact with the SiC substrate corresponding to an active region, so as to form a plurality of Schottky contact regions for integration of the Schottky diode, the Schottky contact regions are located in the second type of conductive channel, and the Schottky contact regions are surrounded by a second type of conductive channel second conductive type doped region in the second type of conductive channel. The application can effectively realize integration of the Schottky diode, form good electric field protection, reduce reverse leakage, and has low turn-on voltage and low freewheeling loss when freewheeling is performed by using the integrated Schottky diode.
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Citation Information

Patent Citations

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