Cavity device, gas laser device and method of manufacturing an electronic device

Abstract

The chamber device (CH) has a housing (30) that encloses laser gas, a pair of discharge electrodes (32a, 32b) that generate light using the laser gas by being applied with a voltage, windows (31a, 31b) that are provided to wall surfaces of the housing (30) through which the light passes, a first fan (46) that causes the laser gas to flow between the pair of discharge electrodes (32a, 32b), filters (53a, 53b), and a second fan (311, 321) that rotates together with the first fan (46) by a driving force from a driving source (46a) of the first fan (46). Further, the chamber device (CH) has a fan-side flow path (313, 323) in which the laser gas filtered by the filters (53a, 53b) flows by the second fan (311, 321), the fan-side flow path causing a part of the laser gas to flow in a direction away from the windows (31a, 31b), and a window-side flow path (315, 325) that communicates with the fan-side flow path (313, 323), the window-side flow path causing the laser gas that flows from the fan-side flow path (313, 323) by the second fan (311, 321) to flow toward the windows (31a, 31b).

Description

Technical Field

[0001] This disclosure relates to methods for manufacturing cavity devices, gas laser devices, and electronic devices. Background Technology

[0002] In recent years, with the miniaturization and high integration of semiconductor integrated circuits, there has been a demand for higher resolution in semiconductor exposure equipment. Therefore, the use of shorter wavelengths of light emitted from exposure light sources has been developed. For example, as gas laser devices for exposure, there are KrF excimer lasers that use lasers with an output wavelength of approximately 248 nm, and ArF excimer lasers that use lasers with an output wavelength of approximately 193 nm.

[0003] The naturally oscillating light from KrF and ArF excimer lasers has a relatively wide spectral linewidth, approximately 350 pm to 400 pm. Therefore, when using projection lenses made of materials that allow ultraviolet light to pass through KrF and ArF lasers, chromatic aberration sometimes occurs. As a result, resolution may be reduced. Therefore, it is necessary to narrow the spectral linewidth of the laser output from the gas laser device to a level that eliminates chromatic aberration. Thus, in the laser resonator of a gas laser device, a line-narrowing module (LNM) containing narrowing elements (etalon, grating, etc.) is sometimes included to narrow the spectral linewidth. Hereinafter, gas laser devices with narrowed spectral linewidths will be referred to as narrow-bandgap gas laser devices.

[0004] Existing technical documents

[0005] Patent documents

[0006] Patent Document 1: Japanese Patent Application Publication No. 6-132582

[0007] Patent Document 2: Japanese Patent Application Publication No. 6-152030

[0008] Patent Document 3: Japanese Patent Application Publication No. 6-237029

[0009] Patent Document 4: Japanese Patent Publication No. 7-118556 Summary of the Invention

[0010] One aspect of the cavity device disclosed herein may also include: a housing containing laser gas; a pair of discharge electrodes disposed opposite each other in the interior space of the housing, which generate light using the laser gas by applying a voltage; a window disposed on the wall of the housing through which light passes; a first fan disposed in the interior space to allow the laser gas to flow between the pair of discharge electrodes; a filter disposed in the interior space; a second fan that rotates together with the first fan by a driving force from a drive source of the first fan; a fan-side flow path disposed in the interior space in which the laser gas filtered by the filter flows by means of the second fan, the fan-side flow path causing a portion of the laser gas to flow away from the window; and a window-side flow path disposed in the interior space and communicating with the fan-side flow path to allow the laser gas flowing from the fan-side flow path by means of the second fan to flow towards the window side.

[0011] One aspect of the gas laser device disclosed herein may also have a cavity device comprising: a housing containing laser gas; a pair of discharge electrodes disposed opposite each other in the interior space of the housing, which generate light using the laser gas by applying a voltage; a window disposed on the wall of the housing through which light passes; a first fan disposed in the interior space for causing the laser gas to flow between the pair of discharge electrodes; a filter disposed in the interior space; a second fan rotating together with the first fan by a driving force from a drive source of the first fan; a fan-side flow path disposed in the interior space in which the laser gas filtered by the filter flows by means of the second fan, the fan-side flow path causing a portion of the laser gas to flow away from the window; and a window-side flow path disposed in the interior space and communicating with the fan-side flow path for causing the laser gas flowing from the fan-side flow path by means of the second fan to flow toward the window side.

[0012] One method of manufacturing an electronic device disclosed herein can also generate laser light using a gas laser device having a cavity, output the laser light to an exposure apparatus, and expose the laser light on a photosensitive substrate within the exposure apparatus to manufacture the electronic device. The cavity device comprises: a housing enclosed in laser gas; a pair of discharge electrodes disposed opposite each other within the interior space of the housing, which generate light using the laser gas by applying a voltage; a window disposed on a wall of the housing through which light passes; a first fan disposed within the interior space to allow the laser gas to flow between the pair of discharge electrodes; and a filter disposed within the interior space to filter the laser gas. The system includes: a filter; a second fan that rotates with the first fan via a driving force from a driving source of the first fan; a filter disposed within the interior space; a second fan that rotates with the first fan via a driving force from a driving source of the first fan; a fan-side flow path disposed within the interior space, in which the laser gas filtered by the filter flows via the second fan, the fan-side flow path causing a portion of the laser gas to flow away from the window; and a window-side flow path disposed within the interior space, communicating with the fan-side flow path, causing the laser gas flowing from the fan-side flow path via the second fan to flow towards the window side. Attached Figure Description

[0013] Hereinafter, several embodiments of the present disclosure will be described as simple examples with reference to the accompanying drawings.

[0014] Figure 1 This is a schematic diagram illustrating a general structural example of an electronic device manufacturing apparatus.

[0015] Figure 2 This is a schematic diagram showing the overall general structure of a comparative example gas laser device.

[0016] Figure 3 Viewed from the insulation side towards the crossflow fan side Figure 2 A diagram showing the internal space of the housing of the cavity device.

[0017] Figure 4 yes Figure 2 The cavity device shown is a cross-sectional view perpendicular to the direction of laser travel.

[0018] Figure 5 This is a diagram showing the internal space of the housing of the cavity device in Embodiment 1 as viewed from the insulating part side towards the crossflow fan side.

[0019] Figure 6 This is a three-dimensional view of the partition wall and front flow path as observed from the internal space where the electrodes are located.

[0020] Figure 7 This is a three-dimensional view of the partition wall and the front flow path as observed from the interior space on the window side.

[0021] Figure 8 This is a diagram showing the internal space of the housing of the cavity device in Embodiment 2 as viewed from the insulating part side toward the crossflow fan side. Detailed Implementation

[0022] 1. Description of the electronic device manufacturing apparatus used in the exposure process of electronic devices

[0023] 2. Description of the comparative gas laser device

[0024] 2.1 Structure

[0025] 2.2 Actions

[0026] 2.3 Research Topic

[0027] 3. Description of the cavity device in Embodiment 1

[0028] 3.1 Structure

[0029] 3.2 Actions

[0030] 3.3 Functions / Effects

[0031] 4. Description of the cavity device in Embodiment 2

[0032] 4.1 Structure

[0033] 4.2 Functions / Effects

[0034] The embodiments of this disclosure will now be described in detail with reference to the accompanying drawings.

[0035] The embodiments described below illustrate several examples of this disclosure and do not limit the scope of this disclosure. Furthermore, the structures and operations described in each embodiment are not necessarily all necessary for the structures and operations of this disclosure. Additionally, the same reference numerals are used to denote the same structural elements, and repeated descriptions are omitted.

[0036] 1. Description of the electronic device manufacturing apparatus used in the exposure process of electronic devices

[0037] Figure 1 This is a schematic diagram illustrating a general structural example of an electronic device manufacturing apparatus used in the exposure process of an electronic device. For example... Figure 1As shown, the manufacturing apparatus used in the exposure process includes a gas laser device 100 and an exposure device 200. The exposure device 200 includes an illumination optics system 210 and a projection optics system 220. The illumination optics system 210 includes multiple mirrors 211, 212, and 213. The illumination optics system 210 illuminates the mask pattern on the mask stage RT using laser light incident from the gas laser device 100. The projection optics system 220 projects the laser light transmitted through the mask onto a workpiece (not shown) positioned on a workpiece stage WT. The workpiece is a photosensitive substrate such as a semiconductor wafer coated with photoresist. The exposure device 200 moves the mask stage RT and the workpiece stage WT synchronously and parallelly, thereby exposing the workpiece to laser light reflecting the mask pattern. Through this exposure process, a device pattern is transferred onto a semiconductor wafer, thereby enabling the manufacture of semiconductor devices as electronic devices.

[0038] 2. Description of the comparative gas laser device

[0039] 2.1 Structure

[0040] The gas laser device 100 of the comparative example will be described. Furthermore, the comparative examples disclosed herein are methods known only to the applicant and are not publicly known examples acknowledged by the applicant.

[0041] Figure 2 This is a schematic diagram illustrating the overall general structure of the gas laser device 100 in this example. The gas laser device 100 is, for example, an ArF excimer laser device using a mixture of argon (Ar), fluorine (F2), and neon (Ne). In this case, the gas laser device 100 outputs pulsed laser light with a center wavelength of approximately 193 nm. The gas laser device 100 can also be a gas laser device other than an ArF excimer laser device, for example, a KrF excimer laser device using a mixture of krypton (Kr), F2, and Ne. In this case, the gas laser device 100 emits pulsed laser light with a center wavelength of approximately 248 nm. The mixture of Ar, F2, and Ne as the laser medium, and the mixture of Kr, F2, and Ne as the laser medium, are sometimes referred to as laser gases. Furthermore, in the mixtures used in ArF and KrF excimer laser devices, helium (He) can be used instead of Ne.

[0042] The gas laser device 100 in this example includes a housing 110, a laser oscillator 130 disposed in the internal space of the housing 110, a monitor module 150, a laser gas supply device (not shown), a laser gas exhaust device (not shown), and a laser processor 190 as its main structures.

[0043] The laser oscillator 130 includes a cavity device CH, a charger 141, a pulse power module 143, a rear mirror 145, and an output coupling mirror 147 as its main structures.

[0044] exist Figure 2 The image shows the internal structure of the cavity device CH as viewed from a direction approximately perpendicular to the direction of laser travel. Figure 3 This is a diagram showing the internal space of the housing 30 of the cavity device CH as viewed from the insulating part 33 side towards the crossflow fan 46 side. Figure 4 yes Figure 2 The cavity device CH shown is a cross-sectional view perpendicular to the direction of laser travel. The cavity device CH has a housing 30, a pair of windows 31a and 31b, a pair of electrodes 32a and 32b, an insulating part 33, a feed hole 34, an electrode holder part 36, a crossflow fan 46, a heat exchanger 47, a pressure sensor 48, and a filter box 50 as its main structures.

[0045] The housing 30 encloses the aforementioned laser gas. Furthermore, the housing 30 includes an internal space where light is generated by the excitation of the laser gas. The laser gas is supplied from a laser gas supply device to the internal space of the housing 30 via piping (not shown). The light generated by the excitation of the laser gas travels towards windows 31a and 31b.

[0046] Window 31a is located on the front side of the laser traveling from the gas laser device 100 toward the exposure device 200 in the direction of laser travel, and window 31b is located on the rear side of the same direction of travel. Windows 31a and 31b are tilted at a Brewster angle relative to the direction of laser travel to suppress the reflection of P-polarized light from the laser. Window 31a is disposed on the front wall of the housing 30, and window 31b is disposed on the rear wall of the housing 30. Specifically, as... Figure 3 As shown, window 31a is held by a cylindrical retainer 31c connected to the front wall, and the retainer 31c is configured to face the opening 30a of the wall. Furthermore, window 31b is held by a retainer 31d of the same structure as retainer 31c, connected to the rear wall, and the retainer 31d is configured to face the opening 30b of the wall.

[0047] Electrodes 32a and 32b are positioned along the direction of laser travel, and are arranged opposite each other within the internal space of housing 30. The space between electrodes 32a and 32b in housing 30 is enclosed by windows 31a and 31b. Electrodes 32a and 32b are discharge electrodes used to excite the laser medium via glow discharge. In this example, electrode 32a is the cathode, and electrode 32b is the anode.

[0048] Electrode 32a is supported by insulating portion 33. Insulating portion 33 blocks the opening continuous with housing 30. Insulating portion 33 includes an insulator. Examples of insulators include alumina ceramic, which has low reactivity with F2 gas. Furthermore, a feedthrough 34 made of conductive material is disposed in insulating portion 33. Feedthrough 34 applies the voltage supplied from pulse power module 143 to electrode 32a.

[0049] Electrode 32b is supported by electrode holder portion 36 and is electrically connected to electrode holder portion 36. Figure 3 For clarity, the electrode holder portion 36 is omitted from the illustration. Furthermore, as... Figure 4 As shown, the electrode holder 36 is electrically connected to the housing 30 via the reset plate 37.

[0050] A crossflow fan 46 is disposed within the internal space of the housing 30, on the side opposite to the electrode 32b, with reference to the electrode holder 36. The space within the housing 30 where the crossflow fan 46 is disposed communicates with the space between the electrodes 32a and 32b. The crossflow fan 46 is connected to a motor 46a disposed outside the housing 30. When the motor 46a rotates, the crossflow fan 46 rotates. The rotation of the crossflow fan 46 causes laser gas to flow between the electrodes 32a and 32b. Figure 4 In the diagram, thick arrows indicate the flow of laser gas, which circulates via a cross-flow fan 46, between electrodes 32a and 32b, and back to the heat exchanger 47. The start-up, shutdown, and rotation speed of motor 46a are regulated by the laser processor 190. Therefore, by controlling motor 46a, the laser processor 190 can regulate the circulation speed of the laser gas circulating within the interior space of the housing 30.

[0051] A heat exchanger 47 is disposed next to the crossflow fan 46. Most of the laser gas flowing by the crossflow fan 46 passes through the heat exchanger 47, through which the heat of the laser gas is removed.

[0052] like Figure 3 and Figure 4 As shown, the filter box 50 is disposed on the wall of the housing 30 opposite to the heat exchanger 47, with reference to the crossflow fan 46. The filter box 50 includes: an inlet 51 communicating with an opening 30c continuous with the approximate center of the housing 30 in the direction of laser travel; and outlets 51a and 51b communicating with flow paths 30d and 30e disposed in the front and rear walls of the housing 30, respectively. Furthermore, in the internal space of the filter box 50, a front filter 53a is disposed between the inlet 51 and the front outlet 51a, and a rear filter 53b is disposed between the inlet 51 and the rear outlet 51b. Filters 53a and 53b are as follows: Figure 3 As shown by the dashed lines, the laser gas passing through filters 53a and 53b is filtered with the same shape and length to remove the particles described later from the laser gas.

[0053] The flow path 30d communicates with a front purge chamber 30g disposed in the front wall of the housing 30. The purge chamber 30g communicates with the interior space of the housing 30 through an opening 30j in the wall and with the interior space of the cage 31c through an opening 30a. A purge chamber is also disposed in the rear wall. Similar to the purge chamber 30g, the rear purge chamber 30h communicates with the flow path 30e, communicates with the interior space of the housing 30 through an opening 30k in the wall, and communicates with the interior space of the cage 31d through an opening 30b.

[0054] A front-side cylindrical component 60a is disposed in the purge chamber 30g. The length direction of the cylindrical component 60a is along the laser travel direction. One end of the cylindrical component 60a is separated from the opening 30j and is located on the side of the holder 31c compared to the flow path 30d. The other end of the cylindrical component 60a is connected to the edge of the holder 31c in such a way that it surrounds the opening of the holder 31c. Similar to the purge chamber 30g, a rear-side cylindrical component 60b is disposed in the purge chamber 30h.

[0055] The cylindrical member 60a includes a plurality of plate members 61 disposed on its inner peripheral surface. Each plate member 61 is arranged side-by-side along the length of the cylindrical member 60a at predetermined intervals, with its in-plane direction generally perpendicular to the length direction of the cylindrical member 60a. Therefore, the plate members 61 are arranged with gaps between them. Furthermore, each plate member 61 has continuous openings 63. Each opening 63 is arranged on the same straight line. Through this arrangement of plate members 61 including openings 63, a labyrinth structure is provided in the cylindrical member 60a. The laser passes through these continuous openings 63. Figure 3 For ease of observation, plate component 61 and opening 63 are simplified in the illustration, with only one plate component 61 and one opening 63 labeled; the labels for other plate components 61 and other openings 63 are omitted. Cylindrical component 60b has the same structure as cylindrical component 60a.

[0056] return Figure 2Continuing with the description of the gas laser device 100 in this example, the charger 141 is a DC power supply device that charges a capacitor (not shown) disposed in the pulse power module 143 with a specified voltage. The charger 141 is disposed outside the housing 30 and connected to the pulse power module 143. The pulse power module 143 includes a switch 143a controlled by the laser processor 190. When the switch 143a changes from open to closed by this control, the pulse power module 143 boosts the voltage applied from the charger 141 to generate a pulsed high voltage, which is applied to the electrodes 32a and 32b. When the high voltage is applied, the insulation between the electrodes 32a and 32b is broken down, resulting in a discharge. The energy of this discharge excites the laser medium inside the housing 30, generating excimers at an excitation energy level. Then, when the excimers transition to the ground state energy level that dissociates into two atoms, they emit light corresponding to the energy level difference. The emitted light travels towards the windows 31a and 31b.

[0057] The rear mirror 145 is opposite to window 31b, and the output coupling mirror 147 is opposite to window 31a. A high-reflectivity film is coated on the rear mirror 145, and a partial-reflectivity film is coated on the output coupling mirror 147. The rear mirror 145 causes the laser emitted from window 31b to be reflected back to the housing 30 with high reflectivity. The output coupling mirror 147 allows a portion of the laser emitted from window 31a to pass through, while reflecting the remaining portion back to the interior space of the housing 30 via window 31a. The output coupling mirror 147 is, for example, a component with a dielectric multilayer film formed on a calcium fluoride substrate.

[0058] Therefore, a Fabry-Perot type laser resonator is constructed using the rear mirror 145 and the output coupling mirror 147, with the housing 30 positioned in the optical path of the laser resonator. Thus, the laser emitted from the housing 30 reciprocates between the rear mirror 145 and the output coupling mirror 147. The reciprocating laser is amplified each time it passes through the laser gain space between electrodes 32a and 32b. A portion of the amplified light passes through the output coupling mirror 147 as a pulsed laser.

[0059] The rear mirror 145 is fixed to the interior space of the housing 145a, which is connected to the rear side of the housing 30. In addition, the output coupling mirror 147 is fixed to the interior space of the optical path tube 147a, which is connected to the front side of the housing 30.

[0060] Alternatively, window 31b can also function as a rear mirror 145. In this case, the cage 31d becomes a flexible structure, allowing adjustment of the angle of the laser incident on window 31b. Furthermore, window 31a can also function as an output coupling mirror 147. In this case, the cage 31c becomes a flexible structure, allowing adjustment of the angle of the laser incident on window 31b. Alternatively, instead of the rear mirror 145, a narrowing module (not shown) can be configured to narrow the laser beam. The narrowing module includes a prism, a grating, and a rotating stage. The prism, grating, and rotating stage are disposed within the internal space of housing 145a.

[0061] The prism widens the beam width of the light emitted from window 31b, allowing the light to enter the grating. Furthermore, the prism narrows the beam width of the reflected light from the grating, causing the light to return through window 31b to the interior space of the housing 30. At least one prism is required.

[0062] The surface of the grating is made of a highly reflective material, and multiple grooves are arranged on the surface at predetermined intervals. The grating is a dispersive optical element. The cross-sectional shape of each groove is, for example, a right-angled triangle. Light incident on the grating from the prism is reflected by these grooves and diffracted in a direction corresponding to the wavelength of the light. The grating is configured in a Littlero configuration so that the angle of incidence of the light incident on the grating from the prism coincides with the diffraction angle of the diffracted light at the desired wavelength. Thus, light near the desired wavelength returns to the housing 30 via the prism.

[0063] A rotating stage supports the prism, causing it to rotate. By rotating the prism, the angle of incidence of light relative to the grating is changed. Therefore, by rotating the prism, the wavelength of light returning from the grating to the housing 30 via the prism can be selected.

[0064] A laser resonator is constructed using an output coupling mirror 147 and a grating disposed between housing 30 and the laser resonator. Housing 30 is positioned in the optical path of the laser resonator. Therefore, the light emitted from housing 30 reciprocates between the grating and the output coupling mirror 147.

[0065] The monitor module 150 is positioned in the optical path of the pulsed laser transmitted through the output coupling mirror 147. The monitor module 150 comprises a housing 151, a beam splitter 152 disposed within the interior space of the housing 151, a condenser lens 153, and a photosensor 154 as its main structures. An opening is continuous with the housing 151, and an optical path tube 147a is connected to surround the opening. Therefore, the interior space of the housing 151 communicates with the interior space of the optical path tube 147a through this opening.

[0066] Beam splitter 152 allows the pulsed laser light passing through output coupling mirror 147 to pass through exit window 161 with high transmittance, and reflects a portion of the pulsed laser light towards condenser lens 153. Condenser lens 153 focuses the pulsed laser light onto the light-receiving surface of optical sensor 154. Optical sensor 154 measures the pulse energy E of the pulsed laser light incident on the light-receiving surface. Optical sensor 154 is electrically connected to laser processor 190 and outputs a signal representing data related to the measured pulse energy E to laser processor 190.

[0067] The opening is continuous with the side of the housing 151 of the monitor module 150 opposite to the side connected to the optical path tube 147a, and the optical path tube 161a is connected to the opening in a manner that surrounds the opening. Therefore, the internal space of the housing 151 and the internal space of the optical path tube 161a are in communication with each other. In addition, the optical path tube 161a is connected to the housing 110. An exit window 161 is provided in the housing 110 at a position surrounded by the optical path tube 161a. Light passing through the beam splitter 152 of the monitor module 150 is emitted from the exit window 161 to the exposure device 200 outside the housing 110.

[0068] The internal spaces of optical path tubes 147a, 161a, and housings 145a, 151 are filled with purge gas. The purge gas contains inert gases such as high-purity nitrogen with few impurities, including oxygen. The purge gas is supplied to the internal spaces of optical path tubes 147a, 161a, and housings 145a, 151 through piping (not shown) from a purge gas supply source (not shown) located outside housing 110.

[0069] Pressure sensor 48 measures the pressure inside the housing 30. Pressure sensor 48 is electrically connected to laser processor 190 and outputs a signal representing data related to the measured pressure to laser processor 190.

[0070] A laser gas supply device supplies laser gas from a laser gas supply source (not shown) located outside the housing 110 via piping (not shown). The laser gas supply device is equipped with valves (not shown), a flow regulating valve, and is connected to other piping connected to the housing 30. Based on control signals from the laser processor 190, the laser gas supply device supplies multiple gases to the interior space of the housing 30 via these other piping. A laser gas exhaust device is connected to the housing 30 via piping. The laser gas exhaust device includes an exhaust pump (not shown), which exhausts gas from the interior space of the housing 30 into the interior space of the housing 110 via piping.

[0071] In addition, an exhaust pipe 111 is provided in the housing 110. Gas is discharged to the outside of the housing 110 from the exhaust pipe 111. This gas is gas discharged from the internal space of the housing 30 to the internal space of the housing 110 through a laser gas exhaust device, or gas discharged from the optical path tubes 147a, 161a, etc. (not shown) through structures.

[0072] The laser processor 190 disclosed herein is a processing device comprising a storage device storing a control program and a CPU executing the control program. The laser processor 190 is specifically configured or programmed to perform the various processes contained herein. Furthermore, the laser processor 190 controls the gas laser device 100 as a whole. Additionally, the laser processor 190 is electrically connected to the exposure processor of the exposure apparatus 200, and transmits and receives various signals with and from the exposure processor.

[0073] 2.2 Actions

[0074] Next, the operation of the comparative example gas laser device 100 will be explained.

[0075] Before the gas laser device 100 emits a pulsed laser, purge gas is supplied from a purge gas supply source (not shown) to fill the internal spaces of the optical path tubes 147a and 161a, and the internal spaces of the housings 145a and 151. Additionally, a laser gas supply device (not shown) supplies laser gas to the internal space of the housing 30. After the laser gas is supplied, the laser processor 190 controls the motor 46a to rotate the crossflow fan 46. The rotation of the crossflow fan 46 circulates the laser gas within the internal space of the housing 30.

[0076] When the gas laser device 100 emits pulsed laser light, the laser processor 190 sets a predetermined charging voltage for the charger 141 and turns on the switch 143a. As a result, the pulsed power module 143 uses the electrical energy held by the charger 141 to generate a pulsed high voltage, applying a high voltage between electrodes 32a and 32b. When a high voltage is applied, the insulation between electrodes 32a and 32b breaks down, resulting in a discharge. During this discharge, the laser medium contained in the laser gas between electrodes 32a and 32b is excited by the energy of the discharge and emits spontaneously emitted light upon returning to its ground state. A portion of this light is ultraviolet light, which is reflected at the rear mirror 145 after passing through window 31b. The light reflected at the rear mirror 145 propagates again from window 31b into the interior space of the housing 30. Through the light propagating into the interior space of the housing 30, the excited laser medium undergoes stimulated emission, and the light is amplified. The light then travels through window 31a towards the output coupling mirror 147. A portion of the light passes through the output coupling mirror 147, while the remainder is reflected by the output coupling mirror 147 and propagates through window 31a into the interior space of housing 30. The light propagating into the interior space of housing 30 travels towards rear mirror 145 as described above. Thus, the laser oscillates between rear mirror 145 and output coupling mirror 147, being amplified each time it passes through the discharge space within housing 30. Then, a portion of the laser, as a pulsed laser, passes through output coupling mirror 147 and travels towards beam splitter 152.

[0077] A portion of the pulsed laser traveling toward beam splitter 152 is reflected at beam splitter 152. The reflected pulsed laser is received by optical sensor 154, which measures the pulse energy E of the received pulsed laser. Optical sensor 154 outputs a signal representing data related to the measured pulse energy E to laser processor 190. Laser processor 190 performs feedback control on the charging voltage of charger 141 to ensure that the difference ΔE between the pulse energy E and the target pulse energy Et is within an acceptable range. When the difference ΔE is within the acceptable range, the laser passes through beam splitter 152 and exit window 161 and enters exposure apparatus 200. This pulsed laser is an ArF laser, which is ultraviolet light with a center wavelength of approximately 193 nm.

[0078] Furthermore, the pressure inside the housing 30 is measured by a pressure sensor 48, and the signal from the pressure sensor 48, representing pressure-related data, is input to the laser processor 190. When the charging voltage exceeds the maximum permissible value, the laser processor 190 controls the laser gas supply device based on the signal from the pressure sensor 48, supplying laser gas to the inside of the housing 30 until the pressure inside the housing 30 reaches a predetermined pressure. Conversely, when the charging voltage falls below the minimum permissible value, the laser processor 190 controls the laser gas exhaust device based on this signal, discharging laser gas from the inside of the housing 30 until the pressure reaches a predetermined pressure.

[0079] However, when a discharge occurs between electrodes 32a and 32b as described above, metal powder and vapor are generated from electrodes 32a and 32b due to sputtering or heat caused by the discharge. The metal powder and vapor react with F2 gas in the laser gas to generate fluoride. The fluoride particles, along with the laser gas, circulate within the internal space of the housing 30 by means of a cross-flow fan 46. This circulation creates a pressure difference between opening 30c and opening 30j or opening 30k, through which a portion of the laser gas containing the particles flows from opening 30c and inlet 51 into the filter box 50. Figure 4 The dashed arrows in the diagram illustrate the flow of laser gas from the interior space of housing 30 toward filter box 50.

[0080] A portion of the laser gas flowing into the filter chamber 50 flows into the filter 53a and is filtered, removing particles from the laser gas. The particle-free laser gas flows through the flow path 30d into the purge chamber 30g. A portion of the flowing laser gas flows into the interior space of the housing 30 through the opening 30j. Additionally, another portion of the laser gas blows through the window 31a. Then, another portion of the laser gas is bounced back by the window 31a and flows into the interior space of the housing 30 through the opening 30j. However, particles suspended in the interior space of the housing 30 sometimes flow from the opening 30j through the purge chamber 30g into the window 31a. To suppress the adhesion of these particles to the window 31a, a cylindrical component 60a is provided. The laser gas containing particles from the opening 30j is compressed as it passes through the opening 63 in the cylindrical component 60a, and after passing through the gap of the adjacent plate component 61, the compression is released and it expands. As the laser gas travels along the length of the cylindrical component 60a within its internal space, it undergoes repeated compression and expansion. Through this repeated compression and expansion, some of the particles contained in the laser gas adhere to the inner circumferential surfaces of the plate component 61 and the cylindrical component 60a and are removed. The laser gas, now free of particles, flows towards and blows through the window 31a. This prevents particles flowing from the opening 30j from adhering to the window 31a. While the flow and blowing of the laser gas have been described using the former perspective, the flow and blowing of the laser gas on the latter perspective are also described in the same way. Therefore, by blowing laser gas towards the window 31b, particle adhesion to the window 31b is prevented.

[0081] 2.3 Research Topic

[0082] In the comparative cavity device CH, the flow of laser gas flowing into the filter box 50 may be insufficient due to the pressure difference generated solely by driving the cross-flow fan 46. In this case, the flow of laser gas flowing from the purge chambers 30g and 30g through openings 30j and 30k into the internal space of the housing 30 is reduced, and particles sometimes travel from the internal space of the housing 30 through openings 30j and 30k towards windows 31a and 31b. Since only a portion of the particles in the laser gas are removed in the cylindrical components 60a and 60b, particles adhere to windows 31a and 31b, and the transmittance of windows 31a and 31b may sometimes decrease due to the particles. When the transmittance decreases, the energy density of the pulsed laser emitted from the gas laser device 100 toward the exposure device 200 may sometimes decrease. Therefore, the reliability of the gas laser device 100 may decrease. When the pulse energy of the gas laser device 100 increases, the number of particles generated increases due to the increase in electrode area, etc., and therefore, this insufficient flow becomes more significant.

[0083] Therefore, in the following embodiments, a cavity device CH capable of suppressing the decrease in reliability of the gas laser device 100 is illustrated.

[0084] 3. Description of the cavity device in Embodiment 1

[0085] Next, the cavity device CH of Embodiment 1 will be described. Furthermore, structures identical to those described above will be labeled with the same reference numerals, and repeated descriptions will be omitted unless specifically stated otherwise. Additionally, in some of the accompanying drawings, parts of components may be omitted or simplified for ease of observation.

[0086] 3.1 Structure

[0087] Figure 5 This is a diagram showing the internal space of the housing 30 of the cavity device CH of this embodiment, viewed from the insulating part 33 side toward the crossflow fan 46 side. Unlike the cavity device CH of the comparative example, the cavity device CH of this embodiment does not include a filter box 50, flow paths 30d and 30e, or purge chambers 30g and 30h.

[0088] The cavity device CH has partition walls 81 and 83 disposed within the internal space of the housing 30. Partition wall 81 is disposed between the electrodes 32a and 32b and the front wall, and partition wall 83 is disposed between the electrodes 32a and 32b and the rear wall. Furthermore, the main surface of partition wall 81 faces the front wall of the housing 30, and the main surface of partition wall 83 faces the rear wall of the housing 30. These partition walls 81 and 83 divide the internal space of the housing 30 into three internal spaces 301, 303, and 305. Internal space 301 is the space on the front window side between partition wall 81 and the front wall of the housing 30, and internal space 303 is the space on the rear window side between partition wall 83 and the rear wall of the housing 30. Internal space 301 is in contact with the front wall, and internal space 303 is in contact with the rear wall. The internal space 305 is the space between internal spaces 301 and 303, specifically the space between partition walls 81 and 83 on the side of electrodes 32a and 32b. Internal space 305 is the internal space on the opposite side of internal space 301 relative to partition wall 81, and the internal space on the opposite side of internal space 303 relative to partition wall 83. Internal spaces 301 and 303 are of the same size, while internal space 305 is larger than both internal spaces 301 and 303.

[0089] Electrodes 32a and 32b, an electrode holder 36, a crossflow fan 46 serving as a first fan, a heat exchanger 47, and a pressure sensor 48 are arranged in the internal space 305. Figure 5 In, with Figure 3 Similarly, for clarity of illustration, the diagrams of electrode 32b, electrode holder 36, and pressure sensor 48 are omitted.

[0090] In the cavity device CH of this embodiment, the crossflow fan 46 and the heat exchanger 47 are arranged in the internal space 305 in a manner opposite to those in the comparative example. Furthermore, unlike the internal space of the housing 30 in the comparative example, filters 53a and 53b are arranged in the internal space 305. Filters 53a and 53b are positioned on the side opposite to the crossflow fan 46, with respect to the heat exchanger 47. In the cavity device CH of this embodiment, the crossflow fan 46 circulates the laser gas in the following order: crossflow fan 46, between electrodes 32a and 32b, filters 53a and 53b, heat exchanger 47, and crossflow fan 46. Therefore, filters 53a and 53b filter the laser gas flowing with the aid of the crossflow fan 46 and passing through the filters 53a and 53b respectively, removing particles from the laser gas. Filter 53a is disposed adjacent to partition wall 81 in the internal space 305 such that it blocks the opening 81a continuous with partition wall 81, and filter 53b is disposed adjacent to partition wall 81 in the internal space 305 such that it blocks the opening 83a continuous with partition wall 83. Figure 5 In the diagram, openings 81a and 83a are shown using dashed lines. Filters 53a and 53b, and openings 81a and 83a, are arranged on the same straight line in the direction of laser travel. Filters 53a and 53b are shorter than the filters in the comparative example. Alternatively, filters 53a and 53b may be longer than the filters in the comparative example, or they may be the same length. Alternatively, a single filter may be arranged between openings 81a and 83a to block them.

[0091] The cavity device CH of this embodiment has a second fan, a fan-side flow path in which the second fan is disposed, and a window-side flow path that communicates with the fan-side flow path and allows laser gas to flow toward the window side, which are respectively disposed on the front and rear sides. Hereinafter, the front second fan, fan-side flow path, and window-side flow path will be described as second fan 311, flow path 313, and flow path 315. Furthermore, the rear second fan, fan-side flow path, and window-side flow path will be described as second fan 321, flow path 323, and flow path 325. Hereinafter, the front second fan 311, flow path 313, and flow path 315 will be used for description; however, the rear second fan 321, flow path 323, and flow path 325 have the same structure as the front second fan 311, flow path 313, and flow path 315. Therefore, the second fan 321, flow path 323 and flow path 325 can achieve the same action / function / effect as the second fan 311, flow path 313 and flow path 315.

[0092] Figure 6 This is a three-dimensional view of the partition wall 81 and flow path 313 as observed from the internal space 305. Figure 7 This is a three-dimensional view of the partition wall 81 and flow path 313 as observed from the internal space 301.

[0093] A second fan 311 is provided in the flow path 313, and the laser gas filtered by the filter 53a flows in the flow path 313 by means of the second fan 311. In this embodiment, the flow path 313 is provided in the internal space 301 and the internal space 305 through the openings 81a, 81b, and 81c of the partition wall 81. This flow path 313 includes a first flow path 313a provided in the internal space 301, a second flow path 313b provided in the internal space 305, and a third flow path 313c provided in the internal space 301. The first flow path 313a, the second flow path 313b, and the third flow path 313c are spaces surrounded by the partition wall 81 and the plate, respectively. The first flow path 313a, the second flow path 313b, and the third flow path 313c are arranged along the planar direction of the partition wall 81.

[0094] One end of the first flow path 313a communicates with the internal space 305 via an opening 81a and a filter 53a. Laser gas from the internal space 305 flows into the first flow path 313a from the internal space 305 through the opening 81a, which serves as the first opening. Furthermore, the other end of the first flow path 313a communicates with an opening 81b that is continuous with the partition wall 81. The opening 81b is smaller than the opening 81a and is located below the opening 81a. Figure 5 In the image, a portion of the first flow path 313a, which is obscured by the third flow path 313c, is shown using dashed lines. Figure 6 In the diagram, a portion of the first flow path 313a, obscured by the partition wall 81, is shown using dashed lines. Furthermore, in... Figure 5 In order to facilitate observation of the attached diagram, the illustration of opening 81b is omitted. Figure 6 and Figure 7 In the middle, the opening 81b is shown using a dashed line.

[0095] One end of the second flow path 313b is connected to the first flow path 313a via an opening 81b, which serves as the second opening. Laser gas from the first flow path 313a flows into the second flow path 313b from the first flow path 313a via the opening 81b, which serves as the second opening. Furthermore, the other end of the second flow path 313b is connected to an opening 81c, which is continuous with the partition wall 81, and serves as the third opening. Figure 7 In the diagram, a portion of the second flow path 313b, obscured by partition wall 81, is shown using dashed lines. Opening 81c is larger than opening 81b but smaller than opening 81a. Opening 81c is located at approximately the same height as opening 81a on the side opposite to opening 81a, with opening 81b as the reference point. Figure 5 In the middle, the opening 81c is shown using a dashed line.

[0096] One end of the third flow path 313c is connected to the second flow path 313b via an opening 81c. Laser gas from the second flow path 313b flows into the third flow path 313c from the second flow path 313b through the opening 81c, which serves as the third opening. Furthermore, the other end of the third flow path 313c is connected to one end of the partition wall 83 side of the flow path 315, and is connected to the internal space 305 via an opening 81d. This third flow path 313c causes a portion of the laser gas to flow into the internal space 305 through the opening 81d, and another portion of the laser gas to flow into the flow path 315. Therefore, the third flow path 313c causes a portion of the laser gas to flow away from the window 31a, and another portion of the laser gas to flow towards the window 31a. The opening 81d is larger than the opening 81c but smaller than the opening 81a. The opening 81d is located above the opening 81b.

[0097] The second fan 311, for example, is a centrifugal fan, and is arranged adjacent to the opening 81c in the third flow path 313c. The second fan 311 is positioned approximately in the middle of the flow path 313. However, the drive shaft 46b of the crossflow fan 46 is inserted through the second flow path 313b, the opening 81c, and the third flow path 313c, and the end of the drive shaft 46b is held by a bearing 46c disposed outside the housing 30. This drive shaft 46b is connected to the second fan 311, and the second fan 311 rotates by the rotation of the drive shaft 46b. Therefore, when the drive shaft 46b and the crossflow fan 46 are rotated by the driving force of the motor 46a, which is the power source of the crossflow fan 46, the second fan 311 rotates in the same direction as the crossflow fan 46 by the driving force. The rotation of the second fan 311 causes the laser gas in the flow path 313 to flow into the flow path 315.

[0098] The flow path 315 is the internal space of a cylindrical component and is disposed within the internal space 301. The length direction of the flow path 315 is along the direction of laser travel. The flow path 315 is disposed within the internal space 301. One end of the flow path 315 communicates with the third flow path 313c, and the other end of the flow path 315 is connected to the front wall of the housing 30 in a manner that surrounds the opening 30a. When viewed along the direction of pulsed laser travel, the window 31a overlaps with the following parts: the opening 81d, the connection between the opening 81d and the third flow path 313c, the connection between the third flow path 313c and the flow path 315, and the flow path 315. The flow path 315 allows the laser gas flowing from the third flow path 313c of the flow path 315 via the second fan 311 to flow towards the window 31a side. Furthermore, the flow path 315 causes the laser gas bounced back by the window 31a to flow away from the window 31a. Specifically, the laser gas flows into the interior space 305 through the opening 81d.

[0099] A cylindrical component 60a is disposed in flow path 315. The cylindrical component 60a is coaxially disposed with window 31a. The cylindrical component 60a is shorter than flow path 315. One end of the cylindrical component 60a separates from the partition wall 81 and is located on the side of window 31a compared to the third flow path 313c. The other end of the cylindrical component 60a is connected to the front wall of the housing 30 in a manner that surrounds the opening 30a.

[0100] exist Figure 5 In this diagram, each flow path in flow path 323 corresponding to the first flow path 313a, the second flow path 313b, and the third flow path 313c is designated as first flow path 323a, second flow path 323b, and third flow path 323c, respectively. Furthermore, the openings corresponding to openings 81a, 81b, 81c, and 81d are designated as openings 83a, 83b, 83c, and 83d, respectively.

[0101] 3.2 Actions

[0102] Next, the operation of the crossflow fan 46 and the second fan 311 in this embodiment will be explained.

[0103] When motor 46a rotates, drive shaft 46b, connected to motor 46a and crossflow fan 46, rotates. Thus, crossflow fan 46 rotates due to the driving force from motor 46a. Furthermore, second fan 311 is connected to drive shaft 46b, and therefore rotates in the same direction as crossflow fan 46 due to the driving force from motor 46a. Thus, most of the laser gas circulates in the order of crossflow fan 46, between electrodes 32a and 32b, filters 53a and 53b, heat exchanger 47, and crossflow fan 46, thanks to the rotation of crossflow fan 46. Additionally, another portion of the laser gas flows through filter 53a and opening 81a into flow path 313 due to the rotation of crossflow fan 46 and second fan 311. The laser gas is filtered by filter 53a, and flows into flow path 313 in a state where particles contained in the laser gas have been removed by filtration.

[0104] In flow path 313, laser gas flows in the sequence of first flow path 313a, opening 81b, second flow path 313b, opening 81c, and third flow path 313c, aided by the second fan 311. At the other end of the third flow path 313c, the direction of laser gas travel is approximately orthogonal to the axis of opening 81d and flow path 315. This axis is the direction of laser travel. Furthermore, at the other end of the third flow path 313c, the laser gas collides with the inner circumferential surface of the third flow path 313c located in the direction of laser gas travel. Through this collision, a portion of the laser gas flows into the internal space 305 through opening 81d, while another portion flows into flow path 315.

[0105] In the flow path 315, the laser gas flows toward the cylinder component 60a, toward the window 31a, and blows through the window 31a. The laser gas blowing through the window 31a is bounced back by the window 31a and flows through the cylinder component 60a, the flow path 315, and the opening 81d into the internal space 305.

[0106] 3.3 Functions / Effects

[0107] In the cavity device CH of this embodiment, the second fan 311 rotates together with the crossflow fan 46 by a driving force from the motor 46a, which is the driving source of the crossflow fan 46. Laser gas filtered by the filter 53a flows through the second fan 311 into the flow path 313, which serves as the fan-side flow path. A portion of this laser gas flows away from the window 31a, and another portion flows into the flow path 315, which serves as the window-side flow path. The laser gas flowing into the flow path 315 flows towards the window 31a side through the flow path 315, is bounced back by the window 31a, and flows away from the window 31a through the flow path 315.

[0108] In the cavity device CH of this embodiment, the flow rate of the laser gas in the flow path 313 is increased by the second fan 311. Therefore, even if the laser gas containing particles in the internal space 305 on the electrode 32a, 32b side is to travel towards the window 31a, the laser gas is pushed back into the internal space 305 by the laser gas whose flow rate has been increased as described above and flows away from the window 31a. As a result, it is possible to suppress the movement of particles from the internal space 305 towards the window 31a and to suppress the adhesion of particles to the window 31a. Furthermore, the laser gas flowing towards the window 31a blows the window 31a in a state where particles have been removed, so the adhesion of particles can be suppressed by blowing. When adhesion is suppressed as described above, the decrease in transmittance of the window 31a caused by adhesion can be suppressed. In addition, when the decrease in transmittance is suppressed, the decrease in the energy density of the pulsed laser emitted from the gas laser device 100 towards the exposure device 200 can be suppressed, and the decrease in the reliability of the gas laser device 100 can be suppressed.

[0109] Furthermore, the second fan 311 rotates together with the crossflow fan 46. In this case, the crossflow fan 46 and the second fan 311 can be driven by a common motor 46a. Thus, compared to the case where the motor 46a is separately configured in the crossflow fan 46 and the second fan 311, the number of motors 46a can be reduced, the cost of the cavity device CH can be suppressed, and the cavity device CH can be made smaller.

[0110] Furthermore, in the cavity device CH of this embodiment, flow path 313 is provided in the internal space 301 and an internal space 305 that is larger than the internal space 301, and flow path 315 is provided in the internal space 301. Since the internal space 305 is larger than the internal space 301, it is easier to secure extra space in the internal space 305 compared to the internal space 301. Therefore, in the above-described structure, a portion of flow path 313 can be easily arranged in the internal space 301. Furthermore, since another portion of flow path 313 is arranged in the internal space 305, the space for arranging each flow path in the internal space 301 can be increased compared to the case where both flow path 313 and flow path 315 are entirely arranged in the internal space 301. Thus, a portion of flow path 313 and flow path 315 can be easily arranged in the internal space 301. Moreover, since a portion of flow path 313 is arranged in the internal space 305, the internal space 301 can be reduced, and the length of the housing 30 in the longitudinal direction can be shortened.

[0111] Furthermore, in the cavity device CH of this embodiment, the third flow path 313c also allows laser gas to flow through an opening 81d located on the opposite side of the flow path 315, based on the third flow path 313c, into the internal space 305 communicating with the third flow path 313c. Particles in the internal space 305 sometimes travel from the internal space 305 to the window 31a via the opening 81d, the third flow path 313c, and the flow path 315, aided by a crossflow fan 46. In the above structure, a portion of the laser gas flowing in the third flow path 313c flows into the internal space 305 in a manner that pushes back the particles; therefore, it is possible to suppress the flow of particles from the internal space 305 into the window 31a.

[0112] Furthermore, in the cavity device CH of this embodiment, when viewed along the travel direction of the pulsed laser, the window 31a overlaps with the following portions: opening 81d, the connection between opening 81d and the third flow path 313c, the connection between the third flow path 313c and the flow path 315, and the flow path 315. In this case, the pulsed laser travels from the internal space 305 through opening 81d, the third flow path 313c, and the flow path 315 to the window 31a. Therefore, it is not necessary to separate the opening for the pulsed laser from the opening 81d in the partition wall 81.

[0113] Furthermore, in the cavity device CH of this embodiment, the third flow path 313c communicates with the flow path 315 further away from the partition wall 81 than the wall side of the front side of the housing 30. In this case, compared with the case where the third flow path 313c communicates with the flow path 315 on the wall side of the front side of the housing 30, it is possible to suppress the flow of particles from the internal space 305 into the flow path 315 through the opening 81d.

[0114] Furthermore, in the cavity device CH of this embodiment, the filter 53a covers the opening 81a in the internal space 305. According to this structure, compared to the case where the filter 53a is disposed in the internal space 305 without covering the opening 81a, it is possible to suppress the movement of particles toward the flow path 313. When the movement of particles toward the flow path 313 is suppressed, the accumulation of particles in the flow paths 313 and 315, and the movement of particles toward the window 31a through the flow paths 313 and 315, can be suppressed.

[0115] Furthermore, in the cavity device CH of this embodiment, a cylindrical member 60a is disposed in the flow path 315. The cylindrical member 60a includes a plurality of plate members 61, the openings 63 of the plurality of plate members 61 being continuous, and the plate members 61 being arranged side by side in the longitudinal direction of the cylindrical member 60a at intervals. As a result, the laser gas is repeatedly compressed and expanded as it travels in the internal space of the cylindrical member 60a, and the particles contained in the laser gas can adhere to the plate members 61, thereby further removing the particles from the laser gas.

[0116] Furthermore, in the cavity device CH of this embodiment, the second fan 311 is connected to the drive shaft 46b of the crossflow fan 46 and rotates by the rotation of the drive shaft 46b. According to this structure, the second fan 311 can rotate simultaneously with the crossflow fan 46. Moreover, compared to the case where the drive shafts 46b are separately arranged in the crossflow fan 46 and the second fan 311, the number of drive shafts 46b can be reduced, thus suppressing the cost of the cavity device CH and enabling it to be compact.

[0117] In the cavity device CH of this embodiment, the crossflow fan 46 is described as the first fan; however, the first fan may also be a recirculation fan. Furthermore, the second fan 311 is described as a centrifugal fan; however, the second fan 311 may also be a Sirocco fan.

[0118] 4. Description of the cavity device in Embodiment 2

[0119] Next, the cavity device CH of Embodiment 2 will be described. Furthermore, structures identical to those described above will be labeled with the same reference numerals, and repeated descriptions will be omitted unless specifically stated otherwise.

[0120] 4.1 Structure

[0121] Figure 8This is a view of the internal space of the housing 30 of this embodiment, viewed from the insulating part 33 side towards the crossflow fan 46 side. In the cavity device CH of this embodiment, the structures of flow paths 313, 315, 323, and 325 are different from those of each of Embodiment 1. Hereinafter, flow paths 313 and 315 will be used for explanation; however, flow paths 323 and 325 have the same structure as flow paths 313 and 315. Therefore, flow paths 323 and 325 can achieve the same operation / function / effect as flow paths 313 and 315.

[0122] The flow path 313 in this embodiment includes a first flow path 313a and a second flow path 313b, which are respectively disposed in the internal space 301, that is, the entire flow path 313 is disposed in the internal space 301. Therefore, the openings 81b and 81c described in Embodiment 1, which connect the various flow paths in the flow path 313, are not provided in the partition wall 81 of this embodiment.

[0123] The second flow path 313b is a space surrounded by the front wall and plate of the housing 30, and is arranged along the wall. One end of the second flow path 313b is connected to the other end of the first flow path 313a, and the other end of the second flow path 313b is connected to the opening 30a. A second fan 311 is arranged at one end of the second flow path 313b, and a cylindrical component 60a is arranged at the other end of the second flow path 313b.

[0124] The flow path 315 is positioned on the side opposite to the front wall of the housing 30, with reference to the cylindrical member 60a. One end of the flow path 315 communicates with the other end of the second flow path 313b on the side of the direction of travel of the laser gas flowing in the second flow path 313b. The laser gas in the second flow path 313b flows into the flow path 315 from the second flow path 313b along the outer peripheral surface of the cylindrical member 60a. In this embodiment, the opening 81d is provided on the side opposite to the second flow path 313b, with reference to the flow path 315. The diameter of the flow path 315 is larger than that of the opening 81d, and the other end of the flow path 315 is connected to the partition wall 81 in a manner that surrounds the opening 81d. When viewed along the direction of travel of the pulsed laser, the window 31a overlaps with the following parts: the opening 81d, the connection between the opening 81d and the flow path 315, and the internal space of the flow path 315 and the cylindrical member 60a. Flow path 315 allows a portion of the laser gas flowing from the second flow path 313b along the outer peripheral surface of the cylindrical member 60a to flow towards the window 31a side via the internal space of the cylindrical member 60a. Furthermore, flow path 315 allows another portion of the laser gas to flow into the internal space 305 via the opening 81d. Additionally, flow path 315 allows laser gas that bounces back from the window 31a and returns to flow path 315 via the cylindrical member 60a to flow into the internal space 305 via the opening 81d. This flow path 313 communicates with the second flow path 313b on the wall side closer to the front of the housing 30 than the partition wall 81 side. In this embodiment, the partition wall 81 does not have openings 81b and 81c; therefore, opening 81d is the second opening of the partition wall 81.

[0125] In the flow path 313 of this embodiment, the laser gas flows in the order of the first flow path 313a and the second flow path 313b via the second fan 311. At the other end of the second flow path 313b, the laser gas flows along the outer periphery of the cylindrical member 60a toward the flow path 315 in the direction of pulsed laser travel. A portion of the laser gas flowing toward the flow path 315 flows toward the interior space 305 through the opening 81d. Furthermore, as described above, the diameter of the flow path 315 is larger than that of the opening 81d; therefore, another portion of the laser gas collides with the wall surface between the periphery of the flow path 315 and the edge of the opening 81d in the partition wall 81. Through this collision, the laser gas flows toward the window 31a via the flow path 315 and the cylindrical member 60a. Therefore, the flow path 315, which communicates with the second flow path 313b, allows the laser gas to flow toward the window 31a via the cylindrical member 60a provided in the second flow path 313b. Therefore, the second flow path 313b causes a portion of the laser gas to flow away from the window 31a via the flow path 315 and the opening 81d, and causes a portion of the laser gas to flow towards the window 31a via the flow path 315. The laser gas in the flow path 315 blows against the window 31a. The laser gas blowing against the window 31a is bounced back by the window 31a. The flow path 315 causes the laser gas bounced back from the window 31a to flow away from the window 31a, specifically, causes the laser gas to flow into the interior space 305 via the opening 81d.

[0126] 4.2 Functions / Effects

[0127] In the cavity device CH of this embodiment, flow paths 313 and 315 are disposed within the internal space 301. Therefore, it is not necessary to provide openings 81b and 81c in the partition wall 81. Furthermore, since flow paths 313 and 315 are not disposed within the internal space 305, it is possible to suppress turbulence in the gas flow based on the crossflow fan 46 due to flow paths 313 and 315.

[0128] The foregoing description is not a limitation but a simple illustration. Therefore, those skilled in the art will understand that modifications can be made to embodiments of this disclosure without departing from the claims. Furthermore, those skilled in the art will understand the use of embodiments of this disclosure in combination.

[0129] Unless explicitly stated otherwise, all terms used in this specification and claims should be interpreted as "non-limiting". For example, terms such as "comprising", "having", "possessing", and "comprise" should be interpreted as "excluding the presence of structural elements other than the described structural elements". Furthermore, the modifier "a" should be interpreted as meaning "at least one" or "one or more". Additionally, terms such as "at least one of A, B, and C" should be interpreted as "A", "B", "C", "A+B", "A+C", "B+C", or "A+B+C", and further, should be interpreted as including combinations of these elements with other than "A", "B", and "C".

Claims

1. A cavity device comprising: The casing, which is filled with laser gas; A pair of discharge electrodes, arranged opposite each other within the interior space of the housing, generate light using the laser gas by applying a voltage; A window is disposed on the wall of the housing, through which the light passes; A first fan is configured in the internal space to allow the laser gas to flow between the pair of discharge electrodes; A filter is configured in the internal space; The second fan rotates together with the first fan by a driving force from the drive source of the first fan; A partition wall is disposed between the wall surface where the window is disposed and the discharge electrode, dividing the internal space into a window-side internal space and an electrode-side internal space that is larger than the window-side internal space. The window-side internal space is connected to the wall surface where the window is disposed, and the discharge electrode is located in the electrode-side internal space. A fan-side flow path is provided in the internal space of the housing, through which the laser gas filtered by the filter flows by the second fan, causing a portion of the laser gas to flow away from the window; as well as A window-side flow path is disposed within the interior space of the window side and communicates with the fan-side flow path, allowing the laser gas flowing from the fan-side flow path via the second fan to flow towards the window side. The fan-side flow path includes: The first flow path is disposed in the internal space of the window side, and the laser gas in the internal space of the electrode side flows into the first flow path through the first opening of the partition wall; The second flow path is disposed in the internal space of the electrode side, and the laser gas of the first flow path flows into the second flow path through the second opening of the partition wall; as well as The third flow path is located in the internal space of the window side. The laser gas in the second flow path flows into the third flow path through the third opening of the partition wall. The third flow path causes the laser gas to flow toward the window side flow path.

2. The cavity device according to claim 1, wherein, The second fan is configured in the third flow path.

3. The cavity device according to claim 1, wherein, The filter covers the first opening in the internal space on the electrode side.

4. The cavity device according to claim 1, wherein, The cavity device also includes a cylindrical component disposed in the window-side flow path. The cylindrical component includes a plurality of plate components disposed within the internal space of the cylindrical component, and the openings of the plurality of plate components are continuous. The various plate components are arranged side by side at intervals in the direction of light travel.

5. The cavity device according to claim 1, wherein, The third flow path allows the laser gas to flow into the internal space of the electrode side through the fourth opening of the partition wall.

6. The cavity device according to claim 5, wherein, When viewed along the direction of light travel, the window overlaps with the following parts: the fourth opening, the connection between the fourth opening and the third flow path, the connection between the third flow path and the window-side flow path, and the window-side flow path.

7. The cavity device according to claim 1, wherein, The second fan is connected to the drive shaft of the first fan and rotates by the rotation of the drive shaft.

8. The cavity device according to claim 1, wherein, The second fan is a centrifugal fan.

9. The cavity device according to claim 1, wherein, The second fan is a Sirocco fan.

10. A cavity device comprising: The casing, which is filled with laser gas; A pair of discharge electrodes, arranged opposite each other within the interior space of the housing, generate light using the laser gas by applying a voltage; A window is disposed on the wall of the housing, through which the light passes; A first fan is configured in the internal space to allow the laser gas to flow between the pair of discharge electrodes; A filter is configured in the internal space; The second fan rotates together with the first fan by a driving force from the drive source of the first fan; A partition wall is disposed between the wall surface where the window is disposed and the discharge electrode, dividing the internal space into a window-side internal space and an electrode-side internal space. The window-side internal space is connected to the wall surface where the window is disposed, and the discharge electrode is located in the electrode-side internal space. A fan-side flow path is provided in the internal space of the housing, through which the laser gas filtered by the filter flows by the second fan, causing a portion of the laser gas to flow away from the window; as well as A window-side flow path, which is connected to the fan-side flow path, allows the laser gas flowing from the fan-side flow path via the second fan to flow towards the window side. The fan-side flow path and the window-side flow path are disposed in the window-side interior space between the partition wall and the wall surface where the window is disposed. The laser gas in the electrode-side interior space flows into the fan-side flow path through the first opening of the partition wall. The electrode-side interior space is located on the side opposite to the window-side interior space with the partition wall as a reference. The filter covers the first opening in the electrode-side interior space. The fan-side flow path causes the laser gas to flow into the electrode-side interior space through the window-side flow path and the second opening of the partition wall.

11. The cavity device according to claim 10, wherein, The second fan is configured in the fan-side flow path.

12. The cavity device according to claim 10, wherein, The cavity device also includes a cylindrical component disposed in the fan-side flow path. The cylindrical component includes a plurality of plate components disposed within the internal space of the cylindrical component, and the openings of the plurality of plate components are continuous. The various plate components are arranged side by side at intervals in the direction of light travel.

13. A gas laser device having a cavity, wherein, The cavity device has: The casing, which is filled with laser gas; A pair of discharge electrodes, arranged opposite each other within the interior space of the housing, generate light using the laser gas by applying a voltage; A window is disposed on the wall of the housing, through which the light passes; A first fan is configured in the internal space to allow the laser gas to flow between the pair of discharge electrodes; A filter is configured in the internal space; The second fan rotates together with the first fan by a driving force from the drive source of the first fan; A partition wall is disposed between the wall surface where the window is located and the discharge electrode, dividing the interior space into a window-side interior space and an electrode-side interior space that is larger than the window-side interior space. The window-side interior space is connected to the wall surface where the window is located, and the discharge electrode is located in the electrode-side interior space. A fan-side flow path is provided in the internal space of the housing, through which the laser gas filtered by the filter flows by the second fan, causing a portion of the laser gas to flow away from the window; as well as A window-side flow path is disposed within the interior space of the window side and communicates with the fan-side flow path, allowing the laser gas flowing from the fan-side flow path via the second fan to flow towards the window side. The fan-side flow path includes: The first flow path is disposed in the internal space of the window side, and the laser gas in the internal space of the electrode side flows into the first flow path through the first opening of the partition wall; The second flow path is disposed in the internal space of the electrode side, and the laser gas of the first flow path flows into the second flow path through the second opening of the partition wall; as well as The third flow path is located in the internal space of the window side. The laser gas in the second flow path flows into the third flow path through the third opening of the partition wall. The third flow path causes the laser gas to flow toward the window side flow path.

14. The gas laser device according to claim 13, wherein, The gas laser device is an excimer laser device.

15. A method for manufacturing an electronic device, comprising the following steps: Laser is generated by a gas laser device with a cavity. The laser is output to the exposure device. The laser is exposed on a photosensitive substrate within the exposure apparatus to manufacture electronic devices. The cavity device has: The casing, which is filled with laser gas; A pair of discharge electrodes, arranged opposite each other within the interior space of the housing, generate light using the laser gas by applying a voltage; A window is disposed on the wall of the housing, through which the light passes; A first fan is configured in the internal space to allow the laser gas to flow between the pair of discharge electrodes; A filter is configured in the internal space; The second fan rotates together with the first fan by a driving force from the drive source of the first fan; A partition wall is disposed between the wall surface where the window is located and the discharge electrode, dividing the interior space into a window-side interior space and an electrode-side interior space that is larger than the window-side interior space. The window-side interior space is connected to the wall surface where the window is located, and the discharge electrode is located in the electrode-side interior space. A fan-side flow path is provided in the internal space of the housing, through which the laser gas filtered by the filter flows by the second fan, causing a portion of the laser gas to flow away from the window; as well as A window-side flow path is disposed within the interior space of the window side and communicates with the fan-side flow path, allowing the laser gas flowing from the fan-side flow path via the second fan to flow towards the window side. The fan-side flow path includes: The first flow path is disposed in the internal space of the window side, and the laser gas in the internal space of the electrode side flows into the first flow path through the first opening of the partition wall; The second flow path is disposed in the internal space of the electrode side, and the laser gas of the first flow path flows into the second flow path through the second opening of the partition wall; as well as The third flow path is located in the internal space of the window side. The laser gas in the second flow path flows into the third flow path through the third opening of the partition wall. The third flow path causes the laser gas to flow toward the window side flow path.

16. The method for manufacturing an electronic device according to claim 15, wherein, The gas laser device is an excimer laser device.

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