一种采用双脉冲技术制备的高熵合金涂层及其方法与装置

By using dual-pulse technology to process plasma and combining it with multi-field magnetic and electric field control, the problems of large-area uniformity and compositional inhomogeneity in high-entropy alloy coatings were solved, achieving the preparation of high-entropy alloy coatings with high bonding strength and density, and reducing the preparation cost.

CN116904938BActive Publication Date: 2026-07-17BEIJING NORMAL UNIVERSITY +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
BEIJING NORMAL UNIVERSITY
Filing Date
2023-07-19
Publication Date
2026-07-17

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Abstract

本发明公开了一种采用双脉冲技术制备的高熵合金涂层及其制备方法，所述方法包括以下步骤：将等离子体依次通过脉冲磁场、扫描磁场和脉冲电场处理后沉积在基体样品表面形成高熵合金涂层。本发明方法制备的高熵合金涂层和基体结合强度高，不同服役环境下保持优异性能时间长；本发明方法有别于传统技术，双脉冲技术制备高熵合金涂层在靶材确定后其内各元素种类通过沉积外部参数可以实现元素成分、结构精确调节；本发明双脉冲技术制备高熵合金涂层其膜层致密性高，结构可通过脉冲磁场与脉冲负压和过渡层进行调节；本发明双脉冲技术制备高熵合金膜层大面积的均匀性好，通过磁场的设计，金属等离子体能够充分的混合，不存在成分偏析的情况。
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