A centrifuge CIP cleaning system and method of operation

Abstract

The application discloses a centrifuge CIP cleaning system and a running method. The acid liquid pressure stabilizing valve of the system is connected between an acid liquid tank and an acid liquid sending pipeline and arranged between an acid liquid sending pump and an acid liquid sending valve; the alkali liquid pressure stabilizing valve is connected between an alkali liquid tank and an alkali liquid sending pipeline and arranged between an alkali liquid sending pump and an alkali liquid sending valve; and the hot water pressure stabilizing valve is connected between a hot water tank and a hot water sending pipeline and arranged between a hot water sending pump and a hot water sending valve. The application can guarantee stable running of the centrifuge CIP cleaning system and avoid vibration of the centrifuge CIP cleaning system during running.

Description

Technical Field

[0001] This application belongs to the field of centrifuge technology, specifically relating to a centrifuge CIP cleaning system and its operation method. Background Technology

[0002] Ethanol production via coal gas fermentation is a new technology that uses carbon monoxide as a carbon source to produce ethanol through microbial fermentation. After distillation to extract ethanol, the fermentation wastewater contains a certain amount of microbial protein, which increases the difficulty of wastewater treatment. However, the microbial protein in the wastewater has a simple composition and high crude protein content, making it a high-value-added protein feed that can be widely used in aquaculture and livestock feeding. Microbial protein powder can replace a portion of fishmeal in the feed industry to reduce reliance on high-grade protein feeds for marine fish, thus having significant environmental and economic benefits.

[0003] The extraction of bacterial cells is mainly achieved through production processes such as centrifugation concentration, drying, and packaging. The centrifuge system is the core of this process, determining the quality of the finished protein product and energy consumption. The CIP (Clean-In-Place) operation of the centrifuge is crucial for the normal operation and safety of the centrifuge system. Currently, during operation, the opening and closing of relevant valves in the centrifuge CIP cleaning system can cause vibrations, affecting its stable operation. Summary of the Invention

[0004] This application aims to at least partially solve the technical problem of unstable operation of current centrifuge CIP cleaning systems. To this end, this application provides a centrifuge CIP cleaning system and its operating method.

[0005] The technical solution of this application is as follows: On one hand, this application provides a centrifuge CIP cleaning system, comprising: Centrifuge; The raw material liquid pipeline is connected to the raw material liquid inlet of the centrifuge; Acid tank; An acid delivery pipeline is connected between the acid tank and the raw material pipeline; An acid delivery pump is installed on the acid delivery pipeline; An acid inlet valve is installed on the acid outlet pipeline and between the acid outlet pump and the raw material pipeline. An acid pressure regulating valve is connected between the acid tank and the acid delivery pipeline, and is located between the acid delivery pump and the acid inlet valve. Alkali solution tank; The alkali solution delivery pipeline is connected between the alkali solution tank and the raw material solution pipeline; An alkaline solution delivery pump is installed on the alkaline solution delivery pipeline; An alkali inlet valve is installed on the alkali outlet pipeline and is located between the alkali outlet pump and the raw material pipeline. An alkaline solution pressure stabilizing valve is connected between the alkaline solution tank and the alkaline solution delivery pipeline, and is located between the alkaline solution delivery pump and the alkaline solution inlet valve; Hot water tank; A hot water delivery pipeline is connected between the hot water tank and the raw material liquid pipeline; A hot water delivery pump is installed on the hot water delivery pipeline; A hot water inlet valve is installed on the hot water outlet pipeline and between the hot water outlet pump and the raw material liquid pipeline; A hot water pressure regulating valve is connected between the hot water tank and the hot water delivery pipeline, and is installed between the hot water delivery pump and the hot water delivery valve; The centrifuge CIP cleaning system also includes: Clear liquid pipeline; A clear liquid tank, wherein the clear liquid pipeline is connected between the centrifuge and the clear liquid tank; The first acid reflux line is connected between the clear liquid line and the acid tank; The first acid return valve is installed on the first acid return pipeline; The first alkali return pipeline is connected between the clear liquid pipeline and the alkali tank; The first alkali return valve is installed on the first alkali return pipeline; The first hot water return pipeline is connected between the clear liquid pipeline and the hot water tank; The first hot water return valve is installed on the first hot water return pipeline; The centrifuge CIP cleaning system also includes: Concentrate pipeline; A concentrate tank, wherein the concentrate pipeline is connected between the centrifuge and the concentrate tank; A second acid reflux line is connected between the concentrated solution line and the acid tank; The second acid return valve is installed on the second acid return pipeline; The second alkali return line is connected between the concentrated liquid line and the alkali tank. The second alkali return valve is installed on the second alkali return pipeline; The second hot water return pipeline is connected between the concentrated liquid pipeline and the hot water tank; The second hot water return valve is installed on the second hot water return pipeline.

[0006] In some embodiments, the centrifuge CIP cleaning system further includes: Waste acid tank; The first waste acid pipeline is connected between the first acid return pipeline and the waste acid tank; The first waste acid return valve is installed on the first waste acid pipeline; The second waste acid pipeline is connected between the second acid return pipeline and the waste acid tank; The second waste acid return valve is installed on the second waste acid pipeline.

[0007] In some embodiments, the centrifuge CIP cleaning system further includes: The third acid return valve is installed on the first acid return pipeline and between the first waste acid pipeline and the acid tank. The fourth acid return valve is installed on the second acid return pipeline and between the second waste acid pipeline and the acid tank.

[0008] The cleaning solution is fed into the main pipeline, one end of which is connected to the raw material pipeline, and the acid outlet pipeline, the alkali outlet pipeline, and the hot water outlet pipeline are all connected to the other end of the cleaning solution feed into the main pipeline. The cleaning fluid supply valve is located at one end of the cleaning fluid supply main pipeline.

[0009] The centrifuge CIP cleaning system also includes a safety water line connected to the raw material liquid line and positioned between the cleaning liquid inlet main line and the centrifuge.

[0010] In some embodiments, the centrifuge CIP cleaning system further includes: The first cleaning fluid return main pipeline has one end connected to the clean fluid pipeline, and the first acid return pipeline, the first alkali return pipeline, and the first hot water return pipeline are all connected to the other end of the first cleaning fluid return main pipeline. The first cleaning fluid return main valve is installed at one end of the first cleaning fluid return main pipeline.

[0011] In some embodiments, the centrifuge CIP cleaning system further includes: The second cleaning fluid return main pipeline has one end connected to the concentrated liquid pipeline, and the second acid return pipeline, the second alkali return pipeline, and the second hot water return pipeline are all connected to the other end of the second cleaning fluid return main pipeline. The second cleaning fluid return main valve is installed at one end of the second cleaning fluid return main pipeline.

[0012] On the other hand, this application also proposes a centrifuge CIP cleaning system operation method, applied to the aforementioned centrifuge CIP cleaning system, the centrifuge CIP cleaning system operation method comprising: Turn on the acid delivery pump, the acid inlet valve, and the acid pressure stabilizing valve to allow the acid in the acid tank to stably enter the centrifuge through the acid delivery pipeline and the raw material pipeline, so as to clean the centrifuge. Turn on the alkali solution delivery pump, the alkali solution inlet valve, and the alkali solution pressure stabilizing valve so that the alkali solution in the alkali solution tank enters the centrifuge stably through the alkali solution delivery pipeline and the raw material liquid pipeline to clean the centrifuge. Turn on the hot water delivery pump, the hot water inlet valve, and the hot water pressure stabilizing valve to allow the hot water in the hot water tank to stably enter the centrifuge through the hot water delivery pipeline and the raw material liquid pipeline, so as to clean the centrifuge.

[0013] The embodiments of this application have at least the following beneficial effects: This application proposes a centrifuge CIP cleaning system. The centrifuge is used to separate a raw material liquid into a clear liquid and a concentrated liquid. A raw material liquid pipeline is connected to the centrifuge for supplying the raw material liquid into the centrifuge. The centrifuge CIP cleaning system of this application operates based on the centrifuge's operating system. In the centrifuge CIP cleaning system, the cleaning fluid used to clean the centrifuge includes acid, alkali, and hot water. The acid is stored in an acid tank, which is connected to the raw material liquid pipeline via an acid delivery pipeline. An acid delivery pump is installed on the acid delivery pipeline to pump the acid from the acid tank into the acid delivery pipeline, then into the raw material liquid pipeline, and finally into the centrifuge, thus cleaning the centrifuge with the acid. Alkali solution is stored in an alkali solution tank, which is connected to the raw material solution pipeline via an alkali solution delivery pipeline. An alkali solution delivery pump is installed on this pipeline to pump the alkali solution from the tank into the pipeline, then into the raw material solution pipeline, and finally into the centrifuge for cleaning. Hot water is stored in a hot water tank, which is connected to the raw material solution pipeline via a hot water delivery pipeline. A hot water delivery pump is installed on this pipeline to pump the hot water from the tank into the pipeline, then into the raw material solution pipeline, and finally into the centrifuge for cleaning.

[0014] In addition, the centrifuge CIP cleaning system is equipped with acid, alkali, and hot water pressure regulating valves. The acid pressure regulating valve connects the acid tank to the acid delivery line, and the connection point on the acid delivery line between the acid delivery line and the alkali pressure regulating valve is located between the acid delivery pump and the acid inlet valve. Similarly, the alkali pressure regulating valve connects the alkali tank to the alkali delivery line, and the connection point on the alkali delivery line between the alkali delivery pump and the alkali inlet valve is located between the hot water pump and the hot water inlet valve. The hot water pressure regulating valve connects the hot water tank to the hot water delivery line, and the connection point on the hot water delivery line between the hot water delivery pump and the hot water inlet valve. Through the coordination of these valves with the acid, alkali, and hot water inlet valves, the stable operation of the centrifuge CIP cleaning system is ensured, and vibration during operation is prevented. Attached Figure Description

[0015] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0016] Figure 1 This is a schematic diagram of the centrifuge CIP cleaning system according to an embodiment of this application.

[0017] Figure 2 This is a timing diagram of the operation method of the centrifuge CIP cleaning system according to an embodiment of this application.

[0018] Figure label: 10. Centrifuge; 20. Raw material liquid pipeline; 30. Acid tank; 40. Acid discharge pipeline; 50. Acid discharge pump; 60. Acid inlet valve; 70. Acid pressure stabilizing valve; 80. Alkali tank; 90. Alkali discharge pipeline; 100. Alkali discharge pump; 110. Alkali inlet valve; 120. Alkali pressure stabilizing valve; 130. Hot water tank; 140. Hot water discharge pipeline; 150. Hot water discharge pump; 160. Hot water inlet valve; 170. Hot water pressure stabilizing valve; 180. Clarified liquid pipeline; 190. Clarified liquid tank; 200. First acid return line; 210. First acid return valve; 220. First alkali return line; 230. First alkali return valve; 240. First hot water return line; 250. First hot water return valve; 260. Concentrate line; 270. Second acid return line; 280. Second acid return valve; 290. Second alkali return line; 300. Second alkali return valve; 310. Second hot water return line; 320. Second hot water return valve; 330. Waste acid tank; 340. First waste acid tank. Acid pipeline; 350, First waste acid return valve; 360, Second waste acid pipeline; 370, Second waste acid return valve; 380, Third acid return valve; 390, Fourth acid return valve; 400, Cleaning fluid inlet main pipeline; 410, Cleaning fluid inlet main valve; 420, Safety water pipeline; 430, First cleaning fluid return main pipeline; 440, First cleaning fluid return main valve; 450, Second cleaning fluid return main pipeline; 460, Second cleaning fluid return main valve; 470, Slag tank; 480, Raw material liquid inlet main valve ; 490, First raw material liquid inlet valve; 500, Raw material liquid filter; 510, Second raw material liquid inlet valve; 520, Raw material liquid flow regulating valve; 530, Clarified liquid pressure regulating valve; 540, Clarified liquid main outlet valve; 550, Clarified liquid outlet valve; 560, Clarified liquid branch line; 570, Clarified liquid discharge valve; 580, Clarified liquid flushing line; 590, Clarified liquid flushing valve; 600, Concentrated liquid outlet valve; 610, Concentrated liquid branch line; 620, Concentrated liquid discharge valve; 630, Clarified liquid return line; 640, Concentrated liquid tank. Detailed Implementation

[0019] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0020] Furthermore, reference numerals and / or reference letters may be repeated in different examples in this application. Such repetition is for simplification and clarity purposes and does not in itself indicate a relationship between the various embodiments and / or settings discussed. In addition, this application provides examples of various specific processes and materials; however, those skilled in the art will recognize the application of other processes and / or the use of other materials.

[0021] This application is described below with reference to the accompanying drawings and specific embodiments: Figure 1 This is a schematic diagram of a centrifuge CIP (Clean In Place) cleaning system according to an embodiment of this application, combined with... Figure 1 The centrifuge CIP cleaning system includes a centrifuge 10, a raw material liquid pipeline 20, an acid tank 30, an acid delivery pipeline 40, an acid delivery pump 50, an acid inlet valve 60, an acid pressure stabilizing valve 70, an alkali tank 80, an alkali delivery pipeline 90, an alkali delivery pump 100, an alkali inlet valve 110, an alkali pressure stabilizing valve 120, a hot water tank 130, a hot water delivery pipeline 140, a hot water delivery pump 150, a hot water inlet valve 160, and a hot water pressure stabilizing valve 170.

[0022] In this embodiment, the raw material liquid pipeline 20 is connected to the centrifuge 10, the acid liquid discharge pipeline 40 is connected between the acid liquid tank 30 and the raw material liquid pipeline 20, the acid liquid discharge pump 50 is installed on the acid liquid discharge pipeline 40, the acid liquid inlet valve 60 is installed on the acid liquid discharge pipeline 40 and is located between the acid liquid discharge pump 50 and the raw material liquid pipeline 20, the acid liquid pressure regulating valve 70 is connected between the acid liquid tank 30 and the acid liquid discharge pipeline 40 and is located between the acid liquid discharge pump 50 and the acid liquid inlet valve 60, the alkali liquid discharge pipeline 90 is connected between the alkali liquid tank 80 and the raw material liquid pipeline 20, the alkali liquid discharge pump 100 is installed on the alkali liquid discharge pipeline 90, and the alkali liquid inlet valve 110 is installed on the alkali liquid discharge pipeline 90. A hot water supply line 140 is connected between a hot water tank 130 and a raw material liquid pipeline 20. A hot water supply pump 150 is installed on the hot water supply line 140. A hot water supply valve 160 is installed on the hot water supply line 140 and is located between the hot water supply pump 150 and the raw material liquid pipeline 20. A hot water pressure stabilizing valve 170 is connected between the hot water tank 130 and the hot water supply line 140 and is located between the hot water supply pump 150 and the hot water supply valve 160.

[0023] Specifically, centrifuge 10 is used to centrifuge and separate raw material liquid into clear liquid and concentrated liquid. Raw material liquid pipeline 20 is connected to centrifuge 10 and used to deliver the raw material liquid into centrifuge 10. The centrifuge CIP cleaning system of this embodiment operates based on the centrifuge 10's operating system. In the centrifuge CIP cleaning system, the cleaning solution used to clean centrifuge 10 includes acid, alkali, and hot water. Acid is stored in acid tank 30, which is connected to raw material liquid pipeline 20 via acid delivery pipeline 40. Acid delivery pump 50 is installed on acid delivery pipeline 40 to pump acid from acid tank 30 into acid delivery pipeline 40, then into raw material liquid pipeline 20, and finally into centrifuge 10, thus cleaning centrifuge 10 with acid. The alkali solution is stored in an alkali solution tank 80, which is connected to the raw material solution pipeline 20 via an alkali solution delivery pipeline 90. An alkali solution delivery pump 100 is installed on the alkali solution delivery pipeline 90 to pump the alkali solution in the alkali solution tank 80 into the alkali solution delivery pipeline 90, and then into the raw material solution pipeline 20. Finally, the raw material solution pipeline 20 enters the centrifuge 10 to clean the centrifuge 10 with the alkali solution. Hot water is stored in a hot water tank 130, which is connected to the raw material liquid pipeline 20 via a hot water delivery pipeline 140. A hot water delivery pump 150 is installed on the hot water delivery pipeline 140 to pump the hot water in the hot water tank 130 into the hot water delivery pipeline 140, and then into the raw material liquid pipeline 20. Finally, the raw material liquid pipeline 20 enters the centrifuge 10 to clean the centrifuge 10 with hot water.

[0024] In addition, the centrifuge CIP cleaning system also includes an acid pressure regulating valve 70, an alkali pressure regulating valve 120, and a hot water pressure regulating valve 170. The acid pressure regulating valve 70 is connected between the acid tank 30 and the acid delivery line 40, and the connection point on the acid delivery line 40 with the alkali pressure regulating valve 120 is located between the acid delivery pump 50 and the acid inlet valve 60. The alkali pressure regulating valve 120 is connected between the alkali tank 80 and the alkali delivery line 90, and the connection point on the alkali delivery line 90 with the alkali pressure regulating valve 120 is located between the alkali delivery pump 100 and the alkali inlet valve 110. The hot water pressure regulating valve 170 is connected between the hot water tank 130 and the hot water delivery line 140, and the connection point on the hot water delivery line 140 with the alkali pressure regulating valve 120 is located between the hot water delivery pump 150 and the hot water inlet valve 160. By cooperating with the acid pressure regulating valve 70, the alkali pressure regulating valve 120, and the hot water pressure regulating valve 170, as well as the acid inlet valve 60, the alkali inlet valve 110, and the hot water inlet valve 160, the stable operation of the centrifuge CIP cleaning system is ensured, and vibration of the centrifuge CIP cleaning system during operation is avoided.

[0025] In some embodiments, the centrifuge CIP cleaning system further includes a clean liquid line 180, a clean liquid tank 190, a first acid return line 200, a first acid return valve 210, a first alkali return line 220, a first alkali return valve 230, a first hot water return line 240, and a first hot water return valve 250. Specifically, the clear liquid pipeline 180 is connected between the centrifuge 10 and the clear liquid tank 190, the first acid return pipeline 200 is connected between the clear liquid pipeline 180 and the acid tank 30, the first acid return valve 210 is installed on the first acid return pipeline 200, the first alkali return pipeline 220 is connected between the clear liquid pipeline 180 and the alkali tank 80, the first alkali return valve 230 is installed on the first alkali return pipeline 220, the first hot water return pipeline 240 is connected between the clear liquid pipeline 180 and the hot water tank 130, and the first hot water return valve 250 is installed on the first hot water return pipeline 240.

[0026] As mentioned earlier, the raw material liquid is centrifuged and separated into a clear liquid and a concentrated liquid in centrifuge 10. The clear liquid is discharged from centrifuge 10 into the clear liquid line 180, and then from the clear liquid line 180 into the clear liquid tank 190. The acid entering centrifuge 10 is then discharged into the clear liquid line 180 to clean the clear liquid line 180. The acid in the clear liquid line 180 is then discharged into the first acid return line 200 by opening the first acid return valve 210, and finally returned to the acid tank 30 through the first acid return line 200. The alkaline solution entering the centrifuge 10 flows into the clean liquid line 180 to clean the line. The first alkaline return valve 230 is then opened, allowing the alkaline solution in the clean liquid line 180 to flow into the first alkaline return line 220, and finally back into the alkaline tank 80. Similarly, the hot water entering the centrifuge 10 flows into the clean liquid line 180 to clean the line. The first hot water return valve 250 is opened, allowing the hot water in the clean liquid line 180 to flow into the first hot water return line 240, and finally back into the hot water tank 130.

[0027] In some embodiments, the centrifuge CIP cleaning system also includes a concentrate line 260, a concentrate tank 640, a second acid return line 270, a second acid return valve 280, a second alkali return line 290, a second alkali return valve 300, a second hot water return line 310, and a second hot water return valve 320. The concentrated liquid pipeline 260 is connected between the centrifuge 10 and the concentrated liquid tank 640. The second acid return pipeline 270 is connected between the concentrated liquid pipeline 260 and the acid tank 30. The second acid return valve 280 is installed on the second acid return pipeline 270. The second alkali return pipeline 290 is connected between the concentrated liquid pipeline 260 and the alkali tank 80. The second alkali return valve 300 is installed on the second alkali return pipeline 290. The second hot water return pipeline 310 is connected between the concentrated liquid pipeline 260 and the hot water tank 130. The second hot water return valve 320 is installed on the second hot water return pipeline 310.

[0028] As mentioned earlier, the raw material liquid is centrifuged and separated into a clear liquid and a concentrated liquid in centrifuge 10. The concentrated liquid is discharged from centrifuge 10 into concentrated liquid pipeline 260, and then from concentrated liquid pipeline 260 into concentrated liquid tank 640. The acid entering centrifuge 10 is discharged into concentrated liquid pipeline 260 to clean concentrated liquid pipeline 260. The acid in concentrated liquid pipeline 260 is then discharged into second acid return pipeline 270 by opening the second acid return valve 280, and finally returned to acid tank 30 through second acid return pipeline 270. The alkaline solution entering the centrifuge 10 flows through the centrifuge 10 into the concentrated solution line 260 to clean the concentrated solution line 260. Then, by opening the second alkaline solution return valve 300, the alkaline solution in the concentrated solution line 260 flows into the second alkaline solution return line 290, and finally returns to the alkaline solution tank 80 through the second alkaline solution return line 290. Similarly, the hot water entering the centrifuge 10 flows through the centrifuge 10 into the concentrated solution line 260 to clean the concentrated solution line 260. Then, by opening the second hot water return valve 320, the hot water in the concentrated solution line 260 flows into the second hot water return line 310, and finally returns to the hot water tank 130 through the second hot water return line 310.

[0029] In some embodiments, the centrifuge CIP cleaning system further includes a waste acid tank 330, a first waste acid line 340, a first waste acid return valve 350, a second waste acid line 360, and a second waste acid return valve 370. The first waste acid line 340 is connected between the first acid return line 200 and the waste acid tank 330, and also connects the first acid return valve 210 and the acid tank 30. The first waste acid return valve 350 is disposed on the first waste acid line 340. The second waste acid line 360 ​​is connected between the second acid return line 270 and the waste acid tank 330, and also connects the second acid return valve 280 and the acid tank 30. The second waste acid return valve 370 is disposed on the second waste acid line 360. By opening the first waste acid return valve 350, waste acid in the first acid return pipeline 200 is allowed to enter the waste acid tank 330 through the first waste acid pipeline 340. By opening the second waste acid return valve 370, waste acid in the second acid return pipeline 270 is allowed to enter the waste acid tank 330 through the second waste acid pipeline 360.

[0030] In some embodiments, the centrifuge CIP cleaning system further includes a third acid return valve 380 and a fourth acid return valve 390. The third acid return valve 380 is located on the first acid return line 200 and between the first waste acid line 340 and the acid tank 30. The fourth acid return valve 390 is located on the second acid return line 270 and between the second waste acid line 360 ​​and the acid tank 30. By closing the third acid return valve 380 and the fourth acid return valve 390, the waste acid in the first acid return line 200 and the second acid return line 270 is prevented from flowing back into the acid tank 30.

[0031] In some embodiments, the centrifuge CIP cleaning system further includes a cleaning fluid inlet main line 400 and a cleaning fluid inlet main valve 410. One end of the cleaning fluid inlet main line 400 is connected to the raw material liquid line 20, and the cleaning fluid inlet main valve 410 is located at one end of the cleaning fluid inlet main line 400. The acid solution outlet line 40, the alkali solution outlet line 90, and the hot water outlet line 140 are all connected to the other end of the cleaning fluid inlet main line 400. The acid solution outlet line 40, the alkali solution outlet line 90, and the hot water outlet line 140 are controlled via the cleaning fluid inlet main line 400 and the cleaning fluid inlet main valve 410.

[0032] In some embodiments, the centrifuge CIP cleaning system also includes a safety water line 420, which is connected to the raw material liquid line 20 and positioned between the cleaning fluid inlet main line 400 and the centrifuge 10. This allows the system to automatically shut off and supply safety water in case of emergencies such as power outages or instrument air shortages during centrifugation, preventing mechanical damage caused by idling during high-speed centrifugation.

[0033] In some embodiments, the centrifuge CIP cleaning system further includes a first cleaning fluid return main line 430 and a first cleaning fluid return main valve 440. One end of the first cleaning fluid return main line 430 is connected to the clean fluid line 180, and the first cleaning fluid return main valve 440 is located at one end of the first cleaning fluid return main line 430. The first acid return line 200, the first alkali return line 220, and the first hot water return line 240 are all connected to the other end of the first cleaning fluid return main line 430. The first acid return line 200, the first alkali return line 220, and the first hot water return line 240 are controlled via the first cleaning fluid return main line 430 and the first cleaning fluid return main valve 440.

[0034] In some embodiments, the centrifuge CIP cleaning system further includes a second cleaning fluid return main line 450 and a second cleaning fluid return main valve 460. One end of the second cleaning fluid return main line 450 is connected to the concentrate line 260, and the second cleaning fluid return main valve 460 is located at one end of the second cleaning fluid return main line 450. The second acid return line 270, the second alkali return line 290, and the second hot water return line 310 are all connected to the other end of the second cleaning fluid return main line 450. The second acid return line 270, the second alkali return line 290, and the second hot water return line 310 are controlled via the second cleaning fluid return main line 450 and the second cleaning fluid return main valve 460.

[0035] In some embodiments, the centrifuge CIP cleaning system further includes a sludge tank 470, which is located on the concentrate line 260 and between the centrifuge 10 and the second cleaning fluid return main line 450. In addition to separating the raw material liquid into a clear liquid and a concentrate, the centrifuge 10 also separates a sludge-liquid mixture. The clear liquid is located in the upper part of the centrifuge 10, while the sludge-liquid and concentrate are located in the lower part. The mixture of sludge-liquid and concentrate enters the sludge tank 470 from the centrifuge 10, where the sludge-liquid remains, and the concentrate enters the concentrate line 260 from the sludge tank 470. The cleaning fluid enters the sludge tank 470 through the centrifuge 10 to clean the sludge tank 470.

[0036] In some embodiments, the centrifuge CIP cleaning system further includes a main feed liquid valve 480, a first feed liquid valve 490, a feed liquid filter 500, a second feed liquid valve 510, and a feed liquid flow regulating valve 520. The main feed liquid valve 480, the first feed liquid valve 490, the feed liquid filter 500, the second feed liquid valve 510, and the feed liquid flow regulating valve 520 are sequentially arranged on the feed liquid pipeline 20 in a direction close to the centrifuge 10. The cleaning liquid main feed pipeline 400 is connected between the main feed liquid valve 480 and the first feed liquid valve 490.

[0037] In some embodiments, the centrifuge CIP cleaning system further includes a cleaning liquid pressure regulating valve 530, a cleaning liquid main discharge valve 540, and a cleaning liquid discharge valve 550. The cleaning liquid pressure regulating valve 530, the cleaning liquid main discharge valve 540, and the cleaning liquid discharge valve 550 are sequentially arranged on the cleaning liquid line 180 in a direction away from the centrifuge 10, and the first cleaning liquid return main line 430 is connected between the cleaning liquid main discharge valve 540 and the cleaning liquid discharge valve 550.

[0038] As mentioned earlier, acid, alkali, and hot water all enter the centrifuge 10 through the raw material pipeline 20. After cleaning the centrifuge 10, they all flow through the centrifuge 10 into the clean liquid pipeline 180, and then return to the acid tank 30, alkali tank 80, and hot water tank 130, respectively. A raw material flow regulating valve 520 is installed on the raw material pipeline 20, and a clean liquid pressure regulating valve 530 is installed on the clean liquid pipeline 180. These valves allow for the regulation of the pressure within the centrifuge 30, ensuring effective cleaning while minimizing the impact of acid, alkali, and hot water on the centrifuge 30.

[0039] In some embodiments, the centrifuge CIP cleaning system further includes a clean liquid branch line 560 and a clean liquid discharge valve 570. One end of the clean liquid branch line 560 is connected to the clean liquid line 180, and another end of the clean liquid branch line 560 is connected between the clean liquid pressure regulating valve 530 and the clean liquid main discharge valve 540. The other end of the clean liquid branch line 560 is connected to the clean liquid tank 190, and the clean liquid discharge valve 570 is provided on the clean liquid branch line 560.

[0040] In some embodiments, the centrifuge CIP cleaning system further includes a cleaning fluid flushing line 580 and a cleaning fluid flushing valve 590. One end of the cleaning fluid flushing line 580 is connected to the cleaning fluid line 180, and another end of the cleaning fluid flushing line 580 is connected between the centrifuge 10 and the raw material inlet main valve 480. The other end of the cleaning fluid flushing line 580 is connected to the slag tank 470. On the one hand, the slag tank 470 can be flushed with cleaning fluid by opening the cleaning fluid flushing valve 590 when the centrifuge 10 is operating. On the other hand, the slag tank 470 can also be flushed with cleaning fluid by opening the cleaning fluid flushing valve 590 when the centrifuge CIP cleaning system is running.

[0041] In some embodiments, the centrifuge CIP cleaning system also includes a concentrate delivery valve 600, which is disposed on the concentrate line 260 and between the second cleaning fluid return main line 450 and the concentrate tank 640.

[0042] In some embodiments, the centrifuge CIP cleaning system also includes a concentrate branch line 610 and a concentrate discharge valve 620. One end of the concentrate branch line 610 is connected to the centrifuge 10, and the other end of the concentrate branch line 610 is connected to the concentrate line 260. Furthermore, the other end of the concentrate branch line 610 is connected between the second cleaning fluid return main line 450 and the concentrate discharge valve 600.

[0043] In some embodiments, the centrifuge CIP cleaning system further includes a clean liquid return line 630, one end of which is connected to a concentrate branch line 610, and one end of which is connected between the centrifuge 10 and the concentrate discharge valve 620. The other end of the clean liquid return line 630 is connected to a clean liquid line 180, and the other end of which is connected between a clean liquid delivery valve 550 and a clean liquid tank 190. When the clear liquid flushing valve 590 is opened and the slag tank 470 is flushed with clear liquid, the concentrated liquid outlet of the centrifuge 10, the second cleaning liquid return main valve 460 and the concentrated liquid delivery valve 600 are closed, and the concentrated liquid discharge valve 620 is opened, so that the clear liquid in the slag tank 470 flows back to the clear liquid tank 190 through the concentrated liquid pipeline 260, the concentrated liquid branch pipeline 610, the clear liquid return pipeline 630 and the clear liquid pipeline 180 in sequence.

[0044] Furthermore, this application also proposes a method for operating a centrifuge CIP cleaning system, which is applied to the aforementioned centrifuge CIP cleaning system. The method includes: Turn on the acid delivery pump 50, acid inlet valve 60 and acid pressure stabilizing valve 70 so that the acid in the acid tank 30 enters the centrifuge 10 stably through the acid delivery pipeline 40 and the raw material pipeline 20 to clean the centrifuge 10. Turn on the alkali delivery pump 100, alkali inlet valve 110 and alkali pressure stabilizing valve 120 so that the alkali in the alkali tank 80 enters the centrifuge 10 stably through the alkali delivery pipeline 90 and the raw material liquid pipeline 20 to clean the centrifuge 10. Turn on the hot water delivery pump 150, the hot water inlet valve 160, and the hot water pressure stabilizing valve 170 so that the hot water in the hot water tank 130 enters the centrifuge 10 stably through the hot water delivery pipeline 90 and the raw material liquid pipeline 20 to clean the centrifuge 10.

[0045] The acid pressure regulating valve 70, the alkali pressure regulating valve 120, and the hot water pressure regulating valve 170 can ensure the stable operation of the centrifuge CIP cleaning system and prevent vibration during operation.

[0046] In some implementations, to ensure the cleaning effect, the specific cleaning method adopted is the following steps: S1: The centrifuge 10 is cleaned with acid, and then the acid is discharged into the waste acid tank 330; S2: Use hot water to clean the centrifuge 10, and then drain the hot water into the hot water tank 130; S3: Clean the centrifuge 10 with alkaline solution, and then drain the alkaline solution into the alkaline solution tank 80; S4: Use hot water to clean the centrifuge 10, and then drain the hot water into the hot water tank 130; S5: Clean the centrifuge 10 with acid solution, and then discharge the hot acid into the acid tank 30; S6: Clean the centrifuge 10 with alkaline solution, and then drain the hot water into the hot water tank 130; In step S1, centrifuge 10 is first cleaned with acid. At this point, the centrifuge 10 and related pipelines contain residual raw material liquid. After cleaning with acid, the acid solution is mixed with the raw material liquid and cannot be recycled; therefore, the acid solution must be discharged. If the centrifuge CIP cleaning system is equipped with a waste acid tank 330, the acid solution can be discharged into the waste acid tank 330. Then, in step S2, the residue in centrifuge 10 is cleaned with hot water. The hot water used in this step can be recycled to a hot water tank 130, and the alkali solution, alkali solution, and hot water from subsequent steps can also be recycled. Next, in step S3, centrifuge 10 is cleaned with alkali solution. Then, in step S4, the residue in centrifuge 10 is cleaned again with hot water. Then, in step S5, centrifuge 10 is cleaned with acid solution. Finally, in step S6, the residue in centrifuge 10 is cleaned once more with hot water. This completes the cleaning of centrifuge 10 and related pipelines, enabling centrifuge 10 to be put back into use.

[0047] Figure 2 This is a timing diagram of the centrifuge CIP cleaning system operation method in the embodiments of this application, combined with... Figure 2 The cleaning time for centrifuge 10 is as follows: S1: approximately 10 minutes with acid solution; S2: approximately 10 minutes with hot water solution; S3: approximately 60 minutes with alkaline solution; S4: approximately 10 minutes with hot water solution; S5: approximately 60 minutes with acid solution; S6: approximately 10 minutes with alkaline solution. This completes one cleaning cycle of the centrifuge CIP cleaning system. For details on how to control the valves in the centrifuge CIP cleaning system to achieve the above steps, please refer to [link to relevant documentation]. Figure 2 The timing diagrams in the diagram will not be detailed here.

[0048] It should be noted that the switching action time of each valve in the centrifuge CIP cleaning system (except for regulating valves such as the raw material flow regulating valve 520 and the clear liquid pressure regulating valve 530) is 5 seconds.

[0049] To ensure the cleaning effect of the centrifuge CIP cleaning system, the raw material liquid flow regulating valve 520 is set to open at approximately 60% during the operation of the centrifuge CIP cleaning system. This maintains the flow rate of the cleaning liquid entering the centrifuge 10 at approximately 60% of the flow rate of the raw material liquid entering the centrifuge 10, thereby improving the cleaning effect of the centrifuge CIP cleaning system. The cleaning liquid pressure regulating valve 530 automatically controls the pressure value to remain within a reasonable range.

[0050] To ensure the stability of the centrifuge CIP cleaning system and avoid impacting the centrifuge 10, the acid delivery pump 50, acid pressure regulating valve 70, alkali delivery pump 100, alkali pressure regulating valve 120, hot water delivery pump 150, and hot water pressure regulating valve 170 are all opened before other valves. Furthermore, the acid pressure regulating valve 70, alkali pressure regulating valve 120, and hot water pressure regulating valve 170 are all automatically controlled to appropriate pressure values. For example, in step S1, the hot water delivery pump 150 and hot water pressure regulating valve 170 are opened first, followed by the hot water inlet valve 160 and the corresponding valves in the subsequent pipelines.

[0051] The cleaning liquid flushing valve 590 uses a pulse flushing method, which causes the cleaning liquid flushing valve 590 to open every 5 minutes, with each opening time lasting 6 seconds, in order to clean the slag tank 470.

[0052] In this application, unless otherwise expressly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature being directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0053] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", and "counterclockwise" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0054] It should be noted that all directional indications in the embodiments of this application are only used to explain the relative positional relationship and movement of each component in a specific posture. If the specific posture changes, the directional indications will also change accordingly.

[0055] In this application, unless otherwise expressly specified and limited, the terms "connection," "fixed," etc., should be interpreted broadly. For example, "fixed" can mean a fixed connection, a detachable connection, or an integral part; it can mean a mechanical connection or an electrical connection; it can mean a direct connection or an indirect connection through an intermediate medium; it can mean the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0056] Furthermore, the use of terms such as "first" and "second" in this application is for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, features defined with "first" or "second" may explicitly or implicitly include one or more of the stated features. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0057] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. In addition, those skilled in the art can combine and integrate the different embodiments or examples described in this specification.

[0058] Furthermore, the technical solutions of the various embodiments can be combined with each other, but only if they are based on the ability of those skilled in the art to implement them. When the combination of technical solutions is contradictory or cannot be implemented, it should be considered that such combination of technical solutions does not exist and is not within the scope of protection claimed in this application.

[0059] Although embodiments of this application have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of this application, the scope of which is defined by the claims and their equivalents.

Claims

1. A centrifuge CIP cleaning system, characterized in that, include: Centrifuge; The raw material liquid pipeline is connected to the raw material liquid inlet of the centrifuge; Acid tank; An acid delivery pipeline is connected between the acid tank and the raw material pipeline; An acid delivery pump is installed on the acid delivery pipeline; An acid inlet valve is installed on the acid outlet pipeline and between the acid outlet pump and the raw material pipeline. An acid pressure regulating valve is connected between the acid tank and the acid delivery pipeline, and is located between the acid delivery pump and the acid inlet valve. Alkali solution tank; An alkali solution delivery pipeline is connected between the alkali solution tank and the raw material solution pipeline; An alkaline solution delivery pump is installed on the alkaline solution delivery pipeline; An alkali inlet valve is installed on the alkali outlet pipeline and is located between the alkali outlet pump and the raw material pipeline. An alkaline solution pressure stabilizing valve is connected between the alkaline solution tank and the alkaline solution delivery pipeline, and is located between the alkaline solution delivery pump and the alkaline solution inlet valve; Hot water tank; A hot water delivery pipeline is connected between the hot water tank and the raw material liquid pipeline; A hot water delivery pump is installed on the hot water delivery pipeline; A hot water inlet valve is installed on the hot water outlet pipeline and between the hot water outlet pump and the raw material liquid pipeline; A hot water pressure regulating valve is connected between the hot water tank and the hot water delivery pipeline, and is installed between the hot water delivery pump and the hot water delivery valve; The centrifuge CIP cleaning system also includes: Clear liquid pipeline; A clear liquid tank, wherein the clear liquid pipeline is connected between the centrifuge and the clear liquid tank; The first acid reflux line is connected between the clear liquid line and the acid tank; The first acid return valve is installed on the first acid return pipeline; The first alkali return pipeline is connected between the clear liquid pipeline and the alkali tank; The first alkali return valve is installed on the first alkali return pipeline; The first hot water return pipeline is connected between the clear liquid pipeline and the hot water tank; The first hot water return valve is installed on the first hot water return pipeline; The centrifuge CIP cleaning system also includes: Concentrate pipeline; A concentrate tank, wherein the concentrate pipeline is connected between the centrifuge and the concentrate tank; A second acid reflux line is connected between the concentrated solution line and the acid tank; The second acid return valve is installed on the second acid return pipeline; The second alkali return line is connected between the concentrated liquid line and the alkali tank. The second alkali return valve is installed on the second alkali return pipeline; The second hot water return pipeline is connected between the concentrated liquid pipeline and the hot water tank; The second hot water return valve is installed on the second hot water return pipeline; Waste acid tank; The first waste acid pipeline is connected between the first acid return pipeline and the waste acid tank; The first waste acid return valve is installed on the first waste acid pipeline; The second waste acid pipeline is connected between the second acid return pipeline and the waste acid tank; The second waste acid return valve is installed on the second waste acid pipeline; The centrifuge CIP cleaning system also includes: The third acid return valve is installed on the first acid return pipeline and between the first waste acid pipeline and the acid tank. The fourth acid return valve is installed on the second acid return pipeline and between the second waste acid pipeline and the acid tank. The centrifuge CIP cleaning system also includes: The cleaning solution is fed into the main pipeline, one end of which is connected to the raw material pipeline, and the acid outlet pipeline, the alkali outlet pipeline, and the hot water outlet pipeline are all connected to the other end of the cleaning solution feed into the main pipeline. The cleaning fluid inlet valve is located at one end of the cleaning fluid inlet main pipeline; The centrifuge CIP cleaning system also includes a safety water line connected to the raw material liquid line and positioned between the cleaning liquid inlet main line and the centrifuge.

2. The centrifuge CIP cleaning system according to claim 1, characterized in that, The centrifuge CIP cleaning system also includes: The first cleaning fluid return main pipeline has one end connected to the clean fluid pipeline, and the first acid return pipeline, the first alkali return pipeline, and the first hot water return pipeline are all connected to the other end of the first cleaning fluid return main pipeline. The first cleaning fluid return main valve is installed at one end of the first cleaning fluid return main pipeline.

3. The centrifuge CIP cleaning system according to claim 1, characterized in that, The centrifuge CIP cleaning system also includes: The second cleaning fluid return main pipeline has one end connected to the concentrated liquid pipeline, and the second acid return pipeline, the second alkali return pipeline, and the second hot water return pipeline are all connected to the other end of the second cleaning fluid return main pipeline. The second cleaning fluid return main valve is installed at one end of the second cleaning fluid return main pipeline.

4. A method for operating a centrifuge CIP cleaning system, characterized in that, The centrifuge CIP cleaning system according to any one of claims 1-3, wherein the centrifuge CIP cleaning system operation method includes: Turn on the acid delivery pump, the acid inlet valve, and the acid pressure stabilizing valve to allow the acid in the acid tank to stably enter the centrifuge through the acid delivery pipeline and the raw material pipeline, so as to clean the centrifuge. Turn on the alkali solution delivery pump, the alkali solution inlet valve, and the alkali solution pressure stabilizing valve so that the alkali solution in the alkali solution tank enters the centrifuge stably through the alkali solution delivery pipeline and the raw material liquid pipeline to clean the centrifuge. Turn on the hot water delivery pump, the hot water inlet valve, and the hot water pressure stabilizing valve to allow the hot water in the hot water tank to stably enter the centrifuge through the hot water delivery pipeline and the raw material liquid pipeline, so as to clean the centrifuge.

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