Shafting orthogonality measuring device and measuring system

Abstract

The application discloses a shaft system orthogonality measuring device and a measuring system, and relates to the field of photoelectric precision measurement, aiming to solve the problems of high machining difficulty of positioning reference in the contact type measuring method and the problem of insufficient comprehensive measuring precision of the non-contact type measuring method. The shaft system orthogonality measuring device comprises a collimating light path assembly, a focusing micrometry light path assembly, an auxiliary imaging assembly and a reflecting part detachably connected with a two-dimensional rotating shaft system device. The auxiliary imaging assembly is located on the side, away from the reflecting part, of the two-dimensional rotating shaft system device, and the optical axis of the auxiliary imaging assembly is coaxial with the optical axis of the reflecting part. The collimating light path assembly and the focusing micrometry light path assembly are located on the side, away from the reflecting part, of the auxiliary imaging assembly, and the optical axis of the focusing micrometry light path assembly and the optical axis of the collimating light path assembly are both perpendicular to the optical axis of the auxiliary imaging assembly. The shaft system orthogonality measuring system comprises the shaft system orthogonality measuring device.

Description

Technical Field

[0001] This invention relates to the field of optoelectronic precision measurement technology, and in particular to an axis orthogonality measuring device and system. Background Technology

[0002] Laser trackers are typical precision measuring instruments with orthogonal axes, and the two-dimensional precision laser tracking turntable is the core angle measurement unit of the laser tracker. The orthogonality accuracy of the two-dimensional precision rotating axis system directly affects the coordinate measurement accuracy of the instrument. Therefore, precise measurement of the orthogonality of the precision axis system is an effective method to improve the two-dimensional laser tracking turntable. At the same time, it will also reduce the difficulty of machining and assembling the orthogonal axis system, improve the instrument's production efficiency and reliability, and facilitate subsequent maintenance.

[0003] Currently, methods for measuring the orthogonality of two-dimensional rotating axis systems are mainly divided into contact measurement and non-contact measurement. Contact measurement requires a positioning datum with extremely high machining accuracy, which increases the difficulty of part machining, and is only applicable to the assembly stage, making it difficult to perform re-inspection after assembly. Non-contact measurement, on the other hand, requires the use of multiple measuring instruments, involves complex measurement steps, and is difficult to guarantee the runout accuracy of the optical axis, resulting in problems such as low target aiming accuracy and insufficient overall measurement accuracy. Summary of the Invention

[0004] The purpose of this invention is to provide a shaft orthogonality measuring device and system to solve the problems of high machining difficulty of positioning reference and inability to re-inspect after assembly in the existing contact measurement method, and insufficient overall measurement accuracy of the non-contact measurement method.

[0005] To achieve the above objectives, the present invention provides the following technical solution:

[0006] In a first aspect, the present invention provides an axis orthogonality measuring device for measuring the orthogonality of a two-dimensional rotating axis system. It includes: a self-collimating optical path assembly, a focusing micrometer optical path assembly, an auxiliary imaging assembly, and a reflective part detachably connected to the two-dimensional rotating axis system.

[0007] The auxiliary imaging component is located on the side of the reflector away from the two-dimensional rotation axis system, and its optical axis is coaxial with that of the reflector. The autocollimating optical path component and the focusing micrometer optical path component are located on the side of the auxiliary imaging component away from the reflector, and their optical axes are perpendicular to each other. The auxiliary imaging component and the autocollimating optical path component together form a autocollimating optical path, and the auxiliary imaging component and the focusing micrometer optical path component together form a focusing micrometer optical path.

[0008] The self-collimating optical path component is used to emit a first beam to the auxiliary imaging component. The auxiliary imaging component is used to collimate the first beam to obtain a second beam and emit the second beam to the reflecting part. The reflecting part is used to reflect the second beam to the auxiliary imaging component. The auxiliary imaging component is also used to converge the second beam to obtain a third beam and emit the third beam to the self-collimating optical path component and the focusing micrometer optical path component. The third beam is imaged on the self-collimating optical path component.

[0009] The reflector is also used to emit a fourth beam to the auxiliary imaging component. The auxiliary imaging component is used to converge the fourth beam to obtain a fifth beam, and then emits the fifth beam to the focusing micrometer optical path component. The focusing micrometer optical path component is used to perform refraction and convergence processing on the fifth beam in sequence to form an image.

[0010] Compared with existing technologies, in the axis orthogonality measurement device provided by this invention, the auxiliary imaging component is located on the side of the reflector away from the two-dimensional rotating axis system, and the optical axis of the auxiliary imaging component is coaxial with the optical axis of the reflector. The autocollimating optical path component and the focusing micrometer optical path component are located on the side of the auxiliary imaging component away from the reflector. The optical axes of both the focusing micrometer optical path component and the autocollimating optical path component are perpendicular to the optical axis of the auxiliary imaging component, and the auxiliary imaging component is simultaneously located within both the autocollimating optical path and the focusing micrometer optical path. Based on this, the propagation path of the light beam emitted by the autocollimating optical path component can be made coaxial with the propagation paths of the light beam received by the autocollimating optical path component and the focusing micrometer optical path component. This allows for the establishment of a unified coordinate system based on the coaxial optical paths of light transmission and reception, utilizing the characteristic of light propagating in a straight line, thereby improving measurement accuracy.

[0011] When measuring a two-dimensional rotating axis system using an axis orthogonality measuring device, a first beam is emitted from the autocollimating optical path component to the auxiliary imaging component. After divergence by the auxiliary imaging component, the first beam becomes a second beam. This second beam is emitted by the auxiliary imaging component to the reflecting unit, which reflects it back to the auxiliary imaging component. After convergence by the auxiliary imaging component, the second beam becomes a third beam, which is then emitted by the auxiliary imaging component to the autocollimating optical path component, ultimately forming an image on it. A fourth beam is emitted from the reflecting unit to the auxiliary imaging component. After convergence by the auxiliary imaging component, the fourth beam becomes a fifth beam. The focusing micrometer optical path component receives this fifth beam and sequentially refracts and converges it, ultimately forming an image on it. Finally, based on the image information from the autocollimating optical path component, the two-dimensional angular error of the two-dimensional rotating measuring device can be obtained. Based on the image information from the focusing micrometer optical path component, the two-dimensional linear displacement error can be obtained, thus achieving the orthogonality measurement of the two-dimensional rotating axis system. Based on this, the axis orthogonality measuring device provided by the present invention can simultaneously measure multiple parameters under the same instrument and coordinate system, thereby avoiding the need to change instruments and coordinate systems when measuring multiple single parameters, reducing the introduction of uncontrollable process errors, and thus improving measurement accuracy.

[0012] Furthermore, the shaft orthogonality measuring device provided by this invention utilizes the characteristic of light propagating in a straight line. By adjusting the self-collimating optical path assembly, the focusing micrometer optical path assembly, the auxiliary imaging assembly, and the reflector, a standard orthogonal coordinate system can be established as a positioning reference for measuring the deviation angle and displacement of a two-dimensional rotating shaft system, thus eliminating the need for machining a positioning reference with extremely high precision. Moreover, it allows for direct re-inspection of already assembled two-dimensional rotating shaft systems without the need for additional mechanical inspection bars or shaft extension rods for indirect measurement, thus avoiding the introduction of new errors and improving testing efficiency.

[0013] Therefore, the shaft orthogonality measuring device provided by the present invention can solve the problems of high processing difficulty of positioning reference and inability to re-inspect after assembly in the contact measurement method in the prior art, and insufficient overall measurement accuracy of the non-contact measurement method.

[0014] In a second aspect, the present invention also provides a shaft orthogonality measurement system for measuring the orthogonality of a two-dimensional rotating shaft system, comprising a control device and at least one shaft orthogonality measurement device as described in the first aspect.

[0015] The composite target of the axis orthogonality measuring device is fixedly connected to the rotating shaft of the two-dimensional rotating axis system device.

[0016] The control device is electrically connected to at least one shaft orthogonality measuring device and a two-dimensional rotating shaft device.

[0017] During the measurement process, the control device is used to control the rotation of the rotation axis of the two-dimensional rotating axis system device. When the normal of the composite target and the axis of rotation of the rotating axis meet the preset conditions with the optical axis of the axis orthogonality measuring device, the deviation angle and deviation displacement of the axis of rotation of the rotating axis relative to the optical axis of the axis orthogonality measuring device are obtained.

[0018] The control device is also used to determine the orthogonality of the two-dimensional rotating shaft system based on the deviation angle and the deviation displacement.

[0019] Compared with the prior art, the beneficial effects of the shaft orthogonality measurement system provided by the present invention are the same as those of the shaft orthogonality measurement device described in the above technical solution, and will not be repeated here. Attached Figure Description

[0020] The accompanying drawings, which are included to provide a further understanding of the invention and form part of this invention, illustrate exemplary embodiments of the invention and are used to explain the invention, but do not constitute an undue limitation of the invention. In the drawings:

[0021] Figure 1 This is a schematic diagram of the shaft orthogonality measuring device in an embodiment of the present invention;

[0022] Figure 2 This is a schematic diagram of the reflective part in an embodiment of the present invention;

[0023] Figure 3 This is a schematic diagram of the single-station shaft orthogonality measurement system in an embodiment of the present invention;

[0024] Figure 4 This is a schematic diagram of the perpendicularity calibration of the dual-station shaft orthogonality measurement system in an embodiment of the present invention;

[0025] Figure 5 This is a schematic diagram of the intersection degree calibration of the dual-station shaft orthogonality measurement system in an embodiment of the present invention;

[0026] Figure 6 This is a schematic diagram of the dual-station shaft orthogonality measurement system in an embodiment of the present invention;

[0027] Figure 7 This is a schematic diagram of the control device in an embodiment of the present invention.

[0028] Figure label:

[0029] 1-Axis orthogonality measuring device; 11-Autocollimating optical path assembly;

[0030] 12-Focusing micrometer optical path assembly; 13-Auxiliary imaging assembly;

[0031] 14 - Reflector, 111 - First optical path structure

[0032] 1111 - First light source, 1112 - First reticle,

[0033] 1113 - Collimating lens, 112 - First beam splitter,

[0034] 113 - First imaging structure, 1131 - Compensation mirror,

[0035] 1132 - First charge-coupled detector, 121 - Second beam splitter,

[0036] 122 - Second imaging structure, 1221 - Converging lens,

[0037] 1222 - Third beam splitter, 1223 - Second charge-coupled detector,

[0038] 123 - Image plane movement adjustment structure; 124 - Second light source;

[0039] 125 - Second reticle, 141 - Third reticle

[0040] 142 - Frosted glass, 143 - Third light source

[0041] 144 - Base; 2 - Two-dimensional rotating shaft system.

[0042] 21 - Horizontal axis, 22 - Vertical axis

[0043] 15 - First composite target, 16 - Second composite target

[0044] 31- First axis orthogonality measuring device; 32- Second axis orthogonality measuring device.

[0045] 4-High-precision cubic mirror, 5-Right-angle reflecting prism

[0046] 17 - Third composite target, 18 - Fourth composite target. Detailed Implementation

[0047] To facilitate a clear description of the technical solutions in the embodiments of the present invention, the terms "first" and "second" are used to distinguish identical or similar items with essentially the same function and effect. For example, the first threshold and the second threshold are merely used to distinguish different thresholds and do not limit their order. Those skilled in the art will understand that the terms "first" and "second" do not limit the quantity or execution order, and that the terms "first" and "second" are not necessarily different.

[0048] It should be noted that in this invention, the terms "exemplary" or "for example" are used to indicate examples, illustrations, or descriptions. Any embodiment or design described as "exemplary" or "for example" in this invention should not be construed as being more preferred or advantageous than other embodiments or designs. Specifically, the use of terms such as "exemplary" or "for example" is intended to present the relevant concepts in a concrete manner.

[0049] In this invention, "at least one" refers to one or more, and "more than one" refers to two or more. "And / or" describes the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A alone, A and B simultaneously, or B alone, where A and B can be singular or plural. The character " / " generally indicates that the preceding and following related objects are in an "or" relationship. "At least one of the following" or similar expressions refer to any combination of these items, including any combination of single or plural items. For example, at least one of a, b, or c can represent: a, b, c, a combination of a and b, a combination of a and c, a combination of b and c, or a, b, and c, where a, b, and c can be single or multiple.

[0050] Laser trackers are typical precision measuring instruments with orthogonal axes, and the two-dimensional precision laser tracking turntable is the core angle measurement unit of the laser tracker. The orthogonality accuracy of the two-dimensional precision rotating axis system directly affects the coordinate measurement accuracy of the instrument. Therefore, precise measurement of the orthogonality of the precision axis system is an effective method to improve the two-dimensional laser tracking turntable. At the same time, it will also reduce the difficulty of machining and assembling the orthogonal axis system, improve the instrument's production efficiency and reliability, and facilitate subsequent maintenance.

[0051] Currently, the methods for measuring the orthogonality of two-dimensional rotating axis systems are mainly divided into two categories: contact measurement and non-contact measurement.

[0052] For example, the literature "The Influence of Orthogonality on the Measurement Accuracy of High-Precision Two-Dimensional Turntables" points out the use of a contact coordinate measuring machine for shaft orthogonality measurement. The monograph "Detection and Testing Technology of Inertial Navigation Testing Equipment" proposes the use of a dial indicator method for orthogonality measurement, that is, using a dial indicator in conjunction with a reference surface for measurement. The patent "A Method and Device for Measuring the Orthogonality of Rotary Shafts" (201510462936.0) proposes the use of a dial indicator in conjunction with a standard ball for orthogonality measurement. All three of these methods are contact measurement methods.

[0053] For example, the patent "A Laser Measurement Method for the Orthogonality of the Axis System of a Land Defense Monitoring Turntable" (201811508567.4) proposes a method for measuring the orthogonality of the axis system based on a self-collimating optical tube and a laser theodolite. The patent "Precision Axis Orthogonality Detection System and Method" proposes a method for measuring the orthogonality of the axis system based on a television internal focusing autocollimator and a four-dimensional adjustable reticle. Both of these methods are non-contact measurement methods.

[0054] However, existing methods for measuring shaft orthogonality all have certain drawbacks. For contact measurement methods, although coordinate measuring machines (CMMs) and dial indicators offer high accuracy, they require highly precise positioning references, increasing the difficulty of part machining. Furthermore, this method is only applicable to the assembly stage and cannot be directly re-inspected after machining and assembly. It requires indirect measurement using auxiliary tooling such as mechanical gauges or shaft extension rods. The machining and assembly errors of these auxiliary toolings introduce new errors, affecting measurement accuracy. The complex and precise assembly requirements also limit measurement efficiency, making it unsuitable for mass production needs.

[0055] For non-contact measurement methods, the orthogonality measurement method based on autocollimators and laser theodolites has low accuracy and involves complex steps due to the use of multiple instruments. While the axis orthogonality measurement method based on a television internal-focus autocollimator and a four-dimensional adjustable reticle is feasible, its internal focusing method makes it difficult to guarantee the accuracy of optical axis runout, and its target aiming accuracy is also low. Therefore, the overall measurement accuracy of this method is not high.

[0056] The purpose of this invention is to provide a shaft orthogonality measuring device and system to solve the problems of high processing difficulty and inability to re-inspect after assembly in the prior art, and insufficient overall measurement accuracy of the non-contact measuring method.

[0057] Firstly, such as Figure 1 As shown, this embodiment of the invention provides an axis orthogonality measuring device 1 for measuring the orthogonality of a two-dimensional rotating axis system device 2. It includes: a self-collimating optical path assembly 11, a focusing micrometer optical path assembly 12, an auxiliary imaging assembly 13, and a reflective part 14 detachably connected to the two-dimensional rotating axis system device 2.

[0058] The auxiliary imaging component 13 is located on the side of the reflector 14 away from the two-dimensional rotation axis device 2, and the optical axis of the auxiliary imaging component 13 is coaxial with the optical axis of the reflector 14. The autocollimation optical path component 11 and the focusing micrometer optical path component 12 are located on the side of the auxiliary imaging component 13 away from the reflector 14, and the optical axes of the focusing micrometer optical path component 12 and the autocollimation optical path component 11 are both perpendicular to the optical axis of the auxiliary imaging component 13. The auxiliary imaging component 13 and the autocollimation optical path component 11 form an autocollimation optical path, and the auxiliary imaging component 13 and the focusing micrometer optical path component 12 form a focusing micrometer optical path.

[0059] The self-collimating optical path assembly 11 is used to emit a first beam to the auxiliary imaging assembly 13. The auxiliary imaging assembly 13 is used to collimate the first beam to obtain a second beam and emit the second beam to the reflecting part 14. The reflecting part 14 is used to reflect the second beam to the auxiliary imaging assembly 13. The auxiliary imaging assembly 13 is also used to converge the second beam to obtain a third beam and emit the third beam to the self-collimating optical path assembly 11 and the focusing micrometer optical path assembly 12. The third beam is imaged on the self-collimating optical path assembly 11.

[0060] The reflector 14 is also used to emit a fourth beam to the auxiliary imaging assembly 13. The auxiliary imaging assembly 13 is used to converge the fourth beam to obtain a fifth beam, and then emit the fifth beam to the focusing micrometer optical path assembly 12. The focusing micrometer optical path assembly 12 is used to perform refraction and convergence processing on the fifth beam in sequence, and then to perform imaging.

[0061] In specific implementation: Before using the axis orthogonality measuring device 1 provided in this embodiment of the invention to measure the two-dimensional rotating axis device 2, it is necessary to fix the reflector 14 to the rotation axis of the two-dimensional rotating axis device 2. In order to improve the accuracy of the measurement and avoid introducing more errors during the measurement process, it is necessary to adjust the axis orthogonality measuring device 1 according to the optical path of the beam emitted from the autocollimating optical path component 11 and the image plane position of the final image on the autocollimating optical path component 11 and the focusing micrometer optical path component 12, so that the optical axis of the auxiliary imaging component 13 is coaxial with the optical axis of the reflector 14, and the optical axes of the focusing micrometer optical path component 12 and the autocollimating optical path component 11 are perpendicular to the optical axis of the auxiliary imaging component 13. This ensures that the propagation path of the beam emitted from the autocollimating optical path component 11 is coaxial with the propagation path of the beam received by the autocollimating optical path component 11 and the propagation path of the beam received by the focusing micrometer optical path component 12, thereby establishing a unified coordinate system using the coaxial optical path of transmission and reception, and achieving high-precision measurement.

[0062] The first beam is emitted from the self-collimating optical path assembly 11 to the auxiliary imaging assembly 13. After being diverged by the auxiliary imaging assembly 13, the first beam becomes the second beam. The second beam is emitted by the auxiliary imaging assembly 13 to the reflecting part 14, and the reflecting part 14 reflects the second beam back to the auxiliary imaging assembly 13. After being converged by the auxiliary imaging assembly 13, the second beam becomes the third beam. The third beam is emitted by the auxiliary imaging assembly 13 to the self-collimating optical path assembly 11, and finally imaged on the self-collimating optical path assembly 11.

[0063] The reflector 14 emits a fourth beam to the auxiliary imaging assembly 13. The auxiliary imaging assembly 13 converges the fourth beam to obtain a fifth beam, and emits the fifth beam to the focusing micrometer optical path assembly 12. The fifth beam is refracted and converged by the focusing micrometer optical path assembly 12 in sequence, and then imaged on the focusing micrometer optical path assembly 12.

[0064] Finally, based on the image information imaged on the self-collimating optical path component 11, the two-dimensional angular error of the two-dimensional rotation measuring device can be obtained, and based on the image information imaged on the focusing micrometer optical path component 12, the two-dimensional linear displacement error can be obtained, thereby realizing the orthogonality measurement of the two-dimensional rotating shaft system device 2.

[0065] As can be seen from the structure and specific implementation process of the above-described axis orthogonality measuring device 1, the auxiliary imaging component 13 is located on the side of the reflector 14 away from the two-dimensional rotating axis device 2, and the optical axis of the auxiliary imaging component 13 is coaxial with the optical axis of the reflector 14. The autocollimation optical path component 11 and the focusing micrometer optical path component 12 are located on the side of the auxiliary imaging component 13 away from the reflector 14. The optical axes of the focusing micrometer optical path component 12 and the autocollimation optical path component 11 are both perpendicular to the optical axis of the auxiliary imaging component 13, and the auxiliary imaging component 13 is simultaneously located within both the autocollimation optical path and the focusing micrometer optical path. Based on this, the propagation path of the light beam emitted by the autocollimation optical path component 11 can be made coaxial with the propagation path of the light beam received by the autocollimation optical path component 11 and the propagation path of the light beam received by the focusing micrometer optical path component 12. By utilizing the characteristic that light propagates in a straight line, a unified coordinate system can be established based on the coaxial optical paths of transmission and reception to improve measurement accuracy.

[0066] When measuring the two-dimensional rotating axis system device 2 using the axis orthogonality measuring device 1, a first beam is emitted from the autocollimating optical path component 11 to the auxiliary imaging component 13. After divergence by the auxiliary imaging component 13, the first beam becomes a second beam. The second beam is emitted by the auxiliary imaging component 13 to the reflecting part 14, which reflects it back to the auxiliary imaging component 13. After convergence by the auxiliary imaging component 13, the second beam becomes a third beam. The third beam is emitted by the auxiliary imaging component 13 to the autocollimating optical path component 11, and finally imaged on the autocollimating optical path component 11. A fourth beam is emitted from the reflecting part 14 to the auxiliary imaging component 13. After convergence by the auxiliary imaging component 13, the fourth beam becomes a fifth beam. After receiving the fifth beam, the focusing micrometer optical path component 12 refracts and converges it sequentially, and finally imaged on the focusing micrometer optical path component 12. Finally, based on the image information imaged on the self-collimating optical path component 11, the two-dimensional angular error of the two-dimensional rotation measuring device can be obtained, and based on the image information imaged on the focusing micrometer optical path component 12, the two-dimensional linear displacement error can be obtained, thereby realizing the orthogonality measurement of the two-dimensional rotating axis system device 2. Based on this, the axis orthogonality measuring device 1 provided in this embodiment of the invention can simultaneously measure multiple parameters under the same instrument and coordinate system, thus avoiding the need to change instruments and coordinate systems when measuring multiple single parameters, reducing the introduction of uncontrollable process errors, and thereby improving measurement accuracy.

[0067] Furthermore, the shaft orthogonality measuring device 1 provided in this embodiment of the invention utilizes the characteristic of light propagating in a straight line. By adjusting the self-collimating optical path component 11, the focusing micrometer optical path component 12, the auxiliary imaging component 13, and the reflector 14, a standard orthogonal coordinate system can be established as a positioning reference for measuring the deviation angle and displacement of the two-dimensional rotating shaft device 2, thus eliminating the need for machining a positioning reference with extremely high precision. Moreover, it can directly re-inspect the already assembled two-dimensional rotating shaft device 2 without the need for additional mechanical inspection bars or shaft extension rods for indirect measurement, which not only avoids introducing new errors but also improves testing efficiency.

[0068] Therefore, the shaft orthogonality measuring device 1 provided in this embodiment of the invention can solve the problems of high processing difficulty of positioning reference and inability to re-inspect after assembly in the contact measurement method in the prior art, and insufficient comprehensive measurement accuracy of the non-contact measurement method.

[0069] In the above embodiments, the auxiliary imaging component 13 can be a telescope objective, specifically a refractive telescope objective. It is understood that the refractive telescope objective can be a doublet objective, a two-part objective, a three-part objective, or a telephoto objective. For example, when the refractive telescope objective is a doublet objective, it consists of a positive lens and a negative lens cemented together; when the refractive telescope objective is a two-part objective, it consists of a positive lens and a negative lens, with an air gap between the two lenses. This embodiment of the invention does not specifically limit this aspect.

[0070] Please see Figure 1 In one possible implementation, the self-collimating optical path assembly 11 includes a first optical path structure 111, a first beam splitter 112, and a first imaging structure 113.

[0071] The first beam splitter 112 is located on the light-emitting side of the first optical path structure 111, and the optical axis of the first optical path structure 111 is coaxial with the center line of the first direction of the first beam splitter 112. The first imaging structure 113 is located on the side of the first beam splitter 112 away from the focusing micrometer optical path assembly 12, and the optical axis of the first imaging structure 113 is coaxial with the center line of the second direction of the first beam splitter 112.

[0072] The optical axis of the first optical path structure 111 is perpendicular to the optical axis of the first imaging structure 113, and the center of the first beam splitter 112 is located at the intersection of the optical axis of the first optical path structure 111 and the optical axis of the first imaging structure 113.

[0073] The first optical path structure 111 is used to emit a first beam to the first beam splitter 112. The first beam splitter 112 is used to refract the first beam and emit it to the auxiliary imaging assembly 13. The auxiliary imaging assembly 13 is used to collimate the first beam to obtain a second beam and emit the second beam to the reflector 14. The reflector 14 is used to reflect the second beam and then emit it into the auxiliary imaging assembly 13. The auxiliary imaging assembly 13 is also used to converge the second beam to obtain a third beam and emit the third beam to the first beam splitter 112. The first beam splitter 112 is used to converge the third beam and emit it to the first imaging structure 113 for imaging.

[0074] Specifically, the first beam splitter 112 can be a first beam splitter prism. The first beam splitter prism is located on the light-emitting side of the first optical path structure 111, and the centerline of the first beam splitter prism in its first direction is coaxial with the optical axis of the first optical path structure 111. The first imaging structure 113 is located on the side of the first beam splitter prism away from the focusing micrometer optical path assembly 12, and the optical axis of the first imaging structure 113 is coaxial with the centerline of the second direction of the first beam splitter prism. In the illustration, the first direction of the first beam splitter prism refers to the vertical direction, and the second direction of the first beam splitter prism refers to the horizontal direction perpendicular to the vertical direction.

[0075] In practice, the first optical path structure 111 emits a first beam of light to the first beam splitter. The first beam splitter refracts the first beam, changing its propagation direction, and then emits the first beam to the telescope objective. The telescope objective receives the refracted first beam and collimates it to obtain a parallel second beam. The second beam is emitted by the telescope objective to the reflector 14. After being reflected by the reflector 14, the second beam returns along its original propagation direction and enters the telescope objective. After being converged by the telescope objective, a third beam is obtained. The third beam is emitted to the first beam splitter, which converges the third beam and emits it to the first imaging structure 113, where it is finally imaged.

[0076] like Figure 1 As shown, in some embodiments, the first optical path structure 111 includes a first light source 1111, a first reticle 1112, and a collimating lens 1113 arranged sequentially. The optical axes of the first light source 1111, the first reticle 1112, and the collimating lens 1113 are all coaxial with the centerline of the first direction of the first beam splitter 112. The first light source 1111 provides a diverging light beam to the first reticle 1112. After passing through the first reticle 1112, the diverging light beam forms a first light beam and exits to the collimating lens 1113. The collimating lens 1113 collimates the first light beam and then exits the first light beam to the first beam splitter 112.

[0077] The first imaging structure 113 includes a compensation mirror 1131 and a first charge-coupled device (CCD) detector 1132. The compensation mirror 1131 is located between the first CCD detector 1132 and the first beam splitter 112. The optical axes of both the first CCD detector 1132 and the compensation mirror 1131 are coaxial with the centerline of the second direction of the first beam splitter 112. The compensation mirror 1131 is used to compensate for the third beam and outputs the compensated third beam to the first CCD detector 1132 for imaging.

[0078] In practice, the first light source 1111 illuminates the first reticle 1112. The light passing through the crosshairs on the first reticle 1112 is the first beam. The first beam is emitted to the collimating lens 113, which collimates the first beam before emitting it to the first beam splitter. The first beam splitter refracts the first beam, changing its propagation direction, and emits it to the telescope objective. The telescope objective receives the refracted first beam and collimates it to obtain a parallel second beam. The second beam is emitted by the telescope objective to the reflecting section 14. After reflection by the reflecting section 14, the second beam returns along its original propagation direction and re-enters the telescope objective. After converging by the telescope objective, a third beam is obtained. The third beam is emitted to the first beam splitter. After the first beam splitter converges the third beam, it is emitted to the compensation mirror 1131. After being compensated by the compensation mirror 1131, the third beam is emitted to the first charge-coupled detector 1132 and finally imaged on the first charge-coupled detector 1132.

[0079] It is understood that in the above embodiments, the first light source 1111 can be an artificial light source such as an LED lamp, halogen lamp, or incandescent lamp. The first reticle 1112 is a dark-field bright-line crosshair reticle. After the first light source 1111 illuminates the first reticle 1112, the light beam transmitted through the crosshairs on the first reticle 1112 becomes the first light beam. The crosshairs on the first reticle 1112, along the propagation direction of the light beam, are ultimately projected onto the first charge-coupled device (CCD) detector 1132. That is, the image plane on the first CCD detector 1132 is the image plane of the crosshairs on the first reticle 1112. The CCD detector can convert the light image into an electronic signal. In actual measurement, the first CCD detector 1132 can convert the image plane of the image into a charge, and then output it to other electronic devices.

[0080] As can be seen from the structure and working process of the self-collimating optical path component 11 in the above embodiments, the bright light emitted by the first light source 1111 in the self-collimating optical path component 11 forms a first beam after passing through the first reticle 1112. The first beam is refracted by the first beam splitter, and the optical axis of the refracted first beam is coaxial with the optical axis of the third beam that is finally imaged on the first charge-coupled detector 1132. That is, it can be understood that the outgoing light path and the reflected light path coincide, thus forming a self-collimating optical path.

[0081] like Figure 1 As shown, in one possible implementation, the focusing micrometer optical path assembly 12 includes a second beam splitter 121, a second imaging structure 122, and an image plane movement adjustment structure 123.

[0082] The second beam splitter 121 is fixedly connected to the first beam splitter 112 in the autocollimating optical path assembly 11, and the center line of the second direction of the second beam splitter 121 is coaxial with the optical axis of the auxiliary imaging assembly 13.

[0083] The second imaging structure 122 is located on the light-emitting side of the second beam splitter 121, and the optical axis of the second imaging structure 122 is coaxial with the center line of the first direction of the second beam splitter 121.

[0084] The second beam splitter 121 is used to refract the fifth beam onto the second imaging structure 122. The second imaging structure 122 is used to form an image based on the fifth beam.

[0085] The image plane movement adjustment structure 123 is used to support the second imaging structure 122. When the image sharpness of the image on the second imaging structure 122 does not meet the target parameters, the distance between the second imaging structure 122 and the second beam splitter 121 is adjusted.

[0086] Specifically, the second beam splitter 121 can be a second beam splitter prism. The second beam splitter prism is fixedly connected to the first beam splitter prism in the self-collimating optical path assembly 11, and the centerline of the second direction of the second beam splitter prism is coaxial with the optical axis of the telescope objective. Furthermore, the optical axis of the second imaging structure 122 is coaxial with the centerline of the first direction of the second beam splitter prism. In the illustration, the first direction of the second beam splitter prism refers to the vertical direction, and the second direction of the second beam splitter prism refers to the horizontal direction perpendicular to the vertical direction.

[0087] In practice, the second beam splitter refracts the fifth beam, which has been converged by the telescope objective, thereby changing the propagation direction of the fifth beam. This allows the fifth beam to exit onto the second imaging structure 122, where it is ultimately imaged. Simultaneously, the second imaging structure 122 is located on the image plane movement adjustment structure 123. When the image sharpness on the second imaging structure 122 does not meet the target parameters, the image plane movement adjustment structure 123 can move along the optical axis of the second imaging structure 122. By changing the distance between the second imaging structure 122 and the second beam splitter, the sharpness of the image plane on the second imaging structure 122 can be altered.

[0088] In practical applications, the focusing micrometer optical path assembly 12 adopts a fixed-focus image adjustment design method, that is, when the focal length is determined, the image distance is changed by moving the image plane adjustment structure, and finally the moving distance of the object plane is calculated using the optical imaging formula.

[0089] By adopting the above technical solution, on the one hand, the measurement accuracy of the autocollimating optical path component 11 can be avoided when focusing the focusing micrometer optical path component 12, ensuring that the autocollimating optical path component 11 will not be affected. On the other hand, the focal length will not be changed during the focusing process, avoiding the influence on the measurement optical axis, reducing the error during focusing measurement, and ultimately improving the measurement accuracy.

[0090] like Figure 1 As shown, in some embodiments, the second imaging structure 122 includes a converging lens 1221, a third beam splitter 1222, and a second charge-coupled detector 1223 arranged in sequence.

[0091] The optical axes of the converging lens 1221, the third beam splitter 1222, and the second charge-coupled detector 1223 are all coaxial with the center line of the second direction of the second beam splitter 121.

[0092] The converging lens 1221 is used to converge the fifth beam refracted by the second beam splitter 121, and then outputs the converged fifth beam to the third beam splitter 1222. The third beam splitter 1222 is used to transmit the fifth beam to the second charge-coupled detector 1223 for imaging.

[0093] The image plane movement adjustment structure 123 includes an electrically driven displacement guide rail and a driver electrically connected to the electrically driven displacement guide rail. The driver is used to drive the electrically driven displacement guide rail to move when the image sharpness imaged on the second charge-coupled detector 1223 does not meet the target parameters.

[0094] The third beam splitter 1222 in the above embodiment is specifically a beam splitter, which is a type of coated glass. One or more thin films are coated on the surface of the optical glass. When a beam of light is projected onto the coated glass, it is split into two or more beams through reflection and refraction.

[0095] In practice, the second beam splitter refracts the fifth beam, which has been converged by the telescope objective, thereby changing the propagation direction of the fifth beam. This causes the fifth beam to exit onto the converging lens 1221, which then converges the fifth beam refracted by the second beam splitter before projecting it onto the beam splitter. The beam splitter refracts the fifth beam onto the second charge-coupled detector (CCD) 1223, ultimately forming an image on the CCD. Simultaneously, the second CCD 1223 is located on an electrically driven displacement rail. When the image sharpness on the second CCD 1223 does not meet the target parameters, a driver electrically connected to the displacement rail moves the rail along the optical axis of the second CCD 1223. This changes the distance between the second CCD 1223 and the second beam splitter, thereby altering the sharpness of the image plane on the second CCD 1223 and precisely locating a clear image plane.

[0096] In practical applications, the electric displacement guide rail is a precision displacement stage, and the driver is a motor capable of sending pulse signals. The motor drives the precision displacement stage by sending pulse signals, and the movement distance is determined based on the number of pulse signal transmissions. Alternatively, a grating sensor can be used to directly measure the movement distance of the precision displacement stage. Based on this, the image plane movement adjustment structure 123 employs an automatic precision image adjustment method, achieving high image plane positioning accuracy. Furthermore, given a fixed focal length, it can calculate the object plane's movement distance based on the precise distance of the image plane movement using optical imaging formulas, thereby measuring the offset displacement of the two-dimensional rotating axis orthogonal device.

[0097] like Figure 1 As shown, in some embodiments, the focusing micrometer optical path assembly 12 further includes a second light source 124 and a second reticle 125. Both the second light source 124 and the second reticle 125 are fixedly connected to the image plane movement adjustment structure 123. The optical axis of the second light source 124 is coaxial with the optical axis of the second reticle 125 and parallel to the centerline of the second direction of the second beam splitter 121.

[0098] During the debugging process, the second light source 124 is used to provide a diverging beam to the second reticle 125. After passing through the second reticle 125, the diverging beam forms a sixth beam and is emitted to the second imaging structure 122. The second imaging structure 122 is also used to perform imaging based on the sixth beam.

[0099] In practical applications, the focusing micrometer optical path assembly 12 can be equipped with an independent second light source 124 and a second reticle 125. The optical axis of the second light source 124 is coaxial with the optical axis of the second reticle 125 and is parallel to the center line of the second direction of the second beam splitter. As shown in the figure, the optical axis of the second light source 124, the optical axis of the second reticle, and the center line of the horizontal direction of the second beam splitter are parallel.

[0100] During debugging, the second light source 124 is used to illuminate the second reticle 125. The beam of light passing through the crosshairs on the second reticle 125 is the sixth beam. The second reticle 125 outputs the sixth beam to the beam splitter and the second charge-coupled device 1223. The crosshairs on the second reticle 125 are imaged on the second charge-coupled device 1223.

[0101] It is understandable that before fixing the second light source 124 and the second reticle 125 onto the image plane movement adjustment structure 123, it is necessary to adjust the relative distance between the second light source 124 and the second reticle 125 and the second imaging structure 122 according to the image plane position formed by the crosshairs on the second reticle 125 on the second charge-coupled detector 1223, so that the center of the image plane formed by the crosshairs is located at the center of the second charge-coupled detector 1223.

[0102] As can be seen from the structure and working process of the focusing micrometer optical path component 12 in the above embodiments, the fourth beam overlaps with the second and third beams in part of the optical path. The fifth beam received by the focusing micrometer optical path component 12 and the third beam received by the autocollimating optical path component 11 are perpendicular to each other in the final imaging optical path. That is, the focusing micrometer optical path component 12 and the autocollimating optical path component 11 have achieved high-precision mutual calibration of their respective optical paths and can establish a unified measurement coordinate system.

[0103] With the above technical solution, the autocollimating optical path assembly 11 and the focusing micrometer optical path assembly 12 each have independent projection light sources. The two can provide a reference for mutual calibration of optical axes, improving the accuracy and efficiency of optical path equipment adjustment. At the same time, the focusing micrometer optical path assembly 12 can project a bright crosshair image with high straightness, and can also provide a calibration reference for the optical axes of other instruments' optical systems.

[0104] like Figure 2 As shown, in one possible implementation, the reflector 14 is a composite target. The composite target includes a third reticle 141, a third light source 143, and a base 144, which are sequentially fixedly connected; or, the composite target includes a third reticle 141, frosted glass 142, a third light source 143, and a base 144, which are sequentially fixedly connected.

[0105] For example, the composite target includes a third reticle 141, a third light source 143, and a base 144, which are fixedly connected in sequence. The third reticle 141 is a dark-field crosshair reticle, and a reflective film is coated on its surface to give it high reflectivity, enabling it to serve as a measurement target for the self-collimating optical path assembly 11. The third light source 143 is combined with the third reticle 141. The third light source 143 illuminates the third reticle 141, and the beam of light passing through the crosshairs on the third reticle 141 becomes a fourth beam. After being converged by the telescope objective, the fourth beam becomes a fifth beam, which is transmitted to the second charge-coupled detector 1223 in the focusing micrometer optical path assembly 12 as a bright crosshair target, serving as the measurement target for the focusing micrometer optical path assembly 12. The third light source 143 can be an LED lamp, a halogen lamp, or other gas lamps, incandescent lamps, or other artificial light sources; this embodiment of the invention does not specifically limit its use.

[0106] Furthermore, to achieve higher measurement accuracy, a frosted glass 142 can be added between the third reticle 141 and the third light source 143. Therefore, the composite target includes the third reticle 141, the frosted glass 142, the third light source 143, and the base 144, which are sequentially fixedly connected. The frosted glass 142 can correct the light to form a uniform surface light source, which is more conducive to the projection of a bright cross-shaped target in a dark field.

[0107] The following will be combined with the appendix Figure 1 and appendix Figure 2 The working process of the axis orthogonality measuring device 1 is explained in detail. After the composite target is fixed to one end of the rotation axis of the two-dimensional rotating axis device 2, the first light source 1111 provides a first beam of light to illuminate the first reticle 1112. The crosshairs on the first reticle 1112 pass through the collimating lens 1113, the first beam splitter, the second beam splitter, and the telescope objective lens, and are then emitted to the composite target. The beam is then reflected by the composite target to the telescope objective lens, and after passing through the telescope objective lens, the second beam splitter, the first beam splitter, and the compensating lens 1131, it is imaged onto the first charge-coupled detector 1132, forming a self-collimating optical path. Its main function is to measure the two-dimensional angular error of the rotation axis of the two-dimensional rotating axis device 2 connected to the composite target. After the third light source 143 on the composite target illuminates the third reticle 141, the bright crosshair target displayed passes through the telescope objective, the second beam splitter prism, the converging lens 1221 and the beam splitter, and is finally imaged onto the second charge-coupled detector 1223, forming a focusing micrometer collimating optical path. Its main function is to measure the two-dimensional linear displacement error of the rotation axis of the two-dimensional rotating axis system device 2 connected to the composite target.

[0108] Meanwhile, since the second charge-coupled device 1223 is located on the precision displacement stage, when the bright crosshair target on the composite target passes through the telescope objective, the second beam splitter prism, the converging lens 1221, and the beam splitter, and is finally imaged onto the second charge-coupled device 1223, the precision displacement stage moves the second charge-coupled device 1223 along its optical axis, thereby precisely positioning the clear image plane. Furthermore, the distance the precision displacement stage moves is precisely known. Combined with the known focal length, the object plane movement distance can be calculated using optical imaging formulas, thereby calculating the two-dimensional linear displacement error of the rotation axis of the two-dimensional rotating axis system device 2.

[0109] Secondly, such as Figures 3 to 6 As shown, this embodiment of the invention also provides a shaft orthogonality measurement system for measuring a two-dimensional rotating shaft system device 2, including a control device and at least one shaft orthogonality measurement device 1 as described in the above embodiments.

[0110] The composite target of the shaft orthogonality measuring device 1 is fixedly connected to the rotating shaft of the two-dimensional rotating shaft device 2.

[0111] The control device is electrically connected to at least one shaft orthogonality measuring device 1 and a two-dimensional rotating shaft device 2.

[0112] During the measurement process, the control device controls the rotation of the rotation axis of the two-dimensional rotating axis system device 2. When the normal of the composite target and the axis of rotation of the rotation axis meet the preset conditions with the optical axis of the axis orthogonality measuring device 1, the control device obtains the deviation angle and deviation displacement of the axis of rotation of the rotation axis relative to the optical axis of the axis orthogonality measuring device 1. The control device is also used to determine the orthogonality of the two-dimensional rotating axis system device 2 based on the deviation angle and deviation displacement.

[0113] Compared with the prior art, the beneficial effects of the shaft orthogonality measurement system provided in this embodiment of the invention are the same as the beneficial effects of the shaft orthogonality measurement device 1 described in the above technical solution, and will not be repeated here.

[0114] In one possible implementation, such as Figure 3 As shown, when using a single-station measurement device 2 to measure the orthogonality of a two-dimensional rotating shaft system, the number of shaft orthogonality measuring devices is one.

[0115] The first composite target 15 of the shaft orthogonality measuring device 1 is fixedly connected to the first end of the horizontal axis 21 of the two-dimensional rotating shaft device 2, and the second composite target 16 of the shaft orthogonality measuring device 1 is fixedly connected to the second end of the horizontal axis 21 of the two-dimensional rotating shaft device 2.

[0116] During the measurement process, the control device is used to control the rotation of the horizontal axis 21 of the two-dimensional rotating axis system device 2, and when the normal of the first composite target 15 and the axis of rotation of the horizontal axis 21 meet the preset conditions with the optical axis of the axis system orthogonality measuring device 1, the first deviation angle and the first deviation displacement of the axis of rotation of the horizontal axis 21 relative to the optical axis of the axis system orthogonality measuring device 1 are obtained.

[0117] The control device is also used to control the horizontal axis 21 of the two-dimensional rotating axis system device 2 to rotate after controlling the vertical axis 22 of the two-dimensional rotating axis system device 2 to rotate 180°, and to obtain the second deviation angle and the second deviation displacement of the axis of rotation of the horizontal axis 21 relative to the optical axis of the axis system orthogonality measuring device 1 when the normal of the second composite target 16 and the axis of rotation of the horizontal axis 21 meet the preset conditions with the optical axis of the axis system orthogonality measuring device 1.

[0118] The control device is also used to determine the orthogonality of the two-dimensional rotating shaft system device 2 based on the first deviation angle, the second deviation angle, the first deviation displacement, and the second deviation displacement.

[0119] In specific implementation, after the first composite target 15 and the second composite target 16 of the axis orthogonality measuring device 1 are respectively installed at the first and second ends of the horizontal axis 21 of the two-dimensional rotating axis device 2, the control device controls the horizontal axis 21 of the two-dimensional rotating axis device 2 to rotate, so that during the rotation of the horizontal axis 21, the rotation axis and the normal of the first composite target 15 are kept as consistent as possible with the optical axis of the axis orthogonality measuring device 1. At this time, the control device acquires the image imaged by the first charge-coupled detector 1132, that is, acquires the first deviation angle of the axis of rotation of the horizontal axis 21 relative to the optical axis of the axis orthogonality measuring device 1. The control device acquires the displacement of the second charge-coupled detector 1223 driven by the precision displacement stage through the image image of the second charge-coupled detector 1223, that is, acquires the first deviation displacement of the axis of rotation of the horizontal axis 21 relative to the optical axis of the axis orthogonality measuring device 1. Keeping the axis orthogonality measuring device 1 fixed, the control device controls the vertical axis 22 of the two-dimensional rotating axis device 2 to rotate 180°. Then, the above steps are repeated to measure the second deviation angle and the second deviation displacement of the axis of rotation of the second end of the horizontal axis 21 relative to the optical axis of the axis orthogonality measuring device 1. Finally, the control device calculates the orthogonality of the two-dimensional rotating axis system device 2 based on the first deviation angle, the second deviation angle, the first deviation displacement, and the second deviation displacement.

[0120] It is understandable that the above-mentioned control device controls the vertical shaft 22 to rotate 180°. Self-positioning can be achieved by using the grating encoder built into the vertical shaft 22, or external positioning can be achieved by using a photoelectric autocollimator in conjunction with a multi-faceted prism or a double-sided reflector, so as to ensure that the rotation angle of the vertical shaft 22 meets 180°.

[0121] In one possible implementation, such as Figures 4 to 6 As shown, when the orthogonality of the two-dimensional rotating shaft system device 2 is measured using a dual-station method, the shaft orthogonality measuring device includes a first shaft orthogonality measuring device 31 and a second shaft orthogonality measuring device 32.

[0122] The optical axis of the first axis orthogonality measuring device 31 is orthogonal to the optical axis of the second axis orthogonality measuring device 32.

[0123] The third composite target 17 of the first axis orthogonality measuring device 31 is fixedly connected to one end of the horizontal axis 21 of the two-dimensional rotating axis device 2; the fourth composite target 18 of the second axis orthogonality measuring device 32 is fixedly connected to one end of the vertical axis 22 of the two-dimensional rotating axis device 2.

[0124] During the measurement process, the control device is used to control the rotation of the horizontal axis 21 of the two-dimensional rotating axis system device 2, and when the normal of the third composite target 17 and the axis of rotation of the horizontal axis 21 meet the preset conditions with the optical axis of the first axis system orthogonality measuring device 31, the third deviation angle and the third deviation displacement of the axis of rotation of the horizontal axis 21 relative to the optical axis of the first axis system orthogonality measuring device 31 are obtained.

[0125] The control device is also used to control the rotation of the vertical axis 22 of the two-dimensional rotating axis system device 2, and when the normal of the fourth composite target 18 and the axis of rotation of the vertical axis 22 meet the preset conditions with the optical axis of the second axis system orthogonality measuring device 32, it obtains the fourth deviation angle and the fourth deviation displacement of the axis of rotation of the vertical axis 22 relative to the optical axis of the second axis system orthogonality measuring device 32.

[0126] The control device is also used to determine the orthogonality of the two-dimensional rotating shaft system device 2 based on the third deviation angle, the third deviation displacement, the fourth deviation angle, and the fourth deviation displacement.

[0127] In practice, such as Figure 4 as well as Figure 5 As shown, before measuring orthogonality using two axis orthogonality measuring devices, it is necessary to establish an orthogonal reference field for the first axis orthogonality measuring device 31 and the second axis orthogonality measuring device 32. This requires calibrating the perpendicularity and intersection of the first axis orthogonality measuring device 31 and the second axis orthogonality measuring device 32 sequentially. Afterward, the calibration fixture is removed, and the two-dimensional rotating axis device 2 is placed in the orthogonal reference field. Based on this, after confirming that the orthogonality of the two axis orthogonality measuring devices themselves meets the reference conditions, the orthogonality measurement of the two-dimensional rotating axis device 2 can avoid introducing new errors and improve the accuracy of the measurement data.

[0128] Please see Figure 4The example illustrates the perpendicularity calibration of the first axis orthogonality measuring device 31 and the second axis orthogonality measuring device 32. The first axis orthogonality measuring device 31 and the second axis orthogonality measuring device 32 are placed perpendicular to each other, and both devices are simultaneously aligned with the high-precision cubic mirror 4. The two devices respectively achieve perpendicularity calibration of the two optical paths through their respective autocollimation optical path components 11, so that the autocollimation angle of the two axis orthogonality measuring devices is zero, thereby completing the perpendicularity calibration of the first axis orthogonality measuring device 31 and the second axis orthogonality measuring device 32.

[0129] Figure 5 The intersection calibration of the first axis orthogonality measuring device 31 and the second axis orthogonality measuring device 32 is illustrated. After the perpendicularity calibration is completed, the high-precision cubic mirror 4 is removed, and a right-angle reflecting prism 5 is placed in the original position of the high-precision cubic mirror 4. The right-angle reflecting prism 5 is adjusted so that the first axis orthogonality measuring device 31 and the second axis orthogonality measuring device 32 remain perpendicular. At this time, the second light source 124 in the first axis orthogonality measuring device 31 is controlled to illuminate the second reticle 125, so that the crosshairs on the second reticle 125 are projected near the right-angle reflecting prism 5, as shown by point H in the figure. The projection of the crosshairs is then reflected by the right-angle reflecting prism 5 and finally imaged on the second charge-coupled device 1223 of the second axis orthogonality measuring device 32. By adjusting the displacement of the second axis orthogonality measuring device 32, the position of the image on the second charge-coupled device 1223 of the second axis orthogonality measuring device 32 is adjusted so that the center of the bright line of the crosshairs is located at the center of the image plane. The second light source 124 of the first axis orthogonality measuring device 31 is controlled to repeatedly project onto multiple positions. Through data fitting calculation, the intersection degree of the first axis orthogonality measuring device 31 and the second axis orthogonality measuring device 32 is calibrated.

[0130] After completing the perpendicularity and intersection calibrations, an orthogonal reference field is considered to have been established. The calibration fixture, namely the right-angle reflecting prism 5, is removed, and the two-dimensional rotating axis system device 2 is placed in its original position. The third composite target 17 of the first axis orthogonality measuring device 31 is installed at the first end of the horizontal axis 21 of the two-dimensional rotating axis system device 2, and the fourth composite target 18 of the second axis orthogonality measuring device 32 is installed at the first end of the vertical axis 22 of the two-dimensional rotating axis system device 2.

[0131] like Figure 6As shown, in specific implementation, the control device controls the horizontal axis 21 of the two-dimensional rotating axis system device 2 to rotate, so that during the rotation of the horizontal axis 21, the rotation axis and the normal of the third composite target 17 are kept as consistent as possible with the optical axis of the first axis orthogonality measuring device 31. At this time, the control device acquires the image of the first charge-coupled device 1132 of the first axis orthogonality measuring device 31, that is, acquires the third deviation angle of the axis of rotation of the horizontal axis 21 relative to the optical axis of the first axis orthogonality measuring device 31. The control device acquires the displacement of the second charge-coupled device 1223 driven by the precision displacement stage through the image of the second charge-coupled device 1223 of the first axis orthogonality measuring device 31, that is, acquires the third deviation displacement of the axis of rotation of the horizontal axis 21 relative to the optical axis of the first axis orthogonality measuring device 31.

[0132] The control device controls the vertical axis 22 of the two-dimensional rotating axis system device 2 to rotate, so that during the rotation, the axis of rotation of the vertical axis 22 and the normal of the fourth composite target 18 are as consistent as possible with the optical axis of the second axis orthogonality measuring device 32. At this time, the control device acquires the image of the first charge-coupled device 1132 of the second axis orthogonality measuring device 32, that is, acquires the fourth deviation angle of the axis of rotation of the horizontal axis 21 relative to the optical axis of the second axis orthogonality measuring device 32. The control device acquires the displacement of the second charge-coupled device 1223 driven by the precision displacement stage through the image of the second charge-coupled device 32, that is, acquires the fourth deviation displacement of the axis of rotation of the vertical axis 22 relative to the optical axis of the second axis orthogonality measuring device 32. Finally, the control device calculates the orthogonality of the two-dimensional rotating axis system device 2 based on the third deviation angle, the third deviation displacement, the fourth deviation angle, and the fourth deviation displacement.

[0133] Based on this, the measurement system provided in this embodiment of the invention can reduce the alignment error of manual target alignment, and has the characteristics of high measurement accuracy, low introduced error, low assembly and adjustment difficulty, and high degree of automation. It can also realize one-stop measurement of multiple parameters. When the orthogonality of the two-dimensional rotating shaft system device 2 is measured by a dual-station method, global detection, continuous detection and dynamic detection of two-dimensional shaft system error can also be realized.

[0134] Figure 7 A schematic diagram of the hardware structure of the control device described in the above embodiments is shown. Figure 7 As shown, the control device 400 includes a processor 410 and a communication interface 430.

[0135] like Figure 7As shown, the processor 410 described above can be a Central Processing Unit (CPU), a general-purpose processor, a Digital Signal Processor (DSP), an Application-Specific Integrated Circuit (ASIC), a Field-Programmable Gate Array (FPGA), or other programmable logic devices, transistor logic devices, hardware components, or any combination thereof. It can implement or execute various exemplary logic blocks, modules, and circuits described in conjunction with the disclosure of this invention. The processor 410 can also be a combination that implements computing functions, such as a combination of one or more microprocessors, a combination of a DSP and a microprocessor, etc. The communication interface 430 described above can be one or more. The communication interface 430 can use any transceiver-like device for communicating with other devices or communication networks.

[0136] like Figure 7 As shown, the control device 400 may further include a communication line 440. The communication line may include a path for transmitting information between the components.

[0137] Optional, such as Figure 7 As shown, the control device 400 may further include a memory 420. The memory 420 is used to store computer execution instructions for implementing the present invention, and its execution is controlled by the processor 410. The processor 410 is used to execute the computer execution instructions stored in the memory 420, thereby realizing the measurement of the orthogonality of the two-dimensional rotating shaft system by the shaft orthogonality measurement system provided in the embodiments of the present invention.

[0138] like Figure 7As shown, memory 420 can be read-only memory (ROM) or other types of static storage devices capable of storing static information and instructions, random access memory (RAM) or other types of dynamic storage devices capable of storing information and instructions, or electrically erasable programmable read-only memory (EEPROM), compact disc read-only memory (CD-ROM) or other optical disc storage, optical disc storage (including compressed optical discs, laser discs, optical discs, digital universal optical discs, Blu-ray discs, etc.), magnetic disk storage media or other magnetic storage devices, or any other medium capable of carrying or storing desired program code in the form of instructions or data structures and accessible by a computer, but not limited thereto. Memory 420 can exist independently and be connected to processor 410 via communication line 440. Memory 420 can also be integrated with processor 410.

[0139] Optionally, the computer execution instructions in the embodiments of the present invention may also be referred to as application code, and the embodiments of the present invention do not specifically limit this.

[0140] In a specific implementation, as one example, such as Figure 7 As shown, processor 410 may include one or more CPUs, such as Figure 7 CPU0 and CPU1 in the CPU.

[0141] In a specific implementation, as one example, such as Figure 7 As shown, the control device 400 may include multiple processors, such as Figure 7 The processors 410 and 450 are included. Each of these processors can be a single-core processor or a multi-core processor.

[0142] This invention also provides a computer-readable storage medium. This computer-readable storage medium stores instructions that, when executed, perform the functions performed by the control device 400 in the above embodiments.

[0143] This invention also provides a chip for use in an axis orthogonality measurement system. The chip includes at least one processor 410 and a communication interface 430. The communication interface 430 and at least one processor 410 are coupled together. The processor is used to run instructions to implement the functions performed by the control device 400 in the above embodiments.

[0144] In the above embodiments, implementation can be achieved entirely or partially through software, hardware, firmware, or any combination thereof. When implemented using software, it can be implemented entirely or partially in the form of a computer program product. The computer program product includes one or more computer programs or instructions. When the computer program or instructions are loaded and executed on a computer, the processes or functions described in the embodiments of the present invention are performed entirely or partially. The computer can be a general-purpose computer, a special-purpose computer, a computer network, a terminal, a user equipment, or other programmable device. The computer program or instructions can be stored in a computer-readable storage medium or transferred from one computer-readable storage medium to another. For example, the computer program or instructions can be transferred from one website, computer, server, or data center to another website, computer, server, or data center via wired or wireless means. The computer-readable storage medium can be any available medium that a computer can access or a data storage device such as a server or data center that integrates one or more available media. The available medium can be a magnetic medium, such as a floppy disk, hard disk, or magnetic tape; it can also be an optical medium, such as a digital video disc (DVD); or it can be a semiconductor medium, such as a solid-state drive (SSD).

[0145] Although the invention has been described herein in conjunction with various embodiments, those skilled in the art will understand and implement other variations of the disclosed embodiments by reviewing the accompanying drawings, the disclosure, and the appended claims in carrying out the claimed invention. In the claims, the word "comprising" does not exclude other components or steps, and "a" or "an" does not exclude a plurality. A single processor or other unit can implement several functions listed in the claims. While different dependent claims may recite certain measures, this does not mean that these measures cannot be combined to produce good results.

[0146] Although the invention has been described in conjunction with specific features and embodiments, it is obvious that various modifications and combinations can be made therein without departing from the spirit and scope of the invention. Accordingly, this specification and drawings are merely exemplary descriptions of the invention as defined by the appended claims, and are considered to cover any and all modifications, variations, combinations, or equivalents within the scope of the invention. Clearly, those skilled in the art can make various alterations and modifications to the invention without departing from its spirit and scope. Thus, if such modifications and modifications of the invention fall within the scope of the claims and their equivalents, the invention is also intended to include such modifications and modifications.

Claims

1. A device for measuring the orthogonality of a shaft system, characterized in that, The device for measuring the orthogonality of a two-dimensional rotating axis system includes: a self-collimating optical path assembly, a focusing micrometer optical path assembly, an auxiliary imaging assembly, and a reflective part that is detachably connected to the two-dimensional rotating axis system. The auxiliary imaging component is located on the side of the reflective portion away from the two-dimensional rotation axis device, and the optical axis of the auxiliary imaging component is coaxial with the optical axis of the reflective portion; the autocollimating optical path component and the focusing micrometer optical path component are located on the side of the auxiliary imaging component away from the reflective portion, and the optical axes of the focusing micrometer optical path component and the autocollimating optical path component are both perpendicular to the optical axis of the auxiliary imaging component; wherein, the auxiliary imaging component and the autocollimating optical path component constitute an autocollimating optical path, and the auxiliary imaging component and the focusing micrometer optical path component also constitute a focusing micrometer optical path; The self-collimating optical path component is used to emit a first beam to the auxiliary imaging component. The auxiliary imaging component is used to collimate the first beam to obtain a second beam and emit the second beam to the reflecting part. The reflecting part is used to reflect the second beam to the auxiliary imaging component. The auxiliary imaging component is also used to converge the second beam to obtain a third beam and emit the third beam to the self-collimating optical path component. The third beam is imaged on the self-collimating optical path component. The reflector is also used to emit a fourth beam to the auxiliary imaging component. The auxiliary imaging component is used to converge the fourth beam to obtain a fifth beam, and then emits the fifth beam to the focusing micrometer optical path component. The focusing micrometer optical path component is used to perform refraction and convergence processing on the fifth beam sequentially to form an image. The reflector is a composite target, wherein: The composite target includes a third reticle, a third light source, and a base, wherein the third reticle, the third light source, and the base are fixedly connected in sequence. Alternatively, the composite target may include a third reticle, a frosted glass, a third light source, and a base, wherein the third reticle, the frosted glass, the third light source, and the base are sequentially fixedly connected.

2. The shaft orthogonality measuring device according to claim 1, characterized in that, The self-collimating optical path assembly includes a first optical path structure, a first beam splitter, and a first imaging structure, wherein: The first beam splitter is located on the light-emitting side of the first optical path structure, and the optical axis of the first optical path structure is coaxial with the centerline of the first direction of the first beam splitter; the first imaging structure is located on the side of the first beam splitter away from the focusing micrometer optical path assembly, and the optical axis of the first imaging structure is coaxial with the centerline of the first direction of the first beam splitter. The centerlines of the second direction of the first beam splitter are coaxial; The optical axis of the first optical path structure is perpendicular to the optical axis of the first imaging structure, and the center of the first beam splitter is located at the intersection of the optical axis of the first optical path structure and the optical axis of the first imaging structure. The first optical path structure is used to emit the first beam towards the first beam splitter; the first beam splitter is used to refract the first beam and emit the first beam to the auxiliary imaging component; the auxiliary imaging component is used to collimate the first beam to obtain the second beam and emit the second beam to the reflector; the reflector is used to reflect the second beam and then it enters the auxiliary imaging component; the auxiliary imaging component is also used to converge the second beam to obtain the third beam and emit the third beam to the first beam splitter; the first beam splitter is used to converge the third beam and then emit it to the first imaging structure for imaging.

3. The shaft orthogonality measuring device according to claim 2, characterized in that, The first optical path structure includes a first light source, a first reticle, and a collimating lens arranged in sequence; wherein: The optical axis of the first light source, the optical axis of the first reticle, and the optical axis of the collimating lens are all coaxial with the centerline of the first direction of the first beam splitter. The first light source is used to provide a diverging light beam to the first reticle. After passing through the first reticle, the diverging light beam forms the first beam and is emitted to the collimating lens. The collimating lens is used to collimate the first beam and then emit the first beam to the first beam splitter. The first imaging structure includes a compensation mirror and a first charge-coupled detector, wherein: The compensation mirror is located between the first charge-coupled detector and the first beam splitter. The optical axis of the first charge-coupled detector and the optical axis of the compensation mirror are both coaxial with the center line of the second direction of the first beam splitter. The compensation mirror is used to compensate for the third beam and then outputs the compensated third beam to the first charge-coupled detector for imaging.

4. The shaft orthogonality measuring device according to claim 1, characterized in that, The focusing micrometer optical path assembly includes a second beam splitter, a second imaging structure, and an image plane movement adjustment structure, wherein: The second beam splitter is fixedly connected to the first beam splitter in the self-collimating optical path assembly, and the center line of the second direction of the second beam splitter is coaxial with the optical axis of the auxiliary imaging assembly; The second imaging structure is located on the light-emitting side of the second beam splitter, and the optical axis of the second imaging structure is coaxial with the center line of the second beam splitter in the first direction; The second beam splitter is used to refract the fifth beam onto the second imaging structure; the second imaging structure is used to form an image based on the fifth beam. The image plane movement adjustment structure is used to support the second imaging structure. When the image clarity of the second imaging structure does not meet the target parameters, the distance between the second imaging structure and the second beam splitter is adjusted.

5. The shaft orthogonality measuring device according to claim 4, characterized in that, The second imaging structure includes a converging lens, a third beam splitter, and a second charge-coupled detector arranged in sequence, wherein: The optical axis of the converging lens, the optical axis of the third beam splitter, and the optical axis of the second charge-coupled detector are all coaxial with the center line of the second direction of the second beam splitter. The converging lens is used to converge the fifth beam refracted by the second beam splitter, and to output the converged fifth beam to the third beam splitter. The third beam splitter is used to transmit the fifth beam to the second charge-coupled detector for imaging. The image plane movement adjustment structure includes an electrically operated displacement guide rail and a driver electrically connected to the electrically operated displacement guide rail; The driver is used to move the electric displacement guide rail when the image clarity on the second charge-coupled detector does not meet the target parameters.

6. The shaft orthogonality measuring device according to claim 4, characterized in that, The focusing micrometer optical path assembly also includes a second light source and a second reticle; both the second light source and the second reticle are fixedly connected to the image plane movement adjustment structure. The optical axis of the second light source is coaxial with the optical axis of the second reticle and is parallel to the center line of the second direction of the second beam splitter. During the debugging process, the second light source is used to provide a diverging light beam to the second reticle. After passing through the second reticle, the diverging light beam forms a sixth light beam and is emitted to the second imaging structure. The second imaging structure is also used to perform imaging based on the sixth light beam.

7. A system for measuring the orthogonality of an axis system, characterized in that, A device for measuring the orthogonality of a two-dimensional rotating shaft system, comprising a control device and at least one shaft orthogonality measuring device as described in any one of claims 1 to 6; wherein: The composite target of the shaft orthogonality measuring device is fixedly connected to the rotating shaft of the two-dimensional rotating shaft device. The control device is electrically connected to the at least one shaft orthogonality measuring device and the two-dimensional rotating shaft device, respectively. During the measurement process, the control device is used to control the rotation of the rotation axis of the two-dimensional rotating axis system device, and when the normal of the composite target and the axis of rotation of the rotating axis meet the preset conditions with the optical axis of the axis orthogonality measuring device, the deviation angle and deviation displacement of the axis of rotation of the rotating axis relative to the optical axis of the axis orthogonality measuring device are obtained. The control device is also used to determine the orthogonality of the two-dimensional rotating shaft system based on the deviation angle and the deviation displacement.

8. The shaft orthogonality measurement system according to claim 7, characterized in that, When the orthogonality of the two-dimensional rotating shaft system is measured using a single-station method, the number of shaft orthogonality measuring devices is one, wherein: The first composite target of the axis orthogonality measuring device is fixedly connected to the first end of the transverse axis of the two-dimensional rotating axis device, and the second composite target of the axis orthogonality measuring device is fixedly connected to the second end of the transverse axis of the two-dimensional rotating axis device. During the measurement process, the control device is used to control the horizontal axis rotation of the two-dimensional rotating axis system device, and when the normal of the first composite target and the axis of the horizontal axis rotation meet the preset conditions with the optical axis of the axis system orthogonality measuring device, the first deviation angle and the first deviation displacement of the axis of the horizontal axis rotation relative to the optical axis of the axis system orthogonality measuring device are obtained. The control device is also used to control the horizontal axis of the two-dimensional rotating axis system to rotate 180° after controlling the vertical axis of the two-dimensional rotating axis system to rotate, and to obtain the second deviation angle and the second deviation displacement of the horizontal axis of rotation relative to the optical axis of the axis system orthogonality measuring device when the normal of the second composite target and the axis of rotation of the horizontal axis meet the preset conditions with the optical axis of the axis system orthogonality measuring device. The control device is also used to determine the orthogonality of the two-dimensional rotating shaft system based on the first deviation angle, the second deviation angle, the first deviation displacement, and the second deviation displacement.

9. The shaft orthogonality measurement system according to claim 7, characterized in that, When using a dual-station method to measure the orthogonality of the two-dimensional rotating shaft system, the shaft orthogonality measuring device includes a first shaft orthogonality measuring device and a second shaft orthogonality measuring device, wherein: The optical axis of the first axis orthogonality measuring device is orthogonal to the optical axis of the second axis orthogonality measuring device; The third composite target of the first axis orthogonality measuring device is fixedly connected to one end of the horizontal axis of the two-dimensional rotating axis device; the fourth composite target of the second axis orthogonality measuring device is fixedly connected to one end of the vertical axis of the two-dimensional rotating axis device. During the measurement process, the control device is used to control the horizontal axis rotation of the two-dimensional rotating axis system device, and when the normal of the third composite target and the axis of the horizontal axis rotation meet the preset conditions with the optical axis of the first axis system orthogonality measuring device, the third deviation angle and the third deviation displacement of the axis of the horizontal axis rotation relative to the optical axis of the first axis system orthogonality measuring device are obtained. The control device is also used to control the vertical axis rotation of the two-dimensional rotating axis system device, and when the normal of the fourth composite target and the axis of the vertical axis rotation meet the preset conditions with the optical axis of the second axis orthogonality measuring device, to obtain the fourth deviation angle and the fourth deviation displacement of the axis of the vertical axis rotation relative to the optical axis of the second axis orthogonality measuring device. The control device is also used to determine the orthogonality of the two-dimensional rotating shaft system based on the third deviation angle, the third deviation angle, the fourth deviation displacement, and the fourth deviation displacement.

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