Display panel, method for manufacturing display panel, and display device

Abstract

The application discloses a display panel, a preparation method of the display panel and a display device. The display panel has a display area, a bending area and a transition area between the display area and the bending area, and comprises a substrate and a passivation layer arranged on one side surface of the substrate; a dam and a protruding piece are arranged on the passivation layer in the transition area; the dam is arranged on the side close to the display area, and the protruding piece is arranged on the side close to the bending area; the protruding piece comprises a taper angle, and the taper angle is formed by the intersection of the inclined surface of the protruding piece and the side surface of the protruding piece facing the passivation layer; an isolation layer extends to the protruding piece; and the side surface of the protruding piece facing the passivation layer, which extends from the edge, is at least partially arranged on the isolation layer. The application can reduce the total stress at the taper angle by reducing the contact area between the taper edge area and the passivation layer, thereby reducing the risk of separation of the taper angle and the passivation layer.

Description

Technical Field

[0001] This application relates to the field of display device technology, and in particular to display panels, methods for manufacturing display panels, and display devices. Background Technology

[0002] A flexible OLED (Organic Light-Emitting Diode) display panel is a type of display panel formed based on a flexible substrate material, comprising a display area (AA area) and a non-display area (non-AA area). The non-display area includes a bending area and a transition area connecting the display area and the bending area.

[0003] In the prior art, dams and protrusions are usually provided at the edges of the display area and the transition area, and at the edges of the transition area and the bending area. The inorganic encapsulation layer extends from the dam to the protrusion and covers the protrusion in a sloping manner.

[0004] However, the interface between the protruding structure and the passivation layer in the array is prone to separation, which can lead to moisture intrusion and corrosion of the data lines, resulting in bright S-shaped (vertical) lines. Summary of the Invention

[0005] The main technical problem addressed by this application is to provide a display panel, a method for manufacturing the display panel, and a display device, which can solve the problem of screen defects caused by the easy separation of the interface between the protruding structure in the transition area and the passivation layer.

[0006] To solve the above-mentioned technical problems, the first technical solution adopted in this application is to provide a display panel having a display area, a bending area, and a transition area located between the display area and the bending area. The display panel includes: a substrate and a passivation layer disposed on one side surface of the substrate; a dam and a protrusion, both disposed on the passivation layer located in the transition area; wherein the dam is located on the side closer to the display area, and the protrusion is located on the side closer to the bending area; the protrusion includes a taper angle, and the inclined surface of the end of the protrusion near the dam intersects with the side surface of the protrusion facing the passivation layer to form an edge of the taper angle; an isolation layer extending toward the protrusion; wherein at least part of the side surface of the protrusion extending from the edge facing the passivation layer is located on the isolation layer.

[0007] The material of the isolation layer includes silicon oxide; preferably, the protrusions are disposed on the isolation layer.

[0008] The thickness of the protrusion on the isolation layer is less than the thickness of the protrusion on the passivation layer; preferably, the thickness of the protrusion on the isolation layer is 1.5 to 2.0 micrometers.

[0009] The display panel includes a first inorganic encapsulation layer, which at least covers an isolation layer, an inclined surface of the protrusion near the dam, and a surface of the protrusion away from the passivation layer.

[0010] The display panel includes a second inorganic encapsulation layer; wherein the second inorganic encapsulation layer is disposed on the first inorganic encapsulation layer.

[0011] The display panel includes a touch layer; the touch layer is disposed on the second inorganic encapsulation layer.

[0012] The substrate located in the non-display area is provided with a buffer layer, a gate insulating layer, a first metal layer, an interlayer insulating layer, a second metal layer, and a passivation layer in sequence.

[0013] To solve the above-mentioned technical problems, the second technical solution adopted in this application is to provide a method for manufacturing a display panel, comprising: obtaining a substrate; wherein the substrate includes a display area, a bending area, and a transition area located between the display area and the bending area; wherein a passivation layer is disposed on one side surface of the substrate; forming an isolation layer on the passivation layer at least partially located in the transition area; forming a dam and a protrusion on the passivation layer located in the transition area, with the dam located on the side closer to the display area and the protrusion located on the side closer to the bending area; wherein the protrusion includes a taper angle, and the inclined surface of the end of the protrusion near the dam intersects with the side surface of the protrusion facing the passivation layer to form an edge of the taper angle; the side surface of the protrusion extending from the edge facing the passivation layer is at least partially located on the isolation layer.

[0014] The step of forming a dam and a protrusion on a passivation layer located in the transition zone, with the dam positioned on the side closer to the display area and the protrusion positioned on the side closer to the bending zone, includes: forming a first inorganic encapsulation layer on at least the dam, the isolation layer, the inclined surface of the protrusion near the dam, and the surface of the protrusion away from the passivation layer; forming a second inorganic encapsulation layer on the first inorganic encapsulation layer; preferably, forming a touch layer on the second inorganic encapsulation layer.

[0015] To solve the above-mentioned technical problems, the third technical solution adopted in this application is to provide a display device, including any of the above-mentioned display panels.

[0016] The beneficial effects of this application are as follows: Unlike the prior art, this application provides a display panel, a method for manufacturing the display panel, and a display device. By ensuring that at least a portion of the surface of the protrusion extending from the edge faces the passivation layer and lies on the isolation layer, the contact area between the edge region of the taper angle and the passivation layer can be effectively reduced, thereby reducing the tensile stress between the edge region of the taper angle and the passivation layer. Furthermore, by reducing the total stress at the taper angle of the protrusion, the risk of separation between the taper angle and the passivation layer can be reduced, thereby reducing the risk of fracture between the taper angle and the isolation layer, thus reducing the probability of S-shaped bright lines and improving product yield. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the example description will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a schematic diagram of the structure of the first embodiment of the display panel of this application;

[0019] Figure 2 This is a schematic diagram of the structure of the second embodiment of the display panel of this application;

[0020] Figure 3 This is a schematic diagram of the structure of the third embodiment of the display panel of this application;

[0021] Figure 4 This is a flowchart illustrating one embodiment of the method for manufacturing the display panel of this application. Detailed Implementation

[0022] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0023] The terminology used in the embodiments of this application is for the purpose of describing particular embodiments only and is not intended to limit the application. The singular forms “a,” “said,” and “the” used in the embodiments of this application and the appended claims are also intended to include the plural forms, unless otherwise clearly indicated above. “Multiple” generally includes at least two, but does not exclude the inclusion of at least one.

[0024] It should be understood that the term "and / or" used in this article is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, and B existing alone. Additionally, the character " / " in this article generally indicates that the preceding and following related objects have an "or" relationship.

[0025] It should be understood that the terms "comprising," "including," or any other variations used herein are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0026] In related technologies, the inclined surface of the taper angle of the protrusion near the bending area in the transition zone overlaps with the inorganic encapsulation layer, which itself is under stress. The horizontal surface of the taper angle of the protrusion overlaps with the passivation layer, causing tensile stress between the protrusion and the passivation layer in the vertical direction. This makes it easy for the protrusion to peel off from the passivation layer, which in turn causes the interface between the protrusion and the inorganic encapsulation layer to break. This allows moisture to enter and corrode the data line, resulting in abnormal signal transmission and the appearance of S-shaped (vertical) bright lines, which in turn leads to screen failure.

[0027] This application provides a display panel, a method for manufacturing the display panel, and a display device, which can solve the problem of screen defects caused by the easy separation of the interface between the protruding structure in the transition region and the passivation layer.

[0028] The display panel provided in this application has a display area, a bending area, and a transition area between the display area and the bending area. The display panel includes: a substrate and a passivation layer disposed on one side surface of the substrate; a dam and a protrusion, both disposed on the passivation layer in the transition area; wherein the dam is located on the side closer to the display area, and the protrusion is located on the side closer to the bending area; the protrusion includes a taper angle, and the inclined surface of the end of the protrusion near the dam intersects with the side surface of the protrusion facing the passivation layer to form the edge of the taper angle; an isolation layer extends toward the protrusion; wherein at least a portion of the side surface of the protrusion extending from the edge facing the passivation layer is located on the isolation layer. By making at least a portion of the side surface of the protrusion extending from the edge facing the passivation layer located on the isolation layer, the contact area between the edge region of the taper angle and the passivation layer can be effectively reduced, thereby reducing the tensile stress between the edge region of the taper angle and the passivation layer. Furthermore, by reducing the total stress at the taper angle of the protrusion, the risk of separation between the taper angle and the passivation layer can be reduced, thereby further reducing the risk of fracture between the taper angle and the isolation layer, thus reducing the probability of S-shaped bright lines and improving product yield.

[0029] To illustrate the specific structure of the display panel in this application, please refer to [link / reference]. Figure 1 , Figure 1 This is a schematic diagram of the structure of the first embodiment of the display panel of this application.

[0030] In this embodiment, the display panel 100 has a display area a, a bending area (not shown), and a transition area b located between the display area a and the bending area. The display panel 100 includes a substrate 110 and a passivation layer 120 disposed on one side surface of the substrate 110. A dam 131 and a protrusion 132 are both disposed on the passivation layer 120 located in the transition area b. The dam 131 is located on the side closer to the display area a, and the protrusion 132 is located on the side closer to the bending area. The protrusion 132 includes a taper angle A, and the inclined surface of the end of the protrusion 132 near the dam 131 intersects with the side surface of the protrusion 132 facing the passivation layer 120 to form an edge of the taper angle A. An isolation layer 140 extends toward the protrusion 132. At least a portion of the side surface of the protrusion 132 extending from the edge facing the passivation layer 120 is located on the isolation layer 140.

[0031] The bending area and transition area b are both located in the non-display area (non-AA area).

[0032] The taper angle, also known as a dihedral angle, refers to the figure formed by two half-planes originating from a straight line. This straight line is called the edge of the dihedral angle, and the two half-planes are called the faces of the dihedral angle. In this embodiment, the end of the protrusion 132 near the dam 131 has an inclined surface. This inclined surface intersects with the surface of the protrusion 132 facing the passivation layer 132, forming a dihedral angle. The straight line where the two planes intersect is the edge of the taper angle A (Taper angle).

[0033] In some embodiments, substrate 110 can be a flexible substrate or a rigid substrate. In one specific embodiment, substrate 110 can be a polymer substrate, a plastic substrate, or an ultrathin glass substrate. In another specific embodiment, substrate 110 can be a glass substrate. This application does not limit the scope of the application.

[0034] In some embodiments, the passivation layer 120 is a silicon nitride film.

[0035] Specifically, a buffer layer, a gate insulating layer (GI), a first metal layer (M1), an interlayer insulating layer, a second metal layer (M2), and a passivation layer 120 are sequentially disposed on the substrate 110 located in the transition region b. The display panel 100 includes gate lines and data lines, with the gate lines disposed on the first metal layer and the data lines disposed on the second metal layer.

[0036] In some embodiments, the dam 131 and the protrusion 132 are made of organic insulating materials. In a specific implementation scenario, the dam 131 and the protrusion 132 may be made of organic polymer materials.

[0037] In some embodiments, the material of the insulating layer 140 includes silicon oxide (SiOx).

[0038] Among them, the bonding force between the silicon oxide film and the organic film is stronger than that between the silicon nitride film and the organic film.

[0039] Understandably, by having at least a portion of the surface of the protrusion 132 extending from the edge toward the passivation layer 120 lie on the isolation layer 140, the interfacial bonding force between the protrusion 132 and the isolation layer 140 at the taper angle can be enhanced, the adhesive strength between the protrusion 132 and the isolation layer 140 can be increased, and a more stable bonding layer can be formed. The more stable bonding layer can transfer stress, thereby reducing the tensile stress between the edge region of the taper angle and the passivation layer 120.

[0040] Meanwhile, since the isolation layer 140 and the passivation layer 120 are both inorganic film layers, the bonding force between the isolation layer 140 and the passivation layer 120 is greater than the bonding force between the protrusion 132 and the passivation layer 120. By bonding the passivation layer 120 and the protrusion 132 respectively with the isolation layer 140 set at the taper angle, the interfacial bonding force between the protrusion 132 and the passivation layer 120 can be further improved, thereby reducing the risk of the taper angle and the passivation layer 120 falling off.

[0041] In this embodiment, the display panel 100 includes a first inorganic encapsulation layer 150, which at least covers the isolation layer 140, the inclined surface of the protrusion 132 near the dam 131, and the side surface of the protrusion 132 away from the passivation layer 120.

[0042] In some embodiments, the first inorganic encapsulation layer 150 also covers the dam 131.

[0043] In some specific embodiments, the material of the first inorganic encapsulation layer 150 may be a nitride, oxide, oxynitride, nitrate, carbide, or any other combination of materials.

[0044] In some embodiments, the display panel 100 includes a second inorganic encapsulation layer 160 disposed on the first inorganic encapsulation layer 150.

[0045] In some specific embodiments, the material of the second inorganic encapsulation layer 160 can be a nitride, oxide, oxynitride, nitrate, carbide, or any other combination of materials.

[0046] Understandably, the isolation layer 140, the first inorganic encapsulation layer 150, and the second inorganic encapsulation layer 160 extend from the display area a to the transition area b, encapsulating and protecting the traces in the transition area b to improve the encapsulation effect; in the display area, an organic encapsulation layer is also provided between the first inorganic encapsulation layer 150 and the second inorganic encapsulation layer 160.

[0047] In some embodiments, the display panel 100 includes a touch layer 170 disposed on the first inorganic encapsulation layer 150. Touch control of the display panel 100 can be achieved through the touch layer 170 without the need for an external TSP (Touch Screen Panel).

[0048] In related technologies, only the inclined surface of the protrusion and the surface away from the passivation layer are covered with an inorganic encapsulation layer. The inorganic encapsulation layer overlaps with the inclined surface of the protrusion's taper angle, increasing the stress on the inclined surface. Furthermore, if the protrusion is completely formed on the passivation layer, the horizontal surface corresponding to the taper angle of the protrusion will be in complete contact with the passivation layer. The taper angle becomes a stress concentration point, meaning there is tensile stress between both the inorganic encapsulation layer and the protrusion, as well as tensile stress between the passivation layer and the protrusion. These two stresses extend from the stress concentration point in the direction away from the protrusion and from the inorganic encapsulation layer, respectively. This may cause peeling between the protrusion and the passivation layer, leading to cracks at the interface where they overlap. With cracks present, moisture can easily penetrate, corroding signal lines (such as data lines), resulting in signal abnormalities and the generation of bright lines in the S-direction.

[0049] In this embodiment, by having at least a portion of the surface of the protrusion 132 extending from the ridge towards the passivation layer 120 located on the isolation layer 140, the edge region of the taper angle A can be positioned on the isolation layer 140. This reduces the contact area between the edge region of the taper angle A and the passivation layer 120, thereby reducing the tensile stress in the vertical direction between the edge region of the taper angle A and the passivation layer 120. It is understood that by reducing the total stress at the taper angle A of the protrusion 132, the risk of detachment between the taper angle A and the passivation layer 120 can be reduced, thereby reducing the risk of breakage between the taper angle A and the isolation layer 140.

[0050] In some embodiments, the thickness of the protrusion 132 on the isolation layer 140 is less than the thickness of the protrusion 132 on the passivation layer 120.

[0051] In some specific embodiments, the thickness of the protrusion 132 on the isolation layer 140 is 1.5 to 2.0 micrometers, and the thickness of the protrusion 132 on the passivation layer 120 is 2.1 to 2.3 micrometers.

[0052] Understandably, the difference in thickness between the protrusion 132 on the isolation layer 140 and the protrusion 132 on the passivation layer 120 is determined by the thickness of the isolation layer 140 corresponding to the edge region.

[0053] In one specific implementation scenario, the thickness of the isolation layer 140 corresponding to the edge region is 0.6 micrometers, and the thickness of the protrusion 132 on the isolation layer 140 is 1.5 micrometers. In another specific implementation scenario, the thickness of the isolation layer 140 corresponding to the edge region is 0.4 micrometers, and the thickness of the protrusion 132 on the isolation layer 140 can be 1.8 micrometers. In yet another specific implementation scenario, the thickness of the isolation layer 140 corresponding to the edge region is 0.2 micrometers, and the thickness of the protrusion 132 on the isolation layer 140 can be 2.0 micrometers.

[0054] Understandably, by ensuring that at least part of the side surface of the protrusion 132 extending from the ridge toward the passivation layer 120 is located on the isolation layer 140, the thickness of the protrusion 132 on the isolation layer 140 is less than the thickness of the protrusion 132 on the passivation layer 120. This reduces the area of ​​the interface between the protrusion 132 and the isolation layer 140 at the inclined surface corresponding to the taper angle A, thereby further reducing the stress concentration at the stress intersection of the isolation layer 140 and the protrusion 132, and thus effectively improving stress-induced cracks.

[0055] Understandably, by effectively reducing the risk of separation between the protrusion 132 and the passivation layer 120 and the risk of breakage with the isolation layer 140, the protection effect of the encapsulation structure on the display panel 100 can be effectively guaranteed, thereby better isolating external oxygen and moisture, avoiding moisture intrusion and corrosion of the data line, avoiding the generation of S-direction bright lines, and thus improving product yield.

[0056] Please see Figure 2 , Figure 2 This is a schematic diagram of the structure of the second embodiment of the display panel of this application.

[0057] In this embodiment, the display panel 200 has a display area a, a bending area (not shown), and a transition area b located between the display area a and the bending area. The display panel 200 includes a substrate 210 and a passivation layer 220 disposed on one side surface of the substrate 210. A dam 231 and a protrusion 232 are both disposed on the passivation layer 220 located in the transition area b. The dam 231 is located near the display area a, and the protrusion 232 is located near the bending area. The protrusion 232 includes a taper angle A, and the inclined surface of the end of the protrusion 232 near the dam 231 intersects with the surface of the protrusion 232 facing the passivation layer 220 to form an edge of the taper angle A. An isolation layer 240 extends toward the protrusion 232.

[0058] The following description only covers the differences between this embodiment and the first embodiment.

[0059] In this embodiment, the protrusion 232 is disposed on the isolation layer 240.

[0060] In this embodiment, the thickness of the protrusion 232 is 1.5 to 2.0 micrometers.

[0061] In the above embodiments, both the dam and the protrusion are composed of a single planarization layer. In other embodiments, the dam and the protrusion may also be composed of two or more planarization layers, and this application does not limit this to any particular embodiment.

[0062] Specifically, please refer to Figure 3 , Figure 3 This is a schematic diagram of the structure of the third embodiment of the display panel of this application.

[0063] In this embodiment, the display panel 300 has a display area a, a bending area (not shown), and a transition area b located between the display area a and the bending area. The display panel 300 includes a substrate 310 and a passivation layer 320 disposed on one side surface of the substrate 310. A dam 331 and a protrusion 332 are both disposed on the passivation layer 320 located in the transition area b. The dam 331 is located on the side closer to the display area a, and the protrusion 332 is located on the side closer to the bending area. The protrusion 332 includes a taper angle A, and the inclined surface of the end of the protrusion 332 near the dam 331 intersects with the side surface of the protrusion 332 near the passivation layer 320 to form an edge of the taper angle A. An isolation layer 340 extends toward the protrusion 332. At least a portion of the side surface of the protrusion 332 extending from the edge toward the passivation layer 320 is located on the isolation layer 340.

[0064] The following description only covers the differences between this embodiment and the first and second embodiments.

[0065] In this embodiment, both the dam 331 and the protrusion 332 are composed of a first planarization layer 3301 and a second planarization layer 3302.

[0066] The isolation layer 340 ends at the inclined surface of the first planarization layer 3301 corresponding to the protrusion 332 near the dam 331.

[0067] Unlike existing technologies, the above-described embodiment, by having at least a portion of the surface of the protrusion extending from the ridge towards the passivation layer located on the isolation layer, reduces the contact area between the edge region of the taper angle and the passivation layer, thereby reducing the tensile stress between the edge region of the taper angle and the passivation layer. Furthermore, by reducing the total stress at the taper angle of the protrusion, the risk of separation between the taper angle and the passivation layer can be reduced, further reducing the risk of fracture between the taper angle and the isolation layer, thus reducing the probability of S-shaped bright lines and consequently improving product yield.

[0068] Correspondingly, this application provides a method for manufacturing a display panel.

[0069] Please see Figure 4, Figure 4 This is a schematic flowchart illustrating one embodiment of the method for manufacturing the display panel according to this application. In this embodiment, the manufacturing method includes:

[0070] S41: Obtain a substrate; wherein the substrate includes a display area, a bending area, and a transition area located between the display area and the bending area; wherein a passivation layer is disposed on one side surface of the substrate.

[0071] In this embodiment, the substrate can be a flexible substrate or a rigid substrate.

[0072] In this embodiment, a buffer layer and a gate insulating layer are sequentially fabricated on one side surface of the substrate. A first metal layer is then fabricated across the entire layer, and the metal is patterned to form metal traces, such as gate lines. Subsequently, an interlayer insulating layer is formed on the metal traces to cover the gate insulating layer and the metal traces. A second metal layer and a passivation layer are then fabricated on the interlayer insulating layer.

[0073] The gate line can be formed through the first mask process.

[0074] The buffer layer may include a first silicon nitride (SiN) film and a first silicon oxide (SiO) film.

[0075] The gate insulating layer may include a second silicon oxide film, a second silicon nitride film, and a third silicon nitride film stacked sequentially.

[0076] The interlayer insulating layer may include a fourth silicon nitride film and a third silicon oxide film, wherein the fourth silicon nitride film covers the gate line and the upper surface of the gate insulating layer, and the third silicon oxide film covers the upper surface of the fourth silicon nitride film.

[0077] Data lines are formed on the second metal layer.

[0078] Multiple vias are formed on the passivation layer located in the display area, and the anode layer of the display area is connected to the drain of the driving transistor in the array layer through the vias.

[0079] In this embodiment, the passivation layer can be prepared using physical vapor deposition (PVD) and / or chemical vapor deposition (CVD), and this application does not limit the method.

[0080] S42: An isolation layer is formed on the passivation layer, which is at least partially located in the transition region.

[0081] In this embodiment, the isolation layer can be prepared using physical vapor deposition (PVD) and / or chemical vapor deposition (CVD), and this application does not limit the method.

[0082] The side closest to the display area does not have an isolation layer deposited, in order to facilitate the subsequent formation of a dam.

[0083] S43: A dam and a protrusion are formed on the passivation layer located in the transition zone, with the dam located on the side closer to the display area and the protrusion located on the side closer to the bending zone; wherein the protrusion includes a taper angle, and the inclined surface of the end of the protrusion near the dam intersects with the side surface of the protrusion facing the passivation layer to form an edge of the taper angle; the side surface of the protrusion facing the passivation layer extending from the edge is at least partially located on the isolation layer.

[0084] In this embodiment, the dam and the protrusion can be prepared using physical vapor deposition (PVD) and / or chemical vapor deposition (CVD), and this application does not limit this.

[0085] In a specific implementation scenario, only the edge region with a taper angle is formed on the isolation layer on the side surface of the protrusion that contacts the passivation layer, while the rest of the region is formed directly on the passivation layer.

[0086] In another specific implementation scenario, the entire surface of the protrusion that contacts the passivation layer is formed on the isolation layer.

[0087] Furthermore, a first inorganic encapsulation layer is formed in the area of ​​the isolation layer not covered by the protrusion, the inclined surface, and the surface of the protrusion away from the passivation layer.

[0088] The first inorganic encapsulation layer can be prepared using physical vapor deposition (PVD) and / or chemical vapor deposition (CVD), and this application does not limit this process.

[0089] Furthermore, a second inorganic encapsulation layer is formed on the first inorganic encapsulation layer.

[0090] The first inorganic encapsulation layer can be prepared using physical vapor deposition (PVD) and / or chemical vapor deposition (CVD), and this application does not limit this process.

[0091] In a preferred embodiment, a touch layer is formed on the second inorganic encapsulation layer.

[0092] Understandably, the above implementation does not require additional manufacturing processes for the display panel, thus avoiding increased manufacturing costs.

[0093] Correspondingly, this application provides a display device including any of the above-mentioned display panels.

[0094] Unlike existing technologies, this application reduces the contact area between the edge region of the taper angle and the passivation layer by ensuring that at least a portion of the surface of the protrusion extending from the ridge faces the passivation layer and lies on the isolation layer. This reduces the tensile stress between the edge region of the taper angle and the passivation layer. Furthermore, by reducing the total stress at the taper angle of the protrusion, the risk of separation between the taper angle and the passivation layer is reduced, thereby reducing the risk of fracture between the taper angle and the isolation layer. This reduces the probability of S-shaped bright lines and improves product yield.

[0095] The above description is merely an embodiment of this application and does not limit the patent scope of this application. Any equivalent structural or procedural transformations made using the content of this application's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.

Claims

1. A display panel having a display area, a bending area, and a transition area located between the display area and the bending area, characterized in that, The display panel includes: A substrate and a passivation layer disposed on one side surface of the substrate; Both the dam and the protrusion are disposed on the passivation layer located in the transition zone; wherein, the dam is located on the side closer to the display area, and the protrusion is located on the side closer to the bending zone; the protrusion includes a taper angle, and the inclined surface of the end of the protrusion near the dam intersects with the side surface of the protrusion facing the passivation layer to form the edge of the taper angle; An isolation layer extends toward the protrusion; wherein at least a portion of the side surface of the protrusion extending from the ridge toward the passivation layer is located on the isolation layer; the thickness of the protrusion located on the isolation layer is less than the thickness of the protrusion located on the passivation layer.

2. The display panel according to claim 1, characterized in that, The material of the isolation layer includes silicon oxide; The protrusion is disposed on the isolation layer.

3. The display panel according to claim 1, characterized in that, The thickness of the protrusion located on the isolation layer is 1.5 to 2.0 micrometers.

4. The display panel according to claim 1, characterized in that, The display panel includes a first inorganic encapsulation layer, which at least covers the isolation layer, the inclined surface of the protrusion near the dam, and the side surface of the protrusion away from the passivation layer.

5. The display panel according to claim 4, characterized in that, The display panel includes a second inorganic encapsulation layer; The second inorganic encapsulation layer is disposed on the first inorganic encapsulation layer.

6. The display panel according to claim 5, characterized in that, The display panel includes a touch layer; The touch layer is disposed on the second inorganic encapsulation layer.

7. The display panel according to claim 1, characterized in that, A buffer layer, a gate insulating layer, a first metal layer, an interlayer insulating layer, a second metal layer, and the passivation layer are sequentially disposed on the substrate located in the non-display area.

8. A method for manufacturing a display panel, characterized in that, The preparation method is used to prepare a display panel as described in any one of claims 1 to 7, and the preparation method includes: A substrate is obtained; wherein the substrate includes a display area, a bending area, and a transition area located between the display area and the bending area; wherein a passivation layer is disposed on one side surface of the substrate; An isolation layer is formed on the passivation layer, which is at least partially located in the transition region; A dam and a protrusion are formed on the passivation layer located in the transition zone, with the dam positioned closer to the display area and the protrusion positioned closer to the bending zone; wherein the protrusion includes a taper angle, and the inclined surface of the end of the protrusion near the dam intersects with the side surface of the protrusion facing the passivation layer to form an edge of the taper angle; the side surface of the protrusion extending from the edge, closer to the passivation layer, is at least partially located on the isolation layer; the thickness of the protrusion located on the isolation layer is less than the thickness of the protrusion located on the passivation layer.

9. The preparation method according to claim 8, characterized in that, After the steps of forming a dam and a protrusion on the passivation layer located in the transition region, and positioning the dam on the side closer to the display area, and positioning the protrusion on the side closer to the bending region, the method includes: A first inorganic encapsulation layer is formed on at least the surface of the dam, the isolation layer, the inclined surface of the protrusion near the dam, and the side of the protrusion away from the passivation layer; A second inorganic encapsulation layer is formed on the first inorganic encapsulation layer; A touch layer is formed on the second inorganic encapsulation layer.

10. A display device, characterized in that, The display panel includes any one of claims 1 to 7 or a display panel prepared by the preparation method described in claim 8 or 9.

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