An interface contamination measuring device, method and material processing method
Patent Information
- Application Number
- CN202311252986.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-09-26
- Publication Date
- 2026-09-25
- Estimated Expiration
- 2043-09-26
AI Technical Summary
[0003]该层界面污物的存在使得两相界面的准确测量难以实现,并会影响工艺设备的运行
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Figure CN117109694B_ABST
Abstract
Description
Technical Field
[0001] This invention belongs to the field of nuclear fuel reprocessing measurement and control technology, specifically relating to a measuring device, measuring method, and material handling method for interface contaminants. Background Technology
[0002] The processes in nuclear fuel reprocessing are highly complex. In wet processes, many storage tanks contain two-phase (aqueous and organic) or multi-phase media with extremely high radioactivity. During operation, radioactive rays in the media degrade organic solvents and produce emulsions, creating an interfacial contaminant layer between the aqueous and organic phases. This interfacial contaminant is a highly viscous mixture with complex composition and is unevenly distributed between the aqueous and organic phases. Furthermore, the density of this interfacial contaminant lies between that of the aqueous and organic phases, with very small density differences among the three media.
[0003] The presence of this interfacial contaminant layer makes accurate measurement of the two-phase interface difficult and affects the operation of process equipment. If operators are unaware of the specific details of the interfacial contaminant layer in the waste liquid storage tank, they will be unable to completely remove or destroy this useless layer of interfacial contaminant, allowing it to enter subsequent process flows and significantly impacting normal production operations.
[0004] Currently, there is no device or method to effectively measure interface contaminants in this layer. Therefore, it is urgent to solve the problem of effective measurement of interface contaminants in the field of nuclear fuel reprocessing. Summary of the Invention
[0005] The technical problem to be solved by the present invention is to address the above-mentioned shortcomings of the prior art by providing a device, method and material handling method for measuring interface contaminants, which can accurately measure the location of interface contaminants, and help to accurately guide operators in the sewage discharge operation so that the production operation meets the process requirements.
[0006] In a first aspect, the present invention provides a device for measuring interface contaminants, including a radio frequency admittance component and an analysis module.
[0007] The radio frequency admittance (RF) component includes a first detection probe and a second detection probe. The first detection probe is used to detect admittance data at the lower interface between the interfacial contaminant and the aqueous phase. The second detection probe is used to detect admittance data at the upper interface between the organic phase and the interfacial contaminant. An analysis module, connected to the RF admittance component, is used to analyze the location of the interfacial contaminant based on the admittance data detected by the first and second detection probes.
[0008] Preferably, the first detection probe includes a first effective electrode, and the second detection probe includes a second effective electrode. The upper edge of the first effective electrode and the lower edge of the second effective electrode are on the same horizontal plane.
[0009] Preferably, the first detection probe further includes a first shielding section, and the second detection probe further includes a second shielding section.
[0010] The first shielding section is connected to the upper end of the first effective electrode, and the length of the first shielding section is determined according to formula (1):
[0011] L2=H+h-L1-L (1)
[0012] The second shielding section is connected to the upper end of the second effective electrode, and the length of the second shielding section is determined according to formula (2):
[0013] L4=H+h-L1-L-L3 (2)
[0014] Wherein, L2 is the length of the first shielding section, L4 is the length of the second shielding section, H is the height of the storage tank, h is the height of the instrument port of the first and second detection probes, L1 is the length of the first effective electrode, L3 is the length of the second effective electrode, and L is the height of the lower edge of the first effective electrode from the bottom plate of the storage tank.
[0015] Preferably, the analysis module includes a first analysis unit and a second analysis unit.
[0016] The first analysis unit is used to analyze the location of the lower interface between the interfacial contaminants and the aqueous phase according to formula (3):
[0017] S1=h2+L (3)
[0018] Where h2 satisfies Y1=Y0′+K1*h2, h2 is the key parameter of the lower interface height between the interface contaminant and the aqueous phase, Y1 is the admittance data detected by the first detection probe, and Y0′ and K1 are constants related to the dielectric constant of the aqueous phase, the dielectric constant of the interface contaminant, the length of the first effective electrode, and the tank structure.
[0019] The second analysis unit is used to analyze the position of the upper interface between the organic phase and the interfacial contaminants according to formula (4):
[0020] S2=h1+L1+L (4)
[0021] Where h1 satisfies Y2=Y0+K2*h1, h1 is the key parameter of the upper interface height between the organic phase and the interface contaminants, Y2 is the admittance data detected by the second detection probe, and Y0 and K2 are constants related to the dielectric constant of the organic phase, the dielectric constant of the interface contaminants, the length of the second effective electrode, and the tank structure.
[0022] Preferably, the radio frequency admittance assembly also includes a transmitter and a radiation-resistant cable.
[0023] The transmitter is connected to the first and second detection probes via radiation-resistant cables, and is used to convert signals and output the admittance data detected by the first and second detection probes.
[0024] The transmitter is used to be installed in a low-radioactivity area, while the first and second detection probes are used to be installed in the high-radioactivity area where the storage tank is located.
[0025] In a second aspect, the present invention also provides a measurement method using the measuring device for interface contaminants as described in the first aspect, comprising: a first detection probe of a radio frequency admittance component acquiring admittance data of the position of the lower interface between the interface contaminant and the aqueous phase; a second detection probe of the radio frequency admittance component acquiring admittance data of the position of the upper interface between the organic phase and the interface contaminant; and an analysis module analyzing the position of the interface contaminant based on the admittance data of the position of the lower interface between the interface contaminant and the aqueous phase and the admittance data of the position of the upper interface between the organic phase and the interface contaminant.
[0026] Preferably, the first detection probe includes a first effective electrode and a first shielding section, and the second detection probe includes a second effective electrode and a second shielding section.
[0027] Before the first detection probe of the radio frequency admittance assembly acquires admittance data of the position of the lower interface between the interface contaminant and the aqueous phase, the measurement method further includes: setting the upper edge of the first effective electrode and the lower edge of the second effective electrode to be on the same horizontal plane; and determining the length of the first shielding section and the length of the second shielding section.
[0028] Preferably, determining the length of the first shielding segment and the length of the second shielding segment specifically includes:
[0029] The length of the first shielding section of the RF admittance assembly is determined according to formula (1):
[0030] L2=H+h-L1-L (1)
[0031] The length of the second shielding section of the RF admittance assembly is determined according to formula (2):
[0032] L4=H+h-L1-L-L3 (2)
[0033] Wherein, L2 is the length of the first shielding section, L4 is the length of the second shielding section, H is the height of the storage tank, h is the height of the instrument port of the first and second detection probes, L1 is the length of the first effective electrode, L3 is the length of the second effective electrode, and L is the height of the lower edge of the first effective electrode from the bottom plate of the storage tank.
[0034] Preferably, the step of analyzing the location of the interfacial contaminants based on admittance data of the lower interface between the interfacial contaminants and the aqueous phase and admittance data of the upper interface between the organic phase and the interfacial contaminants specifically includes:
[0035] The location of the lower interface between the interfacial contaminants and the aqueous phase is determined based on formula (3):
[0036] S1=h2+L (3)
[0037] Where h2 satisfies Y1=Y0′+K1*h2, h2 is the key parameter of the lower interface height between the interface contaminant and the aqueous phase, Y1 is the admittance data detected by the first detection probe, and Y0′ and K1 are constants related to the dielectric constant of the aqueous phase, the dielectric constant of the interface contaminant, the length of the first effective electrode, and the tank structure.
[0038] The location of the upper interface between the organic phase and the interfacial contaminants can be determined based on formula (4):
[0039] S2=h1+L1+L (4)
[0040] Where h1 satisfies Y2=Y0+K2*h1, h1 is the key parameter of the upper interface height between the organic phase and the interface contaminants, Y2 is the admittance data detected by the second detection probe, and Y0 and K2 are constants related to the dielectric constant of the organic phase, the dielectric constant of the interface contaminants, the length of the second effective electrode, and the tank structure.
[0041] Thirdly, the present invention also provides a material handling method, comprising: obtaining the location of interface contaminants according to the measurement method described in the second aspect; and discharging or destroying the interface contaminants according to their location to prevent them from flowing to the next process flow.
[0042] This invention discloses a device, method, and material handling method for measuring interfacial contaminants. The measuring device includes a radio frequency admittance (RF) component and an analysis module. The RF admittance component includes a first detection probe and a second detection probe. The first detection probe detects admittance data at the lower interface between the interfacial contaminant and the aqueous phase, and the second detection probe detects admittance data at the upper interface between the organic phase and the interfacial contaminant. The analysis module, connected to the RF admittance component, analyzes the accurate location of the interfacial contaminant based on the admittance data detected by the first and second detection probes. Since the dielectric constants of the aqueous phase, organic phase, and interfacial contaminant are different, the location of the interfacial contaminant is determined based on the capacitance principle. Because the interfacial contaminant is relatively thin, an improved dual-bar detection probe is used to acquire measurement data for the upper and lower interfaces of the contaminant. Furthermore, the interfacial contaminant is viscous; by employing RF admittance technology, the influence of material adhering to the measured medium can be eliminated, resulting in high measurement accuracy and strong anti-interference capability, making it suitable for determining the location of interfacial contaminants. Attached Figure Description
[0043] Figure 1This is a schematic diagram of the structure of a device for measuring interface contaminants according to Embodiment 1 of the present invention;
[0044] Figure 2 This is a schematic diagram of the installation structure of a device for measuring interface contaminants according to Embodiment 1 of the present invention;
[0045] Figure 3 This is a schematic diagram of the structure of a radio frequency admittance component according to Embodiment 1 of the present invention;
[0046] Figure 4 This is a schematic diagram of the installation structure of a radio frequency admittance component according to Embodiment 1 of the present invention;
[0047] Figure 5 This is a flowchart illustrating the method for measuring interface contaminants according to Embodiment 2 of the present invention.
[0048] In the figure: L1 - first effective electrode; L3 - second effective electrode; L2 - first shielding section; L4 - second shielding section; H - tank height; h - instrument nozzle height; L - height of the lower edge of the first effective electrode from the bottom plate of the tank; h1 - key parameter of the upper interface height between the organic phase and the interface contaminants; h2 - key parameter of the lower interface height between the interface contaminants and the aqueous phase.
[0049] ①- Areas with low radiation doses where personnel can pass and maintenance can be carried out; ②- High radiation areas; ③- Radiation-resistant cables protected by flexible stainless steel sheaths. Detailed Implementation
[0050] To enable those skilled in the art to better understand the technical solution of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments.
[0051] Example 1:
[0052] This embodiment analyzes the problem of measuring interface contaminants as follows:
[0053] First, the operating conditions to be tested are analyzed. The reprocessing media in nuclear power plants are diverse. Media such as nitric acid aqueous solution are called aqueous media, while organic media such as kerosene are called organic media. The presence of high levels of radioactive radiation causes viscous interfacial contaminants to form between the aqueous and organic phases. Such storage tanks can be considered as having three coexisting media: aqueous phase, organic phase, and interfacial contaminants. The determination of the location of the interfacial contaminants can be transformed into the determination of two interfaces when these three media coexist: the determination of the lower interface between the aqueous phase and the interfacial contaminants, and the determination of the upper interface between the interfacial contaminants and the organic phase.
[0054] Secondly, based on operational requirements, the measurement problem is simplified. Interfacial contaminants are distributed between the aqueous and organic phases, with very small density differences among them. The main hazard during operation is that operators are unaware of the location of these contaminants, making it impossible to completely remove or destroy them. To ensure that interfacial contaminants are completely removed during material unloading or promptly destroyed once they reach a certain thickness, the problem of determining the location of interfacial contaminants is simplified to a two-phase medium with interfacial contaminants, where the location of the contaminants is predictable and exceeds a certain thickness, requiring measurement of the dual interface.
[0055] Secondly, the choice of detection principle. Considering the different dielectric constants of the aqueous phase, organic phase, and interfacial contaminants, using the capacitance principle to determine the location of interfacial contaminants is feasible. Because interfacial contaminants are viscous, the influence of medium adhesion must be minimized during measurement. Since interfacial contaminants are particularly viscous, they will adhere to the capacitor. Because the thickness of the interfacial contaminants is relatively thin, they are difficult to measure. Therefore, without eliminating the influence of adhesion, the location of interfacial contaminants cannot be accurately measured. Radio frequency admittance technology can eliminate the influence of medium adhesion and has the characteristics of high measurement accuracy and strong anti-interference ability, making it suitable for determining the location of interfacial contaminants.
[0056] like Figure 1 As shown, this embodiment provides a device for measuring interface contaminants, including a radio frequency admittance component 11 and an analysis module 12.
[0057] The radio frequency admittance assembly 11 includes a first detection probe 111 and a second detection probe 112. The first detection probe 111 is used to detect admittance data of the position of the lower interface between the interfacial contaminant and the aqueous phase. The second detection probe 112 is used to detect admittance data of the position of the upper interface between the organic phase and the interfacial contaminant.
[0058] Analysis module 12, connected to radio frequency admittance component 11, is used to analyze the location of interface contaminants based on admittance data detected by the first and second detection probes.
[0059] In this embodiment, since it is necessary to measure the position of the medium located in the middle among the three media, the radio frequency admittance component is designed to include a dual-bar detection probe, namely a first detection probe and a second detection probe, for detecting the positions of the upper and lower interfaces respectively. Furthermore, the radio frequency admittance technology can eliminate the influence of material buildup, ensuring the accuracy of the detection results.
[0060] Optionally, such as Figure 2 As shown, the first detection probe includes a first effective electrode, and the second detection probe includes a second effective electrode.
[0061] The upper edge of the first effective electrode and the lower edge of the second effective electrode are on the same horizontal plane.
[0062] In this embodiment, because the thickness of the upper and lower interfaces of the interface contaminants is relatively thin, to accurately measure the position of the upper and lower interfaces of the interface contaminants and to facilitate the installation of the first and second detection probes, the upper edge of the first effective electrode and the lower edge of the second effective electrode are placed on the same horizontal plane. This avoids situations where the first effective electrode is located between the aqueous phase and the interface contaminants, while the second effective electrode penetrates all three phases or is completely located in the organic phase, making it impossible to accurately measure the position of the upper and lower interfaces. It should be noted that if the first detection probe is used to detect the admittance data of the upper interface between the organic phase and the interface contaminants, such as... Figure 3 The diagram shows the arrangement of a first effective electrode and a second effective electrode, with the lower edge of the first effective electrode and the upper edge of the second effective electrode on the same horizontal plane.
[0063] Optionally, the first detection probe further includes a first shielding section, and the second detection probe further includes a second shielding section.
[0064] The first shielding section is connected to the upper end of the first effective electrode, and the length of the first shielding section is determined according to formula (1):
[0065] L2=H+h-L1-L (1)
[0066] The second shielding section is connected to the upper end of the second effective electrode, and the length of the second shielding section is determined according to formula (2):
[0067] L4=H+h-L1-L-L3 (2)
[0068] Wherein, L2 is the length of the first shielding section, L4 is the length of the second shielding section, H is the height of the storage tank, h is the height of the instrument port of the first and second detection probes, L1 is the length of the first effective electrode, L3 is the length of the second effective electrode, and L is the height of the lower edge of the first effective electrode from the bottom plate of the storage tank.
[0069] In this embodiment, the lengths and installation positions of the first and second effective electrodes are customized and determined according to the process measurement and operation requirements. The lengths of the first and second shielding sections can be determined by considering the structure of the tank being measured. The absolute positions of the first and second detection probes depend on the process measurement and operation requirements. For example, the process requires that for a tank with a height of 1500mm, with the bottom of the interface contaminant 100mm above the discharge port, interface contaminants with a thickness exceeding 10mm can be stably measured. In this case, the effective electrode lengths of the first and second detection probes should be 100mm. The second effective electrode for measuring the upper interface is installed at a position 105mm-205mm from the bottom of the tank, and the first effective electrode for measuring the lower interface is installed at a position 5mm-105mm from the bottom of the tank. When the height of the instrument mounting pipe on the tank is 100mm above the top of the equipment, the length of the second shielding section of the second detection probe should be 1395mm, and the length of the first shielding section of the first detection probe should be 1495mm.
[0070] Optionally, the analysis module includes a first analysis unit and a second analysis unit.
[0071] The first analysis unit is used to analyze the location of the lower interface between the interfacial contaminants and the aqueous phase according to formula (3):
[0072] S1=h2+L (3)
[0073] Where h2 satisfies Y1=Y0′+K1*h2, h2 is the key parameter of the lower interface height between the interface contaminant and the aqueous phase, Y1 is the admittance data detected by the first detection probe, and Y0′ and K1 are constants related to the dielectric constant of the aqueous phase, the dielectric constant of the interface contaminant, the length of the first effective electrode, and the tank structure. When the interface changes, the immersion height h2 of the aqueous medium on the first detection probe changes, thereby changing the admittance data Y1. By measuring the admittance data Y1, the key parameter h2 of the lower interface height of the interface contaminant can be obtained, and thus the position of the lower interface can be determined.
[0074] The second analysis unit is used to analyze the position of the upper interface between the organic phase and the interfacial contaminants according to formula (4):
[0075] S2=h1+L1+L (4)
[0076] Where h1 satisfies Y2=Y0+K2*h1, h1 is the key parameter of the upper interface height between the organic phase and the interface contaminant, Y2 is the admittance data detected by the second detection probe, and Y0 and K2 are constants related to the dielectric constant of the organic phase, the dielectric constant of the interface contaminant, the length of the second effective electrode, and the tank structure. When the interface changes, the immersion height h1 of the interface contaminant on the second detection probe changes, thus changing the admittance data Y2. By measuring the admittance data Y2, the key parameter h1 of the upper interface height of the interface contaminant can be obtained, and thus the position of the upper interface can be determined.
[0077] In this embodiment, the admittance measured by the radio frequency admittance component is the reciprocal of the impedance. The impedance is composed of resistive, capacitive and inductive components. In practical applications, the inductive component can be ignored. The radio frequency admittance technology makes the resistive and capacitive components generated by the material cancel each other out. Therefore, the admittance measured by the radio frequency admittance component is the resistance and capacitance of the actual liquid. Formulas (3) and (4) can be obtained through mathematical derivation.
[0078] Optionally, such as Figure 4 As shown, the RF admittance assembly also includes a transmitter and a radiation-resistant cable.
[0079] The transmitter, connected to the first and second detection probes via radiation-resistant cables, is used to convert signals and output the admittance data detected by the first and second detection probes. The transmitter is installed in a low-radioactivity area, while the first and second detection probes are installed in the high-radioactivity area where the storage tank is located.
[0080] In this embodiment, to meet the application requirements of the instrument in a high-radioactive environment, the radiation-sensitive transmitter section is separated from the more radiation-resistant detection probe. The detection probe section is installed in the high-radioactive area where the tank is located, while the transmitter section is installed in a safe area with low radioactivity levels. The two are connected by a radiation-resistant cable protected by a flexible stainless steel sheath. To avoid electronic interference or radiation effects of high radioactivity on the transmitter, the transmitter of the RF admittance assembly is installed in a low-radioactive area, and the cable connecting the detection probe and the transmitter is a radiation-resistant cable (such as a radiation-resistant cable protected by a flexible stainless steel sheath), thereby ensuring the accuracy of the interface contaminant location measurement results. This split-type RF admittance assembly can be applied to other interface measurement conditions with high radioactivity levels or non-radioactive conditions, thus having a wide range of applications.
[0081] This embodiment provides a device for measuring interface contaminants, including a radio frequency (RF) admittance component and an analysis module. The RF admittance component is a separate, shielded, dual-bar detection probe. Since the position of the medium located in the middle of the three media needs to be measured, the RF admittance component is designed to include a dual-bar detection probe, namely a first detection probe and a second detection probe, for detecting the positions of the upper and lower interfaces of the interface contaminants, respectively. Furthermore, the RF admittance technology allows the resistive and capacitive components generated by the material buildup to cancel each other out. Therefore, the admittance measured by the RF admittance component is the actual resistance and capacitance of the liquid. Thus, the influence of material buildup can be eliminated based on RF admittance technology, ensuring the accuracy of the detection results. Further, since the thickness of the upper and lower interfaces of the interface contaminants is relatively thin, to accurately measure the position of the upper and lower interfaces and to facilitate quick installation of the first and second detection probes, the upper edge of the first effective electrode and the lower edge of the second effective electrode are placed on the same horizontal plane. This avoids situations where the first effective electrode is between the aqueous phase and the interface contaminants, while the second effective electrode penetrates all three phases or is completely in the organic phase, making it impossible to accurately measure the position of the upper and lower interfaces. Furthermore, to avoid electronic interference or radiation effects on the transmitter of the radio frequency admittance component caused by high radioactivity, the transmitter of the radio frequency admittance component is installed in a low-radioactivity area, and the cable connecting the detection probe and the transmitter is a radiation-resistant cable (such as a radiation-resistant cable protected by a flexible stainless steel sheath), thereby ensuring the accuracy of the interface contaminant location measurement results. Using the interface contaminant measurement device of this embodiment, the position of the upper and lower interfaces of high-radioactive interface contaminants can be measured. The measurement results can be used to more scientifically guide operation and production, solving the problem of the inability to measure the position of high-radioactive interface contaminants, improving the level of dedicated measurement and control technology in the post-treatment plant, and further meeting the requirements of the post-treatment plant's process production and operation.
[0082] Example 2:
[0083] like Figure 5 As shown, this embodiment provides a method for measuring interface contaminants, using the interface contaminant measuring device as described in Embodiment 1. The measurement method includes:
[0084] Step 201: The first detection probe of the radio frequency admittance assembly acquires admittance data of the position of the lower interface between the interface contaminant and the aqueous phase.
[0085] Step 202: The second detection probe of the radio frequency admittance assembly acquires admittance data at the upper interface position between the organic phase and the interface contaminants.
[0086] Step 203: The analysis module analyzes the location of the interface contaminants based on the admittance data of the lower interface between the interface contaminants and the aqueous phase and the admittance data of the upper interface between the organic phase and the interface contaminants.
[0087] Optionally, the first detection probe includes a first effective electrode and a first shielding section, and the second detection probe includes a second effective electrode and a second shielding section.
[0088] Before the first detection probe of the radio frequency admittance assembly acquires admittance data of the position of the lower interface between the interface contaminant and the aqueous phase, the measurement method further includes: setting the upper edge of the first effective electrode and the lower edge of the second effective electrode to be on the same horizontal plane; and determining the length of the first shielding section and the length of the second shielding section.
[0089] In this embodiment, as Figure 3 As shown, one end of the first shielding section is connected to the upper end of the first effective electrode, and one end of the second shielding section is connected to the upper end of the second effective electrode. Based on the process measurement and operation requirements, the lengths and installation positions of the first and second effective electrodes are determined. Then, combined with the structure of the tank under test, the lengths of the first and second shielding sections are determined, thus determining the installation positions of the first and second detection probes.
[0090] Optionally, determining the length of the first shielding segment and the length of the second shielding segment specifically includes:
[0091] The length of the first shielding section of the RF admittance assembly is determined according to formula (1):
[0092] L2=H+h-L1-L (1)
[0093] The length of the second shielding section of the RF admittance assembly is determined according to formula (2):
[0094] L4=H+h-L1-L-L3 (2)
[0095] Wherein, L2 is the length of the first shielding section, L4 is the length of the second shielding section, H is the height of the storage tank, h is the height of the instrument port of the first and second detection probes, L1 is the length of the first effective electrode, L3 is the length of the second effective electrode, and L is the height of the lower edge of the first effective electrode from the bottom plate of the storage tank.
[0096] Optionally, the step of analyzing the location of the interfacial contaminants based on admittance data of the lower interface between the interfacial contaminants and the aqueous phase and admittance data of the upper interface between the organic phase and the interfacial contaminants specifically includes:
[0097] The location of the lower interface between the interfacial contaminants and the aqueous phase is determined based on formula (3):
[0098] S1=h2+L (3)
[0099] Where h2 satisfies Y1=Y0′+K1*h2, h2 is the key parameter of the lower interface height between the interface contaminant and the aqueous phase, Y1 is the admittance data detected by the first detection probe, and Y0′ and K1 are constants related to the dielectric constant of the aqueous phase, the dielectric constant of the interface contaminant, the length of the first effective electrode, and the tank structure.
[0100] The location of the upper interface between the organic phase and the interfacial contaminants can be determined based on formula (4):
[0101] S2=h1+L1+L (4)
[0102] Where h1 satisfies Y2=Y0+K2*h1, h1 is the key parameter of the upper interface height between the organic phase and the interface contaminants, Y2 is the admittance data detected by the second detection probe, and Y0 and K2 are constants related to the dielectric constant of the organic phase, the dielectric constant of the interface contaminants, the length of the second effective electrode, and the tank structure.
[0103] The interface contaminant measurement method in this embodiment can solve the problem of the inability to measure the location of interface contaminants in the post-processing process, further improve the level of post-processing measurement and control technology, provide more scientific guidance for production operation, and further meet the requirements of post-processing plant process production operation.
[0104] Example 3:
[0105] This embodiment provides a material handling method, including:
[0106] Step 301: Obtain the location of interface contaminants according to the measurement method described in Example 2.
[0107] Step 302: Discharge or destroy the interface contaminant according to its location to prevent it from flowing to the next process.
[0108] The material handling method in this embodiment can accurately measure the location of interface contaminants, thus achieving thorough treatment of interface contaminants and preventing incomplete treatment of interface contaminants from flowing into subsequent processes, which would have a significant impact on the normal operation of production.
[0109] It is understood that the above embodiments are merely exemplary implementations used to illustrate the principles of the present invention, and the present invention is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also considered to be within the scope of protection of the present invention.
Claims
1. A measuring device for interface contaminants, characterized in that, Includes radio frequency admittance components and analysis modules. The radio frequency admittance assembly includes a first detection probe and a second detection probe. The first detection probe includes a first effective electrode, and the second detection probe includes a second effective electrode. The upper edge of the first effective electrode and the lower edge of the second effective electrode are on the same horizontal plane. The first detection probe is used to detect admittance data of the lower interface position between the interface contaminants and the aqueous phase. The second detection probe is used to detect admittance data at the upper interface between the organic phase and the interfacial contaminants. The analysis module, connected to the RF admittance assembly, is used to analyze the location of interface contaminants based on the admittance data detected by the first and second detection probes. The analysis module includes a first analysis unit and a second analysis unit. The first analysis unit is used to analyze the location of the lower interface between the interfacial contaminants and the aqueous phase according to formula (3): S1=h2+L (3) Where h2 satisfies Y1=Y0'+K1*h2, h2 is the key parameter of the lower interface height between the interface contaminant and the aqueous phase, Y1 is the admittance data detected by the first detection probe, and Y0' and K1 are constants related to the dielectric constant of the aqueous phase, the dielectric constant of the interface contaminant, the length of the first effective electrode, and the tank structure. The second analysis unit is used to analyze the position of the upper interface between the organic phase and the interfacial contaminants according to formula (4): S2=h1+L1+L (4) Where h1 satisfies Y2=Y0+K2*h1, h1 is the key parameter of the upper interface height between the organic phase and the interface contaminants, Y2 is the admittance data detected by the second detection probe, Y0 and K2 are constants related to the dielectric constant of the organic phase, the dielectric constant of the interface contaminants, the length of the second effective electrode, and the tank structure, L is the height of the lower edge of the first effective electrode from the bottom plate of the tank, and L1 is the length of the first effective electrode.
2. The apparatus according to claim 1, characterized in that, The first detection probe also includes a first shielding section, and the second detection probe also includes a second shielding section. The first shielding section is connected to the upper end of the first effective electrode, and the length of the first shielding section is determined according to formula (1): L2 = H + h - L1 - L (1) The second shielding section is connected to the upper end of the second effective electrode, and the length of the second shielding section is determined according to formula (2): L4 = H + h - L1 - L - L3 (2) Where L2 is the length of the first shielding section, L4 is the length of the second shielding section, H is the height of the storage tank, h is the height of the instrument port of the first and second detection probes, and L3 is the length of the second effective electrode.
3. The apparatus according to claim 1, characterized in that, The radio frequency admittance assembly also includes a transmitter and radiation-resistant cables. The transmitter, connected to the first and second detection probes via radiation-resistant cables, is used to convert signals and output the admittance data detected by the first and second detection probes. The transmitter is used to be installed in a low-radioactivity area, while the first and second detection probes are used to be installed in the high-radioactivity area where the storage tank is located.
4. A measurement method using the measuring device for interface contaminants as described in claim 1, wherein a first detection probe includes a first effective electrode, and a second detection probe includes a second effective electrode, characterized in that, include: The upper edge of the first effective electrode and the lower edge of the second effective electrode are set to be on the same horizontal plane. The first detection probe of the radio frequency admittance assembly acquires admittance data of the position of the lower interface between the interface contaminant and the aqueous phase; The second detection probe of the radio frequency admittance assembly acquires admittance data at the upper interface position between the organic phase and the interfacial contaminants; The analysis module analyzes the location of the interfacial contaminants based on the admittance data of the lower interface between the interfacial contaminants and the aqueous phase, and the admittance data of the upper interface between the organic phase and the interfacial contaminants. The location of the lower interface between the interfacial contaminants and the aqueous phase is determined by formula (3): S1=h2+L (3) Where h2 satisfies Y1=Y0'+K1*h2, h2 is the key parameter of the lower interface height between the interface contaminant and the aqueous phase, Y1 is the admittance data detected by the first detection probe, and Y0' and K1 are constants related to the dielectric constant of the aqueous phase, the dielectric constant of the interface contaminant, the length of the first effective electrode, and the tank structure. The location of the upper interface between the organic phase and the interfacial contaminants can be determined using formula (4): S2=h1+L1+L (4) Where h1 satisfies Y2=Y0+K2*h1, h1 is the key parameter of the upper interface height between the organic phase and the interface contaminants, Y2 is the admittance data detected by the second detection probe, Y0 and K2 are constants related to the dielectric constant of the organic phase, the dielectric constant of the interface contaminants, the length of the second effective electrode, and the tank structure, L is the height of the lower edge of the first effective electrode from the bottom plate of the tank, and L1 is the length of the first effective electrode.
5. The method according to claim 4, characterized in that, The first detection probe includes a first shielding section, and the second detection probe includes a second shielding section. Before the first detection probe of the radio frequency admittance assembly acquires admittance data of the location of the lower interface between the interfacial contaminant and the aqueous phase, the assembly further includes: Determine the length of the first shielding segment and the length of the second shielding segment.
6. The method according to claim 5, characterized in that, Determining the length of the first shielding segment and the length of the second shielding segment specifically includes: The length of the first shielding section of the RF admittance assembly is determined according to formula (1): L2 = H + h - L1 - L (1) The length of the second shielding section of the RF admittance assembly is determined according to formula (2): L4 = H + h - L1 - L - L3 (2) Where L2 is the length of the first shielding section, L4 is the length of the second shielding section, H is the height of the storage tank, h is the height of the instrument port of the first and second detection probes, and L3 is the length of the second effective electrode.
7. A material handling method, characterized in that, include: The measurement method according to any one of claims 4-6 obtains the location of interface contaminants; The interface contaminants are drained or destroyed based on their location to prevent them from flowing to the next process step.
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