一种多功能集成的PVD镀膜设备
By integrating magnetron sputtering, resistance evaporation and electron beam evaporation technologies, a multifunctional PVD coating equipment has been developed, solving the problems of high cost and large footprint caused by equipment independence, and realizing efficient and continuous coating production and quality control.
CN117127157BActive Publication Date: 2026-07-17BEIJING VIKAITECH CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- BEIJING VIKAITECH CO LTD
- Filing Date
- 2023-08-21
- Publication Date
- 2026-07-17
Smart Images
Figure CN117127157B_ABST
Abstract
本发明属于PVD真空镀膜设备技术领域，具体公开了一种多功能集成的PVD镀膜设备，包括传送系统，单靶磁控垂直溅射室，多靶磁控共焦溅射室，电子束蒸发室，电阻蒸发室；四个工艺腔室均和传送系统连接。所述传送系统块包括进样室和传送室；进样室内部含有用于承载工件的多片装置，进样室和传送室之间由高真空隔离阀连接；传送室中设有可将工件传送至单个工艺腔室或进样室的机械手；进样室、传送室和四个工艺腔室均设有独立真空系统；四个工艺腔室由高真空隔离阀和传送室进行连接或隔离并可独立进行镀膜工艺，本发明可同时实现磁控垂直溅射、共焦溅射、电阻蒸发、电子束蒸发工艺，可不间断生产，提高了生产效率。
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