A lateral shearing interferometer and wavefront aberration detection method

CN117146992BActive Publication Date: 2026-07-14ZHEJIANG UNIV

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
ZHEJIANG UNIV
Filing Date
2023-09-27
Publication Date
2026-07-14

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Abstract

The application discloses a lateral shearing interferometer and a wave aberration detection method, and relates to the field of optical measurement. The lateral shearing interferometer comprises optical illumination systems, an object plane grating, an image plane grating, an optical detection element and a computer processing system which are sequentially arranged. The object plane grating and the image plane grating are both chessboard gratings. An optical system to be measured is arranged between the object plane grating and the image plane grating. The application can reduce operation complexity, and a phase shifter only needs one-dimensional phase shifting to solve the wave front to be measured with high precision, and does not need to add additional elements, and the structure is simple.
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