Method for manufacturing display panel, display panel and display device

Abstract

The application provides a display panel preparation method, a display panel and a display device. The preparation method comprises: sequentially stacking a metal layer, a passivation layer and a planarization layer on an array substrate; performing a patterning process on the planarization layer to form a through slot; forming an initial recess on the passivation layer by a first patterning process, the orthographic projection of the initial recess on the array substrate is located within the orthographic projection of the through slot on the array substrate, and the bottom surface of the initial recess is higher than the top surface of the metal layer in the direction of the array substrate pointing to the planarization layer; forming a first recess on the passivation layer and a lens array on the planarization layer by a second patterning process, the side of the first recess close to the array substrate exposes at least part of the metal layer, and the orthographic projection of the initial recess on the array substrate at least partially overlaps the orthographic projection of the first recess on the array substrate. The method can avoid oxidation caused by the exposure of the surface of the metal layer and avoid contamination or damage of the lens array.

Description

Technical Field

[0001] This application relates to the field of display technology, specifically to a method for manufacturing a display panel, a display panel, and a display device. Background Technology

[0002] OLED (Organic Light Emitting Diode) products typically employ lens structures to improve light extraction efficiency and reduce power consumption. However, during the display panel fabrication process, if, due to limitations in the manufacturing process, photoresist is directly applied to the lens structure surface after patterning other film layers following the formation of the lens structure, it can easily put pressure on the lens structure, leading to lens damage. Additionally, if the metal layers in the display panel are exposed prematurely during the fabrication process, the exposed metal layers are prone to oxidation and corrosion upon contact with moisture in the air, resulting in poor contact of subsequent electrodes. Summary of the Invention

[0003] This application addresses the shortcomings of related technologies by proposing a method for manufacturing a display panel, a display panel, and a display device to solve the problems of easy damage to the lens structure and easy exposure and oxidation of the metal layer in the display panel.

[0004] This application provides a method for manufacturing a display panel, comprising the following steps:

[0005] A metal layer, a passivation layer, and a planarization layer are sequentially stacked on the array substrate;

[0006] The planarization layer is patterned to form through slots;

[0007] An initial groove is formed on the passivation layer through a first patterning process. The orthographic projection of the initial groove on the array substrate is located within the orthographic projection of the through slot on the array substrate. Along the direction from the array substrate to the planarization layer, the bottom surface of the initial groove is higher than the top surface of the metal layer.

[0008] A first groove is formed on the passivation layer by a second patterning process, and a lens array is formed on the planarization layer. The side of the first groove near the array substrate exposes at least a portion of the metal layer. The orthographic projection of the initial groove on the array substrate at least partially overlaps with the orthographic projection of the first groove on the array substrate.

[0009] This embodiment employs a two-step patterning process. First, an initial groove is formed using a first patterning process. This initial groove does not expose the metal layer surface, allowing the passivation layer to still cover the metal layer, thus preventing oxidation caused by metal layer exposure. Then, a second patterning process is used to form the first groove and the lens array. Since the initial groove and the first groove at least partially overlap along the direction from the array substrate to the planarization layer, the initial groove can pre-thin the passivation layer of the display panel to a certain extent. Even when the etching rate of the passivation layer is slower than that of the planarization layer, the formed lens structure is prevented from being prematurely exposed to the external environment, avoiding contamination or damage to the lens array. Simultaneously, after performing the second patterning process on both the passivation layer and the planarization layer, the passivation layer exposes the metal layer for electrical connection with the electrode layer in subsequent processes. Furthermore, processing both simultaneously avoids the problem of damage to the lens structure that occurs when the passivation layer is patterned first in traditional processes.

[0010] In one embodiment, forming an initial groove on the passivation layer through a first patterning process and forming a first groove on the passivation layer through a second patterning process includes:

[0011] The first layer of grooves is formed through the first patterning process;

[0012] The second patterning process forms a second layer of grooves, the orthographic projection of the second layer of grooves on the array substrate is located within the orthographic projection of the first layer of grooves on the array substrate, and the first layer of grooves and the second layer of grooves together constitute the first groove.

[0013] In one embodiment, forming an initial groove on the passivation layer through a first patterning process and forming a first groove on the passivation layer through a second patterning process includes:

[0014] The first patterning process forms a sacrificial groove on the passivation layer;

[0015] The first groove is formed by the second patterning process, and the orthogonal projection of the sacrificial groove on the array substrate is located within the orthogonal projection of the first groove on the array substrate.

[0016] In one embodiment, forming the first groove on the passivation layer and forming the lens array on the planarization layer by a second patterning process includes:

[0017] A multi-segment transmittance mask is used to perform a second patterning process on the passivation layer and the planarization layer, forming a first groove on the passivation layer and forming the lens array on the planarization layer. The multi-segment transmittance mask includes a first transmittance region and a second transmittance region, with the first transmittance region corresponding to the first groove and the second transmittance region corresponding to the lens array.

[0018] In one embodiment, after forming the first groove on the passivation layer through a second patterning process and forming the lens array on the planarization layer, the process further includes:

[0019] A first electrode layer is formed on the side of the planarization layer away from the passivation layer. The first electrode layer is connected to the metal layer in sequence through the through groove and the first recess. The shape of the surface of the first electrode layer near the lens array is adapted to the shape of the lens array. The refractive index of the first electrode layer is not equal to the refractive index of the lens array.

[0020] In one embodiment, after forming the first electrode layer on the side of the planarization layer opposite to the passivation layer, the method further includes:

[0021] A pixel defining layer is formed on the side of the first electrode layer away from the planarization layer. The pixel defining layer includes a plurality of pixel openings arranged in an array. The orthographic projection of the lens array on the array substrate at least partially overlaps with the orthographic projection of the pixel openings on the array substrate.

[0022] In one embodiment,

[0023] The process of patterning the planarization layer to form a through-groove; and the process of forming an initial groove on the passivation layer through a first patterning process, includes:

[0024] A multi-segment transmittance mask is used to pattern the planarization layer and the passivation layer, so that the planarization layer forms a through groove while the passivation layer forms an initial groove.

[0025] This application also provides a second method for manufacturing a display panel, comprising the following steps:

[0026] A metal layer and a passivation layer are sequentially stacked on the array substrate;

[0027] An initial groove is formed on the passivation layer through a first patterning process, and the bottom surface of the initial groove is higher than the top surface of the metal layer in the direction from the array substrate to the planarization layer.

[0028] A planarization layer is formed on the passivation layer;

[0029] The planarization layer and the passivation layer are subjected to a second patterning process; the planarization layer is formed into a through-slot and a lens array, and a first groove is formed on the passivation layer, wherein at least a portion of the metal layer is exposed on the side of the first groove near the array substrate, and the orthogonal projections of the through-slot, the first groove and the initial groove on the array substrate at least partially overlap.

[0030] In one embodiment, performing a second patterning process on the planarization layer and the passivation layer includes:

[0031] A multi-segment transmittance mask is used to perform a second patterning process on the planarization layer and the passivation layer, forming a through-slot and a lens array on the planarization layer, and forming a first groove on the passivation layer; the multi-segment transmittance mask includes a third transmittance region, a fourth transmittance region and a fifth transmittance region, the third transmittance region corresponds to the first groove, the fourth transmittance region corresponds to the area of ​​the through-slot other than the first groove, and the fifth transmittance region corresponds to the lens array.

[0032] This application also provides a display panel, comprising an array substrate, a metal layer, a passivation layer, and a planarization layer stacked sequentially; the passivation layer has a first groove, and the planarization layer has a through-slot penetrating the planarization layer and a lens array with its opening direction pointing from the passivation layer to the planarization layer; the orthographic projection of the first groove on the array substrate lies within the orthographic projection of the through-slot on the array substrate, wherein...

[0033] The first groove includes a first layer of groove and a second layer of groove that pass through sequentially along the passivation layer toward the array substrate; along the direction from the array substrate toward the planarization layer, the interface formed between the first layer of groove and the second layer of groove is higher than the surface of the metal layer near the planarization layer, and the side of the second layer of groove near the array substrate exposes at least a portion of the metal layer.

[0034] Compared to the structure formed by patterning the planarization layer and passivation layer using ordinary photomasks or multi-segment transmittance photomasks in related technologies, the display panel provided in this embodiment has a higher structural integrity of the lens array, and the metal layer has a lower probability of oxidation.

[0035] In one embodiment, at least one side of the first groove is a stepped surface that tapers towards the array substrate from the passivation layer, and the orthographic projection of the first layer groove on the array substrate is greater than the orthographic projection of the second layer groove on the array substrate.

[0036] In one embodiment, the greater the depth ratio of the second layer groove to the lens array along the direction from the array substrate to the planarization layer, the greater the etching selectivity ratio of the passivation layer to the planarization layer.

[0037] In one embodiment, the display panel further includes a first electrode layer located on the side of the planarization layer opposite to the passivation layer. The first electrode layer is connected to the metal layer sequentially through the through-slot and the first groove. Along the direction from the array substrate to the planarization layer, the shape of the surface of the first electrode layer near the lens array is adapted to the shape of the lens array. The refractive index of the first electrode layer is not equal to the refractive index of the lens array.

[0038] The shape of the side surface of the first electrode layer facing away from the lens array is the same as the shape of the lens array;

[0039] Alternatively, the surface of the first electrode layer facing away from the lens array may be flat.

[0040] In one embodiment, the display panel further includes a pixel defining layer located on the side of the first electrode layer opposite to the planarization layer, the pixel defining layer including a plurality of pixel openings arranged in an array, the orthographic projection of the lens array on the array substrate at least partially overlapping the orthographic projection of the pixel openings on the array substrate.

[0041] In one embodiment, the first groove is formed by a patterning process using a multi-segment transmittance mask.

[0042] Alternatively, the first layer of grooves and the through grooves are formed by a patterning process using the multi-segment transmittance mask.

[0043] Alternatively, the first groove and the through groove are formed by a patterning process using the multi-segment transmittance mask.

[0044] This application also provides a display device, including a display panel as provided in the foregoing embodiments or a display panel prepared by the preparation method of the display panel provided in the foregoing embodiments.

[0045] Additional aspects and advantages of this application will be set forth in part in the description which follows, and will become apparent from the description or may be learned by practice of this application. Attached Figure Description

[0046] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this application and, together with the description, serve to explain the principles of this application.

[0047] Figure 1The image shown is a schematic diagram of the cross-sectional area of ​​the film layer in a display panel in the related technology;

[0048] Figures 2a to 2g The figure shown is a schematic diagram of the film layer cross-section in each step of a method for preparing a display panel provided in this embodiment;

[0049] Figures 3a-3b The figure shown is a schematic cross-sectional view of the film layer in some steps of another method for preparing a display panel provided in this embodiment;

[0050] Figure 4 The diagram shown is a cross-sectional view of the film layer in some steps of another method for preparing a display panel provided in this embodiment;

[0051] Figures 5a-5d The diagram shown is a cross-sectional view of the film layer in some steps of another method for preparing a display panel provided in this embodiment;

[0052] Figure 6 The figure shown is a schematic cross-sectional view of the film layer of a display panel provided in this embodiment;

[0053] Figure 7 The figure shown is a schematic cross-sectional view of the film layer of another display panel provided in this embodiment;

[0054] Figure 8 The figure shown is a schematic cross-sectional view of the film layer of another display panel provided in this embodiment;

[0055] Figure 9 The diagram shown is a schematic diagram of the layout structure of a display panel provided in this embodiment.

[0056] In the figure: 1-array substrate; 2-metal layer; 3-passivation layer; 30-first groove; 31-first layer groove; 32-second layer groove; 301-initial groove; 301'-sacrificial groove; 4-planarization layer; 40-through groove; 41-lens array; 5-first electrode layer; 6-pixel defining layer; 61-pixel defining unit; 7-planar structure; 8-photoresist; 9-multi-segment transmittance mask. Detailed Implementation

[0057] Exemplary embodiments will now be described in detail, examples of which are illustrated in the accompanying drawings. When the following description relates to the drawings, unless otherwise indicated, the same numerals in different drawings denote the same or similar elements. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with this application. Rather, they are merely examples of apparatuses and methods consistent with some aspects of this application as detailed in the appended claims.

[0058] The terminology used in this application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. The singular forms “a,” “the,” and “the” used in this application and the appended claims are also intended to include the plural forms unless the context clearly indicates otherwise. It should also be understood that the term “and / or” as used herein refers to and includes any or all possible combinations of one or more of the associated listed items.

[0059] It should be understood that when describing the structure of a component, when referring to a layer or region as being "above" or "on top of" another layer or region, it can mean that it is directly above the other layer or region, or that it contains other layers or regions between it and the other layer or region. Furthermore, if the component is flipped over, that layer or region will be located "below" or "under" the other layer or region.

[0060] In the preparation process of related technologies, combined with Figure 1 As shown, the typical fabrication process follows these steps: forming an array substrate 1 - forming a metal layer 2 - forming a passivation layer 3 - forming a planarization layer 4 - patterning the planarization layer 4 - patterning the passivation layer 3 - forming a first electrode layer 5 - forming a pixel defining layer 6. The lens array 41 is formed during the patterning of the planarization layer 4. However, when the passivation layer 3 is subsequently patterned, the already formed lens array 41 is simultaneously subjected to cleaning, resist coating, exposure, development, dry etching, and stripping processes. The resist coating process involves pressure, which can easily damage the structure of the lens array 41. In another fabrication method, the passivation layer 3 is patterned first, followed by the planarization layer 4, simultaneously forming the lens array 41. While this avoids damage to the lens array 41 from the photolithography process in the passivation layer 3, the initial patterning of the passivation layer 3 exposes the metal layer 2 to the external environment prematurely. This exposure can lead to oxidation of the bare metal layer 2 during the subsequent patterning of the planarization layer 4, resulting in poor contact. Furthermore, if the planarization layer 4 and the passivation layer 3 are patterned simultaneously, in general, the planarization layer 4 is an organic material and the passivation layer 3 is an inorganic material. The etching rate of the planarization layer 4 is faster than that of the passivation layer 3. Therefore, in the actual photolithography process, the lens structure is formed in advance. However, at this time, the passivation layer 3 is still being patterned. Thus, the lens structure is exposed to the external environment in advance and is at risk of being damaged by external environmental factors.

[0061] The method for manufacturing the display panel, the display panel, and the display device provided in this application are intended to solve the above-mentioned technical problems in the related art.

[0062] The following detailed description, with reference to the accompanying drawings, describes the method for manufacturing the display panel, the display panel itself, and the display device according to the embodiments of this application. Unless otherwise specified, the features in the following embodiments may complement or combine with each other.

[0063] This application provides a method for manufacturing a display panel, such as... Figures 2a-2e As shown, it includes the following steps:

[0064] Step 100: As Figure 2a As shown, a metal layer 2, a passivation layer 3, and a planarization layer 4 are sequentially stacked on the array substrate 1.

[0065] Step 200: As Figure 2b As shown, the planarization layer 4 is patterned to form a through-slot 40;

[0066] Step 300: As Figure 2c As shown, an initial groove 301 is formed on the passivation layer 3 through the first patterning process. The orthographic projection of the initial groove 301 on the array substrate 1 is located within the orthographic projection of the through groove 40 on the array substrate 1. Along the direction from the array substrate 1 to the planarization layer 4, the bottom surface of the initial groove 301 is higher than the top surface of the metal layer 2.

[0067] Step 400: As Figures 2d to 2e or Figures 3a-3b As shown, a first groove 30 is formed on the passivation layer 3 and a lens array 41 is formed on the planarization layer 4 through a second patterning process. At least part of the metal layer 2 is exposed on the side of the first groove 30 near the array substrate 1. The orthographic projection of the initial groove 301 on the array substrate 1 at least partially overlaps with the orthographic projection of the first groove 30 on the array substrate 1.

[0068] In this embodiment, a two-step patterning process is employed. Specifically, in step 300, a first patterning process is used to form an initial groove 301. The initial groove 301 does not expose the surface of the metal layer 2, allowing the passivation layer 3 to still cover the metal layer 2, thus preventing oxidation caused by exposure of the metal layer 2 surface. Then, in step 400, a second patterning process is used to form a first groove 30 and a lens array 41. Since the initial groove 301 and the first groove 30 overlap at least partially along the direction from the array substrate 1 to the planarization layer 4, the initial groove 301 can pre-thin the passivation layer 3 of the display panel to a certain extent. Even if the etching rate of the passivation layer 3 is slower than that of the planarization layer 4, the formed lens structure can be prevented from being exposed to the external environment in advance, thus preventing the lens array 41 from being contaminated or damaged. Meanwhile, after performing a second patterning process on both the passivation layer 3 and the planarization layer 4, the passivation layer 3 exposes the metal layer 2 for electrical connection with the electrode layer in subsequent processes. Furthermore, processing both simultaneously avoids the problem of damage to the lens structure that would occur if the passivation layer 3 was patterned first in the traditional process.

[0069] In some embodiments, the processes for the first and second patterning processes can be photolithography.

[0070] In some embodiments, steps 300 to 400, forming an initial groove 301 on the passivation layer 3 through a first patterning process, and forming a first groove 30 on the passivation layer 3 through a second patterning process specifically include:

[0071] Step 310: As Figure 2d As shown, the first layer of grooves 31 is formed through the first patterning process;

[0072] Step 410: As Figure 2e As shown, a second layer of groove 32 is formed through a second patterning process. The orthographic projection of the second layer of groove 32 on the array substrate 1 is located within the orthographic projection of the first layer of groove 31 on the array substrate 1. The first layer of groove 31 and the second layer of groove 32 together constitute the first groove 30.

[0073] In this embodiment, on the one hand, a first-layer groove 31 with a relatively large opening can be formed first, and then a second-layer groove 32 with a relatively small opening can be formed on the basis of the first-layer groove 31. The two together form a stepped groove, which can reduce the slope of the first groove 30, making the structure of the first groove 30 more gentle and enhancing the structural stability. At the same time, it can avoid the risk of the first electrode layer 5 formed above the first groove 30 breaking due to the slope, which would further cause poor contact. On the other hand, the first-layer groove 31 and the second-layer groove 32 can form a side that partially overlaps along the direction of the array substrate 1 towards the passivation layer 3. Those skilled in the art can flexibly set it according to the actual situation. It should be noted that in the actual manufacturing process, due to equipment factors, there may always be a step difference between the first-layer groove 31 and the second-layer groove 32 in the final structure due to equipment or human error. However, it is undeniable that in some cases, such as Figure 6 As shown, the first groove 31 and the second groove 32 can form a side surface that partially overlaps with the direction of the array substrate 1 toward the passivation layer 3.

[0074] In other embodiments, steps 300 to 400, forming an initial groove 301 on the passivation layer 3 through a first patterning process, and forming a first groove 30 on the passivation layer 3 through a second patterning process, includes:

[0075] Step 310': As Figure 3a As shown, a sacrificial groove 301' is formed on the passivation layer 3 through a first patterning process;

[0076] Step 410': As Figure 3b As shown, the first groove 30 is formed by a second patterning process, and the orthographic projection of the sacrificial groove 301' on the array substrate 1 is located within the orthographic projection of the first groove 30 on the array substrate 1.

[0077] In this embodiment, a sacrificial groove 301' can be formed first using a mask template with a relatively small opening, and then a first groove 30 can be formed on the basis of the sacrificial groove 301' using a mask template with a relatively large opening. The final structure of the first groove 30 is also a stepped groove (e.g., ...). Figure 2e As shown in the figure, the beneficial effects are the same as those in the aforementioned embodiments, and will not be repeated here. The settings can be flexibly adjusted according to actual circumstances.

[0078] In some embodiments, step 400, forming a first groove 30 on the passivation layer 3 and forming a lens array 41 on the planarization layer 4 through a second patterning process, specifically includes:

[0079] like Figures 2d to 2e or Figures 3a-3bAs shown, a multi-segment transmittance mask 9 is used to perform a second patterning process on the passivation layer 3 and the planarization layer 4. A first groove 30 is formed on the passivation layer 3, and a lens array 41 is formed on the planarization layer 4. The multi-segment transmittance mask 9 includes a first transmittance region A1 and a second transmittance region A2. The first transmittance region corresponds to the first groove 30, and the second transmittance region corresponds to the lens array 41. Exemplarily, after coating the planarization layer 4 with photoresist 8 using photolithography, exposure, development, etching, and other processes are performed.

[0080] In this embodiment, a multi-segment transmittance mask 9 is used to apply different levels of exposure to the photoresist 8 at different locations. Therefore, it is possible to form structures of different shapes simultaneously, that is, to form the first groove 30 and the lens array 41 simultaneously, which can avoid the problem of subsequent damage to the lens structure when the passivation layer 3 is patterned first in the traditional process.

[0081] In some embodiments, the multi-segment transmittance mask 9 includes a half-tone mask and a gray-tone mask. The lens array 41 may include a microlens array (MLA).

[0082] In some embodiments, after forming the first groove 30 on the passivation layer 3 and the lens array 41 on the planarization layer 4 through the second patterning process in step 400, the method further includes:

[0083] Step 500: As Figure 2f As shown, a first electrode layer 5 is formed on the side of the planarization layer 4 away from the passivation layer 3. The first electrode layer 5 is connected to the metal layer 2 in sequence through the through groove 40 and the first groove 30. The shape of the surface of the first electrode layer 5 near the lens array 41 is adapted to the shape of the lens array 41. The refractive index of the first electrode layer 5 is not equal to the refractive index of the lens array 41.

[0084] In this embodiment, the first electrode layer 5 and the lens array 41 are adapted to form a lens structure, which is beneficial for the light-emitting layer formed on the first electrode layer 5 to better concentrate light when emitting from the bottom, thereby improving the light output rate.

[0085] In some embodiments, after forming the first electrode layer 5 on the side of the planarization layer 4 opposite to the passivation layer 3, step 500 further includes:

[0086] Step 600: As Figure 2g As shown, a pixel defining layer 6 is formed on the side of the first electrode layer 5 away from the planarization layer 4. The pixel defining layer 6 includes a plurality of pixel openings arranged in an array. The orthographic projection of the lens array 41 on the array substrate 1 at least partially overlaps with the orthographic projection of the pixel openings on the array substrate 1.

[0087] In this embodiment, by making the lens array 41 and the pixel opening at least partially correspond, the lens array 41 can directly adjust the light emitted by the light-emitting layer, thereby further improving the light output rate and reducing energy consumption.

[0088] In some embodiments, steps 200 and 300 in this embodiment can be combined into one step, such as... Figure 4 As shown, a multi-segment transmittance mask 9 is used to pattern the planarization layer 4 and the passivation layer 3, so that the planarization layer 4 forms a through groove 40, while the passivation layer also forms an initial groove 301.

[0089] In this embodiment, a multi-segment transmittance mask 9 is used to simultaneously process the planarization layer 4 and the passivation layer 3, thereby forming a through groove 40 and an initial groove 301, which simplifies the preparation process and improves the preparation efficiency.

[0090] Based on the same inventive concept, this application also provides another method for manufacturing a display panel, such as... Figures 5a-5d as well as Figure 2e As shown (it should be noted that this embodiment is the same as the one described above) Figures 2a-2e The basic embodiment shown differs in that the basic embodiment is as follows: Figures 2a to 2d The steps shown are replaced with the following: Figures 5a-5d The corresponding steps shown result in a final structure that is similar to... Figure 2e (The structure is the same as in the previous text), including the following steps:

[0091] Step 100': As Figure 5a As shown, a metal layer 2 and a passivation layer 3 are sequentially stacked on the array substrate 1;

[0092] Step 200': As Figure 5b As shown, an initial groove 301 is formed on the passivation layer 3 through a first patterning process. Along the direction from the array substrate 1 to the planarization layer 4, the bottom surface of the initial groove 301 is higher than the top surface of the metal layer 2.

[0093] Step 300': As Figure 5c As shown, a planarization layer 4 is formed on the passivation layer 3;

[0094] Step 400': As Figure 5d and Figure 2e As shown, the planarization layer 4 and the passivation layer 3 are subjected to a second patterning process; the planarization layer 4 forms a through groove 40 and a lens array 41, and the passivation layer 3 forms a first groove 30, wherein the side of the first groove 30 near the array substrate 1 exposes at least part of the metal layer 2, and the orthographic projections of the through groove 40, the first groove 30 and the initial groove 301 on the array substrate 1 at least partially overlap.

[0095] In this embodiment, a passivation layer 3 is first formed and then patterned to form an initial groove 301. The initial groove 301 does not expose the metal layer 2. Then, a planarization layer 4 is formed and patterned to form a through groove 40 and the first groove 30. Thus, the same principle can be achieved: the lens structure can be protected while protecting the metal layer 2.

[0096] In some embodiments, step 400' specifically includes:

[0097] like Figure 5d As shown, a multi-segment transmittance mask 9 is used to perform a second patterning process on the planarization layer 4 and the passivation layer 3, forming a through groove 40 and a lens array 41 on the planarization layer 4, and forming a first groove 30 on the passivation layer 3; the multi-segment transmittance mask 9 includes a third transmittance region A3, a fourth transmittance region A4 and a fifth transmittance region A5, the third transmittance region A3 corresponds to the first groove 30, the fourth transmittance region A4 corresponds to the area of ​​the through groove 40 other than the first groove 30, and the fifth transmittance region A5 corresponds to the lens array 41.

[0098] Based on the same inventive concept, this application also provides a display panel, such as... Figure 2e As shown, the array includes an array substrate 1, a metal layer 2, a passivation layer 3, and a planarization layer 4 stacked sequentially. The passivation layer 3 has a first groove 30, and the planarization layer 4 has a through groove 40 penetrating the planarization layer 4 and a lens array 41 with its opening direction pointing from the passivation layer 3 to the planarization layer 4. The orthographic projection of the first groove 30 on the array substrate 1 is located within the orthographic projection of the through groove 40 on the array substrate 1. The first groove 30 includes a first layer groove 31 and a second layer groove 32 that penetrate sequentially along the direction from the passivation layer 3 to the array substrate 1. Along the direction from the array substrate 1 to the planarization layer 4, the interface formed between the first layer groove 31 and the second layer groove 32 is higher than the surface of the metal layer 2 near the planarization layer 4, and the side of the second layer groove 32 near the array substrate 1 exposes at least part of the metal layer 2.

[0099] Considering that if the lens array 41 is formed prematurely, it will be easily affected by the pressure of the photoresist 8 in the photolithography process and other external environmental factors in subsequent processes. Therefore, the structure of the display panel provided in this embodiment can be such that the lens array 41 is formed after the through groove 40 and the first groove 30 are formed, or the through groove 40 and the lens array 41 are formed simultaneously by patterning after the first groove 30 is formed, or the first groove 30 and the lens array 41 are formed simultaneously by patterning after the through groove 40 is formed. Furthermore, considering that the passivation layer 3 and the planarization layer 4 have different materials in the conventional process, and therefore different etching rates, when forming multi-level grooves, in order to avoid premature exposure of the metal layer 2, the etching time between the two can be further adjusted by controlling the depth ratio between the second groove 32 and the lens array 41, thus avoiding the risk of damage to the lens structure due to premature etching and exposure to the external environment. Compared to the structure formed by patterning the planarization layer 4 and passivation layer 3 using a common mask or a multi-segment transmittance mask in related technologies, the display panel provided in this embodiment has a higher structural integrity of the lens array 41, and the metal layer 2 has a lower probability of being oxidized.

[0100] It should be noted that the display panel in this embodiment can be prepared by any of the display panel preparation methods in the foregoing embodiments or other feasible preparation methods, which will not be elaborated here.

[0101] In some embodiments, the planarization layer 4 is an organic compound or organic polymer; for example, the material of the planarization layer 4 is OCA optical adhesive. The passivation layer 3 is an inorganic material; for example, the passivation layer 3 is silicon nitride, silicon oxide, or silicon oxynitride.

[0102] In some embodiments, the metal layer 2 is made of one or any combination of metals such as silver (Ag), magnesium (Mg), aluminum (Al), tungsten (W), copper (Cu), nickel (Ni), chromium (Cr), molybdenum (Mo), titanium (Ti), platinum (Pt), tantalum (Ta), neodymium (Nd), or scandium (Sc), their alloys, their nitrides, etc. Exemplarily, the metal layer 2 is a source / drain layer made of copper.

[0103] In some embodiments, the array substrate 1 includes a substrate and thin-film transistors and capacitor structures located on the substrate, which are respectively connected to the metal layer 2 to control the light emission of the display panel.

[0104] In some embodiments, such as Figure 2e As shown, at least one side of the first groove 30 is a stepped surface that gradually shrinks in the direction of the passivation layer 3 toward the array substrate 1, and the orthographic projection of the first groove 31 on the array substrate 1 is greater than the orthographic projection of the second groove 32 on the array substrate 1.

[0105] In this embodiment, in some examples, the opening area of ​​the first groove 31 is larger than the area of ​​the second opening, and the two together form a stepped groove. This can reduce the slope of the groove, making the structure of the first groove 30 smoother and enhancing structural stability. At the same time, it can avoid the risk of the first electrode layer 5 formed above the first groove 30 breaking due to the slope, which could further cause poor contact. In other embodiments, the first groove 31 and the second groove 32 can form a side that partially overlaps along the direction from the array substrate 1 to the passivation layer 3. Those skilled in the art can flexibly set this according to the actual situation.

[0106] In some embodiments, such as Figure 2e As shown, the stepped surface includes a first side surface of a first layer of groove 31 and a second side surface of a second layer of groove 32 connected sequentially along the direction from the passivation layer 3 to the array substrate 1. Along the direction from the array substrate 1 to the planarization layer 4, the first sub-angle α1 between the first side surface and the plane of the array substrate 1 is less than or equal to the second sub-angle α2 between the second side surface and the plane of the array substrate 1. As the groove opening gradually increases, the angle between the side surface and the plane of the array substrate 1 gradually decreases or remains constant, which can avoid stress accumulation at the junctions between the side surfaces and improve the structural stability of the multi-layer groove.

[0107] In some embodiments, the first sub-angle α1 is greater than or equal to 15° and less than or equal to 75°, and the second sub-angle α2 is greater than or equal to 30° and less than or equal to 90°. For example, the first sub-angle α1 is 45° and the second sub-angle α2 is 75°.

[0108] In some embodiments, such as Figure 6 As shown, the side of the first groove 30 is a smooth surface, and the orthographic projection of the first groove 31 on the array substrate 1 coincides with the orthographic projection of the second groove 32 on the array substrate 1.

[0109] Although the first groove 30 in this embodiment includes a first layer groove 31 and a second groove, the first layer groove 31 and the second layer groove 32 overlap in the direction from the array substrate 1 to the planarization layer 4. Therefore, the first layer groove 31 and the second layer groove 32 are equivalent to forming only a first groove 30 with a smooth side. Although a stepped groove is not formed, the structure is simpler and it is easier to fill the first groove 30.

[0110] In some embodiments, such as Figure 6As shown, along the direction from the array substrate 1 to the planarization layer 4, the first included angle α between the side of the first groove 30 and the plane of the array substrate 1 is greater than or equal to the second included angle β between the side of the through groove 40 and the plane of the array substrate 1. In this embodiment, along the direction in which the groove opening gradually decreases, the included angle between the side and the plane of the array substrate 1 gradually increases or remains unchanged. Similar to the above embodiment, stress accumulation at the junction between the side surfaces can be avoided, improving the structural stability of the multilayer groove.

[0111] In some embodiments, the first included angle α is greater than or equal to 15° and less than or equal to 75°, and the second included angle β is greater than or equal to 15° and less than or equal to 75°. For example, the first included angle α is 45° and the second included angle β is 15°.

[0112] In some embodiments, such as Figure 2e As shown, along the direction from the array substrate 1 to the planarization layer 4, the greater the depth ratio d1 / d2 between the second layer groove 32 and the lens array 41, the greater the etching selectivity ratio v1 / v2 between the passivation layer 3 and the planarization layer 4.

[0113] It should be noted that, since the cross-section of the lens array 41 is an arc-shaped surface, the depth d2 of the lens array 41 refers to the maximum depth of the lens array 41 from the top of the planarization layer 4 to the bottom of the lens array 41. The depth d1 of the second layer groove 32 is the distance between the interface between the second layer groove 32 and the first layer groove 31 and the top surface of the metal layer 2. The first etching selectivity ratio refers to the relative etching rate of one material to another under the same etching conditions, that is, it is defined as the ratio of the etching rate of the etched material to the etching rate of the other material. In this embodiment, it refers to the ratio between the etching rate v1 of the passivation layer 3 and the etching rate v2 of the planarization layer 4 under the same etching conditions. In this embodiment, the depth ratio d1 / d2 between the second groove 32 and the lens array 41, and the etching selectivity ratio v1 / v2 between the passivation layer 3 and the planarization layer 4 are proportional. This allows the depth between the second groove 32 and the lens array 41 to be adjusted based on the etching rate of the second groove 32 and the etching rate of the lens array 41. Consequently, the depth of the first groove 31 can be adjusted, further controlling the etching time of the second groove 32. This avoids the lens array 41 being exposed to the external environment for too long due to inconsistent timing, thus preventing the risk of damage to the lens array 41.

[0114] In some embodiments, the etching rate of the second groove 32 is 2–5 nm / s, and the etching rate of the lens array 41 is 8–15 nm / s. For example, the etching rate of the second groove 32 is 3 nm / s, and the etching rate of the lens array 41 is 10 nm / s. The depth of the lens array 41 is 1 μm, and the depth of the second groove 32 is 0.3 μm.

[0115] In some embodiments, such as Figure 2f As shown, the display panel also includes a first electrode layer 5 located on the side of the planarization layer 4 opposite to the passivation layer 3. The first electrode layer 5 is connected to the metal layer 2 in sequence through a through groove 40 and a first recess 30. Along the direction from the array substrate 1 to the planarization layer 4, the shape of the surface of the first electrode layer 5 near the lens array 41 is adapted to the shape of the lens array 41. The refractive index of the first electrode layer 5 is not equal to the refractive index of the lens array 41. The shape of the surface of the first electrode layer 5 opposite to the lens array 41 is the same as the shape of the lens array 41; or, as... Figure 7 As shown, the surface of the first electrode layer 5 facing away from the lens array 41 is flat.

[0116] In this embodiment, when the shape of the surface of the first electrode layer 5 facing away from the lens array 41 is the same as the shape of the lens array 41, such as... Figure 2f As shown, the first electrode layer 5 also exhibits a pitted morphology. Simultaneously, by making the refractive index of the first electrode layer 5 different from that of the lens array 41, a refractive light-concentrating structure can be formed between them, thereby further improving the light extraction efficiency of the display panel and reducing energy consumption. When the surface of the first electrode layer 5 facing away from the lens array 41 is flat, as... Figure 7 As shown, on the one hand, a refractive and light-concentrating structure can be formed between the first electrode layer 5 and the lens array 41; on the other hand, the uneven structure of the lens array 41 can prevent the first electrode layer 5 from breaking at the junction of the lenses, causing poor contact and affecting the display effect. Therefore, the quality and display effect of the display panel can be improved.

[0117] In some embodiments, such as Figure 8 As shown, a flat structure 7 is also provided between the first electrode layer 5 and the lens array 41 to fill the pit morphology of the lens structure, so that the first electrode layer 5 can flow and flatten along the horizontal plane and save the material of the first electrode.

[0118] It should be noted that after the formation of the first electrode layer 5, the display panel sequentially forms a light-emitting layer and a second electrode layer (not shown in the figure). The first electrode layer 5 is either an anode layer or a cathode layer. When the first electrode layer 5 is an anode layer, the second electrode layer is a cathode layer. When the first electrode layer 5 is a cathode layer, the second electrode layer is an anode layer. This application takes a bottom-emitting display panel as an example, where the first electrode layer 5 is an anode layer and the second electrode layer is a cathode layer. It should be noted that those skilled in the art can flexibly set the electrode layer according to the actual situation, without specific limitations. The material of the first electrode layer 5 is indium tin oxide (ITO) or indium zinc oxide (IZO). The material of the second electrode layer can be a metal, an inorganic substance, a metal mixture, a mixture of metal and inorganic substances, or a mixture of the above substances.

[0119] In some embodiments, such as Figure 2g As shown, the display panel also includes a pixel defining layer 6 located on the side of the first electrode layer 5 away from the planarization layer 4. The pixel defining layer 6 includes a plurality of pixel openings arranged in an array (located in the area between two adjacent pixel defining units 61). The orthographic projection of the lens array 41 on the array substrate 1 at least partially overlaps with the orthographic projection of the pixel openings on the array substrate 1.

[0120] In this embodiment, the lens array 41 corresponds to and at least partially overlaps with the location of the pixel opening, so that the lens array 41 can directly absorb the light emitted by the light-emitting layer over a large area, thereby improving the light-gathering effect.

[0121] In some embodiments, such as Figure 9 As shown Figure 2g The planar layout corresponding to the cross-sectional view of the film layer shown shows that the orthographic projection of the lens array 41 on the array substrate 1 is larger than and surrounds the orthographic projection of the pixel opening (the central area surrounded by the pixel defining unit 61) on the array substrate 1, thereby realizing the adjustment and focusing of the light emitted by the light-emitting layer from all angles and avoiding light loss.

[0122] In some embodiments, such as Figure 2g As shown, multiple pixel defining units 61 are formed between adjacent pixel openings, wherein,

[0123] The orthographic projection of the pixel defining unit 61 on the array substrate 1 at least partially overlaps with the orthographic projection of the first layer groove 31 on the array substrate 1;

[0124] And / or, the orthographic projection of the pixel defining unit 61 on the array substrate 1 at least partially overlaps with the orthographic projection of the second layer groove 32 on the array substrate 1;

[0125] And / or, the orthographic projection of the pixel defining unit 61 on the array substrate 1 at least partially overlaps with the orthographic projection of the through slot 40 on the array substrate 1.

[0126] In this embodiment, the orthographic projections of the pixel defining unit 61, the through slot 40, the first layer groove 31, and / or the second layer groove 32 on the array substrate 1 are at least coincident. This can make full use of the space where the pixel defining layer 6 is located near the bottom of the array substrate 1, thereby increasing the distributable area of ​​the lens array 41 in the pixel opening. Therefore, the overall space of the display panel is utilized more rationally, and the space utilization rate is improved.

[0127] In some embodiments, the first recess 30 in the display panel is formed by a patterning process using a multi-segment transmittance mask.

[0128] In some embodiments, the first layer of groove 31 and through groove 40 are formed by a patterning process using a multi-segment transmittance mask.

[0129] In some embodiments, the first groove 30 and the through groove 40 are formed by a patterning process using a multi-segment transmittance mask.

[0130] In the above embodiments, any two stacked structures in the groove structure can be formed by a multi-segment transmittance mask, thereby further simplifying the fabrication process.

[0131] In other words, the display panel provided in this application, such as Figure 2e As shown, the array includes an array substrate 1, a metal layer 2, a passivation layer 3, and a planarization layer 4 stacked sequentially. The passivation layer 3 has a first groove 30. The planarization layer 4 has a through-slot 40 penetrating the planarization layer 4 and a lens array 41 with its opening direction pointing from the passivation layer 3 to the planarization layer 4. The orthographic projection of the first groove 30 on the array substrate 1 is located within the orthographic projection of the through-slot 40 on the array substrate 1. The first groove 30 is formed by multiple patterning processes. The patterning process includes a first patterning process and a second patterning process. After the first patterning process, the passivation layer 3 forms an initial groove 301. Along the direction from the array substrate 1 to the planarization layer 4, the bottom surface of the initial groove 301 is higher than the top surface of the metal layer 2. After the second patterning process, the passivation layer 3 forms the first groove 30, and the planarization layer 4 forms the lens array 41. At least part of the metal layer 2 is exposed on the side of the first groove 30 closer to the array substrate 1. The orthographic projection of the initial groove 301 on the array substrate 1 at least partially overlaps with the orthographic projection of the first groove 30 on the array substrate 1.

[0132] In this embodiment, the display panel is formed through a secondary patterning process. In the first patterning process, an initial groove 301 is formed. The initial groove 301 still covers the metal layer 2, which can prevent oxidation caused by exposure of the surface of the metal layer 2. At the same time, the first patterning process can pre-thin the passivation layer 3 of the display panel. Even if the etching rate of the passivation layer 3 is slower than that of the planarization layer 4, the lens structure formed in the second patterning process can be prevented from being exposed to the external environment in advance, thus preventing the lens array 41 from being contaminated or damaged.

[0133] In some embodiments, such as Figures 2d to 2e As shown, the orthographic projection of the first groove 30 on the array substrate 1 is located within the orthographic projection of the initial groove 301 on the array substrate 1. The first groove 30 formed after the second patterning process includes a first groove 31 and a second groove 32 that pass through sequentially along the direction of the passivation layer 3 toward the array substrate 1. The first groove 31 is formed after the first patterning process.

[0134] In some embodiments, such as Figures 3a-3bAs shown, the orthographic projection of the initial groove 301 (sacrificial groove 301') on the array substrate 1 is located within the orthographic projection of the first groove 30 on the array substrate 1, and the projection area of ​​the orthographic projection of the initial groove 301 on the array substrate 1 is smaller than the projection area of ​​the orthographic projection of the first groove 30 on the array substrate 1. The first groove 30 formed after the second patterning process includes a first groove 31 and a second groove 32 that pass through sequentially along the direction of the passivation layer 3 toward the array substrate 1. The first groove 31 is formed after the second patterning process.

[0135] In some embodiments, when the etching rate of the passivation layer 3 is less than the etching rate of the planarization layer 4, the depth of the second groove 32 is less than the depth of the lens array 41 in the direction from the array substrate 1 to the planarization layer 4; when the etching rate of the passivation layer 3 is greater than the etching rate of the planarization layer 4, the depth of the second groove 32 is greater than the depth of the lens array 41 in the direction from the array substrate 1 to the planarization layer 4.

[0136] In some embodiments, a color filter layer (not shown in the figure) is further provided between the passivation layer 3 and the planarization layer 4 of the display panel. The color filter layer includes color resist units of different colors arranged alternately in sequence. The orthographic projection of the color resist unit on the array substrate 1 and the orthographic projection of the pixel opening on the array substrate 1 at least partially overlap.

[0137] Based on the same inventive concept, this application also provides a display device, including the display panel provided in the foregoing embodiments or the display panel prepared by the preparation method of the display panel in the foregoing embodiments. This display device has the advantages of the display panel or the display panel prepared by the preparation method of the display panel in the foregoing embodiments, and therefore will not be described again here.

[0138] It should be noted that the display device can be any device that displays images, whether moving (e.g., video) or fixed (e.g., still images), and whether it contains text or images. More specifically, the intended embodiments can be implemented in or associated with a variety of electronic devices, such as (but not limited to) mobile phones, wireless devices, personal data assistants (PDAs), handheld or portable computers, GPS receivers / navigators, cameras, MP4 video players, camcorders, game consoles, watches, clocks, calculators, television monitors, flat panel displays, computer monitors, automotive displays (e.g., odometer displays, etc.), navigators, cockpit controllers and / or displays, displays of camera views (e.g., displays of rearview cameras in vehicles), electronic photographs, electronic billboards or signs, projectors, architectural structures, packaging and aesthetic structures (e.g., displays of images of a piece of jewelry), etc.

[0139] The above embodiments of this application can complement each other without causing conflict.

[0140] It should be noted that the dimensions of layers and regions may be exaggerated in the accompanying drawings for clarity. Furthermore, it is understood that when an element or layer is referred to as being "on" another element or layer, it can be directly on the other element, or there may be intermediate layers. Additionally, it is understood that when an element or layer is referred to as being "below" another element or layer, it can be directly below the other element, or there may be more than one intermediate layer or element. Furthermore, it is also understood that when a layer or element is referred to as being "between" two layers or two elements, it can be the only layer between the two layers or two elements, or there may be more than one intermediate layer or element. Similar reference numerals throughout indicate similar elements.

[0141] The terms “center,” “upper,” “lower,” “front,” “back,” “left,” “right,” “vertical,” “horizontal,” “top,” “bottom,” “inner,” and “outer,” etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0142] The terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, unless otherwise stated, "a plurality of" means two or more.

[0143] Other embodiments of this application will readily occur to those skilled in the art upon consideration of the specification and practice of the disclosure herein. This application is intended to cover any variations, uses, or adaptations of this application that follow the general principles of this application and include common knowledge or customary techniques in the art not disclosed herein. The specification and examples are to be considered exemplary only, and the true scope and spirit of this application are indicated by the claims.

[0144] It should be understood that this application is not limited to the precise structure described above and shown in the accompanying drawings, and various modifications and changes can be made without departing from its scope. The scope of this application is limited only by the appended claims.

Claims

1. A method for manufacturing a display panel, characterized in that, include: A metal layer, a passivation layer, and a planarization layer are sequentially stacked on an array substrate. The planarization layer is made of an organic material, and the passivation layer is made of an inorganic material. The planarization layer is patterned to form through slots; An initial groove is formed on the passivation layer through a first patterning process. The orthographic projection of the initial groove on the array substrate is located within the orthographic projection of the through slot on the array substrate. Along the direction from the array substrate to the planarization layer, the bottom surface of the initial groove is higher than the top surface of the metal layer. A first groove is formed on the passivation layer by a second patterning process, and a lens array is formed on the planarization layer. The side of the first groove near the array substrate exposes at least a portion of the metal layer. The orthographic projection of the initial groove on the array substrate at least partially overlaps with the orthographic projection of the first groove on the array substrate.

2. The method for manufacturing a display panel according to claim 1, characterized in that, The process of forming an initial groove on the passivation layer through a first patterning process and forming a first groove on the passivation layer through a second patterning process includes: The first layer of grooves is formed through the first patterning process; The second patterning process forms a second layer of grooves, the orthographic projection of the second layer of grooves on the array substrate is located within the orthographic projection of the first layer of grooves on the array substrate, and the first layer of grooves and the second layer of grooves together constitute the first groove.

3. The method for manufacturing a display panel according to claim 1, characterized in that, The process of forming an initial groove on the passivation layer through a first patterning process and forming a first groove on the passivation layer through a second patterning process includes: The first patterning process forms a sacrificial groove on the passivation layer; The first groove is formed by the second patterning process, and the orthogonal projection of the sacrificial groove on the array substrate is located within the orthogonal projection of the first groove on the array substrate.

4. The method for manufacturing a display panel according to claim 1, characterized in that, The step of forming a first groove on the passivation layer and forming a lens array on the planarization layer by a second patterning process includes: A multi-segment transmittance mask is used to perform a second patterning process on the passivation layer and the planarization layer, forming a first groove on the passivation layer and forming the lens array on the planarization layer. The multi-segment transmittance mask includes a first transmittance region and a second transmittance region, with the first transmittance region corresponding to the first groove and the second transmittance region corresponding to the lens array.

5. The method for manufacturing a display panel according to claim 4, characterized in that, After forming the first groove on the passivation layer and the lens array on the planarization layer through a second patterning process, the process further includes: A first electrode layer is formed on the side of the planarization layer away from the passivation layer. The first electrode layer is connected to the metal layer in sequence through the through groove and the first recess. The shape of the surface of the first electrode layer near the lens array is adapted to the shape of the lens array. The refractive index of the first electrode layer is not equal to the refractive index of the lens array.

6. The method for manufacturing a display panel according to claim 5, characterized in that, After forming the first electrode layer on the side of the planarization layer opposite to the passivation layer, the method further includes: A pixel defining layer is formed on the side of the first electrode layer away from the planarization layer. The pixel defining layer includes a plurality of pixel openings arranged in an array. The orthographic projection of the lens array on the array substrate at least partially overlaps with the orthographic projection of the pixel openings on the array substrate.

7. The method for manufacturing a display panel according to claim 1, characterized in that, The planarization layer is patterned to form through slots; The initial grooves formed on the passivation layer through the first patterning process include: A multi-segment transmittance mask is used to pattern the planarization layer and the passivation layer, so that the planarization layer forms a through groove while the passivation layer forms an initial groove.

8. A method for manufacturing a display panel, characterized in that, include: A metal layer and a passivation layer are sequentially stacked on an array substrate, wherein the passivation layer is made of an inorganic material; An initial groove is formed on the passivation layer through a first patterning process. The bottom surface of the initial groove is higher than the top surface of the metal layer in the direction from the array substrate to the planarization layer. A planarization layer is formed on the passivation layer, and the planarization layer is made of an organic material; The planarization layer and the passivation layer are subjected to a second patterning process; The planarization layer is formed into a through-slot and a lens array, and a first groove is formed on the passivation layer, wherein at least a portion of the metal layer is exposed on the side of the first groove near the array substrate, and the orthogonal projections of the through-slot, the first groove and the initial groove on the array substrate at least partially overlap.

9. The method for manufacturing a display panel according to claim 8, characterized in that, The second patterning process for the planarization layer and the passivation layer includes: A multi-segment transmittance mask is used to perform a second patterning process on the planarization layer and the passivation layer, forming a through-slot and a lens array on the planarization layer, and forming a first groove on the passivation layer; the multi-segment transmittance mask includes a third transmittance region, a fourth transmittance region and a fifth transmittance region, the third transmittance region corresponds to the first groove, the fourth transmittance region corresponds to the area of ​​the through-slot other than the first groove, and the fifth transmittance region corresponds to the lens array.

10. A display panel, characterized in that, The array comprises, in sequence, an array substrate, a metal layer, a passivation layer, and a planarization layer; the planarization layer is made of an organic material, and the passivation layer is made of an inorganic material; the passivation layer has a first groove, and the planarization layer has a through-slot penetrating the planarization layer and a lens array with its opening direction pointing from the passivation layer to the planarization layer; the orthographic projection of the first groove on the array substrate lies within the orthographic projection of the through-slot on the array substrate. The first groove includes a first layer of groove and a second layer of groove that pass through sequentially along the passivation layer toward the array substrate; along the direction from the array substrate toward the planarization layer, the interface formed between the first layer of groove and the second layer of groove is higher than the surface of the metal layer near the planarization layer, and the side of the second layer of groove near the array substrate exposes at least a portion of the metal layer.

11. The display panel according to claim 10, characterized in that, At least one side of the first groove is a stepped surface that tapers towards the array substrate from the passivation layer, and the orthographic projection of the first groove on the array substrate is greater than the orthographic projection of the second groove on the array substrate.

12. The display panel according to claim 10, characterized in that, Along the direction from the array substrate to the planarization layer, the greater the depth ratio of the second layer groove to the lens array, the greater the etching selectivity ratio of the passivation layer to the planarization layer.

13. The display panel according to claim 10, characterized in that, The display panel further includes a first electrode layer located on the side of the planarization layer opposite to the passivation layer. The first electrode layer is connected to the metal layer sequentially through the through-slot and the first groove. Along the direction from the array substrate to the planarization layer, the shape of the surface of the first electrode layer near the lens array is adapted to the shape of the lens array. The refractive index of the first electrode layer is not equal to the refractive index of the lens array. The shape of the side surface of the first electrode layer facing away from the lens array is the same as the shape of the lens array; Alternatively, the surface of the first electrode layer facing away from the lens array may be flat.

14. The display panel according to claim 13, characterized in that, The display panel further includes a pixel defining layer located on the side of the first electrode layer opposite to the planarization layer. The pixel defining layer includes a plurality of pixel openings arranged in an array. The orthographic projection of the lens array on the array substrate at least partially overlaps with the orthographic projection of the pixel openings on the array substrate.

15. The display panel according to claim 10, characterized in that, The first groove is formed by a patterning process using a multi-segment transmittance mask. Alternatively, the first layer of grooves and the through grooves are formed by a patterning process using the multi-segment transmittance mask. Alternatively, the first groove and the through groove are formed by a patterning process using the multi-segment transmittance mask.

16. A display device, characterized in that, The display panel is obtained by the method of manufacturing a display panel as described in any one of claims 1 to 9, or the display panel is the display panel as described in any one of claims 10 to 15.

Images