Damping holder for nanometer measurement and nanometer measurement system

Abstract

The application provides a vibration reduction holder applied to nanometer measurement and processing, which comprises a carrier connected with a sample table, a holder fixed on the carrier, and a terminal actuator fixed on the holder, wherein the terminal actuator is used for scanning and imaging a region to be measured of a sample; the holder is used for detecting and offsetting vibration of the terminal actuator; and the vibration represents relative vibration between the terminal actuator and the sample. The vibration reduction holder provided by the application can solve the problem that excited vibration of the terminal actuator cannot be detected and offset, so as to eliminate noise in the nanometer measurement process.

Description

Technical Field

[0001] This invention relates to the field of nanometry, and more particularly to a vibration damping gimbal and nanometry system for use in nanometry. Background Technology

[0002] Atomic force microscopy is an important nanometer measurement instrument that can measure the nanoscale morphology and conductivity of sample surfaces. It is widely used in precision measurement fields such as semiconductors and optical components.

[0003] Especially with optical components becoming increasingly larger, often exceeding the meter scale, in-situ measurement of ultra-large samples is a pressing need in the industry. However, existing atomic force microscopy systems can only measure small samples (less than 40*40 cm). To detect even larger samples, the mechanical circuitry of the probe and sample stage needs to be enlarged.

[0004] Increasing the mechanical circuit size makes it easier to generate excited vibrations, resulting in relative instability between the probe and the sample stage, and consequently, more noise in the image. Therefore, how to detect and eliminate excited vibrations of the probe has become a key technical issue that urgently needs to be addressed by those skilled in the art. Summary of the Invention

[0005] This invention provides a vibration damping gimbal and a nanometer measurement system for use in nanometer measurements, in order to solve the problem that the excited vibration of the probe cannot be detected and canceled.

[0006] According to a first aspect of the present invention, a vibration damping gimbal for nanometer measurements is provided, comprising: The carrier is connected to the sample; A vibration damping gimbal is fixed to the carrier. An end effector, fixed on the gimbal, is used to scan and image the test area of ​​the sample; The vibration damping gimbal is used to detect and counteract the vibration of the end effector; the vibration characterizes the relative vibration between the end effector and the sample.

[0007] Optionally, the vibration damping gimbal includes: Pan-tilt controller, surface vibration sensor, and driver; The surface vibration sensor is integrated on the end effector; the surface vibration sensor is used to detect the vibration of the end effector to obtain a vibration signal, and send the vibration signal to the gimbal controller; The gimbal controller uses the received vibration signal to obtain a compensation signal and sends the compensation signal to the driver; One end of the driver is connected to the terminal actuator, and the other end of the driver is connected to the carrier; the driver is used to drive the terminal actuator to generate a compensating motion after receiving the compensation signal; the compensating motion is used to counteract the vibration.

[0008] Optionally, the terminal actuator is a probe.

[0009] Optionally, the probe includes: a first probe and a probe fixing end; the first probe includes: a first cantilever beam and a probe tip; One end of the first cantilever beam is connected to one end of the probe fixing end; The probe tip is connected to the other end of the first cantilever beam and is used to scan the test points in the test area of ​​the sample.

[0010] Optionally, the surface vibration sensor is a differential interferometer; The differential interferometer is equipped with an optical fiber probe. The fiber optic probe includes a first fiber optic probe and a second fiber optic probe; the first fiber optic probe is used to emit laser light to the fixed end of the probe, and the second fiber optic probe is used to emit laser light to the vicinity of the test point to detect the vibration.

[0011] Optionally, the surface vibration sensor includes a second probe, a cantilever displacement measuring device, and a sinusoidal excitation motion generator; the second probe includes a second cantilever beam; One end of the second cantilever beam is connected to one end of the probe fixing end; The sinusoidal excitation motion generator is connected to the other end of the probe fixing end; the sinusoidal excitation motion generator excites the second cantilever beam to generate the vibration; The cantilever displacement measuring device is used to detect the vibration of the second cantilever beam.

[0012] Optionally, a mechanical circuit is formed between the surface vibration sensor and the probe; The length of the mechanical circuit is less than 100 μm.

[0013] Optionally, the cantilever displacement measuring device includes: Laser emitting device; used to emit laser light into the second cantilever beam; A photoelectric detection device is used to receive laser light reflected from the second cantilever beam, thereby detecting the vibration of the second cantilever beam.

[0014] Optionally, the cantilever displacement measuring device includes a laser interferometer for emitting a laser beam onto the second cantilever beam to detect the vibration of the second cantilever beam.

[0015] Optionally, the probe is an atomic force microscope probe.

[0016] According to a second aspect of the present invention, a nanometer measurement system is provided, comprising the vibration damping gimbal for nanometer measurement as described in any of the first aspects of the present invention.

[0017] This invention provides a vibration damping gimbal for nanometer measurements, comprising: a carrier, a vibration damping gimbal, and a probe. The carrier is connected to a sample, and the vibration damping gimbal is fixed on the carrier. The probe is fixed on the vibration damping gimbal and is used to scan and image the area to be measured of the sample. This invention detects and cancels the vibration of the probe relative to the sample by means of the vibration damping gimbal, solving the problem that the excited vibration of the probe cannot be detected and canceled, thereby eliminating noise in the scanning imaging.

[0018] More specifically, the present invention provides a vibration damping gimbal for nanometer measurements, comprising: a surface vibration sensor for detecting vibration of the probe relative to the sample; a driver and a gimbal controller for cooperating to cancel this relative vibration of the probe; thereby, the present invention utilizes a surface vibration sensor capable of detecting vibration between the probe and the sample, combined with a driver and a gimbal controller, to achieve the detection and cancellation of vibration between the probe and the sample; thus solving the problem that the excited vibration of the probe in nanometer measurements cannot be eliminated. Attached Figure Description

[0019] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1 This is a vibration damping gimbal applied to nanometer measurement in one embodiment of the present invention; Figure 2 This is a vibration damping gimbal applied to nanometer measurement in a specific embodiment of the present invention; Figure 3 This is a surface vibration sensor according to one embodiment of the present invention; Figure 4 This is a surface vibration sensor using a dual-probe method in another embodiment of the present invention; Figure 5 This is a curve showing the variation of the excited amplitude of the second cantilever beam with the distance between the electrode plate and the sample surface in another embodiment of the present invention; Figure 6 This is another embodiment of the cantilever displacement measuring device using the optical lever method; Figure 7This is a cantilever displacement measuring device using laser interferometry in one embodiment of the present invention; Figure 8 This is a vibration damping gimbal applied to nanometer measurement in one embodiment of the present invention; Figure 9 This is a vibration damping gimbal applied to nanometer measurement in another embodiment of the present invention; Explanation of reference numerals in the attached figures: 101 carriers; 102-Sample; 103--Vibration damping gimbal; 1031 surface vibration sensor; 10311 - Differential Interferometer; 103111 - First fiber optic probe; 103112 - Second fiber optic probe; 103113 - Differential Interferometer Controller; 10312 - Second cantilever beam; 103121 - Plate; 10313 - Sine Excitation Motion Generator; 10314 - Cantilever displacement measuring device; 103141 - Laser emitting device; 103142 - Photoelectric detection device; 103143 - Laser Interferometer; 1032-Driver; 1033 - Pan / Tilt Controller; 104-Probe; 1041 - First cantilever beam; 1042 - Probe tip; 1043 - Probe fixing end; 105-Scanner. Detailed Implementation

[0021] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0022] The terms “first,” “second,” “third,” “fourth,” etc. (if present) in the specification, claims, and accompanying drawings of this invention are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that embodiments of the invention described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms “comprising” and “having,” and any variations thereof, are intended to cover a non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0023] Especially with the increasing size of optical components, often exceeding the meter scale, in-situ measurement of ultra-large samples is a pressing need in the industry. However, existing AFM systems can only measure small samples (less than 40*40 cm). To enable atomic force microscopy (AFM) to detect larger samples, engineers have increased the mechanical loop between the AFM probe and the sample. However, increasing the mechanical loop makes the AFM probe more prone to excited vibrations, leading to relative instability between the probe and the sample, and consequently, more noise in the AFM images.

[0024] Therefore, how to detect and counteract vibrations between the sample and the probe has become a problem that urgently needs to be solved by those skilled in the art.

[0025] Currently, the concept of a gimbal exists and is widely used for camera stabilization. It integrates an accelerometer that measures the camera's motion relative to the ground; a controller that generates a corresponding drive signal to the actuator based on the vibration or motion detected by the sensor; and a multi-degree-of-freedom actuator that, upon receiving the drive signal, can drive the camera to move relative to the handle or the user's hand, thus achieving the effect of the camera remaining stationary relative to the ground. This allows for the detection and elimination of camera vibrations relative to the ground caused by hand shake, reducing image blur caused by the photographer's shaky hands.

[0026] Another concept is active vibration damping, used to eliminate platform vibration. Ground vibration causes platform vibration, which in turn causes vibration of the sample on the platform. Vibration sensors mounted on the vibration isolation platform measure this vibration, and a driver applies a compensating force to the platform to compensate for the vibration, thereby actively isolating the transmission of ground vibration to the platform and maintaining its relative stability. This achieves a stable state for the sample on the vibration isolation platform. The vibration detected by the vibration sensors is relative to the ground.

[0027] Existing gimbal or active vibration reduction technologies measure and suppress vibrations from the ground to the stable end of the gimbal (or platform). The stability is relative to the ground reference frame. Therefore, such technologies cannot suppress the relative excited vibrations between the probe and the object under test.

[0028] In view of this, the inventors, through repeated experiments, discovered and proposed a new sensing mechanism for measuring relative surface vibration, in order to realize the relative vibration measurement between the atomic force microscope probe and the sample. The new sensing mechanism for measuring relative surface vibration introduces a differential interferometer from the existing technology to detect the relative vibration between the probe and the sample, and draws on the existing gimbal concept to cancel the relative vibration between the probe and the sample, thereby achieving relative stability between the probe and the sample and eliminating noise.

[0029] In addition, as an alternative to differential interferometers, the inventors have also developed a vibration measurement device based on a dual probe; specifically, it includes an atomic force microscope probe with a pole plate at the top, which is mounted on the probe head and can also realize accurate detection of the relative vibration between the sample and the probe head.

[0030] The novel sensing mechanism proposed in this application can detect and counteract stimulated vibrations between the sample and the probe, thereby eliminating noise in atomic force microscope images.

[0031] The technical solution of the present invention will be described in detail below with reference to specific embodiments. These specific embodiments can be combined with each other, and the same or similar concepts or processes may not be described again in some embodiments.

[0032] Please refer to Figure 1 According to an embodiment of the present invention, a vibration damping gimbal for nanometer measurement is provided, comprising: Carrier 101, which is connected to sample 102; specifically, in one embodiment, the connection between carrier 101 and sample 102 is a mechanical connection, such as... Figure 1 As shown in the dashed line portion; in one embodiment, the carrier 101 is a macro-motion mobile platform, specifically, the macro-motion mobile platform is a robotic arm or a gantry; of course, it can also be other macro-motion mobile platforms, and the present invention is not limited thereto, and any implementation of the macro-motion mobile platform is within the protection scope of the present invention; The vibration damping gimbal 103 is fixed on the carrier 101; An end effector is fixed on the vibration damping gimbal 103, and the end effector is used to scan and image the test area of ​​the sample 102. The vibration damping gimbal 103 is used to detect and counteract the vibration of the end effector; the vibration characterizes the relative vibration between the end effector and the sample 102.

[0033] Specifically, the vibration detected by this invention is the excited vibration during scanning by the terminal actuator.

[0034] This invention creatively develops a vibration damping gimbal for nanometer measurement, including a creative vibration damping gimbal 103, which can detect and cancel the excited resonance of the end effector relative to the sample 102, solving the problem that the excited vibration of the end effector cannot be detected and canceled, thereby eliminating noise in scanning imaging.

[0035] Please refer to Figure 1-2 In one embodiment, the vibration damping gimbal 103 includes: The gimbal controller 1033, the surface vibration sensor 1031, and the driver 1032; The surface vibration sensor 1031 is integrated on the end effector; the surface vibration sensor 1031 is used to detect the vibration of the end effector to obtain a vibration signal, and send the vibration signal to the gimbal controller 1033; The gimbal controller 1033 obtains a compensation signal using the received vibration signal and sends the compensation signal to the driver 1032; One end of the driver 1032 is connected to the end effector, and the other end of the driver 1032 is connected to the carrier 101; the driver 1032 is used to drive the end effector to generate a compensation motion after receiving the compensation signal; the compensation motion is used to counteract the vibration.

[0036] In one embodiment, the terminal actuator is a probe. The vibration-damping gimbal provided in this application is not limited to applications in nanometer measurements, and the terminal actuator is not limited to a probe; in one embodiment, the terminal actuator is a nanoprobe used by a mask repair robot to remove nanoparticles from the mask surface; in another embodiment, the terminal actuator is a processing head in an electron beam lithography machine; in other embodiments, the terminal actuator is a processing head in scanning probe micromachining. This application uses a probe as an example to illustrate a vibration-damping gimbal used in nanometer measurements, as detailed below: In one embodiment, a mechanical circuit is formed between the surface vibration sensor 1031 and the probe 104; The length of the mechanical circuit is less than 100 μm. Through repeated experiments, the inventors discovered that the vibration damping gimbal 103 provided in the technical solution of this invention can achieve a short mechanical circuit with a length of less than 100 μm. Because the shorter the mechanical circuit between the surface vibration sensor 1031 and the probe 104, the closer the vibration signal detected by the surface vibration sensor 1031 from the probe 104 is to the true value of the vibration; therefore, the surface vibration sensor 1031 in the vibration damping gimbal 103 provided by this invention can accurately detect the vibration signal of the probe 104 relative to the sample.

[0037] The surface vibration sensor 1031 provided by this invention is integrated on the probe 104 and can detect the excited vibration of the probe 104, which is the vibration of the probe 104 relative to the sample 102. The gimbal controller 1033 uses the vibration signal detected by the surface vibration sensor 1031 to generate a compensation signal and sends it to the driver 1032. The driver 1032 is connected to the probe 104, and when it receives the compensation signal, it can drive the probe 104 to perform a compensation movement, which can eliminate the excited vibration of the probe 104. Therefore, the surface vibration sensor 1031, driver 1032, and gimbal controller 1033 provided by this invention can detect and eliminate the excited vibration of the probe 104, solving the problem that the excited vibration of the probe 104 cannot be detected and canceled, thereby eliminating noise in scanning imaging.

[0038] Please refer to Figure 1 , 2 8-9, In ​​one embodiment, the probe 104 includes: a first probe and a probe fixing end 1043; In a specific embodiment, the probe 104 is an atomic force microscope probe, or a probe based on the principle of atomic force microscopy. The probe based on the principle of atomic force microscopy can be used for both measurement and processing. Other probes include those based on the principle of laser interferometry, and probes based on other optical principles, such as the DVD laser head astigmatism measurement principle. Alternatively, it can be a micron-sized gripper for high-precision handling of small-scale objects. Of course, it can also be other probes; this invention is not limited to these, and any implementation of the probe is within the protection scope of this invention. The first probe includes: a first cantilever beam 1041 and a probe tip 1042; One end of the first cantilever beam 1041 is connected to one end of the probe fixing end 1043; the probe tip 1042 is connected to the other end of the first cantilever beam 1041 and is used to scan the test point of the test area of ​​the sample.

[0039] The probe can, of course, be of other structures, and this invention is not limited thereto. Any implementation of the probe is within the scope of protection of this invention; please refer to Figure 3-9 The following describes two specific embodiments of the surface vibration sensor 1031, but it is not limited to these two methods. Of course, it can also be other surface vibration sensors 1031. The present invention is not limited to these. As long as the technical solution provided by the present invention can be achieved, any implementation of the surface vibration sensor 1031 is within the protection scope of the present invention.

[0040] Please refer to Figure 3 and Figure 8 In one embodiment, the surface vibration sensor 1031 is a differential interferometer 10311; in a specific embodiment, the differential interferometer 10311 is a differential Doppler interferometer, but it can also be other differential interferometers 10311. The present invention is not limited thereto. As long as the technical solution provided by the present invention can be achieved, any implementation of the differential interferometer 10311 is within the protection scope of the present invention. The differential interferometer 10311 is equipped with an optical fiber probe. The fiber optic probe includes a first fiber optic probe 103111 and a second fiber optic probe 103112; the first fiber optic probe 103111 is used to emit laser light to the probe fixed end 1043, and the second fiber optic probe 103112 is used to emit laser light to the side of the point to be measured in order to detect the vibration.

[0041] In one embodiment, the differential interferometer 10311 further includes a differential interferometer controller 103113, which controls the first fiber optic probe 103111 and the second fiber optic probe 103112 to emit lasers to a designated detection point.

[0042] Specifically, in this embodiment, a short mechanical loop with a length of less than 100 μm can be realized between the first fiber optic probe 103111 and the second fiber optic probe 103112.

[0043] Since the differential interferometer 10311 can measure the relative vibration of two illumination points of two fiber optic probes, the laser emitted by the first fiber optic probe 103111 of the differential interferometer 10311 is focused on the probe fixing end 1043, and the laser emitted by the second fiber optic probe 103112 is focused next to the point to be measured. Thus, both the first fiber optic probe 103111 and the second fiber optic probe can detect a signal. By subtracting the two signals, the vibration signal is obtained, enabling the measurement of the vibration between the probe fixing end and the sample. Furthermore, the detected vibration of the probe fixing end is the vibration of probe 104 relative to sample 102. In one embodiment, a sinusoidal excitation motion generator 10313 can be placed between the probe fixing end 1043 and the scanner 105 to excite the vibration of the second probe.

[0044] Please refer to Figure 4-7 and Figure 9 In another embodiment, the surface vibration sensor 1031 is configured using a dual-probe method, such as... Figure 4 As shown, specifically: The surface vibration sensor 1031 includes a second probe and a cantilever displacement measuring device 10314. Figure 4 (not shown in the image) and a sinusoidal excitation motion generator 10313; the second probe includes a second cantilever beam 10312; One end of the second cantilever beam 10312 is connected to one end of the probe fixing end 1043, and in one embodiment, it is configured to be parallel to the first cantilever beam 1041; in another embodiment, an electrode plate 103121 is provided at the end of the second cantilever beam 10312; the cantilever displacement measuring device 10314 measures the relative vibration between itself and the sample 102 through the electrode plate 103121. In other embodiments, the end of the second cantilever beam 10312 may be provided with other similar structures, and the present invention is not limited thereto; any similar implementation is within the protection scope of the present invention. In other embodiments, the second cantilever beam 10312 may be provided with other similar structures, and the present invention is not limited thereto; any similar implementation is within the protection scope of the present invention. In other embodiments, the second probe may be provided with other similar structures, and the present invention is not limited thereto; any similar implementation is within the protection scope of the present invention. The sinusoidal excitation motion generator 10313 is connected to the other end of the probe fixing end 1043; the sinusoidal excitation motion generator excites the second cantilever beam to generate the vibration. The cantilever displacement measuring device 10314 is used to detect the vibration of the second cantilever beam 10312. It can be seen that, in one embodiment, the second probe of the surface vibration sensor 1031, the second cantilever beam 10312, and the first probe of the probe head 104, the first cantilever beam 1041, are arranged in parallel and are all fixed to the probe fixing end 1043. In this embodiment, a short mechanical loop with a length of less than 100 μm can also be realized between the surface vibration sensor 1031 and the probe head 104.

[0045] In this embodiment, vibration measurement of an ultra-short mechanical circuit was achieved using a dual-probe setup.

[0046] The method of measuring the relative vibration between the probe 104 and the sample 102 using a dual-probe method can be capacitive or pressure-damped, etc.

[0047] Specifically, the principle of using a pressure-damped measuring probe 104 to measure the relative vibration between the probe and the sample 102 is described as follows: The sinusoidal excitation motion generator 10313 excites the second cantilever beam 10312 to move near the resonant frequency.

[0048] When the second cantilever beam 10312 is very close to the sample 102, the electrode plate 103121 at the end of the second cantilever beam 10312 will be subjected to compression damping pressure. The magnitude of the compression damping pressure varies with the surface distance between the electrode plate 103121 and the sample 102. Different compression damping forces will cause the electrode plate 103121 at the end of the second cantilever beam 10312 to generate different excited amplitudes. Therefore, the excited amplitude of the electrode plate varies with the surface distance between the electrode plate and the sample, and thus the excited amplitude of the second cantilever beam varies with the surface distance between the electrode plate and the sample. The curve of the excited amplitude of the second cantilever beam 10312 as a function of the surface distance between the electrode plate and the sample is shown below. Figure 5 As shown, the X-axis represents the surface distance between the electrode 103121 and the sample 102, and the Y-axis represents the excited amplitude of the second cantilever beam 10312. Thus, the relative surface distance between the probe 104 and the sample 102, i.e., the relative surface vibration, is converted into the excited amplitude of the second cantilever beam 10312. The displacement amplitude of the electrode 103121 at the end of the second cantilever beam 10312 is amplified by a factor of Q relative to the amplitude generated by the sinusoidal excitation motion generator 10313; therefore, the cantilever displacement measuring device 10314 can detect the amplitude of the electrode 103121 at the end of the second cantilever beam 10312. The amplitude of the electrode 103121 at the end of the second cantilever beam 10312 detected by the cantilever displacement measuring device 10314 can indicate the vibration between the probe 104 and the sample 102, thereby eliminating noise in the image formed after measurement by the probe 104.

[0049] Furthermore, this amplitude can be measured in different ways, such as the optical lever method, laser interferometry, and piezoresistive method.

[0050] Please refer to Figure 6 . Figure 7 and Figure 9 The following are two specific embodiments of the optical lever method and the laser interferometry method, which will be used to explain the cantilever displacement measuring device 10314 and its principle. In one specific embodiment, the cantilever displacement measuring device 10314, which utilizes the optical lever method, is as follows: Figure 6 and Figure 9 As shown, it includes: Laser emitting device 103141; used to emit laser light to the second cantilever beam 10312; A photoelectric detection device 103142 is used to receive laser light reflected from the second cantilever beam 10312, thereby detecting the vibration of the second cantilever beam 10312.

[0051] The principle of the cantilever displacement measuring device 10314 in this embodiment for measuring amplitude is as follows: The laser emitted by the laser emitting device 103141 strikes the electrode 103121 at the end of the second cantilever beam 10312. When the electrode 103121 at the end of the second cantilever beam 10312 is at different heights relative to the sample 102, the deflection angle of the electrode 103121 at the end of the second cantilever beam 10312 relative to the probe fixing end 1043 is different. The laser reflected by the electrode 103121 strikes the photoelectric detection device 103142 at different positions, and thus the amplitude of the second cantilever beam 10312 is detected. Therefore, the amplitude detected by the cantilever displacement measuring device 10314, which is set using the optical lever method, indicates the vibration of the probe 104 relative to the sample 102.

[0052] In another specific embodiment, the cantilever displacement measuring device 10314, which utilizes laser interferometry, is as follows: Figure 7 and Figure 9 As shown, it includes: a laser interferometer 103143; used to emit a laser beam onto the second cantilever beam 10312, thereby detecting the vibration of the second cantilever beam 10312.

[0053] The principle of the cantilever displacement measuring device 10314 in this embodiment for measuring amplitude is as follows: the laser interferometer 103143 shines a laser beam onto the electrode plate 103121 at the end of the second cantilever beam 10312, thereby measuring the amplitude of the cantilever vibration of the second cantilever beam 10312. This amplitude is the amplitude of the second cantilever beam 10312. As a specific embodiment of setting the surface vibration sensor 1031 using the dual-probe method, the amplitude detected by the cantilever displacement measuring device 10314 set by the laser interferometry indicates the vibration of the probe 104 relative to the sample 102.

[0054] Please refer to Figure 8 and Figure 9 According to another embodiment of the present invention, a nanometer measurement system is provided, including the vibration damping gimbal for nanometer measurement as described in any of the foregoing embodiments of the present invention.

[0055] In one specific embodiment, when the probe 104 is an atomic force microscope probe, the nanometer measurement system further includes an atomic force microscope scanner for scanning the surface of the sample 102 in conjunction with the atomic force microscope probe. Of course, it can also be other scanners 105, and this invention is not limited thereto; any implementation of the scanner 105 is within the protection scope of this invention.

[0056] The cantilever displacement measuring device in this invention is not limited to the embodiments described above. In other embodiments, it can also be a piezoresistive strain sensor or a piezoelectric strain sensor. The piezoelectric strain sensor or piezoresistive strain sensor is disposed at one end of the second cantilever beam near the probe fixing end.

[0057] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A vibration-damping gimbal for nanometer measurement, characterized in that, include: A carrier connected to a sample stage; a sample placed on the sample stage. A vibration damping gimbal is fixed to the carrier. An end effector is fixed on the vibration damping platform, and the end effector is used to scan and image the test area of ​​the sample; The vibration damping gimbal is used to detect and counteract the vibration of the end effector; the vibration characterizes the relative vibration between the end effector and the sample; The vibration damping gimbal includes: Pan-tilt controller, surface vibration sensor, and driver; The surface vibration sensor is integrated on the end effector; the surface vibration sensor is used to detect the vibration of the end effector to obtain a vibration signal, and send the vibration signal to the gimbal controller; The gimbal controller uses the received vibration signal to obtain a compensation signal and sends the compensation signal to the driver; One end of the driver is connected to the terminal actuator, and the other end of the driver is connected to the carrier; the driver is used to drive the terminal actuator to generate a compensating motion after receiving the compensation signal; the compensating motion is used to counteract the vibration; The terminal actuator is a probe; The probe includes: a first probe and a probe fixing end; the first probe includes: a first cantilever beam and a probe tip; One end of the first cantilever beam is connected to one end of the probe fixing end; The probe tip is connected to the other end of the first cantilever beam and is used to scan the test points in the test area of ​​the sample. The surface vibration sensor includes a second probe, a cantilever displacement measuring device, and a sinusoidal excitation motion generator; the second probe includes a second cantilever beam. One end of the second cantilever beam is connected to one end of the probe fixing end; The sinusoidal excitation motion generator is connected to the other end of the probe fixing end; the sinusoidal excitation motion generator excites the second cantilever beam to generate the vibration; The cantilever displacement measuring device is used to detect the vibration of the second cantilever beam; A mechanical circuit is formed between the surface vibration sensor and the probe; The length of the mechanical circuit is less than 100 μm.

2. The vibration-damping gimbal for nanometer measurement according to claim 1, characterized in that, The cantilever displacement measuring device includes: Laser emitting device; used to emit laser light into the second cantilever beam; A photoelectric detection device is used to receive laser light reflected from the second cantilever beam, thereby detecting the vibration of the second cantilever beam.

3. The vibration-damping gimbal for nanometer measurement according to claim 1, characterized in that, The cantilever displacement measuring device includes a laser interferometer for emitting a laser beam onto the second cantilever beam to detect the vibration of the second cantilever beam.

4. The vibration-damping gimbal for nanometer measurement according to any one of claims 1-3, characterized in that, The probe is an atomic force microscope probe.

5. A nanometer measurement system, characterized in that, Including the vibration damping gimbal for nanometer measurement as described in any one of claims 1-3.

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