A method, system and storage medium for drawing an overlay mark pattern

Abstract

This invention relates to the field of photolithography, and particularly to a method, system, and storage medium for drawing overlay marking patterns. The method for drawing overlay marking patterns includes the following steps: providing a chip design layout; obtaining filtering parameters and a filtering parameter table for the overlay marking patterns of the chip design layout using a preset tool; forming and classifying overlay marking patterns based on the filtering parameter table; combining the classified overlay marking patterns according to a preset combination method based on the filtering parameters to obtain multiple sets of markings; calling the filtering parameter table to obtain custom parameters for each set of markings; and converting the multiple sets of markings into graphic files and outputting them based on the custom parameters. This method, by matching and adjusting variable parameters before outputting, improves the efficiency of data conversion and the measurement rate of overlay errors, thereby saving computation time.

Description

[Technical Field]

[0001] This invention relates to the field of photolithography, and in particular to a method, system, and storage medium for drawing overlay marking patterns. [Background Technology]

[0002] In photolithography, overlay techniques are commonly used. However, overlay errors occur during the process. These errors refer to the deviations in the position of the patterns between upper and lower layers of a wafer during manufacturing. Since the functional area patterns of each layer on a wafer are different, it is impossible to directly measure the deviations using the patterns of the functional areas between layers. Therefore, it is necessary to add overlay markings of a specific shape and size outside the functional area patterns of each layer. By measuring these overlay markings, the deviations between layers can be indirectly measured.

[0003] The overlay marking pattern is not fixed. Relevant parameters can be obtained through overlay marking optimization software. This software takes variables such as the marking period (PITCH), critical dimension (CD), length (SPAN), and cutting parameters as input, and outputs them in the form of the above variables after simulation calculations for manufacturability, detectability, accuracy, and matching items. However, as a layout design, it is presented as a GDS file in the form of a pattern. The rapid measurement and accurate evaluation of overlay error is crucial for optimizing the lithography machine's operating parameters and managing the process yield. [Summary of the Invention]

[0004] To improve the measurement rate of overlay error, this invention provides a method for drawing overlay mark patterns, an event extraction system, and a storage medium.

[0005] The present invention provides a method for drawing overlay marking patterns, comprising the following steps: providing a chip design layout; obtaining filtering parameters and a filtering parameter table for the overlay marking patterns of the chip design layout based on a preset tool; forming and classifying overlay marking patterns based on the filtering parameter table; combining the classified overlay marking patterns in a preset combination method based on the filtering parameters to obtain multiple sets of markings; calling the filtering parameter table to obtain custom parameters for each set of markings; and converting the multiple sets of markings into graphic files and outputting them based on the custom parameters.

[0006] Preferably, a chip design layout is provided, and the filtering parameters and a filtering parameter table of the overlay marking patterns of the chip design layout are obtained based on a preset tool. Specifically, the following steps are included: obtaining the filtering parameters of the overlay marking patterns in the chip design layout based on a preset tool; and outputting the filtering parameters in the form of a preset parameter combination to obtain a filtering parameter table.

[0007] Preferably, the process of forming and classifying overlay marking graphics based on the screening parameter table includes the following steps: forming overlay marking graphics based on the screening parameter table and performing coarse classification; and performing fine classification on the overlay marking graphics based on the coarse classification results and the graphic size or interval.

[0008] Preferably, the fine classification is obtained by dividing the key dimensions and / or dividing the intervals between the key dimensions based on the coarse classification.

[0009] Preferably, the process of combining the classified overprinted marking graphics in a preset combination method based on the filtering parameters to obtain multiple sets of markings specifically includes the following steps: defining the graphic arrangement of a set of markings and obtaining the spacing between the graphics in the marking; arranging the overprinted marking graphics based on the graphic arrangement and the spacing between the graphics to obtain a set of markings; repeating the above steps to obtain multiple sets of markings.

[0010] Preferably, each group of marks includes two layers, each layer includes four sub-marks, and the four sub-marks in each layer include two combination methods, with each combination method including two directions of the sub-marks.

[0011] Preferably, the four sub-markers in each layer include a first combination method and a second combination method generated based on the first combination method, wherein the second combination method includes at least one preset size.

[0012] Preferably, converting multiple sets of marks into graphic files and outputting them based on custom parameters specifically includes the following steps: obtaining the dimensions specified in the graphic file; converting the marks with custom parameters into graphic files and outputting them based on the dimensions specified in the graphic file and the graphic spacing of the marks in the overlay mark graphic.

[0013] To address the aforementioned technical problems, this invention also provides a system for drawing overlay marking patterns, implementing the method for drawing overlay marking patterns as described above. The system includes an information acquisition module for acquiring a chip design layout, acquiring filtering parameters and a filtering parameter table for the overlay marking patterns on the chip design layout using a preset tool, combining the categorized overlay marking patterns according to the filtering parameters using a preset combination method, acquiring multiple sets of combined markings, and acquiring custom parameters for each set of markings; an operation module for forming and categorizing overlay marking patterns based on the filtering parameter table, and combining the categorized overlay marking patterns according to the filtering parameters using a preset combination method; and a conversion module for converting multiple sets of markings into graphic files based on custom parameters.

[0014] To solve the above-mentioned technical problems, the present invention also provides a storage medium, including a memory, a processor, and a computer program stored in the memory and executable on the processor. When the processor executes the computer program, it implements the method for drawing overlay marking patterns as described above.

[0015] Compared with the prior art, the method, system and storage medium for drawing overlay marking patterns of the present invention have the following advantages:

[0016] 1. The method for drawing overlay marking patterns according to the present invention includes the following steps: providing a chip design layout; obtaining the filtering parameters and a filtering parameter table of the overlay marking patterns of the chip design layout based on a preset tool; forming and classifying overlay marking patterns based on the filtering parameter table; combining the classified overlay marking patterns in a preset combination method based on the filtering parameters to obtain multiple sets of markings; calling the filtering parameter table to obtain custom parameters for each set of markings; and converting the multiple sets of markings into graphic files and outputting them based on the custom parameters. The preset tool takes variables such as the mark period, key dimensions, length, and cutting parameters as input, and outputs them in the same variable form after simulation calculations for manufacturability, detectability, accuracy, and matching. However, layout design is presented as a graphic file in the form of a pattern. Therefore, there is a data conversion process between the variable output and the acquisition of the final graphic file, which increases the calculation time. This method matches and adjusts the variable parameters before outputting, which can improve the efficiency of data conversion and increase the measurement rate of overlay error, thereby saving calculation time. In addition, existing drawing tools draw one graphic at a time, while the preset tool usually obtains multiple marks, i.e., multiple graphics. Therefore, this method can draw and input multiple graphics at the same time, further improving the calculation speed.

[0017] 2. The method for drawing overlay marking patterns of the present invention provides a chip design layout, and obtains the filtering parameters and a filtering parameter table of the overlay marking patterns of the chip design layout based on a preset tool. Specifically, it includes the following steps: obtaining the filtering parameters of the overlay marking patterns in the chip design layout based on a preset tool; outputting the filtering parameters in the form of a preset parameter combination to obtain a filtering parameter table. Through this method, the filtering parameters in the overlay marking patterns are first obtained, and then a filtering parameter table is obtained based on the filtering parameters. The overlay marking patterns are generated and classified based on the filtering parameter table, thus allowing for multiple calls to the filtering parameters in the filtering parameter table. Finally, the method converts the parameters into a graphic file based on the parameter table, overcoming the shortcomings of the prior art and improving the functionality of overlay marking optimization software compared to the prior art.

[0018] 3. The method for drawing overlay marking patterns according to the present invention, which forms and classifies overlay marking graphics based on a screening parameter table, specifically includes the following steps: forming overlay marking graphics based on the screening parameter table and performing coarse classification; and performing fine classification of the overlay marking graphics based on the coarse classification results and graphic size or interval. Coarse classification yields fewer graphic categories with less distinction between them, lacking precision. This method obtains more types of fine classifications based on coarse classification, making the distinction between graphics more rigorous and facilitating variable parameter adjustments. Therefore, data conversion is more convenient at the end, further saving computation time.

[0019] 4. The method for drawing overlay marking patterns according to the present invention, which combines the classified overlay marking graphics in a preset combination method based on screening parameters to obtain multiple sets of markings, specifically includes the following steps: defining a graphic arrangement method for a set of markings and obtaining the spacing between the graphics in the marking; arranging the overlay marking graphics based on the graphic arrangement method and the spacing between the graphics to obtain a set of markings; repeating the above steps to obtain multiple sets of markings. The graphic arrangement method of the markings can be customized by the user, so users can directly obtain the required graphic files through this method, which is more targeted and more convenient to use. Moreover, the spacing between the graphics affects the overall area of ​​the graphics in the final graphic file. Changing the spacing between the graphics makes it easier to adjust the overlay marking graphics during use, thereby improving the overall speed.

[0020] 5. The method for drawing overlay marking patterns of the present invention includes two layers for each group of markings, four sub-marks for each layer, and two combination methods for the four sub-marks in each layer. Each combination method includes two directions for the sub-marks. By setting multiple layers, multiple sub-marks, and different combination methods, the diversity of combinations can be increased, thereby covering more graphic classifications.

[0021] 6. The method for drawing overlay marking patterns of the present invention includes four sub-markers in each layer comprising a first combination method and a second combination method generated based on the first combination method, wherein the second combination method includes at least one preset size. By setting at least one preset size to combine the graphics, users can customize one or more, further improving the diversity of classification and covering a wider range.

[0022] 7. This invention also provides a system for drawing overlay marking patterns, implementing the overlay marking pattern drawing method described above. The system includes an information acquisition module for acquiring a chip design layout, acquiring filtering parameters and a filtering parameter table for the overlay marking graphics of the chip design layout based on a preset tool, combining the categorized overlay marking graphics according to the filtering parameters using a preset combination method, acquiring multiple sets of combined markings, and acquiring custom parameters for each set of markings; an operation module for forming and categorizing overlay marking graphics based on the filtering parameter table, and combining the categorized overlay marking graphics according to the filtering parameters using a preset combination method; and a conversion module for converting multiple sets of markings into graphic files based on custom parameters. The overlay marking pattern drawing system has the same beneficial effects as the overlay marking pattern drawing method described above, and will not be elaborated upon here.

[0023] 8. The present invention also provides a storage medium storing a computer program thereon. When the computer program is executed, it implements the above-described method for drawing overlay marking patterns and has the same beneficial effects as the above-described method for drawing overlay marking patterns, which will not be described in detail here. [Attached Image Description]

[0024] To more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0025] Figure 1 This is a flowchart of the steps of a method for drawing an overlay marking pattern provided in the first embodiment of the present invention.

[0026] Figure 2 This is a flowchart of step S1 in a method for drawing an overlay marking pattern provided in the first embodiment of the present invention.

[0027] Figure 3 This is a schematic diagram of the selection parameter table for a method of drawing overlay marking patterns provided in the first embodiment of the present invention.

[0028] Figure 4 This is a flowchart of step S2 in a method for drawing overprinted marking patterns provided in the first embodiment of the present invention.

[0029] Figure 5 This is an example diagram illustrating a detailed classification of a method for drawing overprinted marking patterns provided in the first embodiment of the present invention.

[0030] Figure 6 This is a flowchart of step S3 in a method for drawing overprinted marking patterns provided in the first embodiment of the present invention.

[0031] Figure 7 This is an example diagram of a preset combination method for drawing an overlay marking pattern provided in the first embodiment of the present invention.

[0032] Figure 8 This is an example graphic file illustrating a method for drawing overprinted marking patterns provided in the first embodiment of the present invention.

[0033] Figure 9 This is a flowchart of step S5 in a method for drawing an overlay marking pattern provided in the first embodiment of the present invention.

[0034] Figure 10 This is a schematic diagram of the structure of a drawing system for overlay marking patterns provided in the second embodiment of the present invention.

[0035] Figure 11 This is a schematic diagram of the structure of a storage medium provided in the third embodiment of the present invention.

[0036] Explanation of reference numerals in the attached diagram:

[0037] 1. A system for drawing overprinted marking patterns; 2. A storage medium;

[0038] 11. Information acquisition module; 12. Operation module; 13. Conversion module; 21. Memory; 22. Processor; 23. Computer program.

Detailed Implementation Methods

[0039] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the invention.

[0040] Please see Figure 1 The first embodiment of the present invention provides a method for drawing overlay marking patterns, comprising the following steps:

[0041] S1: Provide a chip design layout and obtain the filtering parameters and filtering parameter table of the overlay mark graphics of the chip design layout based on the preset tool;

[0042] S2: Generate and classify overlay marking graphics based on the filtering parameter table;

[0043] S3: Based on the filtering parameters, the classified overprinted marking graphics are combined in a preset combination method to obtain multiple sets of markings;

[0044] S4: Call the filter parameter table to obtain the custom parameters for each group of tags;

[0045] S5: Convert multiple sets of markers into graphic files and output them based on custom parameters.

[0046] It should be noted that the default tool is overlay marking optimization software. Overlay marking optimization software takes variables such as the marking cycle, key dimensions, length, and cutting parameters as input, and outputs them in the form of the above variables after simulation calculations of manufacturability, detectability, accuracy, and matching. However, as a layout design, it is a graphic file presented in the form of a pattern. Therefore, there is a data conversion process between the output of variables and the acquisition of the final graphic file, which will increase the calculation time.

[0047] Understandably, matching and adjusting variable parameters through this method before outputting can improve the efficiency of data conversion, increase the measurement rate of overlay error, and thus save computation time. Furthermore, existing drawing tools draw one graphic at a time, while overlay mark optimization software usually obtains multiple marks, i.e., multiple graphics. Therefore, this method can draw and input multiple graphics simultaneously, further improving computation speed.

[0048] Furthermore, please combine Figures 2-3This involves providing a chip design layout and obtaining the filtering parameters and a filtering parameter table for the overlay marking patterns of the chip design layout based on preset tools. Specifically, the steps include:

[0049] S11: Obtain the filtering parameters of the overlay marking pattern in the chip design layout based on the preset tool;

[0050] S12: Output the filtering parameters in the form of preset parameter combinations to obtain a filtering parameter table.

[0051] Specifically, for a simple unit, the input pitch (period): 500-800nm, cd (critical dimension): 300-500nm; one pitch and one cd value correspond to one method of generating overlay marking patterns, so there are 300 * 200 = 60,000 patterns. The calculation process of the overlay marking optimization software is the transmission of (pitch, cd) numbers, and the output is also a combination of numbers, which is the formed selection parameter table.

[0052] Understandably, this method first obtains the filtering parameters in the overlay mark graphics, then obtains a filtering parameter table based on the filtering parameters, and the overlay mark graphics are generated and classified based on the filtering parameter table. Therefore, the filtering parameters in the filtering parameter table can be called multiple times. Finally, the parameters are converted into graphic files based on the parameter table, which overcomes the defects of the existing technology and improves the functionality of overlay mark optimization software compared to the existing technology.

[0053] Furthermore, please combine Figures 4-5 The process of generating and classifying overlay marking graphics based on a selection parameter table includes the following steps:

[0054] S21: Based on the screening parameter table, generate overlay marking graphics and perform coarse classification;

[0055] S22: Based on the coarse classification results and the graphic size or interval, perform fine classification on the overlay marking graphics.

[0056] Specifically, the fine classification is obtained by dividing the key dimensions and / or the intervals between key dimensions based on the coarse classification.

[0057] It should be noted that currently there are simple Line-Space and simple dot matrix graphics. Based on the graphic style requirements of overlay marking graphics in the process, and relying on existing drawing technology, four basic types (coarse classifications) have been developed: BasicLS (Basic LineSpace), ParallelST (Parallel Segmentation), VertST (Vertical Segmentation), and 2DST (Two-Dimensional Segmentation). In a specific embodiment of this invention, the four basic types are further subdivided according to the key dimension (CD) type and the space type, expanding to a total of seven basic classifications (refined classifications): BasicLS, ParallelST-C, ParallelST-S, VertST-C, VertST-S, 2DST-C, and 2DST-S, where -C represents the CD type and -S represents the space type.

[0058] Specifically, BasicLS is the most basic line-space graphic style, and its description parameters only require the period (PITCH) and critical dimension (CD). Other more refined classification types, in addition to the period (PITCH) and critical dimension (CD), require additional description parameters obtained from a parameter table. The refined classifications are as follows:

[0059] ParalST-C: Divide the CD along the CD direction; ① the resulting miniCD; ② the spacing between the resulting miniCDs; ③ the number of divisions.

[0060] ParalST-S: Divides the CD along the CD direction into spaces, ① miniCDs after division; ② the distance between miniCDs after division; ③ the number of divisions.

[0061] VertST-C: Divides CD along the perpendicular direction of CD, ① the width of the small rectangles after division in the perpendicular direction; ② the spacing between the widths of the small rectangles after division in the perpendicular direction.

[0062] VertST-S: Divide the space between CD along the perpendicular direction of CD. ① The distance between the blank spaces in the perpendicular direction after the division; ② The distance of the blank space in the perpendicular direction after the division.

[0063] 2D S TC: Divide CD along both the CD direction and its perpendicular direction. ① The horizontal width of the resulting small rectangles; ② The spacing between the horizontal widths of the resulting small rectangles; ③ The vertical width of the resulting small rectangles; ④ The spacing between the vertical widths of the resulting small rectangles.

[0064] 2D S TS: Divide CD along the CD direction and its perpendicular direction to form the interval between CD, ① the horizontal width of the blank rectangles after division; ② the interval between the horizontal widths of the blank rectangles after division; ③ the vertical width of the blank rectangles after division; ④ the interval between the vertical widths of the blank rectangles after division.

[0065] Understandably, coarse classification yields fewer graphic categories with less distinction between them, lacking precision. This method, based on coarse classification, obtains more refined categories, making the distinction between graphics more rigorous and facilitating the adjustment of variable parameters. Consequently, data transformation becomes more convenient, further saving computation time.

[0066] Furthermore, please combine Figures 6-8 The process of combining the classified overprinted marking graphics based on filtering parameters into multiple sets of markings includes the following steps:

[0067] S 31: Define the graphic arrangement of a set of markers and obtain the spacing between the graphics in the marker;

[0068] S 32: Based on the arrangement of graphics and the spacing between graphics, a set of markings is obtained by overlaying the marking graphics;

[0069] S 33: Repeat steps S 31-S 32 to obtain multiple sets of labels.

[0070] It should be noted that users can customize the left / right and up / down spacing between overlay mark graphic combinations, and can select some or all of the parameters in the overlay mark parameters for drawing.

[0071] Specifically, the filtering parameter table corresponds to the overall overlay mark graphic generation method. Not every generation method needs to be used, as this would increase computational complexity and reduce efficiency. Therefore, during use, you only need to customize some data or the arrangement of mark graphics and specify the mark to obtain the corresponding data.

[0072] Understandably, the arrangement of the marked graphics can be customized, so users can directly obtain the required graphic files through this method, which is more targeted and easier to use. Moreover, the spacing between the graphics will affect the overall area of ​​the final graphic file. Changing the spacing between the graphics can make it easier to adjust the overlay marking graphics during use, thereby improving the overall speed.

[0073] Furthermore, each group of markers includes two layers, each layer includes four sub-markers, and the four sub-markers in each layer include two combination methods, with each combination method including two directions for the sub-markers.

[0074] It should be noted that each group of markers includes two layers: top and bottom. The two directions are the coordinate system established on the plane. The x-axis and y-axis in the coordinate system refer to the orientation of the sub-mark along one of the x-axis or y-axis.

[0075] Specifically, each layer has four sub-markers, including a first combination method and a second combination method generated based on the first combination method. The second combination method includes at least one preset size.

[0076] More specifically, in a specific embodiment of the present invention, the first combination method is of type DBO, and the second combination form is of type uD BO. uD BO is further divided into three types according to size: uD BO Oc 10 (10*10um), uD BO Oc 16 (16*16um), and uD BO Oc 20 (20*20um). This allows users to select one or more combination forms of a set of marks for drawing according to their own preferences.

[0077] It should be noted that placing overlay marking patterns on the chip design layout requires a certain area, and the DBO type with a size of 40*160um is usually used. In the process of continuous improvement and refinement, the uDBO type with a smaller size has emerged.

[0078] With the basic classification graphic style and description parameters of the sub-marks determined, changes in the combination method and size result in changes in the number of times the internal period (PITCH) is repeated within the sub-mark, while the values ​​of the description parameters remain unchanged. For example, in a specific embodiment of the present invention, both DBO and uDBO types are supported. With the BasicLS basic type, the PITCH is repeated 50 times in the DBO combination method, while in the uDBO-c20 combination method, the overall size of the sub-mark is reduced, and the PITCH is repeated only about 10 times, but the PITCH value itself remains unchanged.

[0079] Understandably, by setting multiple layers, multiple sub-labels, and different combination methods, the diversity of combinations can be increased, thereby covering more graphic categories. By setting at least one preset size to combine graphics, users can customize one or more, further improving the diversity of categories and covering a wider range.

[0080] Furthermore, please refer to the user-defined preset combination of overlay marks (DBO, uDBO-c10, uDBO-c16, uDBO-c20) to combine the graphics. One or more can be customized. Then, select the horizontal spacing (Group width) and vertical spacing (Group height) between overlay mark groups, as well as the width (GDSwidth) and height (GDS height) of the entire GDS map, and draw the parameters after translating the parameter table calculated by the overlay mark optimization software.

[0081] It should be noted that the coarse classification type contained in each group of markers can be directly read. The fine classification, which is based on variables such as period (PITCH), critical size (CD), length (SPAN), and segmentation parameters, requires translation and extraction based on the basic type. In the parameter table, P represents PITCH, C represents CD, and the first row contains group_ID, which is the group number, with one group above and one group below, forming a pair. Each pair of markers has a unique ID. x_Target_ID is the graphic number, consisting of x_top and x_bottom. x_top is the descriptive parameter name of the marker in the top layer in the x-direction; x_top_mark_type is the basic classification name of the marker graphic in the top layer in the x-direction; x_bottom is the descriptive parameter name of the marker in the bottom layer in the x-direction; x_bottom_mark_type is the basic classification name of the marker graphic in the bottom layer in the x-direction; the naming of those with the Y prefix is ​​similar to those with the X prefix.

[0082] For further details, please refer to Figure 9 The process of converting multiple sets of markers into graphic files and outputting them based on custom parameters includes the following steps:

[0083] S51: Obtain the dimensions specified in the graphic file;

[0084] S52: Based on the dimensions specified in the graphic file and the graphic spacing of the marks in the overlay mark graphic, convert the marks with custom parameters into a graphic file and output it.

[0085] Please see Figure 10The second embodiment of the present invention provides a drawing system 1 for overlay marking patterns, which implements the drawing method for overlay marking patterns as described above. The system includes an information acquisition module 11: used to acquire a chip design layout, acquire filtering parameters and a filtering parameter table for the overlay marking graphics of the chip design layout based on a preset tool, combine the classified overlay marking graphics in a preset combination method based on the filtering parameters, acquire multiple sets of combined markings, and acquire custom parameters for each set of markings; an operation module 12: used to form and classify overlay marking graphics based on the filtering parameter table, and combine the classified overlay marking graphics in a preset combination method based on the filtering parameters; and a conversion module 13: used to convert multiple sets of markings into graphic files based on custom parameters.

[0086] The overlay marking pattern drawing system 1 has the same beneficial effects as the overlay marking pattern drawing method described above, and will not be elaborated here.

[0087] Please see Figure 11 The third embodiment of the present invention provides a storage medium 2, including a memory 21, a processor 22, and a computer program 23 stored on the memory 21 and executable on the processor 22. When the processor 22 executes the computer program 23, it implements the above-mentioned method for drawing overlay marking patterns and has the same beneficial effects as the above-mentioned method for drawing overlay marking patterns, which will not be described in detail here.

[0088] It is understood that, according to the embodiments disclosed in this invention, the processes described above with reference to the flowcharts can be implemented as computer software programs. For example, embodiments of this disclosure include a computer program product comprising a computer program carried on a computer-readable medium, the computer program containing program code for performing the methods shown in the flowcharts. In such embodiments, the computer program can be downloaded and installed from a network via a communication component, and / or installed from a removable medium. When the computer program is executed by a central processing unit (CPU), it performs the functions defined in the methods of this application. It should be noted that the computer-readable medium described in this application can be a computer-readable signal medium or a computer-readable storage medium, or any combination of the two. Computer-readable storage media include, but are not limited to, electrical, magnetic, optical, electromagnetic, infrared, or semiconductor systems, apparatuses, or devices, or any combination thereof. More specific examples of computer-readable storage media may include, but are not limited to: electrical connections having one or more wires, portable computer disks, hard disks, random access memory (RAM), read-only memory (ROM), erasable programmable read-only memory (EPROM or flash memory), optical fiber, portable compact disk read-only memory (CDROM), optical storage devices, magnetic storage devices, or any suitable combination thereof. In this application, a computer-readable storage medium can be any tangible medium containing or storing a program that can be used by or in connection with an instruction execution system, apparatus, or device. In this application, a computer-readable signal medium may include a data signal propagated in baseband or as part of a carrier wave, carrying computer-readable program code. Such propagated data signals can take various forms, including but not limited to electromagnetic signals, optical signals, or any suitable combination thereof. A computer-readable signal medium may also be any computer-readable medium other than a computer-readable storage medium, which can send, propagate, or transmit a program for use by or in connection with an instruction execution system, apparatus, or device. Program code contained on a computer-readable medium may be transmitted using any suitable medium, including but not limited to: wireless, wire, optical fiber, RF, etc., or any suitable combination thereof.

[0089] Computer program code for performing the operations of this application can be written in one or more programming languages ​​or a combination thereof, including object-oriented programming languages ​​such as Java, Smalltalk, and C++, as well as conventional procedural programming languages ​​such as C or similar languages. The program code can be executed entirely on the user's computer, partially on the user's computer, as a standalone software package, partially on the user's computer and partially on a remote computer, or entirely on a remote computer or server. In cases involving remote computers, the remote computer can be connected to the user's computer via any type of network, including a local area network (LAN) or a wide area network (WAN), or it can be connected to an external computer (e.g., via the Internet using an Internet service provider).

[0090] In the embodiments provided by this invention, it should be understood that "B corresponding to A" means that B is associated with A, and B can be determined based on A. However, it should also be understood that determining B based on A does not mean determining B solely based on A; B can also be determined based on A and / or other information.

[0091] It should be understood that the phrase "one embodiment" or "an embodiment" throughout the specification means that a specific feature, structure, or characteristic related to the embodiment is included in at least one embodiment of the invention. Therefore, "in one embodiment" or "in an embodiment" appearing throughout the specification does not necessarily refer to the same embodiment. Furthermore, these specific features, structures, or characteristics can be combined in any suitable manner in one or more embodiments. Those skilled in the art should also recognize that the embodiments described in the specification are optional embodiments, and the actions and modules involved are not necessarily essential to the invention.

[0092] In various embodiments of the present invention, it should be understood that the sequence number of each process does not necessarily imply the order of execution. The execution order of each process should be determined by its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of the present invention.

[0093] The flowcharts and block diagrams in the accompanying drawings illustrate the architecture, functionality, and operation of possible implementations of systems, methods, and computer program products according to various embodiments of this application. In this regard, each block in a flowchart or block diagram may represent a module, segment, or portion of code containing one or more executable instructions for implementing a specified logical function. It should also be noted that in some alternative implementations, the functions indicated in the blocks may occur in a different order than those indicated in the drawings. For example, two consecutively indicated blocks may actually be executed substantially in parallel, and they may sometimes be executed in reverse order, depending on the functions involved. It is particularly important to note that each block in the block diagrams and / or flowcharts, and combinations of blocks in the block diagrams and / or flowcharts, can be implemented using a dedicated hardware-based system that performs the specified function or operation, or using a combination of dedicated hardware and computer instructions.

[0094] Compared with the prior art, the method, system and storage medium for drawing overlay marking patterns of the present invention have the following advantages:

[0095] 1. The method for drawing overlay marking patterns according to the present invention includes the following steps: providing a chip design layout; obtaining the filtering parameters and a filtering parameter table of the overlay marking patterns of the chip design layout based on a preset tool; forming and classifying overlay marking patterns based on the filtering parameter table; combining the classified overlay marking patterns in a preset combination method based on the filtering parameters to obtain multiple sets of markings; calling the filtering parameter table to obtain custom parameters for each set of markings; and converting the multiple sets of markings into graphic files and outputting them based on the custom parameters. The preset tool takes variables such as the mark period, key dimensions, length, and cutting parameters as input, and outputs them in the same variable form after simulation calculations for manufacturability, detectability, accuracy, and matching. However, layout design is presented as a graphic file in the form of a pattern. Therefore, there is a data conversion process between the variable output and the acquisition of the final graphic file, which increases the calculation time. This method matches and adjusts the variable parameters before outputting, which can improve the efficiency of data conversion and increase the measurement rate of overlay error, thereby saving calculation time. In addition, existing drawing tools draw one graphic at a time, while the preset tool usually obtains multiple marks, i.e., multiple graphics. Therefore, this method can draw and input multiple graphics at the same time, further improving the calculation speed.

[0096] 2. The method for drawing overlay marking patterns of the present invention provides a chip design layout, and obtains the filtering parameters and a filtering parameter table of the overlay marking patterns of the chip design layout based on a preset tool. Specifically, it includes the following steps: obtaining the filtering parameters of the overlay marking patterns in the chip design layout based on a preset tool; outputting the filtering parameters in the form of a preset parameter combination to obtain a filtering parameter table. Through this method, the filtering parameters in the overlay marking patterns are first obtained, and then a filtering parameter table is obtained based on the filtering parameters. The overlay marking patterns are generated and classified based on the filtering parameter table, thus allowing for multiple calls to the filtering parameters in the filtering parameter table. Finally, the method converts the parameters into a graphic file based on the parameter table, overcoming the shortcomings of the prior art and improving the functionality of overlay marking optimization software compared to the prior art.

[0097] 3. The method for drawing overlay marking patterns according to the present invention, which forms and classifies overlay marking graphics based on a screening parameter table, specifically includes the following steps: forming overlay marking graphics based on the screening parameter table and performing coarse classification; and performing fine classification of the overlay marking graphics based on the coarse classification results and graphic size or interval. Coarse classification yields fewer graphic categories with less distinction between them, lacking precision. This method obtains more types of fine classifications based on coarse classification, making the distinction between graphics more rigorous and facilitating variable parameter adjustments. Therefore, data conversion is more convenient at the end, further saving computation time.

[0098] 4. The method for drawing overlay marking patterns according to the present invention, which combines the classified overlay marking graphics in a preset combination method based on screening parameters to obtain multiple sets of markings, specifically includes the following steps: defining a graphic arrangement method for a set of markings and obtaining the spacing between the graphics in the marking; arranging the overlay marking graphics based on the graphic arrangement method and the spacing between the graphics to obtain a set of markings; repeating the above steps to obtain multiple sets of markings. The graphic arrangement method of the markings can be customized by the user, so users can directly obtain the required graphic files through this method, which is more targeted and more convenient to use. Moreover, the spacing between the graphics affects the overall area of ​​the graphics in the final graphic file. Changing the spacing between the graphics makes it easier to adjust the overlay marking graphics during use, thereby improving the overall speed.

[0099] 5. The method for drawing overlay marking patterns of the present invention includes two layers for each group of markings, four sub-marks for each layer, and two combination methods for the four sub-marks in each layer. Each combination method includes two directions for the sub-marks. By setting multiple layers, multiple sub-marks, and different combination methods, the diversity of combinations can be increased, thereby covering more graphic classifications.

[0100] 6. The method for drawing overlay marking patterns of the present invention includes four sub-markers in each layer comprising a first combination method and a second combination method generated based on the first combination method, wherein the second combination method includes at least one preset size. By setting at least one preset size to combine the graphics, users can customize one or more, further improving the diversity of classification and covering a wider range.

[0101] 7. This invention also provides a system for drawing overlay marking patterns, implementing the overlay marking pattern drawing method described above. The system includes an information acquisition module for acquiring a chip design layout, acquiring filtering parameters and a filtering parameter table for the overlay marking graphics of the chip design layout based on a preset tool, combining the categorized overlay marking graphics according to the filtering parameters using a preset combination method, acquiring multiple sets of combined markings, and acquiring custom parameters for each set of markings; an operation module for forming and categorizing overlay marking graphics based on the filtering parameter table, and combining the categorized overlay marking graphics according to the filtering parameters using a preset combination method; and a conversion module for converting multiple sets of markings into graphic files based on custom parameters. The overlay marking pattern drawing system has the same beneficial effects as the overlay marking pattern drawing method described above, and will not be elaborated upon here.

[0102] 8. The present invention also provides a storage medium storing a computer program thereon. When the computer program is executed, it implements the above-described method for drawing overlay marking patterns and has the same beneficial effects as the above-described method for drawing overlay marking patterns, which will not be described in detail here.

[0103] The foregoing has provided a detailed description of a method, system, and storage medium for drawing overprinted marking patterns according to embodiments of the present invention. Specific examples have been used to illustrate the principles and implementation methods of the present invention. The descriptions of the above embodiments are only for the purpose of helping to understand the method and core ideas of the present invention. At the same time, for those skilled in the art, there will be changes in specific implementation methods and application scope based on the ideas of the present invention. Therefore, the content of this specification should not be construed as a limitation of the present invention. Any modifications, equivalent substitutions, and improvements made within the principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A method of drawing a lithography mark pattern, characterized by: Includes the following steps: Provide a chip design layout, and obtain the filtering parameters and filtering parameter table of the overlay mark pattern of the chip design layout based on the preset tool; Based on the filtering parameter table, overlay marking graphics are generated and categorized; Based on the filtering parameters, the classified overprinted marking graphics are combined in a preset combination method to obtain multiple sets of markings; Call the filter parameter table to obtain the custom parameters for each group of tags; Convert multiple sets of markers into graphic files and output them based on custom parameters.

2. The method of claim 1, wherein: Provided is a chip design layout. Based on a preset tool, the filter parameters and filter parameter table for the overlay marking pattern of the chip design layout are obtained. The specific steps include the following: The selection parameters for the overlay markings in the chip design layout are obtained based on preset tools; The filtering parameters are output in the form of preset parameter combinations to obtain a filtering parameter table.

3. The method of claim 1, wherein: The process of generating and classifying overlay marking graphics based on the filtering parameter table includes the following steps: Based on the screening parameter table, overlay marking graphics are generated and coarsely classified; Based on the coarse classification results and the graphic size or spacing, the overlay marking graphics are finely classified.

4. The method for drawing overlay marking patterns as described in claim 3, characterized in that: The fine classification is obtained by dividing the key dimensions and / or the intervals between the key dimensions based on the coarse classification.

5. The method for drawing overprinted marking patterns as described in claim 1, characterized in that: The classified overlay marking graphics are combined in a preset combination method based on the filtering parameters to obtain multiple sets of markings. The specific steps include the following: Define the graphic arrangement of a set of markers and obtain the spacing between the graphics in that set of markers; A set of markings is obtained by arranging and overlaying the markings according to the graphic arrangement and spacing between the graphics; Repeat the above steps to obtain multiple sets of labels.

6. The method for drawing overprinted marking patterns as described in claim 1, characterized in that: Each group of markers consists of two layers, each layer consists of four sub-markers, and the four sub-markers in each layer include two combination methods. Each combination method includes two directions for the sub-markers.

7. The method for drawing overprinted marking patterns as described in claim 6, characterized in that: Each layer contains four sub-markers, including a first combination method and a second combination method generated based on the first combination method. The second combination method includes at least one preset size.

8. The method for drawing overprinted marking patterns as described in claim 1, characterized in that: Converting multiple sets of markers into graphic files and outputting them based on custom parameters involves the following steps: Obtain the dimensions specified in the graphic file; Based on the dimensions specified in the graphic file and the spacing between the marks in the overlay mark graphic, the marks with custom parameters are converted into graphic files and output.

9. A system for drawing overlay marking patterns, implementing the method for drawing overlay marking patterns as described in any one of claims 1-8, characterized in that: It includes an information acquisition module: used to acquire chip design layout, acquire the filtering parameters and filtering parameter table of the overlay mark graphics of the chip design layout based on preset tools, combine the classified overlay mark graphics in a preset combination method based on the filtering parameters, acquire multiple sets of combined marks, and acquire the custom parameters of each set of marks; Operation module: Generates and categorizes overlay marking graphics based on a filter parameter table, and combines the categorized overlay marking graphics in a preset combination method based on the filter parameters; Conversion module: Converts multiple sets of markers into graphic files based on custom parameters.

10. A storage medium comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, characterized in that: When the processor executes the computer program, it implements the method for drawing overlay marking patterns as described in any one of claims 1-8.

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