Sound production device and audio apparatus

CN117278916BActive Publication Date: 2026-08-28WEIFANG GOERDYNA TECH CO LTD
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Patent Information

Application Number
CN202311254745.6
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-09-26
Publication Date
2026-08-28
Estimated Expiration
2043-09-26

AI Technical Summary

Technical Problem

现今,市场越来越追求全频段音质,为满足全频段音质,涌现出很多多单元发声装置,即一个发声装置中放置多个发声频段不同的发声单元,其中,高音发声单元一般位于中间,容易受到周侧的其他发声单元的干扰,从而引起失真,影响发声装置的发声性能

Benefits of technology

[0020]在本发明技术方案中,第一振膜的设置位置避开了第二振膜的声波辐射区域,且第二振膜也在在第一振膜的声波辐射区域之外,第一振膜和第二振膜的振动互不干扰,有利于保障发声装置在不同频段的发声性能。其次,第二振膜呈锥面结构,更有利于设计发声装置达到360度指向性的反射锥,另外,相较平面振膜而言,第二振膜不容易横向振动,因此,第二振膜的边侧不必设置折边,当第二振膜的作为中高音振膜时,由于中高音的波长短,对发声装置的外表面的平整度要求较高,第二振膜不设置折边,能够减小折边的高度对平面度的影响,有利于避免声波反射造成频响曲线中的峰谷,从而能够提升第一振膜的频响曲线的平坦度。同时,第一振膜和第二振膜的同轴设置,形成点声源,使得发声装置的声音输出更自然,有利于提升用户的听觉体验。

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Abstract

The application discloses a sound production device and an audio equipment, wherein the sound production device comprises a mounting base, a magnetic circuit system, a first diaphragm and a second diaphragm, the magnetic circuit system comprises a first magnetic circuit system and a second magnetic circuit system, the first magnetic circuit system is formed with a first magnetic gap, the second magnetic circuit system is formed with a second magnetic gap, the second magnetic gap is annularly arranged outside the first magnetic gap, the first diaphragm is arranged corresponding to the first magnetic gap, the second diaphragm is arranged corresponding to the second magnetic gap, the vibration frequency of the second diaphragm is lower than that of the first diaphragm, the second diaphragm is located on the side of the first diaphragm close to the mounting base, the second diaphragm is arranged in a gradually expanding cylindrical shape in the direction close to the mounting base, the projections of the first diaphragm and the second diaphragm on the mounting base are respectively a first projection and a second projection, and the first projection is located on the inner ring side of the second projection. The technical scheme of the application aims to reduce the interference between different diaphragms to guarantee the sound production performance of the sound production device.
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Citation Information

Patent Citations

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    WO2017080682A1