涂布机调节模式
By combining the oscillating motion of low-mass or high-heat-capacity substrates with sputtering and heating in the coating machine, the problems of sputtering material deposition and energy waste during the coating machine conditioning process are solved, achieving efficient moisture removal and energy utilization, and reducing debris risk and cleaning complexity.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- BUHLER ALZENAU GMBH
- Filing Date
- 2022-03-01
- Publication Date
- 2026-07-17
AI Technical Summary
Existing coating machines suffer from problems such as sputtering target consumption, sputtering material deposition leading to debris risk and energy waste during adjustment, as well as energy loss and material contamination caused by glass circulation heating after adjustment.
A low-mass or high-heat-capacity substrate is used to oscillate within the coating machine's processing area. This is combined with a sputtering process and a heating device, and regulation is achieved through suction and venting. The sputtering process provides heat and prevents material deposition, while a heating channel transfers heat. Alternating suction and venting ensure effective moisture removal.
It reduces the risk of debris, minimizes energy waste and material loss, simplifies the cleaning process, and improves regulation efficiency and energy utilization.
Smart Images
Figure CN117280074B_ABST