Glass materials and glass elements

By reasonably designing the components and content range of glass materials, the problem of existing glass materials decreasing transmittance under long-term radiation in the ultraviolet band is solved, and high transmittance and excellent UV radiation resistance are achieved, meeting the needs of high-precision lithography equipment.

CN117285251BActive Publication Date: 2025-03-25CDGM OPTICAL GLASS
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Patent Information

Application Number
CN202311239629.7
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-09-25
Publication Date
2025-03-25
Estimated Expiration
2043-09-25

AI Technical Summary

Technical Problem

The transmittance of existing glass materials has dropped significantly and the refractive index changes under long-term radiation in the ultraviolet band, making it difficult to meet the requirements of high-precision lithography equipment.

Method used

By rationally designing the components of glass materials, they contain components such as SiO2, B2O3, K2O, F, etc., and controlling their content range to improve the ultraviolet transmittance and UV radiation resistance of the glass.

Benefits of technology

It realizes the high transmittance of glass materials in the ultraviolet band and excellent UV radiation resistance, meeting the needs of high-precision lithography equipment.

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Abstract

The present invention provides a glass material, the components of which are expressed in weight percentage, and contain: SiO2: 50-70%; B2O3: 2-18%; K2O: 10-30%; Nb2O5: 0-2%; TiO2: 0-2%; ZrO2: 0-3%; F: greater than 3% but less than or equal to 20%, wherein (ZrO2+Nb2O5+TiO2) / F is 0.01-1.0. Through reasonable component design, the glass material of the present invention has a high ultraviolet light transmittance and excellent ultraviolet radiation resistance.
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