Method, device and system for monitoring gas in gas chamber of high-voltage electrical equipment

Abstract

The application discloses a kind of high-voltage electrical equipment gas chamber gas monitoring method, device and system, the method, device and system of the application, by based on uniform arrangement strategy, multiple first temperature monitoring components are uniformly arranged in the gas chamber shell outside high-voltage electrical equipment, so that it correctly feedbacks the influence of different environmental factors, then combining the ambient temperature measured by second temperature monitoring component, and combining conductor heat output, the equivalent average temperature of high-voltage electrical equipment gas chamber gas (such as SF6 gas) is calculated by thermodynamic simulation etc., to be used as the compensation basis of gas chamber gas state parameter, can be convenient to obtain real, accurate gas chamber gas density value, effectively improve the monitoring accuracy of SF6 gas etc. in high-voltage electrical equipment gas chamber, so as to better provide safety guarantee for the safe operation of high-voltage electrical equipment.

Description

Technical Field

[0001] This application belongs to the field of industrial testing technology, and in particular relates to a method, device and system for monitoring gas in the gas chamber of high-voltage electrical equipment. Background Technology

[0002] SF6 gas monitoring is mainly used in high-voltage electrical equipment that uses SF6 as the insulating medium. Its purpose is to provide operators with information such as the density, pressure, and temperature of SF6 gas inside the gas chamber of the high-voltage electrical equipment, so as to provide safety assurance for the operation of the equipment.

[0003] However, the applicant has found that the existing methods for monitoring SF6 gas in the gas chambers of high-voltage electrical equipment cannot accurately reflect the state of SF6 gas in the gas chambers of high-voltage electrical equipment, which may pose a hidden danger to the safe operation of high-voltage electrical equipment. Therefore, providing a gas monitoring scheme for high-voltage electrical equipment that can overcome the above-mentioned defects has become a technical problem that urgently needs to be solved in this field. Summary of the Invention

[0004] In view of this, this application provides a method, device and system for monitoring gases in the gas chamber of high-voltage electrical equipment, which can improve the monitoring accuracy of gases such as SF6 in the gas chamber of high-voltage electrical equipment, thereby providing better safety assurance for the safe operation of high-voltage electrical equipment.

[0005] The specific plan is as follows:

[0006] A method for monitoring gas in the gas chamber of high-voltage electrical equipment, comprising:

[0007] Acquire the state parameters of the gas in the gas chamber of high-voltage electrical equipment collected by the gas monitoring component;

[0008] The system acquires the outer boundary temperature of the gas chamber shell of the high-voltage electrical equipment collected by multiple first temperature monitoring components, and the ambient temperature of the environment in which the high-voltage electrical equipment is located collected by a second temperature monitoring component; the multiple first temperature monitoring components are evenly arranged on the outer side of the gas chamber shell of the high-voltage electrical equipment based on a uniform arrangement strategy.

[0009] Obtain the conductor current value of the conductor in the gas chamber of the high-voltage electrical equipment;

[0010] The equivalent average temperature inside the high-voltage electrical equipment chamber is determined based at least on the outer boundary temperature of the chamber housing, the ambient temperature, and the conductor current value.

[0011] The equivalent average temperature is used to compensate for the state parameters, and the density of the gas in the high-voltage electrical equipment chamber is determined based on the compensated state parameters.

[0012] Optionally, the method for monitoring the gas in the gas chamber of the high-voltage electrical equipment further includes:

[0013] The actual field conditions of the high-voltage electrical equipment are simulated into a corresponding thermodynamic model, and parameters are monitored and data processing is performed based on the thermodynamic model.

[0014] Optionally, the acquisition of the state parameters of the gas in the gas chamber of the high-voltage electrical equipment collected by the gas monitoring component includes:

[0015] The temperature and pressure of SF6 gas in the gas chamber of the high-voltage electrical equipment are acquired by the gas monitoring component.

[0016] Optionally, the gas monitoring component is an SF6 gas monitoring sensor, the plurality of first temperature monitoring components are plurality of first temperature sensors, and the second temperature monitoring component is a second temperature sensor;

[0017] The plurality of first temperature sensors are arranged in a ring on the outside of the gas chamber housing of the high-voltage electrical equipment.

[0018] Optionally, determining the equivalent average temperature inside the high-voltage electrical equipment chamber based at least on the outer boundary temperature of the chamber housing, the ambient temperature, and the conductor current value includes:

[0019] The heat generated by the conductor is determined based on the conductor current value;

[0020] Based on the outer boundary temperature of the gas chamber shell, the ambient temperature, the heat generation of the conductor, and at least some of the data from the gas chamber shell material, thickness, and SF6 gas characteristic parameters of the high-voltage electrical equipment, the equivalent average temperature inside the gas chamber of the high-voltage electrical equipment is calculated by thermodynamic simulation.

[0021] Optionally, the step of compensating the state parameters using the equivalent average temperature and determining the gas density in the high-voltage electrical equipment chamber based on the compensated state parameters includes:

[0022] The equivalent average temperature is used to compensate for the temperature of the SF6 gas, and the density of the SF6 gas in the gas chamber of the high-voltage electrical equipment is determined based on the temperature and corresponding pressure of the compensated SF6 gas.

[0023] The corresponding pressure is the result of correcting the collected pressure based on the temperature of the compensated SF6 gas.

[0024] A device for monitoring gas in the gas chamber of high-voltage electrical equipment, comprising:

[0025] The first acquisition module is used to acquire the state parameters of the gas in the gas chamber of the high-voltage electrical equipment collected by the gas monitoring component;

[0026] The second acquisition module is used to acquire the outer boundary temperature of the gas chamber shell of the high-voltage electrical equipment collected by multiple first temperature monitoring components, and the ambient temperature of the environment in which the high-voltage electrical equipment is located collected by the second temperature monitoring component; the multiple first temperature monitoring components are evenly arranged on the outside of the gas chamber shell of the high-voltage electrical equipment based on a uniform arrangement strategy;

[0027] The third acquisition module is used to acquire the conductor current value of the conductor in the gas chamber of the high-voltage electrical equipment;

[0028] The first data processing module is used to determine the equivalent average temperature inside the high-voltage electrical equipment chamber based at least on the outer boundary temperature of the chamber shell, the ambient temperature, and the conductor current value.

[0029] The second data processing module is used to compensate the state parameters using the equivalent average temperature, and to determine the density of the gas in the high-voltage electrical equipment chamber based on the compensated state parameters.

[0030] A gas monitoring system for a high-voltage electrical equipment chamber includes a front-end monitoring component, a pre-processing device, and a back-end processing device.

[0031] The front-end monitoring component includes:

[0032] Gas monitoring components are used to collect state parameters of the gas in the gas chambers of high-voltage electrical equipment.

[0033] Multiple first temperature monitoring components are used to collect the outer boundary temperature of the gas chamber shell of the high-voltage electrical equipment; the multiple first temperature monitoring components are evenly arranged on the outer side of the gas chamber shell of the high-voltage electrical equipment based on a uniform arrangement strategy.

[0034] The second temperature monitoring component is used to collect the ambient temperature of the environment where the high-voltage electrical equipment is located.

[0035] The preprocessing device is used to collect the conductor current value of the conductor in the gas chamber of the high-voltage electrical equipment, and collect the parameter data collected by the front-end monitoring component, and perform corresponding preprocessing on the conductor current value and the collected parameter data;

[0036] A background processing device is used to acquire the data preprocessed by the preprocessing device, and at least based on the preprocessed data of the outer boundary temperature of the gas chamber shell, the ambient temperature and the conductor current value, determine the equivalent average temperature inside the high-voltage electrical equipment gas chamber, use the equivalent average temperature to compensate the preprocessed state parameters, and determine the density of the gas inside the high-voltage electrical equipment gas chamber based on the compensation result.

[0037] Optionally, the gas monitoring component is an SF6 gas monitoring sensor, the plurality of first temperature monitoring components are plurality of first temperature sensors, and the second temperature monitoring component is a second temperature sensor;

[0038] The plurality of first temperature sensors are arranged in a ring on the outside of the gas chamber housing of the high-voltage electrical equipment.

[0039] Optionally, when performing corresponding preprocessing on the conductor current value and the collected parameter data, the preprocessing device is specifically used for:

[0040] The heat generated by the conductor is determined based on the conductor current value;

[0041] The heat generated by the conductor and the collected parameter data are converted into a format to obtain data information in the protocol format required by the background processing device.

[0042] Optionally, when determining the equivalent average temperature inside the high-voltage electrical equipment chamber based at least on preprocessed data of the outer boundary temperature of the chamber housing, the ambient temperature, and the conductor current value, the background processing device is specifically used for:

[0043] Based on the obtained outer boundary temperature of the gas chamber shell, ambient temperature, and conductor heat generation, and combined with at least some data from the gas chamber shell material, thickness, and SF6 gas characteristics data of the high-voltage electrical equipment, the equivalent average temperature inside the gas chamber of the high-voltage electrical equipment is calculated by thermodynamic simulation.

[0044] The background processing device, when using the equivalent average temperature to compensate the pre-processed state parameters and determining the density of the gas in the high-voltage electrical equipment chamber based on the compensation result, is specifically used to: compensate the temperature of the SF6 gas using the equivalent average temperature, and determine the density of the SF6 gas in the high-voltage electrical equipment chamber based on the compensated SF6 gas temperature and corresponding pressure.

[0045] The corresponding pressure is the result of correcting the collected pressure based on the temperature of the compensated SF6 gas.

[0046] In summary, this application provides a method, apparatus, and system for monitoring gas inside a high-voltage electrical equipment chamber. The method includes: acquiring state parameter information of the gas inside the high-voltage electrical equipment chamber collected by a gas monitoring component; acquiring temperature information of the outer boundary of the chamber shell of the high-voltage electrical equipment collected by multiple first temperature monitoring components, and ambient temperature information of the environment in which the high-voltage electrical equipment is located collected by a second temperature monitoring component; the multiple first temperature monitoring components are uniformly arranged on the outer side of the chamber shell of the high-voltage electrical equipment based on a uniform arrangement strategy; acquiring current information of the conductor inside the high-voltage electrical equipment chamber; determining an equivalent average temperature value inside the high-voltage electrical equipment chamber based at least on the outer boundary temperature information of the chamber shell, the ambient temperature information, and the current information; compensating the state parameter information using the equivalent average temperature value; and determining the density of the gas inside the high-voltage electrical equipment chamber based on the compensated state parameter information.

[0047] This application employs a uniform arrangement strategy, distributing multiple first temperature monitoring components evenly on the outside of the gas chamber shell of high-voltage electrical equipment. This allows them to accurately reflect the influence of different external environmental factors. Combined with the ambient temperature measured by the second temperature monitoring component and the heat generated by the conductor, the equivalent average temperature of the gas (such as SF6 gas) inside the high-voltage electrical equipment is calculated through thermodynamic simulation and other methods. This temperature serves as the basis for compensating the gas state parameters inside the gas chamber, facilitating the determination of a true and accurate gas density value inside the gas chamber. This effectively improves the monitoring accuracy of gases such as SF6 inside the high-voltage electrical equipment, thereby providing better safety assurance for the safe operation of high-voltage electrical equipment. Attached Figure Description

[0048] The above and other features, advantages, and aspects of the embodiments of this application will become more apparent from the accompanying drawings and the following detailed description. Throughout the drawings, the same or similar reference numerals denote the same or similar elements. It should be understood that the drawings are schematic, and the originals and elements are not necessarily drawn to scale.

[0049] Figure 1 This is a flowchart of the method for monitoring gas in the gas chamber of high-voltage electrical equipment provided in this application;

[0050] Figure 2 This is a schematic diagram of the architecture of an exemplary gas monitoring system provided in this application;

[0051] Figure 3 This is a schematic diagram of an equivalent model of the actual field conditions of the high-voltage electrical equipment provided in this application;

[0052] Figure 4 This is a temperature measurement diagram provided in this application;

[0053] Figure 5This application provides Figure 2 Processing logic diagram of the gas monitoring system;

[0054] Figure 6 This is a structural diagram of the gas monitoring device in the gas chamber of the high-voltage electrical equipment provided in this application;

[0055] Figure 7 This is a structural diagram of the gas monitoring system for the high-voltage electrical equipment chamber provided in this application. Detailed Implementation

[0056] Embodiments of this application will now be described in more detail with reference to the accompanying drawings. While some embodiments of this application are shown in the drawings, it should be understood that this application can be implemented in various forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided to provide a more thorough and complete understanding of this application. It should be understood that the drawings and embodiments of this application are for illustrative purposes only and are not intended to limit the scope of protection of this application.

[0057] The term "comprising" and its variations as used herein are open-ended, meaning "including but not limited to". The term "based on" means "at least partially based on". The term "one embodiment" means "at least one embodiment"; the term "another embodiment" means "at least one additional embodiment"; the term "some embodiments" means "at least some embodiments". Definitions of other terms will be given in the description below.

[0058] It should be noted that the concepts of "first" and "second" mentioned in this application are only used to distinguish different devices, modules or units, and are not used to limit the order of functions performed by these devices, modules or units or their interdependencies.

[0059] It should be noted that the terms "one" and "multiple" used in this application are illustrative rather than restrictive, and those skilled in the art should understand that, unless otherwise expressly indicated in the context, they should be understood as "one or more".

[0060] This application provides a method, device, and system for monitoring gases in the gas chamber of high-voltage electrical equipment, which improves the monitoring accuracy of gases such as SF6 in the gas chamber of high-voltage electrical equipment, thereby providing better safety assurance for the safe operation of high-voltage electrical equipment.

[0061] See Figure 1 The flowchart shown illustrates a method for monitoring gas in the gas chamber of high-voltage electrical equipment. The method for monitoring gas in the gas chamber of high-voltage electrical equipment provided in this application includes the following processing steps:

[0062] Step 101: Obtain the state parameters of the gas in the gas chamber of the high-voltage electrical equipment collected by the gas monitoring component.

[0063] High-voltage electrical equipment can be, but is not limited to, GIS (Gas Insulated Switchgear) and other high-voltage electrical equipment. The gas inside the gas chamber of high-voltage electrical equipment can be, but is not limited to, SF6 gas. This application mainly uses SF6 gas as an example for illustration.

[0064] The gas monitoring component may be, but is not limited to, an SF6 gas monitoring sensor. Optionally, the gas monitoring component may be deployed at the gas inlet of the high-voltage electrical equipment's gas chamber to collect status parameters such as temperature and pressure of SF6 and other gases within the high-voltage electrical equipment's gas chamber.

[0065] This step allows the acquisition of state parameters such as temperature and pressure of SF6 and other gases in the gas chamber of the high-voltage electrical equipment, collected by the gas monitoring component.

[0066] Step 102: Obtain the outer boundary temperature of the gas chamber shell of the high-voltage electrical equipment collected by multiple first temperature monitoring components, and the ambient temperature of the environment where the high-voltage electrical equipment is located collected by the second temperature monitoring component; the multiple first temperature monitoring components are evenly arranged on the outside of the gas chamber shell of the high-voltage electrical equipment based on a uniform arrangement strategy.

[0067] Optionally, the multiple first temperature monitoring components are multiple first temperature sensors, specifically arranged in a ring on the outside of the gas chamber shell of the high-voltage electrical equipment, for collecting the temperature of the outer boundary of the high-voltage electrical equipment shell. The second temperature monitoring component is a second temperature sensor, specifically an ambient temperature sensor, for collecting the ambient temperature of the environment in which the high-voltage electrical equipment is located.

[0068] Temperature sensors generally use thermocouples, thermistors, pyroelectric sensors, etc. to measure temperature. Different sensor models are usually selected for different needs, and the thermistor elements and thermocouple assemblies used are also different. When implementing this application, the sensor model, thermistor element, thermocouple assembly, etc. can be selected as needed for the first temperature sensor and the second temperature sensor according to the actual temperature monitoring requirements.

[0069] Step 103: Obtain the conductor current value of the conductor in the gas chamber of the high-voltage electrical equipment.

[0070] The conductor in question is specifically a conductor used for current conduction within the gas chamber of high-voltage electrical equipment, and is a component of the high-voltage electrical equipment.

[0071] Step 104: Determine the equivalent average temperature inside the high-voltage electrical equipment chamber based at least on the outer boundary temperature of the chamber shell, the ambient temperature, and the conductor current value.

[0072] After obtaining the parameter data through steps 101-103, the heating power of the conductor in the high-voltage electrical equipment chamber can be determined based on the obtained conductor current value, thereby determining the heat generation of the conductor. Based on the outer boundary temperature of the chamber shell of the high-voltage electrical equipment, the ambient temperature, the heat generation of the conductor, and at least some of the data in the chamber shell material, thickness, and SF6 gas characteristic parameters of the high-voltage electrical equipment, the equivalent average temperature inside the high-voltage electrical equipment chamber is calculated through thermodynamic simulation.

[0073] SF6 gas characteristic parameters include, but are not limited to, heat loss from gas convection and convective heat transfer coefficient.

[0074] Step 105: Compensate the state parameters using the equivalent average temperature, and determine the density of the gas in the high-voltage electrical equipment chamber based on the compensated state parameters.

[0075] After obtaining the equivalent average temperature inside the high-voltage electrical equipment's gas chamber, the temperature of gases such as SF6 inside the chamber can be further compensated using this equivalent average temperature. The density of gases such as SF6 inside the high-voltage electrical equipment's gas chamber is then determined based on the compensated temperature and corresponding pressure, thereby enabling monitoring of the gases inside the high-voltage electrical equipment's gas chamber. The corresponding pressure is the result of correcting the collected pressure based on the compensated SF6 gas temperature.

[0076] In summary, this application employs a uniform arrangement strategy, distributing multiple first temperature monitoring components evenly outside the gas chamber shell of high-voltage electrical equipment. This allows them to accurately reflect the influence of different external environmental factors. Combined with the ambient temperature measured by the second temperature monitoring component and the heat generated by the conductor, the equivalent average temperature of the gas (such as SF6 gas) inside the high-voltage electrical equipment is calculated through thermodynamic simulation and other methods. This temperature serves as the basis for compensating the gas state parameters inside the gas chamber, facilitating the determination of a true and accurate gas density value inside the gas chamber. This effectively improves the monitoring accuracy of gases such as SF6 inside the high-voltage electrical equipment, thereby providing better safety assurance for the safe operation of high-voltage electrical equipment.

[0077] In one optional embodiment, a corresponding gas monitoring system is deployed for high-voltage electrical equipment based on the method provided in this application to monitor the gas inside the high-voltage electrical equipment.

[0078] See Figure 2 The example monitoring system shown consists mainly of three parts: sensors, IEDs (Intelligent Electronic Devices), and a back-end processing and display system. Figure 2As shown, the sensor end is divided into an SF6 gas monitoring sensor 1, a temperature sensor 2, and an ambient temperature sensor 3. The SF6 gas monitoring sensor 1 is used to collect the pressure and temperature of the SF6 gas inside the high-voltage electrical equipment chamber. The temperature sensor 2 is used to collect the temperature of the outer boundary of the high-voltage electrical equipment chamber shell. The ambient temperature sensor 3 is used to collect the ambient temperature of the environment in which the high-voltage electrical equipment is located. Each sensor transmits the collected parameter data to an IED 4. The IED 4 simultaneously collects the conductor current value of the conductor inside the high-voltage electrical equipment chamber, and performs data aggregation and preprocessing. The preprocessed data is then transmitted to the background processing and display system 5 for final data processing to obtain the SF6 density value inside the high-voltage electrical equipment chamber and display it.

[0079] Optionally, the data preprocessing performed by the IED includes: determining the heat generation of the SF6 conductor in the high-voltage electrical equipment chamber based on the collected conductor current value, and performing corresponding format conversion processing on the obtained conductor heat generation and the collected sensor parameter data (temperature and pressure of SF6 gas in the high-voltage electrical equipment chamber, temperature of the outer boundary of the chamber shell, and ambient temperature) to obtain the data information in the protocol format required by the background processing and display system 5.

[0080] The background processing and display system is specifically responsible for the thermodynamic simulation calculation of the equivalent average temperature in the gas chamber, compensating for the monitored temperature of SF6 gas in the gas chamber based on the equivalent average temperature, and calculating the density of SF6 gas in the gas chamber based on the compensated temperature and corresponding pressure.

[0081] The corresponding pressure is the result of correcting the collected pressure based on the temperature of the compensated SF6 gas.

[0082] In practical applications, the calculation of conductor heating power / heat generation based on current value can also be achieved by the background processing and display system, and there are no restrictions on this.

[0083] Furthermore, optionally, in this embodiment of the application, the actual field conditions of the high-voltage electrical equipment are equivalently simulated as a thermodynamic model, and the parameters are monitored and the data based on the monitored parameters are processed.

[0084] Equivalent model diagram as follows Figure 3As shown, the high-voltage electrical equipment's gas chamber is filled with SF6 gas at the required pressure, such as the rated pressure. An SF6 gas monitoring sensor 1 is installed at the filling port of the high-voltage electrical equipment's gas chamber (e.g., GIS) to collect the pressure and temperature of the SF6 gas inside. Multiple temperature sensors 2 are evenly arranged in a ring on the outside of the high-voltage electrical equipment's gas chamber shell to collect temperature data, obtaining the outer boundary temperature of the model's gas chamber shell. An ambient temperature sensor 3 collects the ambient temperature corresponding to the outside of the high-voltage electrical equipment's shell. IDE is responsible for collecting conductor current, calculating parameters such as conductor heat generation, and converting the parameter data from each sensor and the conductor heat generation into a different format before transmitting them to the background processing and display system for processing. Alternatively, the conductor current value can be directly converted into a different format and transmitted to the background processing and display system, which then calculates the conductor's heat generation.

[0085] See Figure 4 The provided temperature measurement diagram, along with reference to [other sources], is shown below. Figure 5 The monitoring system logic diagram shown illustrates that the backend processing and display system, by combining the outer boundary temperature of the gas chamber shell, ambient temperature, and conductor heat generation with the gas chamber shell material, thickness, and SF6 gas characteristic parameters of the high-voltage electrical equipment, performs finite element analysis calculations based on thermodynamic principles. This yields the temperature distribution at various points along the longitudinal cross-section of the gas chamber shell. Further calculations then obtain the equivalent average temperature value within the high-voltage electrical equipment's gas chamber, ensuring its representativeness and objectively and accurately reflecting the temperature state within the gas chamber. The simulated equivalent average temperature is used as a compensation parameter for the SF6 gas state parameters within the gas chamber, avoiding the problem of inaccurate temperature / pressure data collected by SF6 sensors in traditional methods. This compensation result accurately reflects the influence of external factors such as sunlight angle, altitude, and sampling point location on the temperature within the high-voltage electrical equipment's gas chamber, thus providing a more accurate representation of the gas's actual state and ultimately resulting in a more accurate SF6 density reading.

[0086] Corresponding to the above method, this application also discloses a monitoring device for gas in the gas chamber of high-voltage electrical equipment, the structure of which is as follows: Figure 6 As shown, it includes:

[0087] The first acquisition module 601 is used to acquire the state parameters of the gas in the gas chamber of the high-voltage electrical equipment collected by the gas monitoring component;

[0088] The second acquisition module 602 is used to acquire the outer boundary temperature of the air chamber shell of the high-voltage electrical equipment collected by multiple first temperature monitoring components, and the ambient temperature of the environment in which the high-voltage electrical equipment is located collected by the second temperature monitoring components; the multiple first temperature monitoring components are evenly arranged on the outside of the air chamber shell of the high-voltage electrical equipment based on a uniform arrangement strategy.

[0089] The third acquisition module 603 is used to acquire the conductor current value of the conductor in the gas chamber of the high-voltage electrical equipment;

[0090] The first data processing module 604 is used to determine the equivalent average temperature inside the high-voltage electrical equipment chamber based at least on the outer boundary temperature of the chamber shell, the ambient temperature, and the conductor current value.

[0091] The second data processing module 605 is used to compensate the state parameters using the equivalent average temperature, and to determine the density of the gas in the high-voltage electrical equipment chamber based on the compensated state parameters.

[0092] In an optional embodiment, the above-mentioned device further includes: an equivalent simulation module, used to: equivalently simulate the actual field conditions of the high-voltage electrical equipment into a corresponding thermodynamic model, so as to monitor parameters and process data based on the monitored parameter data based on the thermodynamic model.

[0093] In one optional embodiment, the first acquisition module 601 is specifically used to: acquire the temperature and pressure of SF6 gas in the gas chamber of the high-voltage electrical equipment collected by the gas monitoring component.

[0094] In one optional embodiment, the gas monitoring component is an SF6 gas monitoring sensor, the plurality of first temperature monitoring components are a plurality of first temperature sensors, and the second temperature monitoring component is a second temperature sensor;

[0095] The plurality of first temperature sensors are arranged in a ring on the outside of the gas chamber housing of the high-voltage electrical equipment.

[0096] In an optional implementation, the first data processing module 604 is specifically used for:

[0097] The heat generated by the conductor is determined based on the conductor current value;

[0098] Based on the outer boundary temperature of the gas chamber shell, the ambient temperature, the heat generation of the conductor, and in combination with the gas chamber shell material and SF6 gas characteristic parameters of the high-voltage electrical equipment, the equivalent average temperature inside the gas chamber of the high-voltage electrical equipment is calculated through thermodynamic simulation.

[0099] In one optional embodiment, the second data processing module is specifically used to: compensate the temperature of the SF6 gas using the equivalent average temperature, and determine the density of the SF6 gas in the high-voltage electrical equipment chamber based on the compensated SF6 gas temperature and corresponding pressure.

[0100] The corresponding pressure is the result of correcting the collected pressure based on the temperature of the compensated SF6 gas.

[0101] The gas monitoring device for the gas chamber of high-voltage electrical equipment provided in this application embodiment is described simply because it corresponds to the gas monitoring method for the gas chamber of high-voltage electrical equipment provided in the above method embodiment. For any similarities, please refer to the description of the above method embodiment, which will not be elaborated here.

[0102] In addition, this application embodiment also provides a monitoring system for the gas in the gas chamber of high-voltage electrical equipment, the composition of which is as follows: Figure 7 As shown, it includes a front-end monitoring component 701, a preprocessing device 702, and a back-end processing device 703.

[0103] The front-end monitoring component 701 includes a gas monitoring component, multiple first temperature monitoring components, and a second temperature monitoring component.

[0104] Gas monitoring components are used to collect state parameters of the gas in the gas chambers of high-voltage electrical equipment.

[0105] Multiple first temperature monitoring components are used to collect the outer boundary temperature of the gas chamber shell of the high-voltage electrical equipment; the multiple first temperature monitoring components are evenly arranged on the outer side of the gas chamber shell of the high-voltage electrical equipment based on a uniform arrangement strategy.

[0106] The second temperature monitoring component is used to collect the ambient temperature of the environment in which the high-voltage electrical equipment is located.

[0107] The preprocessing device 702 is used to collect the conductor current value of the conductor in the gas chamber of the high-voltage electrical equipment and collect the parameter data collected by the front-end monitoring component, and perform corresponding preprocessing on the conductor current value and the collected parameter data.

[0108] The background processing device 703 is used to acquire the data preprocessed by the preprocessing device, and at least based on the preprocessed data of the outer boundary temperature of the gas chamber shell, the ambient temperature and the conductor current value, determine the equivalent average temperature inside the high-voltage electrical equipment gas chamber, use the equivalent average temperature to compensate the preprocessed state parameters, and determine the density of the gas inside the high-voltage electrical equipment gas chamber based on the compensation result.

[0109] Optionally, the gas monitoring component is an SF6 gas monitoring sensor, the plurality of first temperature monitoring components are plurality of first temperature sensors, and the second temperature monitoring component is a second temperature sensor;

[0110] The plurality of first temperature sensors are arranged in a ring on the outside of the gas chamber housing of the high-voltage electrical equipment.

[0111] Optionally, when performing corresponding preprocessing on the conductor current value and the collected parameter data, the preprocessing device 702 is specifically used to: determine the conductor heat generation of the conductor based on the conductor current value; and perform format conversion processing on the conductor heat generation and the collected parameter data to obtain data information in the protocol format required by the background processing device.

[0112] Optionally, the background processing device 703, when determining the equivalent average temperature inside the high-voltage electrical equipment chamber based at least on the pre-processed data of the outer boundary temperature of the chamber shell, the ambient temperature, and the conductor current value, is specifically used to: calculate the equivalent average temperature inside the high-voltage electrical equipment chamber through thermodynamic simulation based on the acquired outer boundary temperature of the chamber shell, the ambient temperature, the conductor heat generation, and in combination with the material of the high-voltage electrical equipment chamber shell and the SF6 gas characteristic data;

[0113] The background processing device 703, when compensating the pre-processed state parameters using the equivalent average temperature and determining the density of the gas in the high-voltage electrical equipment chamber based on the compensation result, is specifically used to: compensate the temperature of the SF6 gas using the equivalent average temperature, and determine the density of the SF6 gas in the high-voltage electrical equipment chamber based on the compensated SF6 gas temperature and corresponding pressure.

[0114] Regarding the gas monitoring system example provided above, the front-end monitoring component 701, the pre-processing device 702, and the back-end processing device 703 can be implemented sequentially as the sensor, IED, and back-end processing and display system of the system in this example. For more detailed processing functions of the front-end monitoring component 701, the pre-processing device 702, and the back-end processing device 703 and their respective collaborative processes, please refer to the description of the corresponding embodiments above, which will not be repeated here.

[0115] In summary, the method, apparatus, and system for monitoring gas in the gas chamber of high-voltage electrical equipment provided in this application have at least the following technical advantages:

[0116] 1) Known technologies can only monitor state parameters such as temperature in the gas chamber at the gas inlet of high-voltage electrical equipment based on SF6 gas monitoring sensors. They cannot accurately reflect the overall state of the gas chamber of high-voltage electrical equipment, resulting in errors in the measured gas density values ​​and affecting the operation and maintenance safety of high-voltage electrical equipment. Compared with known technologies, this application designs a thermodynamic temperature measurement model. Through the reasonable arrangement of sensors and the reasonable design of compensation basis and compensation strategy, the obtained results can correctly reflect the influence of factors such as external sunlight angle, altitude, bushing length, and temperature acquisition point, and will not cause the test results to change under the same conditions.

[0117] 2) The equivalent average temperature value obtained by thermodynamic simulation is representative and can reflect the overall temperature inside the chamber in a true and accurate manner. At the same time, the temperature distribution at each point of the temperature measurement section of the chamber shell is of great significance for the study of temperature inside the chamber of high-voltage electrical equipment.

[0118] 3) Temperature sensors and ambient temperature sensors can be added to high-voltage electrical equipment without affecting conventional SF6 gas monitoring sensors and meters, and conductor current values ​​can be collected, thereby improving the accuracy of SF6 gas pressure monitoring. It has high compatibility and wide application scenarios.

[0119] It should be noted that although the subject matter has been described using language specific to structural features and / or methodological logic, it should be understood that the subject matter defined in the appended claims is not necessarily limited to the specific features or actions described above. Rather, the specific features and actions described above are merely illustrative examples of implementing the claims.

[0120] While several specific implementation details are included in the foregoing discussion, these should not be construed as limiting the scope of this application. Certain features described in the context of individual embodiments may also be implemented in combination in a single embodiment. Conversely, various features described in the context of a single embodiment may also be implemented individually or in any suitable sub-combination in multiple embodiments.

[0121] The above description is merely a preferred embodiment of this application and an explanation of the technical principles employed. Those skilled in the art should understand that the scope of this application is not limited to technical solutions formed by specific combinations of the above-described technical features, but should also cover other technical solutions formed by arbitrary combinations of the above-described technical features or their equivalents without departing from the above-described application concept. For example, technical solutions formed by substituting the above-described features with (but not limited to) technical features with similar functions claimed in this application.

Claims

1. A method for monitoring gas in the gas chamber of high-voltage electrical equipment, characterized in that, include: Acquire the state parameters of the gas in the gas chamber of high-voltage electrical equipment collected by the gas monitoring component; The system acquires the outer boundary temperature of the gas chamber shell of the high-voltage electrical equipment collected by multiple first temperature monitoring components, and the ambient temperature of the environment in which the high-voltage electrical equipment is located collected by a second temperature monitoring component; the multiple first temperature monitoring components are evenly arranged on the outer side of the gas chamber shell of the high-voltage electrical equipment based on a uniform arrangement strategy. Obtain the conductor current value of the conductor in the gas chamber of the high-voltage electrical equipment; The equivalent average temperature inside the high-voltage electrical equipment chamber is determined based at least on the outer boundary temperature of the chamber housing, the ambient temperature, and the conductor current value. The equivalent average temperature is used to compensate for the state parameters, and the density of the gas in the high-voltage electrical equipment chamber is determined based on the compensated state parameters. The acquisition of state parameters of the gas in the gas chamber of the high-voltage electrical equipment collected by the gas monitoring component includes: acquiring the temperature and pressure of the SF6 gas in the gas chamber of the high-voltage electrical equipment collected by the gas monitoring component. The step of determining the equivalent average temperature inside the high-voltage electrical equipment chamber based at least on the outer boundary temperature of the chamber shell, the ambient temperature, and the conductor current value includes: determining the conductor heat generation of the conductor based on the conductor current value; and calculating the equivalent average temperature inside the high-voltage electrical equipment chamber through thermodynamic simulation based on the outer boundary temperature of the chamber shell, the ambient temperature, the conductor heat generation, and at least some data from the chamber shell material, thickness, and SF6 gas characteristic parameters of the high-voltage electrical equipment. The step of compensating the state parameters using the equivalent average temperature and determining the density of the gas in the high-voltage electrical equipment chamber based on the compensated state parameters includes: compensating the temperature of the SF6 gas using the equivalent average temperature and determining the density of the SF6 gas in the high-voltage electrical equipment chamber based on the compensated SF6 gas temperature and corresponding pressure. The corresponding pressure is the result of correcting the collected pressure based on the temperature of the compensated SF6 gas.

2. The method for monitoring gas in the gas chamber of high-voltage electrical equipment according to claim 1, characterized in that, Also includes: The actual field conditions of the high-voltage electrical equipment are simulated into a corresponding thermodynamic model, and parameters are monitored and data processing is performed based on the thermodynamic model.

3. The method for monitoring gas in the gas chamber of high-voltage electrical equipment according to claim 1, characterized in that, The gas monitoring component is an SF6 gas monitoring sensor, the plurality of first temperature monitoring components are plurality of first temperature sensors, and the second temperature monitoring component is a second temperature sensor; The plurality of first temperature sensors are arranged in a ring on the outside of the gas chamber housing of the high-voltage electrical equipment.

4. A monitoring device for gas in the gas chamber of high-voltage electrical equipment, characterized in that, include: The first acquisition module is used to acquire the state parameters of the gas in the gas chamber of the high-voltage electrical equipment collected by the gas monitoring component; The second acquisition module is used to acquire the outer boundary temperature of the gas chamber shell of the high-voltage electrical equipment collected by multiple first temperature monitoring components, and the ambient temperature of the environment in which the high-voltage electrical equipment is located collected by the second temperature monitoring component; the multiple first temperature monitoring components are evenly arranged on the outside of the gas chamber shell of the high-voltage electrical equipment based on a uniform arrangement strategy; The third acquisition module is used to acquire the conductor current value of the conductor in the gas chamber of the high-voltage electrical equipment; The first data processing module is used to determine the equivalent average temperature inside the high-voltage electrical equipment chamber based at least on the outer boundary temperature of the chamber shell, the ambient temperature, and the conductor current value. The second data processing module is used to compensate the state parameters using the equivalent average temperature, and to determine the density of the gas in the high-voltage electrical equipment chamber based on the compensated state parameters. Specifically, the first acquisition module, when acquiring the state parameters of the gas in the gas chamber of the high-voltage electrical equipment collected by the gas monitoring component, is used to: acquire the temperature and pressure of the SF6 gas in the gas chamber of the high-voltage electrical equipment collected by the gas monitoring component; The first data processing module, when determining the equivalent average temperature inside the high-voltage electrical equipment chamber based at least on the outer boundary temperature of the chamber shell, the ambient temperature, and the conductor current value, is specifically used for: determining the conductor heat generation of the conductor based on the conductor current value; and calculating the equivalent average temperature inside the high-voltage electrical equipment chamber through thermodynamic simulation based on the outer boundary temperature of the chamber shell, the ambient temperature, the conductor heat generation, and at least some of the data from the chamber shell material, thickness, and SF6 gas characteristic parameters of the high-voltage electrical equipment. The second data processing module, when using the equivalent average temperature to compensate the state parameters and determining the density of the gas in the high-voltage electrical equipment chamber based on the compensated state parameters, is specifically used to: use the equivalent average temperature to compensate the temperature of the SF6 gas, and determine the density of the SF6 gas in the high-voltage electrical equipment chamber based on the compensated SF6 gas temperature and corresponding pressure. The corresponding pressure is the result of correcting the collected pressure based on the temperature of the compensated SF6 gas.

5. A gas monitoring system for a high-voltage electrical equipment chamber, characterized in that, Includes front-end monitoring components, preprocessing devices, and back-end processing devices; The front-end monitoring component includes: Gas monitoring components are used to collect state parameters of the gas in the gas chambers of high-voltage electrical equipment. Multiple first temperature monitoring components are used to collect the outer boundary temperature of the gas chamber shell of the high-voltage electrical equipment; the multiple first temperature monitoring components are evenly arranged on the outer side of the gas chamber shell of the high-voltage electrical equipment based on a uniform arrangement strategy. The second temperature monitoring component is used to collect the ambient temperature of the environment where the high-voltage electrical equipment is located. The preprocessing device is used to collect the conductor current value of the conductor in the gas chamber of the high-voltage electrical equipment, and collect the parameter data collected by the front-end monitoring component, and perform corresponding preprocessing on the conductor current value and the collected parameter data; The background processing device is used to acquire the data preprocessed by the preprocessing device, and at least based on the temperature of the outer boundary of the gas chamber shell, the ambient temperature and the conductor current value, determine the equivalent average temperature inside the high-voltage electrical equipment gas chamber, compensate the preprocessed state parameters using the equivalent average temperature, and determine the density of the gas inside the high-voltage electrical equipment gas chamber based on the compensation result. Specifically, the gas monitoring component is used to collect the temperature and pressure of SF6 gas in the gas chamber of the high-voltage electrical equipment when collecting the state parameters of the gas in the gas chamber. The background processing device, when determining the equivalent average temperature inside the high-voltage electrical equipment chamber based on at least preprocessed data of the outer boundary temperature of the chamber shell, the ambient temperature, and the conductor current value, specifically performs the following: It calculates the equivalent average temperature inside the high-voltage electrical equipment chamber using thermodynamic simulation based on the acquired outer boundary temperature of the chamber shell, the ambient temperature, the conductor heat generation, and at least some data from the chamber shell material, thickness, and SF6 gas characteristic data of the high-voltage electrical equipment; the conductor heat generation is based on the conductor current value. The background processing device, when using the equivalent average temperature to compensate the pre-processed state parameters and determining the density of the gas in the high-voltage electrical equipment chamber based on the compensation result, is specifically used to: compensate the temperature of the SF6 gas using the equivalent average temperature, and determine the density of the SF6 gas in the high-voltage electrical equipment chamber based on the compensated SF6 gas temperature and corresponding pressure. The corresponding pressure is the result of correcting the collected pressure based on the temperature of the compensated SF6 gas.

6. The gas monitoring system for the gas chamber of high-voltage electrical equipment according to claim 5, characterized in that, The gas monitoring component is an SF6 gas monitoring sensor, the plurality of first temperature monitoring components are plurality of first temperature sensors, and the second temperature monitoring component is a second temperature sensor; The plurality of first temperature sensors are arranged in a ring on the outside of the gas chamber housing of the high-voltage electrical equipment.

7. The gas monitoring system for the gas chamber of high-voltage electrical equipment according to claim 6, characterized in that, When performing corresponding preprocessing on the conductor current value and the collected parameter data, the preprocessing device is specifically used for: The heat generated by the conductor is determined based on the conductor current value; The heat generated by the conductor and the collected parameter data are converted into a format to obtain data information in the protocol format required by the background processing device.

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