Excitation source array and radiation source device

CN117311099BActive Publication Date: 2026-10-16PARCAN LAB CO LTD
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Patent Information

Application Number
CN202210727602.1
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2022-06-22
Publication Date
2026-10-16
Estimated Expiration
2042-06-22

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Technical Problem

但是散热效果较差,无法根本性地解决电极产生的瞬态热量的积聚的问题

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Abstract

The embodiment of the present application provides a kind of exciting source array and radiation source device, it is mainly related to extreme ultraviolet lithography technical field.Exciting source array, comprising: multiple exciting sources, exciting source is used to generate optical radiation;The spacing between first exciting source and second exciting source is positively correlated with the sum of the electric power of first exciting source and second exciting source, and first exciting source and second exciting source are two adjacent exciting sources in multiple exciting sources;Wherein the electric power of each exciting source is less than or equal to corresponding electric power upper limit value.In the present application, the output power of generated optical radiation is increased, so that the optical radiation flux at the radiation collection surface is superimposed and increased, and at the same time, power is dispersed into multiple exciting sources, so that the generated heat is distributed to a larger space and is easy to dissipate, while increasing the output power of optical radiation, the temperature of single exciting source position is reduced.
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Description

Technical Field

[0001] This invention relates to the generation of light radiation sources, particularly in the field of extreme ultraviolet lithography, and specifically to an excitation source array and a radiation source device. Background Technology

[0002] Extreme ultraviolet (EUV) lithography is a next-generation lithography technology that uses extreme ultraviolet light with a wavelength of 13.5 nanometers as a light source. It can reduce the exposure wavelength to 13.5 nanometers and extend the lithography technology to feature sizes below 32 nanometers. EUV light source is the core component of lithography machines for chip manufacturing with a process of 14 nanometers or less.

[0003] EUV light sources are mainly obtained through the following five technical solutions: synchrotron radiation source, free electron laser, laser-produced plasma (LPP), gas discharge plasma (DPP), and laser-assisted discharge plasma (LDP).

[0004] When extreme ultraviolet (EUV) radiation is shaped and focused, it needs to pass through multiple mirrors to make it suitable for photolithography. However, the mirrors absorb most of the EUV radiation, resulting in a significant reduction in the power of the EUV radiation.

[0005] Taking the DPP extreme ultraviolet light source as an example, a common method to obtain high-power extreme ultraviolet radiation is to increase the high-voltage alternating current power supplied to the electrode pair. However, increasing the power leads to increased transient heating of the electrode pair, which can even burn out the electrode pair in severe cases. In addition to heat dissipation issues, electrode debris is also generated and flies towards the target direction of extreme ultraviolet light power collection. Although water cooling and other methods can remove the heat generated by the electrode pair, achieving some heat dissipation effect, the heat dissipation effect is poor and cannot fundamentally solve the problem of transient heat accumulation generated by the electrodes.

[0006] Due to the aforementioned problems, simply increasing the power of the DPP extreme ultraviolet light source has a clear upper limit, which prevents the output light power of the DPP extreme ultraviolet light source from being truly improved. As a result, the DPP extreme ultraviolet light source can only be used in experimental environments at present and cannot be truly applied to chip manufacturing. Summary of the Invention

[0007] The purpose of this invention is to provide an excitation source array and a radiation source device. The excitation source array, which integrates multiple excitation sources, increases the total power of the excitation source array, that is, increases the output power of the generated light radiation. This results in the superposition and increase of the light radiation flux at the radiation collection surface. At the same time, the power is distributed to multiple excitation sources, so that the generated heat is distributed in a larger space. This increases the output power of the light radiation while reducing the heat of a single excitation source.

[0008] To achieve the above objectives, the present invention provides an excitation source array, comprising: a plurality of excitation sources for generating light radiation; the spacing between a first excitation source and a second excitation source being positively correlated with the sum of the electrical power of the first excitation source and the second excitation source, wherein the first excitation source and the second excitation source are two adjacent excitation sources among the plurality of excitation sources; wherein the electrical power of each excitation source is less than or equal to the corresponding upper limit value of electrical power.

[0009] The present invention also provides a radiation source device, comprising: an excitation cavity, the aforementioned excitation source array, and a radiation collection surface; the excitation cavity has an opening, the excitation source array is disposed in the excitation cavity, and the radiation collection surface faces the opening.

[0010] In this embodiment of the invention, the spacing between two adjacent excitation sources in the excitation source array determines the electrical power input to these two excitation sources. The larger the spacing between the two excitation sources, the greater the sum of their electrical power. Based on this, distributing the total excitation power across multiple excitation sources in the excitation source array increases the total power of the array, thereby increasing the output power of the generated light radiation. This results in the superposition and increase of the light radiation flux at the radiation collection surface. Simultaneously, distributing the power across multiple excitation sources distributes the generated heat over a larger space, increasing the output power of the light radiation while relatively reducing the heat generated by a single excitation source.

[0011] In one embodiment, the array formed by arranging the plurality of excitation sources is symmetrical about a plane that is perpendicular to the radiation collection surface, such that the light radiation generated by the plurality of excitation sources forms parallel light radiation perpendicular to the radiation collection surface within a predetermined length.

[0012] In one embodiment, the plurality of excitation sources are located on the same straight line, and the straight line containing the plurality of excitation sources passes perpendicularly through the radiation collection surface.

[0013] In one embodiment, if the distance between the first excitation source and the second excitation source is less than a preset distance threshold, the ratio of the distance between the first excitation source and the second excitation source to the sum of the electrical power of the first excitation source and the second excitation source is a first preset ratio value; if the distance between the first excitation source and the second excitation source is greater than or equal to the preset distance threshold, the ratio of the distance between the first excitation source and the second excitation source to the sum of the electrical power of the first excitation source and the second excitation source is a second preset ratio value; the first preset ratio value is less than the second preset ratio value.

[0014] In one embodiment, the plurality of excitation sources form a two-dimensional rectangular array.

[0015] In one embodiment, the plurality of excitation sources includes a plurality of excitation source groups, wherein the plurality of excitation sources in each excitation source group are arranged in a straight line and correspond to a radiation collection point on the radiation collection surface.

[0016] In one embodiment, each excitation source group contains a plurality of excitation sources located on the same straight line, which are arranged at equal intervals.

[0017] In one embodiment, the multiple excitation sources included in the plurality of excitation source groups that are located on the same straight line correspond to the same radiation collection point on the radiation collection surface.

[0018] In one embodiment, the spacing between two adjacent excitation sources in the plurality of excitation sources is between 1 mm and 100 mm.

[0019] In one embodiment, the light radiation is photons, electrons, or ions.

[0020] In one embodiment, the excitation source includes two electrodes disposed opposite to each other, with an excitation medium disposed in the gap between the two electrodes; the two electrodes in the excitation source generate high-voltage alternating current pulses to excite the excitation medium to generate light radiation.

[0021] In one embodiment, the plurality of excitation sources are formed on two electrode layers disposed opposite to each other.

[0022] In one embodiment, each electrode includes: a cooling unit, a control unit, and an emission field source arranged in sequence; the emission field sources of the two electrodes in the same excitation source are arranged opposite to each other.

[0023] In one embodiment, the cooling unit in each electrode is of any of the following types: gas circulation cooling, liquid circulation cooling, and solid thermal conduction cooling.

[0024] In one embodiment, the excitation source includes a laser source and a target material; the laser source emits laser light that irradiates the target material to form light radiation. Attached Figure Description

[0025] Figure 1 This is a schematic diagram of an excitation source array according to an embodiment of the present invention;

[0026] Figure 2 This is a schematic diagram of an excitation source array applied in a radiation source device according to an embodiment of the present invention;

[0027] Figure 3 In one embodiment of the present invention, the distance between two adjacent excitation sources in the excitation source array is related to the total input power (sum of electrical power) I. Input and the total output power (sum of radiated power) I output A diagram illustrating a positive correlation;

[0028] Figure 4 This is a schematic diagram of the application of an excitation source array in a radiation source device according to another embodiment of the present invention;

[0029] Figure 5 This is a schematic diagram of a single excitation source in an excitation source array according to an embodiment of the present invention;

[0030] Figure 6 This is a schematic diagram of the application of an excitation source array in a radiation source device according to an embodiment of the present invention;

[0031] Figure 7 yes Figure 6 A schematic diagram of the optical radiation generated by the excitation source array;

[0032] Figure 8 This is a schematic diagram of an excitation source array according to another embodiment of the present invention;

[0033] Figure 9 yes Figure 8 A schematic diagram of the application of the excitation source array in a radiation source device;

[0034] Figure 10 This is a schematic diagram of the light radiation generated by the application of an excitation source array in a radiation source device according to another embodiment of the present invention;

[0035] Figure 11 This is a schematic diagram of another embodiment of the present invention, in which an excitation source array is applied in a radiation source device, wherein multiple excitation source groups correspond to different radiation collection points;

[0036] Figure 12 This is a schematic diagram of the application of an excitation source array in a radiation source device according to another embodiment of the present invention, wherein multiple excitation source groups correspond to the same radiation collection point. Detailed Implementation

[0037] The embodiments of the present invention will be described in detail below with reference to the accompanying drawings to provide a clearer understanding of the purpose, features, and advantages of the present invention. It should be understood that the embodiments shown in the drawings are not intended to limit the scope of the present invention, but are merely illustrative of the essential spirit of the technical solution of the present invention.

[0038] In the following description, certain specific details are set forth for the purpose of illustrating various disclosed embodiments in order to provide a thorough understanding of the various disclosed embodiments. However, those skilled in the art will recognize that embodiments may be practiced without one or more of these specific details. In other instances, well-known apparatuses, structures, and techniques associated with this application may not have been shown or described in detail to avoid unnecessarily obscuring the description of the embodiments.

[0039] Unless the context requires otherwise, throughout the specification and claims, the word “comprising” and its variations, such as “including” and “having”, shall be understood to have an open, inclusive meaning, that is, to be interpreted as “including, but not limited to”.

[0040] Throughout this specification, references to "an embodiment" or "an embodiment" indicate that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment. Therefore, the appearance of "in an embodiment" or "an embodiment" in various places throughout the specification does not necessarily refer to the same embodiment. Furthermore, a particular feature, structure, or characteristic may be combined in any manner in one or more embodiments.

[0041] The singular forms “a” and “” used in this specification and the appended claims include plural references unless otherwise expressly stated herein. It should be noted that the term “or” is generally used to mean “or / and” unless otherwise expressly stated herein.

[0042] In the following description, in order to clearly demonstrate the structure and working method of the present invention, a number of directional terms will be used. However, terms such as "front", "back", "left", "right", "outside", "inside", "outward", "inward", "up", and "down" should be understood as convenient terms and not as limiting terms.

[0043] One embodiment of the present invention relates to an excitation source array for generating light radiation perpendicular to a radiation collection surface. The light radiation may be photons (e.g., extreme ultraviolet photons), electrons, or ions.

[0044] In this embodiment, please refer to Figures 1 to 11The excitation source array includes: multiple excitation sources 1, which are used to generate light radiation; a first excitation source 11 and a second excitation source 12 are two adjacent excitation sources 1 among the multiple excitation sources 1, and the distance between the first excitation source 11 and the second excitation source 12 is positively correlated with the sum of the electric power of the first excitation source 11 and the second excitation source 12, wherein the electric power of each excitation source 1 is less than or equal to the corresponding upper limit value of electric power. The upper limit values ​​of electric power of the multiple excitation sources 1 included in the excitation source array can be equal or different. In this embodiment, the upper limit value of electric power of each excitation source 1 included in the excitation source array is equal and is I. m Let's take an example to illustrate.

[0045] In an excitation source array, the distance D between two adjacent excitation sources 1 determines the maximum electrical power input to these two sources. This is because electrical power is equivalent to the heat generated at the electrodes; significant heat causes a temperature rise at the electrodes, leading to electrode damage. In other words, heat limits the increase in the total sum of maximum electrical power. The larger the distance between the two excitation sources 1, the better the heat dissipation, the smaller the temperature rise at the electrodes, and the greater the power input to these two excitation sources, i.e., the greater the sum of electrical power. The relationship between the distance between two adjacent excitation sources 1 and the sum of electrical power input to them is as follows: the distance between the two excitation sources 1 must ensure that the heat generated by the electrical power input to either excitation source 1 does not cause the heat input to the other excitation source 1 to accumulate, reaching or exceeding the maximum heat or temperature threshold, causing premature electrode damage. Therefore, when two excitation sources are too close, the input electrical power cannot be too high due to threshold limitations. Appropriately increasing the distance between the excitation sources increases the overall input electrical power, thus generating a larger maximum input power and forming the maximum output power (radiated power). Based on this, distributing the total excitation power to an array of multiple excitation sources increases the total power of the array, thereby increasing the output power of the generated light radiation. This results in the superposition and increase of the light radiation flux at the radiation collection surface S. At the same time, distributing the power to multiple excitation sources 1 distributes the generated heat over a larger space, thereby increasing the output power of the light radiation while relatively reducing the heat of a single excitation source.

[0046] In this embodiment, the excitation source array is applied to a radiation source device, which includes the aforementioned excitation source array, excitation cavity 20, and radiation collection surface S. The excitation source array is disposed in the excitation cavity 20, and the excitation cavity 20 has an opening 201. The radiation collection surface S faces the opening 201, thereby the radiation collection surface S can collect the extreme ultraviolet radiation generated by the excitation source array through the opening 201. The excitation cavity 20 is made of opaque material, and the radiation collection surface S is parallel to and centered with the opening 201.

[0047] In one example, if the distance between the first excitation source 11 and the second excitation source 12 is less than a preset distance threshold, the ratio of the distance between the first excitation source 11 and the second excitation source 12 to the sum of the electrical power of the first excitation source 11 and the second excitation source 12 is a first preset ratio value; if the distance between the first excitation source 11 and the second excitation source 12 is greater than or equal to the preset distance threshold, the ratio of the distance between the first excitation source 11 and the second excitation source 12 to the sum of the electrical power of the first excitation source 11 and the second excitation source 12 is a second preset ratio value; the first preset ratio value is less than the second preset ratio value.

[0048] For example, please refer to Figure 3 The electrical power input to the first excitation source 11 is I1, and the electrical power input to the second excitation source 12 is I2. The sum of the electrical power of the first excitation source 11 and the second excitation source 12 is I3 = I1 + I2. When the distance D between the first excitation source 11 and the second excitation source 12 is less than a preset distance threshold a, the direct proportional relationship between the distance D and the electrical power I3 is as follows: Figure 2 As shown in the first stage; when the distance D between the first excitation source 11 and the second excitation source 12 is greater than the preset distance threshold a, the direct proportional relationship between the distance D and the electric power I3 is as follows: Figure 3 As shown in the second stage, the slope of the straight line in the first stage is less than the slope of the straight line in the second stage; furthermore, in the third stage, the sum of the electric power of the first excitation source 11 and the second excitation source 12 approaches 2I. m (Im is the maximum input electrical power that a single excitation source can obtain). Based on Figure 3 The distance D between two adjacent excitation sources (first excitation source 11 and second excitation source 12) and the sum of the electric power I of the two excitation sources (first excitation source 11 and second excitation source 12) Input A diagram showing a positive correlation between (i.e., total input power) and; additionally, it can also be used Figure 3 Let D represent the distance D between two adjacent excitation sources (first excitation source 11 and second excitation source 12) and I represent the sum of the radiated power of the two excitation sources (first excitation source 11 and second excitation source 12). output A similar diagram illustrates the positive correlation between (i.e., total output power) and (i.e., total output power).

[0049] Among the multiple excitation sources 1 included in the excitation source array, the upper limit of the electrical power of a single excitation source 1 is I. m , then I m ≤I3≤2I m For adjacent first excitation source 11 and second excitation source 12, if the distance between them is zero, due to heat dissipation limitations, the power input to the two excitation sources 1 at the same location is at most equal to Im, that is, the sum of the input electrical power is at most equal to I. mThe electrical power input to the first excitation source 11 and the second excitation source 12 is set to be equal, that is, the electrical power input to a single excitation source 1 is I. m / 2. Alternatively, it is preferable to ensure that the electrical power input to one of the excitation sources 1 is I. m Then the electrical power input to the other excitation source 1 is (I3-I m ).

[0050] It should be noted that for an excitation source 1, if there are multiple excitation sources 1 around it, the electric power between the excitation source 1 and any adjacent excitation source 1 and the distance between the two excitation sources 1 must satisfy the above-mentioned positive correlation.

[0051] In addition, the spacing between two adjacent excitation sources 1 in the plurality of excitation sources 1 is between 1 mm and 100 mm; for example, the preset spacing threshold a is any value in the range of [1 mm, 20 mm].

[0052] In this embodiment, the excitation source 1 can be an excitation source using gas discharge plasma (DPP) technology or laser plasma (LPP) technology.

[0053] In one embodiment, please refer to Figure 4 and Figure 5 The excitation source 1 employing gas discharge plasma (DPP) technology includes two opposing electrodes 13, with an excitation medium 14 (e.g., xenon gas) disposed in the gap between the two electrodes 13. The two electrodes 13 in the excitation source 1 generate high-voltage alternating electrical pulses to excite the excitation medium 14, generating light radiation. (Please refer to...) Figure 4 Multiple excitation sources 1 can be formed on two oppositely arranged electrode layers 2. That is, in a single excitation source 1, two oppositely arranged electrodes 13 are respectively formed on two oppositely arranged electrode layers 2. Thus, multiple excitation sources 1 can be formed on two oppositely arranged electrode layers 2, and the excitation medium 14 of each excitation source 1 is disposed in the gap between the two electrodes 13.

[0054] In one example, each electrode layer 2 includes: a cooling layer 21, a control unit layer 22 in contact with the cooling layer 21, and multiple emission sources 23 formed on the control unit layer 22. The control layer 22 contains control units corresponding to each emission source 23. The number of emission sources 23 on the two electrode layers 2 is equal, and their spatial positions correspond one-to-one, thus forming multiple pairs of opposing emission source pairs on the two electrode layers 2, i.e., multiple opposing electrode pairs are formed between the two electrode layers 2. A gap exists between the two emission sources 23 in each emission source pair, and multiple excitation media 14 are respectively disposed in the gaps between the multiple pairs of emission source pairs. The high-voltage alternating current pulses generated by two adjacent excitation sources 1 can be simultaneous or staggered in time. The cooling layer 21 is made of a heat-dissipating material, which can cool the control unit layer 22 and the multiple emission sources 133, minimizing heat accumulation.

[0055] In one example, in the two opposing electrodes 13 contained in a single excitation source 1, please refer to... Figure 5 Each electrode 13 includes a cooling unit 131, a control unit 132, and a emission source 133 arranged in sequence. The emission sources 133 of the two electrodes 13 in the same excitation source 1 are arranged opposite each other. The cooling unit 131 is made of heat dissipation material and can cool the control unit 132 and the emission source 133 to minimize heat accumulation. The control unit 132 is used to receive control signals and control the current flowing into the emission source 133 based on the control signals. The two opposite emission sources 133 generate high-voltage alternating current pulses based on the input current to excite the excitation medium 14, and the generated plasma radiation is the light radiation produced by the excitation source 1. The cooling unit 131 in each electrode 13 can be of any of the following types: gas circulation cooling, liquid circulation cooling, and solid thermal conductivity cooling.

[0056] It should be noted that in this embodiment and in the following embodiments, the excitation source is an excitation source using gas discharge plasma DPP technology as an example for illustration.

[0057] In another embodiment, the excitation source 1 using laser plasma LPP technology is a laser source; the laser source emits laser light to irradiate the target material, forming plasma on the surface of the target material, resulting in extreme ultraviolet radiation of the plasma; multiple laser radiations emitted by multiple laser sources simultaneously or sequentially irradiate the target material, resulting in enhanced radiation power after the light radiation from multiple radiation points irradiates the radiation collection surface S.

[0058] In one embodiment, multiple excitation sources 1 are located on the same straight line, and the straight line containing the multiple excitation sources 1 passes through the radiation collection surface S. The spacing between any two adjacent excitation sources 1 on the same straight line can be the same or different. In one example, the multiple excitation sources 1 are located on the same straight line, and the straight line containing the multiple excitation sources 1 passes perpendicularly through the radiation collection surface S. Please refer to [reference needed]. Figure 6 and Figure 7 The straight line L1 containing multiple excitation sources 1 is perpendicular to and passes through the radiation collection surface S. The intersection of line L1 and the radiation collection surface S is the radiation collection point. The light radiation generated by the multiple excitation sources 1 is superimposed in the light radiation superposition region, resulting in superposition and enhancement of light radiation at the radiation collection point. Compared to a single excitation source, the radiation beams generated by multiple excitation sources 1 pass through the opening 201 of the excitation cavity 20 and form parallel light tending to be perpendicular to the radiation collection surface S at the radiation collection point. Therefore, the radiation collection surface S can collect radiation rays that are more suitable for photolithography. It should be noted that... Figure 6 and Figure 7 Taking, for example, multiple excitation sources 1 located on the same straight line, where the spacing between two adjacent excitation sources 1 is the same fixed value.

[0059] In one embodiment, the array formed by arranging multiple excitation sources 1 is symmetrical about a plane perpendicular to the radiation collection surface S. This results in the light radiation generated by the multiple excitation sources 1 forming parallel light radiation perpendicular to the radiation collection surface S within a predetermined length. In other words, the two-dimensional array formed by the multiple excitation sources 1 is a symmetrical array, with the symmetry plane being a plane perpendicular to the radiation collection surface S. Consequently, the light radiation generated by the multiple excitation sources 1, superimposed on the radiation collection surface S, forms parallel light radiation perpendicular to the radiation collection surface S within a predetermined length.

[0060] Please refer to Figures 8 to 10 (Taking the example of multiple excitation sources 1 formed on two oppositely arranged electrode layers), the array formed by multiple excitation sources 1 is a two-dimensional rectangular array (only the number of excitation sources 1 is schematically shown in the figure). The two-dimensional rectangular excitation source array is symmetrical about plane M, which is the perpendicular plane of the radiation collection surface S. Thus, the light radiation generated by multiple excitation sources 1 in the two-dimensional rectangular excitation source array is superimposed at the radiation collection surface S to form parallel light radiation perpendicular to the radiation collection surface S within a preset length.

[0061] In one embodiment, the plurality of excitation sources 1 include a plurality of excitation source groups. Each excitation source group contains a plurality of excitation sources 1 arranged in a straight line, corresponding to a radiation collection point on the radiation collection surface S. The light radiation generated by the plurality of excitation sources 1 in the plurality of excitation source groups is superimposed at the radiation collection surface S to form parallel light radiation perpendicular to the radiation collection surface S. That is, the plurality of excitation sources 1 in each excitation source group are all arranged in a straight line, and this straight line passes through a point on the radiation collection surface S, which is the radiation collection point corresponding to that excitation source group. The number of excitation sources 1 in each excitation source group can be the same or different, and the radiation collection points on the radiation collection surface S corresponding to each excitation source group can be the same or different.

[0062] In one example, each excitation source group contains multiple excitation sources 1 arranged at equal intervals along the same straight line. For each excitation source group, the distance between any two adjacent excitation sources 1 among the multiple excitation sources 1 located along the same straight line in that excitation source group is a fixed value.

[0063] Please refer to Figure 11 The excitation source array includes 5 excitation source groups 1. Each excitation source group includes 5 excitation sources 1 located on a straight line. The 5 excitation source groups correspond to different radiation collection points on the corresponding radiation collection surface S. The excitation source array is symmetrical about the plane M. The light radiation generated by multiple excitation sources 1 is superimposed at the radiation collection surface S to form parallel light radiation perpendicular to the radiation collection surface S.

[0064] Please refer to Figure 12 The excitation source array includes 5 excitation source groups 1. Each excitation source group includes multiple excitation sources 1 located on a straight line. The 5 excitation source groups correspond to the same radiation collection point on the corresponding radiation collection surface S. The excitation source array is symmetrical about the plane M. The light radiation generated by the multiple excitation sources 1 is superimposed at the radiation collection surface S to form parallel light radiation perpendicular to the radiation collection surface S.

[0065] Another embodiment of the present invention provides a radiation source device, please refer to... Figures 1 to 12 The radiation source device includes the excitation source array, the excitation cavity 20, and the radiation collection surface S as described in the previous embodiment. The excitation source array is disposed in the excitation cavity 20, and the excitation cavity 20 has an opening 201. The radiation collection surface S faces the opening 201, so that the radiation collection surface S can collect the extreme ultraviolet radiation generated by the excitation source array through the opening 201. The excitation cavity 20 is made of opaque material, and the radiation collection surface S is parallel to and centered with the opening 201.

[0066] The preferred embodiments of the present invention have been described in detail above, but it should be understood that, if necessary, aspects of the embodiments can be modified to utilize aspects, features, and concepts from various patents, applications, and publications to provide other embodiments.

[0067] In light of the detailed description above, these and other changes can be made to the embodiments. Generally, the terminology used in the claims should not be considered limited to the specific embodiments disclosed in the specification and claims, but should be understood to include all possible embodiments together with the full scope of equivalents enjoyed by these claims.

Claims

1. An excitation source array, characterized in that, include: Multiple excitation sources, said excitation sources being used to generate optical radiation; The distance between the first excitation source and the second excitation source is positively correlated with the sum of the electrical power of the first excitation source and the second excitation source, wherein the first excitation source and the second excitation source are two adjacent excitation sources among the plurality of excitation sources; wherein the electrical power of each excitation source is less than or equal to the corresponding upper limit value of electrical power; If the distance between the first excitation source and the second excitation source is less than a preset distance threshold, the ratio of the distance between the first excitation source and the second excitation source to the sum of the electric power of the first excitation source and the second excitation source is a first preset ratio value. If the distance between the first excitation source and the second excitation source is greater than or equal to a preset distance threshold, the ratio of the distance between the first excitation source and the second excitation source to the sum of the electrical power of the first excitation source and the second excitation source is a second preset ratio value; the first preset ratio value is less than the second preset ratio value. For a given excitation source, if the excitation source is surrounded by multiple excitation sources, then the sum of the electrical power between the excitation source and any adjacent excitation source satisfies the positive correlation with the distance between the two excitation sources.

2. The excitation source array according to claim 1, characterized in that, The array formed by the multiple excitation sources is symmetrical about a plane, which is perpendicular to the radiation collection surface, so that the light radiation generated by the multiple excitation sources forms parallel light radiation perpendicular to the radiation collection surface within a predetermined length.

3. The excitation source array according to claim 1, characterized in that, The plurality of excitation sources are located on the same straight line, and the straight line containing the plurality of excitation sources passes perpendicularly through the radiation collection surface.

4. The excitation source array according to claim 2, characterized in that, The multiple excitation sources form a two-dimensional rectangular array.

5. The excitation source array according to claim 2, characterized in that, The plurality of excitation sources include a plurality of excitation source groups, wherein the plurality of excitation sources contained in each excitation source group are in a straight line and correspond to a radiation collection point on the radiation collection surface.

6. The excitation source array according to claim 5, characterized in that, Each of the excitation source groups contains multiple excitation sources located on the same straight line, arranged at equal intervals.

7. The excitation source array according to claim 5, characterized in that, The multiple excitation sources included in the multiple excitation source groups that are located on the same straight line correspond to the same radiation collection point on the radiation collection surface.

8. The excitation source array according to claim 1, characterized in that, The spacing between two adjacent excitation sources in the plurality of excitation sources is between 1 mm and 100 mm.

9. The excitation source array according to claim 1, characterized in that, The light radiation is photons, electrons, or ions.

10. The excitation source array according to claim 1, characterized in that, The excitation source includes two electrodes arranged opposite to each other, and an excitation medium is disposed in the gap between the two electrodes; The two electrodes in the excitation source generate high-voltage electrical pulses to excite the excitation medium to generate light radiation.

11. The excitation source array according to claim 10, characterized in that, The plurality of excitation sources are formed on two electrode layers that are arranged opposite each other.

12. The excitation source array according to claim 10, characterized in that, Each electrode includes: a cooling unit, a control unit, and an emission field source arranged in sequence; the emission field sources of the two electrodes in the same excitation source are arranged opposite to each other.

13. The excitation source array according to claim 12, characterized in that, The cooling unit in each electrode is of any of the following types: gas circulation cooling, liquid circulation cooling, and solid thermal conduction cooling.

14. The excitation source array according to claim 1, characterized in that, The excitation source includes a laser source and a target material; the laser source emits laser light that irradiates the target material to form light radiation.

15. A radiation source device, characterized in that, include: An excitation cavity, an excitation source array according to any one of claims 1 to 14, and a radiation collection surface; the excitation cavity has an opening, the excitation source array is disposed in the excitation cavity, and the radiation collection surface faces the opening.

Citation Information

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