A mechanism and automated chemical etching apparatus for resonant chemical etching

Abstract

The application discloses a mechanism and an automatic chemical etching device for resonator chemical etching, which comprises a base, a liquid box arranged on the base, the liquid box being provided with at least four liquid storage spaces for storing liquid used for chemical etching, a driving mechanism arranged at the upper end of the base, the driving mechanism being used for connecting the resonator and driving the resonator to extend into or take out the liquid box, an etching track realizing mechanism arranged on the driving mechanism, the resonator being connected to the driving mechanism through the etching track realizing mechanism, the etching track realizing mechanism being used for driving the resonator to move in the liquid box according to a preset track, and a control system which is signal-connected to the driving mechanism and the etching track realizing mechanism and is used for controlling the opening and closing of the driving mechanism and the etching track realizing mechanism. The mechanism and the automatic chemical etching device for resonator chemical etching can achieve the purpose of accurately controlling the motion track of the resonator and the residence time and sequence of the resonator in each liquid during the etching process of the resonator.

Description

Technical Field

[0001] This invention relates to the field of precision manufacturing technology for resonant gyroscopes, and more specifically, to a mechanism for chemical etching of resonant oscillators. Furthermore, this invention also relates to an automated chemical etching apparatus including the aforementioned mechanism. Background Technology

[0002] The hemispherical resonant gyroscope is a new type of inertial-level solid-state wave gyroscope. It is a novel type of gyroscope with unique advantages such as high precision, small size, strong shock resistance, long life and high reliability, and has obvious advantages in both military and civilian applications.

[0003] Based on their structure, hemispherical resonant gyroscopes can be divided into three-piece and two-piece structures. The three-piece structure includes an excitation cover (exciter), a resonator, and a signal readout base (pickup device). The two-piece structure combines the excitation cover and signal readout base of the three-piece structure into a single device, which has a signal excitation readout base (electrode base). Therefore, it only includes the two core components: the resonator and the electrode base.

[0004] Regardless of the structure, manufacturing a high-quality resonator factor is crucial for improving the overall performance of a resonant gyroscope. A key step in manufacturing a high-quality resonator factor, distinct from the processing of ordinary mechanical parts, is chemical etching.

[0005] Currently, the common operation of chemical etching involves holding a resonator in a jig and placing it into a container filled with hydrofluoric acid of a certain concentration. The jig is then held and moved at a certain speed to agitate the resonator in the hydrofluoric acid solution, thereby achieving chemical etching of the resonator surface by the chemical etching liquid such as hydrofluoric acid. To improve the efficiency of chemical etching of the resonator surface, a chemical etching cycle is usually adopted. One cycle includes the treatment of the resonator in the chemical etching solution and the cleaning in solutions such as deionized water, strong inorganic acid, and anhydrous ethanol. These solutions are collectively referred to as the liquids used for chemical etching. This cycle can be repeated dozens of times.

[0006] For the chemical etching of resonator oscillators, the concentration and temperature of the hydrofluoric acid solution, the etching time, the trajectory and speed of the resonator, and the order and duration of "washing" in the various etching solutions all affect the etching effect and thus the quality factors of the resonator. The solution concentration is usually pre-prepared and re-prepared after a certain period of use, and the etching time can be controlled by a timer. However, the trajectory and speed of the resonator are often difficult to control precisely in a primarily manual operation. Furthermore, manual operation is not conducive to cyclic chemical etching processes.

[0007] In summary, how to precisely control the trajectory and speed of the harmonic oscillator during chemical etching, as well as the processing time and sequence in various chemical etching liquids, is a problem that urgently needs to be solved by those skilled in the art. Summary of the Invention

[0008] In view of this, the object of the present invention is to provide a mechanism for chemical etching of a resonator, which can precisely control the trajectory, speed and processing time and sequence of the resonator in each chemical etching liquid during the chemical etching process.

[0009] Another object of the present invention is to provide an automated chemical etching apparatus including the above-described mechanism.

[0010] To achieve the above objectives, the present invention provides the following technical solution:

[0011] A mechanism for chemical etching of a harmonic oscillator, comprising:

[0012] Base;

[0013] A liquid container is provided on the base, and the liquid container has at least four containers for storing liquid used for chemical etching.

[0014] A drive mechanism is located at the upper end of the base. The drive mechanism is used to connect the resonator and drive the resonator to extend into or remove the liquid box.

[0015] An etching trajectory realization mechanism is provided in the driving mechanism. The resonator is connected to the driving mechanism through the etching trajectory realization mechanism. The etching trajectory realization mechanism is used to drive the resonator to move in the liquid box according to a preset trajectory.

[0016] A control system is connected to the drive mechanism and the etching trajectory realization mechanism, and the control system is used to control the opening and closing of the drive mechanism and the etching trajectory realization mechanism.

[0017] Preferably, the driving mechanism includes an X-axis translation mechanism, a Y-axis translation mechanism and a Z-axis translation mechanism, wherein the Z-axis translation mechanism is disposed on the Y-axis translation mechanism, the Y-axis translation mechanism is disposed on the X-axis translation mechanism, and the etching trajectory realization mechanism is disposed on the Z-axis translation mechanism.

[0018] Preferably, the X-axis translation mechanism, the Y-axis translation mechanism, and the Z-axis translation mechanism each include: a stepper motor, a coupling, a bearing housing, a ball screw, a slide rail base plate, and a screw nut seat. The stepper motor is mounted on the slide rail base plate and connected to the ball screw via the coupling. The ball screw passes through the bearing housing and is threadedly connected to the screw nut seat. There are two bearing housings, each located at one end of the slide rail base plate.

[0019] Preferably, the X-axis translation mechanism, the Y-axis translation mechanism, and the Z-axis translation mechanism further include: a linear guide rail and a guide rail slider, the linear guide rail being disposed on the slide rail base plate, the guide rail slider being disposed between the lead screw nut seat and the linear guide rail, and the lead screw nut seat and the guide rail slider being disposed between the two bearing seats.

[0020] Preferably, the etching trajectory realization mechanism includes an etching adapter, a revolution servo motor, a revolution disk, a rotation servo motor, a rotation connecting rod, and a clamping mechanism. The etching adapter is located on the Z-axis translation mechanism. The revolution servo motor is located on the etching adapter and connected to the revolution disk. The rotation servo motor is located on the revolution disk and connected to the clamping mechanism through the rotation connecting rod. The clamping mechanism is used to clamp the resonator.

[0021] Preferably, the clamping mechanism includes a resonator quick-release module, which is used to enable quick installation or quick removal of the resonator.

[0022] Preferably, the orbital disk is provided with an orbital counterweight, the orbital disk is fitted with an orbital support seat on its outer periphery, and a thrust bearing is provided between the orbital support seat and the orbital disk.

[0023] An automated chemical etching apparatus includes a mechanism for chemical etching of a harmonic oscillator, wherein the mechanism for chemical etching of the harmonic oscillator is any of the aforementioned mechanisms for chemical etching of a harmonic oscillator.

[0024] This invention provides a mechanism for chemical etching of a resonator. The mechanism has a base with a liquid container for holding the chemical etching liquid. A driving mechanism is also provided on the base. The driving mechanism is connected to the resonator via an etching trajectory realization mechanism. The driving mechanism can move the etching trajectory realization mechanism to allow the resonator to enter the chemical etching liquid in the liquid container or to remove the resonator. The etching trajectory realization mechanism can move the resonator in the etching liquid in the liquid container according to a specified trajectory. A control system is connected to the driving mechanism and the etching trajectory realization mechanism. The control system controls the driving mechanism and the etching trajectory realization mechanism to drive the resonator to perform chemical etching according to a preset trajectory, achieving precise control of the resonator's movement trajectory and its residence time and sequence in each chemical etching liquid. Attached Figure Description

[0025] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort.

[0026] Figure 1 This is a schematic diagram of the structure of the mechanism for chemical etching of a harmonic oscillator provided by the present invention;

[0027] Figure 2 This is a schematic diagram of the Z-axis translation mechanism provided by the present invention;

[0028] Figure 3 A schematic diagram of the etching trajectory realization mechanism provided by the present invention;

[0029] Figure 4 This is a schematic diagram of an etching trajectory for a harmonic oscillator provided by the present invention;

[0030] Figure 5 This is a schematic diagram of another resonator etching trajectory provided by the present invention.

[0031] Figures 1 to 5 In the accompanying drawings, the reference numerals include:

[0032] 1 is the base, 2 is the liquid box, 3 is the etching trajectory realization mechanism, 4 is the X-axis translation mechanism, 5 is the Y-axis translation mechanism, 6 is the Z-axis translation mechanism, 7 is the stepper motor, 8 is the coupling, 9 is the bearing seat, 10 is the linear guide rail, 11 is the ball screw, 12 is the slide rail base plate, 13 is the screw nut seat, 14 is the guide rail slider, 15 is the etching adapter seat, 16 is the revolution servo motor, 17 is the revolution disk, 18 is the rotation servo motor, 19 is the rotation connecting rod, 20 is the resonator quick-release module, 21 is the resonator, 22 is the revolution counterweight, 23 is the revolution support seat, and 24 is the thrust bearing. Detailed Implementation

[0033] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0034] The core of this invention is to provide a mechanism for chemical etching of a harmonic oscillator, which can precisely control the trajectory of the harmonic oscillator and its residence time and sequence in various liquids during the chemical etching process.

[0035] Another core aspect of this invention is to provide an automated chemical etching apparatus that includes the aforementioned mechanisms.

[0036] It should be noted that the orientation or positional relationship indicated by terms such as "upper", "lower", "front", and "rear" is based on the orientation or positional relationship shown in the accompanying drawings and is only for the purpose of facilitating the description of this application and simplifying the description. It is not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0037] This application provides a mechanism for chemical etching of a harmonic oscillator, comprising: a base 1, a liquid container 2, a driving mechanism, an etching trajectory realization mechanism 3, and a control system;

[0038] Among them, the base 1 is a cuboid structure formed by connecting multiple strip frames;

[0039] Liquid box 2 is disposed on substrate 1. The middle part of substrate 1 is provided with an II-shaped frame. Liquid box 2 is provided with at least four and located at the upper end of the frame. Liquid box 2 is filled with liquid for chemical etching.

[0040] The etching trajectory realization mechanism 3 is located at the end of the drive mechanism. The resonator 21 is connected to the drive mechanism through the etching trajectory realization mechanism 3. The etching trajectory realization mechanism 3 is used to drive the resonator 21 to move in the liquid box 2 according to the preset trajectory.

[0041] The control system signal is connected to the drive mechanism and the etching trajectory realization mechanism 3. The control system is used to control the opening and closing of the drive mechanism and the etching trajectory realization mechanism 3.

[0042] For details, please refer to the appendix. Figure 1 A liquid box 2 is set in the middle of the base 1. Multiple liquid boxes 2 are provided, each used to store a chemical etching liquid, a strong inorganic acid, anhydrous ethanol, and deionized water. A drive mechanism is located at the upper end of the base 1. The drive mechanism is connected to the resonator 21 via an etching trajectory realization mechanism 3. The control system controls the drive mechanism to move the etching trajectory realization mechanism 3 and the resonator 21, precisely controlling the movement trajectory of the resonator 21, its residence time in each liquid, and its sequence. The resonator 21 can be inserted sequentially into different liquid boxes 2. The etching trajectory realization mechanism 3 can drive the resonator... The resonator 21 moves within the chemical etching liquid in the liquid container 2 according to different preset trajectories and speeds to achieve the best etching effect. The control system controls the drive mechanism and the etching trajectory realization mechanism 3 according to the etching time. After the chemical etching is completed, the drive mechanism drives the resonator 21 into other liquid containers 2 for cleaning. This can realize the automated cyclic processing of the chemical etching of the resonator 21. Similarly, multiple cycles of the above steps can be set to eliminate the loss layer on the surface of the resonator 21 and improve the efficiency and stability of the chemical etching of the resonator 21.

[0043] Based on the above embodiments, the driving mechanism includes an X-axis translation mechanism 4, a Y-axis translation mechanism 5 and a Z-axis translation mechanism 6. The Z-axis translation mechanism 6 is located on the Y-axis translation mechanism 5, the Y-axis translation mechanism 5 is located on the X-axis translation mechanism 4, and the etching trajectory realization mechanism 3 is located on the Z-axis translation mechanism 6.

[0044] Specifically, the X-axis translation mechanism 4 is fixed to the upper end face of the base 1, the Y-axis translation mechanism 5 is located at the moving end of the X-axis translation mechanism 4, the Z-axis translation mechanism 6 is located at the moving end of the Y-axis translation mechanism 5, and the etching trajectory realization mechanism 3 is located at the moving end of the Z-axis translation mechanism 6. That is, the X-axis translation mechanism 4, the Y-axis translation mechanism 5, and the Z-axis translation mechanism 6 are connected to the etching trajectory realization mechanism 3 in series, so that the etching trajectory realization mechanism 3 can achieve movement in the X-axis, Y-axis, and Z-axis directions through the cooperation of the X-axis translation mechanism 4, the Y-axis translation mechanism 5, and the Z-axis translation mechanism 6.

[0045] Based on the above embodiments, the X-axis translation mechanism 4, Y-axis translation mechanism 5 and Z-axis translation mechanism 6 each include: a stepper motor 7, a coupling 8, a bearing housing 9, a ball screw 11, a slide rail base plate 12 and a screw nut seat 13. The stepper motor 7 is located on the slide rail base plate 12 and is connected to the ball screw 11 through the coupling 8. The ball screw 11 passes through the bearing housing 9 and is threadedly connected to the screw nut seat 13. There are two bearing housings 9, and the two bearing housings 9 are respectively located at both ends of the slide rail base plate 12.

[0046] The slide rail base plate 12 is an L-shaped sheet structure. The stepper motor 7 is located at one end of the slide rail base plate 12, and the output end of the stepper motor 7 passes through this end. The ball screw 11 is arranged along the extension direction of the other end of the slide rail base plate 12.

[0047] For details, please refer to the appendix. Figure 2 The X-axis translation mechanism 4, Y-axis translation mechanism 5, and Z-axis translation mechanism 6 have the same structure and all include: a stepper motor 7, a coupling 8, a bearing housing 9, a ball screw 11, a slide rail base plate 12, and a screw nut seat 13. The output end of the stepper motor 7 is directly driven and connected to the ball screw 11 through the coupling 8. The ball screw 11 passes through the screw nut seat 13 and is connected to the screw nut seat 13 so that when the stepper motor 7 starts, the screw nut seat 13 can reciprocate along the ball screw 11 according to the output of the stepper motor 7. Based on the above, the Y-axis translation mechanism 5 is set on the screw nut seat 13 of the X-axis translation mechanism 4, and the Z-axis translation mechanism 6 is set on the screw nut seat 13 of the Y-axis translation mechanism 5.

[0048] Based on the above embodiments, the X-axis translation mechanism 4, the Y-axis translation mechanism 5 and the Z-axis translation mechanism 6 further include: a linear guide rail 10 and a guide rail slider 14. The linear guide rail 10 is disposed on the slide rail base plate 12, and the guide rail slider 14 is disposed between the lead screw nut seat 13 and the linear guide rail 10. The lead screw nut seat 13 and the guide rail slider 14 are disposed between two bearing seats 9.

[0049] Specifically, in addition to the above-mentioned structure, the X-axis translation mechanism 4, Y-axis translation mechanism 5, and Z-axis translation mechanism 6 also include a linear guide rail 10 and a guide rail slider 14. The linear guide rail 10 is disposed on the surface of the slide rail base plate 12 and is arranged parallel to the ball screw 11. The guide rail slider 14 is fixed to the bottom of the screw nut seat 13 and has a sliding groove. The linear guide rail 10 can be embedded in the sliding groove. The ball screw 11 and the linear guide rail 10 limit the movement of the guide rail slider 14 and the screw nut seat 13, ensuring that the screw nut seat 13 and the guide rail slider 14 can only perform linear motion. The range of motion of the screw nut seat 13 and the guide rail slider 14 is between two bearing seats 9, which serve as limiters.

[0050] In some embodiments, the etching trajectory realization mechanism 3 includes an etching adapter 15, a revolution servo motor 16, a revolution disk 17, a rotation servo motor 18, a rotation connecting rod 19, and a clamping mechanism. The etching adapter 15 is located on the Z-axis translation mechanism 6. The revolution servo motor 16 is located on the etching adapter 15 and connected to the revolution disk 17. The rotation servo motor 18 is located on the revolution disk 17 and connected to the clamping mechanism through the rotation connecting rod 19. The clamping mechanism is used to clamp the resonator 21.

[0051] The self-rotating connecting rod 19 needs to be inserted into the etching liquid or other solution, so the outer periphery of the self-rotating connecting rod 19 is provided with an anti-corrosion layer.

[0052] For details, please refer to the appendix. Figure 1 With appendix Figure 3 The etching adapter 15 is an L-shaped sheet structure. One end of the etching adapter 15 is connected to the lead screw nut seat 13 of the Z-axis translation mechanism 6, and the other end of the etching adapter 15 is a circular sheet structure. A revolution servo motor 16 is arranged in the middle of the circle. The output end of the revolution servo motor 16 is set downward and passes through the etching adapter 15. The output end of the revolution servo motor 16 is connected to the center point of the revolution disk 17. A rotation servo motor 18 is also arranged on the revolution disk 17. The output end of the rotation servo motor 18 is set downward and passes through the center point of the disk 17. The output of the rotary servo motor 18, passing through the orbital disk 17, is connected to the resonator 21 via a clamping mechanism. Both the orbital servo motor 16 and the rotary servo motor 18 are connected to the control system signal. By controlling the output power of the orbital servo motor 16 and the output power of the rotary servo motor 18, the rotational speed V1 of the output of the rotary servo motor 18 and the rotational speed V2 of the orbital servo motor 16 can be obtained. Based on the ratio of V1 to V2, the etching trajectory of the resonator 21 during the etching process can be determined. For example, when V1 / V2 = 0, it is the attachment... Figure 4 The etched traces shown; when V1 / V2 = -1, it is an attachment. Figure 3 The etch trajectory shown; when V1 / V2 is other than 0 and -1, a variety of other etch trajectories can be achieved.

[0053] Based on the above embodiments, the clamping mechanism includes a resonator quick-release module 20, which is used to realize the quick installation or quick removal of the resonator 21.

[0054] Specifically, the output end of the self-rotating servo motor 18 is connected to the resonator quick-release module 20 through the self-rotating connecting rod 19. The resonator quick-release module 20 is provided with a slot, the structure of which is matched with the structure of the resonator 21, so as to facilitate the operator to quickly install or remove the resonator 21.

[0055] In some embodiments, a counterweight 22 is provided on the orbital disk 17, an orbital support 23 is provided on the outer periphery of the orbital disk 17, and a thrust bearing 24 is provided between the orbital support 23 and the orbital disk 17.

[0056] Specifically, a counterweight 22 is provided on the orbital disk 17 to balance the eccentric load introduced by the self-rotating servo motor 18 on the orbital disk 17. The orbital support 23 is sleeved on the outer periphery of the orbital disk 17 to prevent corrosive etching liquid or other liquids from splashing into the components inside the orbital support 23 during the etching process of the resonator 21, thereby extending the service life of the equipment.

[0057] In addition to the mechanism for chemical etching of the harmonic oscillator described above, the present invention also provides an automated chemical etching apparatus including the mechanism disclosed in the above embodiments. The structure of the other parts of the automated chemical etching apparatus is described in the prior art and will not be repeated here.

[0058] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on the differences from other embodiments. The same or similar parts between the various embodiments can be referred to each other.

[0059] The foregoing has provided a detailed description of the mechanism and automated chemical etching equipment for harmonic oscillators provided by this invention. Specific examples have been used to illustrate the principles and implementation methods of this invention. The descriptions of the embodiments above are merely for the purpose of helping to understand the method and core ideas of this invention. It should be noted that those skilled in the art can make various improvements and modifications to this invention without departing from its principles, and these improvements and modifications also fall within the protection scope of the claims of this invention.

Claims

1. A mechanism for chemical etching of a harmonic oscillator, characterized in that, include: Base (1); Liquid boxes (2) are provided on the base (1), and the liquid boxes (2) are provided with at least four and are used to store liquids for chemical etching; A drive mechanism is located at the upper end of the base (1). The drive mechanism is used to connect the resonator (21) and drive the resonator (21) to extend into or take out the liquid box (2). An etching trajectory realization mechanism (3) is provided on the driving mechanism. The resonator (21) is connected to the driving mechanism through the etching trajectory realization mechanism (3). The etching trajectory realization mechanism (3) is used to drive the resonator (21) to move in the liquid box (2) according to a preset trajectory. The control system is connected to the drive mechanism and the etching trajectory realization mechanism (3) and is used to control the opening and closing of the drive mechanism and the etching trajectory realization mechanism (3); The driving mechanism includes an X-axis translation mechanism (4), a Y-axis translation mechanism (5) and a Z-axis translation mechanism (6). The Z-axis translation mechanism (6) is located on the Y-axis translation mechanism (5), the Y-axis translation mechanism (5) is located on the X-axis translation mechanism (4), and the etching trajectory realization mechanism (3) is located on the Z-axis translation mechanism (6). The etching trajectory realization mechanism (3) includes an etching adapter (15), a revolution servo motor (16), a revolution disk (17), a rotation servo motor (18), a rotation connecting rod (19), and a clamping mechanism. The etching adapter (15) is located on the Z-axis translation mechanism (6). The revolution servo motor (16) is located on the etching adapter (15) and connected to the revolution disk (17). The rotation servo motor (18) is located on the revolution disk (17) and connected to the clamping mechanism through the rotation connecting rod (19). The clamping mechanism is used to clamp the resonator (21). The output end of the revolution servo motor (16) is connected to the center point of the revolution disk (17), and both the revolution servo motor (16) and the rotation servo motor (18) are connected to the control system signal. The orbital disk (17) is provided with an orbital counterweight (22), and an orbital support seat (23) is provided on the outer periphery of the orbital disk (17). A thrust bearing (24) is provided between the orbital support seat (23) and the orbital disk (17).

2. The mechanism for chemical etching of a harmonic oscillator according to claim 1, characterized in that, The X-axis translation mechanism (4), the Y-axis translation mechanism (5), and the Z-axis translation mechanism (6) each include: a stepper motor (7), a coupling (8), a bearing seat (9), a ball screw (11), a slide rail base plate (12), and a screw nut seat (13). The stepper motor (7) is located on the slide rail base plate (12). The stepper motor (7) is connected to the ball screw (11) through the coupling (8). The ball screw (11) passes through the bearing seat (9). The ball screw (11) is connected to the screw nut seat (13). There are two bearing seats (9), and the two bearing seats (9) are respectively located at both ends of the slide rail base plate (12).

3. The mechanism for chemical etching of a harmonic oscillator according to claim 2, characterized in that, The X-axis translation mechanism (4), the Y-axis translation mechanism (5) and the Z-axis translation mechanism (6) further include: a linear guide rail (10) and a guide rail slider (14). The linear guide rail (10) is located on the slide rail base plate (12). The guide rail slider (14) is located between the lead screw nut seat (13) and the linear guide rail (10). The lead screw nut seat (13) and the guide rail slider (14) are located between the two bearing seats (9).

4. The mechanism for chemical etching of a harmonic oscillator according to claim 1, characterized in that, The clamping mechanism includes a resonator quick-release module (20), which is used to enable the resonator (21) to be quickly installed or quickly removed.

5. An automated chemical etching apparatus, comprising a mechanism for chemical etching of a harmonic oscillator, characterized in that, The mechanism for chemical etching of the harmonic oscillator is the mechanism for chemical etching of the harmonic oscillator as described in any one of claims 1 to 4.

Images