Light supplementing assembly, UV light curing device and control method thereof

Abstract

This invention discloses a supplementary lighting component for a UV curing apparatus, a UV curing apparatus, and a control method thereof. The supplementary lighting component includes a supplementary light source disposed between two curing lamps in the UV curing apparatus. It provides supplementary UV light to the weak-light area between the two curing lamps to form a uniform target light intensity distribution in the curing area of ​​the object being cured. The first light rays emitted by the two curing lamps, conforming to the target light intensity distribution, respectively cover the outer edges of the corresponding directions of the curing area. By employing the above-mentioned supplementary lighting component for a UV curing apparatus, the drawback of uneven light intensity distribution in the UV curing apparatus can be improved, increasing the light intensity in the weak-light area of ​​the wafer surface during the process, enhancing the uniformity of light intensity distribution, and thus improving the efficiency of precursor chemical bond breaking during the process.

Description

Technical Field

[0001] This invention relates to the field of semiconductor processing technology, and specifically to a supplementary light component for a UV curing device, a UV curing device, a control method for a UV curing device, and a computer-readable storage medium. Background Technology

[0002] In semiconductor manufacturing processes, ultraviolet (UV) irradiation is unavoidable. For example, UV irradiation is essential in processes such as photolithography and colloidal curing, and the quality of UV irradiation directly affects the product yield. UV curing is a type of radiation curing in semiconductor manufacturing. It utilizes short-wave UVC (200nm–280nm) light to irradiate the precursor introduced during the process, causing the chemical bonds such as Si-H and NH to break, thereby forming a more stable Si-O-Si network structure.

[0003] Please refer to Figure 1 and Figure 2 In a traditional UV curing device 100, the UV light emitted by each curing lamp 110 has a limited irradiation range. At the boundary between two adjacent curing lamps 110, there exists a weak light region 120. This weak light region 120 is only irradiated by the edge light from the two curing lamps 110, resulting in poor uniformity of light intensity distribution and failure to reach the target light intensity. Consequently, the chemical bonds in the precursor cannot be broken quickly, affecting the efficiency of precursor chemical bond breaking.

[0004] In order to solve the above-mentioned problems in the prior art, there is an urgent need in the field for a supplementary light technology for UV curing devices, which can improve the drawback of uneven light intensity distribution of light source in UV curing devices, increase the light intensity of weak light areas on the wafer surface in the process, improve the uniformity of light intensity distribution, and thus improve the efficiency of precursor chemical bond breaking in the process. Summary of the Invention

[0005] The following provides a brief overview of one or more aspects to offer a basic understanding of them. This overview is not an exhaustive summary of all conceived aspects, nor is it intended to identify key or decisive elements of all aspects, nor to define the scope of any or all aspects. Its sole purpose is to present some concepts of one or more aspects in a simplified form as a prelude to the more detailed descriptions that follow.

[0006] To overcome the aforementioned deficiencies in the prior art, the present invention provides a supplementary light component for a UV curing device, a UV curing device, a control method for a UV curing device, and a computer-readable storage medium, which can improve the drawback of uneven light intensity distribution of the light source in the UV curing device, increase the light intensity in the weak light area on the wafer surface during the process, improve the uniformity of light intensity distribution, and thus improve the efficiency of precursor chemical bond breaking during the process.

[0007] Specifically, the supplementary light assembly for a UV curing device provided according to the first aspect of the present invention includes: a supplementary light source disposed between two curing lamps of the UV curing device, for providing supplementary UV light to the weak light area between the two curing lamps, so as to form a uniform target light intensity distribution in the curing area of ​​the curing object, wherein the first light emitted by the two curing lamps that conforms to the target light intensity distribution respectively covers the outer edge of the curing area in the corresponding direction.

[0008] Furthermore, in some embodiments of the present invention, the supplementary light source includes: a supplementary light tube for emitting second light in a first direction aligned with the curing area and a second direction deviating from the curing area; and a first reflector surrounding the supplementary light tube in the second direction for reflecting the second light transmitted in the second direction to the weak light area, so as to cooperate with the second light transmitted in the first direction to form the uniform target light intensity distribution in the curing area of ​​the curing object.

[0009] Furthermore, in some embodiments of the present invention, the first reflector is arranged parallel to the supplementary light tube and has a parabolic reflector structure along its radial direction, wherein the supplementary light tube is located at the focal position of the reflector structure so as to reflect the second light rays transmitted in a plurality of second directions parallel to the weak light area.

[0010] Furthermore, in some embodiments of the present invention, the first reflector is composed of multiple reflective mirrors spliced ​​together and includes a first adjustment mechanism, wherein the first adjustment mechanism is respectively connected to each of the reflective mirrors, and the parabolic shape and / or the size of the reflective area of ​​the reflector structure is adjusted by adjusting the pose of each of the reflective mirrors.

[0011] Furthermore, in some embodiments of the present invention, the supplementary light tube is disposed in the microwave cavity of the two curing lamps of the UV curing device, and emits light synchronously with the curing lamps under the excitation of electromagnetic wave energy provided by the microwave cavity, so as to cooperate with the two curing lamps to form the uniform target light intensity distribution in the curing area of ​​the curing object.

[0012] Furthermore, the UV curing apparatus provided according to the second aspect of the present invention includes: two curing lamps for providing UV light to the curing area of ​​the object to be cured for UV curing, wherein the first light emitted by the two curing lamps conforming to the target light intensity distribution respectively covers the outer edge of the curing area in the corresponding direction; and the supplementary light component for the UV curing apparatus provided according to the first aspect of the present invention for providing supplementary UV light to the weak light area between the two curing lamps, so as to cooperate with the two curing lamps to form a uniform target light intensity distribution in the curing area of ​​the object to be cured.

[0013] Furthermore, in some embodiments of the present invention, a second adjustment mechanism is further included, wherein the second adjustment mechanism is respectively connected to each of the curing lamps and is used to adjust the position of the curing lamps so that the first light rays emitted by the two curing lamps that conform to the target light intensity distribution respectively cover the outer edge of the curing area in the corresponding direction.

[0014] Furthermore, in some embodiments of the present invention, the first adjustment mechanism configured in the supplementary lighting component also adjusts the parabolic shape and / or the size of the reflector structure of the supplementary lighting component according to the size of the weak light area generated by the two curing lamps after position adjustment, so as to cooperate with the two curing lamps to form a uniform target light intensity distribution in the curing area of ​​the curing object.

[0015] Furthermore, in some embodiments of the present invention, the supplementary lighting component is also configured to: acquire the original light intensity distribution of the two curing lamps in the curing area; and determine the spatial light intensity distribution of the supplementary UV light based on the target light intensity distribution and the original light intensity distribution, so as to cooperate with the two curing lamps to form a uniform target light intensity distribution in the curing area of ​​the curing object.

[0016] Furthermore, in some embodiments of the present invention, the UV curing device is further configured to: based on the target light intensity distribution, perform uniform adjustment of the luminous flux maintenance rate of the two curing lamps and the supplementary light source, so as to improve the luminous flux maintenance rate of the lower one and reduce the luminous flux maintenance rate of the higher one.

[0017] Furthermore, the control method for the UV curing apparatus provided in the third aspect of the present invention includes the following steps: determining the curing area of ​​the object to be cured; adjusting the positions of two curing lamps of the UV curing apparatus according to the curing area so that the first light rays emitted by the two curing lamps conforming to the target light intensity distribution respectively cover the outer edge of the curing area in the corresponding direction; determining the position and size of a weak light area between the two curing lamps that is smaller than the target light intensity distribution; adjusting the parabolic shape and / or the size of the reflector structure of the supplementary lighting component according to the position and size of the weak light area; and providing supplementary UV light rays to the weak light area via the supplementary lighting component to cooperate with the two curing lamps to form a uniform target light intensity distribution in the curing area of ​​the object to be cured.

[0018] Furthermore, according to a fourth aspect of the present invention, a computer-readable storage medium is provided having computer instructions stored thereon. When the computer instructions are executed by a processor, the control method of the UV curing apparatus described above, as provided in the third aspect of the present invention, is implemented. Attached Figure Description

[0019] The above-described features and advantages of the present invention will be better understood after reading the following detailed description of embodiments of the present disclosure in conjunction with the accompanying drawings. In the drawings, components are not necessarily drawn to scale, and components having similar related characteristics or features may have the same or similar reference numerals.

[0020] Figure 1 This is a structural diagram of a traditional UV curing device in the prior art;

[0021] Figure 2 for Figure 1 The diagram shows the light intensity distribution of a traditional UV curing device.

[0022] Figure 3 A schematic diagram of a UV curing device according to some embodiments of the present invention is shown;

[0023] Figure 4 for Figure 3 An exploded view of the UV curing device shown.

[0024] Figure 5 for Figure 3 The diagram shows the light intensity distribution of the UV curing device.

[0025] Figure 6 A schematic diagram comparing the light intensity distribution of a supplementary lighting component for a UV curing device provided according to some embodiments of the present invention with that of a conventional UV curing device is shown.

[0026] Figure 7A schematic diagram of the light intensity distribution of a supplementary lighting component for a UV curing device, provided according to other embodiments of the present invention, is shown.

[0027] Figure 8 for Figure 7 The diagram shows the trend of lamp life and luminous flux maintenance of the supplementary lighting components used in UV curing devices; and

[0028] Figure 9 A flowchart of a control method for a UV curing device provided according to some embodiments of the present invention is shown.

[0029] Figure label:

[0030] 100 Traditional UV curing devices;

[0031] 110 and 311 curing lamps;

[0032] 120, 330 Low-light areas;

[0033] 300 UV curing device;

[0034] 310 Curing light source assembly;

[0035] 312 Curing reflector;

[0036] 320 microwave cavity;

[0037] 340 Second regulating mechanism;

[0038] 350 Curing area;

[0039] 400 fill light assembly;

[0040] 410 Fill light tube;

[0041] 420 First reflector;

[0042] 421 Reflector;

[0043] 430 First regulating mechanism;

[0044] 440 Second reflector; and

[0045] S910~S940 steps. Detailed Implementation

[0046] The following specific embodiments illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. Although the description of the present invention is presented in conjunction with preferred embodiments, this does not mean that the features of the invention are limited to these embodiments. On the contrary, the purpose of describing the invention in conjunction with embodiments is to cover other options or modifications that may be derived based on the claims of the present invention. To provide a thorough understanding of the invention, many specific details will be included in the following description. The invention may also be implemented without using these details. Furthermore, to avoid confusion or obscuring the focus of the invention, some specific details will be omitted in the description.

[0047] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0048] Furthermore, the terms "upper," "lower," "left," "right," "top," "bottom," "horizontal," and "vertical" used in the following description should be understood as the orientations shown in the relevant paragraphs and accompanying drawings. These relative terms are for illustrative purposes only and do not imply that the described apparatus must be manufactured or operated in a specific orientation, and therefore should not be construed as limiting the invention.

[0049] It is understood that although terms such as "first," "second," and "third" may be used herein to describe various components, regions, layers, and / or parts, these components, regions, layers, and / or parts should not be limited by these terms, and these terms are only used to distinguish different components, regions, layers, and / or parts. Therefore, the first components, regions, layers, and / or parts discussed below may be referred to as second components, regions, layers, and / or parts without departing from some embodiments of the present invention.

[0050] As mentioned above, such as Figure 1 and Figure 2 As shown, the UV light emitted by each curing lamp 110 in a conventional UV curing device 100 has a limited irradiation range. At the boundary between two adjacent curing lamps 110, there exists a weak light region 120. This weak light region 120 is only irradiated by the edge light from the two curing lamps 110. Therefore, the light intensity distribution in this weak light region 120 is not only uneven but also fails to reach the target light intensity, resulting in the inability to quickly break the chemical bonds in the precursor and affecting the efficiency of precursor chemical bond breaking.

[0051] To address the aforementioned problems in the prior art, this invention provides a supplementary light component for a UV curing device, a UV curing device, a control method for a UV curing device, and a computer-readable storage medium. These components can improve the uneven light intensity distribution of the light source in the UV curing device, increase the light intensity in the weak light region on the wafer surface during the process, enhance the uniformity of light intensity distribution, and thereby improve the efficiency of precursor chemical bond breaking during the process.

[0052] In some non-limiting embodiments, the supplementary lighting component for a UV curing device provided in the first aspect of the present invention can be configured in the UV curing device provided in the second aspect of the present invention. Furthermore, the supplementary lighting component for a UV curing device provided in the first aspect of the present invention can also be used to implement the control method for the UV curing device provided in the third aspect of the present invention.

[0053] Specifically, in some non-limiting embodiments, the control method for the UV curing device provided in the third aspect of the present invention can be configured with a memory and a processor. The memory may include, but is not limited to, the computer-readable storage medium provided in the fourth aspect of the present invention, on which computer instructions are stored. The processor may be connected to the memory and configured to execute the computer instructions stored in the memory to implement the control method for the UV curing device provided in the third aspect of the present invention.

[0054] The working principle of the supplementary lighting components for UV curing devices described above will be described below with reference to some embodiments of UV curing devices. Those skilled in the art will understand that these embodiments of supplementary lighting components for UV curing devices are merely non-limiting implementations provided by the present invention, intended to clearly demonstrate the main concepts of the invention and provide specific solutions convenient for public implementation, rather than limiting all operating methods or functions of UV curing devices. Similarly, this UV curing device is also only one non-limiting implementation provided by the present invention and does not constitute a limitation on the implementing entities of these supplementary lighting components for UV curing devices.

[0055] First, please refer to the following: Figure 3 and Figure 4 , Figure 3 A schematic diagram of a UV curing device according to some embodiments of the present invention is shown. Figure 4 for Figure 3 An exploded view of the UV curing device shown.

[0056] like Figure 3 and Figure 4As shown, in some embodiments, the UV curing device 300 may include two sets of curing light source assemblies 310. Each curing light source assembly 310 may include curing lamps 311 and curing reflectors 312. The two curing lamps 311 in the UV curing device 300 can be used to provide UV light to the curing area of ​​the object to be cured in a first direction (e.g., downwards) for UV curing. The first light emitted by the two curing lamps 311, conforming to the target light intensity distribution, can respectively cover the outer edge of the curing area in the corresponding direction (e.g., downwards). Optionally, since the UV curing device 300 can be applied in semiconductor process flows, the object to be cured can be a wafer to be processed.

[0057] Those skilled in the art will understand that the UV curing device 300 with two curing lamps 311 listed in the embodiments of the present invention is merely a non-limiting implementation provided by the present invention, intended to clearly demonstrate the main concept of the present invention and provide a specific solution that is easy for the public to implement, rather than being used to limit the scope of protection of the present invention. Optionally, in other embodiments, those skilled in the art can also use different numbers of curing lamps 311 based on the concept of the present invention and combined with actual curing needs to perform the curing work on the object to be cured.

[0058] Furthermore, since the curing lamp 311 can be activated by electromagnetic wave energy, therefore, as Figure 3 or Figure 4 As shown, the curing light source assembly 310, including the curing lamps 311, can be disposed within the microwave cavity 320. Excitation by electromagnetic wave energy within the microwave cavity 320 illuminates the two curing lamps 311, causing them to emit UV light.

[0059] Continue as Figure 3 or Figure 4 As shown, the UV curing device 300 may further include a supplementary lighting component 400 for the UV curing device 300. In some embodiments, the supplementary lighting component 400 may include a supplementary lighting source, such as a supplementary lighting tube 410. The supplementary lighting tube 410 may also be disposed within the microwave cavity 320 of the two curing lamps 311 of the UV curing device 300. Under the excitation of electromagnetic wave energy provided by the microwave cavity 320, it can emit light synchronously with the curing lamps 311, thereby cooperating with the two curing lamps 311 to form a uniform target light intensity distribution in the curing area of ​​the curing object (e.g., a wafer).

[0060] For a clearer explanation of the 400 fill light module, please refer to [link / reference]. Figure 5 , Figure 5 for Figure 3 The diagram shows the light intensity distribution of the UV curing device.

[0061] like Figure 5As shown, the supplementary light tube 410 of the supplementary light assembly 400 can be disposed between the two curing tubes 311 of the UV curing device 300 to provide supplementary UV light to the weak light area 330 between the two curing tubes 311, thereby forming a uniform target light intensity distribution in the curing area of ​​the curing object (e.g., wafer) in conjunction with the two curing tubes 311.

[0062] Specifically, combined Figure 4 and Figure 5 As shown, in some embodiments, the supplementary lighting component 400 in the UV curing apparatus 300 may include a supplementary lighting tube 410 and a first reflector 420. The supplementary lighting tube 410 may be used to emit second light in a first direction (e.g., downward) and a second direction (e.g., upward, left, right, or other directions) away from the curing area of ​​the object to be cured (e.g., a wafer). The first reflector 420 may surround the supplementary lighting tube 410 in the second direction (e.g., upward, left, right, or other directions) to reflect the second light transmitted in the second direction to the weak light area 330 of the object to be cured (e.g., a wafer), so as to cooperate with the second light transmitted in the first direction to form a uniform target light intensity distribution in the curing area of ​​the object to be cured.

[0063] Furthermore, please continue to refer to [the relevant resources / references]. Figure 4 and Figure 5 In some embodiments, the first reflector 420 may be arranged parallel to the supplementary light tube 410 and have a parabolic reflector structure along its radial direction. The first reflector 420 of the reflector structure can almost completely surround the second direction of the supplementary light tube 410, thereby facilitating the complete reflection of the second light emitted by the supplementary light tube 410 in the second direction towards the first direction (e.g., downward) of the curing area.

[0064] In some preferred embodiments, the supplementary lighting tube 410 can be located at the focal point of the reflector structure of the first reflector 420. According to the definition of a parabola, all parallel light rays parallel to the axis of symmetry incident on a parabola will focus at a single point. According to Fermat's principle, light rays emitted from the focal point will become parallel light after reflection by the parabola. Therefore, by transforming the practical problem into a mathematical problem using analytical geometry, it can be concluded that the opening trajectory of the first reflector 420 can be equivalently represented as a parabola.

[0065] Specifically, optionally, the trajectory of the parabola of the first reflector 420 can be obtained according to the definition formula of a parabola. Where x is the x-coordinate of any point on the parabola, y is the y-coordinate of any point on the parabola, and a is the y-coordinate of the focus of the parabola. Therefore, the equation of the trajectory of the parabola can be derived as follows: Then, by substituting the data 'a' and the x-coordinate 'x', the parabolic trajectory can be obtained, which is the parabolic shape of the reflector of the first reflector 420 in this embodiment. In this embodiment, by placing the supplementary light tube 410 at the focal position of the parabolic reflector structure, the second rays transmitted in multiple second directions can be reflected parallel to the low-light region 330.

[0066] Furthermore, to more conveniently adjust the pose of the parabolic reflector structure of the first reflector 420, in some optional embodiments, such as Figure 4 As shown, the first reflector 420 can also be composed of multiple reflectors 421 spliced ​​together, and the supplementary lighting assembly 400 can also include a first adjustment mechanism 430 for connecting each reflector 421 respectively. The first adjustment mechanism 430 can adjust and fix the position of one or more reflectors 421, thereby adjusting the parabolic shape and / or the size of the reflection area of ​​the first reflector 420. For example, by adjusting the position of each reflector 421 through the first adjustment mechanism 430, the positional relationship between the first reflector 420 and the supplementary lighting tube 410 can be adjusted. By adjusting the orientation of each reflector 421 constituting the first reflector 420 through the first adjustment mechanism 430, such as fixing the angle, the opening size, curvature, and other parameters of the parabola of the spliced ​​reflector structure can be adjusted, thereby achieving curvature adjustment of the reflectors 421. Furthermore, the reflection angle of the second light emitted by the supplementary lighting tube 410 in the second direction can also be adjusted, as can the range of the reflection area reflected to the curvature area in the first direction.

[0067] Optionally, the first adjustment mechanism 430 may include an upper adjustment mechanism and a lower adjustment mechanism, which are used to jointly adjust the position and orientation of the multiple reflectors 421 and keep them fixed.

[0068] Please refer to Figure 6 , Figure 6 A schematic diagram comparing the light intensity distribution of a supplementary lighting component for a UV curing device provided according to some embodiments of the present invention with that of a conventional UV curing device is shown.

[0069] like Figure 6 As shown, if we simply add another set of identical curing light source components 310 as a light source to the traditional UV curing device 100 to enhance the light intensity of the weak light area 330, without performing any special treatment on the added light source, then because the light intensity distribution of the added curing lamp tube 311 itself still has obvious strong and weak light areas, uneven light intensity will occur again in the original weak light area 330. Therefore, this does not effectively solve the problem of uneven light intensity distribution in the UV curing device. Therefore, by... Figure 6The distribution of the light path and its projection diagram shown clearly indicate that in this invention, the supplementary light tube 410 is arranged at the parabolic focal point of the first reflector 420 of the reflector structure, so that the parallel reflected light, that is, the second light ray transmitted in the first direction, is parallel light that illuminates the weak light region 330, making the light intensity uniformity of the weak light region 330 better. This can improve the drawback of uneven light intensity distribution of the light source in the UV curing device, increase the light intensity of the weak light region on the wafer surface in the process, and improve the uniformity of light intensity distribution.

[0070] Please continue to return Figure 4 In some optional embodiments, the supplemental lighting assembly 400 may further include a second reflector 440. The second reflector 440 may be a reflective strip of the same length as the supplemental lighting tube 410. The second reflector 440 is disposed parallel to and directly above the supplemental lighting tube 410 to reflect the second light rays that are directly upward from the supplemental lighting tube 410 back to the first direction (e.g., downward) of the curing area.

[0071] like Figure 4 As shown, in some embodiments of the present invention, the UV curing device 300 may further include a second adjustment mechanism 340. The second adjustment mechanism 340 may be connected to each curing lamp 311 respectively, and is used to adjust the position of each curing lamp 311 so that the first light rays emitted by the two curing lamps 311 that conform to the target light intensity distribution can respectively cover the outer edge of the curing area of ​​the curing object (e.g., wafer) in the corresponding direction.

[0072] Furthermore, combined Figure 4 and Figure 5 As shown, in some embodiments, in the UV curing device 300, the first adjustment mechanism 430 disposed in the supplementary light assembly 400 can also adjust the parabolic shape and / or the size of the reflector structure of the supplementary light assembly 400 according to the size of the weak light area 330 generated by the two curing lamps 311 after the position adjustment by the second adjustment mechanism 340, so as to cooperate with the two curing lamps 311 to form a uniform target light intensity distribution in the curing area of ​​the curing object (e.g., wafer).

[0073] Next, please refer to Figure 7 , Figure 7 A schematic diagram of the light intensity distribution of a supplementary light component for a UV curing device, provided according to other embodiments of the present invention, is shown.

[0074] In some other embodiments of the present invention, the supplementary light component 400 in the UV curing device 300 may also be configured to: acquire the original light intensity distribution of the two curing lamps 311 in the curing area; and determine the spatial light intensity distribution of the supplementary UV light based on the target light intensity distribution and the original light intensity distribution, so as to cooperate with the two curing lamps 311 to form a uniform target light intensity distribution in the curing area of ​​the curing object.

[0075] Furthermore, the UV curing device 300 can uniformly adjust the luminous flux maintenance rate of the two curing lamps 311 and the supplementary lighting lamp 410 based on the target light intensity distribution, thereby improving the luminous flux maintenance rate of the lower lamp and reducing the luminous flux maintenance rate of the higher lamp. Specifically, as... Figure 7 As shown, the direct light from the supplementary light tube 410 of the supplementary light assembly 400 will enhance the light source of the original light source irradiation area of ​​the curing lamp tube 311, i.e., the curing area 350. Therefore, in order to maintain the irradiation intensity of the surface of the object to be cured (e.g., a wafer) unchanged, a lower luminous flux maintenance rate can be defined as a process condition. For example, luminous flux maintenance rate SPEC > 70%.

[0076] If the luminous flux maintenance rate of the curing lamp 311 can be reduced, then the service life of the curing lamp 311 can be extended accordingly. Please refer to [link / reference needed]. Figure 8 , Figure 8 for Figure 7 The diagram shows the trend of lamp life and luminous flux maintenance of the supplementary lighting components used in UV curing devices.

[0077] like Figure 8 As shown, in one embodiment, when there is no supplementary lighting component 400, a luminous flux maintenance rate of 80% or higher is considered acceptable for the curing lamp 311. Therefore, if the luminous flux maintenance rate falls below 80%, the curing lamp 311 needs to be replaced. Assuming that the luminous flux maintenance rate of the curing lamp 311 drops from 100% to 80% over one year (approximately 30,000 hours), then the lifespan of the curing lamp 311 is one year. However, when the supplementary lighting component 400 is added, a luminous flux maintenance rate of 70% or higher can be defined as acceptable. Assuming that the luminous flux maintenance rate of the curing lamp 311 drops from 100% to 70% over two years (approximately 60,000 hours), then the lifespan of the curing lamp 311 is two years, thus extending its service life.

[0078] This concludes the description of the supplementary lighting component 400 for a UV curing device provided in the first aspect of the present invention, and the UV curing device 300 provided in the second aspect. Next, please refer to... Figure 9 , Figure 9A flowchart of a control method for a UV curing device provided according to some embodiments of the present invention is shown.

[0079] like Figure 9 As shown, in some embodiments of the present invention, the control method of the UV curing device may include the following step S910: determining the curing area of ​​the object to be cured. Specifically, optionally, as... Figure 5 As shown, the curing area of ​​the object to be cured (e.g., a wafer) irradiated by the curing lamps 311 in the UV curing apparatus 300 is obtained. Then, step S920 can be performed: Based on the curing area, the positions of the two curing lamps 311 of the UV curing apparatus 300 are adjusted so that the first rays emitted by the two curing lamps 311, conforming to the target light intensity distribution, respectively cover the outer edges of the corresponding directions of the curing area. Then, step S930 can be performed: The position and size of the weak light region 330 between the two curing lamps 311, which is smaller than the target light intensity distribution, are determined. Then, step S940 can be performed: Based on the position and size of the weak light region 330, the parabolic shape of the reflector structure of the supplementary lighting assembly 400 and / or the size of the reflective area are adjusted. Finally, step S950 can be performed: Supplementary UV light is provided to the weak light region 330 via the supplementary lighting assembly 400 to cooperate with the two curing lamps 311 in forming a uniform target light intensity distribution in the curing area of ​​the object to be cured.

[0080] Although the methods described above are illustrated and depicted as a series of actions for the sake of simplicity, it should be understood and appreciated that these methods are not limited by the order of the actions, as some actions may occur in a different order and / or concurrently with other actions from the illustrations and descriptions herein or not illustrated and described herein but which may be understood by those skilled in the art, according to one or more embodiments.

[0081] In summary, the present invention provides a supplementary light component for a UV curing device, a UV curing device, a control method for a UV curing device, and a computer-readable storage medium, which can improve the drawback of uneven light intensity distribution of the light source in the UV curing device, increase the light intensity of the weak light area on the wafer surface in the process, improve the uniformity of light intensity distribution, and thus improve the efficiency of precursor chemical bond breaking in the process.

[0082] The prior description of this disclosure is provided to enable any person skilled in the art to make or use this disclosure. Various modifications to this disclosure will be apparent to those skilled in the art, and the general principles defined herein may be applied to other variations without departing from the spirit or scope of this disclosure. Therefore, this disclosure is not intended to be limited to the examples and designs described herein, but should be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A supplementary lighting component for a UV curing device, characterized in that, include: A supplementary light source is positioned between the two curing lamps of the UV curing device to provide supplementary UV light to the low-light area between the two curing lamps. The first light rays emitted by the two curing lamps, conforming to the target light intensity distribution, respectively cover the outer edge of the curing area. The supplementary light source includes: a supplementary light tube for emitting second light rays in a first direction aligned with the curing area and in a second direction deviating from the curing area; and a first reflector surrounding the supplementary light tube in the second direction, which is a reflector structure arranged parallel to the supplementary light tube and having a parabolic shape along its radial direction, wherein the supplementary light tube is located at the focal position of the reflector structure to reflect the second light rays transmitted in multiple second directions parallel to the weak light area, thereby forming a uniform target light intensity distribution in the curing area.

2. The supplementary lighting component as described in claim 1, characterized in that, The first reflector is composed of multiple reflective mirrors and includes a first adjustment mechanism, wherein the first adjustment mechanism is connected to each of the reflective mirrors respectively, and the parabolic shape and / or the size of the reflective area of ​​the reflector structure is adjusted by adjusting the position and orientation of each of the reflective mirrors.

3. The supplementary lighting component as described in claim 1, characterized in that, The supplementary light tube is disposed in the microwave cavity of the two curing lamps of the UV curing device. Under the excitation of the electromagnetic wave energy provided by the microwave cavity, it emits light synchronously with the curing lamps to cooperate with the two curing lamps to form the uniform target light intensity distribution in the curing area of ​​the object being cured.

4. A UV curing device, characterized in that, include: Two curing lamps are used to provide UV light to the curing area of ​​the object to be cured for UV curing, wherein the first light emitted by the two curing lamps, which conforms to the target light intensity distribution, respectively covers the outer edge of the curing area; as well as The supplementary light component for a UV curing device as described in any one of claims 1 to 3 is used to provide supplementary UV light to the weak light area between the two curing lamps, so as to cooperate with the two curing lamps to form a uniform target light intensity distribution in the curing area of ​​the object being cured.

5. The UV curing device as described in claim 4, characterized in that, Also includes: The second adjustment mechanism is connected to each of the curing lamps and is used to adjust the position of the curing lamps so that the first light rays emitted by the two curing lamps that conform to the target light intensity distribution cover the outer edge of the curing area.

6. The UV curing device as described in claim 5, characterized in that, The first adjustment mechanism configured in the supplementary lighting component also adjusts the parabolic shape and / or the size of the reflector structure of the supplementary lighting component according to the size of the weak light area generated by the two curing lamps after position adjustment, so as to cooperate with the two curing lamps to form a uniform target light intensity distribution in the curing area of ​​the curing object.

7. The UV curing device as described in claim 5, characterized in that, The supplemental lighting component is also configured to: Obtain the original light intensity distribution of the two curing lamps in the curing area; and Based on the target light intensity distribution and the original light intensity distribution, the spatial light intensity distribution of the supplementary UV light is determined to cooperate with the two curing lamps to form a uniform target light intensity distribution in the curing area of ​​the object being cured.

8. The UV curing device as described in claim 7, characterized in that, The UV curing device is also configured to: Based on the target light intensity distribution, the light flux maintenance rate of the two curing lamps and the supplementary light source is uniformly adjusted to improve the light flux maintenance rate of the lower one and reduce the light flux maintenance rate of the higher one.

9. A control method for a UV curing device, characterized in that, Implemented via a supplemental lighting component for a UV curing device as described in any one of claims 1 to 3, the control method includes the following steps: Determine the curing area of ​​the object to be cured; According to the curing area, adjust the positions of the two curing lamps of the UV curing device so that the first light emitted by the two curing lamps, which conforms to the target light intensity distribution, covers the outer edge of the curing area respectively. Determine the location and size of the weak light region between the two curing lamps that is smaller than the target light intensity distribution; Adjust the parabolic shape of the reflector structure and / or the size of the reflective area of ​​the supplementary lighting component according to the location and size of the low-light area; and The supplementary UV light is provided to the low-light area via the supplementary lighting component, so as to cooperate with the two curing lamps to form a uniform target light intensity distribution in the curing area of ​​the object being cured.

10. A computer-readable storage medium storing computer instructions thereon, characterized in that, When the computer instructions are executed by the processor, the control method of the UV curing device as described in claim 9 is implemented.

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