Method for producing a nanoimprint large-size tile work mold for optical waveguides

Abstract

The application discloses a kind of nanoimprint large-size mosaic working mold manufacturing method, the method comprises: by the way of nanoimprinting, structure on master is transferred to first soft film;By the way of nanoimprinting, structure on first soft film is imprinted to wafer glass, and first working mold is prepared;By the way of nanoimprinting, the structure of first working mold is transferred to second soft film, wherein, first working mold specified area is coated with glue;By the way of nanoimprinting, the structure of second soft film is transferred to wafer glass, and second working mold is prepared.The application is made into large-size nanoimprint working mold by mosaic process to single master, so that the production efficiency of optical waveguide is improved, and mass production is facilitated, and industrialization is realized.

Description

Technical Field

[0001] This invention relates to the field of nanoimprint technology, and in particular to a method for manufacturing large-size nanoimprint working dies for producing optical waveguides. Background Technology

[0002] With the rapid development of electronic information technology, AR (Augmented Reality) technology has also made substantial progress. Due to its own optical characteristics, AR technology can project virtual scenes into real scenes, giving users a unique experience that combines the virtual and the real. AR technology can be widely used in education, medical care, entertainment, industry and other industries, and has great commercial and educational value.

[0003] Currently, waveguide sheets for AR display modules are mainly produced directly using 4-inch master plates. This method involves imprinting flexible substrates (such as PET, PC, PMMA, flexible glass, etc.) onto the master plate to transfer the structure onto the flexible material to form a flexible template (referred to as a soft film). The structure is then transferred to the product through the soft film. This production process has low capacity and cannot meet the growing demand of the AR glasses market.

[0004] Master template fabrication typically employs semiconductor processes, which result in high costs, long production times, and low yields for 4-inch master templates. These factors prevent the direct fabrication of 8 / 12-inch multi-panel master templates using this process. This article presents a method to create large-size panelization working molds based on existing 4-inch master templates. Summary of the Invention

[0005] Based on the technical problems existing in the background technology, the present invention proposes a method for manufacturing a large-size nanoimprinting working mold for producing optical waveguides.

[0006] The present invention proposes a method for fabricating a large-size nanoimprint dies for producing optical waveguides, the method comprising: S1 transfers the structure on the master plate to the first soft film using nanoimprinting. S2 uses nanoimprinting to imprint the structure on the first soft film onto the wafer glass to obtain the first working mold; S3 uses nanoimprinting to transfer the structure of the first working mold onto the second soft film, wherein a designated area of ​​the first working mold is coated with adhesive. S4 uses nanoimprinting to transfer the structure of the second soft film onto the wafer glass to create the second working mold.

[0007] Preferably, step S3 involves applying the adhesive by spraying. After spraying, the adhesive self-levels to form a smooth film. The first working mold coated with diluted adhesive is then heated to evaporate the thinner.

[0008] Preferably, the designated area includes at least the area on the first working mold where a structure is provided.

[0009] Preferably, the spraying method is as follows: the glue is squeezed out by a glue pump, the liquid glue is atomized by high-frequency sound waves, and the atomized glue is blown downward by a downward blowing action, so that the atomized glue falls evenly onto the first working mold below.

[0010] Preferably, step S3 includes: The adhesive is diluted by adding a thinner, PGMEA, at a concentration of 20% by mass.

[0011] Preferably, the spraying parameters are: glue flow rate 150ul / min, spray valve moving speed 20mm / s, and spraying spacing 1.5mm.

[0012] Preferably, the heating parameters are: 80℃*1min, after heating, the adhesive layer thickness is about 1µm, and the thickness uniformity is ±5%.

[0013] Preferably, step S3, nanoimprinting, specifically involves placing a first working mold on an imprinting platform, fixing the first working mold in a vacuum adsorption manner, and performing nanoimprinting.

[0014] Preferably, the imprinting method in step S3 is one of three types, specifically: Method 1: Apply adhesive to the first working mold, place multiple first working molds in an array on the imprinting platform, and imprint. Method 2: Place multiple first working dies on the imprinting platform, apply glue simultaneously, and then imprint; Method 3: Glue application step: Apply glue to the first working mold and place it on the imprinting platform; Imprinting step: Imprint the first working die; Displacement step: Change the position of the first working die on the imprinting platform; Repeat the adhesive application, imprinting, and repositioning steps in sequence until the structure of the first working mold is transferred to the second soft film in an array.

[0015] Preferably, the method includes: S21 cuts the first working die into a rectangle.

[0016] In this invention, the method for manufacturing a large-size panelization working mold for producing optical waveguides involves spraying a soft film adhesive onto designated areas of multiple small working molds used for panelization. This ensures the adhesive only covers the grating structure area of ​​the working mold. By using appropriate spraying amounts and printing parameters, the integrity of the adhesive during the printing process is guaranteed without any overflow. The sprayed working mold is then used for panelization soft film fabrication via nanoimprinting, ultimately achieving the production of a large-size panelization working mold.

[0017] This invention uses a panelization process to create a large-size nanoimprint working mold from a single master plate, thereby improving the production efficiency of optical waveguides, facilitating rapid mass production, and enabling industrialization. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of the working mold 2, which is a method for manufacturing a large-size nanoimprinting working mold for producing optical waveguides proposed in this invention. Figure 2 This is a schematic diagram of the imprinting method for the fabrication of a large-size nanoimprinting working mold for producing optical waveguides, as proposed in this invention. Figure 3 This is a schematic diagram of the second imprinting method in the fabrication method of the nanoimprinting large-size panel working mold for producing optical waveguides proposed in this invention; Figure 4 This is a schematic diagram of the three imprinting methods in the fabrication method of the nanoimprinting large-size panel working mold for producing optical waveguides proposed in this invention; Figure 5 This diagram illustrates the spraying method for manufacturing a large-size nanoimprinting die for producing optical waveguides, as proposed in this invention. Figure 6 This is a diagram showing the moving path of a super mist nozzle for a large-size panel working mold for diffractive waveguide nanoimprinting proposed in this invention. Figure 7 This is a first working mold diagram of a large-size panelization working mold for diffractive waveguide nanoimprinting proposed in this invention; Figure 8 This is a flowchart of a method for creating a large-size panel working mold for diffractive waveguide nanoimprinting, as proposed in this invention. Detailed Implementation

[0019] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments.

[0020] Reference Figure 1-8A method for manufacturing a large-size nanoimprint dies for producing optical waveguides, the method comprising: S1 transfers the structure on the master plate to the first soft film using nanoimprinting. S2 uses nanoimprinting to imprint the structure on the first soft film onto the wafer glass to obtain the first working mold; S3 uses nanoimprinting to transfer the structure of the first working mold onto the second soft film, wherein a designated area of ​​the first working mold is coated with adhesive. S4 uses nanoimprinting to transfer the structure of the second soft film onto the wafer glass to create the second working mold.

[0021] In this invention, step S3 involves applying the adhesive by spraying. After spraying, the adhesive self-levels to form a smooth film. The first working mold coated with diluted adhesive is then heated to evaporate the thinner.

[0022] In this invention, the spraying method is specifically as follows: the glue is squeezed out through the glue injection tube 5 of the glue injection pump, the liquid glue is atomized by the high-frequency sound transducer 4, and the atomized glue is blown downward through the air inlet 2 through the air inlet pipe 3, so that the atomized glue 6 falls evenly onto the first working mold 1 below. Compared with spin coating or dispensing, ultrasonic spraying has the following advantages: A. Compared with spin coating, ultrasonic spraying can apply adhesive to a designated area, such as applying adhesive only to the grating structure area or applying adhesive in a way that at least avoids the edges, so that there are areas on the first working mold that are not covered with adhesive. By leaving an appropriate area of ​​uncoated adhesive and using appropriate imprinting parameters, the uncoated area can be used to accommodate the adhesive flowing during imprinting without adhesive layer steps. B. Compared with the dispensing method, ultrasonic spraying can apply adhesive to designated areas, such as applying adhesive only to the grating structure area or applying adhesive in a way that at least avoids the edges, so that there are areas on the first working mold that are not covered with adhesive. By leaving appropriate uncoated areas, the imprinted pattern is complete during imprinting. The uncoated areas do not overflow after accommodating the adhesive flowing during imprinting, and there are no adhesive layer steps.

[0023] In this invention, step S3 includes: The adhesive is diluted by adding a thinner, PGMEA, at a concentration of 20% by mass.

[0024] In this invention, the spraying parameters are: glue flow rate 150ul / min, spray valve moving speed 20mm / s, and spraying spacing 1.5mm.

[0025] In this invention, the heating parameters are: 80℃*1min. After heating, the adhesive layer thickness is approximately 1µm, and the thickness uniformity is ±5%.

[0026] In this invention, step S3, nanoimprinting, specifically involves placing a first working mold on an imprinting platform, fixing the first working mold in a vacuum adsorption manner, and performing nanoimprinting.

[0027] In this invention, the imprinting method in step S3 is one of three types: Method 1: Apply adhesive to the first working mold, place multiple first working molds in an array on the imprinting platform, and imprint. Method 2: Place multiple first working dies on the imprinting platform, apply glue simultaneously, and then imprint; Method 3: Glue application step: Apply glue to the first working mold and place it on the imprinting platform; Imprinting step: Imprint the first working die; Displacement step: Change the position of the first working die on the imprinting platform; Repeat the adhesive application, imprinting, and repositioning steps in sequence until the structure of the first working mold is transferred to the second soft film in an array.

[0028] In this invention, the method includes: S21 cuts the first working die into a rectangle.

[0029] This invention involves: transferring a structure from a master mold to a first flexible film using nanoimprinting; imprinting the structure from the first flexible film onto a wafer glass using nanoimprinting to obtain a first working mold; transferring the structure of the first working mold onto a second flexible film using nanoimprinting, wherein a designated area of ​​the first working mold is coated with adhesive; and transferring the structure of the second flexible film onto a wafer glass using nanoimprinting to obtain a second working mold.

[0030] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. A method for manufacturing a large-size nanoimprint dies for producing optical waveguides, characterized in that, The method includes: S1 transfers the structure on the master plate to the first soft film through nanoimprinting. S2 uses nanoimprinting to imprint the structure on the first soft film onto the wafer glass to obtain the first working mold; the first working mold is then cut into a rectangle; S3 uses nanoimprinting to transfer the structure of the first working mold onto the second soft film. The first working mold has a designated area coated with adhesive. The designated area is either a grating structure area or an area that avoids the edge of the first working mold. The adhesive is applied by ultrasonic spraying. A high-frequency sound transducer can atomize the liquid adhesive, and the atomized adhesive is evenly dropped onto the first working mold by blowing air. In S3, the nanoimprinting method includes three methods: Method 1: Apply adhesive to the first working mold, place multiple first working molds in an array on the imprinting platform, and perform imprinting; Method 2: Place multiple first working dies on the imprinting platform, apply glue simultaneously, and then imprint; Method 3: Glue application step: Apply glue to the first working mold and place it on the imprinting platform; Imprinting step: Imprint the first working die; Displacement step: Change the position of the first working die on the imprinting platform; Repeat the adhesive application, imprinting, and repositioning steps in sequence until the structure of the first working mold is transferred to the second soft film in an array form. S4 uses nanoimprinting to transfer the structure of the second soft film onto the wafer glass to create the second working mold.

2. The method for manufacturing a large-size nanoimprinting die for producing optical waveguides according to claim 1, characterized in that, In step S3, the adhesive is applied by spraying. After spraying, the adhesive will self-level to form a smooth film. The first working mold coated with diluted adhesive is heated to evaporate the thinner.

3. The method for manufacturing a large-size nanoimprinting die for producing optical waveguides according to claim 1, characterized in that, Step S3 includes: The adhesive is diluted by adding a thinner, PGMEA, at a concentration of 20% by mass.

4. The method for manufacturing a large-size nanoimprinting die for producing optical waveguides according to claim 2, characterized in that, The spraying parameters are: glue flow rate 150ul / min, spray valve moving speed 20mm / s, and spraying spacing 1.5mm.

5. The method for manufacturing a large-size nanoimprinting die for producing optical waveguides according to claim 2, characterized in that, The heating parameters are: 80℃ for 1 min, after heating, the adhesive layer thickness is 1 μm, and the thickness uniformity is ±5%.

6. The method for manufacturing a large-size nanoimprinting die for producing optical waveguides according to claim 1, characterized in that, The specific steps of step S3, nanoimprinting, are as follows: the first working mold is placed on the imprinting platform, the imprinting platform fixes the first working mold in the form of vacuum adsorption, and nanoimprinting is performed.

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