Inductive structure and method of forming the same

CN117476611BActive Publication Date: 2026-09-22SEMICON MFG INT (SHANGHAI) CORP
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Patent Information

Application Number
CN202210823262.2
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2022-07-13
Publication Date
2026-09-22
Estimated Expiration
2042-07-13

AI Technical Summary

Technical Problem

[0004]然而,现有的电感结构的品质因数性能仍待进一步的改进

Benefits of technology

[0027]本发明技术方案提供的一种电感结构中,位于所述衬底上的电感线圈,所述电感线圈为平面螺旋线圈,所述电感线圈具有若干匝,所述线圈包括若干奇数线圈和若干偶数线圈,由于各所述奇数线圈位于相邻的偶数线圈之间,一个所述奇数线圈或偶数线圈与所述电感线圈下方的一个第一金属线圈于两端连接在一起,一个所述偶数线圈或奇数线圈与所述电感线圈上方的一个第二金属线圈于两端连接在一起,在电路相当于给电感线圈并联了一个等效电阻,降低了电感线圈的各线圈的电阻;同时,由于相邻的所述第一金属线圈(或第二金属线圈)分别连接不相邻的两匝电感线圈(同为奇数线圈或同为偶数线圈),相邻的所述第一金属线圈(或第二金属线圈)之间可以设置较大的间距,因此相邻的所述第一金属线圈(或第二金属线圈)之间的耦合电容较小,有利于提高电感的品质因数Q。

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Abstract

An inductance structure and a forming method thereof, wherein the structure comprises: a plurality of first metal coils arranged concentrically on a substrate and below an inductance coil, each first metal coil having a third connection end and a fourth connection end at two ends thereof, the third connection end and the fourth connection end being not connected to each other, one first metal coil and one odd coil or even coil being electrically interconnected from the first connection end and the third connection end, and from the second connection end and the fourth connection end; a plurality of second metal coils arranged concentrically above the inductance coil, each second metal coil having a fifth connection end and a sixth connection end at two ends thereof, the fifth connection end and the sixth connection end being not connected to each other, one second metal coil and one even coil or odd coil being electrically interconnected from the first connection end and the fifth connection end, and from the second connection end and the sixth connection end, and the first metal coil and the second metal coil connecting different turns of the inductance coil, thereby improving the inductance quality factor.
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Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing, and more particularly to inductor structures and methods for forming them. Background Technology

[0002] Inductors, as key components of radio frequency integrated circuits, are widely used in voltage-controlled oscillators, low-noise amplifiers, and power amplifiers.

[0003] An inductor typically consists of three parts: a coil, a substrate shielding structure, and a guard ring. The inductor's quality factor Q is the ratio of the difference between the peak magnetic energy and the peak electrical energy stored in the inductor to its losses over one cycle. The inductor's quality factor Q plays a crucial role in the performance of radio frequency circuits. Because the top layer of metal has low coupling to the substrate and low resistance, inductor coils are usually made with a thick top layer of metal to achieve a high quality factor Q.

[0004] However, the quality factor performance of existing inductor structures still needs further improvement. Summary of the Invention

[0005] The technical problem solved by this invention is to provide an inductor structure and a method for forming the same, so as to improve the performance of the inductor structure.

[0006] To solve the above-mentioned technical problems, the present invention provides an inductor structure, comprising: a substrate, the substrate including a base, a device layer on the base, and a metal interconnect layer on the device layer; an inductor coil on the substrate, the inductor coil being a planar spiral coil having a plurality of turns, each turn having a first connection end and a second connection end at both ends, the second connection end of each coil being connected to the first connection end of the adjacent coil, and starting from the outer coil of the inductor coil, coils with an odd number of turns are called odd-numbered coils, and coils with an even number of turns are called even-numbered coils; and a plurality of first metal coils concentrically arranged on the substrate and below the inductor coil, each first metal coil having a third connection end and a fourth connection end at both ends. The third connection terminal and the fourth connection terminal are not connected to each other. One of the first metal coils and one of the odd-numbered coils or the even-numbered coils are electrically interconnected from the first connection terminal and the third connection terminal, respectively, and electrically interconnected from the second connection terminal and the fourth connection terminal. A plurality of second metal coils are concentrically arranged above the inductor coil. Each of the second metal coils has a fifth connection terminal and a sixth connection terminal at both ends. The fifth connection terminal and the sixth connection terminal are not connected to each other. One of the second metal coils and one of the even-numbered coils or the odd-numbered coils are electrically interconnected from the first connection terminal and the fifth connection terminal, respectively, and electrically interconnected from the second connection terminal and the sixth connection terminal. The first metal coil and the second metal coil are connected to inductor coils with different turns.

[0007] Optionally, the plurality of first metal coils are located on the same layer; the plurality of second metal coils are located on the same layer.

[0008] Optionally, it also includes a seventh connection terminal, which is on the same layer as the inductor coil and located outside the inductor coil.

[0009] Optionally, it further includes: an eighth connection terminal, which is located outside the plurality of second metal coils and electrically interconnected with the seventh connection terminal and the second connection terminal located in the innermost coil of the inductor coil; the eighth connection terminal is on the same layer as the plurality of second metal coils.

[0010] Optionally, the seventh connection terminal is parallel to the first connection terminal of the outermost coil of the inductor.

[0011] Optionally, the odd-numbered coils may partially or completely overlap with the projection of the first metal coil on the substrate surface, or the even-numbered coils may partially or completely overlap with the projection of the first metal coil on the substrate surface; the even-numbered coils may partially or completely overlap with the projection of the second metal coil on the substrate surface, or the odd-numbered coils may partially or completely overlap with the projection of the second metal coil on the substrate surface.

[0012] Optionally, the projection shape of the inductor coil on the substrate surface includes a circle, a triangle, a quadrilateral, a pentagon, a hexagon, a heptagon, or an octagon.

[0013] Optionally, the cross-sectional shape of the inductor coil may include circular, square, rectangular, or flat.

[0014] Optionally, the substrate includes a main region and an interconnect region; the first connection terminal, the second connection terminal, the third connection terminal, the fourth connection terminal, the fifth connection terminal and the sixth connection terminal are located on the interconnect region.

[0015] Optionally, the inductor coil, the plurality of first metal coils, and the plurality of second metal coils are all parallel to each other on the substrate surface.

[0016] Accordingly, the technical solution of the present invention provides a method for forming an inductor structure, comprising: providing a substrate, the substrate including a base, a device layer located on the base, and a metal interconnect layer located on the device layer; forming a plurality of first metal coils arranged concentrically around the substrate, each of the first metal coils having a third connection terminal and a fourth connection terminal at both ends, the third connection terminal and the fourth connection terminal being non-connected to each other; forming an inductor coil on the plurality of first metal coils, the inductor coil being a planar spiral coil, the inductor coil having a plurality of turns, each turn having a first connection terminal and a second connection terminal at both ends, the second connection terminal of each coil being connected to the first connection terminal of the adjacent coil, and counting from the outermost coil of the inductor coil, coils with an odd number of turns are considered odd-numbered. A coil, wherein the number of turns is an even-numbered coil, and a first metal coil and an odd-numbered coil or an even-numbered coil are electrically interconnected from the first connection terminal and the third connection terminal, and electrically interconnected from the second connection terminal and the fourth connection terminal, respectively; a plurality of second metal coils are formed concentrically arranged above the inductor coil, each second metal coil having a fifth connection terminal and a sixth connection terminal at both ends, the fifth connection terminal and the sixth connection terminal being unconnected to each other, a second metal coil and an even-numbered coil or an odd-numbered coil are electrically interconnected from the first connection terminal and the fifth connection terminal, and electrically interconnected from the second connection terminal and the sixth connection terminal, and the first metal coil and the second metal coil are connected to inductor coils with different turns.

[0017] Optionally, the plurality of first metal coils are located on the same layer; the plurality of second metal coils are located on the same layer.

[0018] Optionally, after the formation of the plurality of first metal coils and before the formation of the plurality of second metal coils, a seventh connection terminal is formed, the seventh connection terminal being on the same layer as the inductor coil and located outside the inductor coil.

[0019] Optionally, after forming the inductor coil, an eighth connection terminal is also formed. The eighth connection terminal is located outside the plurality of second metal coils and is electrically interconnected with the seventh connection terminal and the second connection terminal located in the innermost coil of the inductor coil; the eighth connection terminal is on the same layer as the plurality of second metal coils.

[0020] Optionally, the seventh connection terminal is parallel to the first connection terminal of the outermost coil of the inductor.

[0021] Optionally, the substrate includes a main region and an interconnect region; the first connection terminal, the second connection terminal, the third connection terminal, the fourth connection terminal, the fifth connection terminal and the sixth connection terminal are located on the interconnect region.

[0022] Optionally, the inductor coil, the plurality of first metal coils, and the plurality of second metal coils are all parallel to each other on the substrate surface.

[0023] Optionally, the odd-numbered coils may partially or completely overlap with the projection of the first metal coil on the substrate surface, or the even-numbered coils may partially or completely overlap with the projection of the first metal coil on the substrate surface; the even-numbered coils may partially or completely overlap with the projection of the second metal coil on the substrate surface, or the odd-numbered coils may partially or completely overlap with the projection of the second metal coil on the substrate surface.

[0024] Optionally, the projection shape of the inductor coil on the substrate surface includes a circle, a triangle, a quadrilateral, a pentagon, a hexagon, a heptagon, or an octagon.

[0025] Optionally, the cross-sectional shape of the inductor coil may include circular, square, rectangular, or flat.

[0026] Compared with the prior art, the technical solution of the present invention has the following beneficial effects:

[0027] In the inductor structure provided by this invention, the inductor coil located on the substrate is a planar spiral coil with several turns. The coil includes several odd-numbered coils and several even-numbered coils. Since each odd-numbered coil is located between adjacent even-numbered coils, one odd-numbered coil or even-numbered coil is connected to a first metal coil below the inductor coil at both ends, and one even-numbered coil or odd-numbered coil is connected to a second metal coil above the inductor coil at both ends. In the circuit, this is equivalent to connecting an equivalent resistor in parallel to the inductor coil, reducing the resistance of each coil. At the same time, since adjacent first metal coils (or second metal coils) are respectively connected to two non-adjacent turns of inductor coils (both odd-numbered coils or both even-numbered coils), a larger spacing can be set between adjacent first metal coils (or second metal coils). Therefore, the coupling capacitance between adjacent first metal coils (or second metal coils) is small, which is beneficial to improving the quality factor Q of the inductor.

[0028] In the method for forming an inductor structure provided by the present invention, an inductor coil is formed on a plurality of first metal coils. The inductor coil is a planar spiral coil with a plurality of turns. The coil includes a plurality of odd-numbered coils and a plurality of even-numbered coils. Since each odd-numbered coil is located between adjacent even-numbered coils, one odd-numbered coil or even-numbered coil is connected to a first metal coil below the inductor coil at both ends, and one even-numbered coil or odd-numbered coil is connected to a second metal coil above the inductor coil at both ends. In the circuit, this is equivalent to connecting an equivalent resistor in parallel to the inductor coil, reducing the resistance of each coil of the inductor coil. At the same time, since adjacent first metal coils (or second metal coils) are respectively connected to two non-adjacent turns of inductor coils (both odd-numbered coils or both even-numbered coils), a larger spacing can be set between adjacent first metal coils (or second metal coils). Therefore, the coupling capacitance between adjacent first metal coils (or second metal coils) is small, which is beneficial to improving the quality factor Q of the inductor. Attached Figure Description

[0029] Figure 1 A schematic diagram of an inductor structure;

[0030] Figures 2 to 6 This is a schematic diagram of the steps in the method for forming an inductor structure according to an embodiment of the present invention. Detailed Implementation

[0031] It should be noted that the terms "surface" and "on" in this specification are used to describe the relative spatial position and are not limited to whether there is direct contact.

[0032] As described in the background section, the performance of inductor structures formed in the prior art needs improvement. An inductor structure will now be described and analyzed in conjunction with this study.

[0033] Figure 1 This is a schematic diagram of an inductor structure.

[0034] Please refer to Figure 1The inductor structure includes: a substrate (not shown); a first metal layer located on the substrate and parallel to the surface of the substrate, the first metal layer including an inductor coil 10 wound from the outside in, the inductor coil 10 including an outermost peripheral coil 101 and an innermost central coil 102, the inductor coil 10 having opposing first connection ends 10a and second connection ends 10b at its ends, the first connection end 10a being located at the end of the peripheral coil 101, the second connection end 10b being located at the end of the central coil 102, the peripheral coil 101 also having a third connection end 10c opposite to the first connection end 10a, and the first metal layer further including a fourth connection end located outside the inductor coil 10. Terminal 10d, the third connection terminal 10b is parallel to the first connection terminal 10a; a second metal layer is located on the first metal layer and parallel to the first metal layer, the second metal layer includes a single-turn coil 11, and a fifth connection terminal 10e located on the second connection terminal 10b and the third connection terminal 10c, the end of the single-turn coil 11 has a sixth connection terminal 10f and a seventh connection terminal 10g opposite to each other, the single-turn coil 11 is located on the peripheral coil 101, the sixth connection terminal 10f is electrically interconnected with the first connection terminal 10a, the seventh connection terminal 10g is electrically interconnected with the third connection terminal 10c, and the fifth connection terminal 10e is electrically interconnected with the second connection terminal 10b and the fourth connection terminal 10d.

[0035] In the above inductor structure, the single-turn coil 11 is a relatively thick top metal layer. The single-turn coil 11 and the outer coil 101 are connected to each other at both ends, that is, the outer coil 101 is connected in parallel with a relatively thick top metal layer, so as to reduce the resistance of the inductor coil 10 and thereby improve the inductor quality factor Q.

[0036] To further improve the inductance quality factor Q, one possible implementation is to connect each turn of the inductor coil 10 to a turn of the top metal layer coil. However, because the distance between the coils in the top metal layer is too small, a large parasitic capacitance will be generated between adjacent coils, which is not conducive to improving the inductance quality factor Q.

[0037] To address the aforementioned technical problem, this invention provides an inductor structure and its formation method. An inductor coil, a planar spiral coil, is located on the substrate and has several turns. The coil includes several odd-numbered coils and several even-numbered coils. Since each odd-numbered coil is located between adjacent even-numbered coils, one odd-numbered or even-numbered coil is connected at both ends to a first metal coil below the inductor coil, and one even-numbered or odd-numbered coil is connected at both ends to a second metal coil above the inductor coil. This effectively adds an equivalent resistance in parallel to the inductor coil, reducing the resistance of each coil. Simultaneously, since adjacent first metal coils (or second metal coils) are connected to two non-adjacent turns of the inductor coil (both odd-numbered or both even-numbered), a larger spacing can be provided between adjacent first metal coils (or second metal coils). Therefore, the coupling capacitance between adjacent first metal coils (or second metal coils) is smaller, which is beneficial for improving the inductor's quality factor Q.

[0038] To make the above-mentioned objectives, features and beneficial effects of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0039] Figures 2 to 6 This is a schematic diagram of the steps in the method for forming an inductor structure according to an embodiment of the present invention.

[0040] Please refer to Figure 2 A substrate 200 is provided, the substrate 200 including a base (not shown in the figure), a device layer (not shown in the figure) located on the base, and a metal interconnect layer (not shown in the figure) located on the device layer; a plurality of first metal coils 201 are formed concentrically arranged on the substrate 200, each of the first metal coils 201 having a third connection terminal C3 and a fourth connection terminal C4 at both ends, the third connection terminal C3 and the fourth connection terminal C4 being non-connected to each other.

[0041] In this embodiment, the substrate 200 includes a main region I and an interconnect region II. The interconnect region II is used to define the positions of each connection end.

[0042] In this embodiment, the third connection terminal C3 and the fourth connection terminal C4 are located on the connection area II.

[0043] In this embodiment, the plurality of first metal coils 201 are located on the same layer. In other embodiments, the plurality of first metal coils may be located on different layers to further reduce the coupling capacitance between adjacent first metal coils, but increasing the number of metal layers will correspondingly increase production costs.

[0044] In this embodiment, the plurality of first metal coils 201 are parallel to the surface of the substrate 200.

[0045] Please refer to Figure 3 and Figure 4 , Figure 4 It's a 3D image. Figure 3 yes Figure 4 A top view structural diagram shows that an inductor coil is formed on the plurality of first metal coils 201. The inductor coil is a planar spiral coil with a plurality of turns. Each coil has a first connection terminal C1 and a second connection terminal C2 at both ends. The second connection terminal C2 of each coil is connected to the first connection terminal C1 of the adjacent coil. Starting from the outer coil, coils with an odd number of turns are called odd coils 301, and coils with an even number of turns are called even coils 302. A first metal coil 201 and an odd coil 301 or an even coil 302 are electrically interconnected from the first connection terminal C1 and the third connection terminal C3, and electrically interconnected from the second connection terminal C2 and the fourth connection terminal C4.

[0046] In this embodiment, a first metal coil 201 and an even-numbered coil 302 are electrically interconnected from the first connection terminal C1 and the third connection terminal C3, respectively, and electrically interconnected from the second connection terminal C2 and the fourth connection terminal C4.

[0047] The odd-numbered coils 301 and the first metal coil 201 partially or completely overlap on the surface of the substrate 200, or the even-numbered coils 302 partially or completely overlap on the surface of the first metal coil 201. In this embodiment, the even-numbered coils 302 and the first metal coil 201 completely overlap on the surface of the substrate 200.

[0048] The cross-sectional shape of the inductor coil includes circular, square, rectangular, or flat shapes. In this embodiment, the cross-sectional shape of the inductor coil is square.

[0049] In this embodiment, only an inductor with 4 turns is shown. In other embodiments, the number of turns of the inductor can be adjusted according to actual needs.

[0050] The projection shape of the inductor coil onto the surface of the substrate 200 can be circular, triangular, quadrilateral, pentagonal, hexagonal, heptagonal, or octagonal. In this embodiment, the projection shape of the inductor coil onto the surface of the substrate 200 is octagonal. In other embodiments, the shape of the inductor coil can be adjusted according to actual needs.

[0051] In this embodiment, after the formation of the plurality of first metal coils 201 and before the formation of inductor coils, a first conductive plug 300 is formed on the third connection terminal C3, and a second conductive plug 400 is formed on the fourth connection terminal C4.

[0052] In this embodiment, specifically, the first connection terminal C1 of the even-numbered coil 302 is located on the first conductive plug 300, and the first connection terminal C1 and the third connection terminal C3 are electrically interconnected through the first conductive plug 300; the second connection terminal C2 of the even-numbered coil 302 is located on the second conductive plug 400, and the second connection terminal C2 and the fourth connection terminal C4 are electrically interconnected through the second conductive plug 400. That is, the first conductive plug 300 and the second conductive plug 400 are used to connect the plurality of first metal coils 201 to the even-numbered coils 301 of the inductor coil.

[0053] Subsequently, a plurality of second metal coils are formed concentrically arranged above the inductor coil.

[0054] In this embodiment, after the formation of the plurality of first metal coils 201 and before the formation of the plurality of second metal coils, a seventh connection terminal C7 is also formed. The seventh connection terminal C7 is on the same layer as the inductor coil and is located outside the inductor coil.

[0055] In this embodiment, the seventh connection terminal C7 is located on the connection area II.

[0056] In this embodiment, the seventh connection terminal C7 is parallel to the first connection terminal C1 of the outermost coil of the inductor. The seventh connection terminal C7 is used to connect to the subsequently formed eighth connection terminal, reducing the resistance of the eighth connection terminal. The eighth connection terminal is used to lead out the second connection terminal C2 of the innermost coil of the inductor.

[0057] In this embodiment, the inductor coil is parallel to the surface of the substrate 200.

[0058] Please refer to Figure 5 and Figure 6 , Figure 6 It is a 3D image. Figure 5 for Figure 6A top view of the structure shows that several second metal coils 401 are concentrically arranged above the inductor coil. Each second metal coil 401 has a fifth connection terminal C5 and a sixth connection terminal C6 at both ends. The fifth connection terminal C5 and the sixth connection terminal C6 are not connected to each other. One second metal coil 401 and one of the even-numbered coils 302 or the odd-numbered coils 301 are electrically interconnected from the first connection terminal C1 and the fifth connection terminal C5, and electrically interconnected from the second connection terminal C2 and the sixth connection terminal C6, respectively. The first metal coil 201 and the second metal coil 401 are connected to inductors with different turns.

[0059] Thus, one of the odd-numbered coils 301 or even-numbered coils 302 is connected to a first metal coil 201 below the inductor at both ends, and one of the even-numbered coils 302 or odd-numbered coils 301 is connected to a second metal coil 401 above the inductor at both ends. In the circuit, this is equivalent to connecting an equivalent resistor in parallel to the inductor, thereby reducing the resistance of each coil in the inductor. At the same time, since adjacent first metal coils 201 (or second metal coils 401) are respectively connected to two non-adjacent turns of inductor (both odd-numbered coils or both even-numbered coils), a larger spacing can be set between adjacent first metal coils 201 (or second metal coils 401). Therefore, the coupling capacitance between adjacent first metal coils 201 (or second metal coils 401) is small, which is beneficial to improving the quality factor Q of the inductor.

[0060] In this embodiment, a second metal coil 401 and an odd-numbered coil 301 are electrically interconnected from the first connection terminal C1 and the fifth connection terminal C5, respectively, and electrically interconnected from the second connection terminal C2 and the sixth connection terminal C6.

[0061] The even-numbered coils 302 and the second metal coil 401 partially or completely overlap on the surface of the substrate 200, or the odd-numbered coils 301 and the second metal coil 401 partially or completely overlap on the surface of the substrate 200. In this embodiment, the projections of the odd-numbered coils 301 and the second metal coil 401 on the surface of the substrate 200 completely overlap.

[0062] In this embodiment, after the inductor coil is formed, an eighth connection terminal C8 is also formed. The eighth connection terminal C8 is located outside the plurality of second metal coils 401 and is electrically interconnected with the seventh connection terminal C7 and the second connection terminal C2 located in the innermost coil of the inductor coil. The eighth connection terminal C8 is on the same layer as the plurality of second metal coils 401.

[0063] In this embodiment, after forming the inductor coil and the seventh connection terminal C7, and before forming the plurality of second metal coils 401, the method further includes: forming a third conductive plug 500 on the first connection terminal C1 of the odd-numbered coils 301; forming a fourth conductive plug 600 on the second connection terminal C2 of the odd-numbered coils 301; and forming a fifth conductive plug 700 on the second connection terminal C2 of the innermost coil of the inductor coil. The third conductive plug 500 and the fourth conductive plug 600 are used to connect the plurality of second metal coils 401 to the odd-numbered coils 301 of the inductor coil, and the fifth conductive plug 700 is used to electrically connect the second connection terminal C2 of the innermost coil of the inductor coil to the eighth connection terminal C8, so as to lead out the circuit.

[0064] In this embodiment, the fifth conductive plug 700 is also located at the seventh connection terminal C7, and the fifth conductive plug 700 is also used to electrically connect the seventh connection terminal C7 and the eighth connection terminal C8.

[0065] In this embodiment, the eighth connection terminal C8 is located on the connection area II.

[0066] In this embodiment, the plurality of second metal coils 401 are located on the same layer. In other embodiments, the plurality of second metal coils may be located on different layers to further reduce the coupling capacitance between adjacent second metal coils, but increasing the number of metal layers will correspondingly increase production costs.

[0067] In this embodiment, the first connection terminal C1, the second connection terminal C2, the third connection terminal C3, the fourth connection terminal C4, the fifth connection terminal C5, and the sixth connection terminal C6 are located on the connection area II.

[0068] In this embodiment, the plurality of second metal coils 401 are parallel to each other on the surface of the substrate 200.

[0069] Accordingly, embodiments of the present invention also provide an inductor structure formed by the above method; please refer to [further details]. Figure 5 and Figure 6The inductor structure includes: a substrate 200; an inductor coil located on the substrate 200, the inductor coil including a plurality of coils arranged concentrically on the same layer, the coil including a plurality of odd-numbered coils 301 and a plurality of even-numbered coils 302, each of the odd-numbered coils 301 being located between adjacent even-numbered coils 302, each coil having a first connection terminal C1 and a second connection terminal C2 at both ends, the second connection terminal C2 of each coil being connected to the first connection terminal C1 of the adjacent coil; and a plurality of first metal coils 201 concentrically arranged below the inductor coil, each of the first metal coils 201 having a third connection terminal C3 and a fourth connection terminal C4 at both ends, the third connection terminal C3 and the fourth connection terminal C4 being connected to the first connection terminal C4. The first metal coil 201 and the even-numbered coil 302 are electrically interconnected from the first connection terminal C1 and the third connection terminal C3, respectively, and electrically interconnected from the second connection terminal C2 and the fourth connection terminal C4, respectively. A plurality of second metal coils 401 are concentrically arranged above the inductor coil. Each second metal coil 401 has a fifth connection terminal C5 and a sixth connection terminal C6 at both ends. The fifth connection terminal C5 and the sixth connection terminal C6 are not connected to each other. A second metal coil 401 and the odd-numbered coil 301 are electrically interconnected from the first connection terminal C1 and the fifth connection terminal C5, respectively, and electrically interconnected from the second connection terminal C2 and the sixth connection terminal C6, respectively.

[0070] An even-numbered coil 302 is connected at both ends to a first metal coil 201 below the inductor, and an odd-numbered coil 301 is connected at both ends to a second metal coil 401 above the inductor. In the circuit, this is equivalent to connecting an equivalent resistor in parallel to the inductor, thus reducing the resistance of each coil in the inductor. At the same time, since adjacent first metal coils 201 (or second metal coils 401) are connected to two non-adjacent turns of the inductor, a larger spacing can be set between adjacent first metal coils 201 (or second metal coils 401). Therefore, the coupling capacitance between adjacent first metal coils 201 (or second metal coils 401) is small, which is beneficial to improving the quality factor Q of the inductor.

[0071] In this embodiment, the plurality of first metal coils 201 are located on the same layer; the plurality of second metal coils 401 are located on the same layer.

[0072] In this embodiment, the inductor structure further includes a seventh connection terminal C7, which is on the same layer as the inductor coil and located outside the inductor coil. The seventh connection terminal C7 is used to connect to an eighth connection terminal C8, thereby reducing the resistance of the eighth connection terminal C8.

[0073] In this embodiment, the inductor structure further includes an eighth connection terminal C8, which is located outside the plurality of second metal coils 401 and electrically interconnected with the seventh connection terminal C7 and the second connection terminal C2 located in the innermost coil of the inductor coil; the eighth connection terminal C8 is on the same layer as the plurality of second metal coils 401. The eighth connection terminal C8 is used to lead out the second connection terminal C2 of the innermost coil of the inductor coil.

[0074] In this embodiment, the seventh connection terminal C7 is parallel to the first connection terminal C1 of the outermost coil of the inductor.

[0075] In this embodiment, the substrate includes a main region I and an interconnect region II; the first connection terminal C1, the second connection terminal C2, the third connection terminal C3, the fourth connection terminal C4, the fifth connection terminal C5, and the sixth connection terminal C6 are located on the interconnect region II. Specifically, the seventh connection terminal C7 and the eighth connection terminal C8 are also located on the interconnect region II.

[0076] In this embodiment, the inductor coil, the plurality of first metal coils 201 and the plurality of second metal coils 401 are all parallel to the surface of the substrate 200.

[0077] The projection shape of the inductor coil onto the surface of the substrate 200 can be circular, triangular, quadrilateral, pentagonal, hexagonal, heptagonal, or octagonal. In this embodiment, the projection shape of the inductor coil onto the surface of the substrate 200 is octagonal. In other embodiments, the shape of the inductor coil can be adjusted according to actual needs.

[0078] The odd-numbered coils 301 and the first metal coil 201 partially or completely overlap on the surface of the substrate 200, or the even-numbered coils 302 partially or completely overlap on the surface of the first metal coil 201. In this embodiment, the even-numbered coils 302 and the first metal coil 201 completely overlap on the surface of the substrate 200.

[0079] The even-numbered coils 302 and the second metal coil 401 partially or completely overlap on the surface of the substrate 200, or the odd-numbered coils 301 and the second metal coil 401 partially or completely overlap on the surface of the substrate 200. In this embodiment, the projections of the odd-numbered coils 301 and the second metal coil 401 on the surface of the substrate 200 completely overlap.

[0080] The cross-sectional shape of the inductor coil includes circular, square, rectangular, or flat shapes. In this embodiment, the cross-sectional shape of the inductor coil is square.

[0081] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. An inductor structure, characterized in that, include: A substrate, the substrate comprising a base, a device layer on the base, and a metal interconnect layer on the device layer; An inductor coil located on the substrate, the inductor coil being a planar spiral coil having a number of turns, each coil having a first connection end and a second connection end at both ends, the second connection end of each coil being connected to the first connection end of the adjacent coil, starting from the outer coil of the inductor coil, coils with an odd number of turns are called odd-numbered coils, and coils with an even number of turns are called even-numbered coils; A plurality of first metal coils are concentrically arranged on the substrate and below the inductor coil. Each first metal coil has a third connection terminal and a fourth connection terminal at both ends. The third connection terminal and the fourth connection terminal are not connected to each other. One first metal coil and one of the odd-numbered coils or the even-numbered coils are electrically interconnected from the first connection terminal and the third connection terminal, respectively, and electrically interconnected from the second connection terminal and the fourth connection terminal. A plurality of second metal coils are concentrically arranged above the inductor coil. Each second metal coil has a fifth connection terminal and a sixth connection terminal at both ends. The fifth connection terminal and the sixth connection terminal are not connected to each other. One second metal coil and one of the even-numbered coils or the odd-numbered coils are electrically interconnected from the first connection terminal and the fifth connection terminal, and electrically interconnected from the second connection terminal and the sixth connection terminal, respectively. The first metal coil and the second metal coil are connected to inductor coils with different turns.

2. The inductor structure as described in claim 1, characterized in that, The plurality of first metal coils are located on the same layer; the plurality of second metal coils are located on the same layer.

3. The inductor structure as described in claim 2, characterized in that, Also includes: The seventh connection terminal is on the same layer as the inductor coil and is located outside the inductor coil.

4. The inductor structure as described in claim 3, characterized in that, Also includes: The eighth connection terminal is located outside the plurality of second metal coils and is electrically interconnected with the seventh connection terminal and the second connection terminal located in the innermost coil of the inductor coil; the eighth connection terminal is on the same layer as the plurality of second metal coils.

5. The inductor structure as described in claim 3, characterized in that, The seventh connection terminal is parallel to the first connection terminal of the outermost coil of the inductor.

6. The inductor structure as described in claim 1, characterized in that, The odd-numbered coils and the first metal coils on the substrate surface are partially or completely overlapped in projection, or the even-numbered coils and the first metal coils on the substrate surface are partially or completely overlapped in projection, or the even-numbered coils and the second metal coils on the substrate surface are partially or completely overlapped in projection, or the odd-numbered coils and the second metal coils on the substrate surface are partially or completely overlapped in projection, or the even ...

7. The inductor structure as described in claim 1, characterized in that, The projection shape of the inductor coil on the substrate surface includes a circle, a triangle, a quadrilateral, a pentagon, a hexagon, a heptagon, or an octagon.

8. The inductor structure as described in claim 1, characterized in that, The cross-sectional shape of the inductor coil includes circular, square, rectangular, or flat.

9. The inductor structure as described in claim 1, characterized in that, The substrate includes a main region and an interconnect region; the first interconnect terminal, the second interconnect terminal, the third interconnect terminal, the fourth interconnect terminal, the fifth interconnect terminal and the sixth interconnect terminal are located on the interconnect region.

10. The inductor structure as described in claim 1, characterized in that, The inductor coil, the plurality of first metal coils, and the plurality of second metal coils are all parallel to each other on the substrate surface.

11. A method for forming an inductor structure, characterized in that, include: A substrate is provided, the substrate comprising a base, a device layer on the base, and a metal interconnect layer on the device layer; A plurality of first metal coils are formed concentrically around the substrate, each of the first metal coils having a third connection end and a fourth connection end at both ends, wherein the third connection end and the fourth connection end are not connected to each other; An inductor coil is formed on the plurality of first metal coils. The inductor coil is a planar spiral coil with a plurality of turns. Each coil has a first connection end and a second connection end at both ends. The second connection end of each coil is connected to the first connection end of the adjacent coil. Starting from the outer coil, coils with an odd number of turns are called odd coils, and coils with an even number of turns are called even coils. A first metal coil and one of the odd coils or the even coils are electrically interconnected from the first connection end and the third connection end, respectively, and electrically interconnected from the second connection end and the fourth connection end. A plurality of second metal coils are formed concentrically around the inductor coil. Each second metal coil has a fifth connection terminal and a sixth connection terminal at both ends. The fifth connection terminal and the sixth connection terminal are not connected to each other. One second metal coil and one of the even-numbered coils or the odd-numbered coils are electrically interconnected from the first connection terminal and the fifth connection terminal, and electrically interconnected from the second connection terminal and the sixth connection terminal, respectively. The first metal coil and the second metal coil are connected to inductor coils with different turns.

12. The method for forming an inductor structure as described in claim 11, characterized in that, The plurality of first metal coils are located on the same layer; the plurality of second metal coils are located on the same layer.

13. The method for forming an inductor structure as described in claim 12, characterized in that, After the formation of the first metal coils and before the formation of the second metal coils, a seventh connection terminal is formed, which is on the same layer as the inductor coils and located outside the inductor coils.

14. The method for forming an inductor structure as described in claim 13, characterized in that, After the inductor coil is formed, an eighth connection terminal is also formed. The eighth connection terminal is located outside the plurality of second metal coils and is electrically interconnected with the seventh connection terminal and the second connection terminal located in the innermost coil of the inductor coil. The eighth connection terminal is on the same layer as the plurality of second metal coils.

15. The method for forming an inductor structure as described in claim 13, characterized in that, The seventh connection terminal is parallel to the first connection terminal of the outermost coil of the inductor.

16. The method for forming an inductor structure as described in claim 11, characterized in that, The substrate includes a main region and an interconnect region; the first interconnect terminal, the second interconnect terminal, the third interconnect terminal, the fourth interconnect terminal, the fifth interconnect terminal and the sixth interconnect terminal are located on the interconnect region.

17. The method for forming an inductor structure as described in claim 11, characterized in that, The inductor coil, the plurality of first metal coils, and the plurality of second metal coils are all parallel to each other on the substrate surface.

18. The method for forming an inductor structure as described in claim 11, characterized in that, The odd-numbered coils and the first metal coils on the substrate surface are partially or completely overlapped in projection, or the even-numbered coils and the first metal coils on the substrate surface are partially or completely overlapped in projection, or the even-numbered coils and the second metal coils on the substrate surface are partially or completely overlapped in projection, or the odd-numbered coils and the second metal coils on the substrate surface are partially or completely overlapped in projection, or the even ...

19. The method for forming an inductor structure as described in claim 11, characterized in that, The projection shape of the inductor coil on the substrate surface includes a circle, a triangle, a quadrilateral, a pentagon, a hexagon, a heptagon, or an octagon.

20. The method for forming an inductor structure as described in claim 11, characterized in that, The cross-sectional shape of the inductor coil includes circular, square, rectangular, or flat.

Citation Information

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