Display panel and manufacturing method thereof

Abstract

The application discloses a display panel and a manufacturing method thereof. The display panel comprises a substrate, an electrode layer, an oxidation-resistant metal layer, an organic layer and a cathode layer which are sequentially arranged on the substrate. The electrode layer comprises an auxiliary electrode, and the auxiliary electrode comprises a first auxiliary sub-electrode and a second auxiliary sub-electrode which are stacked. The edge of the second auxiliary sub-electrode protrudes laterally compared with the edge of the first auxiliary sub-electrode. The oxidation-resistant metal layer is in close contact with the side surface of the first auxiliary sub-electrode and the side of the second auxiliary sub-electrode close to the substrate. The organic layer comprises a first organic part on the second auxiliary sub-electrode and a second organic part which is arranged in a spaced manner with the first organic part and is located at the side of the auxiliary electrode. The cathode layer is located on the first organic part and the second organic part and is electrically connected with the side surface of the second auxiliary sub-electrode and the side surface of the oxidation-resistant metal layer. The application can reduce the lap joint resistance between the cathode layer and the auxiliary electrode, thereby ensuring the IR Drop improvement effect of the display panel.

Description

Technical Field

[0001] This application relates to the field of display technology, specifically to a display panel and its manufacturing method. Background Technology

[0002] In the panel display industry, AMOLED displays offer higher color saturation and lower power consumption compared to LCD displays. With the diversification of customer demands, the trend towards larger screens and higher quality, panel sizes are evolving towards larger and higher resolutions. However, as panel sizes increase, some issues that are not prominent for smaller panels are gradually becoming apparent. One significant issue is that panel brightness uniformity gradually deteriorates with increasing size.

[0003] One of the reasons for reduced panel brightness uniformity is that OLED devices are current-driven devices. According to the formula U=I*R, when the panel is lit, there are different VDD / VSS voltage drops at different positions (also known as IR Drop effect). The IR Drop effect will cause the pixel brightness to be lower, thus resulting in uneven panel brightness.

[0004] Uneven brightness caused by IR drop can usually be addressed by adding auxiliary cathode traces. For example... Figure 1 As shown, an auxiliary cathode trace 2' is added to the multiple data line traces 1', connecting the cathode layer to the auxiliary cathode trace 2'. This utilizes the principle of reduced resistance due to parallel resistors to improve the uneven panel brightness caused by IR drop. Figure 2 As shown, the auxiliary electrode 3' and the anode 4' are disposed on the same layer. The auxiliary electrode 3' is connected to the auxiliary cathode trace 2' through a via. The cathode layer 5' and the auxiliary electrode 3' are directly connected at the contact hole 6'. Ideally, the organic layer 7' of the OLED is deposited only in the pixel light-emitting area (i.e., above the anode 4') and not at the contact hole 6'. When the cathode layer 5' covers the entire surface, it will directly overlap with the auxiliary electrode 3' at the contact hole 6'.

[0005] like Figure 3 As shown, to allow the auxiliary electrode 3' to directly overlap with the cathode layer 5', the pixel definition layer 8' does not cover the auxiliary electrode 3', leaving the edges of the auxiliary electrode 3' exposed. During film formation, the organic layer 7' of the OLED will naturally break at the edges of the auxiliary electrode 3', allowing the cathode layer 5' to directly overlap with the auxiliary electrode 3' at the break points when it fully covers the surface. Figure 3 As shown, the auxiliary electrode 3' and the anode 4' are disposed in the same layer and made of the same material, both consisting of three layers of conductive material. The middle reflective layer 9' is an aluminum (Al)-containing ANCL alloy, and the top layer can be ITO or WO4. xA transparent conductive layer 10' is formed. After the auxiliary electrode 3' is etched, the intermediate reflective layer 9' will be recessed at the electrode edge. When the organic layer 7' is formed, it will break at the edge of the top transparent conductive layer 10', exposing the side of the intermediate reflective layer 9'. Finally, when the cathode layer 5' is formed, it will overlap with the side of the intermediate reflective layer 9'. However, since the edge of the intermediate reflective layer 9', which is made of an Al-containing ANCL alloy, will be oxidized after being exposed, the cathode layer 5' and the auxiliary electrode 3' will overlap through a metal oxide, resulting in a large overlap resistance between the cathode layer 5' and the auxiliary electrode 3', thus failing to achieve the purpose of improving the IR drop effect. Summary of the Invention

[0006] This application provides a display panel and its manufacturing method. By using an anti-oxidation metal layer, the cathode layer and the auxiliary electrode are effectively overlapped on the side, which avoids a large overlap resistance between the cathode layer and the auxiliary electrode, thereby ensuring the IR drop improvement effect of the display panel.

[0007] This application provides a display panel, including:

[0008] The substrate includes sub-pixel regions and auxiliary electrode regions spaced apart;

[0009] An electrode layer is located on the substrate and includes an auxiliary electrode located in the auxiliary electrode region; the auxiliary electrode includes a first auxiliary sub-electrode and a second auxiliary sub-electrode sequentially located on the substrate, wherein the edge of the second auxiliary sub-electrode protrudes laterally relative to the edge of the first auxiliary sub-electrode.

[0010] An antioxidant metal layer is attached to the side of the first auxiliary sub-electrode and to the side of the second auxiliary sub-electrode closest to the substrate; the antioxidant capacity of the antioxidant metal layer is greater than that of the first auxiliary sub-electrode.

[0011] An organic layer is located on the substrate and the electrode layer, and includes a first organic portion located on the second auxiliary sub-electrode, and a second organic portion spaced apart from the first organic portion and located on the side of the auxiliary electrode; the thickness of the organic layer is less than the thickness of the first auxiliary sub-electrode; and

[0012] A cathode layer is located on the first organic part and the second organic part, and is electrically connected to the side of the second auxiliary sub-electrode and the side of the antioxidant metal layer.

[0013] Optionally, the edge of the second auxiliary sub-electrode is aligned with the edge of the antioxidant metal layer, or the edge of the second auxiliary sub-electrode protrudes laterally relative to the edge of the antioxidant metal layer.

[0014] Optionally, the material of the antioxidant metal layer includes any one or more of titanium, silver, and molybdenum.

[0015] Optionally, the material of the first auxiliary sub-electrode includes a metal or alloy containing aluminum; the material of the second auxiliary sub-electrode includes indium tin oxide or tungsten oxide.

[0016] Optionally, the auxiliary electrode further includes a third auxiliary sub-electrode located between the substrate and the first auxiliary sub-electrode; the edge of the third auxiliary sub-electrode protrudes laterally relative to the edge of the first auxiliary sub-electrode; the antioxidant metal layer is located between the second auxiliary sub-electrode and the third auxiliary sub-electrode; the second organic portion at least covers the side of the third auxiliary sub-electrode.

[0017] Optionally, the material of the third auxiliary sub-electrode includes any one of molybdenum-titanium-nickel alloy, molybdenum-titanium alloy, and indium tin oxide.

[0018] Optionally, the electrode layer further includes an anode located in the sub-pixel region; the anode includes a first sub-anode and a second sub-anode sequentially located on the substrate; the edge of the second sub-anode protrudes laterally relative to the edge of the first sub-anode;

[0019] The first sub-anode and the first auxiliary sub-electrode are disposed in the same layer and are made of the same material; the second sub-anode and the second auxiliary sub-electrode are disposed in the same layer and are made of the same material; the second organic part also extends to the second sub-anode;

[0020] The antioxidant metal layer is also bonded to the side of the first sub-anode and to the side of the second sub-anode closest to the substrate.

[0021] Optionally, the display panel further includes a pixel defining layer located on the electrode layer, wherein the organic layer and the cathode sequentially cover the pixel defining layer; the pixel defining layer includes a main body portion and a first opening and a second opening penetrating the main body portion, wherein the first opening is correspondingly disposed to the auxiliary electrode area, and the second opening is correspondingly disposed to the sub-pixel area;

[0022] The auxiliary electrode is located within the first opening, and the distance between the main body and the side of the auxiliary electrode and the side of the antioxidant metal layer is greater than 0; the anode is located within the second opening, and the main body at least covers the side of the anode.

[0023] This application also provides a method for manufacturing a display panel, including the following steps:

[0024] A substrate is provided; wherein the substrate includes sub-pixel regions and auxiliary electrode regions disposed at intervals;

[0025] An electrode layer is formed on the substrate; wherein the electrode layer includes an auxiliary electrode located in the auxiliary electrode region, the auxiliary electrode including a first auxiliary sub-electrode and a second auxiliary sub-electrode sequentially located on the substrate, and the edge of the second auxiliary sub-electrode protrudes laterally relative to the edge of the first auxiliary sub-electrode;

[0026] An antioxidant metal layer is formed; wherein the antioxidant metal layer is attached to the side of the first auxiliary sub-electrode and to the side of the second auxiliary sub-electrode closer to the substrate, and the antioxidant capacity of the antioxidant metal layer is greater than that of the first auxiliary sub-electrode;

[0027] An organic layer is formed covering the substrate and the electrode layer; wherein the organic layer includes a first organic portion located on the second auxiliary sub-electrode, and a second organic portion spaced apart from the first organic portion and located on the side of the auxiliary electrode, the thickness of the organic layer being less than the thickness of the first auxiliary sub-electrode; and

[0028] A cathode layer is formed; wherein the cathode layer covers the first organic part and the second organic part, and is electrically connected to the side of the second auxiliary sub-electrode and the side of the antioxidant metal layer.

[0029] Optionally, forming the antioxidant metal layer includes the following steps:

[0030] An antioxidant metal film is applied to the entire surface of the substrate on which the electrode layer is formed; wherein the antioxidant metal film further covers the side surface of the first auxiliary sub-electrode; and

[0031] The antioxidant metal film is etched over its entire surface to form an antioxidant metal layer located on the side of the second auxiliary sub-electrode closer to the substrate.

[0032] The display panel and its manufacturing method provided in this application can effectively protect the side of the first auxiliary sub-electrode by forming an anti-oxidation metal layer on the side of the first auxiliary sub-electrode, preventing the side of the first auxiliary sub-electrode from being exposed and oxidized. This allows the cathode layer to directly overlap with the side of the anti-oxidation metal layer and the side of the second auxiliary sub-electrode, thus achieving an effective overlap between the cathode layer and the side of the auxiliary electrode. This avoids a large overlap resistance between the cathode layer and the auxiliary electrode, thereby ensuring the IR drop improvement effect of the display panel. Attached Figure Description

[0033] The technical solution and other beneficial effects of this application will become apparent from the following detailed description of specific embodiments in conjunction with the accompanying drawings.

[0034] Figure 1This is a schematic diagram of an exemplary pixel unit.

[0035] Figure 2 This is a schematic diagram of a cross-sectional structure of an exemplary display panel.

[0036] Figure 3 This is a schematic diagram of the cross-sectional structure of another exemplary display panel.

[0037] Figure 4 This is a schematic diagram of the structure of a display panel provided in an embodiment of this application.

[0038] Figure 5 This is a flowchart illustrating a method for manufacturing a display panel according to an embodiment of this application.

[0039] Figure 6 This is a schematic diagram of the structure of forming a substrate and an electrode layer in a method for manufacturing a display panel according to an embodiment of this application.

[0040] Figure 7 This is a schematic diagram of the structure for forming an antioxidant metal film in a method for manufacturing a display panel according to an embodiment of this application.

[0041] Figure 8 This is a schematic diagram of the structure for forming an antioxidant metal layer in a method for manufacturing a display panel according to an embodiment of this application.

[0042] Figure 9 This is a schematic diagram of the structure for forming a pixel-defining layer in a method for manufacturing a display panel according to an embodiment of this application.

[0043] Figure 10 This is a schematic diagram of the structure in which an organic layer is formed in a method for manufacturing a display panel according to an embodiment of this application. Detailed Implementation

[0044] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0045] In the description of this application, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," and "counterclockwise," etc., indicating orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include one or more of the stated features. In the description of this application, "a plurality of" means two or more, unless otherwise explicitly specified.

[0046] In this application, unless otherwise expressly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature being directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0047] The following disclosure provides many different embodiments or examples for implementing different structures of this application. To simplify the disclosure, specific examples of components and arrangements are described below. Of course, these are merely examples and are not intended to limit the scope of this application. Furthermore, reference numerals and / or letters may be repeated in different examples; such repetition is for simplification and clarity and does not in itself indicate a relationship between the various embodiments and / or arrangements discussed. In addition, various specific examples of processes and materials are provided in this application, but those skilled in the art will recognize the application of other processes and / or the use of other materials.

[0048] like Figure 3 In the display panel shown, theoretically, the auxiliary electrode 3' containing Al can effectively overlap with the cathode layer 5' that is disposed across the entire surface, thereby effectively reducing the equivalent resistance of the cathode layer 5' and improving the IR drop problem. However, in reality, the improvement in IR drop is not ideal. After further investigation... Figure 3TEM (Transmission Electron Microscopy) testing of the displayed panel revealed the following: Based on the distribution of C (representing the organic light-emitting material) and Ag and In (representing the cathode material) elements, it was found that the organic light-emitting material fractured at the edge of the auxiliary electrode, and the cathode material overlapped with the side of the auxiliary electrode. This indicates that the cathode layer and the auxiliary electrode are directly connected in the film structure. However, the O element distribution showed that the edge of the Al-containing ANCL film was oxidized, meaning that there was a metal oxide layer between the cathode layer and the ANCL film of the auxiliary electrode. The TEM results indicate that the exposed edge of the Al-containing ANCL film is oxidized, leading to a higher resistance at the direct connection between the auxiliary electrode and the cathode layer. This prevents an effective reduction in the equivalent resistance of the cathode layer and fails to improve IR drop.

[0049] It should be noted that the effective resistance mentioned in this application refers to the resistance value after the cathode layer and the auxiliary electrode are connected in parallel.

[0050] To address the aforementioned technical problems, this application provides an improved display panel and its manufacturing method, as described in the following embodiments.

[0051] like Figure 4 As shown, this application embodiment provides a display panel 1, which includes a substrate 2, an electrode layer 3, a pixel defining layer 4, an antioxidant metal layer 5, an organic layer 6, and a cathode layer 7.

[0052] Specifically, the substrate 2 includes sub-pixel regions 8 and auxiliary electrode regions 9 spaced apart.

[0053] Specifically, there are multiple sub-pixel regions 8 and multiple auxiliary electrode regions 9. An auxiliary electrode region 9 can be set every other sub-pixel region 8, or every three sub-pixel regions 8, but is not limited to this. It should be noted that this application does not limit the number or positional relationship of the auxiliary electrode regions 9 and the sub-pixel regions 8.

[0054] Specifically, the substrate 2 includes a substrate layer 10 and a driving circuit layer 11 located on the substrate layer 10; the driving circuit layer 11 is electrically connected to the electrode layer 3.

[0055] In one specific embodiment, the driving circuit layer 11 includes a light-shielding layer 12, a buffer layer 13, an active layer 14, a gate insulating layer 15, a gate layer 16, an interlayer insulating layer 17, a source / drain electrode layer 18, a passivation layer 19, and a planarization layer 20, sequentially located on the substrate layer 10. The substrate layer 10 is made of glass, but is not limited to this. The active layer 14, gate insulating layer 15, gate layer 16, interlayer insulating layer 17, and source / drain electrode layer 18 constitute at least one thin-film transistor (TFT). The light-shielding layer 12 includes a first light-shielding portion 21 corresponding to the TFT, and the material of the light-shielding layer 12 is an opaque metal material. The source / drain electrode layer 18 includes a source electrode 22 and a drain electrode 23 disposed on the same layer and spaced apart. The source electrode 22 and the drain electrode 23 are electrically connected to the two ends of the active layer 14 through vias penetrating the interlayer insulating layer 17. The drain electrode 23 is electrically connected to the first light-shielding portion 21 through vias penetrating the interlayer insulating layer 17 and the buffer layer 13.

[0056] Specifically, the driving circuit layer 11 also includes an auxiliary cathode trace 24 disposed on the same layer as the source and drain electrode layer 18, and the light-shielding layer 12 also includes a second light-shielding part 25 disposed corresponding to the auxiliary cathode trace 24; the auxiliary cathode trace 24 is electrically connected to the second light-shielding part 25 through a via penetrating the interlayer insulating layer 17 and the buffer layer 13.

[0057] It should be noted that the specific structure of the driving circuit layer 11 described above is only an example, and this application does not limit the specific structure of the driving circuit layer 11.

[0058] Specifically, electrode layer 3 is located on substrate 2, specifically on planarization layer 20 of substrate 2. Electrode layer 3 includes auxiliary electrode 26 located in auxiliary electrode region 9 and anode 27 located in sub-pixel region 8.

[0059] It is understandable that the auxiliary electrode 26 and the anode 27 are arranged in the same layer, and the film structure and materials are the same.

[0060] Specifically, the anode 27 is electrically connected to the drain 23 through a via penetrating the planarization layer 20 and the passivation layer 19, and the auxiliary electrode 26 is electrically connected to the auxiliary cathode trace 24 through a via penetrating the planarization layer 20 and the passivation layer 19.

[0061] Specifically, the electrode layer 3 is composed of at least two conductive layers stacked together; wherein at least one conductive layer is a metal or alloy containing Al element, and the conductive layer serves as a reflective layer.

[0062] In one specific embodiment, the auxiliary electrode 26 includes a first auxiliary sub-electrode 28 and a second auxiliary sub-electrode 29 sequentially located on the substrate 2, and the edge of the second auxiliary sub-electrode 29 protrudes laterally relative to the edge of the first auxiliary sub-electrode 28. It is understood that the edge of the first auxiliary sub-electrode 28 is laterally concave relative to the edge of the second auxiliary sub-electrode 29, such that the edge of the second auxiliary sub-electrode 29 is suspended.

[0063] Specifically, the material of the first auxiliary sub-electrode 28 includes a metal or alloy containing Al, such as an ANCL alloy; the material of the second auxiliary sub-electrode 29 includes indium tin oxide (ITO) or tungsten oxide (WO3). x ).

[0064] Specifically, a patterned electrode layer 3 can be formed by etching the entire electrode layer 3 using a suitable etchant. Since the etchant etches the material of the first auxiliary sub-electrode 28 relatively quickly, while it etches the material of the second auxiliary sub-electrode 29 relatively slowly, after etching, the edge of the second auxiliary sub-electrode 29 protrudes laterally from the edge of the first auxiliary sub-electrode 28 at the edge of the pattern formed.

[0065] Specifically, the anode 27 includes a first sub-anode 30 and a second sub-anode 31 located sequentially on the substrate 2, and the edge of the second sub-anode 31 protrudes laterally relative to the edge of the first sub-anode 30.

[0066] Specifically, the first sub-anode 30 and the first auxiliary sub-electrode 28 are disposed in the same layer and are made of the same material, and the second sub-anode 31 and the second auxiliary sub-electrode 29 are disposed in the same layer and are made of the same material.

[0067] In another specific embodiment, the auxiliary electrode 26 further includes a third auxiliary sub-electrode 32 located between the substrate 2 and the first auxiliary sub-electrode 28, and the edge of the third auxiliary sub-electrode 32 protrudes laterally compared to the edge of the first auxiliary sub-electrode 28. Correspondingly, the anode 27 further includes a third sub-anode 33 located between the substrate 2 and the first sub-anode 30, the edge of the third sub-anode 33 protruding laterally compared to the edge of the first sub-anode 30, and the third sub-anode 33 and the third auxiliary sub-electrode 32 are disposed in the same layer and made of the same material.

[0068] Specifically, the material of the third auxiliary sub-electrode 32 includes any one of molybdenum-titanium-nickel (MoTiNi) alloy, molybdenum-titanium (MoTi) alloy, and indium tin oxide.

[0069] Understandably, the edge of the first auxiliary sub-electrode 28 is laterally concave compared to the edges of the second auxiliary sub-electrode 29 and the third auxiliary sub-electrode 32; and the edge of the first sub-anode 30 is laterally concave compared to the edges of the second sub-anode 31 and the third sub-anode 33.

[0070] Specifically, the antioxidant metal layer 5 is attached to the side of the first auxiliary sub-electrode 28 and to the side of the second auxiliary sub-electrode 29 near the substrate 2, and the antioxidant capacity of the antioxidant metal layer 5 is greater than that of the first auxiliary sub-electrode 28.

[0071] Specifically, the material of the antioxidant metal layer 5 includes any one or more of titanium (Ti), silver (Ag), and molybdenum (Mo).

[0072] It is understandable that by providing an antioxidant metal layer 5 on the side of the first auxiliary sub-electrode 28, the side of the first auxiliary sub-electrode 28 can be effectively prevented from being exposed, thereby effectively preventing the side of the first auxiliary sub-electrode 28 from being oxidized; and the antioxidant capacity of the antioxidant metal layer 5 is greater than that of the first auxiliary sub-electrode 28, so the exposed side of the antioxidant metal layer 5 is not easily oxidized.

[0073] Specifically, the edge of the second auxiliary sub-electrode 29 is aligned with the edge of the antioxidant metal layer 5, or the edge of the second auxiliary sub-electrode 29 protrudes laterally relative to the edge of the antioxidant metal layer 5.

[0074] Specifically, when fabricating the antioxidant metal layer 5, the antioxidant metal film can be first applied to the entire surface, covering the side of the first auxiliary sub-electrode 28. Then, a metal etching process is used to etch the entire surface of the antioxidant metal film. During the etching process, since the edge of the second auxiliary sub-electrode 29 protrudes laterally from the edge of the first auxiliary sub-electrode 28, the self-alignment effect of the second auxiliary sub-electrode 29 can be used to protect the antioxidant metal film located on the side of the first auxiliary sub-electrode 28 from being etched, thereby forming the antioxidant metal layer 5 located on the side of the first auxiliary sub-electrode 28.

[0075] Understandably, during the etching process of the anti-oxidation metal film, the second auxiliary sub-electrode 29 acts as a mask layer, preventing the anti-oxidation metal film located below the second auxiliary sub-electrode 29 from being etched away.

[0076] Specifically, since the anode 27 and the auxiliary electrode 26 have the same film structure, the antioxidant metal layer 5 is also attached to the side of the first sub-anode 30 and to the side of the second sub-anode 31 near the substrate 2.

[0077] Specifically, when the auxiliary electrode 26 further includes the aforementioned third auxiliary sub-electrode 32, and the anode 27 further includes the aforementioned third sub-anode 33, the antioxidant metal layer 5 is specifically located between the second auxiliary sub-electrode 29 and the third auxiliary sub-electrode 32, and between the second sub-anode 31 and the third sub-anode 33.

[0078] Specifically, the pixel defining layer 4 is located on the electrode layer 3, and the pixel defining layer 4 includes a main body portion 34 and a first opening 35 and a second opening 36 penetrating the main body portion 34. The first opening 35 is correspondingly disposed with respect to the auxiliary electrode region 9, and the second opening 36 is correspondingly disposed with respect to the sub-pixel region 8.

[0079] Specifically, the auxiliary electrode 26 is located within the first opening 35, and the distance between the main body 34 and the side of the auxiliary electrode 26 and the side of the anti-oxidation metal layer 5 is greater than 0; the anode 27 is located within the second opening 36, and the main body 34 at least covers the side of the anode 27.

[0080] Understandably, the auxiliary electrode 26 partially covers the bottom of the first opening 35, and the anode 27 completely covers the bottom of the second opening 36.

[0081] In one specific embodiment, the area of ​​the substrate 2 in the first opening 35 not covered by the auxiliary electrode 26 is annular, that is, the distance between any side of the auxiliary electrode 26 and the main body 34 is greater than 0. It is understood that the main body 34 does not cover the edge positions of the auxiliary electrode 26.

[0082] Specifically, the organic layer 6 is located on the substrate 2, the electrode layer 3, and the pixel defining layer 4.

[0083] Specifically, the organic layer 6 includes a first organic portion 37 located on the second auxiliary sub-electrode 29, and a second organic portion 38 spaced apart from the first organic portion 37 and located on the side of the auxiliary electrode 26. The second organic portion 38 extends from the substrate 2 in the auxiliary electrode region 9 to the main body portion 34 and the second sub-anode 31 of the pixel defining layer 4.

[0084] Specifically, the thickness of the organic layer 6 is less than the thickness of the first auxiliary sub-electrode 28.

[0085] Understandably, the organic layer 6 breaks naturally at the edge of the second auxiliary sub-electrode 29, forming a first organic portion 37 and a second organic portion 38 spaced apart. Since the thickness of the organic layer 6 is less than the thickness of the first auxiliary sub-electrode 28, the break point of the organic layer 6 will expose the side of the second auxiliary sub-electrode 29 and at least part of the side of the antioxidant metal layer 5.

[0086] Specifically, when the auxiliary electrode 26 also includes the aforementioned third auxiliary sub-electrode 32, the second organic part 38 at least covers the side of the third auxiliary sub-electrode 32, but does not completely cover the side of the antioxidant metal layer 5.

[0087] Specifically, organic layer 6 can be the entire organic light-emitting functional layer or a partial organic light-emitting functional layer. When organic layer 6 is the entire organic light-emitting functional layer, organic layer 6 includes a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, and an electron injection layer stacked sequentially. When organic layer 6 is a partial organic light-emitting functional layer, organic layer 6 includes an electron transport layer and an electron injection layer stacked sequentially; in this case, the hole injection layer, hole transport layer, and light-emitting layer are only stacked within the sub-pixel region 8, specifically located between organic layer 6 and anode 27. It should be noted that this application does not limit the specific composition of organic layer 6.

[0088] Specifically, the cathode layer 7 is located on the first organic part 37 and the second organic part 38, and is electrically connected to the side of the second auxiliary sub-electrode 29 and the side of the antioxidant metal layer 5.

[0089] Understandably, the cathode layer 7 is a full-surface structure, and the cathode layer 7 directly overlaps with the side of the second auxiliary sub-electrode 29 and the side of the antioxidant metal layer 5 at the fracture position of the organic layer 6.

[0090] Specifically, the cathode layer 7 is electrically connected to the first auxiliary sub-electrode 28 by directly overlapping with the side of the antioxidant metal layer 5.

[0091] Specifically, the purpose of electrically connecting the cathode layer 7 and the auxiliary electrode 26 is to reduce the equivalent resistance of the cathode layer 7 by parallel connection, thereby improving the IR drop effect of the display panel 1. In this embodiment, an anti-oxidation metal layer 5 with stronger anti-oxidation ability is formed on the side of the first auxiliary sub-electrode 28 containing Al element, which can prevent the side of the first auxiliary sub-electrode 28 from being oxidized, so that the cathode layer 7 can effectively connect with the auxiliary electrode 26 through the anti-oxidation metal layer 5, and avoid the connection resistance between the cathode layer 7 and the auxiliary electrode 26 from increasing due to the oxidation of the side of the auxiliary electrode 26.

[0092] Therefore, in this embodiment, an anti-oxidation metal layer 5 is formed on the side of the first auxiliary sub-electrode 28, which can effectively protect the side of the first auxiliary sub-electrode 28 and prevent the side of the first auxiliary sub-electrode 28 from being exposed and oxidized. This allows the cathode layer 7 to directly overlap with the side of the anti-oxidation metal layer 5 and the side of the second auxiliary sub-electrode 29 when it is formed, so that the cathode layer 7 and the side of the auxiliary electrode 26 can be effectively overlapped. This prevents the overlap resistance between the cathode layer 7 and the auxiliary electrode 26 from increasing due to the oxidation of the side of the auxiliary electrode 26, thereby ensuring the IR drop improvement effect of the display panel 1.

[0093] like Figures 4 to 10 As shown, this application embodiment also provides a method for manufacturing the display panel 1 in the foregoing embodiment, the manufacturing method including steps S501 to S505.

[0094] S501: Provides a substrate; wherein the substrate includes sub-pixel regions and auxiliary electrode regions spaced apart.

[0095] like Figure 6 As shown in (e), the substrate 2 includes sub-pixel regions 8 and auxiliary electrode regions 9 arranged at intervals.

[0096] like Figure 7 As shown, the substrate 2 includes a substrate layer 10 and a driving circuit layer 11 located on the substrate layer 10.

[0097] Specifically, such as Figure 7 As shown, the driving circuit layer 11 includes a light-shielding layer 12, a buffer layer 13, an active layer 14, a gate insulating layer 15, a gate layer 16, an interlayer insulating layer 17, a source / drain electrode layer 18, a passivation layer 19, and a planarization layer 20, sequentially located on the substrate layer 10. The active layer 14, gate insulating layer 15, gate layer 16, interlayer insulating layer 17, and source / drain electrode layer 18 constitute at least one thin-film transistor. The light-shielding layer 12 includes a first light-shielding portion 21 corresponding to the thin-film transistor, and the material of the light-shielding layer 12 is an opaque metal material. The source / drain electrode layer 18 includes a source electrode 22 and a drain electrode 23 disposed on the same layer and spaced apart. The source electrode 22 and the drain electrode 23 are electrically connected to the two ends of the active layer 14 through vias penetrating the interlayer insulating layer 17. The drain electrode 23 is electrically connected to the first light-shielding portion 21 through vias penetrating the interlayer insulating layer 17 and the buffer layer 13.

[0098] Specifically, the driving circuit layer 11 also includes an auxiliary cathode trace 24 disposed on the same layer as the source and drain electrode layer 18, and the light-shielding layer 12 also includes a second light-shielding part 25 disposed corresponding to the auxiliary cathode trace 24; the auxiliary cathode trace 24 is electrically connected to the second light-shielding part 25 through a via penetrating the interlayer insulating layer 17 and the buffer layer 13.

[0099] Specifically, such as Figure 6 As shown, the fabrication steps of the substrate 2 include:

[0100] like Figure 6 As shown in (a), a light-shielding layer 12, a buffer layer 13, an active layer 14, a gate insulating layer 15 and a gate layer 16 are sequentially formed on a substrate layer 10; wherein, the light-shielding layer 12 includes a first light-shielding portion 21 and a second light-shielding portion 25 disposed at intervals, and the first light-shielding portion 21 is disposed corresponding to the active layer 14 and the gate layer 16.

[0101] like Figure 6As shown in (b), an interlayer insulating layer 17 is formed covering the buffer layer 13, the active layer 14, the gate insulating layer 15 and the gate layer 16, and two first vias 39 are formed that penetrate the interlayer insulating layer 17 and are respectively provided at both ends of the active layer 14, and two second vias 40 are formed that penetrate the interlayer insulating layer 17 and the buffer layer 13 and are respectively provided at the first light-shielding part 21 and the second light-shielding part 25;

[0102] like Figure 6 As shown in (c), a source electrode 22, a drain electrode 23, and an auxiliary cathode trace 24 are formed on the interlayer insulating layer 17; wherein the source electrode 22 and the drain electrode 23 are electrically connected to the two ends of the active layer 14 through two first vias 39, the drain electrode 23 is electrically connected to the first light-shielding portion 21 through one of the second vias 40, and the auxiliary cathode trace 24 is electrically connected to the second light-shielding portion 25 through the other second via 40; and

[0103] like Figure 6 As shown in (d), a passivation layer 19 and a planarization layer 20 are sequentially formed to cover the source electrode 22, the drain electrode 23 and the auxiliary cathode trace 24, and two third vias 41 are formed that penetrate the passivation layer 19 and the planarization layer 20 and are respectively provided for the drain electrode 23 and the auxiliary cathode trace 24.

[0104] S502: An electrode layer is formed on a substrate; wherein the electrode layer includes an auxiliary electrode located in an auxiliary electrode region, and the auxiliary electrode includes a first auxiliary sub-electrode and a second auxiliary sub-electrode sequentially located on the substrate, and the edge of the second auxiliary sub-electrode protrudes laterally relative to the edge of the first auxiliary sub-electrode.

[0105] like Figure 6 As shown in (e), the electrode layer 3 is formed on the planarization layer 20 of the substrate 2. The electrode layer 3 includes an auxiliary electrode 26 located in the auxiliary electrode region 9 and an anode 27 located in the sub-pixel region 8. The anode 27 is electrically connected to the drain 23 through one of the third vias 41, and the auxiliary electrode 26 is electrically connected to the auxiliary cathode trace 24 through the other third via 41.

[0106] Specifically, the auxiliary electrode 26 includes a first auxiliary sub-electrode 28 and a second auxiliary sub-electrode 29 sequentially located on the substrate 2, with the edge of the second auxiliary sub-electrode 29 laterally protruding relative to the edge of the first auxiliary sub-electrode 28. In other embodiments, the auxiliary electrode 26 further includes a third auxiliary sub-electrode 32 located between the substrate 2 and the first auxiliary sub-electrode 28, with the edge of the third auxiliary sub-electrode 32 laterally protruding relative to the edge of the first auxiliary sub-electrode 28.

[0107] Specifically, the material of the first auxiliary sub-electrode 28 includes a metal or alloy containing Al, such as an ANCL alloy; the material of the second auxiliary sub-electrode 29 includes ITO or WO4.x The material of the third auxiliary sub-electrode 32 includes any one of MoTiNi alloy, MoTi alloy and ITO.

[0108] Specifically, the anode 27 includes a first sub-anode 30 and a second sub-anode 31 sequentially located on the substrate 2, with the edge of the second sub-anode 31 laterally protruding relative to the edge of the first sub-anode 30. The first sub-anode 30 is co-layered with the first auxiliary sub-electrode 28 and made of the same material, and the second sub-anode 31 is co-layered with the second auxiliary sub-electrode 29 and made of the same material. In other embodiments, the anode 27 further includes a third sub-anode 33 located between the substrate 2 and the first sub-anode 30, with the edge of the third sub-anode 33 laterally protruding relative to the edge of the first sub-anode 30, and the third sub-anode 33 is co-layered with the third auxiliary sub-electrode 32 and made of the same material.

[0109] Specifically, a patterned electrode layer 3 can be formed by etching the entire electrode layer using a suitable etchant. Since the etchant etches the first auxiliary sub-electrode material (first sub-anode material) relatively quickly, while it etches the second auxiliary sub-electrode material (second sub-anode material) and the third auxiliary electrode material (third sub-anode material) relatively slowly, after etching, at the edges of the formed pattern, the edge of the second auxiliary sub-electrode 29 protrudes laterally compared to the edge of the first auxiliary sub-electrode 28, and the edge of the third auxiliary sub-electrode 32 protrudes laterally compared to the edge of the first auxiliary sub-electrode 28. At the same time, the edge of the second sub-anode 31 protrudes laterally compared to the edge of the first sub-anode 30, and the edge of the third sub-anode 33 protrudes laterally compared to the edge of the first sub-anode 30.

[0110] S503: Form an antioxidant metal layer; wherein the antioxidant metal layer is attached to the side of the first auxiliary sub-electrode and to the side of the second auxiliary sub-electrode near the substrate, and the antioxidant capacity of the antioxidant metal layer is greater than that of the first auxiliary sub-electrode.

[0111] Specifically, such as Figure 8 As shown, the antioxidant metal layer 5 is bonded to the side of the first auxiliary sub-electrode 28 and to the side of the second auxiliary sub-electrode 29 near the substrate 2. Simultaneously, the antioxidant metal layer 5 is also bonded to the side of the first sub-anode 30 and to the side of the second sub-anode 31 near the substrate 2. When the auxiliary electrode 26 further includes the aforementioned third auxiliary sub-electrode 32, and the anode 27 further includes the aforementioned third sub-anode 33, the antioxidant metal layer 5 is specifically located between the second auxiliary sub-electrode 29 and the third auxiliary sub-electrode 32, and also between the second sub-anode 31 and the third sub-anode 33.

[0112] Specifically, the material of the antioxidant metal layer 5 includes any one or more of Ti, Ag, and Mo.

[0113] Specifically, step S503 includes the following steps:

[0114] like Figure 7 As shown, an anti-oxidation metal film 42 covers the entire surface of the substrate 2 on which the electrode layer 3 is formed; wherein, the anti-oxidation metal film 42 also covers the side surface of the first auxiliary sub-electrode 28; and

[0115] like Figure 8 As shown, the anti-oxidation metal film 42 is etched on the entire surface using a metal etching process to form an anti-oxidation metal layer 5 located on the side of the second auxiliary sub-electrode 29 near the substrate 2 and on the side of the second sub-anode 31 near the substrate 2.

[0116] like Figure 7 and Figure 8 As shown, during the etching process, since the edge of the second auxiliary sub-electrode 29 protrudes laterally from the edge of the first auxiliary sub-electrode 28, the self-alignment effect of the second auxiliary sub-electrode 29 can be used to protect the anti-oxidation metal film 42 located on the side of the first auxiliary sub-electrode 28 from being etched, thereby forming an anti-oxidation metal layer 5 located on the side of the first auxiliary sub-electrode 28; similarly, since the edge of the second sub-anode 31 protrudes laterally from the edge of the first sub-anode 30, the self-alignment effect of the second sub-anode 31 can be used to protect the anti-oxidation metal film 42 located on the side of the first sub-anode 30 from being etched, thereby forming an anti-oxidation metal layer 5 located on the side of the first sub-anode 30.

[0117] Understandably, during the etching process of the anti-oxidation metal film 42, the second auxiliary sub-electrode 29 and the second sub-anode 31 act as a mask layer, preventing the anti-oxidation metal film 42 located below the second auxiliary sub-electrode 29 and the second sub-anode 31 from being etched away.

[0118] Specifically, the edge of the second auxiliary sub-electrode 29 is aligned with the edge of the antioxidant metal layer 5, or the edge of the second auxiliary sub-electrode 29 protrudes laterally relative to the edge of the antioxidant metal layer 5. Similarly, the edge of the second sub-anode 31 is aligned with the edge of the antioxidant metal layer 5, or the edge of the second sub-anode 31 protrudes laterally relative to the edge of the antioxidant metal layer 5.

[0119] S504: Form an organic layer covering the substrate and the electrode layer; wherein the organic layer includes a first organic portion located on the second auxiliary sub-electrode and a second organic portion disposed at a distance from the first organic portion and located on the side of the auxiliary electrode, and the thickness of the organic layer is less than the thickness of the first auxiliary sub-electrode.

[0120] Specifically, such as Figure 9As shown, a pixel-defining layer 4 needs to be formed before the organic layer is formed.

[0121] Specifically, the pixel defining layer 4 includes a main body portion 34 and a first opening 35 and a second opening 36 penetrating the main body portion 34. The first opening 35 is disposed corresponding to the auxiliary electrode region 9, and the second opening 36 is disposed corresponding to the sub-pixel region 8.

[0122] Specifically, the auxiliary electrode 26 is located within the first opening 35, and the distance between the main body 34 and the side of the auxiliary electrode 26 and the side of the anti-oxidation metal layer 5 is greater than 0; the anode 27 is located within the second opening 36, and the main body 34 at least covers the side of the anode 27.

[0123] Specifically, such as Figure 10 As shown, after the pixel limiting layer 4 is formed, the entire surface is covered with organic layer 6. Since the thickness of organic layer 6 is less than the thickness of the first auxiliary sub-electrode 28, the thickness of organic layer 6 is much less than the thickness of auxiliary electrode 26, causing organic layer 6 to break naturally at the edge of the second auxiliary sub-electrode 29, forming a first organic part 37 and a second organic part 38 that are spaced apart. The break point of organic layer 6 will expose the side of the second auxiliary sub-electrode 29 and at least part of the side of the antioxidant metal layer 5.

[0124] Specifically, the first organic part 37 covers the second auxiliary sub-electrode 29, and the second organic part 38 covers the anode 27, the main body 34 of the pixel limiting layer 4, and the planarization layer 20 of the substrate 2.

[0125] When the auxiliary electrode 26 also includes the aforementioned third auxiliary sub-electrode 32, the second organic part 38 at least covers the side of the third auxiliary sub-electrode 32, but does not completely cover the side of the antioxidant metal layer 5.

[0126] Specifically, organic layer 6 can be the entire organic light-emitting functional layer or a partial organic light-emitting functional layer. When organic layer 6 is the entire organic light-emitting functional layer, organic layer 6 includes a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, and an electron injection layer stacked sequentially. When organic layer 6 is a partial organic light-emitting functional layer, organic layer 6 includes an electron transport layer and an electron injection layer stacked sequentially; in this case, the hole injection layer, hole transport layer, and light-emitting layer are only stacked within the sub-pixel region 8, specifically located between organic layer 6 and anode 27. It should be noted that this application does not limit the specific composition of organic layer 6.

[0127] S505: Forming a cathode layer; wherein the cathode layer covers the first organic part and the second organic part, and is electrically connected to the side of the second auxiliary sub-electrode and the side of the antioxidant metal layer.

[0128] like Figure 4As shown, the cathode layer 7 is formed over the entire surface, for example by vapor deposition or sputtering. Specifically, the cathode layer 7 is located on the first organic part 37 and the second organic part 38, and is electrically connected to the side of the second auxiliary sub-electrode 29 and the side of the antioxidant metal layer 5.

[0129] Understandably, the cathode layer 7 directly overlaps with the side of the second auxiliary sub-electrode 29 and the side of the antioxidant metal layer 5 at the fracture location of the organic layer 6.

[0130] Specifically, the cathode layer 7 is electrically connected to the first auxiliary sub-electrode 28 by directly overlapping with the side of the antioxidant metal layer 5.

[0131] In this embodiment, an anti-oxidation metal layer 5 is formed on the side of the first auxiliary sub-electrode 28, which can effectively protect the side of the first auxiliary sub-electrode 28 and prevent oxidation caused by exposure of the side of the first auxiliary sub-electrode 28. This allows the cathode layer 7 to directly overlap with the side of the anti-oxidation metal layer 5 and the side of the second auxiliary sub-electrode 29 during its formation. This ensures that the cathode layer 7 and the side of the auxiliary electrode 26 are effectively overlapped, preventing the overlap resistance between the cathode layer 7 and the auxiliary electrode 26 from increasing due to oxidation of the side of the auxiliary electrode 26. This, in turn, ensures the IR drop improvement effect of the display panel 1.

[0132] In the above embodiments, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions in other embodiments.

[0133] The above provides a detailed description of a display panel and its manufacturing method according to the embodiments of this application. Specific examples have been used to illustrate the principles and implementation methods of this application. The description of the above embodiments is only for the purpose of helping to understand the technical solutions and core ideas of this application. Those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. These modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A display panel, characterized in that, include: The substrate includes sub-pixel regions and auxiliary electrode regions spaced apart; An electrode layer is located on the substrate and includes an auxiliary electrode located in the auxiliary electrode region; the auxiliary electrode includes a first auxiliary sub-electrode and a second auxiliary sub-electrode sequentially located on the substrate, wherein the edge of the second auxiliary sub-electrode protrudes laterally relative to the edge of the first auxiliary sub-electrode. An antioxidant metal layer is attached to the side of the first auxiliary sub-electrode and to the side of the second auxiliary sub-electrode closest to the substrate; the antioxidant capacity of the antioxidant metal layer is greater than that of the first auxiliary sub-electrode. An organic layer is located on the substrate and the electrode layer, and includes a first organic portion located on the second auxiliary sub-electrode, and a second organic portion disposed at a distance from the first organic portion and located on the side of the auxiliary electrode; the thickness of the organic layer is less than the thickness of the first auxiliary sub-electrode. as well as A cathode layer is located on the first organic part and the second organic part, and is electrically connected to the side of the second auxiliary sub-electrode and the side of the antioxidant metal layer.

2. The display panel according to claim 1, characterized in that, The edge of the second auxiliary sub-electrode is aligned with the edge of the antioxidant metal layer, or the edge of the second auxiliary sub-electrode protrudes laterally relative to the edge of the antioxidant metal layer.

3. The display panel according to claim 1, characterized in that, The material of the antioxidant metal layer includes any one or more of titanium, silver, and molybdenum.

4. The display panel according to claim 1, characterized in that, The material of the first auxiliary sub-electrode includes a metal or alloy containing aluminum; the material of the second auxiliary sub-electrode includes indium tin oxide or tungsten oxide.

5. The display panel according to claim 1, characterized in that, The auxiliary electrode further includes a third auxiliary sub-electrode located between the substrate and the first auxiliary sub-electrode; the edge of the third auxiliary sub-electrode protrudes laterally relative to the edge of the first auxiliary sub-electrode; the antioxidant metal layer is located between the second auxiliary sub-electrode and the third auxiliary sub-electrode; the second organic portion at least covers the side of the third auxiliary sub-electrode.

6. The display panel according to claim 5, characterized in that, The material of the third auxiliary sub-electrode includes any one of molybdenum-titanium-nickel alloy, molybdenum-titanium alloy, and indium tin oxide.

7. The display panel according to claim 1, characterized in that, The electrode layer further includes an anode located in the sub-pixel region; the anode includes a first sub-anode and a second sub-anode sequentially located on the substrate; the edge of the second sub-anode protrudes laterally relative to the edge of the first sub-anode; The first sub-anode and the first auxiliary sub-electrode are disposed in the same layer and are made of the same material; the second sub-anode and the second auxiliary sub-electrode are disposed in the same layer and are made of the same material; the second organic part also extends to the second sub-anode; The antioxidant metal layer is also bonded to the side of the first sub-anode and to the side of the second sub-anode closest to the substrate.

8. The display panel according to claim 7, characterized in that, The display panel further includes a pixel defining layer located on the electrode layer, and the organic layer and the cathode are sequentially covered on the pixel defining layer; the pixel defining layer includes a main body portion and a first opening and a second opening penetrating the main body portion, the first opening being disposed corresponding to the auxiliary electrode area, and the second opening being disposed corresponding to the sub-pixel area; The auxiliary electrode is located within the first opening, and the distance between the main body and the side of the auxiliary electrode and the side of the antioxidant metal layer is greater than 0; the anode is located within the second opening, and the main body at least covers the side of the anode.

9. A method for manufacturing a display panel, characterized in that, Includes the following steps: A substrate is provided; wherein the substrate includes sub-pixel regions and auxiliary electrode regions disposed at intervals; An electrode layer is formed on the substrate; wherein the electrode layer includes an auxiliary electrode located in the auxiliary electrode region, the auxiliary electrode including a first auxiliary sub-electrode and a second auxiliary sub-electrode sequentially located on the substrate, and the edge of the second auxiliary sub-electrode protrudes laterally relative to the edge of the first auxiliary sub-electrode; An antioxidant metal layer is formed; wherein the antioxidant metal layer is attached to the side of the first auxiliary sub-electrode and to the side of the second auxiliary sub-electrode closer to the substrate, and the antioxidant capacity of the antioxidant metal layer is greater than that of the first auxiliary sub-electrode; An organic layer is formed covering the substrate and the electrode layer; wherein the organic layer includes a first organic portion located on the second auxiliary sub-electrode, and a second organic portion spaced apart from the first organic portion and located on the substrate, the thickness of the organic layer being less than the thickness of the first auxiliary sub-electrode; and A cathode layer is formed; wherein the cathode layer covers the first organic part and the second organic part, and is electrically connected to the side of the second auxiliary sub-electrode and the side of the antioxidant metal layer.

10. The method for manufacturing a display panel according to claim 9, characterized in that, The formation of the antioxidant metal layer includes the following steps: An antioxidant metal film is applied to the entire surface of the substrate on which the electrode layer is formed; wherein the antioxidant metal film further covers the side surface of the first auxiliary sub-electrode; and The antioxidant metal film is etched over its entire surface to form an antioxidant metal layer located on the side of the second auxiliary sub-electrode closer to the substrate.

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