像素电路及其驱动方法、显示装置
By adding an oxide semiconductor anti-leakage transistor between the gate of the driving transistor and the initialization transistor and compensation transistor, the problem of gate voltage variation caused by leakage current of low-temperature polycrystalline silicon thin film transistors is solved, achieving the effect of low power consumption and low frequency display, and supporting narrow bezel design.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO LTD
- Filing Date
- 2020-07-15
- Publication Date
- 2026-07-17
AI Technical Summary
In the prior art, the leakage current of low-temperature polycrystalline silicon thin-film transistors is relatively large, which causes the gate voltage of the driving transistor to change during low-frequency display, resulting in flickering problems.
Leakage protection transistors are added between the gate of the driving transistor and the initialization transistor, and between the gate of the driving transistor and the compensation transistor. The leakage protection transistors use an active layer with oxide semiconductor to suppress potential changes by utilizing its low leakage characteristics.
It effectively reduces power consumption, improves low-frequency display performance, avoids flickering, and enables a narrow bezel design.
Smart Images

Figure CN117542318B_ABST