Photomask handling apparatus
Patent Information
- Application Number
- CN202311710905.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-12-12
- Publication Date
- 2026-10-16
- Estimated Expiration
- 2043-12-12
AI Technical Summary
但是会增加光掩模制造的流程数,延长光掩模的制造周期,提高生产成本,增本降效
[0014]与现有技术相比,本说明书实施例采用的上述至少一个技术方案能够达到的有益效果至少包括:
Smart Images

Figure CN117620633B_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of photomask technology, specifically to a photomask loading and unloading device. Background Technology
[0002] With the development of chip manufacturing technology, the requirements for photomask quality have increased. During the disassembly process of the photomask transport box lid, because the equipment is not sealed, external gas will flow into the photomask loading and unloading equipment as the lid is raised, causing airflow turbulence in the stable space inside the photomask. Impurity particles scattered inside the equipment are blown up, posing a risk of falling from the box onto the photomask, thus affecting the yield of photomask production. Currently, there are two methods to reduce the impact of impurity particles: First, increasing the frequency of cleaning photomask loading and unloading equipment can effectively reduce the risk of contamination by impurity particles, but it will reduce the frequency of equipment use, resulting in decreased production capacity and increased photomask manufacturing costs.
[0003] Secondly, adding visual inspection and cleaning processes can effectively detect and remove contaminant particles, preventing them from affecting subsequent processes. However, this increases the number of processes in photomask manufacturing, extends the manufacturing cycle, increases production costs, and leads to increased efficiency and reduced productivity.
[0004] Therefore, a new technological solution is needed. Summary of the Invention
[0005] In view of this, embodiments of this specification provide a photomask loading and unloading device that can reduce contamination of the photomask in the transfer box during the opening process.
[0006] The embodiments of this specification provide the following technical solutions: a photomask loading and unloading device, including a box body, a base provided inside the box body, the base being used to hold the photomask, and a box cover being connected to the opening of the box body via a box opener, the box opener controlling the lifting and lowering of the box cover; The lid is connected to a fan. As the lid rises, the fan blows air into the space between the lid and the box body to maintain the air pressure in the space between the lid and the box body greater than or equal to the external air pressure.
[0007] Optionally, the lid is barrel-shaped, with its bottom wall close to the base, its inner wall close to the outer wall of the box body, and a gap between the inner wall of the lid and the outer wall of the box body.
[0008] Optionally, multiple fans are provided, and the fans are located at the edge of the bottom wall of the box cover, with a gap between the inner wall of the box cover and the outer wall of the box body for blowing air.
[0009] Optionally, the air outlet of the fan is equipped with an air filter.
[0010] Optionally, the bottom wall of the box cover is provided with a groove, which is located directly above the photomask.
[0011] Optionally, the base is located at the top of the box body, close to the box lid.
[0012] Optionally, the gas blown out by the fan is nitrogen or CDA gas.
[0013] Optionally, the box opener is connected to a guide pin, the box body has a guide pin, the guide pin is disposed in the guide pin, and the guide pin guides the box lid.
[0014] Compared with the prior art, the beneficial effects that at least one technical solution adopted in the embodiments of this specification can achieve include at least: During the opening process, the fan blows air towards the box body. The air pressure in the space between the lid and the box body is greater than or equal to the external air pressure. This prevents external impurities and dust particles from entering the box body and contaminating the photomask inside the box due to the lower air pressure inside the box during the opening process, thereby improving the yield of photomask production. The fan blows air through a gap between the inner wall of the cover and the outer wall of the box, preventing the fan from blowing air directly onto the photomask and reducing the contamination of the photomask by impurities in the fan. Attached Figure Description
[0015] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0016] Figure 1 This is a schematic diagram of the closed state of the cover and the body in a photomask loading and unloading device according to this application; Figure 2 This is a schematic diagram of the open state of the cover and body in a photomask loading and unloading device according to this application.
[0017] In the diagram: 1. Box body; 2. Base; 3. Box cover; 4. Fan. Detailed Implementation
[0018] The embodiments of this application will now be described in detail with reference to the accompanying drawings.
[0019] The following specific examples illustrate the implementation of this application. Those skilled in the art can easily understand other advantages and effects of this application from the content disclosed in this specification. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. This application can also be implemented or applied through other different specific embodiments, and the details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of this application. It should be noted that, in the absence of conflict, the following embodiments and features in the embodiments can be combined with each other. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.
[0020] It should be noted that various aspects of embodiments within the scope of the appended claims are described below. It will be apparent that the aspects described herein can be embodied in a wide variety of forms, and any particular structure and / or function described herein is merely illustrative. Based on this application, those skilled in the art will understand that one aspect described herein can be implemented independently of any other aspect, and two or more of these aspects can be combined in various ways. For example, any number and aspects set forth herein can be used to implement the device and / or practice the method. Additionally, this device and / or method can be implemented using structures and / or functionalities other than one or more of the aspects set forth herein.
[0021] It should also be noted that the illustrations provided in the following embodiments are only schematic representations of the basic concept of this application. The drawings only show the components related to this application and are not drawn according to the actual number, shape and size of the components in the actual implementation. In the actual implementation, the form, quantity and proportion of each component can be arbitrarily changed, and the layout of the components may also be more complex.
[0022] Additionally, specific details are provided in the following description to facilitate a thorough understanding of the examples. However, those skilled in the art will understand that practice can be carried out without these specific details.
[0023] With the development of chip manufacturing technology, the requirements for photomask quality have increased. During the disassembly process of the photomask transport box lid, because the equipment is not sealed, external gas will flow into the photomask loading and unloading equipment as the lid is raised, causing airflow turbulence in the stable space inside the photomask. Impurity particles scattered inside the equipment are blown up, posing a risk of falling from the box onto the photomask, thus affecting the yield of photomask production. Currently, there are two methods to reduce the impact of impurity particles: First, increasing the frequency of cleaning photomask loading and unloading equipment can effectively reduce the risk of contamination by impurity particles, but it will reduce the frequency of equipment use, resulting in decreased production capacity and increased photomask manufacturing costs.
[0024] Secondly, adding visual inspection and cleaning processes can effectively detect and remove contaminant particles, preventing them from affecting subsequent processes. However, this increases the number of processes in photomask manufacturing, extends the manufacturing cycle, increases production costs, and leads to increased efficiency and reduced productivity.
[0025] Based on this, the embodiments of this specification propose a photomask loading and unloading device: such as Figure 1 As shown, the device includes a box body 1, a base 2 inside the box body 1, the base 2 being used to hold a photomask, and a box cover 3 connected to the opening of the box body 1 via a box opener (not shown in the figure), the box opener controlling the lifting and lowering of the box cover 3.
[0026] The box opener can be a telescopic rod structure or a lead screw structure, which can drive the box lid 3 to move up and down.
[0027] The lid 3 is connected to a fan 4, and the air outlet of the fan 4 faces the inner cavity of the box body 1. During the process of the lid 3 being lifted by the box opener, the fan 4 blows air into the space between the lid 3 and the box body 1 to keep the air pressure in the space between the lid 3 and the box body 1 greater than or equal to the external air pressure. This prevents external impurities and dust particles from entering the box body 1 and contaminating the photomask inside the box body 1 due to the low air pressure inside the box body 1 during the opening process, thereby improving the yield of photomask production.
[0028] In this embodiment, the lid 3 is barrel-shaped, and a portion of the box body 1 is placed inside the lid 3. The bottom wall of the lid 3 is close to the base 2, and the inner side wall of the lid 3 is close to the outer side wall of the box body 1. There is a gap between the inner side wall of the lid 3 and the outer side wall of the box body 1, thereby improving the airtightness of the inner cavity of the box body 1 and reducing the contamination of the photomask by external pollutant particles.
[0029] In this embodiment of the application, multiple fans 4 are provided, for example, four. The fans 4 are located at the edge of the bottom wall of the cover 3. There is a gap between the inner wall of the cover 3 and the outer wall of the box body 1 to blow air, so as to avoid the fans 4 blowing air directly towards the photomask and reduce the contamination of the photomask by impurity particles in the fans 4.
[0030] In this embodiment, the blower 4 is equipped with an air filter (not shown in the figure) at its air outlet. The gas blown out by the blower 4 is nitrogen or CDA gas. The air filter filters the adsorbed gas. In this embodiment, CDA gas is specifically clean compressed air.
[0031] In this embodiment, the bottom wall of the box cover 3 is provided with a groove, which is located directly above the photomask. The base 2 is located at the top of the box body 1, and the base 2 is close to the box cover 3.
[0032] In this embodiment, the box opener is connected to a guide pin (not shown in the figure), and the box body 1 is provided with a guide pin (not shown in the figure). The guide pin is set in the guide pin, and the guide pin guides the box cover 3, thereby improving the stability of the box cover 3 during the lifting and lowering process and reducing vibration.
[0033] During the opening process, the fan 4 blows air towards the box 1. The air pressure in the space between the lid 3 and the box 1 is greater than or equal to the external air pressure. This prevents external impurities and dust particles from entering the box 1 due to the low air pressure inside the box 1 during the opening process, which could contaminate the photomask inside the box 1 and thus improve the yield of photomask production. The fan 4 blows air through a gap between the inner wall of the cover 3 and the outer wall of the box 1, preventing the fan 4 from blowing air directly toward the photomask and reducing the contamination of the photomask by impurity particles in the fan 4.
[0034] In this specification, the same or similar parts between the various embodiments can be referred to mutually. Each embodiment focuses on describing the differences from other embodiments. In particular, the descriptions of the embodiments described later are relatively simple, and relevant parts can be referred to the descriptions of the foregoing embodiments.
[0035] The above description is merely a specific embodiment of this application, but the scope of protection of this application is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in this application should be included within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of the claims.
Claims
1. A photomask loading and unloading device, characterized in that: The device includes a box body, a base is provided inside the box body for holding a photomask, and a box lid is connected to the opening of the box body via a box opener, which controls the lifting and lowering of the box lid. The lid is connected to a fan. During the process of the lid rising, the fan blows air into the space between the lid and the box body to maintain the air pressure in the space between the lid and the box body greater than or equal to the external air pressure. The lid is barrel-shaped, with its bottom wall close to the base and its inner wall close to the outer wall of the box body. There is a gap between the inner wall of the lid and the outer wall of the box body. Multiple fans are provided, and the fans are located at the edge of the bottom wall of the box cover. The fans blow air through a gap between the inner wall of the box cover and the outer wall of the box body. The blower is equipped with an air filter at its air outlet; The gas blown out by the fan is nitrogen or CDA gas.
2. The photomask loading and unloading device according to claim 1, characterized in that: The bottom wall of the box cover is provided with a groove, which is located directly above the photomask.
3. The photomask loading and unloading device according to claim 2, characterized in that: The base is located at the top of the box body, close to the box lid.
4. The photomask loading and unloading device according to claim 3, characterized in that: The box opener is connected to a guide pin, the box body has a guide pin, the guide pin is set in the guide pin, and the guide pin guides the box lid.
Citation Information
Patent Citations
Photomask loading and unloading equipment
CN221363567U
Apparatus for processing substrate
US20200294832A1