Liquid source vaporization tank device, liquid source vaporization tank liquid supplement method and device

Abstract

The application discloses a liquid source evaporation tank device, a liquid supplement method and a liquid supplement device. The liquid source evaporation tank device comprises a liquid storage area for storing liquid chemical source inside; and a liquid supplement assembly located below the liquid storage area, comprising a liquid supplement pipeline and a heating device. The end of the liquid supplement pipeline is connected to the liquid storage area through a valve to simultaneously contain and transport multiple liquid supplements provided to the liquid storage area. The heating device is arranged below the liquid supplement pipeline to preheat the multiple liquid supplements in the liquid supplement pipeline. The single liquid supplement amount of the liquid storage area is less than one thousandth of the total volume of the liquid storage area. The liquid source evaporation tank device can realize high-frequency small-dose liquid supplement without limiting the supplement time, effectively preheat the liquid supplement part, improve the liquid level stability and liquid temperature stability in the liquid source evaporation tank, and is beneficial to stabilizing the working conditions of Dosing and improving the stability of the deposition process.

Description

Technical Field

[0001] This invention relates to the technical field of semiconductor processing, specifically to a liquid source evaporator device, a liquid replenishment method for a liquid source evaporator, a liquid replenishment apparatus for a liquid source evaporator, and a computer-readable storage medium. Background Technology

[0002] In semiconductor manufacturing, some thin film deposition processes, such as atomic layer deposition (ALD), have a much slower film growth rate compared to chemical vapor deposition (CVD) due to the limitations of their principles. Therefore, while ensuring that the film performance parameters meet the required specifications, the growth thickness per cycle (GPC) and its long-term stability are the key performance parameters of the thin film deposition process.

[0003] The stability of GPC is directly related to the stability of the dosing step, which in turn is closely related to the stability of the liquid level and temperature within the liquid source evaporator. Furthermore, the stability of the liquid level and temperature is greatly influenced by the replenishment operation of the liquid chemical source.

[0004] Existing liquid source replenishment operations are limited by the evaporator's structural design, generally only allowing replenishment during dry cleaning or idle periods, thus restricting the frequency of replenishment. Furthermore, a single replenishment volume typically accounts for 2% to 4% of the evaporator's total volume, affecting the stability of the liquid level within the evaporator and consequently the partial pressure of the chemical source vapor during the dosing process. In addition, the relatively large replenishment volume also impacts the temperature stability of the liquid source within the evaporator, requiring a longer time for the overall liquid temperature to stabilize, which in turn leads to a longer stabilization period before the dosing process stabilizes.

[0005] To address the aforementioned problems in the existing technology, there is an urgent need in the field for an improved liquid source evaporator technology that eliminates restrictions on the timing of liquid replenishment, enables high-frequency, small-dose liquid replenishment, and allows for effective preheating of the replenishment portion. This would improve the stability of the liquid level and temperature within the liquid source evaporator, thereby stabilizing the working conditions of Dosing and enhancing the stability of the deposition process. Summary of the Invention

[0006] The following provides a brief overview of one or more aspects to offer a basic understanding of them. This overview is not an exhaustive summary of all conceived aspects, nor is it intended to identify key or decisive elements of all aspects, nor to define the scope of any or all aspects. Its sole purpose is to present some concepts of one or more aspects in a simplified form as a prelude to the more detailed descriptions that follow.

[0007] To overcome the aforementioned deficiencies in the prior art, this invention provides a liquid source evaporator device, a liquid replenishment method for a liquid source evaporator, a liquid replenishment apparatus for a liquid source evaporator, and a computer-readable storage medium. It eliminates restrictions on the timing of liquid replenishment, enables high-frequency, low-dose replenishment, and allows for effective preheating of the replenishment portion, thereby improving the stability of the liquid level and temperature within the liquid source evaporator. This is beneficial for stabilizing the working conditions of Dosing and enhancing the stability of the deposition process.

[0008] Specifically, the liquid source evaporator device provided according to the first aspect of the present invention includes: a liquid storage area, which stores a liquid chemical source; and a replenishment assembly located below the liquid storage area, including a replenishment pipe and a heating device, wherein the end of the replenishment pipe is connected to the liquid storage area via a valve for simultaneously accommodating and transmitting multiple replenishments supplied to the liquid storage area, and the heating device is located below the replenishment pipe for preheating the multiple replenishments in the replenishment pipe, wherein the amount of a single replenishment to the liquid storage area is less than one-thousandth of the total volume of the liquid storage area.

[0009] Furthermore, in some embodiments of the present invention, the volume of the replenishment pipe is less than five per thousand of the total volume of the liquid storage area.

[0010] Furthermore, in some embodiments of the present invention, the replenishment pipe is arranged in a curved manner on the upper surface of the heating device.

[0011] Furthermore, in some embodiments of the present invention, the replenishment pipes are spirally distributed from the inside out on the upper surface of the heating device.

[0012] Furthermore, in some embodiments of the present invention, the heating device is disposed in the bottom plate of the liquid source evaporator equipment, and the thickness of the bottom plate is at least greater than 5 mm.

[0013] Furthermore, in some embodiments of the present invention, a first temperature sensor and a second temperature sensor are also included. The first temperature sensor is disposed in the liquid storage area to detect the temperature of the liquid chemical source in the liquid storage area, and the second temperature sensor is disposed in the replenishment pipe to detect the temperature of the replenishment solution in the replenishment pipe, wherein the temperature of the replenishment solution is greater than the temperature of the liquid chemical source.

[0014] Furthermore, in some embodiments of the present invention, a level sensor is also included, disposed within the liquid storage area, for detecting the level of the liquid chemical source within the liquid storage area.

[0015] Furthermore, according to the liquid source evaporator replenishment method provided by the second aspect of the present invention, the liquid source evaporator equipment provided by the first aspect of the present invention is used for replenishment. The replenishment method includes the following steps: obtaining the current liquid level of the liquid chemical source in the storage area; and in response to the current liquid level of the liquid chemical source being lower than the standard liquid level, providing preheated multiple replenishment solutions in the replenishment pipeline to the storage area in batches for multiple replenishment, wherein the single replenishment volume to the storage area is less than one-thousandth of the total volume of the storage area.

[0016] Furthermore, in some embodiments of the present invention, the liquid replenishment method further includes: issuing an alert in response to a change in the liquid level of the liquid chemical source in the storage area exceeding a liquid level change threshold, so as to accelerate the liquid replenishment process.

[0017] Furthermore, according to a third aspect of the present invention, a liquid replenishment device for a liquid source evaporator is provided. This liquid replenishment device for a liquid source evaporator includes a memory and a processor. The processor is connected to the memory and configured to implement the liquid replenishment method for a liquid source evaporator provided in the second aspect of the present invention.

[0018] Furthermore, according to a fourth aspect of the present invention, a computer-readable storage medium is provided having computer instructions stored thereon. When the computer instructions are executed by a processor, the liquid replenishment method for the liquid source evaporator described above, as provided in the second aspect of the present invention, is implemented. Attached Figure Description

[0019] The above-described features and advantages of the present invention will be better understood after reading the following detailed description of embodiments of the present disclosure in conjunction with the accompanying drawings. In the drawings, components are not necessarily drawn to scale, and components having similar related properties or features may have the same or similar reference numerals.

[0020] Figure 1 A schematic diagram of the structure of a liquid source evaporator device according to some embodiments of the present invention is shown;

[0021] Figure 2 A cross-sectional view of a liquid source evaporator apparatus according to some embodiments of the present invention is shown;

[0022] Figure 3 A bottom view of a liquid source evaporator apparatus according to some embodiments of the present invention is shown;

[0023] Figure 4 A flowchart illustrating a liquid replenishment method for a liquid source evaporator according to some embodiments of the present invention is shown; and

[0024] Figure 5 A structural block diagram of a liquid replenishment device for a liquid source evaporator provided according to some embodiments of the present invention is shown.

[0025] Figure label:

[0026] 100 Liquid Source Evaporator Equipment;

[0027] 110 Liquid Storage Area;

[0028] 120 fluid replacement kit;

[0029] 121 fluid replenishment tubing;

[0030] 122 Heating device;

[0031] 123 valve;

[0032] 130 base plate;

[0033] 140 fluid replenishment interface;

[0034] 150 carrier gas inlet;

[0035] 151 Mixed gas outlet;

[0036] 160 level gauge;

[0037] 170 diaphragm valve;

[0038] Steps S410 to S420;

[0039] Liquid replenishment device for a 500 liquid source evaporator;

[0040] 510 memory; and

[0041] 520 processor. Detailed Implementation

[0042] The following specific embodiments illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. Although the description of the present invention is presented in conjunction with preferred embodiments, this does not mean that the features of the invention are limited to these embodiments. On the contrary, the purpose of describing the invention in conjunction with embodiments is to cover other options or modifications that may be derived based on the claims of the present invention. To provide a thorough understanding of the invention, many specific details will be included in the following description. The invention may also be implemented without using these details. Furthermore, to avoid confusion or obscuring the focus of the invention, some specific details will be omitted in the description.

[0043] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0044] Furthermore, the terms "upper," "lower," "left," "right," "top," "bottom," "horizontal," and "vertical" used in the following description should be understood as the orientations shown in the relevant paragraphs and accompanying drawings. These relative terms are for illustrative purposes only and do not imply that the described apparatus must be manufactured or operated in a specific orientation, and therefore should not be construed as limiting the invention.

[0045] It is understood that although terms such as "first," "second," and "third" may be used herein to describe various components, regions, layers, and / or parts, these components, regions, layers, and / or parts should not be limited by these terms, and these terms are only used to distinguish different components, regions, layers, and / or parts. Therefore, the first components, regions, layers, and / or parts discussed below may be referred to as second components, regions, layers, and / or parts without departing from some embodiments of the present invention.

[0046] As mentioned above, existing liquid source replenishment operations are limited by the structural design of the evaporator, generally only allowing replenishment during dry cleaning or idle periods, thus restricting the frequency of replenishment. Furthermore, a single replenishment volume can account for 2% to 4% of the entire evaporator volume, affecting the stability of the liquid level within the evaporator and consequently the partial pressure of the chemical source vapor during the dosing process. In addition, the relatively large replenishment volume also impacts the temperature stability of the liquid source within the evaporator, requiring a longer time for the overall liquid temperature to stabilize, which in turn leads to a longer stabilization time for the dosing process to stabilize.

[0047] To address the aforementioned problems in the prior art, this invention provides a liquid source evaporator device, a liquid replenishment method for a liquid source evaporator, a liquid replenishment apparatus for a liquid source evaporator, and a computer-readable storage medium. It eliminates restrictions on the timing of liquid replenishment, enables high-frequency, low-dose replenishment, and allows for effective preheating of the replenishment portion, thereby improving the stability of the liquid level and temperature within the liquid source evaporator. This facilitates stable operating conditions for Dosing and enhances the stability of the deposition process.

[0048] In some non-limiting embodiments, the liquid source evaporator equipment provided in the first aspect of the present invention can be used to implement the liquid replenishment method of the liquid source evaporator provided in the second aspect of the present invention.

[0049] The working principle of the liquid source evaporator replenishment device described above will be described below with reference to some embodiments of liquid source evaporator replenishment methods. Those skilled in the art will understand that these embodiments of liquid source evaporator replenishment methods are merely non-limiting implementations provided by the present invention, intended to clearly demonstrate the main concept of the invention and provide specific solutions convenient for public implementation, rather than limiting all operating methods or functions of the liquid source evaporator device. Similarly, this liquid source evaporator device is also only one non-limiting implementation provided by the present invention and does not limit the entities implementing each step in these liquid source evaporator replenishment methods.

[0050] First, please refer to Figure 1 , Figure 1 A schematic diagram of the structure of a liquid source evaporator device provided according to some embodiments of the present invention is shown.

[0051] like Figure 1 As shown, in some embodiments of the present invention, the liquid source evaporator device 100 can be configured in a thin film deposition apparatus to provide a liquid chemical source to the reaction chamber. The liquid source evaporator device 100 may include a storage zone 110 and a replenishment assembly 120. The liquid storage zone 110 can store the liquid chemical source. The replenishment assembly 120 can be located below the storage zone 110 to replenish the liquid chemical source in the storage zone 110. The upper part of the liquid source evaporator device 100 may be provided with a carrier gas inlet 150 and a mixed gas outlet 151. Carrier gas can be introduced into the storage zone 110 through the carrier gas inlet 150 to carry the liquid chemical source in the storage zone 110, and the carrier gas carrying the liquid chemical source can be output through the mixed gas outlet 151 and finally delivered to the reaction chamber of the thin film deposition apparatus for deposition reaction, such as an ALD reaction.

[0052] Next, please refer to Figure 2 , Figure 2 A cross-sectional view of a liquid source evaporator apparatus provided according to some embodiments of the present invention is shown.

[0053] like Figure 2As shown, the replenishment assembly 120 located below the storage area 110 may include a replenishment pipe 121 and a heating device 122. The end of the replenishment pipe 121 may be connected to the storage area 110 via a valve 123 to simultaneously accommodate and transmit multiple replenishments supplied to the storage area 110. The heating device 122 may be located below the replenishment pipe 121 to preheat the multiple replenishments within the replenishment pipe 121, wherein the amount of a single replenishment to the storage area 110 is less than one-thousandth of the total volume of the storage area 110.

[0054] Specifically, in some optional embodiments, the volume of the replenishment conduit 121 can be less than five-thousandths of the total volume of the reservoir 110. For example, the total volume of the reservoir 110 can be 1600 ml, and the volume of the replenishment conduit 121 can be controlled within 2-5 ml. Furthermore, the single replenishment volume of the replenishment conduit 121 to the reservoir 110 can be in the range of 0.5-0.8 ml, that is, less than one-thousandth of the total volume of the reservoir 110, thereby realizing a single small-dose replenishment scheme.

[0055] Those skilled in the art will understand that the aforementioned solution, where the volume of the replenishment conduit 121 can be controlled within 2-5 ml and the single replenishment volume is within the range of 0.5-0.8 ml, is merely a non-limiting embodiment provided by the present invention. It is intended to clearly demonstrate the main concept of the invention and provide a specific solution that is easy for the public to implement, rather than to limit the scope of protection of the invention. Optionally, in some other embodiments, those skilled in the art can also, based on the concept of the present invention and in conjunction with the actual consumption of the chemical source, select other suitable volumes of the replenishment conduit 121 and single replenishment volumes for replenishment to achieve the same technical effect.

[0056] Please continue reading. Figure 2 The heating device 122 in the liquid replenishment assembly 120 can be installed in the base plate 130 of the liquid source evaporator equipment 100, and the base plate 130 is thickened to increase the heat capacity of the liquid storage area 110 and improve temperature stability. Optionally, the thickness of the base plate 130 is preferably at least greater than 5 mm.

[0057] Furthermore, in some preferred embodiments, the replenishment pipe 121 in the liquid source evaporator equipment 100 is preferably arranged in a curved manner on the upper surface of the heating device 122, thereby increasing the contact area between the replenishment solution in the replenishment pipe 121 and the heating device 122, which is beneficial for fully preheating the replenishment solution in the replenishment pipe 121.

[0058] Specifically, please refer to Figure 3 , Figure 3 A bottom view of a liquid source evaporator apparatus provided according to some embodiments of the present invention is shown.

[0059] like Figure 3 As shown, in some embodiments, a spiral groove can be formed on the base plate 130 of the liquid source evaporator equipment 100, and a 1 / 8-inch liquid replenishment pipe 121 with a cross-sectional area of ​​500 mm² can be welded in the groove. The liquid replenishment pipe 121 can be spirally distributed from the inside to the outside on the upper surface of the base plate 130.

[0060] Furthermore, the heating device 122 inside the base plate 130 can heat the bottom of the liquid source evaporator equipment 100 and the replenishment pipe 121 in one piece, which is conducive to the replenishment solution sent into the replenishment pipe 121 being fully preheated.

[0061] like Figure 3 As shown, one end of the replenishment pipe 121 is connected to an external replenishment port 140 to receive replenishment solution from an external source to replenish the liquid chemical source in the storage area 110. Further, in some preferred embodiments, a diaphragm valve 170 may be provided between the replenishment port 140 and the replenishment pipe 121 located on the base plate 130 of the liquid source evaporator equipment 100. The diaphragm valve 170 can be used to isolate the liquid source evaporator equipment 100 during maintenance and transportation, primarily to ensure that the storage area 110 of the liquid source evaporator equipment 100 remains in an ultra-clean state and is not contaminated. If the liquid source evaporator equipment 100 needs to be scrapped during maintenance, the diaphragm valve 170 can be manually closed to prevent residual chemical sources inside the storage area 110 from leaking into the workers' working environment and posing a potential risk to their health and safety.

[0062] Further, optionally, in some embodiments, the liquid source evaporator equipment 100 may also include a first temperature sensor and a second temperature sensor (not shown in the figures). The first temperature sensor may be located in the liquid storage area 110 to detect the temperature of the liquid chemical source in the liquid storage area 110. The second temperature sensor may be located in the replenishment pipe 121 to detect the temperature of the replenished solution in the replenishment pipe 121. By using the heating device 122 located at the bottom, the temperature of the replenished solution in the replenishment pipe 121 can be controlled to be appropriately higher than the temperature of the liquid chemical source in the upper liquid storage area 110, so that the temperature of the entire liquid source evaporator equipment 100 is kept highest at the bottom and gradually decreases towards the top.

[0063] In this embodiment, since the temperature of the replenishment solution in the preheated replenishment pipe 121 at the bottom is slightly higher than the temperature of the existing liquid chemical source in the upper liquid storage area 110, and since the replenishment amount of the liquid chemical source entering the liquid storage area 110 at one time is controlled by the valve 123, the preheated replenishment solution in the replenishment pipe 121 can be delivered to the interior of the liquid storage area 110 in multiple times, thereby ensuring that no cold liquid enters the interior of the liquid storage area 110. Furthermore, since the actual replenishment amount at one time is basically controlled to be less than one-thousandth of the existing liquid in the liquid storage area 110, when replenishing the liquid storage area 110 through the replenishment component 120, it has almost no impact on the state of the gas-liquid interface in the liquid storage area 110.

[0064] Please return Figure 1 or Figure 2 In some embodiments, the liquid source evaporator device 100 may further include a level gauge 160. The level gauge 160 can extend into the storage area 110 to detect the liquid level of the liquid chemical source in the storage area 110 in real time. When the liquid level of the liquid chemical source in the storage area 110 of the liquid source evaporator device 100 is lower than the standard level, the storage area 110 can be replenished by the replenishment component 120.

[0065] Next, please refer to Figure 4 , Figure 4 A flowchart of a liquid replenishment method for a liquid source evaporator provided according to some embodiments of the present invention is shown.

[0066] like Figure 4 As shown, in some embodiments of the present invention, the liquid replenishment method for the liquid source evaporator may include the following steps: S410: obtaining the current liquid level of the liquid chemical source in the storage area; and S420: in response to the current liquid level of the liquid chemical source being lower than the standard liquid level, providing the preheated multiple replenishment liquid in the replenishment pipeline to the storage area in batches for multiple replenishment.

[0067] Specifically, it can be combined with Figure 2 As shown, in one embodiment, it is assumed that the film thickness of an ALD process is Based on the film thickness per cycle (GPC) as... Based on this calculation, it would require 2500 cycles. If each ALD cycle consumes 0.01 ml of liquid chemical source, then the entire ALD deposition process would consume 25 ml of liquid chemical source.

[0068] Assuming the total volume of the storage zone 110 within the liquid source evaporator 100 is 1600 ml, its optimal working liquid level, or standard working liquid level, is 50% of the total volume. First, the current liquid level of the liquid chemical source within the storage zone 110 can be obtained via a level gauge 160. When the current liquid level is less than 800 ml, the storage zone 110 can be replenished with solution. Assuming the initial capacity of the liquid chemical source in the storage zone 110 is 800 ml, and based on a replenishment volume of 1 / 1000 of the total volume of the storage zone 110 each time, the single replenishment volume can be set within the range of 0.8–0.5 ml. This means that 30–50 replenishments are required throughout the entire deposition process.

[0069] Assuming each ALD cycle takes 1 second, the entire deposition time would be 2500 seconds. If small-dose replenishment is performed on the storage area 110 in 50 batches using the replenishment component 120, the preheating of the replenishing liquid will be very thorough and stable. This is because preheating for a single replenishment volume, such as 0.5 ml of cold liquid, does not require a large amount of heat, and therefore, it will not significantly disturb the temperature state of the entire liquid chemical source within the storage area 110. Therefore, this invention enables high-frequency, small-dose replenishment of the liquid source evaporator equipment 100, thereby allowing the evaporation conditions within the storage area 110 of the liquid source evaporator equipment 100 to be modulated to a very stable state. The liquid source evaporator equipment 100 and the high-frequency, small-dose replenishment method for the liquid source evaporator provided in this invention have no specific requirements regarding the timing of replenishment and can even achieve 24 / 7 replenishment.

[0070] Furthermore, in some preferred embodiments, in the liquid replenishment method of the liquid source evaporator provided by the present invention, if the liquid level change of the liquid chemical source in the storage area 110 is greater than the liquid level change threshold, an alert can be issued to speed up the liquid replenishment process.

[0071] Specifically, for the aforementioned high-frequency, low-dose replenishment process, the liquid level change should be kept within 1%, and the replenishment plan needs to be designed according to the different chemical source consumption rates of various processes. Practical experience has shown that a 5% liquid level change generally does not significantly affect process stability; therefore, the liquid level change threshold can be set at 5%. When the liquid level change in storage area 110 exceeds 5%, an alert can be issued to remind operators to replenish the liquid as soon as possible.

[0072] Although the methods described above are illustrated and depicted as a series of actions for the sake of simplicity, it should be understood and appreciated that these methods are not limited by the order of the actions, as some actions may occur in a different order and / or concurrently with other actions from the illustrations and descriptions herein or not illustrated and described herein but which may be understood by those skilled in the art, according to one or more embodiments.

[0073] This concludes the introduction of the liquid source evaporator equipment provided in the first aspect of the present invention, and the liquid replenishment method for the aforementioned liquid source evaporator provided in the second aspect of the present invention. Please refer to... Figure 5 , Figure 5 A structural block diagram of a liquid replenishment device for a liquid source evaporator provided according to some embodiments of the present invention is shown.

[0074] like Figure 5 As shown, the liquid replenishment device 500 of the liquid source evaporator can be equipped with a memory 510 and a processor 520. The memory 510 may include, but is not limited to, the computer-readable storage medium described in the fourth aspect of the present invention, on which computer instructions are stored. The processor 520 is connected to the memory 510 and is configured to execute the computer instructions stored in the memory 510 to implement the liquid replenishment method of the liquid source evaporator described in the second aspect of the present invention.

[0075] In summary, this invention provides a liquid source evaporator device, a liquid replenishment method for a liquid source evaporator, a liquid replenishment apparatus for a liquid source evaporator, and a computer-readable storage medium. It eliminates restrictions on the timing of liquid replenishment, enables high-frequency, low-dose replenishment, and allows for effective preheating of the replenishment portion. This improves the stability of the liquid level and temperature within the liquid source evaporator, facilitating stable Dosing operating conditions and enhancing the stability of the deposition process.

[0076] The prior description of this disclosure is provided to enable any person skilled in the art to make or use this disclosure. Various modifications to this disclosure will be apparent to those skilled in the art, and the general principles defined herein may be applied to other variations without departing from the spirit or scope of this disclosure. Therefore, this disclosure is not intended to be limited to the examples and designs described herein, but should be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A method for replenishing liquid in a liquid source evaporator, characterized in that, Includes the following steps: During a single ALD deposition process, the current liquid level of the liquid chemical source within the reservoir is obtained; as well as In response to the current liquid level of the liquid chemical source being lower than the standard liquid level, the preheated liquid in the replenishment pipeline is supplied to the storage area in batches through the replenishment pipeline, and the replenishment is performed multiple times. The amount of liquid replenished to the storage area at one time is less than one-thousandth of the total volume of the storage area.

2. The fluid replacement method as described in claim 1, characterized in that, Also includes: In response to a change in the liquid level of the liquid chemical source in the storage area exceeding a liquid level change threshold, an alert is issued to expedite the liquid replenishment process.

3. A liquid source evaporator device, comprising a liquid storage area, wherein a liquid chemical source is stored inside. Its features are, For performing the liquid replenishment method of the liquid source evaporator as described in claim 1 or 2, the liquid source evaporator equipment further includes: A replenishment assembly, located below the liquid storage area, includes a replenishment pipe and a heating device. The end of the replenishment pipe is connected to the liquid storage area via a valve to simultaneously accommodate and transmit multiple replenishments to the liquid storage area. The heating device is located below the replenishment pipe to preheat the multiple replenishments within the replenishment pipe. In response to the current liquid level of the liquid chemical source being lower than the standard liquid level, the preheated multiple replenishments are supplied to the liquid storage area in batches for multiple replenishments. The amount of liquid replenished to the liquid storage area at a time is less than one-thousandth of the total volume of the liquid storage area.

4. The liquid source evaporator equipment as described in claim 3, characterized in that, The volume of the replenishment pipeline is less than five-thousandths of the total volume of the storage area.

5. The liquid source evaporator equipment as described in claim 3, characterized in that, The replenishment pipe is arranged in a curved manner on the upper surface of the heating device.

6. The liquid source evaporator equipment as described in claim 5, characterized in that, The replenishment pipes are spirally distributed from the inside out on the upper surface of the heating device.

7. The liquid source evaporator equipment as described in claim 3, characterized in that, The heating device is installed in the bottom plate of the liquid source evaporator equipment, and the thickness of the bottom plate is at least greater than 5 mm.

8. The liquid source evaporator equipment as described in claim 3, characterized in that, It also includes a first temperature sensor and a second temperature sensor. The first temperature sensor is located in the liquid storage area to detect the temperature of the liquid chemical source in the liquid storage area. The second temperature sensor is located in the replenishment pipe to detect the temperature of the replenishment solution in the replenishment pipe. The temperature of the replenishment solution is greater than the temperature of the liquid chemical source.

9. The liquid source evaporator equipment as described in claim 3, characterized in that, It also includes a level gauge, which is installed in the liquid storage area to detect the level of the liquid chemical source in the liquid storage area.

10. A liquid replenishment device for a liquid source evaporator, characterized in that, include: Memory; as well as A processor, connected to the memory, and configured to implement the liquid replenishment method for a liquid source evaporator as described in claim 1 or 2.

11. A computer-readable storage medium storing computer instructions thereon, characterized in that, When the computer instructions are executed by the processor, the liquid replenishment method for the liquid source evaporator as described in claim 1 or 2 is implemented.

Images