用于多腔体沉积设备的双射频电源和多腔体沉积设备
By designing a dual-RF power supply system, the problem of thin film uniformity in multi-cavity deposition equipment is solved, achieving thin film uniformity control and improving production efficiency. It is suitable for multi-cavity deposition equipment.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- LIYANG BISEMI SEMICON EQUIP CO LTD
- Filing Date
- 2022-08-24
- Publication Date
- 2026-07-17
AI Technical Summary
In existing multi-cavity deposition equipment, deposition uniformity is difficult to control, and traditional single-frequency RF power supply adjustment is cumbersome and difficult to achieve online control, which cannot meet the process requirements of high-capacity multi-cavity plasma-enhanced chemical vapor deposition equipment.
A dual-RF power supply system is adopted, including first and second RF generators, modulation module, signal splitter, output splitter and power divider. Independent adjustment and control of each cavity are realized through detection feedback circuit to ensure film uniformity.
It enables uniformity control of thin films in multi-cavity deposition equipment, and allows for online real-time monitoring and adjustment of radio frequency power, thereby improving deposition uniformity and production efficiency.
Smart Images
Figure CN117660940B_ABST