Method, system and apparatus for controlling silicon nanoparticle patterning and dynamic manipulation

Abstract

The application discloses a control method, system and device for silicon nanoparticle patterning and dynamic manipulation, and the method comprises the following steps: obtaining a preset pattern, wherein the preset pattern comprises a static pattern, a dynamic pattern, a pattern of a single figure or a pattern of several figures; determining a scanning path program of laser according to the preset pattern, wherein the shape of the scanning path of the scanning path program is the same as that of the preset pattern; obtaining an optical potential well for capturing silicon nanoparticles and parameters of a focal plane; controlling the optical potential well to perform cyclic motion according to the scanning path in the scanning path program; controlling the power of the laser to ensure that the optical potential well stably captures the silicon nanoparticles during the motion process, and controlling the scanning frequency of the laser to enable the silicon nanoparticles to move at a preset speed, so that a pattern composed of the silicon nanoparticles is obtained. The embodiment of the application realizes nanoparticle patterning and real-time controllable dynamic manipulation, can simultaneously manipulate multiple particles, and can be widely applied to the technical field of optical manipulation.

Description

Technical Field

[0001] This invention relates to the field of optical manipulation technology, and in particular to a control method, system and device for patterning and dynamically manipulating silicon nanoparticles. Background Technology

[0002] Existing optical capture display technologies utilize particles larger than micrometers, such as those using photophoresis to capture micrometer-sized cellulose particles for display. These technologies cannot stably manipulate nanoscale particles to form even smaller patterns. Furthermore, existing technologies can only capture, illuminate, and scan single particles, and cannot reliably capture and illuminate multiple particles simultaneously. In addition, existing optical capture display technologies can only display static patterns, which is a limitation. Summary of the Invention

[0003] In view of this, the purpose of this invention is to provide a control method, system and device for patterning and dynamic manipulation of silicon nanoparticles, which realizes the patterning of nanoparticles, can simultaneously manipulate multiple particles, and achieves real-time controllable dynamic control of nanoparticle patterns.

[0004] In a first aspect, embodiments of the present invention provide a control method for patterning and dynamically manipulating silicon nanoparticles, comprising:

[0005] Obtain preset patterns, which include static patterns, dynamic patterns, patterns of a single graphic, or patterns of several graphics;

[0006] The scanning path program of the laser is determined according to the preset pattern, and the shape of the scanning path program is the same as the preset pattern.

[0007] An optical potential trap for capturing silicon nanoparticles is obtained, and the parameters of the focal plane are obtained to enable the optical potential trap to stably capture silicon nanoparticles; wherein, silicon nanoparticles include single silicon nanoparticles or silicon nanoclusters;

[0008] Control the optical potential trap to cyclically move according to the scanning path in the scanning path program;

[0009] The power of the laser is controlled to ensure that the optical potential trap stably captures silicon nanoparticles during the movement, and the scanning frequency of the laser is controlled to make the silicon nanoparticles move at a preset speed, thereby obtaining a pattern composed of silicon nanoparticles.

[0010] Optionally, the procedure for determining the laser scanning path based on a preset pattern includes:

[0011] The scanning path program of the laser is determined according to the preset pattern by the software in the scanning optical tweezers system;

[0012] or,

[0013] The program obtains the scanning path of the laser imported from the outside; the laser scanning path consists of several scanning points.

[0014] Optionally, when the preset pattern is a static pattern of several graphics, the scanning path program includes several programs, each corresponding to a static pattern of one graphic. The potential traps include several programs, and the program controls the potential traps to cyclically move according to the scanning path in the scanning path program. Specifically, this includes:

[0015] Each optical potential well is controlled to move cyclically according to the corresponding scanning path in the scanning path program.

[0016] Optionally, when the preset pattern is a dynamic pattern of a single graphic, the procedure for determining the laser scanning path based on the preset pattern specifically includes:

[0017] A set of scanning path procedures is determined based on a preset pattern, wherein the set of scanning path procedures contains patterns of a single graphic in the same or different positions.

[0018] Optionally, the optical potential trap is controlled to circulate along the scanning path in the scanning path program, specifically including:

[0019] The optical potential trap is controlled to cycle through each scanning path in a set of scanning path programs in sequence; each scanning path program lasts for a preset time.

[0020] Optionally, the laser power is controlled to ensure that the optical potential trap stably captures silicon nanoparticles during its movement, and the laser scanning frequency is controlled to make the silicon nanoparticles move at a preset speed, thereby obtaining a pattern composed of silicon nanoparticles, specifically including:

[0021] The power of the laser is controlled within a preset range, which includes 200-500mW, to ensure that the optical potential trap stably captures silicon nanoparticles during the movement.

[0022] When the optical potential trap drives the silicon nanoparticles to move cyclically along the scanning path, the scanning frequency of the laser is gradually increased. When the scanning frequency reaches the preset frequency, the silicon nanoparticles form a complete pattern, thus achieving patterning. The preset frequency is determined according to the scanning path program.

[0023] Secondly, a control system for patterning and dynamically manipulating silicon nanoparticles includes:

[0024] The first module is used to obtain preset patterns, which include static patterns, dynamic patterns, patterns of a single graphic, or patterns of several graphics.

[0025] The second module is used to determine the scanning path program of the laser according to the preset pattern. The shape of the scanning path program is the same as the preset pattern.

[0026] The third module is used to obtain the optical potential trap for capturing silicon nanoparticles and to obtain the parameters of the focal plane to enable the optical potential trap to stably capture silicon nanoparticles; wherein, silicon nanoparticles include silicon nanoparticles or silicon nanoclusters;

[0027] The fourth module is used to control the optical potential trap to move cyclically along the scanning path in the scanning path program;

[0028] The fifth module is used to control the power of the laser to ensure that the optical potential trap stably captures silicon nanoparticles during the movement, and to control the scanning frequency of the laser so that the silicon nanoparticles move at a preset speed, thereby obtaining a pattern composed of silicon nanoparticles.

[0029] Thirdly, a control device for patterning and dynamically manipulating silicon nanoparticles includes:

[0030] At least one processor;

[0031] At least one memory for storing at least one program;

[0032] When at least one program is executed by at least one processor, such that at least one processor implements the method described above.

[0033] Fourthly, a computer-readable storage medium stores a processor-executable program that, when executed by a processor, performs the method described above.

[0034] Fifthly, a control system for patterning and dynamically manipulating silicon nanoparticles includes an optical tweezers device and a computer device connected to the optical tweezers device; wherein,

[0035] Optical tweezers device for forming patterns composed of silicon nanoparticles;

[0036] Computer equipment includes:

[0037] At least one processor;

[0038] At least one memory for storing at least one program;

[0039] When at least one program is executed by at least one processor, such that at least one processor implements the method described above.

[0040] The implementation of the embodiments of the present invention has the following beneficial effects: The embodiments of the present invention provide a control method for patterning and dynamically manipulating silicon nanoparticles. By capturing and controlling the movement of silicon nanoparticles through an optical potential trap, and adjusting the laser power to ensure stable capture of the silicon nanoparticles during their movement, stable manipulation of nanoscale particle patterning is achieved. It can display patterns including several graphics, enabling simultaneous manipulation and patterning of multiple nanoparticles. Each graphic in the pattern can be different. It can display dynamic patterns, achieving pattern dynamism and solving the problem of reconstructible line differences in nanoscale images. The dynamism includes pattern translation, rotation, size change, color change, and switching between multiple static patterns. Attached Figure Description

[0041] Figure 1 This is a schematic flowchart of a control method for patterning and dynamically manipulating silicon nanoparticles provided in an embodiment of the present invention;

[0042] Figure 2 This is a scanning electron microscope image of a silicon nanoparticle and a silicon nanodimer provided in an embodiment of the present invention;

[0043] Figure 3 This is a chromaticity diagram obtained by spectral calculation of several silicon nanoparticles under a dark-field microscope, provided in an embodiment of the present invention.

[0044] Figure 4 This is a schematic diagram of a structure for realizing the patterning and dynamic manipulation of silicon nanoparticles according to an embodiment of the present invention;

[0045] Figure 5 This is a static pattern diagram of a single pattern formed from silicon nanoparticles according to an embodiment of the present invention, wherein... Figure 5 (a) Figure 5 (b) and Figure 5 (c) are all different static patterns;

[0046] Figure 6 This is a static pattern diagram of a single pattern formed from silicon nanoparticles according to another embodiment of the present invention, wherein, Figure 6 (a) Figure 6 (b) Figure 6 (c) and Figure 6 (d) are all different static solid patterns;

[0047] Figure 7 This is a static pattern diagram of a single pattern formed from silicon nanoparticles according to another embodiment of the present invention, wherein, Figure 7 (a) Figure 7 (b) Figure 7(c) and Figure 7 (d) are the characters "Cheng", "Feng", "Po" and "Lang" respectively;

[0048] Figure 8 is a schematic structural diagram for realizing patterning and dynamic manipulation of silicon nanoparticles of a static pattern including a plurality of graphics provided by an embodiment of the present invention;

[0049] Figure 9 is a schematic diagram of a static pattern comprising a plurality of graphics formed by silicon nanoparticles provided by an embodiment of the present invention;

[0050] Figure 10 is a schematic diagram of another static pattern comprising a plurality of graphics formed by silicon nanoparticles provided by an embodiment of the present invention, wherein, Figure 10 (a) is a static pattern comprising "123", Figure 10 (b) is a 3×3 colored pattern array;

[0051] Figure 11 is a schematic diagram of a dynamic pattern formed by silicon nanoparticles provided by an embodiment of the present invention, Figure 11 (a)- Figure 11 (c) is a schematic diagram of rotating the pattern;

[0052] Figure 12 is a schematic diagram of another dynamic pattern formed by silicon nanoparticles provided by an embodiment of the present invention, Figure 12 (a)- Figure 12 (c) is a schematic diagram of changing the size of the pattern;

[0053] Figure 13 is a schematic diagram of another dynamic pattern formed by silicon nanoparticles provided by an embodiment of the present invention, Figure 13 (a)- Figure 13 (b) is a schematic diagram of changing the position of the pattern;

[0054] Figure 14 is a schematic diagram of another dynamic pattern formed by silicon nanoparticles provided by an embodiment of the present invention, Figure 14 (a)- Figure 14 (d) is a schematic diagram of changing the posture of the stick figure in the pattern;

[0055] Figure 15 is a schematic diagram of another dynamic pattern formed by silicon nanoparticles provided by an embodiment of the present invention, Figure 14 (a)- Figure 14 (d) is a schematic diagram of changing the color of the pattern;

[0056] Figure 16 is a structural block diagram of a control system for silicon nanoparticle patterning and dynamic manipulation provided by an embodiment of the present invention;

[0057] Figure 17 This is a structural block diagram of a control device for patterning and dynamically manipulating silicon nanoparticles provided in an embodiment of the present invention;

[0058] Figure 18 This is a structural block diagram of another control system for patterning and dynamically manipulating silicon nanoparticles provided in an embodiment of the present invention;

[0059] Figure 19 This is a schematic diagram of the structure of an optical tweezers device for patterning and dynamically manipulating silicon nanoparticles, provided in an embodiment of the present invention.

[0060] Explanation of reference numerals in the attached figures: 1. Laser; 2. Acousto-optic deflector; 3. Beam expander; 4. Dichroic mirror; 5. Filter; 6. Objective lens; 7. Illumination source; 8. Dark-field condenser; 9. Sample chamber; 10. Electrocoupler; 11. Aqueous solution; 12. Silicon nanoparticles. Detailed Implementation

[0061] The present invention will now be described in further detail with reference to the accompanying drawings and specific embodiments. The step numbers in the following embodiments are only for ease of explanation and do not limit the order of the steps. The execution order of each step in the embodiments can be adapted according to the understanding of those skilled in the art.

[0062] In the following description, references are made to “some embodiments,” which describe a subset of all possible embodiments. However, it is understood that “some embodiments” may be the same subset or different subsets of all possible embodiments and may be combined with each other without conflict.

[0063] In the following description, the terms "first, second, third" are used merely to distinguish similar objects and do not represent a specific ordering of objects. It is understood that "first, second, third" may be interchanged in a specific order or sequence where permitted, so that the embodiments of the invention described herein can be implemented in an order other than that illustrated or described herein.

[0064] Unless otherwise defined, all technical and scientific terms used in the embodiments of this invention have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used in the embodiments of this invention is for descriptive purposes only and is not intended to limit the invention.

[0065] Before implementing the embodiments of the present invention, it is necessary to prepare a silicon nanoparticle solution sample. The preparation steps include:

[0066] S001: Take the silicon nanoparticle stock solution and add it to a centrifuge tube. Then add deionized water to the centrifuge tube until it is full.

[0067] Specifically, the amount of silicon nanoparticle stock solution and the volume of the centrifuge tube are determined according to the actual situation. This embodiment does not limit the amount of stock solution and only provides an example for reference. For example, take 3-10 μL of silicon nanoparticle stock solution and the volume of the centrifuge tube is 1.5 mL.

[0068] S002: Seal the centrifuge tube and sonicate it for the first preset time to obtain the prepared silicon nanoparticle solution.

[0069] Specifically, the first preset time is determined according to the actual situation. This embodiment does not limit it, but only provides an example for reference. For example, ultrasound for 1-5 minutes.

[0070] S003: Take a coverslip and a glass slide, rinse them carefully with clean water or wipe them with alcohol, and then dry them with a lint-free cloth to obtain clean coverslips and glass slides.

[0071] Specifically, the size of the cover glass and the glass slide is determined according to the actual situation. This embodiment does not limit the size of the cover glass and the glass slide, but only provides an example for reference. For example, the size of the cover glass is 24×50mm, the size of the glass slide is 18×18mm, and the thickness of both is 0.13-0.16mm.

[0072] Specifically, use alcohol to wipe away stains that cannot be washed away with water.

[0073] S004: Take a pre-defined volume of silicon nanoparticle solution, drop it onto a glass slide, cover it with a coverslip, and obtain a silicon nanoparticle solution sample.

[0074] Specifically, the amount of silicon nanoparticle solution dropped onto the glass slide is determined according to the actual situation. This embodiment does not limit the amount of solution and only provides an example for reference. For example, 50-100 μL of silicon nanoparticle solution is dropped onto the glass slide.

[0075] Specifically, the number of silicon nanoparticles in a silicon nanoparticle solution sample can be controlled by controlling the concentration of the original silicon nanoparticle solution in the sample.

[0076] like Figure 1 As shown, this embodiment of the invention provides a control method for patterning and dynamically manipulating silicon nanoparticles, including:

[0077] S100. Obtain a preset pattern, which may include a static pattern, a dynamic pattern, a pattern of a single graphic, or a pattern of several graphics.

[0078] Specifically, the color of the pattern is determined by the color of the silicon nanoparticles, which are determined by the user finding and capturing silicon nanoparticles of the desired color in a dark field; the user can clearly observe the silicon nanoparticles through a magnifying device.

[0079] S200. Determine the laser scanning path program according to the preset pattern. The shape of the scanning path program is the same as the preset pattern.

[0080] Specifically, when the preset pattern is a static pattern of a single graphic, the number of scanning path programs is 1.

[0081] S300. Obtain an optical potential trap for capturing silicon nanoparticles, and obtain parameters of the focal plane to enable the optical potential trap to stably capture silicon nanoparticles; wherein, silicon nanoparticles include single silicon nanoparticles or silicon nanoclusters.

[0082] Specifically, the optical potential trap is set using the software "Tweez" in a control system that patterns and dynamically manipulates silicon nanoparticles.

[0083] Specifically, the optical potential trap captures silicon nanoparticles through gradient force and scattering force. The gradient force and scattering force confine the silicon nanoparticles in the optical potential trap, and when the optical potential trap is dragged, the nanoparticles will move with the optical potential trap.

[0084] Specifically, users can adjust the focal plane using computer equipment to stably capture silicon nanoparticles in the optical potential trap.

[0085] S400 controls the optical potential trap to cyclically move according to the scanning path in the scanning path program.

[0086] S500 controls the power of the laser to ensure that the optical potential trap stably captures silicon nanoparticles during the movement, and controls the scanning frequency of the laser to make the silicon nanoparticles move at a preset speed, thereby obtaining a pattern composed of silicon nanoparticles.

[0087] Specifically, after the optical potential trap starts to cycle along the scanning path in the scanning path program, the laser power is adjusted to ensure that the optical potential trap stably captures silicon nanoparticles during the movement. At the same time, the scanning frequency of the laser is increased so that the movement speed of the silicon nanoparticles gradually increases. When the scanning frequency reaches the preset frequency, due to the persistence of vision effect, the human eye can see a complete pattern composed of silicon nanoparticles.

[0088] like Figure 2 As shown, Figure 2 (a) Figure 2 (b) and Figure 2 (c) Scanning electron microscopy images of silicon nanoparticles with diameters of 125 nm, 151 nm and 160 nm, respectively. Figure 2 (d) is a scanning electron micrograph of silicon nanodimers, which are composed of silicon nanoparticles with diameters of 134 nm and 136 nm, respectively. Figure 2 (a) Figure 2 (b) Figure 2 (c) and Figure 2 The particles in (d) are blue, green, yellow and white, respectively.

[0089] like Figure 3 As shown, Figure 3 The chromaticity diagram is calculated based on the spectra of 430 different silicon nanoparticles under a dark-field microscope. The standard used for the chromaticity diagram is CIE 1931. Figure 3 It showcases the color range of silicon nanoparticles under dark conditions, demonstrating the wide color gamut of silicon particles.

[0090] like Figure 4 As shown, in a specific embodiment, the user locates yellow silicon nanoparticles in a dark field and determines a preset pattern, which is a circle with a diameter of 5 μm. The corresponding scanning path program includes 68 scanning points. A potential trap is set to capture the silicon nanoparticles, and the corresponding scanning path program is loaded into the potential trap, causing the potential trap to cycle along the scanning path program. The laser power is adjusted to 200-500 mW to ensure that the potential trap stably captures the silicon nanoparticles and stably drives the silicon nanoparticles to move at high speed during the control process. The scanning frequency is increased from 1000 Hz to 2300 Hz, and the movement speed of the silicon nanoparticles gradually increases. As can be seen from the image, the silicon nanoparticles in the aqueous solution 11 gradually change from a moving point to an incomplete circle, and finally to a complete circle. When the scanning frequency reaches 2300 Hz, a complete yellow circle is obtained.

[0091] Specifically, the laser 1 emits a single-beam laser with a wavelength of 1064nm, which passes through the acousto-optic deflector 2 and reaches the aqueous solution 11. The potential trap formed by the laser captures the silicon nanoparticles in the aqueous solution.

[0092] Specifically, the pattern formed by silicon nanoparticles can be acquired using a color CCD (electrically coupled device), with an exposure time of 30ms and a frame rate of 29Hz.

[0093] like Figure 5 As shown, different scanning frequencies are required to form different patterns. Figure 5 The scanning frequency of the three patterns is 20-30kHz, among which, Figure 5 (a) Figure 5 (b) and Figure 5 (c) The colors are yellow, red and green, and the scale bar of the image is 3 μm.

[0094] In another specific embodiment, such as Figure 6 As shown, Figure 6 (a) Figure 6 (b) Figure 6 (c) and Figure 6 (c) are solid patterns of red, yellow, green and blue respectively, and the scale bar of the image is 3 μm; when the preset pattern is a solid pattern, the scanning path of the optical potential well is scanning layer by layer from top to bottom, then scanning layer by layer from bottom to top in the reverse direction, and cyclic scanning is performed.

[0095] In another specific embodiment, as shown in Figure 7 , Figure 7 (a), Figure 7 (b), Figure 7 (c) and Figure 7 (c) are the characters "乘", "風", "破", "浪" with different colors respectively, with a size of 5-8 μm and a scale bar of 3 μm.

[0096] Optionally, determining the laser scanning path program according to the preset pattern specifically includes:

[0097] determining the laser scanning path program according to the preset pattern through software in the scanning optical tweezers system;

[0098] or,

[0099] obtaining the laser scanning path program imported from the outside; wherein the scanning path of the laser is composed of a plurality of scanning points.

[0100] Specifically, the interval between scanning points cannot be too large, and the interval shall satisfy that when the scanning frequency of the laser reaches the preset frequency, silicon nanoparticles can form a complete pattern.

[0101] Specifically, the laser scanning path program is determined according to the preset pattern through the software "SeqGen" in the scanning optical tweezers system, wherein the software "SeqGen" can generate a simple scanning path program, such as a program whose scanning path is a regular figure.

[0102] Specifically, the laser scanning path program imported from the outside includes scanning path programs for complex figures independently written by users.

[0103] Optionally, when the preset pattern is a static pattern of a plurality of figures, there are a plurality of scanning path programs, one scanning path program corresponds to the static pattern of one figure, there are a plurality of optical potential wells, and controlling the optical potential wells to perform circular movement according to the scanning path in the scanning path program specifically includes:

[0104] sequentially controlling each optical potential well to perform circular movement according to the scanning path in the corresponding scanning path program.

[0105] As shown in Figure 8 , when the preset pattern is the static pattern of "NANO", the control method for patterning and dynamic manipulation of silicon nanoparticles comprises:

[0106] S011. Obtain the patterns of the letters “N”, “A”, “N”, and “O”;

[0107] S012. Determine the scanning path program 1, scanning path program 2, scanning path program 3 and scanning path program 4 for the letters “N”, “A”, “N” and “O” respectively according to the preset pattern.

[0108] S013. Obtain four optical potential traps for capturing silicon nanoparticles, and obtain the parameters of the focal plane to enable the optical potential traps to stably capture silicon nanoparticles; wherein, silicon nanoparticles include single silicon nanoparticles or silicon nanoclusters.

[0109] S014. Sequentially control each optical potential trap to perform a cyclical motion according to the scanning paths of scanning path program 1, scanning path program 2, scanning path program 3 and scanning path program 4. That is, after scanning from scanning path program 1 to scanning path program 4, return to scanning path program 1 for cyclic scanning.

[0110] S015. Control the laser power to ensure the optical potential trap stably captures silicon nanoparticles during its movement, and increase the laser scanning frequency to make the silicon nanoparticles move at a preset speed, thereby obtaining a structure composed of silicon nanoparticles such as... Figure 9 The "NANO" pattern shown.

[0111] Specifically, in this embodiment, one scanning path program requires a scanning frequency of 2400Hz to form a complete pattern, and four scanning path programs require a scanning frequency of 9600Hz to form the pattern "NANO".

[0112] In another embodiment, such as Figure 10 As shown in (a), the letters "123" in different colors are formed; as Figure 10 As shown in (b), a 3×3 pattern array of colors is formed, in which each pattern is different.

[0113] Optionally, when the preset pattern is a dynamic pattern of a single graphic, the procedure for determining the laser scanning path based on the preset pattern specifically includes:

[0114] A set of scanning path procedures is determined based on a preset pattern, wherein the set of scanning path procedures contains patterns of a single graphic in the same or different positions.

[0115] Optionally, when the preset pattern is a dynamic pattern of a single graphic, the potential trap is controlled to cyclically move according to the scanning path in the scanning path program, specifically including:

[0116] The optical potential trap is controlled to cycle through each scanning path in a set of scanning path programs in sequence; each scanning path program lasts for a second preset time.

[0117] In one specific embodiment, when the preset pattern is a dynamic pattern of a single graphic, the control method for patterning and dynamically manipulating silicon nanoparticles includes:

[0118] S021. Obtain the dynamic pattern of a single graphic;

[0119] S022. Determine a set of scanning path procedures based on a preset pattern, wherein the set of scanning path procedures contains patterns of a single graphic in the same or different positions.

[0120] Specifically, the patterns in a set of scan path assemblies include, but are not limited to, the following: such as Figure 11 As shown, five-pointed star patterns of the same shape and size are formed in the same position, but with different rotation angles. Figure 11 (a)- Figure 11 (c) is a schematic diagram of the pattern being rotated; such as Figure 12 As shown, heart-shaped patterns of the same shape but different sizes are formed in the same location. Figure 12 (a)- Figure 12 (c) is a schematic diagram showing the pattern changing size; such as Figure 13 As shown, the same rocket pattern is formed in different positions. Figure 13 (a)- Figure 13 (b) is a schematic diagram showing the change of the pattern's position; such as Figure 14 As shown, different stick figure action patterns are formed in the same position. Figure 14 (a)- Figure 14 (d) is a schematic diagram of the stick figure changing its movements in the pattern.

[0121] S023. Obtain an optical potential trap for capturing silicon nanoparticles, and obtain parameters of the focal plane to enable the optical potential trap to stably capture silicon nanoparticles; wherein, silicon nanoparticles include single silicon nanoparticles or silicon nanoclusters.

[0122] S024. Control the optical potential trap to cycle through each scanning path in a set of scanning path programs in sequence; wherein each scanning path program lasts for a second preset time.

[0123] Specifically, the second preset time is determined according to the actual situation. This embodiment does not limit it, but only provides an example for reference. For example, the second preset time can be 250ms.

[0124] Specifically, forming as Figure 14The stick figure animation shown has a set of scanning path programs including four different scanning path programs. The light potential trap is controlled to move in a loop according to the scanning paths of these four scanning path programs. The second preset time for looping according to each scanning path program is 250ms. After the light potential trap moves in a loop according to the scanning path of one scanning path program for 250ms, it switches to the next scanning path program until the fourth scanning path program is completed, and then returns to the first scanning path program of the set of scanning path programs to loop.

[0125] Specifically, the duration or number of loops for cyclical movement within a set of scanning path procedures is determined based on the actual situation, and is not limited in this embodiment.

[0126] S025. Control the power of the laser to ensure that the optical potential trap stably captures silicon nanoparticles during the movement, and increase the scanning frequency of the laser to make the silicon nanoparticles move at a preset speed, thereby obtaining a pattern composed of silicon nanoparticles.

[0127] In another specific embodiment, the dynamic pattern of a single graphic also includes a dynamic pattern in which the color changes, and the method for achieving the color change includes:

[0128] like Figure 15 As shown in (a), after silicon nanoparticles a form a static pattern, a light potential trap is used to capture new silicon nanoparticles b. Silicon nanoparticles a and b have a chance to form a dimer c. When dimer c forms, the spectrum of silicon nanoparticles a changes in the dark field, thus achieving a color change. Figure 15 (b)- Figure 15 As shown in (c), the pattern color changes from pinkish-purple to yellow, with a scale bar of 3 μm.

[0129] Optionally, the laser power is controlled to ensure that the optical potential trap stably captures silicon nanoparticles during its movement, and the laser scanning frequency is controlled to make the silicon nanoparticles move at a preset speed, thereby obtaining a pattern composed of silicon nanoparticles, specifically including:

[0130] The power of the laser is controlled within a preset range, which includes 200-500mW, to ensure that the optical potential trap stably captures silicon nanoparticles during the movement process.

[0131] When the optical potential trap drives the silicon nanoparticles to move cyclically along the scanning path, the scanning frequency of the control laser is gradually increased. When the scanning frequency reaches the preset frequency, the silicon nanoparticles move at the preset speed so that the silicon nanoparticles form a complete pattern, thus achieving patterning. The preset frequency is determined according to the scanning path program; the preset speed is a sufficiently high speed so that when the silicon nanoparticles move at the preset speed, combined with the persistence of vision effect, the complete pattern can be observed by the human eye.

[0132] Specifically, the laser power needs to be adjusted during each experiment to ensure that the optical potential trap can more stably capture silicon nanoparticles. The laser power is in the range of 200-500mW, and the specific value is determined according to the actual situation. This embodiment does not limit it.

[0133] The implementation of this invention provides the following beneficial effects: This invention provides a control method for patterning and dynamically manipulating silicon nanoparticles. It captures and controls the movement of silicon nanoparticles using an optical potential trap, adjusting the laser power to ensure stable capture of the silicon nanoparticles during movement. This achieves stable manipulation of nanoscale particle patterning, with a pattern size less than 10 μm and a linewidth of 0.4-1 μm. It can display patterns comprising several graphics. After capturing one silicon nanoparticle, the optical potential trap can continue to capture new silicon nanoparticles. Two silicon nanoparticles can form a dimer, enabling simultaneous manipulation and patterning of multiple nanoparticles. In a pattern comprising several graphics, each graphic can be different. It can display dynamic patterns, achieving pattern dynamism and solving the problem of reconstructible line differences in nanoscale images. The dynamism includes pattern translation, rotation, size change, color change, and switching between multiple static patterns, with the switching time for static patterns controllable within 500 ms.

[0134] like Figure 16 As shown, the present invention also provides a control system for patterning and dynamically manipulating silicon nanoparticles, comprising:

[0135] The first module is used to obtain preset patterns, which include static patterns, dynamic patterns, patterns of a single graphic, or patterns of several graphics.

[0136] The second module is used to determine the scanning path program of the laser according to the preset pattern. The shape of the scanning path program is the same as the preset pattern.

[0137] The third module is used to obtain the optical potential trap for capturing silicon nanoparticles and to obtain the parameters of the focal plane to enable the optical potential trap to stably capture silicon nanoparticles; wherein, silicon nanoparticles include single silicon nanoparticles or silicon nanoclusters;

[0138] The fourth module is used to control the optical potential trap to move cyclically along the scanning path in the scanning path program;

[0139] The fifth module is used to control the power of the laser to ensure that the optical potential trap stably captures silicon nanoparticles during the movement, and to control the scanning frequency of the laser so that the silicon nanoparticles move at a preset speed, thereby obtaining a pattern composed of silicon nanoparticles.

[0140] It is evident that the content of the above method embodiments is applicable to this system embodiment. The specific functions implemented in this system embodiment are the same as those in the above method embodiments, and the beneficial effects achieved are also the same as those achieved in the above method embodiments.

[0141] like Figure 17 As shown, the present invention also provides a control device for patterning and dynamically manipulating silicon nanoparticles, comprising:

[0142] At least one processor;

[0143] At least one memory for storing at least one program;

[0144] When at least one program is executed by at least one processor, such that at least one processor implements the method described above.

[0145] The memory, as a non-transitory computer-readable storage medium, can be used to store non-transitory software programs and non-transitory computer-executable programs. The memory may include high-speed random access memory, and may also include non-transitory memory, such as at least one disk storage device, flash memory device, or other non-transitory solid-state storage device. In some embodiments, the memory may optionally include remote memory located remotely relative to the processor, which can be connected to the processor via a network. Examples of such networks include, but are not limited to, the Internet, intranets, local area networks, mobile communication networks, and combinations thereof.

[0146] It is evident that the content of the above method embodiments is applicable to this device embodiment. The specific functions implemented in this device embodiment are the same as those in the above method embodiments, and the beneficial effects achieved are also the same as those achieved in the above method embodiments.

[0147] The present invention also provides a computer-readable storage medium storing a processor-executable program, which, when executed by a processor, is used to perform the method described above.

[0148] It is understood that all or some of the steps and systems in the methods disclosed above can be implemented as software, firmware, hardware, and suitable combinations thereof. Some or all of the physical components can be implemented as software executed by a processor, such as a central processing unit, digital signal processor, or microprocessor, or as hardware, or as an integrated circuit, such as an application-specific integrated circuit. Such software can be distributed on a computer-readable medium, which can include computer storage media (or non-transitory media) and communication media (or transient media). As is known to those skilled in the art, the term computer storage media includes volatile and non-volatile, removable and non-removable media implemented in any method or technology for storing information (such as computer-readable instructions, data structures, program modules, or other data). Computer storage media includes, but is not limited to, RAM, ROM, EEPROM, flash memory or other memory technologies, CD-ROM, digital versatile disc (DVD) or other optical disc storage, magnetic cartridges, magnetic tape, disk storage or other magnetic storage devices, or any other medium that can be used to store desired information and is accessible to a computer. Furthermore, as is known to those skilled in the art, communication media typically contain computer-readable instructions, data structures, program modules, or other data in modulated data signals such as carrier waves or other transmission mechanisms, and may include any information delivery medium.

[0149] like Figure 18 As shown, the present invention also provides a control system for patterning and dynamically manipulating silicon nanoparticles, including an optical tweezers device and a computer device connected to the optical tweezers device; wherein,

[0150] Optical tweezers, such as Figure 19 As shown, it is used to form a pattern composed of silicon nanoparticles;

[0151] Computer equipment includes:

[0152] At least one processor;

[0153] At least one memory for storing at least one program;

[0154] When at least one program is executed by at least one processor, such that at least one processor implements the method described above.

[0155] Specifically, such as Figure 19 As shown, the present invention provides a specific embodiment of an optical tweezers device, which includes a laser 1, an acousto-optic deflector 2, a beam expander 3, a dichroic mirror 4, a filter 5, an objective lens 6, an illumination source 7, a dark-field condenser 8, a sample chamber 9, and an electro-coupled device (CCD) 10; wherein the objective lens 6 is inverted.

[0156] Specifically, the computer device can be of different types of electronic devices, including but not limited to desktop computers, laptops and other terminals.

[0157] It is evident that the content of the above method embodiments is applicable to this system embodiment. The specific functions implemented in this system embodiment are the same as those in the above method embodiments, and the beneficial effects achieved are also the same as those achieved in the above method embodiments.

[0158] The above is a detailed description of the preferred embodiments of the present invention. However, the present invention is not limited to the embodiments described. Those skilled in the art can make various equivalent modifications or substitutions without departing from the spirit of the present invention. All such equivalent modifications or substitutions are included within the scope defined by the claims of this application.

Claims

1. A method for controlling the patterning and dynamic manipulation of silicon nanoparticles, characterized in that, include: Obtain a preset pattern, which includes a static or dynamic pattern of several graphics; The scanning path program of the laser is determined according to a preset pattern, wherein the shape of the scanning path of the scanning path program is the same as the preset pattern; An optical potential trap for capturing silicon nanoparticles is obtained, and parameters of the focal plane are obtained to enable the optical potential trap to stably capture the silicon nanoparticles; wherein, the silicon nanoparticles include single silicon nanoparticles or silicon nanoclusters; The optical potential trap is controlled to circulate according to the scanning path in the scanning path program; Controlling the power of the laser to ensure that the optical potential trap stably captures the silicon nanoparticles during its movement, and controlling the scanning frequency of the laser to make the silicon nanoparticles move at a preset speed, thereby obtaining a pattern composed of silicon nanoparticles, specifically includes: The power of the laser is controlled within a preset range, which includes 200-500mW, to ensure that the optical potential trap stably captures the silicon nanoparticles during the movement. When the optical potential trap drives the silicon nanoparticles to move cyclically along the scanning path, the scanning frequency of the laser is gradually increased. When the scanning frequency reaches a preset frequency, the silicon nanoparticles form a complete pattern, thus achieving patterning. The preset frequency is determined according to the scanning path program.

2. The control method for patterning and dynamically manipulating silicon nanoparticles according to claim 1, characterized in that, The procedure for determining the laser scanning path based on a preset pattern specifically includes: The scanning path of the laser is determined by the software in the scanning optical tweezers system according to the preset pattern. or, A program is used to obtain the scanning path of the laser imported from the outside; wherein the scanning path of the laser consists of several scanning points.

3. The control method for patterning and dynamically manipulating silicon nanoparticles according to claim 1, characterized in that, When the preset pattern is a static pattern of several graphics, the scanning path program includes several programs, each corresponding to a static pattern of one graphic. The potential trap includes several programs. Controlling the potential trap to cyclically move according to the scanning path in the scanning path program specifically includes: Each of the optical potential traps is sequentially controlled to circulate according to the scanning path in the corresponding scanning path program.

4. The control method for patterning and dynamically manipulating silicon nanoparticles according to claim 1, characterized in that, When the preset pattern is a dynamic pattern of a single graphic, the procedure for determining the laser scanning path based on the preset pattern specifically includes: A set of scanning path procedures is determined based on a preset pattern, wherein the set of scanning path procedures includes patterns of the single graphic at the same or different positions.

5. The control method for patterning and dynamically manipulating silicon nanoparticles according to claim 4, characterized in that, The control of the optical potential trap to cyclically move according to the scanning path in the scanning path program specifically includes: The optical potential trap is controlled to cyclically move according to each scanning path in a set of scanning path programs; wherein each scanning path program lasts for a preset time.

6. A control system for patterning and dynamically manipulating silicon nanoparticles, characterized in that, include: The first module is used to acquire a preset pattern, which includes a static or dynamic pattern of several graphics. The second module is used to determine the scanning path program of the laser according to the preset pattern, wherein the shape of the scanning path program is the same as the preset pattern. The third module is used to obtain an optical potential trap for capturing silicon nanoparticles and to obtain parameters of the focal plane to enable the optical potential trap to stably capture the silicon nanoparticles; wherein, the silicon nanoparticles include single silicon nanoparticles or silicon nanoclusters; The fourth module is used to control the optical potential trap to move cyclically according to the scanning path in the scanning path program; The fifth module is used to control the power of the laser to ensure that the optical potential trap stably captures the silicon nanoparticles during its movement, and to control the scanning frequency of the laser so that the silicon nanoparticles move at a preset speed, thereby obtaining a pattern composed of silicon nanoparticles. Specifically, it includes: The power of the laser is controlled within a preset range, which includes 200-500mW, to ensure that the optical potential trap stably captures the silicon nanoparticles during the movement. When the optical potential trap drives the silicon nanoparticles to move cyclically along the scanning path, the scanning frequency of the laser is gradually increased. When the scanning frequency reaches a preset frequency, the silicon nanoparticles form a complete pattern, thus achieving patterning. The preset frequency is determined according to the scanning path program.

7. A control device for patterning and dynamically manipulating silicon nanoparticles, characterized in that, include: At least one processor; At least one memory for storing at least one program; When the at least one program is executed by the at least one processor, the at least one processor performs the method as described in any one of claims 1-5.

8. A computer-readable storage medium storing a processor-executable program, characterized in that, The processor-executable program, when executed by the processor, is used to perform the method as described in any one of claims 1-5.

9. A control system for patterning and dynamically manipulating silicon nanoparticles, characterized in that, It includes an optical tweezers device and a computer device connected to the optical tweezers device; wherein, The optical tweezers device is used to form a pattern composed of the silicon nanoparticles; The computer device includes: At least one processor; At least one memory for storing at least one program; When the at least one program is executed by the at least one processor, the at least one processor performs the method as described in any one of claims 1-5.

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