一种低温烧结低介电微波介质陶瓷材料及电子部件

The low-temperature sintering low-dielectric microwave dielectric ceramic material prepared by using Li2O-Al2O3-SiO2 microcrystalline glass and additives solves many of the performance deficiencies of dielectric ceramic materials in the prior art, and achieves the effects of low-temperature sintering, low dielectric constant and low coefficient of thermal expansion, which is suitable for LTCC process and integration with silicon chips.

CN117682768BActive Publication Date: 2026-07-17SHENZHEN SUNLORD ELECTRONICS

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SHENZHEN SUNLORD ELECTRONICS
Filing Date
2023-11-28
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing microwave dielectric ceramic materials cannot simultaneously meet the requirements of low-temperature sintering, low dielectric constant, low dielectric loss, and low coefficient of thermal expansion, making them unsuitable for use with single-crystal silicon chips. Furthermore, there are material compatibility issues in the LTCC process.

Method used

Using Li2O-Al2O3-SiO2 microcrystalline glass as the main component, and adding TiO2 and sintering aids such as B2O3, Bi2O3, Li2O, V2O5, and P2O5, the sintering temperature was controlled at 850-900℃ and the holding time was 1-2h, resulting in a low-temperature sintered low-dielectric microwave dielectric ceramic material with a β-lithium nepheline phase content higher than 50wt%.

Benefits of technology

It achieves dielectric constant K < 5, dielectric loss tanδ < 0.3%, and thermal expansion coefficient α: 2 ~ 5 ppm/℃ after low-temperature sintering. It is suitable for LTCC process, integrates and matches with silicon-based chips, has good co-firing bonding, and has no cracking or corrosion.

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Abstract

本发明公开了一种低温烧结低介电微波介质陶瓷材料及电子部件,所述低温烧结低介电微波介质陶瓷材料包括如下重量百分比的各组分:Li2O:8~14%;Al2O3:28~35%;SiO2:50~56%;B2O3:0.1~4%;TiO2:2~7%;Bi2O3、V2O5、P2O5中的至少一者:0~3%;K2O:0.1~1%。本发明的低温烧结低介电微波陶瓷材料满足低温烧结(900℃以下),具有低介电常数(K<5)、低损耗(tanδ<0.3%)及低热膨胀系数(α:2~5ppm / ℃),适用于LTCC叠层工艺,采用该材料制备的LTCC器件与硅基芯片集成相匹配。
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