含氟清洗液组合物及其应用
By using a fluorinated cleaning solution composition, the problems of instability and poor cleaning effect of hydroxylamine cleaning solutions are solved, achieving efficient removal of residues after dry etching at low temperature, reducing cleaning costs and improving the electrical performance of devices.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- HUBEI SINOPHORUS ELECTRONIC MATERIALS CO LTD
- Filing Date
- 2023-10-30
- Publication Date
- 2026-07-17
AI Technical Summary
Existing hydroxylamine-based cleaning solutions are unstable at high temperatures, prone to explosion, and have poor cleaning effects, increasing wafer manufacturing costs and the risk of particle residue, and affecting the electrical performance of devices.
The fluorinated cleaning solution composition contains 40%-70% organic solvent, 0.1%-5% carboxylic acid, 0.1%-5% carboxylate, 0.1%-5% fluoride, 0.1%-5% corrosion inhibitor, and 0.1%-5% dispersant. The operating temperature is 25-40℃, and ultrapure water is used to make up the balance. A buffer system and dispersant are added to the composition to maintain pH stability and prevent particle aggregation.
It achieves efficient removal of residues after dry etching at low temperatures, reduces cleaning costs, avoids particle agglomeration, and improves cleaning effect and device electrical performance.
Smart Images
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