Display panel and its manufacturing method, display device

Abstract

A display panel includes a second substrate, the second substrate including a shielding layer, an array structure layer and a reflective layer sequentially disposed on the second substrate, the array structure layer including gate lines; the shielding layer includes multiple sets of light-shielding units arranged sequentially along a first direction, each set of light-shielding units including multiple independent sub-light-shielding units arranged sequentially along a second direction; the reflective layer includes multiple reflective units arranged in an array, the multiple reflective units forming multiple reflective rows and multiple reflective columns, a first interval region is formed between adjacent reflective columns, and a second interval region is formed between adjacent reflective rows; the first interval region includes a first sub-region and a second sub-region, the orthographic projection of the first sub-region on the second substrate overlaps with the orthographic projection of the interval region between two adjacent sub-light-shielding units in each set on the second substrate, and the orthographic projection of the second sub-region on the second substrate does not overlap with the orthographic projection of the interval region between two adjacent sub-light-shielding units in each set on the second substrate.

Description

Technical Field

[0001] This disclosure relates to, but is not limited to, the field of display technology, and in particular to a display panel, a method for manufacturing the same, and a display device. Background Technology

[0002] Liquid crystal displays (LCDs) have been rapidly developed due to their small size, low power consumption, and lack of radiation. The main structure of an LCD includes a thin film transistor array (TFT) substrate and a color filter (CF) substrate. Liquid crystal (LC) molecules fill the space between the array substrate and the color filter substrate. By controlling the common electrode and pixel electrode, an electric field is formed to drive the deflection of the liquid crystal, thus achieving grayscale display.

[0003] Depending on the type of light source used, LCDs can be divided into transmissive, reflective, and semi-transmissive / semi-reflective types. Among them, semi-transmissive / semi-reflective LCDs combine the advantages of both transmissive and reflective LCDs. However, due to color mixing caused by color resists and the presence of oblique electric fields, the transmissive image suffers from color mixing, resulting in an extremely low color gamut, which seriously affects the image quality and user experience. Summary of the Invention

[0004] The following is an overview of the subject matter described in detail in this disclosure. This overview is not intended to limit the scope of the claims.

[0005] This disclosure provides a display panel, including: a first substrate and a second substrate disposed opposite to each other, and a liquid crystal layer sandwiched between the first substrate and the second substrate, wherein:

[0006] The second substrate includes a second base and a shielding layer, an array structure layer, an insulating layer and a reflective layer sequentially disposed on the second base. The array structure layer includes a gate electrode layer and the gate electrode layer includes multiple gate lines.

[0007] The shielding layer includes multiple sets of light-shielding units arranged sequentially along a first direction, and each set of light-shielding units includes multiple independent sub-light-shielding units arranged sequentially along a second direction, wherein the first direction intersects the second direction; the reflective layer includes multiple reflective units arranged in an array along the first direction and the second direction, wherein the multiple reflective units form multiple reflective rows and multiple reflective columns, wherein the interval between adjacent reflective columns forms a first interval region, and the interval between adjacent reflective rows forms a second interval region;

[0008] The first interval region includes a first sub-region and a second sub-region. The orthographic projection of the first sub-region on the second substrate overlaps with the orthographic projection of the interval region between each group of two adjacent sub-shading units on the second substrate. The orthographic projection of the second sub-region on the second substrate does not overlap with the orthographic projection of the interval region between each group of two adjacent sub-shading units on the second substrate.

[0009] This disclosure provides a display panel, including: a first substrate and a second substrate disposed opposite to each other, and a liquid crystal layer sandwiched between the first substrate and the second substrate, wherein:

[0010] The first substrate includes a first polarizer disposed on the side of the first substrate away from the second substrate. The first polarizer includes a first quarter-wave plate, a second adhesive layer, a half-wave plate, a third adhesive layer, a first triacetate cellulose layer, a first polyvinyl alcohol layer, and a second triacetate cellulose layer arranged sequentially along the direction away from the second substrate. The absorption axis angle of the first polyvinyl alcohol layer is n°, the slow axis angle of the half-wave plate is ((n+21)%180)° to ((n+23)%180)°, and the slow axis angle of the first quarter-wave plate is ((n+142)%180)° to ((n+144)%180)°, where n is between 0 and 180°.

[0011] This disclosure also provides a display device, including a display panel as described in any embodiment of this disclosure.

[0012] This disclosure also provides a method for manufacturing a display panel, comprising:

[0013] A first substrate and a second substrate are formed respectively. The second substrate includes a shielding layer, an array structure layer, an insulating layer, and a reflective layer sequentially disposed on the second substrate. The array structure layer includes a gate electrode layer, which includes multiple gate lines. The shielding layer includes multiple groups of light-shielding units arranged sequentially along a first direction. Each group of light-shielding units includes multiple independent sub-light-shielding units arranged sequentially along a second direction. The sub-light-shielding units extend along the second direction, and the first direction intersects the second direction. The reflective layer includes multiple reflective units arranged in an array along the first and second directions. The multiple reflective units form multiple reflective rows and multiple reflective columns. The interval region between adjacent reflective columns forms a first interval region, and the interval region between adjacent reflective rows forms a second interval region. The first interval region includes a first sub-region and a second sub-region. The orthographic projection of the first sub-region on the second substrate overlaps with the orthographic projection of the interval region between two adjacent sub-light-shielding units in each group on the second substrate. The orthographic projection of the second sub-region on the second substrate does not overlap with the orthographic projection of the interval region between two adjacent sub-light-shielding units in each group on the second substrate.

[0014] The first substrate and the second substrate are assembled, and liquid crystal is filled between the first substrate and the second substrate.

[0015] This disclosure also provides a method for manufacturing a display panel, comprising:

[0016] The first substrate and the second substrate are formed respectively;

[0017] The first substrate and the second substrate are assembled, and liquid crystal is filled between the first substrate and the second substrate;

[0018] A first polarizer is attached to the side of the first substrate away from the second substrate. The first polarizer includes a first quarter-wave plate, a second adhesive layer, a half-wave plate, a third adhesive layer, a first triacetate cellulose layer, a first polyvinyl alcohol layer, and a second triacetate cellulose layer arranged sequentially along the direction away from the second substrate. The absorption axis angle of the first polyvinyl alcohol layer is n°, the slow axis angle of the half-wave plate is ((n+21)%180)° to ((n+23)%180)°, and the slow axis angle of the first quarter-wave plate is ((n+142)%180)° to ((n+144)%180)°, where n is between 0 and 180°.

[0019] After reading and understanding the accompanying diagrams and detailed descriptions, the other aspects can be understood. Attached Figure Description

[0020] The accompanying drawings are used to provide an understanding of the technical solutions of this disclosure and form part of the specification. They are used together with the embodiments of this disclosure to explain the technical solutions of this disclosure and do not constitute a limitation on the technical solutions of this disclosure.

[0021] Figure 1 Comparison chart of optical simulations for different display modes;

[0022] Figures 2A to 2C Schematic diagrams of the effective display area structure of three different transflective display panels;

[0023] Figure 3 This is a schematic diagram illustrating the color mixing effect of the transmissive image on some display panels.

[0024] Figure 4 This is a schematic diagram of a planar structure of a display panel provided in an embodiment of the present disclosure;

[0025] Figure 5 This is a schematic cross-sectional view of a display panel provided in an embodiment of the present disclosure;

[0026] Figure 6 This is a schematic cross-sectional view of a second substrate in a display panel provided in an embodiment of the present disclosure;

[0027] Figure 7 A schematic diagram illustrating the color gamut enhancement effect of a display panel provided in an embodiment of this disclosure;

[0028] Figure 8 This is a schematic diagram illustrating light leakage within the housing of some display panels.

[0029] Figure 9 A schematic diagram of light leakage detection results for a display panel provided in an embodiment of this disclosure;

[0030] Figure 10 A schematic diagram of the phase delay curves across the entire wavelength range for some optical phase delay materials;

[0031] Figure 11 A schematic diagram of a Bonga sphere model for some display panels;

[0032] Figure 12 A schematic diagram illustrating the improved principle of the Bonga sphere model for the display panel provided in this embodiment of the disclosure;

[0033] Figure 13 A schematic diagram of a structure of a first polarizer in a display panel provided in an embodiment of this disclosure;

[0034] Figure 14 This is a schematic diagram of a structure of a second polarizer in a display panel provided in an embodiment of the present disclosure;

[0035] Figures 15A to 15B This is a schematic diagram illustrating the change in light polarization of a display panel in the off-state of reflection mode, as provided in an embodiment of this disclosure.

[0036] Figures 15C to 15D This is a schematic diagram illustrating the change in light polarization of a display panel in the reflective mode on state, as provided in an embodiment of this disclosure.

[0037] Figures 15E to 15F A schematic diagram illustrating the change in light polarization of a display panel in the off state of transmission mode, provided in an embodiment of this disclosure.

[0038] Figures 15G to 15H A schematic diagram illustrating the change in light polarization of a display panel in the on state of transmission mode, provided in an embodiment of this disclosure.

[0039] Figure 16 This is a schematic diagram of the planar structure of a touch structure layer in a display panel, which is an exemplary embodiment of the present disclosure. Detailed Implementation

[0040] The embodiments will now be described with reference to the accompanying drawings. Note that the embodiments can be implemented in many different forms. Those skilled in the art will readily understand that the methods and content can be varied in many ways without departing from the spirit and scope of this disclosure. Therefore, this disclosure should not be construed as being limited to the contents described in the following embodiments.

[0041] In the accompanying drawings, the size of the constituent elements, the thickness of the layers, or the area are sometimes exaggerated for clarity. Therefore, one aspect of this disclosure is not necessarily limited to these dimensions, and the shapes and sizes of the components in the drawings do not reflect true proportions. Furthermore, the drawings schematically illustrate ideal examples, and one aspect of this disclosure is not limited to the shapes or values ​​shown in the drawings.

[0042] The ordinal numbers “first,” “second,” and “third” used in this specification are used to avoid confusion among the constituent elements, not to limit their quantity.

[0043] In this specification, for convenience, terms such as "middle," "upper," "lower," "front," "rear," "vertical," "horizontal," "top," "bottom," "inner," and "outer" are used to indicate orientation or positional relationships in conjunction with the accompanying drawings. This is solely for the purpose of facilitating the description and simplification, and does not imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation of this disclosure. The positional relationships of the constituent elements may be appropriately varied depending on the orientation of each constituent element being described. Therefore, the use of terms not limited to those described in the specification may be appropriately replaced as needed.

[0044] In this specification, unless otherwise expressly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection via an intermediate component; and they can refer to the internal connection between two components. Those skilled in the art will understand the specific meaning of these terms in this disclosure based on the specific circumstances.

[0045] In this specification, a transistor is a device that includes at least three terminals: a gate electrode, a drain electrode, and a source electrode. A transistor has a channel region between the drain electrode (drain electrode terminal, drain region, or drain electrode) and the source electrode (source electrode terminal, source region, or source electrode), and current can flow through the drain electrode, the channel region, and the source electrode. Note that in this specification, the channel region refers to the region through which current primarily flows.

[0046] In this specification, the first electrode can be the drain electrode and the second electrode can be the source electrode, or vice versa. In cases where transistors with opposite polarities are used or the current direction changes during circuit operation, the functions of the "source electrode" and "drain electrode" may sometimes be interchanged. Therefore, in this specification, the "source electrode" and "drain electrode" can be interchanged.

[0047] In this specification, "electrical connection" includes the situation where components are connected together by elements that have a certain electrical function. There are no particular limitations on what constitutes an "electrical function," as long as it allows for the transmission and reception of electrical signals between the connected components. Examples of "electrical functions" include not only electrodes and wiring, but also switching elements such as transistors, resistors, inductors, capacitors, and other elements with various functions.

[0048] In this specification, "parallel" refers to the state where the angle formed by two straight lines is greater than or equal to -10° and less than 10°, and therefore also includes the state where the angle is greater than or equal to -5° and less than 5°. Similarly, "perpendicular" refers to the state where the angle formed by two straight lines is greater than or equal to 80° and less than 100°, and therefore also includes the state where the angle is greater than or equal to 85° and less than 95°.

[0049] In this specification, the terms "film" and "layer" may be interchanged. For example, "conductive layer" may sometimes be replaced with "conductive film." Similarly, "insulating film" may sometimes be replaced with "insulating layer."

[0050] Semi-reflective LCDs possess both reflective and transmissive modes, freeing them from environmental limitations. With reflection as the primary mode and transmissivity as a secondary mode, their demand has been steadily increasing in recent years, particularly in wearable devices and industrial control systems. In wearable products, low power consumption is a crucial performance characteristic. To match this, a low-voltage driving mode becomes the primary choice. Figure 1 The image shows a comparison of optical simulations for different display modes. ECB (Electrically controlled Birefringence) is the electrically controlled birefringence mode, and ADS (Advanced Super Dimension Switch) is the advanced super-dimensional field conversion mode. Considering the light efficiency of liquid crystals, the Twisted Nematic (TN) normally black mode becomes the primary choice for low-voltage driving.

[0051] Semi-transmissive LCDs typically include the following structures:

[0052] 1) The effective display area (AA area) has no black matrix (BM).

[0053] like Figure 2AAs shown, area AA has no black matrix. The reflective layer consists of multiple reflective units arranged in an array, forming a reflective area, and the space between the reflective units serves as a transmission area. The advantage of this structure is that it maximizes the reflective aperture, i.e., maximizes reflectivity. The disadvantage is that in the data line direction, the color mixing area is not obstructed. Due to the color mixing by the color resist and the presence of the oblique electric field, color mixing occurs in the transmitted image, such as... Figure 3 As shown, the color mixing ratio is as high as 50%, and the color gamut of the transmissive mode is low, which is not conducive to improving image quality.

[0054] 2) The effective display area includes a grid-like matrix (BM), a reflective area, and a transmissive area, which divide the pixel aperture area.

[0055] like Figure 2B As shown, a portion of the pixel openings within the effective display area are designated as reflective areas, while the remaining pixel openings are designated as transmissive areas. The advantage of this structure is that it ensures a high color gamut for both reflective and transmissive modes, with a low risk of color mixing. The disadvantage is that the reflective openings are relatively small, and alignment fluctuations during the cell assembly process can affect reflectivity and the color gamut of the transmissive mode.

[0056] 3) The effective display area has a BM in the data line direction but no BM in the raster line direction, and the horizontal spacing area serves as the transmission area.

[0057] like Figure 2C As shown, the reflective layer comprises multiple reflective units arranged in an array, forming a reflective area. The data line direction is blocked by a metal band mask (BM), while the gate line direction is free of BMs. The interval between adjacent reflective rows serves as a transmission area. The advantage of this structure is less color mixing in the transmission mode and a larger reflective aperture. However, because the strip-shaped BMs are prone to peeling, the width of the BMs cannot be too narrow. This results in the partial obstruction of the metallic pattern in the reflective layer, causing a loss of reflective aperture and a decrease in reflectivity.

[0058] Figure 4 This is a schematic diagram of a planar structure of a display panel provided in an embodiment of the present disclosure. Figure 5 This is a cross-sectional structural diagram of a display panel provided in an embodiment of this disclosure. Figure 4 and Figure 5 As shown, the display panel of this embodiment includes: a first substrate 1 and a second substrate 2 disposed opposite to each other, and a liquid crystal layer 3 sandwiched between the first substrate 1 and the second substrate 2. Figure 6 This is a schematic cross-sectional view of the second substrate 2 in the display panel provided in an embodiment of the present disclosure.

[0059] like Figures 4 to 6As shown, the second substrate 2 includes a second base 20 and a buffer layer 21, a shielding layer 22, an array structure layer 23, an insulating layer 24 and a reflective layer 25 sequentially disposed on the second base 20. The array structure layer 23 includes a gate electrode layer 233, and the gate electrode layer 233 includes multiple gate lines 233a.

[0060] The shielding layer 22 includes multiple sets of light-shielding units arranged sequentially along the first direction x. Each set of light-shielding units includes multiple independent sub-light-shielding units 22a arranged sequentially along the second direction y. The first direction x intersects the second direction y. The reflective layer 25 includes multiple reflective units 25a arranged in an array along the first direction x and the second direction y. The multiple reflective units 25a form multiple reflective rows and multiple reflective columns. The interval between adjacent reflective columns forms a first interval region 100, and the interval between adjacent reflective rows forms a second interval region 200.

[0061] The first interval region 100 includes a first sub-region 101 and a second sub-region 102. The orthographic projection of the first sub-region 101 on the second base 20 overlaps with the orthographic projection of the interval region between each group of two adjacent sub-shading units 22a on the second base 20. The orthographic projection of the second sub-region 102 on the second base 20 does not overlap with the orthographic projection of the interval region between each group of two adjacent sub-shading units 22a on the second base 20.

[0062] The display panel of this embodiment eliminates the need for a black matrix to prevent color mixing of the transmitted image by setting a light-shielding unit. Therefore, the entire display panel can achieve a design that maximizes reflectivity without the influence of process problems such as BM peeling or alignment fluctuations. In addition, by setting multiple independent sub-light-shielding units 22a arranged sequentially along the second direction y, the extension length of the light-shielding unit along the second direction y is prevented from being too long, thereby effectively preventing electrostatic discharge (ESD). Figure 7 These are comparison diagrams showing the color gamut effect of display panels in some technologies and the display panels of the embodiments of this disclosure in transmissive mode, such as... Figure 7 As shown, the color mixing ratio of the transmitted image can be reduced to below 5%, thereby improving the user experience. Furthermore, the display panel of this embodiment does not require an increase in the number of photomasks; the shielding layer 22 can be fabricated in the same layer as the shielding layer used to shield semiconductor silicon in current display panels, exhibiting good process compatibility, not requiring changes to existing process equipment, and possessing promising application prospects.

[0063] In some exemplary embodiments, at least one gate line 233a has its orthographic projection on the second substrate 20 covering the orthographic projection of the first sub-region 101 on the second substrate 20, and the orthographic projection of the light-shielding unit on the second substrate 20 covers the orthographic projection of the second sub-region 102 on the second substrate 20.

[0064] In this embodiment of the present disclosure, the second interval region 200 forms a transmission region, and the plurality of reflection units 25a form a reflection region.

[0065] In some exemplary embodiments, such as Figure 4 As shown, each sub-shading unit 22a is a strip-shaped structure extending along the second direction y.

[0066] In some exemplary embodiments, such as Figure 4 As shown, the width W1 of the first sub-region 101 in the second direction y is 2 micrometers to 4 micrometers. For example, the width W1 of the first sub-region 101 in the second direction y can be 3 micrometers.

[0067] In some exemplary embodiments, such as Figure 4 As shown, each light-shielding unit includes a first light-shielding part 221 and a second light-shielding part 222. The orthographic projection of the first light-shielding part 221 on the second base 20 does not overlap with the orthographic projection of the second interval region 200 on the second base 20. The orthographic projection of the second light-shielding part 222 on the second base 20 overlaps with the orthographic projection of the second interval region 200 on the second base 20. The width W2 of the second light-shielding part 222 in the first direction x is smaller than the width W3 of the first light-shielding part 221 in the first direction x.

[0068] In some exemplary embodiments, such as Figure 4 As shown, the width W3 of the first light-shielding portion 221 in the first direction x is greater than or equal to the width W4 of the first interval region 100 in the first direction x.

[0069] In some exemplary embodiments, such as Figure 4 As shown, the width W3 of the first light-shielding portion 221 in the first direction x is between 5 micrometers and 8 micrometers. For example, the width W3 of the first light-shielding portion 221 in the first direction x can be 6.4 micrometers.

[0070] In some exemplary embodiments, such as Figure 4 As shown, the first light-shielding portion 221 includes a first edge and a second edge, which are disposed opposite to each other in the first direction x. The first interval region 100 includes a third edge and a fourth edge, which are disposed opposite to each other in the first direction x. The first edge of the first light-shielding portion 221 is located on the side of the third edge of the corresponding first interval region that is away from the fourth edge. The second edge of the first light-shielding portion 221 is located on the side of the fourth edge of the corresponding first interval region that is away from the second edge. The interval a between the first edge of the first light-shielding portion 221 and the third edge of the corresponding first interval region is 0.8 micrometers to 1.5 micrometers. The interval b between the second edge of the first light-shielding portion 221 and the fourth edge of the corresponding first interval region is 0.8 micrometers to 1.5 micrometers.

[0071] For example, the distance a between the first edge of the first light-shielding portion 221 and the third edge of the corresponding first spacing region 100 is 1.2 micrometers, and the distance b between the second edge of the first light-shielding portion 221 and the fourth edge of the corresponding first spacing region 100 is 1.2 micrometers.

[0072] In the display panel of this embodiment, by making the width W3 of the first light-shielding part 221 in the first direction x greater than or equal to the width W4 of the first interval area 100 in the first direction x, the orthogonal projection of the first light-shielding part 221 on the second substrate 20 can cover the orthogonal projection of the two edges of the corresponding first interval area that are disposed opposite to each other in the first direction x on the second substrate 20, thereby ensuring the blocking effect of the blocking layer and avoiding color mixing of the transmitted image.

[0073] In some exemplary embodiments, such as Figure 4 As shown, the width W2 of the second light-shielding portion 222 in the first direction x is smaller than the width W4 of the first interval region 100 in the first direction x.

[0074] In some exemplary embodiments, such as Figure 4 As shown, the width W2 of the second light-shielding portion 222 in the first direction x is between 3 micrometers and 5 micrometers. For example, the width W2 of the second light-shielding portion 222 in the first direction x can be 4.0 micrometers.

[0075] The display panel of this embodiment makes the width W2 of the second light-shielding part 222 in the first direction x smaller than the width W3 of the first light-shielding part 221 in the first direction x. On the one hand, it can ensure the blocking effect of the blocking layer and avoid color mixing of the transmitted image; on the other hand, it can increase the transmission aperture ratio and increase the light transmittance.

[0076] In some exemplary embodiments, such as Figure 4 As shown, the width W4 of the first spacing region 100 in the first direction x can be between 3 micrometers and 5 micrometers, and the width W5 of the second spacing region 200 in the second direction y can be between 7 micrometers and 9 micrometers.

[0077] For example, the width W4 of the first spacing region 100 in the first direction x can be 4 micrometers, and the width W5 of the second spacing region 200 in the second direction y can be 8 micrometers.

[0078] In some exemplary embodiments, such as Figure 6 As shown, the array structure layer also includes an active semiconductor layer 231 and a source / drain electrode layer. The source / drain electrode layer includes a source electrode 235a and a drain electrode 235b. The insulating layer 24 is provided with a first via K1. The reflective unit 25a is connected to the drain electrode 235b through the first via K1.

[0079] The first substrate 1 includes a first base 10 and a black matrix layer 11 and a color filter layer 12 sequentially disposed on the first base 10; at least one of the first substrate 1 and the second substrate 2 further includes a spacer 4.

[0080] The black matrix layer 11 includes at least one first black matrix 11a and at least one second black matrix 11b. The orthographic projection of at least one first black matrix 11a onto the first substrate 10 covers the orthographic projection of a spacer 4 onto the first substrate 10. The orthographic projection of at least one second black matrix 11b onto the first substrate 10 covers the orthographic projection of a first via K1 onto the first substrate.

[0081] The display panel of this embodiment is provided with at least one first black matrix 11a and at least one second black matrix 11b. The orthographic projection of the first black matrix 11a on the first substrate 10 covers the orthographic projection of a spacer 4 on the first substrate 10, and the orthographic projection of the second black matrix 11b on the first substrate 10 covers the orthographic projection of a first via K1 on the first substrate. The entire display panel does not need to be provided with strip-shaped black matrices to avoid color mixing of the transmitted image. Therefore, the entire display panel can achieve a design that maximizes reflectivity and is not affected by process problems such as BM peeling or alignment fluctuations. The color mixing ratio of the transmitted image is greatly reduced, thereby improving the user experience.

[0082] Semi-transmissive LCDs require both reflective and transmissive areas. Due to the outdoor nature of wearable products, maximizing reflectivity, with reflection as the primary factor and transmissivity as a secondary factor, becomes the top priority. Some semi-transmissive LCDs use a grid-like matrix gate (BM) design, which can only set the transmissive and reflective areas in the BM opening area. This is not conducive to maximizing the reflective opening, resulting in lower reflectivity. Furthermore, alignment fluctuations during cell assembly cause further loss of opening ratio, leading to a decrease in reflectivity.

[0083] Figure 8 This is a schematic diagram of light leakage phenomenon inside a display panel. The patch "BM" designed in this embodiment only blocks the spacer 4 and the first via K1. While blocking the light leakage position, it ensures the maximum area of ​​the reflection opening, improves the reflectivity, and at the same time, the contrast ratio (CR) is also greatly improved. Figure 9 The actual image of light leakage in the L0 state after adding a "patch" black matrix to the embodiments of this disclosure is shown in the figure. Figure 8 In contrast, the light leakage of the display panel in the embodiments of this disclosure is basically invisible.

[0084] In some exemplary embodiments, the distance between the edge of the orthographic projection of the first black matrix 11a onto the first substrate 10 and the edge of the orthographic projection of the corresponding spacer 4 onto the first substrate 10 is between 1 micrometer and 3 micrometers. For example, the distance between the edge of the orthographic projection of the first black matrix 11a onto the first substrate 10 and the edge of the orthographic projection of the corresponding spacer 4 onto the first substrate 10 can be 2 micrometers.

[0085] In some exemplary embodiments, the distance between the edge of the orthographic projection of the second black matrix 11b on the first substrate 10 and the edge of the orthographic projection of the corresponding first via K1 on the first substrate 10 can be between 1 micrometer and 3 micrometers. For example, the distance between the edge of the orthographic projection of the second black matrix 11b on the first substrate 10 and the edge of the orthographic projection of the corresponding first via K1 on the first substrate 10 can be 2 micrometers.

[0086] like Figure 10 As shown, the optical phase delay materials currently used include compensation films and liquid crystals, both of which exhibit positive dispersion, meaning that the longer the wavelength, the lower the reflectivity. In the optical path design of reflective devices, the L0 (grayscale of 0) design is usually based on a wavelength of 550nm. Due to the high phase delay (Re value) in the low-band, blue light cannot be absorbed by the polarizer in the L0 state, resulting in leakage and causing dark-state reflection color shift, which greatly affects the user experience.

[0087] In the reflective mode optical path design, achieving the L0 dark state requires the light to become circularly polarized before reaching the reflective layer 25 after passing through the liquid crystal layer 3. This process is represented by reaching the pole position on the Bonga sphere. Since the wavelengths of RGB in visible light are different, their polarization states will differ after the same phase delay. The Bonga sphere can be represented by the difference in the path traveled on the sphere. The change in polarization state of visible light of different wavelengths after passing through the phase difference compensation film with axial orientation angle θ and phase difference R(λ) can be represented on the Bonga sphere as follows:

[0088] Taking the position at an angle of 2θ with respect to S1 as the axis, rotate clockwise from the starting position by the following angle:

[0089] △=360°x(R(λ) / λ), where λ is the wavelength of the light.

[0090] From the above formula, it can be seen that due to the wavelength differences of the visible light in RGB, the path length relationship on the sphere is B > G > R. When the overall brightness of the cell optics is at its lowest, such as Figure 11 As shown, the G light is located at the pole position, the R light is located near but not at the pole position, and the B light exceeds the pole and travels a long distance. The macroscopic manifestation is that the blue light portion leaks out in the dark state, and the L0 color shift occurs.

[0091] like Figure 12As shown, this embodiment of the present disclosure designs the optical path and compensation value of the compensation film using a Bonga sphere model, and adjusts the ratio of RGB light output in the L0 state. On the surface of the Bonga sphere, the phase compensation value of the first quarter-wave plate 154 is adjusted from 90nm to 110nm. At the same time, the overall optical path matching design is adjusted. This can be described as increasing the distance that the faster blue light traveling on the sphere is pulled back. This allows the blue light that was originally beyond the pole position to adjust the angle of the compensation film so that it travels a suitable distance to reach the pole, while the red and green light fail to reach the pole. As a result, in the L0 state, the amount of red and green light leakage is greater than the amount of blue light leakage, thus improving the problem of blue bias in the L0 state.

[0092] like Figure 4 and Figure 5 As shown, this disclosure also provides a display panel, which includes: a first substrate 1 and a second substrate 2 disposed opposite to each other, and a liquid crystal layer 3 sandwiched between the first substrate 1 and the second substrate 2.

[0093] The first substrate 1 includes a first polarizer 15, which is disposed on the side of the first substrate 10 away from the second substrate 2, such as... Figure 13 As shown, the first polarizer 15 includes a first quarter-wave plate 154, a second adhesive layer 155, a half-wave plate 156, a third adhesive layer 157, a first triacetate cellulose layer 158, a first polyvinyl alcohol layer 159, and a second triacetate cellulose layer 160 arranged sequentially along the direction away from the second substrate 2. The absorption axis angle of the first polyvinyl alcohol layer 159 is n°, the slow axis angle of the half-wave plate 156 is ((n+21)%180)° to ((n+23)%180)°, and the slow axis angle of the first quarter-wave plate 154 is ((n+142)%180)° to ((n+144)%180)°, where n is between 0 and 180°.

[0094] In some exemplary embodiments, such as Figure 13As shown, the first polarizer 15 further includes a first optically clear adhesive (OCA) layer 151, a scattering film 152, and a first adhesive layer 153. The first optically clear adhesive (OCA) layer 151, scattering film 152, first adhesive layer 153, first quarter-wave plate 154, second adhesive layer 155, half-wave plate 156, third adhesive layer 157, first triacetate cellulose (TAC) layer 158, first polyvinyl alcohol (PVA) layer 159, and second triacetate cellulose (TAC) layer 160 are sequentially arranged in a direction away from the second substrate 2. The first polarizer 15 adds a scattering film 152 to widen the viewing angle. The first TAC layer 158 and the second TAC layer 160 are both 0-TAC to reduce phase interference. The surface of the first polarizer 15 can be coated to provide hard coating (HC) protection.

[0095] In some exemplary embodiments, the absorption axis angle of the first PVA layer 159 can be set to 20°. The slow axis angle of the half-wave plate 156 can be 42°, and the slow axis angle of the first quarter-wave plate 154 can be 163°.

[0096] In some other exemplary embodiments, the absorption axis angle of the first PVA layer 159 can be set to 35°. The slow axis angle of the half-wave plate 156 can be 57°, and the slow axis angle of the first quarter-wave plate 154 can be 163°.

[0097] In some exemplary embodiments, the phase compensation value of the half-wave plate 156 can be between 265nm and 275nm. For example, the phase compensation value of the half-wave plate 156 can be 270nm. The phase compensation value of the first quarter-wave plate 154 can be between 105nm and 115nm. For example, the phase compensation value of the first quarter-wave plate 154 can be 110nm.

[0098] In this embodiment of the present disclosure, the first polarizer 15 adopts a dual compensation design, including a half-wave plate 156 and a first quarter-wave plate 154. The half-wave plate 156 can be made of cyclic olefin polymer (COP) material, and the first quarter-wave plate 154 can also be made of COP material.

[0099] In some exemplary embodiments, such as Figure 5 and Figure 14As shown, the second substrate 2 further includes a second polarizer 27, which is disposed on the side of the second substrate 20 away from the first substrate 1. The second polarizer 27 includes a second quarter-wave plate 272, a fourth adhesive layer 273, a third cellulose triacetate (TAC) layer 274, a second polyvinyl alcohol (PVA) layer 275, and a fourth cellulose triacetate (TAC) layer 276 arranged sequentially along the direction away from the first substrate 1. The absorption axis angle of the second PVA layer 275 is ((n+89)%180)° to ((n+91)%180)°, and the slow axis angle of the second quarter-wave plate 272 is ((n+139)%180)° to ((n+141)%180)°.

[0100] In some exemplary embodiments, such as Figure 14 As shown, the second polarizer 27 further includes a second optically clear adhesive (OCA) layer 271, a fifth adhesive layer 277, and an advanced patterning film (APF) layer 278. The second optically clear adhesive (OCA) layer 271, the second quarter-wave plate 272, the fourth adhesive layer 273, the third cellulose triacetate (TAC) layer 274, the second polyvinyl alcohol (PVA) layer 275, the fourth cellulose triacetate (TAC) layer 276, the fifth adhesive layer 277, and the advanced patterning film (APF) layer 278 are arranged sequentially in a direction away from the first substrate 1. The second polarizer 27 uses an APF reinforcement film, and the third TAC layer 274 and the fourth TAC layer 276 are both non-phase retardation materials (0-TAC).

[0101] In some exemplary embodiments, the absorption axis angle of the first PVA layer 159 can be set to 20°. The absorption axis angle of the second PVA layer 275 is 110°, and the slow axis angle of the second quarter-wave plate 272 is 160°.

[0102] In some other exemplary embodiments, the absorption axis angle of the first PVA layer 159 may be set to 35°. The absorption axis angle of the second PVA layer 275 is 125°, and the slow axis angle of the second quarter-wave plate 272 is 175°.

[0103] In some exemplary embodiments, the phase compensation value of the second quarter-wave plate 272 is 135 nm to 145 nm.

[0104] In this embodiment of the disclosure, the second polarizer 27 adopts a single compensation design, including a second quarter-wave plate 272. For example, the second quarter-wave plate 272 can also be made of COP material. For example, the phase compensation value can be 140nm and the slow axis angle can be 175°.

[0105] In some exemplary embodiments, the twist angle (TA) of the liquid crystal layer 3 is 51° to 53°. For example, the twist angle (TA) of the liquid crystal layer 3 can be 52°.

[0106] In some exemplary embodiments, the phase retardation (Re value) of the liquid crystal layer 3 is 213.5 nm to 214.5 nm, the rubbing angle of the first substrate 1 is -94.5° to -93.5°, and the rubbing angle of the second substrate 2 is 137.5° to 138.5°.

[0107] For example, the phase retardation of the liquid crystal layer 3 is 214 nm, the rubbing angle of the first substrate 1 is -94°, and the rubbing angle of the second substrate 2 is 138°.

[0108] This disclosure improves the problem of bluish discoloration in dark states of TN constant black mode by designing a matching relationship between the phase retardation of the compensation film, the slow axis angle, and the rubbing angle within the cell, and by utilizing Bonga sphere theory, thereby optimizing the optical display effect.

[0109] The overall reflective light path design of the display panel in this embodiment is a TN normally black mode. External light enters through the first polarizer 15, and after being reflected by the first polarizer 15, the first substrate 10, the liquid crystal layer 3, and the reflective layer 25, it passes through the liquid crystal layer 3, the first substrate 10, and the first polarizer 15 again before exiting. The transmission light path is that the light is emitted from the backlight module (BLU), passes through the second polarizer 27, the transmission area of ​​the second substrate 20, the liquid crystal layer 3, the first substrate 10, and the first polarizer 15 before exiting.

[0110] In some exemplary embodiments, the reflected light path angle is designed such that the absorption axis angle of the first PVA layer 159 is set to 35°, the half-wave plate is made of COP material with a phase compensation value of 270nm and a slow axis angle of 57°, the first quarter-wave plate 154 is made of COP material with a phase compensation value of 110nm and a slow axis angle of 178°, the Re value of the liquid crystal layer 3 is 214nm, the rubbing angle of the first substrate (also called the CF substrate) 1 is set to -94°, the rubbing angle of the second substrate (also called the TFT substrate) 2 is set to 138°, and the TA of the liquid crystal layer 3 is 52°.

[0111] The transmission angle is designed such that the absorption axis angle of the second PVA layer 275 is 125°, the material of the second quarter-wave plate 272 is COP, the phase compensation value is 140nm, and the slow axis angle is 175°.

[0112] like Figures 15A to 15B As shown, in the off state of the reflection mode, natural light becomes linearly polarized light parallel to 101° after passing through the first PVA layer 159. After passing through the half-wave plate 156, the outgoing light becomes linearly polarized light at 169°. Under the combined action of the first quarter-wave plate 154 and the liquid crystal layer 3, it becomes circularly polarized light before reaching the reflective layer 25. After the half-wave loss occurs in the reflective layer 25, the outgoing light becomes circularly polarized light with the opposite rotation direction. After passing through the liquid crystal layer 3, it reaches the first quarter-wave plate 154. After exiting the first quarter-wave plate 154, it enters the liquid crystal layer with the incident light perpendicular to the major axis of the elliptical polarization. After passing through the first quarter-wave plate 154, it becomes linearly polarized light again. After exiting the half-wave plate 156, it becomes linearly polarized light at 145°, which is parallel to the absorption axis angle of the first PVA layer 159 and is absorbed. This is the off state.

[0113] like Figures 15C to 15D As shown, in the reflective mode, the TN liquid crystal stands upright and has no birefringence. Before reaching the reflective layer 25, it has the same polarization state as the first quarter-wave plate 154. After the half-wave loss occurs in the reflective layer 25, the rotation direction is reversed. After the outgoing light exits the liquid crystal layer 3, the rotation direction is reversed with the incident light before entering the liquid crystal layer 3, with a phase difference of 180°. After exiting the half-wave plate 156, it becomes 55° linearly polarized light, which is perpendicular to the absorption axis angle of the first PVA layer 159 and can be transmitted. This is the open state.

[0114] like Figures 15E to 15F As shown, in the off state of the transmission mode, the backlight module (BLU) light becomes 35° linearly polarized light after passing through the second PVA layer 275, and forms an angle of 40° with the second quarter-wave plate 272. Before entering the liquid crystal layer 3, it becomes circularly polarized light. The subsequent light path is consistent with the light path emitted in the off state of the reflection mode, and finally the off state is achieved.

[0115] like Figures 15G to 15H As shown, in the transmission mode open state, the BLU light becomes circularly polarized light before entering the liquid crystal layer 3 through the second PVA layer 275. It can be decomposed into two parts of light that are parallel and perpendicular to the light path emitted in the reflection mode. The parallel part eventually passes through the first polarizer 15, while the perpendicular part is absorbed, thus realizing the open state control.

[0116] The technical solution of this embodiment is further illustrated below through the fabrication process of the array substrate in this embodiment. The "patterning process" mentioned in this embodiment includes processes such as film deposition, photoresist coating, mask exposure, development, etching, and photoresist stripping, which are mature fabrication processes in related technologies. Deposition can employ known processes such as sputtering, evaporation, and chemical vapor deposition; coating can employ known coating processes; and etching can employ known methods, without specific limitations. In the description of this embodiment, it should be understood that a "thin film" refers to a thin film made of a certain material on a substrate using a deposition or coating process. If the "thin film" does not require a patterning process or photolithography process during the entire fabrication process, it can also be called a "layer." If the "thin film" requires a patterning process or photolithography process during the entire fabrication process, it is called a "thin film" before the patterning process and a "layer" after the patterning process. The "layer" after the patterning process or photolithography process contains at least one "pattern."

[0117] First, a first substrate 1 and a second substrate 2 are prepared respectively. The first substrate 1 includes a first base 10 and a black matrix layer 11, a color filter layer 12 and a common electrode layer 14 sequentially disposed on the first base 10. The second substrate 2 includes a second base 20 and a buffer layer 21, a shielding layer 22, an array structure layer 23, an insulating layer 24 and a reflective layer 25 sequentially disposed on the second base 20. Then, liquid crystal 3 and spacer 4 are deposited on one of the substrates, and a sealant is coated on the other substrate. The first substrate 1 and the second substrate 2 are aligned, and the substrates are pressed and the sealant is cured under vacuum to form a liquid crystal display panel. Finally, a first polarizer 15 is attached to the outside of the first substrate 1 and a second polarizer 27 is attached to the outside of the second substrate 2.

[0118] The preparation of the first substrate 1 includes:

[0119] (1) A polymer photoresist layer mixed with black matrix material is coated on the first substrate 10. After exposure and development, a pattern of black matrix layer 11 is formed. The black matrix layer 11 includes a first black matrix 11a and a second black matrix 11b. The position of the first black matrix 11a corresponds to the position of the subsequently formed spacer 4, i.e., the orthographic projection of the first black matrix 11a on the first substrate 10 covers the orthographic projection of the spacer 4 on the first substrate 10. The position of the second black matrix 11b corresponds to the position of the first via K1 on the subsequently formed insulating layer 24, i.e., the orthographic projection of the second black matrix 11b on the first substrate 10 covers the orthographic projection of the first via K1 on the first substrate 10. The black matrix layer 11 is used to block light leakage at locations where light leakage occurs. In this embodiment, the light leakage locations include the positions corresponding to the spacer 4 and the first via K1 on the insulating layer 24 of the second substrate 2.

[0120] In some exemplary embodiments, the distance between the edge of the orthographic projection of the first black matrix 11a on the first substrate 10 and the edge of the orthographic projection of the corresponding spacer 4 on the first substrate 10 is 1 micrometer to 3 micrometers. For example, the distance between the edge of the orthographic projection of the first black matrix 11a on the first substrate 10 and the edge of the orthographic projection of the corresponding spacer 4 on the first substrate 10 is 2 micrometers.

[0121] The distance between the edge of the orthographic projection of the second black matrix 11b on the first substrate 10 and the edge of the orthographic projection of the corresponding first via on the first substrate 10 is 1 micrometer to 3 micrometers. For example, the distance between the edge of the orthographic projection of the second black matrix 11b on the first substrate 10 and the edge of the orthographic projection of the corresponding first via on the first substrate 10 is 2 micrometers.

[0122] (2) On the first substrate 10 with the aforementioned pattern, a polymer photoresist layer mixed with red pigment is coated, and after exposure and development, a pattern of red photoresist is formed; the same method and steps are used to form patterns of green photoresist and blue photoresist in sequence, and the red photoresist, green photoresist and blue photoresist are arranged according to a set rule to form a color film layer 12.

[0123] In this design, red, green, and blue photoresist form red, green, and blue sub-pixels, respectively, and are arranged according to a predetermined pattern to form a pixel. The red, green, and blue photoresist are used to filter and transmit red, green, and blue light, respectively. In practice, the first substrate 1 may not include the color filter layer 12, but instead the color filter layer 12 is disposed on the second substrate 2. The color filter layer 12 may also have four sub-pixels forming a pixel; for example, the four sub-pixels could be red, green, blue, and white sub-pixels.

[0124] (3) A protective film OC is deposited on the first substrate 10 on which the aforementioned pattern is formed to obtain a protective layer 13.

[0125] (4) On the first substrate 10 with the aforementioned pattern, an indium tin oxide (ITO) thin film is deposited on the first substrate 10 by methods such as coating, magnetron sputtering, thermal evaporation or plasma enhanced chemical vapor deposition (PECVD) to obtain a common electrode layer 14.

[0126] (5) A polyimide (PI) solution is coated on the first substrate 10 with the aforementioned pattern, and the coated PI solution is heated to evaporate the organic solvent in the PI solution, thereby forming a first alignment film 16 with a certain thickness, thus completing the preparation of the first substrate 1.

[0127] The preparation of the second substrate 2 includes:

[0128] (I) On the second substrate 20, a first insulating film and a first metal film are sequentially deposited. The first metal film is patterned using a patterning process to form a pattern of a first insulating layer (i.e., a buffer layer) 21 and a shielding layer 22 disposed on the second substrate 20. The position of the shielding layer 22 corresponds to the position of the subsequently formed first interval region 100, and is used to confine the light emitted by each sub-pixel to its corresponding pixel, shield the lateral light leakage of the pixel, and prevent color mixing of the transmitted image.

[0129] In some exemplary embodiments, the shielding layer 22 includes multiple sets of light-shielding units arranged sequentially along a first direction x, and each set of light-shielding units includes multiple independent sub-light-shielding units 22a arranged sequentially along a second direction y.

[0130] In some exemplary embodiments, each light-shielding unit includes a first light-shielding portion 221 and a second light-shielding portion 222. The orthographic projection of the first light-shielding portion 221 on the second base 20 does not overlap with the orthographic projection of the subsequently formed second interval region 200 on the second base 20. The orthographic projection of the second light-shielding portion 222 on the second base 20 overlaps with the orthographic projection of the subsequently formed second interval region 200 on the second base 20. The width of the second light-shielding portion 222 in the first direction x is smaller than the width of the first light-shielding portion 221 in the first direction x.

[0131] In some exemplary embodiments, the width W2 of the second light-shielding portion 222 in the first direction x is between 3 micrometers and 5 micrometers. For example, the width W2 of the second light-shielding portion 222 in the first direction x can be 4.0 micrometers.

[0132] In some exemplary embodiments, the width W3 of the first light-shielding portion 221 in the first direction x is between 5 micrometers and 8 micrometers. For example, the width W3 of the first light-shielding portion 221 in the first direction x can be 6.4 micrometers.

[0133] (II) A pattern of array structure layer 23 is formed on a second substrate 20 having the aforementioned pattern.

[0134] Forming an array structure layer 23, including:

[0135] (a) Forming an active semiconductor layer 231 pattern. Forming an active semiconductor layer 231 pattern includes: sequentially depositing a second insulating film and an active layer film on a second substrate 20 on which the aforementioned pattern is formed; patterning the active layer film using a patterning process to form a second insulating layer covering the pattern of the shielding layer 22; and an active semiconductor layer 231 pattern disposed on the second insulating layer, wherein the position of the active semiconductor layer 231 corresponds to the position of the gate electrode 233b subsequently formed.

[0136] (a) Forming a gate electrode layer 233 pattern. Forming a gate electrode layer 233 pattern includes: sequentially depositing a third insulating film and a second metal film on a second substrate 20 on which the aforementioned pattern is formed; patterning the second metal film using a patterning process to form a third insulating layer 232 covering the active semiconductor layer 231 pattern; and a gate electrode layer 233 pattern disposed on the third insulating layer 232. The gate electrode layer 233 may include at least one gate line 233a and at least one gate electrode 233b pattern, and the gate line 233a and the gate electrode 233b may be an integral structure.

[0137] (c) Forming source / drain electrode layer patterns. Forming source / drain electrode layer patterns includes: depositing a fourth insulating film and a third metal film on a second substrate 20 on which the aforementioned patterns are formed; patterning the fourth insulating film and the third metal film respectively using a patterning process to form a fourth insulating layer 234 and source / drain electrode layer patterns disposed on the gate electrode layer 233. The source / drain electrode layers may include patterns of data lines (not shown in the figure), source electrodes 235a and drain electrodes 235b. The source electrode 235a and the data lines may be an integral structure interconnected. One end of the source electrode 235a adjacent to the drain electrode 235b is connected to one end of the active semiconductor layer 231 through a via on the fourth insulating layer 234. One end of the drain electrode 235b adjacent to the source electrode 235a is connected to the other end of the active semiconductor layer 231 through a via on the fourth insulating layer 234. A conductive channel is formed between the source electrode 235a and the drain electrode 235b.

[0138] (III) A pattern of insulating layer 24 is formed on a second substrate 20 having the aforementioned pattern.

[0139] The process of forming the insulating layer 24 pattern includes: depositing a fifth insulating film on a second substrate 20 on which the aforementioned pattern is formed, forming an insulating layer 24 covering the source and drain electrode layer pattern, patterning the insulating layer 24 through a patterning process to form a first via K1 pattern, and etching away the insulating layer 24 within the first via K1 to expose the surface of the drain electrode 235b.

[0140] (IV) Forming a pattern for the reflective layer 25. Forming a pattern for the reflective layer 25 includes: depositing a transparent conductive film on a second substrate 20 on which the aforementioned pattern is formed, and patterning the transparent conductive film using a patterning process to form a pattern for the reflective layer 25. The reflective layer 25 includes a plurality of reflective units 25a arranged in an array along a first direction x and a second direction y. The plurality of reflective units 25a form a plurality of reflective rows and a plurality of reflective columns. The spacing between adjacent reflective columns forms a first spacing region 100, and the spacing between adjacent reflective rows forms a second spacing region 200. The reflective units 25a are connected to the drain electrode 235b through a first via K1. The reflective units 25a also serve as pixel electrodes.

[0141] In this embodiment, the first metal thin film can be a metallic material, such as molybdenum (Mo). The second and third metal thin films can be metallic materials, such as silver (Ag), copper (Cu), aluminum (Al), molybdenum (Mo), or alloys of the above metals, and can be a single-layer structure or a multi-layer composite structure. The first to fourth insulating films can be silicon oxide (SiOx), silicon nitride (SiNx), silicon oxynitride (SiON), or aluminum oxide (AlOx), hafnium oxide (HfOx), tantalum oxide (TaOx), and can be single-layer, multi-layer, or composite layers, deposited using chemical vapor deposition (CVD) or plasma-enhanced chemical vapor deposition (PECVD). Typically, the third insulating layer 232 is also called the gate insulating (GI) layer, the fourth insulating layer 234 is also called the passivation (PVX) layer, and the insulating layer 24 is also called the planarization (PLN) layer. The transparent conductive film can be an ITO-Ag-ITO alloy, deposited using magnetron sputtering.

[0142] In some exemplary embodiments, the first spacing region 100 includes a first sub-region 101 and a second sub-region 102. The orthographic projection of the first sub-region 101 on the second substrate 20 overlaps with the orthographic projection of the spacing region between each group of two adjacent sub-shading units 22a on the second substrate 20. The orthographic projection of the second sub-region 102 on the second substrate 20 does not overlap with the orthographic projection of the spacing region between each group of two adjacent sub-shading units 22a on the second substrate 20. The orthographic projection of at least one grid line 233a on the second substrate 20 covers the orthographic projection of the first sub-region 101 on the second substrate 20, and the orthographic projection of the shading unit on the second substrate 20 covers the orthographic projection of the second sub-region 102 on the second substrate 20.

[0143] (V) A polyimide (PI) solution is coated on the second substrate 20 on which the aforementioned pattern is formed. The coated PI solution is heated to evaporate the organic solvent in the PI solution, thereby forming a second alignment film 26 with a certain thickness, thus completing the preparation of the second substrate 2.

[0144] After the fabrication of the first substrate 1 and the second substrate 2 is completed, the first substrate 1 and the second substrate 2 are assembled and liquid crystal is filled between the first substrate 1 and the second substrate 2. Subsequently, a first polarizer 15 is attached to the side of the first substrate 1 away from the second substrate 2, and a second polarizer 27 is attached to the side of the second substrate 2 away from the first substrate 1.

[0145] The first polarizer 15 adopts a dual-compensation design, including a first optically clear adhesive (OCA) layer 151, a scattering film 152, a first adhesive layer 153, a first quarter-wave plate 154, a second adhesive layer 155, a half-wave plate 156, a third adhesive layer 157, a first triacetate cellulose (TAC) layer 158, a first polyvinyl alcohol (PVA) layer 159, and a second triacetate cellulose (TAC) layer 160 arranged sequentially along the direction away from the second substrate 2. The absorption axis angle of the first polyvinyl alcohol layer 159 is n°, the slow axis angle of the half-wave plate 156 is ((n+21)%180)° to ((n+23)%180)°, and the slow axis angle of the first quarter-wave plate 154 is ((n+142)%180)° to ((n+144)%180)°, where n is between 0 and 180°.

[0146] For example, the absorption axis angle of the first PVA layer 159 can be set to 35°. The half-wave plate 156 can use COP material, with a phase compensation value of 265nm to 275nm, for example, 270nm, and a slow axis angle of 56.5° to 57.5°, for example, 57°. The first quarter-wave plate 154 uses COP material, with a phase compensation value of 105nm to 115nm, for example, 110nm, and a slow axis angle of 177.5° to 178.5°, for example, 178°. Both the first TAC layer 158 and the second TAC layer 160 are 0-TAC.

[0147] The phase retardation (Re value) of the liquid crystal layer 3 is 213.5 nm to 214.5 nm. For example, the phase retardation of the liquid crystal layer 3 is 214 nm. The rubbing angle of the first substrate 1 is -94.5° to -93.5°. The rubbing angle of the second substrate 2 is 137.5° to 138.5°. The TA of the liquid crystal layer 3 is 51.5° to 52.5°. For example, the rubbing angle of the first substrate 1 is -94°. The rubbing angle of the second substrate 2 is 138°. The TA is 52°.

[0148] The second polarizer 27 adopts a single compensation design, including a second optically clear adhesive (OCA) layer 271, a second quarter-wave plate 272, a fourth adhesive layer 273, a third cellulose triacetate (TAC) layer 274, a second polyvinyl alcohol (PVA) layer 275, a fourth cellulose triacetate (TAC) layer 276, a fifth adhesive layer 277, and an advanced patterning film (APF) layer 278 arranged sequentially along the direction away from the first substrate 1. The absorption axis angle of the second PVA layer 275 is ((n+89)%180)° to ((n+91)%180)°, and the slow axis angle of the second quarter-wave plate 272 is ((n+139)%180)° to ((n+141)%180)°.

[0149] For example, the absorption axis angle of the second PVA layer 275 is 124.5° to 125.5°, such as 125°. The second quarter-wave plate 272 uses COP material, and the phase compensation value can be 135nm to 145nm, with a slow axis angle of 174.5° to 175.5°, such as 140nm. The third TAC layer 274 and the fourth TAC layer 276 are both 0-TAC.

[0150] As can be seen from the above description of this embodiment, the display panel of this disclosure, by setting multiple light-shielding units and multiple "patch" black matrices, eliminates the need for strip-shaped black matrices to prevent color mixing of the transmitted image. Therefore, the entire display panel can achieve a design that maximizes reflectivity, without the influence of process issues such as black matrix peeling or alignment fluctuations. The color mixing ratio of the transmitted image can be reduced to below 5%, thereby improving the user experience. The liquid crystal display panel of this embodiment can be manufactured using existing process equipment and methods, which is easy to implement, has good process compatibility, low production cost, and high product quality, and has good application prospects.

[0151] Furthermore, this embodiment of the present disclosure designs the optical path and compensation value of the compensation film using the Bonga sphere model, and adjusts the ratio of RGB light output in the L0 state. This allows the blue light, which was originally beyond the extreme position, to travel a suitable distance to reach the extreme position by adjusting the angle of the compensation film, while the red and green light fail to reach the extreme position. As a result, in the L0 state, the amount of red and green light leakage is greater than that of blue light leakage, thus improving the problem of blue bias in the L0 state.

[0152] In this embodiment, the structure of the color filter layer 12, the common electrode layer 14, and the first polarizer 15 in the first substrate 1 is merely an example. In actual implementation, the positions of the three layers can be adjusted according to actual needs. For example, the first polarizer 15 can be disposed on the color filter layer 12. Furthermore, the first substrate 1 may not include the color filter layer 12, but instead the color filter layer 12 may be disposed on the second substrate 2. The first substrate 1 and the second substrate 2 may also include other layers, etc. Those skilled in the art can understand and extend this concept based on common knowledge and existing technology; therefore, no specific limitations are made here.

[0153] In some exemplary embodiments, the display panel provided in this disclosure may further include a touch structure layer disposed on the outer side of the first substrate (i.e., the side of the first substrate away from the second substrate). In one exemplary embodiment, the touch structure layer can be formed by an on-cell process. In this case, before attaching the first polarizer 15, ITO metal blocks are formed on the side of the first substrate 1 away from the second substrate 2 through coating, development, and etching processes. The metal lines of each block are concentrated at one side of the display panel (i.e., the bonding area), where the touch chip (IC) is bonded to achieve the touch function of the display panel. In this example, the touch structure layer is located between the first substrate 10 and the first polarizer 15.

[0154] Figure 16 This is a schematic diagram of a planar structure of a touch structure layer in a display panel, illustrating a self-contained structure, as shown in the exemplary embodiment of this disclosure. Figure 16 As shown, in a plane parallel to the display panel, the display panel includes a touch area 100 and a bonding area 210 located on one side of the touch area 100 in the second direction y. The touch area 100 may include a plurality of touch electrodes 300 arranged in a regular pattern. In an exemplary embodiment, the touch electrodes 300 are rectangular and arranged in an M x N matrix, where M and N are both natural numbers greater than 1. The touch area 100 may be divided into N electrode areas 110 and N lead areas 120. The electrode areas 110 and lead areas 120 are strip-shaped extending along the second direction y. The strip-shaped electrode areas 110 and the strip-shaped lead areas 120 are alternately arranged along the first direction x, that is, except for the electrode areas and lead areas at the edge positions, one lead area 120 is disposed between two electrode areas 110, and one electrode area 110 is disposed between two lead areas 120. Each electrode region 110 includes M touch electrodes 300 arranged sequentially along the second direction y, and each lead region 120 includes M touch traces 310 arranged sequentially along the first direction x. The first end of each touch trace 310 is connected to a touch electrode 300, and the second end extends along the second direction y to the bonding region 210.

[0155] In another exemplary embodiment, the touch structure layer can also be formed using GFF (Glass Film Film) bonding technology. In this case, two conductive coating layers are combined with a substrate to form the touch structure layer. The formed touch structure layer is then directly attached to the side of the first polarizer 15 in the first substrate 1 that is away from the second substrate 2 to realize the touch function of the display panel. In this example, the touch structure layer is located on the side of the first polarizer 15 that is away from the first substrate 10.

[0156] This disclosure also provides a method for manufacturing a display panel, the method comprising:

[0157] S1. A first substrate and a second substrate are formed respectively. The second substrate includes a second base and a shielding layer, an array structure layer, an insulating layer, and a reflective layer sequentially disposed on the second base. The array structure layer includes a gate electrode layer, which includes multiple gate lines. The shielding layer includes multiple sets of light-shielding units arranged sequentially along a first direction. Each set of light-shielding units includes multiple independent sub-light-shielding units arranged sequentially along a second direction. The sub-light-shielding units extend along the second direction, and the first direction intersects with the second direction. The reflective layer includes multiple reflective units arranged in an array along the first and second directions. The multiple reflective units form multiple reflective rows and multiple reflective columns. The interval between adjacent reflective columns forms a first interval region, and the interval between adjacent reflective rows forms a second interval region. The first interval region includes a first sub-region and a second sub-region. The orthographic projection of the first sub-region on the second base overlaps with the orthographic projection of the interval region between two adjacent sub-light-shielding units in each set on the second base. The orthographic projection of the second sub-region on the second base does not overlap with the orthographic projection of the interval region between two adjacent sub-light-shielding units in each set on the second base.

[0158] S2. The first substrate and the second substrate are assembled, and liquid crystal is filled between the first substrate and the second substrate.

[0159] In some exemplary embodiments, the orthographic projection of at least one grid line on the second substrate covers the orthographic projection of the first sub-region on the second substrate, and the orthographic projection of the light-shielding unit on the second substrate covers the orthographic projection of the second sub-region on the second substrate.

[0160] In some exemplary embodiments, the array structure layer further includes an active semiconductor layer and a source / drain electrode layer, the source / drain electrode layer includes a source electrode and a drain electrode, the insulating layer is provided with a first via, and the reflective unit is connected to the drain electrode through the first via;

[0161] The first substrate includes a first base and a black matrix layer, a color filter layer and a common electrode layer sequentially disposed on the first base. At least one of the first substrate and the second substrate further includes a spacer.

[0162] The black matrix layer includes at least one first black matrix and at least one second black matrix, wherein the orthographic projection of the at least one first black matrix on the first substrate covers the orthographic projection of a spacer on the first substrate; and the orthographic projection of the at least one second black matrix on the first substrate covers the orthographic projection of a first via on the first substrate.

[0163] The reflective layer can be made of a transparent conductive material, such as an ITO-Ag-ITO alloy.

[0164] This disclosure also provides a method for manufacturing a display panel, the method comprising:

[0165] S1' forms the first substrate and the second substrate respectively;

[0166] S2': The first substrate and the second substrate are assembled and liquid crystal is filled between the first substrate and the second substrate;

[0167] S3'. A first polarizer is attached to the side of the first substrate away from the second substrate. The first polarizer includes a first quarter-wave plate, a second adhesive layer, a half-wave plate, a third adhesive layer, a first triacetate cellulose (TAC) layer, a first polyvinyl alcohol (PVA) layer, and a second triacetate cellulose (TAC) layer arranged sequentially along the direction away from the second substrate. The absorption axis angle of the first polyvinyl alcohol (PVA) layer is n°, the slow axis angle of the half-wave plate is ((n+21)%180)° to ((n+23)%180)°, and the slow axis angle of the first quarter-wave plate is ((n+142)%180)° to ((n+144)%180)°, where n is between 0 and 180°.

[0168] The specific manufacturing process of the display panel and the structure of the first and second polarizers have been described in detail in the previous embodiments, and will not be repeated here.

[0169] The method for manufacturing a display panel provided in this disclosure allows the orthogonal projection of the grid lines and the light-shielding unit onto the second substrate to cover the orthogonal projection of the first interval area onto the second substrate. As a result, the entire display panel does not need to be equipped with a striped black matrix to prevent color mixing of the transmitted image. Therefore, the entire display panel can achieve a design that maximizes reflectivity and is not affected by process problems such as black matrix peeling or alignment fluctuations. The color mixing ratio of the transmitted image can be reduced to below 5%, thereby improving the user experience.

[0170] Furthermore, the display panel manufacturing method provided in this disclosure uses a Bonga sphere model to design the optical path and compensation value of the compensation film, and adjusts the ratio of RGB light output in the L0 state. This allows the blue light, which was originally beyond the extreme position, to travel a suitable distance to reach the extreme position by adjusting the angle of the compensation film, while the red and green light fail to reach the extreme position. As a result, in the L0 state, the amount of red and green light leakage is greater than that of blue light leakage, thus improving the problem of blue bias in the L0 state.

[0171] This disclosure also provides a display device, including the aforementioned display panel. The display device can be any product or component with a display function, such as a mobile phone, tablet computer, television, monitor, laptop computer, digital photo frame, or navigator, or it can be a wearable electronic device such as a smartwatch or smart bracelet.

[0172] In recent years, smart bracelets (watches) have become increasingly popular among consumers due to their portability, timekeeping, step counting, sleep monitoring, and color display functions. However, their battery life often falls short of usage requirements. The transflective display device provided in this embodiment can effectively increase the battery life of smart bracelets (watches).

[0173] While the embodiments disclosed herein are as described above, the content is merely for the purpose of facilitating understanding of this disclosure and is not intended to limit this disclosure. Any person skilled in the art to which this disclosure pertains may make any modifications and changes in the form and details of the implementation without departing from the spirit and scope disclosed herein; however, the scope of patent protection of this disclosure shall still be determined by the scope defined in the appended claims.

Claims

1. A display panel, characterized in that, include: A first substrate and a second substrate disposed opposite to each other, and a liquid crystal layer sandwiched between the first substrate and the second substrate, wherein: The second substrate includes a second base and a shielding layer, an array structure layer, an insulating layer and a reflective layer sequentially disposed on the second base. The array structure layer includes a gate electrode layer and the gate electrode layer includes multiple gate lines. The shielding layer includes multiple sets of light-shielding units arranged sequentially along a first direction, and each set of light-shielding units includes multiple independent sub-light-shielding units arranged sequentially along a second direction, wherein the first direction intersects the second direction; the reflective layer includes multiple reflective units arranged in an array along the first direction and the second direction, wherein the multiple reflective units form multiple reflective rows and multiple reflective columns, wherein the interval between adjacent reflective columns forms a first interval region, and the interval between adjacent reflective rows forms a second interval region; The first interval region includes a first sub-region and a second sub-region. The orthographic projection of the first sub-region on the second substrate overlaps with the orthographic projection of the interval region between each group of two adjacent sub-shading units on the second substrate. The orthographic projection of the second sub-region on the second substrate does not overlap with the orthographic projection of the interval region between each group of two adjacent sub-shading units on the second substrate.

2. The display panel according to claim 1, characterized in that, The orthographic projection of at least one grid line on the second substrate covers the orthographic projection of the first sub-region on the second substrate, and the orthographic projection of the light-shielding unit on the second substrate covers the orthographic projection of the second sub-region on the second substrate.

3. The display panel according to claim 1, characterized in that, The width of the first sub-region in the second direction is 2 micrometers to 4 micrometers.

4. The display panel according to claim 1, characterized in that, Each of the light-shielding units includes a first light-shielding part and a second light-shielding part, wherein the orthographic projection of the first light-shielding part on the second substrate does not overlap with the orthographic projection of the second interval area on the second substrate; The orthographic projection of the second light-shielding portion onto the second substrate overlaps with the orthographic projection of the second interval area onto the second substrate, and the width of the second light-shielding portion in the first direction is smaller than the width of the first light-shielding portion in the first direction.

5. The display panel according to claim 4, characterized in that, The width of the second light-shielding portion in the first direction is between 3 micrometers and 5 micrometers.

6. The display panel according to claim 4, characterized in that, The width of the first light-shielding portion in the first direction is between 5 micrometers and 8 micrometers.

7. The display panel according to claim 4, characterized in that, The first light-shielding portion includes a first edge and a second edge, which are disposed opposite to each other in a first direction. The first interval region includes a third edge and a fourth edge, which are disposed opposite to each other in a first direction. The interval between the first edge of the first light-shielding portion and the corresponding third edge of the first interval region is 0.8 micrometers to 1.5 micrometers, and the interval between the second edge of the first light-shielding portion and the corresponding fourth edge of the first interval region is 0.8 micrometers to 1.5 micrometers.

8. The display panel according to claim 1, characterized in that, The array structure layer further includes an active semiconductor layer and a source / drain electrode layer. The source / drain electrode layer includes a source electrode and a drain electrode. The insulating layer is provided with a first via. The reflective unit is connected to the drain electrode through the first via. The first substrate includes a first base and a black matrix layer and a color filter layer sequentially disposed on the first base; at least one of the first substrate and the second substrate further includes a spacer. The black matrix layer includes at least one first black matrix and at least one second black matrix, wherein the orthographic projection of at least one first black matrix on the first substrate covers the orthographic projection of one of the spacers on the first substrate; At least one of the second black matrices projected onto the first substrate overlaps the first via's projected onto the first substrate.

9. The display panel according to claim 1, characterized in that, The first substrate further includes a first polarizer, which is disposed on the side of the first substrate away from the second substrate. The first polarizer includes a first quarter-wave plate, a second adhesive layer, a half-wave plate, a third adhesive layer, a first triacetate cellulose layer, a first polyvinyl alcohol layer, and a second triacetate cellulose layer arranged sequentially along the direction away from the second substrate. The absorption axis angle of the first polyvinyl alcohol layer is n°, the slow axis angle of the half-wave plate is ((n+21)%180)° to ((n+23)%180)°, and the slow axis angle of the first quarter-wave plate is ((n+142)%180)° to ((n+144)%180)°, where n is between 0 and 180°.

10. The display panel according to claim 1, characterized in that, The second substrate further includes a second polarizer, which is disposed on the side of the second substrate away from the first substrate. The second polarizer includes a second quarter-wave plate, a fourth adhesive layer, a third cellulose triacetate layer, a second polyvinyl alcohol layer, and a fourth cellulose triacetate layer arranged sequentially along the direction away from the first substrate. The absorption axis angle of the second polyvinyl alcohol layer is ((n+89)%180)° to ((n+91)%180)°, and the slow axis angle of the second quarter-wave plate is ((n+139)%180)° to ((n+141)%180)°.

11. The display panel according to claim 1, characterized in that, It also includes a touch structure layer, which is disposed on the side of the first substrate away from the second substrate; In a plane parallel to the display panel, the display panel includes a touch area and a bonding area located on one side of the touch area in a second direction. The touch area includes N electrode areas and N lead areas, both of which extend along the second direction. The electrode areas and lead areas are alternately arranged along the first direction. Each electrode area includes M touch electrodes arranged sequentially along the second direction. Each lead area includes M touch traces arranged sequentially along the first direction. The first end of each touch trace is connected to one of the touch electrodes, and the second end extends along the second direction to the bonding area. Here, M and N are both natural numbers greater than 1.

12. A display device, characterized in that, Includes the display panel as described in any one of claims 1 to 11.

13. A method for manufacturing a display panel, characterized in that, include: A first substrate and a second substrate are formed respectively. The second substrate includes a shielding layer, an array structure layer, an insulating layer, and a reflective layer sequentially disposed on the second substrate. The array structure layer includes a gate electrode layer, which includes multiple gate lines. The shielding layer includes multiple groups of light-shielding units arranged sequentially along a first direction. Each group of light-shielding units includes multiple independent sub-light-shielding units arranged sequentially along a second direction. The sub-light-shielding units extend along the second direction, and the first direction intersects the second direction. The reflective layer includes multiple reflective units arranged in an array along the first and second directions. The multiple reflective units form multiple reflective rows and multiple reflective columns. The interval region between adjacent reflective columns forms a first interval region, and the interval region between adjacent reflective rows forms a second interval region. The first interval region includes a first sub-region and a second sub-region. The orthographic projection of the first sub-region on the second substrate overlaps with the orthographic projection of the interval region between two adjacent sub-light-shielding units in each group on the second substrate. The orthographic projection of the second sub-region on the second substrate does not overlap with the orthographic projection of the interval region between two adjacent sub-light-shielding units in each group on the second substrate. The first substrate and the second substrate are assembled, and liquid crystal is filled between the first substrate and the second substrate.

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