Method for preparing planar net texture based on eccentric fixed-axis circular motion

Abstract

This invention provides a method for preparing planar mesh textures based on eccentric fixed-axis circular motion. The required apparatus includes: a base, an eccentric rotation loading mechanism, a sample clamping disk, a disc sample, hard particles, a texture processing disk, and a rotary motor. The processing method includes: the hard particles are fixed on the texture processing disk and move in a circular motion at a certain speed along with the texture processing disk; the disc sample is arranged on the sample clamping disk and moves in an eccentric fixed-axis circular motion relative to the texture processing disk at a certain speed under constant axial pressure; the planar mesh texture is obtained under the combined action of the two motions. The surface texture processing method provided by this invention can efficiently and conveniently prepare planar mesh textures with different geometric features by adjusting process parameters such as the speed ratio of the sample clamping disk and the texture processing disk, the eccentricity of the sample clamping disk, the installation position of the hard particles, the axial pressure, and the size of the hard particles.

Description

Technical Field

[0001] This invention relates to the technical field of surface texture preparation, specifically to a method for preparing planar mesh texture based on eccentric fixed-axis circular motion. Background Technology

[0002] During bearing service, the bearing friction interface experiences various friction conditions: fluid lubrication, boundary lubrication, and dry friction. Under fluid lubrication conditions, the heat generated by friction leads to an increase in the temperature of the lubricating medium, a decrease in viscosity, and a reduction in the liquid film's load-carrying capacity and lubrication performance. Under boundary lubrication conditions, the lubricating medium at the bearing interface is insufficient, and the fluid lubrication effect is not significant. Under dry friction conditions, the intense frictional behavior at the thrust bearing contact interface directly causes severe wear, affecting bearing performance and reducing its service life. Surface texture can significantly improve bearing lubrication characteristics, increase load-carrying capacity, store lubricating oil, accommodate wear debris, and reduce the coefficient of friction and wear rate, making it an effective method to improve bearing performance and extend bearing service life.

[0003] Patent publication number CN109570932B discloses a surface texture that reduces friction and improves oil film bearing capacity, along with its manufacturing method. It employs a laser repeated scanning method, selecting the appropriate processing technology based on the desired surface texture arrangement. This surface texture can improve oil film bearing capacity and reduce friction on the moving contact surface of machinery. Patent publication number CN105864285B discloses an aerospace joint bearing with microtexture and its manufacturing method. Its characteristic is the use of an ultrasonic rolling tool with micro-protrusions to roll the outer surface of the bearing inner ring and the inner surface of the bearing outer ring, achieving the formation of a surface microtexture. This microtexture can store grease, improving the lubrication performance of the friction pair between the inner and outer rings. However, the above technologies require expensive equipment, have low processing efficiency, and are not suitable for preparing micron-level textures on large surfaces.

[0004] Patent publication number CN106985017B discloses an internal surface microtexturing forming device. The device includes a positioning device, a driving device mounted on the positioning device, and a processing device mounted on the driving device. The processing device is cylindrical, and its outer circumferential surface is provided with a plurality of abrasive grains, at least partially protruding from the surface of the processing device. The positioning device pushes the driving device to a moving position, causing the abrasive grains to adhere to the inner cavity wall of the workpiece. The driving device drives the processing device to rotate, causing the abrasive grains to grind the inner cavity wall of the workpiece, forming a microtexture. However, the size and shape of the microstructure processed using this device are difficult to control, and a high-power grinding shaft is required.

[0005] Therefore, a technical solution is needed to improve the above-mentioned technical problems. Summary of the Invention

[0006] In view of the deficiencies in the prior art, the purpose of this invention is to provide a method for preparing planar mesh texture based on eccentric fixed-axis circular motion.

[0007] According to the present invention, a planar mesh texture preparation method based on eccentric fixed-axis circular motion is provided, which employs a planar mesh texture preparation device based on eccentric fixed-axis circular motion, including: a base, an eccentric rotation loading mechanism, a sample clamping disk, a disc sample, hard particles, a texture processing disk, and a rotary motor.

[0008] The eccentric rotary loading mechanism is mounted on the base; the sample clamping disk is mounted on the eccentric rotary loading mechanism; the disc sample is placed in the sample clamping disk; the hard particles are fixed on the texture processing disk; the texture processing disk is mounted on the rotary motor; the rotary motor is mounted on the base.

[0009] The sample clamping disk is mounted on the eccentric rotary loading mechanism by screws; the sample clamping disk has multiple circular through holes with a radius of r1, and the circular through holes are used to place a circular sample with a radius of r1. The number and size of the circular through holes can be changed according to the requirements of the sample clamping disk.

[0010] The eccentric rotary loading mechanism changes the eccentricity e through a manual hinge mechanism on the base, and loads the disc sample through a cylinder and a push rod; the radius of the texture processing disc is r2, the center distance between the sample clamping disc and the disc sample is r3, and the adjustment range of the eccentricity e of the eccentric rotary loading mechanism is 0 to (r2-r1-r3).

[0011] The method includes the following steps:

[0012] Step S1: Design the hard particle texture processing path, and the resulting texture processing path is in the form of planar intersecting arcs;

[0013] Step S2: Based on the design results of step S1, fix the hard particles at the specified positions on the texture processing plate;

[0014] Step S3: Based on the design results of step S1, adjust the eccentricity of the sample clamping plate through the eccentric rotation loading mechanism, place the disc sample in the sample clamping plate, and apply a suitable axial force to the disc sample using the eccentric rotation loading mechanism.

[0015] Step S4: Based on the design results of step S1, set the rotation speed of the sample clamping disk and the texture processing disk to prepare a planar mesh texture.

[0016] Preferably, an abrasive machining method based on eccentric fixed-axis circular motion is adopted, and the rotational speed n of the texture processing disk is adjusted. D The rotational speed n of the sample clamping disc WThe eccentricity e of the sample clamping disk and the position (r) of the hard particles on the texture processing disk. p θ p By adjusting the axial load F and the hard particle size R, planar mesh textures with different planar shapes and area ratios can be obtained; cross mesh textures with different widths and depths can be obtained.

[0017] Preferably, in step S1, a motion trajectory model of the hard particles is first established, and then the motion trajectory is calculated and solved using MatLab software to obtain the texture processing parameters; the specific process of establishing the motion trajectory model of the hard particles is as follows:

[0018] Based on the initial and operational states, a coordinate system is defined for the sample clamping disk and the texture processing disk, where... The fixed coordinate systems Wx represent the initial states of the sample clamping disk and the texture processing disk, respectively. W y W Dx D y D These are the instantaneous coordinate systems Wx and Wx, representing the operating states of the sample clamping disk and the texture processing disk, respectively. W y W Fixed on the sample holder plate, coordinate system Dx D y D Fixed on the texture processing tray; angular velocity of the sample clamping tray rotation angular velocity of texture processing disc The position of the hard particle P on the texture processing disk is (r p θ p ), where the DP connection is connected to x D The angle between the positive axes is θ. P Then its coordinate system Dx in the texture processing disk D y D The coordinate position in the image is represented as:

[0019]

[0020] Place point P on Dx D y D If a position in a coordinate system is represented by polar coordinates, then it is expressed as:

[0021]

[0022] When the texture processing disc rotates, due to the hard particles and Dx D y D The coordinate system is fixed on the texture processing disk, therefore the hard particles are in Dx D y D The position coordinates of the coordinate system are fixed; however, in the instantaneous coordinate system Wx of the disk sample...W y W Under these conditions, the position of the hard particles changes; therefore, in motion, if the sample clamping disk is used as the observation coordinate system, the position of the hard particles relative to the sample clamping disk changes, forming a honing motion trajectory; for a given texture processing disk rotation speed ω D and the rotational speed ω of the sample clamping disk W The eccentricity e between the sample processing disk and the sample clamping disk, and the coordinate system Dx of the hard particles in the texture processing disk. D y D The position coordinates of the hard particles in the sample clamping disk coordinate system Wx W y W The trajectory is determined and represented below;

[0023] Let the hard particles be in the coordinate system Wx of the sample clamping disk. W y W The following position coordinates are:

[0024]

[0025] Hard particles are tested in the sample clamping disk coordinate system Wx W y W The position coordinates below and their coordinates in the texture processing disk coordinate system Dx D y D The relationship between the position coordinates of the coordinate system is as follows:

[0026]

[0027] in:

[0028] Let Wx be the coordinate system of the sample clamping disk. W y W to the initial coordinate system of the sample clamping plate Rotation transformation matrix:

[0029]

[0030] θ w θ is the angle of rotation of the sample clamping disk. w =ω w t;

[0031] Initial coordinate system of the sample clamping disk To the initial coordinate system of the texture processing disk Translation transformation matrix:

[0032]

[0033] Initial coordinate system for the texture processing disk To the texture processing disk coordinate system Dx D y D Rotation transformation matrix:

[0034]

[0035] θ D θ is the angle of rotation of the texture processing disc. D =ω D t;

[0036] The combined solution is as follows:

[0037]

[0038] Will θ w =ω w t,θ D =ω D Substituting t into the above equation and simplifying, we can obtain the trajectory of the hard particle on the sample holder plate:

[0039]

[0040] Since the disc sample is placed on the sample clamping plate and the two remain relatively stationary, the trajectory of motion is also the trajectory of the hard particles on the disc sample, that is, the planar cross-textured texture shape on the disc sample.

[0041] Preferably, in step S2, a flexible pad with a single square hole is adhered to the surface of the texture processing disc, and hard particles are embedded in the square hole of the flexible pad on the surface of the texture processing disc and fixed at a designated position on the texture processing disc; the position (r) of the hard particles p θ p According to changes in demand.

[0042] Preferably, in step S3, a layer of flexible anti-slip material is attached to the cylindrical side of the disc sample. The disc sample is placed into the circular hole on the sample clamping plate. The flexible anti-slip material undergoes slight deformation and forms a clamping force, so the disc sample does not move in the circular hole of the sample clamping plate.

[0043] Preferably, in step S4, the sample clamping disk and the texture processing disk rotate in the same direction.

[0044] Preferably, the area ratio Sp of the prepared planar mesh texture ranges from 15% to 38%; the cross angle θ of the planar mesh texture ranges from 30° to 60°; the cross section of the planar mesh texture is triangular, with a depth of 2 to 5 μm and a width of 20 to 40 μm.

[0045] Compared with the prior art, the present invention has the following beneficial effects:

[0046] 1. The planar texture preparation device and method of the present invention adopts a combination of eccentric fixed-axis circular motion of the sample clamping disk and fixed-axis circular motion of the texture processing disk to process planar cross-textured textures. As the texture processing disk rotates, the hard particles can effectively prepare large-size planar textures on the disc sample through grinding, resulting in high preparation efficiency. At the same time, by simply changing the sample clamping disk with different numbers and sizes of circular holes, the preparation of planar cross-textured textures on disc samples of specified numbers and sizes can be achieved simultaneously, further improving the preparation efficiency.

[0047] 2. The planar texture preparation device and method of the present invention, by establishing a hard particle motion trajectory model, can predict the shape of the planar mesh texture under specified processing parameters; based on the established hard particle motion trajectory model, planar mesh textures with different geometric features can be designed by adjusting process parameters such as the rotational speed ratio of the sample clamping plate and the texture processing plate, the eccentricity of the sample clamping plate, and the installation position of the hard particles.

[0048] 3. The planar texture preparation apparatus and method of the present invention achieve adaptive clamping of the disc sample by attaching a flexible anti-slip material to the cylindrical side of the disc sample, thereby avoiding unexpected movement of the disc sample; and by using a flexible pad on the surface of the texture processing disc as a sacrificial layer, the fixed position of the hard particles can be flexibly and conveniently replaced. Attached Figure Description

[0049] Other features, objects, and advantages of the present invention will become more apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings:

[0050] Figure 1 This is a schematic diagram of the planar mesh texture preparation device of the present invention;

[0051] Figure 2 This is a schematic diagram of the coordinate system of the sample clamping disk and the texture processing disk of the present invention;

[0052] Figure 3 This is a schematic diagram of the motion trajectory of the hard particles of the present invention;

[0053] Figure 4 This is a schematic diagram of the sample clamping disc of the present invention;

[0054] Figure 5 This is a schematic diagram of the arrangement method of the disc sample in the sample clamping disk of the present invention.

[0055] Figure 6 This is a schematic diagram of the method for fixing hard particles on a textured processing disc according to the present invention;

[0056] Figure 7 This is a schematic diagram illustrating the principle of preparing the planar mesh texture of the present invention. Detailed Implementation

[0057] The present invention will now be described in detail with reference to specific embodiments. These embodiments will help those skilled in the art to further understand the present invention, but do not limit the invention in any way. It should be noted that those skilled in the art can make several changes and improvements without departing from the concept of the present invention. These all fall within the protection scope of the present invention.

[0058] Example 1:

[0059] According to the present invention, a planar mesh texture preparation method based on eccentric fixed-axis circular motion is provided, which employs a planar mesh texture preparation device based on eccentric fixed-axis circular motion, including: a base 1, an eccentric rotation loading mechanism 2, a sample clamping disk 3, a disc sample 4, hard particles 5, a texture processing disk 6, and a rotary motor 7.

[0060] The eccentric rotary loading mechanism 2 is mounted on the base 1; the sample clamping disk 3 is mounted on the eccentric rotary loading mechanism 2; the disc sample 3 is placed in the sample clamping disk 3; the hard particle 5 is fixed on the texture processing disk 6; the texture processing disk 6 is mounted on the rotary motor 7; the rotary motor 7 is mounted on the base 1.

[0061] The sample clamping disk 3 is mounted on the eccentric rotary loading mechanism 2 by screws; the sample clamping disk 3 has multiple circular through holes with a radius of r1, and the circular through holes are used to place the circular sample 4 with a radius of r1. The number and size of the circular through holes of the sample clamping disk 3 can be changed according to the requirements.

[0062] The eccentric rotation loading mechanism 2 changes the eccentricity e through the manual hinge mechanism on the base 1, and loads the disc sample 4 through the cylinder and push rod; the radius of the texture processing disc 6 is r2, the center distance between the sample clamping disc 3 and the disc sample 4 is r3, and the adjustment range of the eccentricity e of the eccentric rotation loading mechanism 2 is 0 to (r2-r1-r3).

[0063] The method includes the following steps:

[0064] Step S1: Design the hard particle texture processing path, and the resulting texture processing path is in the form of planar intersecting arcs;

[0065] Step S2: Based on the design results of step S1, fix the hard particles at the specified positions on the texture processing plate;

[0066] Step S3: Based on the design results of step S1, adjust the eccentricity of the sample clamping plate through the eccentric rotation loading mechanism, place the disc sample in the sample clamping plate, and apply a suitable axial force to the disc sample using the eccentric rotation loading mechanism.

[0067] Step S4: Based on the design results of step S1, set the rotation speed of the sample clamping disk and the texture processing disk to prepare a planar mesh texture.

[0068] An abrasive machining method based on eccentric fixed-axis circular motion is adopted, and the rotational speed n of the texture processing disk is adjusted. D The rotational speed n of the sample clamping disc W The eccentricity e of the sample clamping disk and the position r of the hard particles on the texture processing disk. p θ p Planar mesh textures with different planar shapes and area ratios can be obtained; cross mesh textures with different widths and depths can be obtained by adjusting the axial load F and the hard particle size R.

[0069] In step S1, a motion trajectory model of the hard particles is first established, and then the motion trajectory is calculated and solved using MatLab software to obtain the texture processing parameters. The specific process of establishing the motion trajectory model of the hard particles is as follows:

[0070] Based on the initial and operational states, a coordinate system is defined for the sample clamping disk and the texture processing disk, where... The fixed coordinate systems Wx represent the initial states of the sample clamping disk and the texture processing disk, respectively. W y W Dx D y D These are the instantaneous coordinate systems Wx and Wx, representing the operating states of the sample clamping disk and the texture processing disk, respectively. W y W Fixed on the sample holder plate, coordinate system Dx D y D Fixed on the texture processing tray; angular velocity of the sample clamping tray rotation angular velocity of texture processing disc The hard particle P is located at position r on the texture processing disk. p θ p In which, the DP connection is connected to x D The angle between the positive axes is θ. P Then its coordinate system Dx in the texture processing disk D y D The coordinate position in the image is represented as:

[0071]

[0072] Place point P on Dx D y D If a position in a coordinate system is represented by polar coordinates, then it is expressed as:

[0073]

[0074] When the texture processing disc rotates, due to the hard particles and Dx D y D The coordinate system is fixed on the texture processing disk, therefore the hard particles are in Dx D y D The position coordinates of the coordinate system are fixed; however, in the instantaneous coordinate system Wx of the disk sample... W y W Under these conditions, the position of the hard particles changes; therefore, in motion, if the sample clamping disk is used as the observation coordinate system, the position of the hard particles relative to the sample clamping disk changes, forming a honing motion trajectory; for a given texture processing disk rotation speed ω D and the rotational speed ω of the sample clamping disk W The eccentricity e between the sample processing disk and the sample clamping disk, and the coordinate system Dx of the hard particles in the texture processing disk. D y D The position coordinates of the hard particles in the sample clamping disk coordinate system Wx W y W The trajectory is determined and represented below;

[0075] Let the hard particles be in the coordinate system Wx of the sample clamping disk. W y W The following position coordinates are:

[0076]

[0077] Hard particles are tested in the sample clamping disk coordinate system Wx W y W The position coordinates below and their coordinates in the texture processing disk coordinate system Dx D y D The relationship between the position coordinates of the coordinate system is as follows:

[0078]

[0079] in:

[0080] Let Wx be the coordinate system of the sample clamping disk. W y W to the initial coordinate system of the sample clamping plate Rotation transformation matrix:

[0081]

[0082] θ w θ is the angle of rotation of the sample clamping disk. w =ω w t;

[0083] Initial coordinate system of the sample clamping disk To the initial coordinate system of the texture processing disk Translation transformation matrix:

[0084]

[0085] Initial coordinate system for the texture processing disk To the texture processing disk coordinate system Dx D y D Rotation transformation matrix:

[0086]

[0087] θ D θ is the angle of rotation of the texture processing disc. D =ω D t;

[0088] Solving equations 1 to 7 simultaneously yields:

[0089]

[0090] Will θ w =ω w t,θ D =ω D Substituting t into the above equation and simplifying, we can obtain the trajectory of the hard particle on the sample holder plate:

[0091]

[0092] Since the disc sample is placed on the sample clamping plate and the two remain relatively stationary, the trajectory of motion is also the trajectory of the hard particles on the disc sample, that is, the planar cross-textured texture shape on the disc sample.

[0093] In step S2, a flexible pad with a single square hole is adhered to the surface of the texture processing disc. Hard particles are embedded in the square hole of the flexible pad on the surface of the texture processing disc and fixed at a designated position on the texture processing disc; the position r of the hard particles... p θ p According to changes in demand.

[0094] In step S3, a layer of flexible anti-slip material is attached to the cylindrical side of the disc sample. The disc sample is placed into the circular hole on the sample clamping plate. The flexible anti-slip material undergoes slight deformation and forms a clamping force, so the disc sample does not move in the circular hole of the sample clamping plate.

[0095] In step S4, the sample clamping disk and the texture processing disk rotate in the same direction.

[0096] The area ratio Sp of the prepared planar reticulated texture ranges from 15% to 38%; the cross angle θ of the planar reticulated texture ranges from 30° to 60°; the cross section of the planar reticulated texture is triangular, with a depth of 2 to 5 μm and a width of 20 to 40 μm.

[0097] Example 2:

[0098] This invention provides a planar textured surface fabrication apparatus and method based on eccentric fixed-axis circular motion. The apparatus includes: a base, an eccentric rotation loading mechanism, a sample clamping disk, a disc sample, hard particles, a texture processing disk, and a rotary motor. The processing method includes: the hard particles are fixed on the texture processing disk and move in a circular motion at a certain speed along with the texture processing disk; the disc sample is arranged on the sample clamping disk and moves in an eccentric fixed-axis circular motion relative to the texture processing disk at a certain speed under constant axial pressure; the planar textured surface fabrication is obtained under the combined action of the two motions. The surface texture processing method provided by this invention can efficiently and conveniently prepare planar textured surfaces with different geometric features by adjusting process parameters such as the speed ratio between the sample clamping disk and the texture processing disk, the eccentricity of the sample clamping disk, the installation position of the hard particles, the axial pressure, and the size of the hard particles.

[0099] A planar texture fabrication device based on eccentric fixed-axis circular motion according to the present invention includes: a base, an eccentric rotary loading mechanism 2, a sample clamping disk 3, a disc sample 5, hard particles 5, a texture processing disk 6, and a rotary motor. The eccentric rotary loading mechanism 2 is mounted on the base 1; the sample clamping disk 3 is mounted on the eccentric rotary loading mechanism 2; the disc sample 3 is placed in the sample clamping disk 2; the hard particles 5 are fixed on the texture processing disk 6; the texture processing disk 6 is mounted on the rotary motor 7; the rotary motor 7 is mounted on the base 1, as shown below. Figure 1 As shown.

[0100] The cross-hatched texture is fabricated on the surface of a disc sample using the aforementioned apparatus, and the specific method is as follows:

[0101] like Figure 2 As shown, a trajectory model of the hard particles is established. Based on the initial and running states, the coordinate systems of the sample clamping disk and the texture processing disk are defined, where... The fixed coordinate systems Wx represent the initial states of the sample clamping disk 3 and the texture processing disk 6, respectively. W y W Dx D y D These are the instantaneous coordinate systems Wx and Wx, representing the operating states of the sample clamping disk and the texture processing disk, respectively. W y W Fixed on the sample clamping plate 3, coordinate system Dx D y DFixed on the texture processing disc 6. The rotational angular velocity of the sample clamping disc 3. angular velocity of texture processing disc The position of the hard particle P on the texture processing disk is (r p θ p In this case, the DP connection is connected to x. D The angle between the positive axes is θ. P Then, in the texture processing disk 6 coordinate system Dx D y D The coordinate position in the middle can be represented as:

[0102]

[0103] Place point P on Dx D y D If a position in a coordinate system is represented by polar coordinates, it can be expressed as:

[0104]

[0105] When the texture processing disc 6 rotates, due to the hard particles 5 and Dx D y D The coordinate system is fixed on the texture processing disk 6, therefore the hard particles 5 are in Dx D y D The position coordinates of the coordinate system are fixed; however, in the instantaneous coordinate system Wx of the disk sample 4... W y W Under these conditions, the position of the hard particles 5 changes. Therefore, in motion, if the sample clamping disk 3 is taken as the observation coordinate system, the position of the hard particles 5 relative to the sample clamping disk 3 changes, forming a grinding motion trajectory. For a given rotational speed ω of the textured processing disk 6... D and the rotational speed ω of the sample clamping disk W The eccentricity e between the sample processing disk 3 and the sample clamping disk 6, and the coordinate system Dx of the hard particles 5 in the texture processing disk. D y D The position coordinates of the hard particle 5 in the sample clamping disk 3 coordinate system Wx W y W The trajectory below can then be used to determine the characterization.

[0106] Let the hard particle 5 be in the coordinate system Wx of the sample clamping disk 3. W y W The following position coordinates are:

[0107]

[0108] Hard particles 5 are tested in the sample clamping disk 3 coordinate system Wx W y W The position coordinates below and their coordinates in the texture processing disk 6 coordinate system DxD y D The relationship between the position coordinates of the coordinate system is as follows:

[0109]

[0110] in:

[0111] The three-coordinate system Wx for the sample clamping disk W y W Return to the initial coordinate system of sample clamping plate 3 (fixed). Rotation transformation matrix:

[0112]

[0113] θ w θ is the angle of rotation of the sample clamping disk 3. w =ω w t.

[0114] Initial coordinate system of sample clamping disk 3 To the initial coordinate system of texture processing disk 6 Translation transformation matrix:

[0115]

[0116] Initial coordinate system for texture processing disk 6 To the texture processing disk (6) coordinate system Dx D y D Rotation transformation matrix:

[0117]

[0118] θ D θ is the angle of rotation of the texture processing disk 6. D =ω D t.

[0119] Combining equations (1) to (7), we get:

[0120]

[0121] Will θ w =ω w t,θ D =ω D Substituting t into the above equation and simplifying, we can obtain the trajectory of the hard particle 5 on the sample clamping disk 3:

[0122]

[0123] like Figure 3 As shown, the rotational speed n of different texture processing discs is selected. D The rotational speed n of the sample clamping disc W It is possible to design meshes with different mesh angles θ and area ratios S. p The planar mesh texture.

[0124] like Figure 4 As shown, the number and size of the circular holes on the sample clamping plate 3 for arranging the disc sample 4 can be designed according to requirements. Specifically, based on the design results of the hard particle motion trajectory, a suitable sample clamping plate 3 is selected and installed on the eccentric rotary loading mechanism 2, and the texture processing plate 6 is installed on the rotary motor 7.

[0125] like Figure 5 As shown, a layer of flexible anti-slip material 401 is adhered to the cylindrical side of the selected disc sample 4. The disc sample 4 is then placed into the circular hole on the sample clamping plate 3. The flexible anti-slip material 401 undergoes slight deformation and flexible clamping force. During the fabrication of the planar texture, the flexible anti-slip material 401 can, on the one hand, clamp the disc sample 4 to prevent translation, and on the other hand, suppress the rotation of the disc sample 4 within the circular hole.

[0126] like Figure 6 As shown, based on the design results of the hard particle movement trajectory, a square hole is machined at a designated position on the flexible pad 601, and the flexible pad 601 is attached to the texture processing tray 6. A thin sheet with the hard particles 5 bonded to it is embedded into the square hole on the flexible pad 601, and the thin sheet with the hard particles 5 bonded to it is attached to the texture processing tray 6 using glue.

[0127] like Figure 7 As shown, the radius of the texture processing disk 6 is r2, the radius of the sample clamping disk 3 is r3, and the adjustable range of the eccentricity e of the eccentric rotation loading mechanism 2 is 0 to (r2-r1-r3). Based on the design results of the hard particle motion trajectory, the eccentricity e of the sample clamping disk 3 is adjusted by the eccentric rotation loading mechanism 2, and a reasonable axial force is applied to the disc sample 4; the rotation directions of the sample clamping disk 3 and the texture processing disk 6 are the same.

[0128] like Figure 7 As shown, hard particles are used to prepare a planar cross-textured texture on the surface of disk sample 4 through grinding. The area ratio Sp of the planar cross-textured texture ranges from 15% to 38%; the cross angle θ of the planar cross-textured texture ranges from 30° to 60°; the cross section of the planar cross-textured texture is triangular, with a depth of 2 to 5 μm and a width of 20 to 40 μm.

[0129] Those skilled in the art can understand this embodiment as a more specific description of Embodiment 1.

[0130] In the description of this application, it should be understood that the terms "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0131] Specific embodiments of the present invention have been described above. It should be understood that the present invention is not limited to the specific embodiments described above, and those skilled in the art can make various changes or modifications within the scope of the claims, which do not affect the essence of the present invention. Unless otherwise specified, the embodiments and features described in this application can be arbitrarily combined with each other.

Claims

1. A method for preparing planar mesh texture based on eccentric fixed-axis circular motion, characterized in that, A planar mesh texture preparation device based on eccentric fixed-axis circular motion is adopted, including: a base (1), an eccentric rotation loading mechanism (2), a sample clamping disk (3), a disc sample (4), hard particles (5), a texture processing disk (6), and a rotary motor (7). The eccentric rotary loading mechanism (2) is mounted on the base (1); the sample clamping disk (3) is mounted on the eccentric rotary loading mechanism (2); the disc sample (4) is placed in the sample clamping disk (3); the hard particle (5) is fixed on the texture processing disk (6); the texture processing disk (6) is mounted on the rotary motor (7); the rotary motor (7) is mounted on the base (1); The sample clamping disk (3) is mounted on the eccentric rotary loading mechanism (2) by screws; the sample clamping disk (3) has multiple radii of A circular through hole, wherein the radius of the circular through hole is The circular sample (4) and the sample clamping disk (3) change the number and size of the circular through holes as required; The eccentric rotary loading mechanism (2) changes the eccentricity e through a manual hinge mechanism on the base (1), and loads the disc sample (4) through a cylinder and push rod; the radius of the texture processing disc (6) is The center distance between the sample clamping disk (3) and the disc sample (4) is The eccentricity e of the eccentric rotary loading mechanism (2) can be adjusted within the range of 0 to 1. ; The method includes the following steps: Step S1: Design the hard particle texture processing path, and the resulting texture processing path is in the form of planar intersecting arcs; Step S2: Based on the design results of step S1, fix the hard particles at the specified positions on the texture processing plate; Step S3: Based on the design results of step S1, adjust the eccentricity of the sample clamping plate through the eccentric rotation loading mechanism, place the disc sample in the sample clamping plate, and apply a suitable axial force to the disc sample using the eccentric rotation loading mechanism. Step S4: Based on the design results of step S1, set the rotation speed of the sample clamping disk and the texture processing disk to prepare a planar mesh texture.

2. The method for preparing planar mesh texture based on eccentric fixed-axis circular motion according to claim 1, characterized in that, An abrasive machining method based on eccentric fixed-axis circular motion is adopted, and the rotational speed of the texture processing disc is adjusted. Rotation speed of the sample clamping disc The eccentricity e of the sample clamping disk and the position of the hard particles on the texture processing disk ( , This allows for the creation of planar mesh textures with different planar shapes and area ratios; by adjusting the axial load F and the size of the hard particles... This allows for the creation of cross-textured patterns with varying widths and depths.

3. The method for preparing planar mesh texture based on eccentric fixed-axis circular motion according to claim 1, characterized in that, In step S1, a motion trajectory model of the hard particles is first established, and then the motion trajectory is calculated and solved using MatLab software to obtain the texture processing parameters. The specific process of establishing the motion trajectory model of the hard particles is as follows: Based on the initial and operational states, a coordinate system is defined for the sample clamping disk and the texture processing disk, where... , These are the fixed coordinate systems of the sample clamping disk and the texture processing disk in their initial states, respectively. , These are the instantaneous coordinate systems of the sample clamping disk and the texture processing disk during their operation, respectively. Fixed on the sample holder plate, coordinate system Fixed on the texture processing tray; angular velocity of the sample clamping tray rotation angular velocity of the texture processing disc , For the rotational speed of the texture processing disc, The rotational speed of the sample clamping disc; The position of the hard particle P on the texture processing disk is ( , ), where DP connection and The angle between the positive and negative axes is Then its coordinate system in the texture processing disk The coordinate position in the image is represented as: （1） Place point P at If a position in a coordinate system is represented by polar coordinates, then it is expressed as: （2） When the texture processing disc rotates, due to the hard particles and The coordinate system is fixed on the texture processing disk, therefore the hard particles are... The position coordinates of the coordinate system are fixed; however, in the instantaneous coordinate system of the disk sample... Under these conditions, the position of the hard particles changes; therefore, in motion, if the sample clamping disk is used as the observation coordinate system, the position of the hard particles relative to the sample clamping disk changes, forming a honing motion trajectory; for a given texture processing disk rotation speed... and the rotation speed of the sample clamping plate The eccentricity between the sample processing plate and the sample clamping plate and hard particles in the texture processing disk coordinate system The position coordinates of the hard particles in the sample clamping disk coordinate system The trajectory is determined and represented below; Let the hard particles be in the coordinate system of the sample clamping disk. The following position coordinates are: （3） Hard particles are tested in the sample clamping disk coordinate system. The position coordinates below and their coordinates in the texture processing disk coordinate system The relationship between the position coordinates of the coordinate system is as follows: （4） in: for to the initial coordinate system of the sample clamping plate Rotation transformation matrix: （5） The angle of rotation of the sample clamping disk. ; Initial coordinate system of the sample clamping disk To the initial coordinate system of the texture processing disk Translation transformation matrix: （6） Initial coordinate system for the texture processing disk To the texture processing disk coordinate system Rotation transformation matrix: （7） The angle of rotation of the texture processing disc. ; Combining equations (1) to (7), we get: （8） Will Substituting into the above equation and simplifying, we can obtain the trajectory of the hard particles on the sample holder plate: （9） Since the disc sample is placed on the sample clamping plate and the two remain relatively stationary, the trajectory of motion is also the trajectory of the hard particles on the disc sample, that is, the planar cross-textured texture shape on the disc sample.

4. The method for preparing planar mesh texture based on eccentric fixed-axis circular motion according to claim 1, characterized in that, In step S2, a flexible pad with a single square hole is adhered to the surface of the texture processing disc, and hard particles are embedded in the square hole of the flexible pad on the surface of the texture processing disc and fixed at a designated position on the texture processing disc; the position of the hard particles ( , According to changes in demand.

5. The method for preparing planar mesh texture based on eccentric fixed-axis circular motion according to claim 1, characterized in that, In step S3, a layer of flexible anti-slip material is attached to the cylindrical side of the disc sample. The disc sample is placed into the circular hole on the sample clamping plate. The flexible anti-slip material undergoes slight deformation and forms a clamping force, so the disc sample does not move in the circular hole of the sample clamping plate.

6. The method for preparing planar mesh texture based on eccentric fixed-axis circular motion according to claim 1, characterized in that, In step S4, the sample clamping disk and the texture processing disk rotate in the same direction.

7. The method for preparing planar mesh texture based on eccentric fixed-axis circular motion according to claim 1, characterized in that, The area ratio Sp of the prepared planar reticulated texture ranges from 15% to 38%; the cross angle of the planar reticulated texture... The value range is 30° to 60°; the cross section of the planar mesh texture is triangular, with a depth of 2 to 5 μm and a width of 20 to 40 μm.

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