Workpiece holder and vacuum apparatus

Abstract

The application relates to a workpiece rack and a vacuum equipment, a first rotating shaft, a second rotating shaft and a mounting structure; the mounting structure is designed as a U-shaped structure shape, comprises two side edge supporting arms and a bottom platform, at least one workpiece disc for placing workpieces is arranged on each mounting structure and is mounted on the bottom platform of the mounting structure; during work, the first rotating shaft and the second rotating shaft rotate around a rotating axis, so that the mounting structure is spatially overturned in a vacuum cavity of the vacuum equipment, the workpiece disc is placed at different spatial positions, a balancing device is arranged on the mounting structure, the mounting structure is trimmed to form dynamic balance during overturning, so that the mounting structure forms dynamic balance during overturning; the technical scheme realizes a two-dimensional spatial adjustment function, improves the working efficiency of the vacuum equipment, reduces vibration generated in a coating / etching process of the vacuum equipment, and maintains the working stability of the vacuum equipment.

Description

Technical Field

[0001] This application relates to the field of vacuum technology, and in particular to a workpiece holder and vacuum equipment. Background Technology

[0002] In vacuum equipment, such as vacuum coating equipment and vacuum etching equipment, workpieces are usually placed on workpiece racks or workpiece trays for coating or etching.

[0003] Conventional workpiece holders rotate in one dimension, and some workpiece holders may also have multiple rotating workpiece disks. However, in certain special processes, the requirements for adjusting the position and angle of the workpiece are high. Existing workpiece holders are difficult to meet the needs of these special processes within the vacuum chamber space, resulting in the coating or etching effect failing to meet the design requirements and affecting the performance of the vacuum equipment. Summary of the Invention

[0004] The purpose of this application is to address one of the aforementioned technical deficiencies by providing a workpiece holder and vacuum equipment to improve the performance of the vacuum equipment.

[0005] A workpiece holder, built into the vacuum chamber of a vacuum device, includes: a first rotating shaft and a second rotating shaft located on a rotation axis, and at least one mounting structure for mounting a workpiece tray disposed between the first rotating shaft and the second rotating shaft.

[0006] The first rotating shaft is mounted on the vacuum chamber via a first fixed base, and the second rotating shaft is mounted on the vacuum chamber via a second fixed base;

[0007] The mounting structure is designed in a U-shape, including two side support arms and a bottom platform. Each mounting structure is provided with at least one workpiece tray for placing workpieces. The workpiece tray is mounted on the bottom platform of the mounting structure.

[0008] During operation, the first and second rotating shafts rotate around the rotation axis, causing the mounting structure to rotate in space within the vacuum chamber of the vacuum equipment, placing the workpiece disk in different spatial positions.

[0009] In one embodiment, the bottom platform of the mounting structure is also rotated around the central axis to rotate the workpiece disk on the bottom platform to different angles.

[0010] In one embodiment, the bottom two side arms of the mounting structure are provided with a telescopic structure for longitudinally telescopically moving the bottom platform along the extension direction of the side arms.

[0011] In one embodiment, the first fixed base is provided with a first servo motor connected to a first rotating shaft, which is used to rotate the first rotating shaft to drive the mounting structure to flip.

[0012] In one embodiment, a second servo motor is provided on the second fixed base to transmit power to the workpiece disk through a first transmission mechanism, so as to drive the workpiece disk to rotate.

[0013] In one embodiment, the second servo motor also transmits power to the mounting structure via a second transmission mechanism, driving the bottom platform of the mounting structure to rotate around the central axis.

[0014] In one embodiment, the first rotating shaft is connected to the outer shell of the vacuum chamber via a first magnetohydrodynamic sealing device, and the second rotating shaft is connected to the outer shell of the vacuum chamber via a second magnetohydrodynamic sealing device.

[0015] In one embodiment, a heating element is built into the workpiece tray for heating the placed workpiece.

[0016] In one embodiment, the workpiece tray is equipped with a temperature sensor for detecting the real-time temperature of the workpiece tray.

[0017] In one embodiment, the workpiece tray has a built-in cooling chamber connected to a cooling water circuit for dissipating heat from the workpiece tray.

[0018] In one embodiment, the mounting structure is provided with a balancing device, which is equipped with a counterweight for balancing the mounting structure so that the mounting structure forms dynamic balance during rotation.

[0019] In one embodiment, the balancing device controls the counterweight to move longitudinally along the extension direction of the side arm, and / or controls the counterweight to swing laterally along the direction perpendicular to the extension direction of the side arm.

[0020] In one embodiment, after a workpiece is placed on the workpiece holder, the balancing device moves the counterweight to the initial position and adjusts the counterweight while the workpiece holder is rotating; the real-time output power of the workpiece holder is detected and the target position is obtained based on the minimum power value; and the counterweight is adjusted to the target position while the vacuum equipment is running.

[0021] In one embodiment, the balancing device detects the real-time output power change of the workpiece holder during the operation of the vacuum equipment. When the change exceeds a set threshold, the position of the counterweight is adjusted until the change is less than the set threshold.

[0022] A vacuum device includes: a vacuum chamber, a coating device or an etching device built into the vacuum chamber, and the workpiece holder;

[0023] The workpiece holder is used to place workpieces to be coated or etched, and the coating equipment is used to coat or etch the workpieces to be coated.

[0024] The aforementioned workpiece rack and vacuum equipment are designed with a U-shaped mounting structure. Each mounting structure is equipped with at least one workpiece tray for placing workpieces. During operation, the mounting structure is rotated around the rotation axis by the first and second rotating shafts, which allows the workpiece tray to be placed in different spatial positions within the vacuum chamber of the vacuum equipment. This technical solution realizes two-dimensional spatial adjustment function and improves the working efficiency of the vacuum equipment.

[0025] Furthermore, the bottom platform of the installation structure is designed to rotate around the central axis, allowing the workpiece disk to be rotated to different angles, including specific directional angles.

[0026] Furthermore, the bottom two side arms of the installation structure are equipped with telescopic structures, which allow the workpiece tray to be moved longitudinally along the extension direction of the side arms. This can adjust the flipping range and reach of the workpiece tray, thereby creating a multi-layer layout effect for the workpiece tray.

[0027] Furthermore, a balancing device was designed into the mounting structure to balance the structure and achieve dynamic balance during rotation, thereby reducing vibrations generated by the vacuum equipment during coating / etching and maintaining the operational stability of the vacuum equipment.

[0028] Furthermore, an automated balancing solution for the workpiece rack is provided, which enables rapid and convenient automated balancing after the workpiece is placed on the workpiece rack.

[0029] Furthermore, a fine-tuning scheme for the balance state during the operation of the vacuum equipment was designed to keep the entire workpiece holder in a stable balance state during the operation of the vacuum equipment, thereby maintaining the stability of the vacuum equipment and improving the quality and effect of coating / etching.

[0030] Additional aspects and advantages of this application will be set forth in part in the description which follows, and will become apparent from the description or may be learned by practice of this application. Attached Figure Description

[0031] The above and / or additional aspects and advantages of this application will become apparent and readily understood from the following description of the embodiments taken in conjunction with the accompanying drawings, wherein:

[0032] Figure 1 This is a schematic diagram of a workpiece rack structure according to one embodiment;

[0033] Figure 2 This is a schematic diagram of an example installation structure;

[0034] Figure 3A side view of an example installation structure;

[0035] Figure 4 A side view of another example of an installation structure;

[0036] Figure 5 This is a schematic diagram of another example of an installation structure;

[0037] Figure 6 This is a schematic diagram of another embodiment of the workpiece rack structure;

[0038] Figure 7 This is a side view of an example balancing device;

[0039] Figure 8 This is a schematic diagram of an example balancing device control.

[0040] Figure 9 This is an example electrical connection diagram for a vacuum device. Detailed Implementation

[0041] The embodiments of this application are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application.

[0042] Those skilled in the art will understand that, unless otherwise stated, the singular forms “a,” “an,” “the,” and “the” used herein may also include the plural forms. It should be further understood that the word “comprising” as used in this application’s specification means the presence of the stated feature, integer, step, or operation, but does not preclude the presence or addition of one or more other features, integers, steps, or operations.

[0043] To address the shortcomings of workpiece holders in vacuum equipment, this application designs a new workpiece holder, referencing... Figure 1 As shown, Figure 1This is a schematic diagram of a workpiece holder structure according to an embodiment. The workpiece holder 01 is built into the vacuum chamber 02 of the vacuum equipment 100. An ion source 03 is provided in the vacuum chamber 02. Its structure includes: a first rotating shaft 11, a second rotating shaft 12, and at least one mounting structure 13 for mounting a workpiece disk 131 disposed between the first rotating shaft 11 and the second rotating shaft 12. The first rotating shaft 11 can be mounted to the vacuum chamber 02 through a first fixing seat 11a, and the second rotating shaft 12 can be mounted to the vacuum chamber 02 through a second fixing seat 12a. The first rotating shaft 11 and the second rotating shaft 12 are located on the same rotation axis. The mounting structure 13 is designed in a U-shaped structure and can include two side support arms 132 and a bottom platform 133. At least one workpiece disk 131 is provided on the bottom platform 133 of each mounting structure 13. The workpiece disk 131 is mounted on the bottom platform 133 and is used to place the workpiece to be coated / etched.

[0044] As described in the above embodiment, when the workpiece holder 01 is in operation, the first rotating shaft 11 and the second rotating shaft 12 rotate around the rotation axis, causing the mounting structure 13 to flip inside the vacuum chamber 02 and placing the workpiece disk 131 in different spatial positions.

[0045] For the design scheme of installation structure 13, such as Figure 1 As shown, it can be designed in single or multiple quantities, such as Figure 2 As shown, Figure 2 This is a schematic diagram of an example mounting structure, in which two mounting structures 13 are arranged between the first rotating shaft 11 and the second rotating shaft 12. For example, as shown... Figure 3 As shown, Figure 3 The side view of an example mounting structure shows that the side arms 132 of the two mounting structures 13 face opposite directions and form a 180° angle between them. For example, when the two mounting structures 13 form a 180° angle layout, they are flipped in the vacuum chamber 02 to place the mounted workpiece disk 131 in different spatial positions.

[0046] In addition, in some embodiments, the mounting structure 13 can be designed to have three or more components; for example, such as... Figure 4 As shown, Figure 4 Here is a side view of another example of an installation structure. In the design scheme with three installation structures 13, the angle between each installation structure 13 can be 0°; for example, four installation structures 13 can be set, and the angle between each installation structure 13 can be 90°, etc. Other design schemes will not be described in detail here.

[0047] The design of the workpiece tray 131 on the mounting structure 13 allows for the installation of one or more workpiece trays 131; for example, in the layout of the workpiece trays 131, two sets of workpiece trays 131 symmetrically arranged can be set on the bottom platform 133 of the mounting structure 13; Figures 1 to 4 As shown, multiple sets of workpiece trays 131 can be arranged and installed on the mounting structure 13, and each set of workpiece trays 131 can be flipped during operation.

[0048] As described in the above embodiment, the U-shaped mounting structure 13 is supported by the first rotating shaft 11 and the second rotating shaft 12, and rotates around the axis of rotation as a whole, thereby rotating the mounted workpiece disk 131 to different positions in space. This allows the vacuum equipment to achieve coating or etching at different angles according to the process conditions during use, realizing a multi-dimensional spatial adjustment effect and improving the coating or etching effect of the vacuum equipment.

[0049] In one embodiment, reference Figures 3 to 5 As shown, Figure 5 This is another example of an installation structure diagram. The bottom platform 133 of the installation structure 13 is also rotated around the central axis to rotate the workpiece disk 131 on the bottom platform 133 to different angles. By rotating the bottom platform 133 around the central axis, the workpiece disk 131 can be pointed to any angle position. Specifically, according to the coating / etching requirements, the first rotation speed of the first rotating shaft 11 and the second rotating shaft 12 around the rotation axis and the second rotation speed of the bottom platform 133 around the central axis can be set. By different combinations of the first rotation speed and the second rotation speed, a specific pointing angle can be achieved. For example, the workpieces on some of the workpiece disks 131 can always point towards the ion source O3.

[0050] As in the above embodiment, the bottom platform 133 is designed to flip around the central axis. By combining the first rotating shaft 11, the second rotating shaft 12, and the bottom platform 133 at different angles, a specific pointing angle can be achieved, thereby meeting a wider range of coating / etching requirements.

[0051] In one embodiment, such as Figure 5 As shown, the two side support arms 132 at the bottom of the mounting structure 13 can also be provided with telescopic structures 132b, which are used to move the bottom platform 133 longitudinally along the extension direction of the side support arms 132. For each mounting platform, during use, the bottom platform 133 can be moved to different lengths, thereby adjusting the flipping range and reach of the workpiece tray 131, thus forming a multi-layer layout effect of the workpiece tray 131. For the telescopic structure 132b, for example, it can be implemented by a push rod, a linear module or other device.

[0052] As in the above embodiment, the side support arm 132 pushes the bottom platform 133 to extend and retract longitudinally through the telescopic structure 132b, so that the workpiece disk 131 can be set to any spatial position as needed. Thus, the workpiece disk 131 can be adjusted to a suitable spatial position according to the coating or etching requirements, thereby improving the coating or etching effect and meeting more diverse coating / etching needs.

[0053] In one embodiment, reference Figure 6 As shown, Figure 6 This is a schematic diagram of a workpiece holder structure according to another embodiment. In this embodiment, a first fixed seat 11a and a second fixed seat 12a are provided outside the vacuum chamber 02 to fix a first rotating shaft 11 and a second rotating shaft 12. The first rotating shaft 11 passes through the outer shell of the vacuum chamber 02 and is connected to the first fixed seat 11a, and the second rotating shaft 12 passes through the outer shell of the vacuum chamber 02 and is connected to the second fixed seat 12a. A first servo motor 110 is provided inside the first fixed seat 11a, and the end of the first rotating shaft 11 is connected to the first servo motor 110. The first servo motor 110 drives the mounting structure 13 to rotate by rotating the first rotating shaft 11. A second servo motor 120 is provided inside the second fixed seat 12a, and the end of the second rotating shaft 12 is connected to the second servo motor 120. The second servo motor 120 transmits power to the workpiece disk 131 through a first transmission mechanism to drive it to rotate.

[0054] In one embodiment, the second servo motor 120 can also transmit power to the mounting structure 13 via the second transmission mechanism, driving the bottom platform 133 of the mounting structure 13 to rotate around the central axis. For example, the first and second transmission mechanisms can be transmitted mechanically or via a gear set to transmit power through the second rotating shaft 12 to the vacuum chamber 02; other mechanical structures, such as flexible wires, can also be used to transmit power. Conventional technical solutions can be used for the transmission mechanism, which are not shown in the figures in this embodiment, and specific design schemes will not be elaborated here.

[0055] In one embodiment, such as Figure 6 As shown, the first rotating shaft 11 can be connected to the outer shell of the vacuum chamber 02 via the first magnetohydrodynamic sealing device 111, and the second rotating shaft 12 can be connected to the outer shell of the vacuum chamber 02 via the second magnetohydrodynamic sealing device 121. As described in the above embodiment, the magnetohydrodynamic sealing achieves a non-contact seal, effectively reducing energy consumption.

[0056] In one embodiment, considering the requirements of the coating process, a heating element 31c is built into the workpiece tray 131 for heating the placed workpiece, such as... Figure 6As shown, the heating element 31c can be disposed on the surface of the workpiece disk 131; as in the above embodiment, by heating the workpiece disk 131, heat is transferred to the substrate, i.e., the workpiece, making the molecules of the substrate more active and improving the quality of the film layer.

[0057] In one embodiment, considering the cooling requirements of certain special coating and etching processes, such as Figure 6 As shown, the workpiece disk 131 has a built-in cooling cavity 31d, and the second rotating shaft 12 has a cooling water passage 31e; wherein, the cooling cavity 31d is connected to the inlet and outlet water ports 31f on the second fixed seat 12a through the cooling water passage 31e. As in the above embodiment, in some special coating processes where an amorphous film is required, appropriate cooling of the substrate can prevent crystallization of the film on the substrate; during vacuum etching, water cooling can remove the heat generated during etching, thereby improving the etching quality.

[0058] In one embodiment, such as Figure 6 As shown, a temperature sensor 32 is provided on the workpiece tray 131. The temperature sensor 32 is used to detect the real-time temperature of the workpiece tray 131. Preferably, in order to facilitate the transmission of detection data, the temperature sensor 32 can wirelessly transmit the detected real-time temperature to the outside of the vacuum chamber 02, so as to monitor the status of the workpiece in real time and provide important data reference for coating or etching process control. For example, by combining the real-time temperature data of the workpiece tray 131, the surface temperature of the workpiece can be kept stable by controlling the flow rate of the cooling water channel 31e and the heating element 31c, thereby improving the working efficiency of coating / etching.

[0059] In one embodiment, due to the U-shaped structure design causing a shift in the center of gravity of the workpiece holder 01, the mounting platform needs to be balanced to ensure the stability of the entire mounting structure 13 during the flipping process. Accordingly, as follows... Figures 5 to 6 As shown, a balancing device 14 can also be set on the mounting structure 13 to balance it, so that the mounting structure 13 can form a dynamic balance during the flipping process.

[0060] In some embodiments, the balancing device 14 may include multiple detachable counterweights 141. The balancing device 14 can adjust the balance by increasing or decreasing the number of counterweights 141 according to the overall mass of the workpiece rack 01 and the workpiece tray 131 after the workpiece is placed.

[0061] In addition, considering that the overall weight of the mounting structure 13 will change after the workpiece is placed on the workpiece tray 131, in order to meet the balance requirements in different scenarios, this embodiment provides several embodiments of the balancing device 14 to ensure that the workpiece holder 01 maintains overall dynamic balance during rotation.

[0062] In some embodiments, such as Figures 5 to 6 As shown, the balancing device 14 can be designed as an adjustable structure, such as... Figure 7 As shown, Figure 7 This is a side view of an example balancing device. The left image shown is a front view, and the right image is an AA view of the left image; as shown. Figure 7 As shown, it may include a counterweight 141 and a linear module 142. The counterweight 141 is mounted on the slider of the linear module 142, as shown. Figure 8 As shown, Figure 8 This is a schematic diagram of an example balancing device control. By controlling the slider to move, the counterweight 141 is moved longitudinally a distance L along the extension direction of the side support arm 132, thereby adjusting the position of the counterweight 141 to achieve the dynamic balancing function of the workpiece frame 01. Furthermore, considering the center of gravity offset, the connection between the linear module 142 and the mounting structure 13 is hinged, as shown by the swing arrow in the figure. The linear module 142 can swing around the axis by an angle θ, which is within the angle range [-α, α], thereby adjusting the center of gravity offset position of the counterweight 141 to achieve a better balance state.

[0063] For the control part of the balancing device 14, for example, it can be controlled by a controller, which can be a separate hardware or the industrial control computer 04 of the vacuum equipment. In the embodiments of this application, it is preferred to use the industrial control computer 04 of the vacuum equipment for control.

[0064] It should be noted that the installation location and quantity of the balancing device 14 can be determined according to the actual structural design and requirements of the installation structure 13. The embodiments of this application only illustrate some design schemes and do not constitute a limitation on the structure of the balancing device 14 and its installation location and quantity.

[0065] In the above embodiment, the workpiece holder 01 can achieve dynamic balance during the flipping process by the balancing device 14, thereby reducing the vibration generated by the vacuum equipment 100 during the coating / etching process and maintaining the working stability of the vacuum equipment.

[0066] Based on the balancing device 14 in the above embodiments, considering that accurately determining the moving distance L and swing angle θ of the counterweight 141 during the balancing process is crucial, the embodiments of this application also provide embodiments of balancing technology solutions, thereby realizing fast and convenient automated balancing after placing workpieces on the workpiece rack 01 when different numbers of workpieces are placed on the workpiece tray 131.

[0067] In one embodiment, the automated balancing technology of the balancing device 14 may include the following:

[0068] (1) After the workpiece is installed on the workpiece tray 131, the control balance device 14 moves the counterweight 141 to an initial position and starts to rotate the workpiece holder 01 through the vacuum device, so that the workpiece holder 01 is flipped in the vacuum chamber 02.

[0069] For example, the initial position can be the equilibrium position under normal conditions, that is, the initial moving distance L = l0 and the swing angle θ = θ0 are set. Compared with the conventional loading operation, which requires consideration of the balance of the entire workpiece rack 01, the solution in this embodiment can reduce the loading operation requirements and complete the balance process through automated balancing.

[0070] (2) In the rotating state, the counterweight 141 is continuously adjusted within the adjustable range, while the output power corresponding to the workpiece holder 01 is detected in real time.

[0071] For example, the workpiece holder 01 is controlled to rotate at a set speed. During the rotation, the counterweight 141 is adjusted to change within an adjustable range. At the same time, the output power of the first servo motor 110 is detected, and the corresponding output power curve is obtained by fitting.

[0072] (3) Obtain the target position based on the minimum output power within the entire adjustment range, and determine the target position to be moved for counterweight 141 based on the minimum power value of the power curve.

[0073] For example, the target position corresponding to the minimum power can be obtained through the output power curve. When the vacuum equipment officially starts coating / etching, the control balance device 14 adjusts the counterweight 141 to the target position for operation.

[0074] The balancing technology solution described above allows for quick and accurate balancing of the entire workpiece rack 01 after the workpiece is placed on the workpiece tray 131, based on the different distribution positions of the workpiece. When loading the vacuum equipment, there is no need to pre-calculate the weight of the workpiece, nor is it necessary to distribute the workpiece evenly. This allows for rapid loading, followed by automatic balancing using the balancing device 14. This not only improves the efficiency of the loading operation but also ensures the stability of the vacuum equipment during operation.

[0075] Based on the adjustment scheme of the above embodiments, the balancing technology solution of this embodiment may further include the following in specific implementation:

[0076] With the swing angle θ = θ0 (usually 0°) and L = l0, the moving distance L of the counterweight 141 is adjusted within the variable range. The moving distance l1 is determined according to the minimum value of the power curve, and then the counterweight 141 is moved to the position l1.

[0077] Keeping the position of l1 unchanged, continue to adjust the swing angle θ within the adjustable range to obtain the swing angle θ1 corresponding to the minimum value of the power curve. Keeping the swing angle θ1 unchanged, adjust the moving distance L of the counterweight 141 within the adjustable range. Determine the moving distance l2 according to the minimum value of the power curve, and so on, repeatedly adjusting until the swing angle θ is obtained. n and distance of movement l m The specific number of iterations can be determined based on the requirements, as it represents the final target location.

[0078] Based on the balancing technology solution of the above embodiments, without the need to add hardware equipment, after the workpiece is installed on the workpiece tray 131, the entire workpiece holder 01 can be automatically and quickly and accurately balanced, improving the efficiency of the loading operation and enabling the vacuum equipment to quickly perform coating or etching. This technology solution achieves balancing processing, enhances the working stability of the vacuum equipment, and improves the quality of workpiece coating or etching.

[0079] In one embodiment, considering that the center of gravity of the workpiece holder 01 may shift due to changes in workpiece weight or other factors during the coating or etching process, the balancing device 14 may also detect the change in the output power of the workpiece holder 01 relative to the minimum value during the operation of the vacuum equipment. When the change exceeds a set threshold, the position of the counterweight 141 is adjusted until the change is less than the set threshold, thereby achieving fine adjustment of the balance state.

[0080] For example, taking the swing angle θ1 and the moving distance l2 at the target position as an example, during the formal coating / etching process, the real-time output power of the first servo motor 110 can be detected. When the change value of the real-time output power exceeds the set threshold, the moving distance l2 can be adjusted to the moving distance l3, and the swing angle θ1 can be adjusted to the swing angle θ2. The adjustment is continued in the above manner until the change value of the real-time output power is less than the set threshold.

[0081] As described in the above embodiments, during the coating or etching process in the vacuum equipment, the counterweight 141 can be finely adjusted by the balancing device 14. Thus, during the operation of the vacuum equipment, when the workpiece undergoes coating / etching and its quality changes, the workpiece holder 01 can be kept in a balanced state, thereby further maintaining the stability of the vacuum equipment and improving the coating / etching quality and effect of the vacuum equipment.

[0082] The following describes an embodiment of the vacuum equipment.

[0083] This application provides a vacuum device, with reference to... Figures 1 to 9 As shown, Figure 9This is an example electrical connection diagram of a vacuum device. The vacuum device 100 of this application can be a vacuum coating device or a vacuum etching device, including: a vacuum chamber 02, a coating device or etching device 05 built into the vacuum chamber 02, and a workpiece holder 01 as described in the previous embodiment; in addition, it also includes an ion source 03 and an industrial control computer 04; wherein, the workpiece holder 01 is used to place the workpiece to be coated or etched, and the coating device is used to coat the workpiece to be coated; the workpiece holder 01 is installed horizontally in the vacuum chamber 02, and the workpiece disk 131 is flipped in the vacuum chamber 02 during use.

[0084] like Figure 9 The electrical structure of the vacuum equipment 100 includes an industrial control computer 04, an ion source 03, and a coating / etching device 05; wherein, the industrial control computer 04 is connected to a first servo motor 110, a second servo motor 120, a temperature sensor 32, a heating element 31c, etc.

[0085] Vacuum equipment 100 uses industrial control computer 04 to control sputtering source for coating, and ion source 03 to assist coating / etching. During the coating / etching process, heating element 31c or water cooling pipeline is turned on to dissipate heat from workpiece disk 131 according to coating process requirements. Temperature sensor 32 detects the real-time temperature of workpiece disk 131, thereby providing accurate parameter support for coating / etching process control.

[0086] The vacuum equipment 100 of this application, through the U-shaped installation structure 13, and the overall flipping of the installation structure 13 and the flipped workpiece disk 131 installed thereon, allows the vacuum equipment 100 to automatically adjust the angle of the workpiece disk 131 according to the process conditions, realizing a two-dimensional spatial adjustment function and improving the working efficiency of the vacuum equipment 100. By designing a balancing device 14 on the installation structure 13, the installation structure 13 forms a dynamic balance during flipping and the balance state is finely adjusted during the operation of the vacuum equipment 100, reducing the vibration generated by the vacuum equipment 100 during the coating / etching process and maintaining the working stability of the vacuum equipment 100. Furthermore, an automated balancing scheme for the workpiece holder 01 is provided. After the workpiece is placed on the workpiece holder 01, a quick and convenient automated balancing is achieved, keeping the entire workpiece holder 01 in a stable balance state during the operation of the vacuum equipment 100, thereby maintaining stability and improving the quality and effect of coating / etching.

[0087] It will be understood by those skilled in the art that, unless otherwise defined, all terms used herein (including technical and scientific terms) have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains. It should also be understood that terms such as those defined in general dictionaries should be understood to have the same meaning as in the context of the prior art, and should not be interpreted in an idealized or overly formal sense unless specifically defined as herein.

[0088] The above description is only a partial embodiment of this application. It should be noted that for those skilled in the art, several improvements and modifications can be made without departing from the principle of this application, and these improvements and modifications should also be considered within the scope of protection of this application.

Claims

1. A workpiece holder, built into the vacuum chamber of a vacuum device, characterized in that, include: A first rotating shaft and a second rotating shaft located on the axis of rotation, and at least one mounting structure for mounting a workpiece disk disposed between the first rotating shaft and the second rotating shaft; The first rotating shaft is mounted on the vacuum chamber via a first fixed base, and the second rotating shaft is mounted on the vacuum chamber via a second fixed base; The mounting structure is designed in a U-shape, including two side support arms and a bottom platform. Each mounting structure is provided with at least one workpiece tray for placing workpieces. The workpiece tray is mounted on the bottom platform of the mounting structure. The two side arms of the mounting structure are equipped with telescopic structures; During operation, the first and second rotating shafts rotate around the rotation axis, causing the mounting structure to rotate in space within the vacuum chamber of the vacuum equipment, placing the workpiece disk in different spatial positions. The telescopic structure moves the bottom platform longitudinally along the extension direction of the side support arm.

2. The workpiece holder according to claim 1, characterized in that, The bottom platform of the mounting structure can also be rotated around the central axis to rotate the workpiece disk on the bottom platform to different angles.

3. The workpiece holder according to claim 1, characterized in that, The first fixed base is equipped with a first servo motor connected to a first rotating shaft, which is used to rotate the first rotating shaft to drive the mounting structure to flip. The second fixed base is equipped with a second servo motor, which transmits power to the workpiece disk through the first transmission mechanism to drive the workpiece disk to rotate.

4. The workpiece holder according to claim 3, characterized in that, The second servo motor also transmits power to the mounting structure through the second transmission mechanism, driving the bottom platform of the mounting structure to rotate around the central axis.

5. The workpiece holder according to claim 1, characterized in that, A heating element is built into the workpiece tray for heating the placed workpiece; The workpiece tray is equipped with a temperature sensor to detect the real-time temperature of the workpiece tray. The workpiece tray has a built-in cooling chamber, which is connected to a cooling water circuit for dissipating heat from the workpiece tray.

6. The workpiece holder according to claim 1, characterized in that, The mounting structure is equipped with a balancing device, which has a counterweight plate to balance the mounting structure so that the mounting structure forms dynamic balance during rotation. The balancing device controls the counterweight to move longitudinally and / or swing laterally.

7. The workpiece holder according to claim 6, characterized in that, After the workpiece is placed on the workpiece holder, the balancing device moves the counterweight to the initial position and adjusts the counterweight while the workpiece holder is rotating; it detects the real-time output power of the workpiece holder and obtains the target position based on the minimum power value, and adjusts the counterweight to the target position while the vacuum equipment is running.

8. The workpiece holder according to claim 7, characterized in that, The balancing device detects the real-time output power change of the workpiece holder during the operation of the vacuum equipment. When the change exceeds a set threshold, the position of the counterweight is adjusted until the change is less than the set threshold.

9. A vacuum device, characterized in that, include: A vacuum chamber, a coating or etching device built into the vacuum chamber, and a workpiece holder as described in any one of claims 1-8; The workpiece holder is used to place workpieces to be coated or etched, and the coating equipment is used to coat or etch the workpieces to be coated.

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