Electromagnetic emission track deposition layer reconstruction method
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-12-21
- Publication Date
- 2026-08-11
AI Technical Summary
该方法能对材料转移层进行重构,但重构的材料转移层是基于摩擦材料转移,仅能针对轨道上部分区域的沉积层特征进行重构,而电磁发射轨道上沉积层的形成机制主要为电枢材料的熔融飞溅,且重构的沉积层的厚度与熔融飞溅过程形成的沉积层厚度具有一定的差异
[0019]本发明中的铜合金包括CuCrZr合金。
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Figure CN117778934B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to a method for reconstructing the deposition layer of an electromagnetic launch orbit; it belongs to the field of electromagnetic orbit launch technology. Background Technology
[0002] Electromagnetic orbital launch technology is a novel launch method that utilizes electromagnetic energy to achieve ultra-high-speed launch of objects. It consists of a high-power pulsed power supply, two parallel rails, and an armature. During launch, the high-power pulsed power supply generates a large current, which flows into one rail, passes through the armature, and exits from the other rail. The current generates a strong magnetic field between the parallel rails. Under the influence of this strong magnetic field, the current-carrying armature experiences a Lorentz force, propelling the mover and other payloads to speeds difficult to achieve with traditional chemical and mechanical energy launch methods. This technology offers advantages such as controllable speed and high precision.
[0003] During launch, the armature and track engage in ultra-high-speed sliding electrical contact, resulting in a series of complex changes on the track surface, such as wear, planing, grooving, and deposition. Deposition is a particularly prevalent phenomenon, present almost across the entire track surface. These surface changes significantly impact the electrical contact performance between the armature and track, as well as the movement of the armature or warhead within the bore. In the optimization of armature and track materials, deposition formation is an essential evaluation indicator for assessing material performance. Current research on deposition involves disassembling and sampling the track. However, due to the high launch costs and the inability to reconstruct the launch device after destructive disassembly, this method of studying deposition formation through actual launches and disassembly sampling has significant drawbacks. Therefore, a technique for reconstructing deposition layers on the surface of laboratory electromagnetic launch tracks is needed to provide sufficient samples for the study of track surface deposition layers.
[0004] Huang Wei et al., in their paper "Evolution Law of Surface Microstructure of CuCrZr Alloy under Current-Carrying Friction Conditions" published in the journal "Rare Metals," conducted a detailed study on the microstructure and formation mechanism of the deposited layer by disassembling and sampling the track after launch through actual launch tests. The results showed that the deposited layer formation was mainly due to Joule heating, which melted the material at the pivot rail contact surface, causing low-melting-point aluminum to deposit first on the copper track surface. However, this study involved disassembling the track after launch, resulting in high testing and inspection costs. Chinese patent document CN202211671176.0 discloses a method for reconstructing the surface of an electromagnetic launch track. This method uses a pin-disc type current-carrying friction and wear testing machine. By changing at least one parameter among the current magnitude, contact pressure of the friction pair, friction speed, friction time, and arc initiation distance, the surface microstructure of the track material under corresponding conditions can be obtained. This method accumulates original data for reconstructing the morphology of the track material surface, including friction and wear, material transfer, and arc ablation. This method can reconstruct the material transfer layer, but the reconstructed material transfer layer is based on frictional material transfer and can only reconstruct the characteristics of the deposition layer in a certain area of the track. The formation mechanism of the deposition layer on the electromagnetic launch track is mainly the melting and splashing of the armature material, and the thickness of the reconstructed deposition layer differs from the thickness of the deposition layer formed by the melting and splashing process. Based on previous research, this invention further discovered a correlation between the deposition layer formed by melting and splashing on the track surface and the coating obtained by arc spraying, and based on this, a new reconstruction method is proposed. Summary of the Invention
[0005] This invention addresses the shortcomings of existing technologies by proposing for the first time a method of reconstructing the deposition layer on the surface of an electromagnetic launch track using arc spraying under laboratory conditions, thus providing sufficient test samples for the research of armature and track materials.
[0006] This invention uses electromagnetic launch track material as the substrate and armature material as the spraying material. It employs an arc spraying device and obtains the surface deposition layer structure of the track material by changing the spraying angle and spraying passes. Based on the experimentally obtained deposition layer structure, the actual electromagnetic launch track surface deposition layer is reconstructed.
[0007] This invention is the first to discover and select appropriate spraying voltage, spraying current, spraying distance, and air pressure, and then change the spraying angle and spraying passes to obtain a surface deposit layer of the orbital material that is consistent with the morphology of the deposit layer formed by molten splashing during actual launch in terms of internal microstructure and interface state.
[0008] This invention utilizes an arc spraying device, employing track material as the substrate and armature material as the spraying material. By altering the spray angle and spray passes, it creates a morphology and physical properties similar to the deposited layer formed by molten spatter in the rear section of the track after actual launch, thereby achieving the objective of this invention. The spraying process uses a voltage of 10–50V, a spraying current of 100–300A, a spraying distance of 150–300mm, and an air pressure of 0.5–1.0MPa. Preferably, the voltage is 15–35V, the spraying current is 150–250A, the spraying distance is 180–250mm, and the air pressure is 0.6–0.9MPa.
[0009] In this invention, the starting point is the end where the armature begins to accelerate, and the ending point is the end where the armature leaves the track. The starting point is defined as zero point, and the distance L from the ending point to the starting point is defined as the actual rear section of the track after launch. When the distance from the starting point to the track is greater than 0.4L, it can be considered as the actual rear section of the track after launch. The rear section here includes the middle part of the actual track after launch and the end with the launch port.
[0010] To better simulate the actual process of melting and splashing, unlike the 90° spray angle in traditional spraying, the present invention uses a spray angle of 10–60° and 1–4 spray passes. Preferably, it is 15–50° and 1–2 spray passes.
[0011] Preferably, the following parameters are controlled during spraying: voltage 20-30V, spraying current 190-210A, spraying distance 190-210mm, air pressure 0.6-0.65MPa, and spraying angle 15-48°.
[0012] Regarding the control of the above-mentioned spray angle and spray frequency parameters, if the spray angle is below the above range, most of the sprayed material will be lost due to the low angle and high spray speed, and the deposited layer will not easily adhere to the track material, resulting in an insignificant spraying effect. If the spray angle is above the above parameters, it does not conform to the actual situation of molten splash formation during the launch process. If the number of spray passes is above the above parameters, the morphology will accumulate excessively, resulting in a poor reconstruction effect.
[0013] The reconstruction effect of the deposited layer prepared by the present invention can be judged from the thickness of the deposited layer, the internal structure of the deposited layer, and the interface state between the deposited layer and the orbital material.
[0014] Based on the above experimental parameters, this invention can reconstruct the deposition layer formed on the surface of an electromagnetic orbital launch track due to molten splashing.
[0015] This invention uses Cu or Cu alloy as the substrate and Al or Al alloy as the spraying material; controls the spraying voltage to be 25V, the current to be 200A, the air pressure to be 0.6MPa, and sets the distance between the nozzle and the substrate to be 200mm; when the spraying angle is 10° to 20° and the spraying passes are 1, a deposited layer can be obtained that reconstructs the middle position of the orbit with a service time of 1 / 3 to 3 / 5 of the service life.
[0016] This invention uses Cu or Cu alloy as the substrate and Al or Al alloy as the spraying material; controls the spraying voltage to be 25V, the current to be 200A, the air pressure to be 0.6MPa, and sets the distance between the nozzle and the substrate to be 200mm; when the spraying angle is 25° to 35° and the spraying passes are 1, a deposited layer can be obtained that reconstructs the service time of the orbital end position, which is 1 / 3 to 3 / 5 of the service life.
[0017] This invention uses Cu or Cu alloy as the substrate and Al or Al alloy as the spraying material; controls the spraying voltage to be 25V, the current to be 200A, the air pressure to be 0.6MPa, and sets the distance between the nozzle and the substrate to be 200mm; when the spraying angle is 42° to 48° and the spraying passes are 1, a deposition layer can be obtained that reconstructs the service time of the middle position of the orbit with a service time greater than or equal to 0.9 times the service life.
[0018] This invention uses Cu or Cu alloy as the substrate and Al or Al alloy as the spraying material; controls the spraying voltage to be 25V, the current to be 200A, the air pressure to be 0.6MPa, and sets the distance between the nozzle and the substrate to be 200mm; when the spraying angle is 42° to 48° and the spraying passes are 2 times, a deposition layer that reconstructs the orbital end position with a service time greater than or equal to 0.9 times the service life can be obtained.
[0019] The copper alloys in this invention include CuCrZr alloys.
[0020] The aluminum alloy in this invention includes 7075Al alloy.
[0021] The reconstruction method proposed in this invention is reasonable, the process is easy to control, the reconstruction process is highly safe, and it can easily and effectively obtain reconstructed samples of the deposition layer formed on the orbital surface due to molten splashing at different launch times.
[0022] Current methods for analyzing orbital deposits after service use primarily involve destructively disassembling the launcher's orbit to obtain samples. This invention, however, presents a method that can obtain samples similar to the deposits formed on the actual launch track surface due to molten spatter under laboratory conditions. This avoids irreversible disassembly of the launcher, reducing research costs and time, and simplifies the reconstruction process with easy-to-operate techniques. Furthermore, it provides the necessary conditions for the efficient development of materials required for electromagnetic orbital launch technology. Moreover, the efficiency of developing new materials based on this invention is exponentially higher than that of existing technologies. Attached Figure Description
[0023] Appendix Figure 1 This is a cross-sectional topography of the reconstructed sedimentary layer obtained in Example 1;
[0024] Appendix Figure 2 This is a cross-sectional topography of the reconstructed sedimentary layer obtained in Example 2;
[0025] Appendix Figure 3 This is a cross-sectional topography of the reconstructed sedimentary layer obtained in Example 3;
[0026] Appendix Figure 4 This is a cross-sectional topography of the reconstructed sedimentary layer obtained in Example 4;
[0027] Appendix Figure 5 A cross-sectional view of the sedimentary layer in the middle of the orbit, where more than half of its service life has passed.
[0028] Appendix Figure 6 A cross-sectional view of the sedimentary layer at the end of the orbit where more than half of its service life has passed.
[0029] Appendix Figure 7 Cross-sectional topography of the sedimentary layer at the mid-orbit location to reach the end of its service life;
[0030] Appendix Figure 8 Cross-sectional topography of the sediment layer at the end of the orbit to reach its service life;
[0031] Appendix Figure 9 This is a schematic diagram of arc spraying. Detailed Implementation
[0032] In the embodiments and comparative examples, the experimental principle of arc spraying is as follows: Figure 7 As shown, the material of the plate is the same as that used for the track (specifically, CuCrZr alloy, with a mass percentage of 99.17% copper, 0.66% Cr, and 0.17% Zr); the wire is the same as that used for the armature (specifically, 7075Al alloy).
[0033] Example 1
[0034] First, the spraying equipment parameters were set as follows: voltage 25V, current 200A, and air pressure 0.6MPa. The distance between the nozzle and the substrate was set to 200mm, the spray angle to 15°, and the number of spray passes to 1. After the spraying experiment, a deposition layer of approximately 10μm was formed on the track material. The bonding between the deposition layer and the substrate was poor, with obvious interface cracking and pores appearing within the layer. The cross-sectional morphology is shown in the figure below. Figure 1 As shown. The sedimentary layer reconstructed through this embodiment is similar to the sedimentary layer in the middle of the orbit that has served more than half of its service life in terms of thickness, intralayer morphology, and interface state.
[0035] Example 2
[0036] First, the spraying equipment parameters were set as follows: voltage 25V, current 200A, and air pressure 0.6MPa. The distance between the nozzle and the substrate was set to 200mm, the spray angle to 30°, and the number of spray passes to 1. After the spraying experiment, a deposition layer of approximately 10μm was formed on the track material, and the bonding effect between the deposition layer and the substrate was good, with no obvious interface cracking. Its cross-sectional morphology is as follows. Figure 2 As shown. The sedimentary layer reconstructed through this embodiment is similar to the sedimentary layer at the end of the orbit where the service life is more than halfway through.
[0037] Example 3
[0038] First, the spraying equipment parameters were set as follows: voltage 25V, current 200A, and air pressure 0.6MPa. The distance between the nozzle and the substrate was set to 200mm, the spray angle to 45°, and the number of spray passes to 1. After the spraying experiment, a deposition layer of approximately 20μm was formed on the track material, and the bonding effect between the deposition layer and the substrate was good, with no obvious interface cracking. Cracks and pores were present within the layer. Its cross-sectional morphology is as follows. Figure 3 As shown. The sedimentary layer reconstructed through this embodiment is similar to the sedimentary layer in the middle of the orbit that has reached its service life in terms of thickness, intralayer morphology, and interface state.
[0039] Example 4
[0040] First, the spraying equipment parameters were set as follows: voltage 25V, current 200A, and air pressure 0.6MPa. The distance between the nozzle and the substrate was set to 200mm, the spray angle to 45°, and the number of spray passes to 2. After the spraying experiment, a deposition layer of approximately 40μm was formed on the track material, and the bonding effect between the deposition layer and the substrate was good, with no obvious interface cracking. Large areas of defects and pores were observed within the layer. Its cross-sectional morphology is shown below. Figure 4As shown. The deposition layer reconstructed through this embodiment is similar to the deposition layer at the end of the orbit that has reached its service life in terms of thickness, intralayer morphology, and interface state.
Claims
1. A method for reconstructing an electromagnetic launch orbit deposition layer, characterized in that: Using electromagnetic launch track material as the substrate and armature material as the coating material, an arc spraying device was used to obtain the surface coating deposition layer structure of the track material by changing the spray angle and spray passes; the actual electromagnetic launch track surface deposition layer was reconstructed based on the obtained deposition layer structure. By changing the spray angle and spray passes, a morphology and physical properties similar to the deposited layer caused by molten spatter in the latter half of the actual launch trajectory are formed. The voltage used in the spraying process is 10~50 V, the spraying current is 100~300 A, the spraying distance is 150~300 mm, the air pressure is 0.5~1.0 MPa, the spray angle is 10~60°, and the number of spray passes is 1~2. The electromagnetic launch track is made of Cu or Cu alloy, and the armature is made of Al or Al alloy.
2. The method for reconstructing an electromagnetic launch orbit deposition layer according to claim 1, characterized in that: The voltage is 15~35 V, the spraying current is 150~250 A, the spraying distance is 180~250 mm, the air pressure is 0.6~0.9 MPa, and the spraying angle is 15~50°.
3. The method for reconstructing an electromagnetic launch orbit deposition layer according to claim 2, characterized in that: The voltage is 20~30 V, the spraying current is 190~210 A, the spraying distance is 190~210 mm, the air pressure is 0.6~0.65 MPa, and the spraying angle is 15~48°.
4. The method for reconstructing an electromagnetic launch orbit deposition layer according to claim 1, characterized in that: Using Cu or Cu alloy as the substrate and Al or Al alloy as the spraying material; controlling the spraying voltage to 25 V, the current to 200 A, the air pressure to 0.6 MPa, and setting the distance between the nozzle and the substrate to 200 mm; when the spraying angle is 10°~20° and the spraying pass is 1, a deposited layer is obtained that reconstructs the middle position of the orbit with a service time of 1 / 3 to 3 / 5 of the service life; Using Cu or Cu alloy as the substrate and Al or Al alloy as the spraying material; controlling the spraying voltage to 25 V, the current to 200 A, the air pressure to 0.6 MPa, and setting the distance between the nozzle and the substrate to 200 mm; when the spraying angle is 25°~35° and the spraying pass is 1, a deposited layer can be obtained that reconstructs the orbital end position with a service time of 1 / 3 to 3 / 5 of the service life.
5. The method for reconstructing an electromagnetic launch orbit deposition layer according to claim 1, characterized in that: Using Cu or Cu alloy as the substrate and Al or Al alloy as the spraying material; controlling the spraying voltage to 25 V, the current to 200 A, the air pressure to 0.6 MPa, and setting the distance between the nozzle and the substrate to 200 mm; when the spraying angle is 42°~48° and the spraying passes are 1, a deposition layer in the middle position of the orbit with a service time greater than or equal to 0.9 times the service life can be obtained; Using Cu or Cu alloy as the substrate and Al or Al alloy as the spraying material; controlling the spraying voltage to 25 V, the current to 200 A, the air pressure to 0.6 MPa, and setting the distance between the nozzle and the substrate to 200 mm; when the spraying angle is 42°~48° and the spraying passes are 2, a deposition layer that reconstructs the service time of the orbital end position is greater than or equal to 0.9 times the service life can be obtained.
Citation Information
Patent Citations
An electromagnetic launch rail surface reconstruction method
CN116202366B
Electromagnetic emission track surface reconstruction method
CN116202366A