Plasma discharge power adjustment system and method

Abstract

The application discloses a kind of plasma discharge power adjusting system and method thereof, including microcontroller, several oscillation circuits, several power regulation modules, operation module, feedback module and alarm module, the power regulation module, operation module, alarm module and feedback module are connected with microcontroller respectively;The power regulation module is used to adjust the output power of oscillation circuit, and the feedback module includes several temperature acquisition circuits;Specific adjustment method steps are as follows: S1, collect temperature information of treatment area;S2, judge whether temperature is normal;S3, adjust plasma discharge power.The application can realize the continuous adjustment of power, can understand the change of skin surface temperature during treatment in real time, facilitate timely adjustment of power parameter, reduce the risk of complication.

Description

Technical Field

[0001] This invention relates to the field of plasma skin treatment technology, specifically to a plasma discharge power adjustment system and method. Background Technology

[0002] A necessary condition for generating high-performance plasma for skin treatment is the stable voltage of the high-voltage electrode during the excitation process. The high-voltage electrode is mounted at the front of the treatment handpiece. Furthermore, to control the treatment effect in different skin areas, skin colors, and textures, and to reduce the risk of postoperative inflammation, the plasma excitation power must be adjustable. The range of power variation is a core variable to be controlled in plasma treatment because it affects current, temperature, and discharge frequency. In traditional treatment methods, the discharge power of the high-voltage electrode is fixed and cannot be continuously adjusted. This results in inflexible treatment parameters, affecting treatment flexibility, potentially causing complications, and preventing the adaptation of treatment plans to individual patient conditions. Summary of the Invention

[0003] The purpose of this invention is to provide a plasma discharge power adjustment system and method that can achieve continuous power adjustment, monitor changes in skin surface temperature in real time during treatment, facilitate timely adjustment of power parameters, reduce the risk of complications, and solve the problems mentioned in the background art.

[0004] To achieve the above objectives, the present invention provides the following technical solution: a plasma discharge power adjustment system, comprising a microcontroller, several oscillation circuits, several power adjustment modules, an operation module, a feedback module, and an alarm module, wherein the power adjustment module, the operation module, the alarm module, and the feedback module are respectively connected to the microcontroller;

[0005] The power adjustment module is used to adjust the output power of the oscillation circuit, and the feedback module is used to provide feedback on the effect of the power adjustment.

[0006] The power regulation module includes a voltage control unit, a current control unit, and a current acquisition unit;

[0007] The operation module includes a touch screen unit, an adjustment button unit, and a communication module;

[0008] The feedback module includes several temperature acquisition circuits;

[0009] The alarm module includes several buzzers and alarm lights.

[0010] Preferably, the voltage control unit includes an input voltage stabilizing chip and an input voltage circuit connected to the input voltage stabilizing chip, and the voltage control unit is used to adjust the DC voltage input to the oscillation circuit.

[0011] Preferably, the current control unit includes a PWM chopper current control circuit, the input terminal of which is connected to the microcontroller; the PWM chopper current control circuit includes a rise resistor R30, a resistor R29, a sampling resistor R33, and a high-speed switching MOSFET, the sampling resistor R33 is connected in series with the high-speed switching MOSFET, one end of the high-speed switching MOSFET is connected to the input terminal of the oscillation circuit, and the resistor R30 is connected to the input terminal of the high-speed switching MOSFET.

[0012] Preferably, the current acquisition unit is a two-stage series signal amplification and AD conversion circuit with filtering function. The current acquisition unit is connected to the microcontroller. The current acquisition unit module feeds back the signal across the acquisition and monitoring resistor R33 to the microcontroller after filtering, amplification and AD conversion, so that the microcontroller can effectively identify the plasma excitation power under various power states.

[0013] Preferably, the touch screen unit is located on the upper part of the treatment host, the alarm module is located on one side of the treatment host, the adjustment button unit is located on the touch screen unit, and the communication module includes a wireless communication module and a wired communication module, and the communication module is connected to the microcontroller.

[0014] The present invention also provides a method for adjusting plasma discharge power, using a plasma discharge power adjustment system, the specific steps of which are as follows:

[0015] S1. Collect temperature information of the treatment area; The temperature acquisition circuit receives the heat information of the skin in the treatment area, and the heat information is transmitted to the microcontroller. The microcontroller processes the information and obtains the temperature of the skin surface.

[0016] S2. Determine if the temperature is normal: Compare the real-time skin temperature information acquired by the microprocessor with the preset temperature information. If it exceeds the safety threshold, an alarm is triggered; if it does not exceed the safety threshold, return to step S1 and continue to collect temperature data.

[0017] S3. Adjust plasma discharge power: After receiving the alarm information, the doctor can manually adjust the current and voltage by operating the touch screen unit or the adjustment button unit. After the adjustment is completed, repeat steps S1 and S2.

[0018] Compared with the prior art, the beneficial effects of the present invention are:

[0019] 1. The power adjustment module in this invention is used to adjust the plasma excitation power of the probes on the treatment handpiece. It is equipped with multiple power adjustment modules to adapt to treatment handpieces with multi-level probe structures, and can realize individual control of the plasma excitation power of each probe. By adjusting the plasma excitation power, doctors can have more treatment strategy variations and can implement more precise and appropriate treatments.

[0020] 2. This invention also directly adjusts the input current of the input oscillation circuit through the PWM chopper current control circuit, thereby achieving free current adjustment; the microcontroller can control the input voltage stabilization chip through one pin to adjust the input DC voltage of the oscillation circuit, in order to compensate for the actual DC voltage drop of the input oscillation circuit during the chopper current adjustment process.

[0021] 3. In this invention, a high-speed switching MOSFET is added to the power supply terminal of the oscillation circuit, and its conduction and turn-off are controlled by a microcontroller, thereby realizing the pulse mode control of plasma excitation. The turn-on and turn-off time of the high-speed switching MOSFET can be set completely freely, and seamless switching between pulse mode and continuous mode of plasma discharge can also be realized.

[0022] 4. The current acquisition unit in this invention converts the acquired signal and feeds it back to the microcontroller 1, enabling the microcontroller 1 to effectively identify the plasma excitation state under various power conditions, with a monitoring time accuracy of 10ms. By effectively monitoring and identifying the plasma excitation state, we can use the microcontroller 1 to accurately calculate the plasma excitation time of a single treatment point. Attached Figure Description

[0023] Figure 1 This is a circuit connection diagram of the oscillation circuit module of the present invention;

[0024] Figure 2 This is a circuit diagram of the voltage control unit of the present invention;

[0025] Figure 3 This is a circuit diagram showing the connection between the circuit control unit and the current acquisition unit of the present invention;

[0026] Figure 4 This is a schematic diagram of the pinout of the microcontroller of the present invention;

[0027] Figure 5 This is a circuit diagram for temperature acquisition in this invention;

[0028] Figure 6 This is a schematic diagram of the system installation structure of the present invention;

[0029] Figure 7 This is a flowchart illustrating the steps of a plasma discharge power adjustment method according to the present invention.

[0030] In the diagram: 1. Microcontroller; 2. Oscillator circuit; 3. Power regulation module; 4. Operation module; 5. Feedback module; 6. Alarm module. Detailed Implementation

[0031] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0032] In the description of this invention, it should be noted that the terms "upper," "lower," "inner," "outer," "top / bottom," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing the invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0033] Please see Figure 1-6 The present invention provides a technical solution: a plasma discharge power adjustment system, comprising a microcontroller 1, several oscillation circuits 2, several power adjustment modules 3, an operation module 4, a feedback module 5, and an alarm module 6, wherein the power adjustment module 3, the operation module 4, the alarm module 6, and the feedback module 5 are respectively connected to the microcontroller 1;

[0034] The power adjustment module 3 is used to adjust the output power of the oscillation circuit 2, and the feedback module 5 is used to provide feedback on the effect of the power adjustment. The power adjustment module 3 includes a voltage control unit, a current control unit, and a current acquisition unit. The operation module 4 includes a touch screen unit, an adjustment button unit, and a communication module. The feedback module 5 includes several temperature acquisition circuits. The alarm module 6 includes several buzzers and alarm lights.

[0035] The voltage control unit includes an input voltage stabilizing chip and an input voltage circuit connected to the input voltage stabilizing chip. The voltage control unit is used to adjust the DC voltage input to the oscillation circuit 2.

[0036] The current control unit includes a PWM chopper current control circuit, the input of which is connected to the microcontroller 1. The PWM chopper current control circuit includes a rise resistor R30, a resistor R29, a sampling resistor R33, and a high-speed switching MOSFET. The sampling resistor R33 is connected in series with the high-speed switching MOSFET. One end of the high-speed switching MOSFET is connected to the input of the oscillation circuit 2, and the resistor R30 is connected to the input of the high-speed switching MOSFET.

[0037] The current acquisition unit is a two-stage series signal amplification and AD conversion circuit with filtering function. The current acquisition unit is connected to the microcontroller 1. The current acquisition unit module feeds back the signal across the acquisition and monitoring resistor R33 to the microcontroller 1 after filtering, amplification and AD conversion, so that the microcontroller 1 can effectively identify the plasma excitation power under various power conditions.

[0038] The touch screen unit is installed on the upper part of the external treatment host, the adjustment button unit is set on the touch screen unit, the alarm module is installed on the upper part of the external treatment host, and the communication module includes a wireless communication module and a wired communication module. The communication module is connected to the microcontroller 1.

[0039] Please see Figure 7 The present invention also provides a method for adjusting plasma discharge power, using a plasma discharge power adjustment system, the specific steps of which are as follows:

[0040] S1. Collect temperature information of the treatment area; The temperature acquisition circuit receives the heat information of the skin in the treatment area and transmits the heat information to the microcontroller 1. The microcontroller 1 processes the information and obtains the temperature of the skin surface.

[0041] S2. Determine if the temperature is normal: Compare the real-time skin temperature information acquired by the microprocessor with the preset temperature information. If it exceeds the safety threshold, an alarm is triggered; if it does not exceed the safety threshold, return to step S1 and continue to collect temperature data.

[0042] S3. Adjust plasma discharge power: After receiving the alarm information, the doctor can manually adjust the current and voltage by operating the touch screen unit or the adjustment button unit. After the adjustment is completed, repeat steps S1 and S2.

[0043] Working principle: During plasma treatment of the skin, the fluctuation of plasma excitation power is the core control variable during treatment, as it directly affects the effect of plasma treatment and post-treatment inflammation and pigmentation.

[0044] The power adjustment module 3 is used to adjust the plasma excitation power of the probes on the treatment handpiece. Multiple power adjustment modules 3 are provided to accommodate treatment handpieces with multi-level probe structures, and the plasma excitation power of each probe can be controlled individually. By adjusting the plasma excitation power, doctors can have more variations in treatment strategies and can implement more precise and appropriate treatments.

[0045] The input current of the input oscillation circuit 2 is directly adjusted by the PWM chopper current control circuit, thereby achieving free current adjustment. The oscillation circuit 2 adopts the mature Royer oscillation circuit. The microcontroller 1 can control the input voltage stabilization chip through a single pin to adjust the input DC voltage of the oscillation circuit 2. This is used to compensate for the actual DC voltage drop in the input oscillation circuit 2 during the chopper current adjustment process. The voltage stabilization chip is model FP6269-SOP8-EP.

[0046] A high-speed switching MOSFET is added to the power supply terminal of oscillation circuit 2, and its on / off state is controlled by microcontroller 1, thereby realizing pulse mode control of plasma excitation. The microcontroller uses a CC2642R1 chip, and the on / off time of the high-speed switching MOSFET can be set completely freely. It also enables seamless switching between pulse and continuous modes of plasma discharge. The current acquisition unit converts the acquired signal and feeds it back to microcontroller 1, allowing microcontroller 1 to effectively identify the plasma excitation state under various power conditions, with a monitoring time accuracy of 10ms. By effectively monitoring and identifying the plasma excitation state, we can use microcontroller 1 to accurately calculate the plasma excitation time for a single treatment point.

[0047] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0048] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.

[0049] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installed," "equipped with," "sleeved / connected," "connected," etc., should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be a connection within two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

Claims

1. A plasma discharge power adjustment system, characterized in that: It includes a microcontroller (1), several oscillation circuits (2), several power adjustment modules (3), an operation module (4), a feedback module (5) and an alarm module (6), wherein the power adjustment module (3), the operation module (4), the alarm module (6) and the feedback module (5) are respectively connected to the microcontroller (1); The power adjustment module (3) is used to adjust the output power of the oscillation circuit (2), and the feedback module (5) is used to provide feedback on the effect of the power adjustment. The power regulation module (3) includes a voltage control unit, a current control unit, and a current acquisition unit; The operation module (4) includes a touch screen unit, an adjustment button unit, and a communication module; The feedback module (5) includes several temperature acquisition circuits for acquiring temperature information of the treatment area; The alarm module (6) includes several buzzers and alarm lights; The voltage control unit includes an input voltage stabilizing chip and an input voltage circuit connected to the input voltage stabilizing chip. The voltage control unit is used to adjust the DC voltage input to the oscillation circuit (2). The current control unit includes a PWM chopper current control circuit, the input terminal of which is connected to the microcontroller (1); the PWM chopper current control circuit includes a lift resistor R30, a resistor R29, a sampling resistor R33, and a high-speed switching MOSFET, the sampling resistor R33 is connected in series with the high-speed switching MOSFET, one end of the high-speed switching MOSFET is connected to the input terminal of the oscillation circuit (2), and the resistor R30 is connected to the input terminal of the high-speed switching MOSFET.

2. The plasma discharge power adjustment system according to claim 1, characterized in that: The current acquisition unit is a two-stage series signal amplification and AD conversion circuit with filtering function. The current acquisition unit is connected to the microcontroller (1). The current acquisition unit module feeds back the signal across the acquisition monitoring resistor R33 to the microcontroller (1) after filtering, amplification and AD conversion, so that the microcontroller (1) can effectively identify the plasma excitation power under various power states.

3. The plasma discharge power adjustment system according to claim 1, characterized in that: The touch screen unit is located on the external treatment host, the adjustment button unit is located on the touch screen unit, the alarm module is located on the external treatment host, and the communication module includes a wireless communication module and a wired communication module. The communication module is connected to the microcontroller (1).

4. A method for adjusting plasma discharge power, characterized in that: The specific steps for applying this to the plasma discharge power adjustment system as described in any one of claims 1-3 are as follows: S1. Collect temperature information of the treatment area; receive heat information of the skin in the treatment area through the temperature acquisition circuit, transmit the heat information to the microcontroller (1), and obtain the temperature of the skin surface after processing by the microcontroller (1); S2. Determine if the temperature is normal: Compare the real-time skin temperature information acquired by the microprocessor with the preset temperature information. If it exceeds the safety threshold, an alarm is triggered; if it does not exceed the safety threshold, return to step S1 and continue to collect temperature data. S3. Adjust plasma discharge power: After receiving the alarm information, the doctor can manually adjust the current and voltage by operating the touch screen unit or the adjustment button unit. After the adjustment is completed, repeat steps S1 and S2.

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