Chuck mechanism and film forming device

Abstract

This invention provides a chuck mechanism and a film-forming apparatus capable of simultaneously holding or releasing multiple workpieces. The chuck mechanism of the embodiment includes: a first rotating part having multiple first arms extending radially from a shaft, and a first holding part disposed at the front end of the first arms and in contact with / separating from the outer edge of the workpiece; a second rotating part configured to rotate coaxially with the first rotating part, having multiple second arms extending radially from the shaft, the first arms and second arms forming a pair, the second rotating part having a second holding part disposed at the front end of the second arms and in contact with / separating from the outer edge of the workpiece; and a driving part that causes the first rotating part and the second rotating part to rotate synchronously, and causes each pair of the first holding parts and the second holding parts to move simultaneously between a holding position for holding the workpiece and a releasing position for releasing the workpiece, thereby simultaneously holding or releasing multiple workpieces.

Description

Technical Field

[0001] This invention relates to a chuck mechanism and a film-forming device. Background Technology

[0002] Sputtering-based film deposition apparatuses are widely used as devices for depositing films on the surface of substrates and other objects, i.e., workpieces. Sputtering is a technique that utilizes the following operation: ions are generated by plasma-introducing a gas into a vacuum chamber; the generated ions collide with the surface of a target material, thereby ejecting the film material and adhering it to the substrate.

[0003] In this type of sputtering, since the film formation on each substrate requires a specified time, the time required to form films on multiple substrates one by one becomes longer. To address this issue, the following operation is performed: multiple substrates are arranged facing each other relative to the target and formed into films simultaneously (see reference 1).

[0004] [Existing technical documents]

[0005] [Patent Literature]

[0006] [Patent Document 1] Japanese Patent Application Publication No. 01-212756 Summary of the Invention

[0007] [The problem the invention aims to solve]

[0008] However, even when multiple substrates are deposited together, the time required to remove the substrates one by one from the storage and move them into / out of the chamber increases, hindering productivity. Furthermore, when depositing films on both sides of the substrates, even when flipping the deposited substrates one by one, the time required increases, reducing productivity. Even with multiple mechanisms for moving the substrates into / out of the chamber or for flipping them, the number of mechanisms increases, requiring more components and complicating the structure.

[0009] The embodiments of the present invention are proposed to solve the problems of the prior art as described above, and the purpose is to provide a chuck mechanism and film forming device that can hold or release multiple workpieces at the same time.

[0010] [Technical means to solve the problem]

[0011] To achieve the aforementioned objective, the chuck mechanism of the embodiment includes: a first rotating part configured to rotate about a shaft, having multiple first arms extending radially from the shaft, and having a first holding part disposed at the front end of each of the first arms and in contact with / separating from the outer edge of the workpiece; a second rotating part configured to rotate coaxially with the first rotating part, having multiple second arms extending radially from the shaft, and having a second holding part disposed at the front end of each of the second arms and in contact with / separating from the outer edge of the workpiece; and a driving part, wherein each of the multiple first arms and each of the multiple second arms forms a pair, causing the first rotating part and the second rotating part to rotate synchronously, and causing the pair of first holding parts and second holding parts to move simultaneously between a holding position holding the workpiece and a releasing position releasing the workpiece, thereby holding or releasing multiple workpieces together.

[0012] The film-forming apparatus of the embodiment includes: a chamber capable of being set to vacuum; a film-forming section disposed in the chamber, which forms a film on a plurality of workpieces by sputtering in the film-forming chamber containing a target material; a conveying body disposed in the chamber, which conveys the plurality of workpieces to a position facing the film-forming chamber; a conveying / removing section, which moves the workpieces in / out relative to the chamber; and a supply section having the chuck mechanism, which delivers the plurality of workpieces together to the conveying / removing section.

[0013] In addition, the film-forming apparatus of the embodiment includes: a chamber that can be set to a vacuum; a film-forming section disposed in the chamber, which forms a film on multiple workpieces by sputtering in the film-forming chamber containing a target material; and a reversing section that holds the multiple workpieces formed by the film-forming section in the chuck mechanism and reverses the multiple workpieces together.

[0014] [The effects of the invention]

[0015] Through the embodiments of the present invention, a chuck mechanism and a film-forming device capable of holding or releasing multiple workpieces simultaneously can be provided. Attached Figure Description

[0016] Figure 1 This is a simplified plan view illustrating the film-forming apparatus of the embodiment.

[0017] Figure 2A It is an exploded perspective view showing the workpiece and the substrate. Figure 2B It's a 3D image. Figure 2C yes Figure 2B BB arrow view sectional view.

[0018] Figure 3A It is a plan view showing the retainer and the workpiece. Figure 3B yes Figure 3A CC arrow view sectional view, Figure 3CIt is a plan view showing the rotary table and the retainer.

[0019] Figure 4 This is a three-dimensional diagram representing the chuck mechanism.

[0020] Figure 5 This is an exploded 3D view of the chuck mechanism.

[0021] Figure 6A and Figure 6B This is a partial horizontal cross-sectional view of the chuck mechanism. Figure 6A It is a diagram representing maintaining position. Figure 6B This is a diagram showing the release position.

[0022] Figure 7 It represents the internal structure of the film-forming part. Figure 1 AA arrow view sectional view.

[0023] Figure 8 It represents the internal structure of the reversing part. Figure 1 The DD arrow view is a cross-sectional view, and it is a diagram showing the standby state of the chuck mechanism.

[0024] Figure 9 It means based on Figure 8 A diagram showing the handover status of the workpiece in the chuck mechanism.

[0025] Figure 10 It means based on Figure 8 A diagram showing the workpiece in the mid-reverse state of the chuck mechanism.

[0026] Figure 11A This is a plan view showing the standby state of the memory. Figure 11B It's a side view.

[0027] Figure 12A It is a plan view showing the workpiece delivery status of the storage device. Figure 12B It's a side view.

[0028] [Explanation of Symbols]

[0029] 1: Film forming device

[0030] 2: Chamber

[0031] 2a: Opening

[0032] 3: Rotary table

[0033] 10, 10A, 10B: Target materials

[0034] 22: Cover plate

[0035] 23: Chamber exhaust section

[0036] 25: Load lock chamber

[0037] 32: Opening

[0038] 50: Control device

[0039] 100: Film-forming part

[0040] 110: Film-forming chamber

[0041] 111: Opening

[0042] 112: Spacer

[0043] 113: Cover

[0044] 120: Sputtering source

[0045] 121: Backplate

[0046] 122: Electrode

[0047] 130: Power Supply Section

[0048] 140: Sputtering gas inlet section

[0049] 150: Exhaust section

[0050] 160: Thruster

[0051] 161: Loading section

[0052] 162: Top

[0053] 200: Reversal Section

[0054] 210: Reversal Chamber

[0055] 211: Opening

[0056] 212: Container

[0057] 220: Reverse Drive Unit

[0058] 230: Sealed Chamber

[0059] 240: Thruster

[0060] 241: Loading section

[0061] 242: Top

[0062] 243: Sealing body

[0063] 300: Move-in / Move-out Department

[0064] 310: Transport Department

[0065] 311: Arm

[0066] 312: Enclosed section

[0067] 400: Supply Department

[0068] 410: Supply Station

[0069] 420: Chuck moving mechanism

[0070] 421: Guiding mechanism

[0071] 422: Rotating mechanism

[0072] 430: Storage

[0073] 431: Carrier

[0074] 431a: Support plate

[0075] 431b: Side guide

[0076] 431c: Protrusion

[0077] 432: Sending organization

[0078] 432a: Upper push rod

[0079] 432b: Drive unit

[0080] 432c: lift plate

[0081] 432d: Slider

[0082] 432e: Driver Source

[0083] 500: Chuck structure

[0084] 510: Shaft

[0085] 520: First rotating part

[0086] 521: Matrix

[0087] 521a: Shaft hole

[0088] 522: First Arm

[0089] 523: First Maintenance Section

[0090] 523a: slot

[0091] 530: Second rotating part

[0092] 531: Matrix

[0093] 531a: Shaft hole

[0094] 532: Second Arm

[0095] 533: Second Maintenance Section

[0096] 533a: slot

[0097] 540: Drive Unit

[0098] 541: Main body

[0099] 542: Drive shaft

[0100] 543: Driver Source

[0101] 544: Conversion Mechanism

[0102] 544a, 544b: Elbow-joint arm

[0103] 544c: Common shaft section

[0104] 544d, 544e: Connecting rod shaft

[0105] 545: Shaft support section

[0106] 545a, 545b: Support plate

[0107] G: Sputtering gas

[0108] H: Holder

[0109] Ha: Kong

[0110] Hb: Supporting edge

[0111] J: Fixture

[0112] Ju: Upper clamp

[0113] Jd: Lower clamp

[0114] Js: Spacer

[0115] Jp: Sales

[0116] Jm: Magnet

[0117] S: Substrate

[0118] T: Platform

[0119] W: Workpiece Detailed Implementation

[0120] Embodiments of the present invention (hereinafter referred to as "this embodiment") will be specifically described with reference to the accompanying drawings. Furthermore, the drawings are schematic diagrams, and the dimensions, proportions, etc., of each part include exaggerated portions for ease of understanding.

[0121] [summary]

[0122] like Figure 1As shown, this embodiment is a film-forming apparatus 1 that uses plasma to form films on the film-forming target surfaces of various workpieces W, which are the objects to be formed. The film-forming apparatus 1 of this embodiment includes a rotating stage 3, which holds a holder H (see reference 1) containing multiple workpieces W within a chamber 2 that can be set to a vacuum. Figure 3A The rotating assembly is held in place and rotates intermittently in 90° increments. The film-forming apparatus 1 performs various processing on the workpiece W at three of the four stopping positions of the rotating table 3. A film-forming section 100, a reversing section 200, and a loading / unloading section 300 are located at these three stopping positions. Furthermore, the film-forming apparatus 1 has a supply section 400 that supplies the workpiece W to the loading / unloading section 300. In addition, the remaining stopping position is a preparatory position that can be used in various ways. This preparatory position can be used, for example, as a standby position for cooling, a cooling mechanism-based cooling position, a position for adding a film-forming section, a film processing section, etc.

[0123] In this embodiment, multiple workpieces W are stored in the supply unit 400, and three workpieces W are mounted in a holder H within the supply unit 400. The holder H, carrying the workpieces W, is supplied to the rotary table 3 within the chamber 2 via the loading / unloading unit 300. As the rotary table 3 rotates intermittently, the holder H is transported to the film-forming unit 100 for film-forming treatment on one side of the workpiece W. After film-forming treatment, the workpiece W is transported to the reversing unit 200 and reversed. The holder H, carrying the reversed workpiece W, is then transported again to the film-forming unit 100 for film-forming treatment on the other side of the workpiece W. The holder H carrying workpieces W on both sides (one side and the other) that have undergone film-forming is transported to the loading / unloading unit 300 without reversing via the reversing unit 200 and is removed from the chamber 2. Thus, the film-forming apparatus 1 of this embodiment can perform film-forming treatment on multiple workpieces W simultaneously.

[0124] In the film-forming section 100, multiple workpieces W are simultaneously formed by sputtering within the film-forming chamber 110, which includes the target material 10. Specifically, ions generated by plasmaizing the sputtering gas G collide with the target material 10, causing particles of the film-forming material constituting the target material 10 to adhere to the film-forming target surfaces of the multiple workpieces W. The film-forming section 100 of this embodiment includes two targets 10A and 10B. Furthermore, without distinguishing between target material 10A and target material 10B, they are simply referred to as target material 10 (see reference 10B). Figure 7 ).

[0125] The reversing section 200 reverses the workpiece W. This reversing mechanism includes a chuck mechanism 500. Specifically, in order to form a film on both sides of the workpiece W, the chuck mechanism 500 within the reversing chamber 210 holds the workpiece W after film formation on one side in the film-forming section 100 and reverses it, so that film formation on the other side can also be performed in the film-forming section 100 (see reference). Figure 10The chuck mechanism 500 holds multiple workpieces W together.

[0126] The loading / unloading unit 300, while maintaining a vacuum inside the chamber 2 via the load lock chamber 25, loads unprocessed workpieces W from the outside into the chamber 2 and unloads processed workpieces W out of the chamber 2. The supply unit 400 delivers multiple workpieces W to the loading / unloading unit 300 simultaneously. The supply unit 400 also includes a chuck mechanism 500.

[0127] [Target material for film formation]

[0128] In this embodiment, a circular workpiece W is used as an example of the object to be deposited. The workpiece W is a component in which the substrate S and the fixture J are integrated, as described later. Multiple workpieces W are mounted on the holder H and transported by the rotary table 3. The substrate S is a circular plate. The substrate S is, for example, a quartz substrate used in quartz devices such as quartz oscillators and quartz crystals, and Au layers as electrodes are deposited on both sides of the quartz substrate. In addition, a Cr layer, which serves as an adhesive layer to improve the adhesion of the Au layer to the surface of the quartz substrate, is deposited between the surface of the quartz substrate and the Au layer. Therefore, the Cr layer as an adhesive layer and the Au layer as an electrode are deposited on both sides of the quartz substrate. However, this is not limited to these two layers; silicon (Si) wafers, silicon carbide (SiC) wafers, sapphire substrates, and glass substrates may also be used.

[0129] Fixture J is a component for assembling the substrate S. For example... Figure 2A Exploded 3D diagram Figure 2B 3D image Figure 2C Cross-sectional view ( Figure 2B As shown in the BB arrow cross-sectional view, the fixture J of this embodiment has an upper fixture Ju, a lower fixture Jd, a spacer Js, and a pin Jp. The upper fixture Ju and the lower fixture Jd are annular plates with an inner diameter smaller than the outer diameter of the substrate S and an outer diameter larger than the outer diameter of the substrate S. The spacer Js is an annular plate with an inner diameter larger than the outer diameter of the substrate S, and an outer diameter equal in size to that of the upper fixture Ju and the lower fixture Jd. The spacer Js is made of resin. The upper fixture Ju, the lower fixture Jd, and the spacer Js can also be made of metal.

[0130] By clamping a spacer Js between the upper clamp Ju and the lower clamp Jd, and clamping the substrate S on the inner edge side of the spacer Js, the substrate S is assembled into the clamp J. Therefore, as... Figure 2C As shown, the spacer Js is disposed on the outer side of the substrate S. Additionally, as... Figure 2CAs shown, a magnet Jm is embedded in the lower clamp Jd further outward from the outer edge of the substrate S. This magnet attracts the upper clamp Ju, thereby clamping the spacer Js and substrate S between the upper clamp Ju and the lower clamp Jd. This prevents the substrate S from detaching from the clamp J. Furthermore, the upper clamp Ju, lower clamp Jd, and spacer Js each have multiple through holes at their corresponding positions. Inserting a pin Jp into these through holes prevents positional shift. In the following description, the clamp J on which the substrate S is mounted will be referred to simply as the workpiece W.

[0131] [Retainer]

[0132] like Figure 3A , Figure 3B As shown, the retainer H in this embodiment is a component for mounting workpieces W. The retainer H is a circular plate having a diameter capable of mounting multiple workpieces W, and three workpieces W are mounted at equal intervals around its center. A circular hole Ha is formed at the mounting position of the workpiece W, and a thin-walled support edge Hb supporting the outer edge of the lower surface of the workpiece W is formed on the inner edge of the hole Ha.

[0133] [Chuck Mechanism]

[0134] Reference Figure 4 3D image Figure 5 Exploded 3D diagram Figure 6A , Figure 6B The plan view illustrates the chuck mechanism 500, which is disposed between the reversing section 200 and the supply section 400 and holds multiple workpieces W together. The chuck mechanism 500 includes a shaft section 510, a first rotating section 520, a second rotating section 530, and a drive section 540.

[0135] (Shaft)

[0136] The shaft portion 510 is a component that serves as the rotation center for both the first rotating portion 520 and the second rotating portion 530. In this embodiment, the shaft portion 510 is a cylindrical bolt with a threaded groove formed at its front end for fastening a nut.

[0137] (First rotating part)

[0138] The first rotating part 520 includes a base 521, first arms 522, and a first holding part 523. The base 521 is a plate with shaft holes 521a for inserting shaft parts 510. The first arms 522 are multiple members extending radially from the shaft parts 510. The first arms 522 are elongated cuboid members and are arranged at equal intervals around the base 521. In this embodiment, three first arms 522 are provided on the base 521. The front end of each first arm 522 is bent in the direction along the tangent of the outer circumference of the workpiece W.

[0139] The first retaining part 523 is disposed at the front end of each of the first arms 522 and contacts / separates from the outer edge of the workpiece W. The contact / separation is performed as the first arm 522 rotates. The first retaining part 523 is a cuboid-shaped component extending along the tangent direction of the outer circumference of the workpiece W, and a groove 523a is formed on the surface that contacts / separates from the workpiece W for the edge of the workpiece W to be inserted.

[0140] (Second rotating part)

[0141] The second rotating part 530 includes a base 531, a second arm 532, and a second holding part 533. The base 531 is a plate with a shaft hole 531a for inserting the shaft part 510. The second arm 532 is a plurality of members arranged coaxially with the first arm 522, i.e., rotating about the shaft part 510, and extending radially from the shaft part 510. The second arm 532 is an elongated cuboid-shaped member and is arranged at equal intervals around the base 531. In this embodiment, three second arms 532 are provided on the base 531. The front ends of each second arm 532 are bent in the same direction along the tangent of the outer circumference of the workpiece W. Each of the plurality of first arms 522 and each of the plurality of second arms 532 form a pair.

[0142] The second retaining portion 533 is disposed at the front end of each of the second arms 532 and contacts / separates from the outer edges of the plurality of workpieces W. The contact / separation is performed as the second arm 532 rotates. The second retaining portion 533 is a cuboid-shaped component extending along the tangent direction of the outer circumference of the workpiece W, and a groove 533a is formed on the surface that contacts / separates from the workpiece W for the edge of the workpiece W to be inserted.

[0143] (Drive Department)

[0144] The drive unit 540 causes the first rotating part 520 and the second rotating part 530 to rotate synchronously. The direction of rotation is opposite to that of the first rotating part 520 and the second rotating part 530. For example, when the first rotating part 520 rotates to the left, the second rotating part 530 rotates to the right. The first rotating part 520 and the second rotating part 530, based on the rotation of the drive unit 540, cause a pair of first holding parts 523 and second holding parts 533 to be in the holding position of holding the workpiece W (see reference). Figure 6A ) and the release position of the released workpiece W (refer to Figure 6BThe multiple workpieces W can be moved simultaneously between the two parts, and can be held or released together. That is, multiple workpieces W can be held and released together. More specifically, the first holding part 523 and the second holding part 533 in a pair of first holding parts 523 and second holding parts 533 can be simultaneously positioned in the holding position to hold the workpieces W by the drive unit 540, and multiple workpieces W can be held together. The first holding part 523 and the second holding part 533 in a pair of first holding parts 523 and second holding parts 533 can be simultaneously positioned in the release position to release the workpieces W, and the multiple held workpieces W can be released together. Alternatively, the workpieces W can be positioned between the first holding parts 523 and the second holding parts 533 facing each other for holding purposes.

[0145] In this embodiment, there are three sets of the first holding portion 523 and the second holding portion 533, so that three workpieces W can be held or released at the same time. Furthermore, the holding positions of the first holding portion 523 and the second holding portion 533 are set to hold the workpiece W in a direction orthogonal to the axial direction of the shaft portion 510. That is, the outer end of the workpiece W is held in a horizontal direction, the same direction as the surface of the workpiece W, in a direction orthogonal to the axial direction of the shaft portion 510, which is the rotation center of the first rotating portion 520 and the second rotating portion 530. The position of the surface of the first holding portion 523 and the second holding portion 533 in contact with the workpiece W, and the position of the grooves 523a and 533a into which the edge of the workpiece W is inserted, are set in such a way that the height difference caused by the overlapping arrangement of the first rotating portion 520 and the second rotating portion 530 does not affect the holding position of the workpiece W based on the first holding portion 523 and the second holding portion 533. Therefore, when the shaft 510 is in the vertical direction, the workpiece W is in the horizontal direction.

[0146] The drive unit 540 includes a main body 541, a drive shaft 542, a drive source 543, a conversion mechanism 544, and a shaft support 545. The main body 541 is a cylindrical body constituting the main body of the drive unit 540. The drive shaft 542 is an elongated rod configured to slide within the main body 541. The front end of the drive shaft 542 protrudes from one end face of the main body 541. The rear end of the drive shaft 542 protrudes from the other end face of the main body 541. The drive source 543 moves the drive shaft 542 in a linear direction, that is, the drive shaft 542 moves linearly toward the shaft portion 510. The drive source 543 is a cylinder connected to the rear end of the drive shaft 542 and reciprocates the drive shaft 542. Thus, the drive shaft 542 moves in the radial direction of the rotation of the first rotating portion 520 and the second rotating portion 530.

[0147] The conversion mechanism 544 converts the linear movement of the drive shaft 542 based on the drive source 543 into rotation of the first rotating part 520 and the second rotating part 530. The conversion mechanism 544 is a linkage mechanism connected to the drive shaft 542, a first arm 522 of the first rotating part 520, and a second arm 532 of the second rotating part 530. The conversion mechanism 544 has a pair of connecting members, namely, toggle arms 544a and 544b. One end of each toggle arm 544a and 544b is rotatably connected. More specifically, one end of toggle arms 544a and 544b is rotatably connected to the end of the drive shaft 542 near the shaft portion 510 (the front end of the drive shaft 542). This connection is made via a common shaft portion 544c. The other end of one toggle arm 544a is rotatably connected to the first arm 522 of the first rotating part 520 closest to the drive shaft 542. The connection is made via the connecting rod shaft portion 544d. The other end of the other toggle arm 544b is rotatably connected to a second arm 532 in the second rotating portion 530 closest to the drive shaft 542. This connection is made via the connecting rod shaft portion 544e. In this embodiment, the common shaft portion 544c, connecting rod shaft portion 544d, and connecting rod shaft portion 544e are cylindrical bolts with threaded grooves formed at their front ends for nut tightening.

[0148] The shaft support 545 is a component that rotatably supports the first rotating part 520 and the second rotating part 530 via the shaft part 510 to the drive part 540. The shaft support 545 is a pair of elongated plates and has support plates 545a and 545b configured to clamp the first rotating part 520 and the second rotating part 530 from above and below. One end of the support plate 545a overlaps the base 521 of the first rotating part 520, and the shaft part 510 is inserted through a hole corresponding to the shaft hole 521a. One end of the support plate 545b overlaps the base 531 of the second rotating part 530, and the shaft part 510 is inserted into the hole corresponding to the shaft hole 531a. A nut is tightened at the downward-protruding front end of the shaft part 510. Thus, the first rotating part 520 and the second rotating part 530 are supported so that they can rotate around a common shaft part 510. Furthermore, the other ends of the support plates 545a and 545b are fixed by clamping the main body 541.

[0149] [Cavity]

[0150] Chamber 2 is a container capable of being made into a vacuum. For example... Figure 1As shown, the chamber 2 in this embodiment is a rectangular box shape with a cover plate 22 on the upper surface and a bottom plate (not shown) on the side where it is disposed. A chamber exhaust section 23 is provided in the chamber 2. The chamber exhaust section 23 in this embodiment has a pipe connected to an opening formed in the bottom plate. The chamber exhaust section 23 is configured with a pneumatic circuit (not shown) and can reduce pressure inside the chamber 2 through exhaust processing.

[0151] [Rotating Table]

[0152] like Figure 1 , Figure 3C As shown, the rotary table 3 is a conveyor that transports the workpiece W mounted on the holder H within the chamber 2. The rotary table 3 is a circular plate that rotates intermittently about its center axis by a drive source (not shown). Openings 32, serving as through holes, are formed at equal intervals along the circumference of the rotary table 3. Four openings 32 are arranged at 90° intervals corresponding to the stop position of the intermittent rotation. Three of these positions face the film-forming section 100, the reversing section 200, and the loading / unloading section 300. The holder H is placed on the edges of these openings 32 and positioned at each position, and is raised and lowered by the force applied by the pushers 160 and 240 (described later) through the openings 32.

[0153] [Film-forming part]

[0154] like Figure 1 , Figure 7 As shown, the film-forming section 100 includes a film-forming chamber 110, a sputtering source 120, a power supply section 130, a sputtering gas inlet section 140, an exhaust section 150, and a pusher 160.

[0155] (film-forming chamber)

[0156] The film-forming chamber 110 is a space where film formation is performed via sputtering. For example... Figure 7 As shown, the film-forming chamber 110 includes an opening 111, a spacer 112, and a cover 113. The opening 111 is a through hole in the cover plate 22 of the chamber 2. The spacer 112 is a cylindrical component that surrounds the opening 111 and is disposed on the outer side of the cover plate 22 of the chamber 2. The spacer 112 forms the sidewall of the film-forming chamber 110. The cover 113 is a box-shaped body that seals the upper part of the spacer 112. The cover plate 22, spacer 112, and cover 113 are sealed together by a sealing material such as an O-ring.

[0157] (Splash source)

[0158] The sputtering source 120 is a source of film-forming material that deposits film-forming material on the workpiece W and forms a film through sputtering. The sputtering source 120 has a target 10, a back plate 121, and an electrode 122.

[0159] In this embodiment, two targets 10 are provided. The two targets 10, namely targets 10A and targets 10B, are components formed by film-forming materials deposited on the workpiece W to form a film. The sputtering surfaces of targets 10A and targets 10B, which are gradually cut by sputtering, are positioned at an angle to the workpiece W.

[0160] As film-forming materials, Cr, Au, etc. can be used. However, as long as the material can be sputtered to form a film, various materials can be used. Target 10A and target 10B can be made of the same material, or they can be made of different types of materials.

[0161] The backplate 121 is a holding member that individually holds each target 10A and 10B. The electrode 122 is a conductive member used to individually apply electricity to each target 10A and 10B from outside the chamber 2. Furthermore, although not shown, the sputtering source 120 includes magnets, a cooling mechanism, etc. That is, the film-forming section 100 of this embodiment is configured as a magnetron sputtering apparatus.

[0162] (Power Supply Section)

[0163] The power supply unit 130 is a structure that applies electricity to each of the targets 10A and 10B. By applying electricity to the targets 10 through the power supply unit 130, the sputtering gas G (described later) can be plasmaized, thereby causing the film-forming material to deposit on the workpiece W. The electricity applied to each target 10A and 10B can be changed individually. In this embodiment, the power supply unit 130 is, for example, a radio frequency (RF) power supply that applies a high-frequency voltage. Alternatively, it may be a direct current (DC) power supply.

[0164] (Sputtering gas inlet section)

[0165] In the plasma processing of this embodiment, a sputtering gas G can be used. The sputtering gas G is a gas used to cause ions generated by the plasma produced by the application of electricity to collide with the target 10A and the target 10B, thereby causing the material of the target 10A and the target 10B to deposit on the surface of the substrate S. For example, an inert gas such as argon can be used as the sputtering gas G.

[0166] The sputtering gas inlet 140 has piping for introducing sputtering gas G. The sputtering gas inlet 140 is configured to include a gas supply circuit (not shown) and is capable of introducing sputtering gas G from a supply source into the film formation chamber 110.

[0167] (Exhaust section)

[0168] The exhaust section 150 has a pipe connected to an opening formed in the spacer 112. The exhaust section 150 is configured to include an exhaust circuit (not shown) and is capable of depressurizing the film-forming chamber 110 through exhaust processing.

[0169] (Actuator)

[0170] A pusher 160 is positioned within the chamber 2 corresponding to the film-forming section 100, causing the holder H to rise and fall. The pusher 160 is configured to rise and fall via a cylinder (not shown) and is also rotatable. The pusher 160 has a mounting section 161, which, by rising, mounts the holder H and detaches it from the rotary table 3. An upper top 162 is provided on the mounting section 161, which pushes the workpiece W upwards, causing it to detach from the holder H.

[0171] [Reversal Section]

[0172] like Figures 8-10 As shown, the reversing unit 200 holds multiple workpieces W that have undergone film formation in the film-forming unit 100 via the chuck mechanism 500 and reverses them together. In this embodiment, the reversing unit 200 lifts three workpieces W placed on the holder H together, detaches them from the holder H, rotates them 180°, and then lowers them back onto the holder H. The center of rotation for reversing based on the chuck mechanism 500 is common to the three workpieces W, and the axis of rotation is in a direction parallel to the workpieces W, i.e., in the horizontal direction. In addition to the chuck mechanism 500, the reversing unit 200 also includes a reversing chamber 210, a reversing drive unit 220, a sealing chamber 230, and a pusher 240.

[0173] (Reversal Chamber)

[0174] The reversing chamber 210 is a space for reversing workpieces W. It can accommodate multiple workpieces W that are reversed together. The multiple workpieces W held by the chuck mechanism 500, including the chuck mechanism 500, have dimensions larger than the diameter of the outermost edge (the diameter of rotation of workpiece W) as depicted when the rotation is performed for reversal. That is, the width, depth, and height of the reversing chamber 210 are all larger than the diameter of rotation of workpiece W. Figure 10 The diagram illustrates the rotation of multiple workpieces W. In the figure, the diameter of the circle formed by the dashed arrows indicating reversal is the diameter of the rotation of the multiple workpieces W. The reversal chamber 210 includes an opening 211 and a container 212. The opening 211 is a through hole provided in the cover plate 22 of the chamber 2. The container 212 is a bottomed cylindrical component, installed by blocking the opening 211 of the cover plate 22 with its lower opening, and sealed by a sealing material such as an O-ring.

[0175] (Chuck mechanism)

[0176] In the chuck mechanism 500 of the reversing section 200, the drive shaft 542 penetrates the side wall of the reversing chamber 210, and a first rotating part 520 and a second rotating part 530 are disposed inside the reversing chamber 210. More specifically, the main body 541 airtightly penetrates the side of the container 212, the first rotating part 520 and the second rotating part 530 are arranged horizontally inside the container 212 in the standby state, and the drive part 540 is disposed outside the container 212 (see reference). Figure 4 ).

[0177] (Reverse drive unit)

[0178] The reversing drive unit 220 rotates the first rotating part 520 and the second rotating part 530 around the drive shaft 542, thereby reversing the multiple workpieces W held by the first holding part 523 and the second holding part 533. The drive shaft 542 is a rotating shaft used to reverse the multiple workpieces W together, and is arranged in the horizontal direction. Figure 1 As shown, the reverse drive unit 220 of this embodiment is a hollow rotary actuator that is fixed to the outer side of the container 212 in order to accommodate the drive source 543, and the main body 541 rotates together with the drive source 543.

[0179] (Sealed chamber)

[0180] The sealing chamber 230 is a container for sealing the reversing chamber 210. The sealing chamber 230 is cylindrical and is installed by blocking the opening 211 of the cover plate 22 at its upper opening, and is sealed by sealing materials such as O-rings. The lower opening of the sealing chamber 230 is sealed by the sealing body 243 described later (see reference). Figure 9 ).

[0181] (Actuator)

[0182] A pusher 240 is positioned within chamber 2 corresponding to the reversing part 200, causing the retainer H to rise and fall. The pusher 240 is configured to rise and fall via a cylinder (not shown). The pusher 240 has a mounting part 241, which, by rising, mounts the retainer H and detaches it from the rotary table 3. An upper top 242 is provided on the mounting part 241, which pushes the workpiece W upwards, detaching it from the retainer H. Additionally, the pusher 240 is provided with a sealing body 243, which, by rising, seals the opening at the lower end of the sealing chamber 230.

[0183] Furthermore, although not shown in the figure, a cooling water circulation path is provided in the reversing chamber 210, forming a cooling plate that is in close proximity to the workpiece W after film formation for cooling. Additionally, a gas blowing section may be provided for cooling by blowing cooling gas.

[0184] [Move-in / Move-out Department]

[0185] The loading / unloading section 300 is a device for loading / unloading the retainer H relative to the chamber 2. For example... Figure 1 As shown, the loading / unloading unit 300 includes a conveying unit 310. The conveying unit 310 picks up the holder H carrying the workpiece W from the loading table T of the supply unit 400 (described later) and moves it into the load lock chamber 25, which is configured as chamber 2. Furthermore, the conveying unit 310 removes the holder H carrying the processed workpiece W from the load lock chamber 25 and transfers it to the supply unit 400. In addition, the holder H is positioned on the loading table T such that when the chuck moving mechanism 420 of the supply unit 400 positions the first holding part 523 and the second holding part 533 in the chuck mechanism 500 on the loading table T, the positions of the plurality of holes Ha of the holder H are respectively aligned with the plurality of groups of the first holding part 523 and the second holding part 533.

[0186] The conveying unit 310 has an arm 311 and a closing part 312. The arm 311 is a long strip member disposed parallel to the plane of the rotary table 3 between the loading platform T and the chamber 2. The arm 311 is configured to be able to rotate intermittently in 180° increments along an axis parallel to the rotation axis of the rotary table 3 via a drive mechanism (not shown), and to move along the axis. The closing part 312 is a member disposed at both ends of the arm 311 and seals the opening 2a disposed in the chamber 2. The opening 2a is an opening of the cover plate 22 disposed on the upper surface of the chamber 2 for connecting the inside of the chamber 2 to the outside, and is the end of the load lock chamber 25 on the outer side. Moreover, the load lock chamber 25 is formed by closing the opening 2a using the closing part 312.

[0187] Additionally, although not shown, a retaining part such as a mechanical chuck for holding the retainer H is provided in the closed part 312. In the load lock chamber 25, the end located on the inner side of the chamber 2 is sealed by a support part of the support retainer H provided in the actuator (not shown). With the opening 2a sealed by the closed part 312 and the inner end sealed by the support part, forming a closed space, the load lock chamber 25 is connected to an exhaust line for evacuating a vacuum via a pneumatic circuit and an air supply line for breaking the vacuum via a valve, etc.

[0188] Furthermore, the support portion supporting the retainer H receives the retainer H from the holding portion of the sealing portion 312 within the load lock chamber 25, which is sealed by the closing portion 312 and evacuated. It is moved by a pusher to discharge the retainer H from the load lock chamber 25 and place it on the opening 32 of the rotary table 3. Additionally, the support portion pushes the processed retainer H upwards via the pusher to seal the load lock chamber 25 and transfers the retainer H to the holding portion of the sealing portion 312. After the load lock chamber 25 opens to the atmosphere, the closing portion 312, having received the processed retainer H, rises and removes the processed retainer H.

[0189] [Supply Department]

[0190] The supply unit 400 has a chuck mechanism 500, and in addition to the chuck mechanism 500, it also has a supply table 410, a chuck moving mechanism 420 for moving the chuck mechanism 500, and a storage unit 430 for storing (accommodating) workpiece W.

[0191] (Supply counter)

[0192] like Figure 1 As shown, the supply table 410 is a horizontal table adjacent to the loading / unloading section 300 of the chamber 2. A horizontal mounting platform T is provided directly below the closing section 312 of the conveying section 310 of the supply table 410. The retainer H for loading / unloading relative to the chamber 2 is temporarily mounted on the mounting platform T. In addition, the chuck moving mechanism 420 and the storage container 430, which will be described later, are arranged on the supply table 410.

[0193] (Chuck movement mechanism)

[0194] The chuck moving mechanism 420 in the supply unit 400 is a mechanism that moves the chuck mechanism 500 between the platform T and the storage container 430. The chuck moving mechanism 420 includes a guide mechanism 421 and a rotating mechanism 422. The guide mechanism 421 is a linear guide that, driven by a cylinder, moves back and forth along a straight line passing through the center of the platform T, extending from the radius of rotation of the rotary table 3 when viewed from above. The rotating mechanism 422 is a mechanism that, driven by a motor, rotates the chuck mechanism 500 horizontally.

[0195] (Storage)

[0196] like Figure 11A , Figure 11B , Figure 12A , Figure 12B As shown, the storage unit 430 accommodates multiple workpieces W stacked together and held by the chuck mechanism 500. The storage unit 430 has a carrier 431 and a delivery mechanism 432. The carrier 431 has a support plate 431a and a side guide 431b. The support plate 431a is a plate for mounting and stacking workpieces W. Multiple protrusions 431c protruding outward are provided on the support plate 431a. The side guide 431b is a rod-shaped member erected on the protrusions 431c of the support plate 431a in a manner that surrounds the workpieces W. The side guide 431b restricts the position of the workpieces W in the horizontal direction. Furthermore, in order to ensure the area where the upper push rod 432a pushes the workpieces W upward as described later, the support plate 431a is smaller than the outer diameter of the workpieces W.

[0197] In addition, such as Figure 11A , Figure 12AAs shown, the protrusion 431c includes a short protrusion and a long protrusion. The short protrusion 431c protrudes by a predetermined length beyond the outline of the workpiece W and restricts the position of the workpiece W. Therefore, three protrusions are provided at 60° intervals along the circumference of the circular workpiece W. The long protrusion 431c is provided at a length that allows the side guide 431b to enter the first holding part 523 or the second holding part 533 of the chuck mechanism 500.

[0198] Multiple carriers 431 are configured in groups such that the chuck mechanism 500 can hold multiple workpieces W together. In this embodiment, the carriers 431 are arranged in groups of three carriers that combine the first holding part 523 and the second holding part 533 of the chuck mechanism 500. The three workpieces W are arranged horizontally at the positions where they can be held by the first holding part 523 and the second holding part 533 of the three carriers 431 in each group, and the workpieces W are stacked and stored in the same number. That is, the multiple workpieces W to be held together are stacked and stored at the position held by the chuck mechanism 500.

[0199] like Figure 1 As shown, multiple storage containers 430 are provided at positions where the first holding portion 523 and the second holding portion 533 can hold multiple workpieces W together when the chuck mechanism 500 rotates horizontally. That is, multiple carrier groups 431 are arranged along the trajectory of the first holding portion 523 and the second holding portion 533 formed by the rotation of the chuck mechanism 500. Multiple workpieces W stacked in each storage container 430 are arranged in the direction along the rotation trajectory of the first holding portion 523 and the second holding portion 533. When the chuck mechanism 500 rotates, the first holding portion 523 and the second holding portion 533 move along an arc-shaped trajectory; therefore, along this trajectory, each carrier group 431 is arranged at an angle where the workpieces W can be held together by the first holding portion 523 and the second holding portion 533. In this embodiment, five storage containers 430, i.e., five carrier groups 431, are provided.

[0200] like Figure 11A , Figure 11B , Figure 12A , Figure 12BAs shown, the delivery mechanism 432 is a mechanism that delivers the workpiece W to a position that can be held by the first holding part 523 and the second holding part 533 by applying force to the carrier 431. The delivery mechanism 432 of this embodiment has an upper push rod 432a and a drive part 432b disposed at the lower part of the supply table 410. The upper push rod 432a is a rod-shaped member in the vertical direction. Multiple upper push rods 432a are provided at positions where their upper ends pass through the supply table 410 and can push the workpiece W upwards. In this embodiment, three upper push rods 432a are provided around each support plate 431a, at positions where they can contact / separate from the bottom surface of the workpiece W.

[0201] The drive unit 432b is a mechanism for raising and lowering the upper push rod 432a. The drive unit 432b includes: a lifting plate 432c, which supports and fixes the lower end of the upper push rod 432a; a slider 432d, which supports the lifting plate 432c; and a drive source 432e, which causes the slider 432d to slide and moves, thereby raising and lowering the lifting plate 432c. The drive source 432e is correspondingly provided with each set of carriers 431. That is, through the drive unit 432b, the three workpieces W supported by the carriers 431 are raised and lowered at the same height.

[0202] [Control Device]

[0203] like Figure 1 As shown, the control device 50 is a device for controlling various parts of the film-forming apparatus 1. The control device 50 may include, for example, dedicated circuitry or a computer running according to a prescribed program. Specifically, it controls the exhaust of the chamber 2, the introduction and exhaust of the sputtering gas G into the film-forming chamber 110, the power supply of the power unit 130, the rotation of the rotary table 3, the reversal of the reversing unit 200, the supply of the supply unit 400, the loading / unloading of the loading / unloading unit 300, the drive of the pusher 160 and pusher 240, the drive of the chuck mechanism 500, and the reversal control. The control content is programmed and executed by a processing device such as a programmable logic controller (PLC) or a central processing unit (CPU), enabling it to handle various film-forming processes.

[0204] Specific objects to be controlled include: the intermittent operation timing of the drive source of the rotary table 3, the initial exhaust pressure of the film forming device 1, the applied power to the target material 10, the flow rate, type, introduction time and exhaust time of the sputtering gas G, and the time of surface treatment and film forming treatment, etc.

[0205] In particular, in this embodiment, the control device 50 controls the film formation rate (film formation speed) by controlling the power applied to the target 10A and the target 10B, and the supply amount of sputtering gas G based on the sputtering gas inlet 140. Furthermore, the control device 50 controls the drive source 432e of the delivery mechanism 432 in the supply unit 400, the drive source 543 of the chuck mechanism 500, the guide mechanism 421 of the chuck moving mechanism 420, and the drive source of the rotation mechanism 422 to transfer multiple workpieces W to the loading / unloading unit 300 simultaneously. Moreover, the control device 50 controls the drive source 543 of the chuck mechanism 500 and the reversing drive unit 220 in the reversing unit 200 to reverse the multiple workpieces W simultaneously.

[0206] In addition, input devices and output devices (not shown) are connected to the control device 50. Input devices are switches, touchscreens, keyboards, mice, and other input components used by the operator to operate the film-forming apparatus 1 via the control device 50. Output devices are displays, lights, meters, and other output components used to present information about the apparatus's status in a visually readable manner to the operator.

[0207] [Film Forming Treatment]

[0208] This describes the process of forming a film on the workpiece W using the film-forming apparatus 1 based on this embodiment, as described above.

[0209] First, the retainer H is pre-positioned on the mounting stage T, such as... Figure 11A , Figure 11B As shown, workpiece W is stacked and housed in each of the storage units 430. (As...) Figure 12A , Figure 12B As shown, the three sets of first holding parts 523 and second holding parts 533, which are in the released position, are positioned above the three workpieces W of any one set of carriers 431 by the chuck moving mechanism 420. The support plate 431a of the carrier 431 is raised by the delivery mechanism 432, and the three uppermost workpieces W are positioned at the height of the three sets of first holding parts 523 and second holding parts 533.

[0210] By positioning the first retaining part 523 and the second retaining part 533 in the retaining position, the outer edges of the three workpieces W are inserted into the grooves 523a and 533a, thereby being held together. Then, the chuck mechanism 500 is rotated and moved horizontally by the chuck moving mechanism 420, thereby positioning the three workpieces W on the upper part of the three holes Ha of the holder H of the stage T. By positioning the first retaining part 523 and the second retaining part 533 in the release position, the three workpieces W are mounted together in the holes Ha of the holder H.

[0211] The holder H, which holds three workpieces W, is moved into the chamber 2 via the loading / unloading section 300 and placed in the opening 32 of the rotary table 3. Then, the rotary table 3 rotates intermittently to position the holder H directly below the opening 111 of the film-forming chamber 110.

[0212] Secondly, such as Figure 7 As shown, the mounting portion 161 is raised by the pusher 160, thereby housing the holder H in the film-forming chamber 110, and the upper top 162 pushes the workpiece W upward, separating it from the holder H. In this state, sputtering gas G is introduced into the film-forming chamber 110 through the sputtering gas inlet 140. Then, the mounting portion 161 is rotated by the pusher 160, thereby causing the three workpieces W to rotate simultaneously.

[0213] Power is applied to each target 10A and 10B via the power supply unit 130. Ions generated by the plasmaification of the sputtering gas G then collide with the targets 10A and 10B. The film-forming material constituting the targets 10A and 10B is ejected by ions and deposited on the film-forming target surface of the workpiece W, which is rotating via the mounting unit 161.

[0214] After the film-forming process is completed within a specified time, the sputtering gas G is discharged from the film-forming chamber 110 through the exhaust from the exhaust section 150, so that the pressure in the film-forming chamber 110 is equal to that in the chamber 2. Then, when the pusher 160 is lowered, the holder H returns to the opening 32 of the rotary table 3, the mounting part 161 disengages from the holder H, and the upper top 161 descends away from the workpiece W, and the workpiece W returns to the holder H.

[0215] Secondly, such as Figure 8 As shown, the retainer H is moved to a position facing the reversing chamber 210 of the reversing section 200 by intermittently rotating the rotary table 3. Then, as... Figure 9 As shown, the mounting portion 241 is raised by the pusher 240, thereby housing the retainer H in the reversing chamber 210, and the upper top 242 pushes the workpiece W upward, separating it from the retainer H. This positions each workpiece W at the height of the first retainer 523 and the second retainer 533 in the released position. Furthermore, the sealing body 243 seals the lower end of the sealing chamber 230. At this time, the workpiece W that has undergone film formation is cooled by blowing cooling gas near the cooling plate.

[0216] Furthermore, by positioning the first retaining portion 523 and the second retaining portion 533 in the retaining position, the outer edges of the three workpieces W are embedded into the grooves 523a and 533a, thereby being held together. Then, as... Figure 10 As shown, the pusher 240 descends, causing the mounting part 241 to retract from the reversing chamber 210, and causing the first rotating part 520 and the second rotating part 530 to rotate about the drive shaft 542, thereby causing the three workpieces W to reverse together.

[0217] The mounting portion 241 is raised again by the pusher 240, thereby housing the retainer H in the reversing chamber 210, and the upper top 162 supports the reversed workpiece W. When the first retainer 523 and the second retainer 533 are in the released position, and the pusher 240 descends, the retainer H returns to the opening 32 of the rotary table 3, the mounting portion 161 disengages from the retainer H, thereby the upper top 162 descends away from the workpiece W, and the workpiece W returns to the retainer H.

[0218] Then, by intermittently rotating the rotary table 3, the holder H is moved back to the film-forming section 100 to form a film on another film-forming target surface of the workpiece W. Then, by intermittently rotating the rotary table 3, the processed holder H is moved to directly below the opening 2a and is moved out of the chamber 2 by the loading / unloading section 300.

[0219] [Effect]

[0220] (1) The chuck mechanism 500 of this embodiment as described above includes: a first rotating part 520, which is configured to rotate about a shaft part 510, has multiple first arms 522 extending radially from the shaft part 510, and has a first holding part 523 disposed at the front end of each of the first arms 522 and in contact with / separated from the outer edge of the workpiece W; a second rotating part 530, which is configured to rotate coaxially with the first rotating part 520, has multiple second arms 532 extending radially from the shaft part 510, and has a second holding part 533 disposed at the front end of each of the second arms 532 and in contact with / separated from the outer edge of the workpiece W; and a driving part 540, wherein each of the multiple first arms 522 and each of the multiple second arms 532 forms a pair, so that the first rotating part 520 and the second rotating part 530 rotate synchronously, and each pair of the first holding part 523 and the second holding part 533 moves simultaneously between a holding position for holding the workpiece W and a releasing position for releasing the workpiece W, thereby holding or releasing multiple workpieces W together.

[0221] Furthermore, the film-forming apparatus 1 of this embodiment includes: a chamber 2, which can be set to a vacuum; a film-forming section 100, disposed in the chamber 2, which forms a film on a plurality of workpieces W by sputtering in a film-forming chamber 110 having a target material 10; a conveying body (rotary table 3), disposed in the chamber 2, which conveys the plurality of workpieces W to a position facing the film-forming chamber 110; a loading / unloading section 300, which loads / unloads workpieces W into / out of the chamber 2; and a supply section 400, which has a chuck mechanism 500, which delivers the plurality of workpieces W to the loading / unloading section 300 together.

[0222] Furthermore, the film-forming apparatus 1 of this embodiment has a reversing section 200, which holds multiple workpieces W that have undergone film formation in the film-forming section 100 by a chuck mechanism 500 and reverses them together.

[0223] Therefore, multiple workpieces W can be supplied to the chamber 2 simultaneously, thus reducing the required time and improving productivity compared to retrieving them one by one from the storage container. Providing multiple mechanisms for loading / unloading workpieces W into / out of the chamber 2 would complicate the structure and increase the cost of the apparatus. Furthermore, when forming films on both sides of the workpiece W, the time required can be reduced and productivity improved because the film-formed workpieces W can be reversed simultaneously within the chamber (container 212). Moreover, compared to providing multiple mechanisms for reversing the workpieces W, the mechanism can be simplified, and the number of sealing points can be reduced. Here, the drive source for the reversing action is preferably located outside the chamber, thus requiring a drive shaft that penetrates the chamber. In this case, the penetrating portion needs to be sealed. If the number of sealing points increases, it becomes difficult to maintain the required vacuum state within the chamber. Therefore, fewer sealing points are preferable.

[0224] (2) The holding positions of the first holding part 523 and the second holding part 533 are set so that the workpiece W can be held in a direction orthogonal to the shaft part 510. Therefore, multiple workpieces W can be held and exchanged in the horizontal direction, and reversed, etc.

[0225] (3) The drive unit 540 includes: a drive source 543 for linearly moving the drive shaft 542; and a conversion mechanism 544 for converting the linear movement of the drive shaft 542 based on the drive source 543 into rotation of the first rotating part 520 and the second rotating part 530. Therefore, the number of drive sources 543 in the drive unit 540 can be reduced. Since a chuck mechanism that holds or releases multiple workpieces W can be driven by a single drive unit 540, the structure becomes very simple.

[0226] (4) The conversion mechanism 544 has: a drive shaft 542 that moves linearly toward the shaft portion 510; and toggle arms 544a and 544b, which are a pair of connecting structural members with one end rotatably connected to the end of the drive shaft 542 near the shaft portion 510, wherein the other end of one toggle arm 544a is rotatably connected to a first arm 522 in the first rotating portion 520 that is closest to the drive shaft 542, and the other end of the other toggle arm 544b is rotatably connected to a second arm 532 in the second rotating portion 530 that is closest to the drive shaft 542.

[0227] Therefore, the first rotating part 520 and the second rotating part 530 can be driven by a single drive shaft 542, thus achieving exceptionally high synchronization compared to using gears or belts for connection and transmission. This allows for the reliable simultaneous holding and releasing of multiple workpieces W. Furthermore, the simplified structure reduces failure rates and costs. Moreover, when workpiece W is reversed by rotating the entire chuck mechanism, the drive shaft 542 can be used directly as the rotation axis, resulting in an even simpler structure.

[0228] (5) The drive unit 540 causes the first rotating part 520 and the second rotating part 530 to rotate synchronously in opposite directions. Therefore, the holding or releasing action can be performed by a single drive unit 540.

[0229] (6) The supply unit 400 has a storage unit 430, which respectively stores multiple workpieces W held together by the chuck mechanism 500 in a stacked manner. Therefore, the multiple workpieces W stacked and stored in the storage unit 430 can be held together by the chuck mechanism 500. That is, the chuck mechanism 500 has multiple sets of first holding portions 523 and second holding portions 533 for holding workpieces W. In the storage unit 430 storing the stacked workpieces W, multiple workpieces W are stacked in a manner corresponding to each set of first holding portions 523 and second holding portions 533. Thus, each set of first holding portions 523 and second holding portions 533 can simultaneously hold workpieces W together, thereby improving productivity.

[0230] (7) The chuck mechanism 500 is configured to rotate horizontally, and multiple storage containers 430 are provided at positions where the first holding portion 523 and the second holding portion 533 can hold multiple workpieces W together according to the horizontal rotation of the chuck mechanism 500. Therefore, multiple workpieces W can be prepared in advance and processed continuously, thus improving productivity. In this embodiment, the multiple workpieces W held together are stacked and stored corresponding to the positions held by the chuck mechanism 500. The multiple workpieces W stacked in each storage container 430 are arranged in the direction along the rotation trajectory of the first holding portion 523 and the second holding portion 533. Therefore, access can be made in multiple storage containers 430 using a single chuck mechanism 500. Furthermore, since multiple workpieces W can be held together using a single chuck mechanism 500, efficiency can be greatly improved.

[0231] [Variation Example]

[0232] This embodiment is not limited to the described form, and also includes the following variations.

[0233] (1) In the described configuration, the first arm 522 consists of three arms, the second arm 532 consists of three arms, and the configuration is such that it can simultaneously hold or release three workpieces W. The first arm 522 and the second arm 532 can each be two arms, or four or more arms. Therefore, it is possible to simultaneously hold or release two or four or more workpieces W, and to hold multiple workpieces W together, thereby improving productivity.

[0234] (2) The object to be film-formed may not be assembled / mounted on the fixture J. That is, the fixture J may not be used. In this case, the workpiece W is simply the substrate S that serves as the object to be film-formed.

[0235] (3) The number of targets 10 in the film-forming section 100 is not limited to the number illustrated in the embodiment. The number of targets 10 may be odd or more than three. By increasing the number of targets 10, the film-forming rate can be increased (the film-forming speed can be accelerated), and productivity can be improved.

[0236] Multiple targets 10 can be a common film-forming material or different types of film-forming materials. Using a common film-forming material can increase the film formation rate. By using different types of film-forming materials to form films simultaneously or sequentially, a film containing multiple layers of film-forming materials can also be formed.

[0237] (4) The number of film-forming sections 100 can also be multiple. That is, film-forming sections 100 can be provided at multiple stop positions of the conveyor. By increasing the number of film-forming sections 100 using a common film-forming material, the film-forming rate can be increased. By using different types of film-forming materials in multiple film-forming sections 100 to form films simultaneously or sequentially, a film containing layers of multiple film-forming materials can also be formed. The structure that generates plasma in the film-forming section 100 is not limited to a specific type. For example, when a film-forming section 100 is added at the preparatory position, it is possible to form a film on the other side of the workpiece W that has been reversed by the reversing section 200 without having to rotate it another full turn, thus improving productivity.

[0238] (5) In addition to the film-forming section 100, a processing section for performing plasma-based etching, ashing, other surface modification, cleaning, and compound film formation may be provided at any stop position. The structure that generates plasma in the processing section is not limited to a specific type. Such a processing section may also be provided at the aforementioned preparatory position.

[0239] (6) The conveying device is not limited to the rotary table 3. It may also be a rotating body that holds the support or retainer H on an arm that extends radially from the center of rotation and rotates. The number of retainers H conveyed and processed by the conveying device and the number of support parts supporting them are singular in the above configuration, but may also be plural.

[0240] (7) The film-forming section 100 and the processing section may be located on the side of the chamber 2, on the opposite side, or on the side. The direction in which the holder H enters and exits the film-forming chamber 110 and the processing chamber may be from the side of the film-forming chamber 110 and the processing chamber, from the opposite side, or from the side.

[0241] (8) In the described embodiment, the direction consistent with gravity is set downwards, and conversely, the direction against gravity is set upwards. The lifting and lowering in this case is a vertical movement. However, the arrangement direction of the film-forming apparatus 1 is not limited to this; for example, the vertical relationship between the rotating stage 3 and the film-forming chamber 110 can be reversed. Furthermore, the rotating stage 3 is not limited to a horizontal position; it can also be vertically arranged or inclined. The mounting surface of the film-forming apparatus 1 can be the ground, the top surface, or the side wall surface.

[0242] (9) When a cooling mechanism is provided in the preparatory position to cool the workpiece W, the workpiece W, whose temperature rises due to film formation, can be cooled, thus suppressing deformation or thermal damage. Alternatively, when the workpiece can be cooled to the required temperature during the film formation time, the preparatory position can be used as a cooling standby position, suppressing deformation or thermal damage without the need for a cooling mechanism. In this configuration, a cooling mechanism utilizing a cooling plate is provided in the reversing section 200, but it can also be used in conjunction with the cooling mechanism in the preparatory position, or a cooling mechanism can be provided only in any one location.

[0243] (10) The film-forming apparatus 1 may also have three stop positions instead of a preparatory position. In this case, the intermittent rotational conveying is 120° at a time. Furthermore, multiple preparatory positions may also be provided. For example, by having multiple film-forming sections 100 permanently installed at multiple stop positions, films of different types of materials can be formed. In this case, apparatus for performing film treatments (annealing, oxidation, nitriding, planarization, cleaning, and other surface treatments) on the formed film may also be provided at the preparatory positions.

[0244] [Other Implementation Methods]

[0245] This invention is not limited to the described embodiments, and can be embodied by modifying the structural elements during the implementation phase without departing from its spirit. Furthermore, various inventions can be formed by appropriately combining the multiple structural elements disclosed in the described embodiments. For example, several structural elements may be deleted from all the structural elements shown in the embodiments. Moreover, structural elements from different embodiments may be appropriately combined.

Claims

1. A chuck mechanism, characterized in that, include: The first rotating part is configured to rotate about the shaft, and has multiple first arms extending radially from the shaft, and a first holding part disposed at the front end of each of the first arms and in contact with / separating from the outer edge of the workpiece. The second rotating part is configured to rotate coaxially with the first rotating part, and has multiple second arms extending radially from the shaft, and a second holding part disposed at the front end of each of the second arms and in contact with / separating from the outer edge of the workpiece; as well as The drive unit, in which each of the plurality of first arms and each of the plurality of second arms form a pair, causes the first rotating part and the second rotating part to rotate synchronously, and causes the pair of the first holding part and the second holding part to move simultaneously between a holding position for holding the workpiece and a releasing position for releasing the workpiece, thereby holding or releasing a plurality of workpieces together.

2. The chuck mechanism according to claim 1, characterized in that, The driving unit causes the first rotating part and the second rotating part to rotate synchronously in opposite directions.

3. The chuck mechanism according to claim 1, characterized in that, The holding positions of the first holding part and the second holding part are set to hold the workpiece in a direction orthogonal to the axial direction of the shaft.

4. The chuck mechanism according to claim 1, characterized in that, The drive unit has: The drive source causes the drive shaft to move linearly; and The conversion mechanism converts the linear movement of the drive shaft based on the drive source into rotation of the first rotating part and the second rotating part.

5. The chuck mechanism according to claim 4, characterized in that, The conversion mechanism has: The drive shaft moves linearly toward the shaft portion; and A pair of connecting components, one end of which is rotatably connected to the end of the drive shaft near the shaft portion. The other end of one of the connecting components is rotatably connected to one of the first arms in the first rotating part that is closest to the drive shaft. The other end of the connecting member is rotatably connected to one of the second arms in the second rotating part that is closest to the drive shaft.

6. The chuck mechanism according to claim 1, characterized in that, The first arm has three or more parts. The second arm has three or more parts, and Configured to simultaneously hold or release more than three of the workpieces.

7. A film-forming apparatus, characterized in that, include: The chamber can be set to a vacuum. A film-forming section is disposed in the chamber, and in the film-forming chamber containing the target material, a film is formed on multiple workpieces by sputtering; A conveyor body, disposed in the chamber, conveys multiple workpieces to a position facing the film-forming chamber; The loading / unloading section is used to load / unload the workpiece relative to the cavity. as well as The supply unit, having a chuck mechanism according to claim 1, transfers multiple workpieces together to the loading / unloading unit.

8. The film-forming apparatus according to claim 7, characterized in that, The supply unit has a storage device. The storage unit will hold multiple workpieces stacked together by the chuck mechanism.

9. The film-forming apparatus according to claim 8, characterized in that, The chuck mechanism is configured to rotate in a direction parallel to the workpiece. The storage device is provided in multiple ways, such that the first holding part and the second holding part can hold the positions of multiple workpieces together according to the rotation of the chuck mechanism.

10. A film-forming apparatus, characterized in that, include: The chamber can be set to a vacuum. A film-forming section is disposed in the chamber, and in the film-forming chamber containing the target material, a film is formed on multiple workpieces by sputtering; as well as The reversing section, through the chuck mechanism according to claim 1, holds a plurality of workpieces that have undergone film formation in the film-forming section and reverses the plurality of workpieces together.

11. A film-forming apparatus, characterized in that, include: The chamber can be set to a vacuum. A film-forming section is disposed in the chamber, and in the film-forming chamber containing the target material, a film is formed on multiple workpieces by sputtering; A conveyor body, disposed in the chamber, conveys multiple workpieces to a position facing the film-forming chamber; The loading / unloading section is used to load / unload the workpiece relative to the cavity. The supply unit, having a chuck mechanism according to claim 1, transfers multiple workpieces together to the loading / unloading unit; and The reversing section, through the chuck mechanism according to claim 1, holds a plurality of workpieces that have undergone film formation in the film-forming section and reverses the plurality of workpieces together.

12. A film-forming apparatus, characterized in that, include: The chamber can be set to a vacuum. A film-forming section is disposed in the chamber, and in the film-forming chamber containing the target material, a film is formed on multiple workpieces by sputtering; A conveyor body, disposed in the chamber, conveys multiple workpieces to a position facing the film-forming chamber; The loading / unloading section is used to load / unload the workpiece relative to the cavity. The chuck mechanism according to claim 1; The storage unit holds multiple workpieces stacked together and held together by the chuck mechanism. The supply department transfers multiple of the aforementioned workpieces together to the inbound / outbound department; and The reversing section, through the chuck mechanism as described in claim 1, holds a plurality of workpieces that have undergone film formation in the film-forming section and reverses the plurality of workpieces together.

Images