一种用于制备光学ZnS或ZnSe材料的CVD装置及方法
By designing a multifunctional CVD device, H2S/H2Se is introduced using Ar gas to react with Zn vapor on the mold surface, solving the problems of uniformity and singleness in the preparation of existing equipment. This enables the batch preparation of high-quality ZnS and ZnSe materials and simplifies the subsequent processing procedures.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- KUNMING KAIHANG PHOTOELECTRIC TECH CO LTD
- Filing Date
- 2024-01-02
- Publication Date
- 2026-07-17
AI Technical Summary
Existing CVD equipment can only prepare ZnS materials, which has a narrow range of applications, makes it difficult to maintain the stoichiometry, and the large particle size of the prepared ZnS affects optical transmittance and uniformity. It is also impossible to prepare optical ZnS and ZnSe blanks of specific shapes, which increases the need for subsequent grinding and polishing processes.
Design a CVD device including a main frame, insulation structure, water circulation structure, heating structure and air intake structure. The zinc block is directly heated at the bottom of the vacuum furnace to vaporize it. Ar gas is used as a carrier gas to introduce H2S/H2Se for chemical reaction and deposited onto the mold surface to form a high-quality optical blank. The mold design enables the batch preparation of different shapes.
The method enables diversified preparation of ZnS and ZnSe materials, improves material uniformity and optical quality, reduces the difficulty of subsequent processing, and enhances preparation efficiency and flexibility. The transmittance of the prepared materials is significantly improved.
Smart Images
Figure CN117802478B_ABST