利用聚焦太阳能退火工艺进行嵌段共聚物自组装的方法
By using focused solar annealing on a substrate or patterned template to perform block copolymer self-assembly, the problems of high energy consumption and large carbon emissions in the prior art are solved, achieving low-cost and zero-carbon emission microphase separation, which is suitable for chip manufacturing.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 张江国家实验室
- Filing Date
- 2022-09-23
- Publication Date
- 2026-07-17
AI Technical Summary
Existing block copolymer self-assembly technology is energy-intensive, costly, and has high carbon emissions in chip manufacturing. Traditional annealing technology requires secondary energy consumption, which increases carbon emissions.
Block copolymer self-assembly is performed using focused solar annealing. Random copolymers are grafted onto a substrate or patterned template, the corresponding block copolymers are coated, and microphase separation is driven by focused solar annealing to form an ordered structure.
It significantly reduces the energy consumption and cost of BCP lithography, shortens the process time, and achieves green, low-cost and zero-carbon emission microphase separation, suitable for planar substrates and patterned guide templates.
Smart Images
Figure CN117810065B_ABST