Method for manufacturing a holographic optical element

Abstract

The present application relates to a kind of holographic optical element manufacturing method.The holographic optical element manufacturing method includes providing array incident light source, generates array incident light beam;Exposure step is carried out to soft photosensitive module using the array incident light beam;Wherein, the soft photosensitive module is soft layer, the soft layer is continuously passed through the gap between optical object and glass by the multiple roll wheels in roll-to-roll device, and is made into holographic optical element by the exposure step.To solve the problem of destructive interference and dark line existing in large size pattern splicing seam and the problem of vibration interference and light loss, the technical means of array incident light path adjustment and optical path design and other technical features are used, the array incident light enters the photosensitive film and optical object, and the oblique light interference mode is generated in optical object, to achieve the effect of solving the above problems.

Description

Technical Field

[0001] This application relates to the field of optical element technology, and in particular to a method for manufacturing a holographic optical element. Background Technology

[0002] Current methods for fabricating small-sized (e.g., squares with sides less than 50 mm) miniature holographic optical elements primarily use reflective optical structures to record interference fringes on a film, thereby forming the small-sized miniature holographic optical element. Please refer to... Figure 1 , Figure 1 A schematic diagram illustrating a prior art method for fabricating small-sized holographic optical elements is shown. (Example:) Figure 1 As shown, a laser light source 10 emits a non-polarized light 20. The non-polarized light 20 sequentially passes through a shutter 30 and a half-wave plate (HWP) 40 to become polarized light. This polarized light then passes through a polarization beamsplitter (PBS) 50, which splits it into two mutually perpendicular beams: P-polarized light and S-polarized light. The P-polarized light passes completely through the polarization beamsplitter 50, while the S-polarized light is reflected at a 45-degree angle, with its exit direction forming a 90-degree angle with the P-polarized light. Both the P-polarized and S-polarized light are linearly polarized, and their polarization directions are perpendicular to each other. Figure 1 As shown, the S-polarized light exits from the polarization beam splitter 50 and sequentially passes through a space filter (SF) 60, an iris 70, and a lens 80, becoming beam 62. After being reflected by a lens 90, it further passes through a beam splitter (BS) 100, where it is split into two mutually perpendicular beams, 621 and 622. Beam 621 continues to be incident on a lens 110 and reflected, then sequentially passes through a neutral density filter (ND filter) 125 and an optical module, becoming signal light A. Beam 622, after leaving the beam splitter 100, continues to be incident on a lens 120 and reflected, then sequentially passes through the aforementioned optical module, becoming reference light B. The optical module includes a prism 140, a glass 150, and a photosensitive element 130 sandwiched therebetween. The photosensitive element 130 includes a substrate 130a, an optical film 130c, and a photosensitive film 130b sandwiched therebetween.

[0003] In short, such as Figure 1 As shown, the non-polarized light 20 emitted by the laser light source 10 is split into signal light A and reference light B by the beam splitter 100 after a series of optical means. The two lights generate phase interference on the photosensitive element 130 and record the interference fringes on the film.

[0004] However, this method, when used for large-size (>150*150mm) splicing, is prone to causing vibration effects among the signal light A, reference light B, and photosensitive element 130, resulting in a risk of destructive interference. Therefore, how to propose a large-size optical element and its manufacturing method that can solve the above problems is an important issue that the industry needs to consider. Summary of the Invention

[0005] Therefore, it is necessary to provide a method for manufacturing holographic optical elements to address the problems of destructive interference and dark lines, vibration interference, and beam splitting loss in large-size graphic splicing seams (areas).

[0006] This application provides a method for manufacturing a holographic optical element, comprising:

[0007] Provide an array of incident light sources to generate an array of incident beams;

[0008] The soft photosensitive module is exposed using the array of incident light beams;

[0009] The soft-sensing module is a soft stack, which is continuously passed through the gap between the optical object and the glass by multiple rollers in the roll-to-roll device to perform the exposure step and form a holographic optical element.

[0010] In one embodiment, the gap between the optical object and the glass is a light-emitting area for the soft-sensing module to perform the exposure step.

[0011] In one embodiment, the soft photosensitive module continuously passes through the surface of the optical object in close contact with it and receives the illumination of the array light.

[0012] In one embodiment, the array of incident light sources is incident on the glass and the soft photosensitive module, and produces oblique light interference with the optical object.

[0013] In one embodiment, the array of incident light sources emits light at an angle between 0 and 90 degrees.

[0014] In one embodiment, the array of incident light sources is incident on the glass and the soft photosensitive module, and emits light at different angles due to the surface design structure of the optical object.

[0015] In one embodiment, the optical object is a master piece, and the soft-sensing module is a slave piece.

[0016] In one embodiment, the optical object is a stacked structure, and the optical object is a holographic master film, a microstructured photomask, or a polygonal reflective optical element.

[0017] In one embodiment, the refractive index of the optical object is greater than 1.4.

[0018] In one embodiment, the gap between the optical object and the glass is a vacuum or non-vacuum region.

[0019] In the technical solution of this application, in order to solve the problems of destructive interference and dark lines, vibration interference and beam splitting loss in large-size graphic splicing seams, a technical means consisting of array incident light path adjustment and optical path design is used to achieve the effect of solving the above problems by having array incident light enter the photosensitive film and optical object, and generating oblique light interference in the optical object. Attached Figure Description

[0020] Figure 1 A schematic diagram of a prior art method for fabricating small-sized micro-volume holographic optical elements is shown.

[0021] Figure 2 A schematic diagram of a pair of small-sized micro-volume holographic optical elements of this application is shown.

[0022] Figure 3 This illustration shows a schematic diagram of an ideal seamless situation in a pair of small-sized micro-volume holographic optical elements of this application.

[0023] Figure 4 This illustration shows a schematic diagram of a pair of small-sized micro-volume holographic optical elements with actual splicing seams in accordance with the present application.

[0024] Figure 5 This paper presents a schematic diagram illustrating the vibration interference and beam splitting loss in a pair of small-sized micro-volume holographic optical elements of this application.

[0025] Figure 6 This illustration shows a schematic diagram of an ideal vibration-free condition in a pair of small-sized micro-volume holographic optical elements of this application.

[0026] Figure 7 This paper presents a schematic diagram of a pair of small-sized micro-volume holographic optical elements in accordance with the present application, showing a real vibration situation.

[0027] Figure 8 A schematic diagram of a large-size holographic optical element according to an embodiment of this application is shown.

[0028] Figure 9 A schematic diagram of a large-size holographic optical element according to an embodiment of this application is shown.

[0029] Figure 10 A schematic diagram is shown illustrating a case where there are actual seams in a large-size holographic optical element according to an embodiment of this application.

[0030] Figure 11 A schematic diagram of a method for manufacturing a large-size holographic optical element according to an embodiment of this application is shown.

[0031] Figure 12 A schematic diagram of an optical object in a large-size holographic optical element according to an embodiment of this application is shown.

[0032] Figure 13 A schematic diagram of an optical object in a large-size holographic optical element according to an embodiment of this application is shown.

[0033] Figure 14 A schematic diagram of an optical object in a large-size holographic optical element according to an embodiment of this application is shown.

[0034] Figure 15 A schematic diagram of an optical object in a large-size holographic optical element according to an embodiment of this application is shown.

[0035] Figure label:

[0036] Laser source 10

[0037] Nonpolarized light 20

[0038] shutter speed 30

[0039] Half-wave plate 40

[0040] Polarized beam splitter 50

[0041] Spatial Filter 60

[0042] Window opening 70

[0043] Lens 80

[0044] Beam 62

[0045] Lens 90

[0046] 100 beam splitter

[0047] Beam 621

[0048] Beam 622

[0049] Lens 110, Neutral Density Filter 125, Lens 120

[0050] Prism 140

[0051] Glass 150, Photosensitive element 130, Substrate 130a

[0052] 130c optical film, 130bP polarizing film, PS polarizing film, S polarizing film

[0053] Small unit 202, large graphic 200, splicing area 204, small unit 502, large graphic 500, splicing area 504, reference light B1, B2, B3, time T

[0054] Small-sized units C1, C2, C3, C1_1, C1_2, C1_3, C1_n, C1_total; Large-sized holographic optical elements 800

[0055] Optical Item 820

[0056] Small-sized unit 802

[0057] Photosensitive film 610

[0058] splicing area 804

[0059] Array of incident beams A1, A2, A3

[0060] Array reflected light B11, B22, B33

[0061] Large-size holographic optical element 900

[0062] Optical Object 920

[0063] Small size unit 902

[0064] Photosensitive film 910

[0065] splicing area 904

[0066] Light source 930

[0067] Light source splicing area 910

[0068] Vibration A91, A92

[0069] Width F

[0070] Large-size holographic optical element 1000

[0071] Overexposure zone 1004

[0072] Array light A111

[0073] Optical Item 1120

[0074] Photosensitive module 1110

[0075] Substrate 1110a

[0076] Photosensitive film 1110b

[0077] Optical film 1110c

[0078] 1160 reel

[0079] Glass 1130

[0080] Reflected light A112

[0081] Manufacturing apparatus for large-size holographic optical elements 1100 Illumination work area 1140

[0082] Sealing kit 1150

[0083] Optical Item 1220

[0084] Substrate 1240

[0085] Optical film 1230a

[0086] Optical film 1230b

[0087] Optical Item 1320

[0088] Substrate 1340

[0089] Microstructure layer 1330

[0090] Optical Item 1420

[0091] Substrate 1440

[0092] Inner reflector layer 1430

[0093] Optical Item 1520

[0094] Substrate 1540

[0095] Inner reflector layer 1530 Detailed Implementation

[0096] To make the above-mentioned objectives, features, and advantages of this application more apparent and understandable, the specific embodiments of this application are described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of this application. However, this application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of this application. Therefore, this application is not limited to the specific embodiments disclosed below.

[0097] In the description of this application, it should be understood that if terms such as "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" appear, these terms indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0098] Furthermore, where the terms "first" and "second" appear, these terms are for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined with "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, where the term "multiple" appears, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0099] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0100] In this application, unless otherwise expressly specified and limited, the use of descriptions such as "above" or "below" the second feature indicates that the first and second features are in direct contact or indirect contact via an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. Similarly, "below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0101] It should be noted that if an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or there may be an intervening element. If an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. If so, the terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used in this application are for illustrative purposes only and do not represent the only possible implementation.

[0102] First, it is necessary to explain the technical content of the comparative examples in this application and the problems faced by the comparative examples.

[0103] Please refer to Figure 2 , Figure 2 A schematic diagram of a pair of small-sized micro-volume holographic optical elements of this application is shown. (See attached diagram.) Figure 2 As shown in the comparative examples of this application, the large-size pattern has seams. For example, multiple small-size units 202 (i.e., photosensitive elements) are spliced ​​together to form a large-size pattern 200, and there is a splicing area 204 between adjacent small-size units 202. It should be noted that the splicing area 204 has the risk of destructive interference, which can lead to reduced diffraction efficiency and complete interference destruction, resulting in dark lines. In other comparative examples of this application, when multiple small-size units 202 are spliced ​​together to form a large-size pattern 200, the splicing area 204 between adjacent small-size units 202 is minimized or even eliminated. It should be noted that the small-size units in the comparative examples of this application are squares with a side length of less than 50 mm, such as squares with a side length of 30 mm. In the comparative examples of this application, small-size units are spliced ​​together to form a large-size pattern (i.e., squares with a side length greater than 50 mm).

[0104] Additionally, please refer to Figure 3 , Figure 3 This diagram illustrates an ideal, seamless configuration in a pair of small-sized holographic optical elements according to this application. Please refer to [link / reference]. Figure 2 ,exist Figure 3 In this application, the proportion is different from Figure 2 As shown, when multiple small units 202 are joined together to form a large graphic 200, there is no joint area 204 between adjacent small units 202 (not shown in the figure). In this way, [the graphic is formed]. Figure 3 From the waveform diagram, we can see that Figure 3 The comparative example, because there is no splicing area 204 between adjacent small-sized units 202, does not exhibit any destructive interference or hidden lines. It should be noted that... Figure 3 , Figure 4 , Figure 6 , Figure 7The symbols C1, C2, C3, C1_1, C1_2, C1_3, C1_n, and C1_total represent individual small-sized units 202, respectively. Figure 2 , Figure 5 The symbols A1, A2, and A3 represent signal light; Figure 2 , Figure 5 The symbols B1, B2, and B3 represent reference lights. For example... Figure 2 As shown, signal lights A1, A2, A3 and reference lights B1, B2, B3 interfere with multiple small-sized units 202 to create a large-sized pattern 200.

[0105] Additionally, please refer to Figure 4 , Figure 4 This diagram illustrates a scenario where there are actual seams in a pair of small-sized holographic optical elements of this application. Please also refer to... Figure 2 Because there is a splicing area 204 between adjacent small units 202 when multiple small units 202 are spliced ​​together to form a large graphic 200, the following will occur: Figure 4 The disruptive interference shown in the central region 400 results in dark lines. Similarly, the technical details regarding the signal lights A1, A2, A3, the reference lights B1, B2, B3, and the multiple small-sized units 202 will not be elaborated here.

[0106] Furthermore, the comparative technology in this application also suffers from vibration interference and spectral loss. Please refer to... Figure 5 , Figure 5 This diagram illustrates the vibration interference and beam splitting loss in a pair of small-sized holographic optical elements according to this application. Figure 5 As shown in the example of this application, multiple small-sized units 502 (i.e., photosensitive elements) are spliced ​​together to form a large-sized pattern 500, and there is a splicing area 504 between adjacent small-sized units 502. Vibration interference and light energy loss will occur between the signal lights A1, A2, A3 and the reference lights B1, B2, B3, and the small-sized units 502. It should also be noted that the vibration interference varies with the exposure time; the light energy at the focusing surface is affected by the light path distance, the number of beam splitting channels, and the filter.

[0107] Please refer to Figure 6 , Figure 6 This diagram illustrates an ideal vibration-free condition in a pair of small-sized micro-volume holographic optical elements according to this application. Please refer to [further details]. Figure 5 ,exist Figure 6 In this application, the proportion is different from Figure 5 As shown, Figure 6In the comparative small-sized holographic optical element, there is no vibration. Therefore, it can be seen that the waveforms corresponding to the small-sized units C1, C2, C3, C1_1, C1_2, C1_3, C1_n, and C1_total, representing individual small-sized units 502, do not change when the time T is 1s, 2s, 3s, ..., ns.

[0108] Additionally, please refer to Figure 7 , Figure 7 This diagram illustrates a real-world vibration scenario in a pair of small-sized holographic optical elements according to this application. Please also refer to... Figure 5 Because the small-sized units 502 (i.e., photosensitive elements) in this application vibrate, it can be seen that the waveforms corresponding to the small-sized units C1, C2, C3, C1_1, C1_2, C1_3, C1_n, and C1_total of the individual small-sized units 502 change at times T of 1s, 2s, 3s, ..., ns. It should be specifically noted here that... Figure 7 As shown, in one pair of examples of this application, the small-sized unit 700 produces a waveform change; while in another pair of examples of this application, the small-sized unit 702 does not produce a waveform change.

[0109] Next, please refer to Figure 8 , Figure 8 A schematic diagram of a large-size holographic optical element according to an embodiment of this application is shown. Figure 8 As shown, in one embodiment of this application, the large-size holographic optical element 800 includes, but is not limited to, a photosensitive film 610 composed of an optical object 820 and small-size units 802, with a splicing area 804 between the small-size units 802. In this embodiment, by adjusting the array incident light path, that is, by allowing array incident light A1, A2, A3 to enter the photosensitive film 802 and the optical object 820, oblique light interference is generated at the optical object 820. In this embodiment, the array incident light A1, A2, A3 enters the photosensitive film 802 and the optical object 820, generating array reflected light B11, B22, B33. Furthermore, this embodiment also utilizes optical path design to bind the optical object 820 and the photosensitive film 802 (i.e., they are in a master-slave relationship) during the fabrication of a large-size, wide-format F, preventing misalignment or splicing between the optical object 820 and the photosensitive film 802. This eliminates vibrations between the optical object 820 and the photosensitive film 802 and reduces destructive interference. It should be specifically noted that the small-sized unit in this embodiment is a square with a side length less than 50mm, such as a square with a side length of 30mm. In this embodiment, the small-sized units are spliced ​​together to form a large-sized graphic (i.e., squares with side lengths all greater than 50mm).

[0110] Figure 9 A schematic diagram of a large-size holographic optical element according to an embodiment of this application is shown. Figure 9 As shown, in one embodiment of this application, the large-size holographic optical element 900 includes, but is not limited to, an optical object 920 and a photosensitive film 910 composed of small-size units 902, with a splicing area 904 between the small-size units 902. In this embodiment, a light source 930 scans the light source splicing area 910, which is composed of, for example, the small-size units 902 and the splicing area 904, so the large-size holographic optical element 900 only experiences vibrations A91 and A92, thus reducing the destructive interference effect. In one embodiment of this application, the photosensitive film 910 is, for example, a film (sub-film), and the optical object 920 is, for example, an SRG photomask or a holographic film (master film). In one embodiment of this application, the width of the optical object 920 is F (mm), and the width F can be adjusted according to design requirements.

[0111] Next, please refer to Figure 10 , Figure 10 This diagram illustrates a case where a large-size holographic optical element according to an embodiment of this application actually has a seam. For example... Figure 10 As shown in one embodiment of this application, please also refer to... Figure 9 The symbols C1, C2, and C3 represent individual small-sized units 902. Furthermore, multiple small-sized units 902 are spliced ​​together to form a large-sized holographic optical element 900. Figure 10 When the symbol 1000 is used, there is a splicing area 904 between adjacent small-sized units 902, and the splicing area 904 is an overexposed area 1004.

[0112] Figure 11 A schematic diagram of a method for manufacturing a large-size holographic optical element according to an embodiment of this application is shown. It should be particularly noted that the embodiment of this application replaces the prior art described above by adjusting the array incident light path, that is, by allowing the array incident light to enter the photosensitive film and the optical object, thereby generating oblique light interference at the optical object. Figure 11 As shown, in a manufacturing apparatus 1100 for a large-size holographic optical element according to an embodiment of this application, a laser light source 10 emits a non-polarized light 20. The non-polarized light 20 sequentially passes through a shutter 30 and a half-wave plate (HWP) 40 to become polarized light. This polarized light then passes through a polarization beam splitter (PBS) 50, which splits it into two mutually perpendicular beams: P-polarized light and S-polarized light. The P-polarized light passes completely through the polarization beam splitter 50, while the S-polarized light is reflected at a 45-degree angle, with its exit direction forming a 90-degree angle with the P-polarized light. Both the P-polarized and S-polarized light are linearly polarized light, and their polarization directions are perpendicular to each other. Figure 11As shown, S-polarized light exits from the polarization beam splitter 50 and sequentially passes through a space filter (SF) 60, an iris 70, and a lens 80, then enters the optical object 1120 and the photosensitive module 1110 in the form of array light A111. It should be noted that the optical object 1120 and the photosensitive module 1110 are bonded together as a master and slave film. Furthermore, in one embodiment of this application, the photosensitive module 1110 includes, but is not limited to, a substrate 1110a, a photosensitive film 1110b, and an optical film (Re film) 1110c. Figure 11 As shown, in one embodiment of this application, the photosensitive module 1110 is a flexible laminate. The photosensitive module 1110 can be continuously driven by multiple rollers 1160 in a roll-to-roll process to pass through the gap between the optical object 1120 and the glass 1130, and receive illumination from array light A111 at the location of the optical object 1120 and the glass 1130. After the array light A111 enters the glass 1130 and the photosensitive module 1110, it is reflected by the optical object 1120 to become reflected light A112. Figure 11 As shown, in one embodiment of this application, the flexible laminate of the photosensitive module 1110 is subsequently fabricated into a large-size holographic optical element after passing through the manufacturing apparatus 1100 for large-size holographic optical elements. It should be particularly noted here that, as... Figure 11 As shown, in one embodiment of this application, the length F of the glass 1130 and the optical object 1120 is, for example, equal to or greater than 100 mm; the gap between the optical object 1120 and the glass 1130 is the illumination operation area 1140; a plurality of sealing kits 1150 are provided at the corresponding corners of the sides of the glass 1130 and the optical object 1120 facing each other, which can make the gap of the illumination operation area 1140 a vacuum area. In another embodiment of this application, the gap of the illumination operation area 1140 can also be a non-vacuum area. It should be particularly noted here that, as Figure 11 As shown, in one embodiment of this application, the photosensitive module 1110 continuously passes through the surface of the optical object 1120 in a manner that is in close contact with the optical object 1120, and receives the illumination of the array light A111.

[0113] in addition, Figure 12 A schematic diagram of an optical object in a large-size holographic optical element according to an embodiment of this application is shown. Figure 12 As shown, in one embodiment of this application, the optical object 1220 is a holographic master film, which is composed of a substrate 1240, an optical film 1230a and an optical film 1230b.

[0114] Figure 13 A schematic diagram of an optical object in a large-size holographic optical element according to an embodiment of this application is shown. Figure 13As shown, in one embodiment of this application, the optical object 1320 is a microstructure photomask, which is composed of a substrate 1340 and a microstructure layer 1330.

[0115] Figure 14 A schematic diagram of an optical object in a large-size holographic optical element according to an embodiment of this application is shown. Figure 14 As shown, in one embodiment of this application, the optical object 1420 is a polygonal reflective optical element, which is composed of a substrate 1440 and an inner reflective layer 1430.

[0116] Figure 15 This is a schematic diagram illustrating an optical object in a large-size holographic optical element according to an embodiment of this application. For example... Figure 15 As shown, in one embodiment of this application, the optical object 1520 is a polygonal reflective optical element, which is composed of a substrate 1540 and an inner reflective layer 1530.

[0117] In addition, one embodiment of this application provides a method for manufacturing a holographic optical element, comprising: providing an array of incident light sources to generate an array of incident beams; and exposing a soft photosensitive module using the array of incident beams. The soft photosensitive module is a flexible stack, which is continuously passed through the gap between the optical object and the glass by multiple rollers in a roll-to-roll device to perform the exposure step and thus fabricate the holographic optical element.

[0118] In another embodiment of this application, the gap between the optical object and the glass is a light-emitting area for the soft photosensitive module to perform the exposure step.

[0119] In another embodiment of this application, the soft photosensitive module continuously passes through the surface of the optical object in a manner that is in close contact with the optical object and receives the illumination of the array light.

[0120] In another embodiment of this application, the array of incident light sources is incident on the glass and the soft photosensitive module, and produces oblique light interference with the optical object.

[0121] In another embodiment of this application, the array incident light source emits light at an angle between 0 and 90 degrees.

[0122] In another embodiment of this application, the array of incident light sources is incident on the glass and the soft photosensitive module, and emits light at different angles due to the surface design structure of the optical object.

[0123] In another embodiment of this application, the optical object is a master piece, and the soft-sensing photosensitive module is a slave piece.

[0124] In another embodiment of this application, the optical object is a stacked structure, and the optical object is a holographic master film, a microstructure photomask, or a polygonal reflective optical element.

[0125] In another embodiment of this application, the refractive index of the optical object is greater than 1.4.

[0126] In another embodiment of this application, the gap between the optical object and the glass is a vacuum or non-vacuum region.

[0127] In summary, the embodiments of this application address the problems of destructive interference and dark lines, vibration interference, and beam splitting loss in large-size graphic splicing seams (areas). They employ technical means, such as array incident light path adjustment and optical path design, to achieve the effect of solving the aforementioned problems by having array incident light A1, A2, and A3 enter the photosensitive film and optical object, generating oblique light interference in the optical object.

[0128] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0129] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.

Claims

1. A method for manufacturing a holographic optical element, characterized in that, include: Provide an array of incident light sources to generate an array of incident beams; The soft photosensitive module is exposed using the array of incident light beams; The soft-sensing module is a soft stack, which is continuously driven by multiple rollers in a roll-to-roll device to pass through the gap between the optical object and the glass to perform the exposure step and form a holographic optical element; the array of incident light sources is incident on the glass and the soft-sensing module, and produces oblique light interference with the optical object.

2. The method for manufacturing a holographic optical element according to claim 1, characterized in that, The gap between the optical object and the glass is the illumination area, which is used by the soft photosensitive module to perform the exposure step.

3. The method for manufacturing a holographic optical element according to claim 1, characterized in that, The soft-sensing photosensitive module continuously passes through the surface of the optical object in a manner that is close to the optical object, and receives the illumination of the array light.

4. The method for manufacturing a holographic optical element according to claim 1, characterized in that, The array of incident light sources emits light at an angle between 0 and 90 degrees.

5. The method for manufacturing a holographic optical element according to claim 1, characterized in that, The array of incident light sources illuminates the glass and the soft photosensitive module, and emits light at different angles due to the surface design structure of the optical object.

6. The method for manufacturing a holographic optical element according to claim 1, characterized in that, The optical object is the master piece, while the soft-sensing module is the slave piece.

7. The method for manufacturing a holographic optical element according to claim 1, characterized in that, The optical object has a layered structure and can be a full-image master film, a microstructured photomask, or a polygonal reflective optical element.

8. The method for manufacturing a holographic optical element according to claim 1, characterized in that, The refractive index of the optical object is greater than 1.

4.

9. The method for manufacturing a holographic optical element according to claim 1, characterized in that, The gap between the optical object and the glass is a vacuum or non-vacuum region.

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