Wafer etching apparatus

Abstract

The application relates to the wafer production field, and a wafer etching device which comprises a device box, a mounting mechanism, a wafer basket, a lifting mechanism, a rotating mechanism and a locking mechanism. The device box comprises a box body and a box door. The box body is provided with a containing groove. The box door is connected to the box body and covers the opening of the containing groove. The lifting mechanism is connected to the box body and is used for driving the rotating mechanism to slide vertically. The rotating mechanism is used for driving the mounting mechanism to rotate. The rotating axis of the mounting mechanism is vertical. The wafer basket is connected to the mounting mechanism and is used for placing wafers. The locking mechanism comprises a fixing assembly which is slidingly connected to the box body. The side surface of the fixing assembly facing the box body is used for abutting against the side surface of the box door away from the box body. The box door is fixed by the fixing assembly. When the wafer basket is rotated while being immersed in etching liquid, the box door can be prevented from being opened at will by workers, and the etching liquid can be prevented from splashing on the workers, so as to affect the health of the workers.

Description

Technical Field

[0001] This application relates to the field of wafer manufacturing technology, and in particular to a wafer etching apparatus. Background Technology

[0002] In existing technologies, wafers need to be etched with an etchant after grinding. A wafer etching apparatus is a commonly used device for etching wafers. In use, the wafer is placed in a wafer basket, which is then placed in a tank containing the etchant. The wafer basket is then immersed in the etchant bath, and the wafer is etched by rotating the wafer basket.

[0003] When the wafer basket is shaken in the etching solution, there is a risk of the etching solution splashing. If the staff opens the equipment door while the wafer basket is rotating, the etching solution may splash directly onto the staff, affecting their health. Summary of the Invention

[0004] To prevent workers from opening the equipment door during operation and to protect their health, this application provides a wafer etching device.

[0005] The wafer etching apparatus provided in this application adopts the following technical solution: A wafer etching apparatus includes an equipment box, a mounting mechanism, a wafer basket, a lifting mechanism, a rotating mechanism, and a locking mechanism. The equipment box includes a body and a door. The body has a receiving groove for holding etching solution. The door is connected to the body and covers the opening of the receiving groove. The lifting mechanism is connected to the body and drives the rotating mechanism to slide vertically. The mounting mechanism includes a rotating shaft and a hanging block. The rotating shaft is vertically positioned, and its upper end is connected to the rotating mechanism, which drives the shaft to rotate. The hanging block is located within the receiving groove and is connected to the lower end of the rotating shaft. The wafer basket is connected to the hanging block and is used to place wafers. The locking mechanism includes a fixing component, a stop block, a reset component, and a gear. The stop block is slidably embedded in the receiving groove, and its sliding direction is horizontal. The reset component… A component is connected between the abutment block and the housing. The reset component causes the abutment block to tend to move closer to the rotating shaft. The abutment block includes an abutment part and a meshing part. The abutment part has a guide slope at one end near the rotating shaft. The guide slope is located at the lower end of the abutment part. The distance from any point on the guide slope to the upper end of the abutment part increases as the point moves closer to the other end of the abutment part. The guide slope is used for the upper end of the hanging block to abut. The other end of the abutment part is connected to the meshing part. The gear is rotatably connected to the housing. The meshing part meshes with the gear. The fixing component is slidably connected to the housing. The side surface of the fixing component facing the housing is used to abut the side surface of the housing door away from the housing. The fixing component includes a rack. The rack meshes with the gear. When the abutment block moves towards the rotating shaft, the rack moves towards the center of the housing door.

[0006] By adopting the above technical solution, a fixing component abuts against the side of the enclosure door furthest from the enclosure body. When the wafer basket is immersed in the etching solution and rotates, this prevents workers from opening the enclosure door at will and avoids the etching solution splashing onto workers, thus protecting their health. After the wafer is etched, the hanging block rises, and its upper end abuts against the guide ramp. This pushes the abutment block to slide, causing the fixing component to slide and release the fixing to the enclosure door, making it easier for workers to open the door and remove the wafer basket.

[0007] Preferably, the fixing assembly further includes a sliding seat, a stop block, and a second reset member. The sliding seat is connected to the rack, and the stop block is slidably connected to the sliding seat. The sliding direction of the stop block is parallel to the sliding direction of the rack. The stop block has a second guide slope at one end near the center of the door. The second guide slope is located on the side of the stop block away from the door body. The distance from any point on the second guide slope to the surface of the stop block facing the door body increases as the point approaches the other end of the stop block. The second guide slope is used for the door to slide against the stop block. The second reset member is connected between the sliding seat and the stop block. The second reset member causes the abutment block to tend to move closer to the center of the door.

[0008] By adopting the above technical solution, the cabinet door can be closed regardless of the position of the hanging block.

[0009] Preferably, the locking mechanism further includes a locking component, which includes an abutment rod slidably connected to the housing and used to fix the stop block.

[0010] By adopting the above technical solution, during equipment operation, the stop block is locked by the abutting rod, which prevents the door from being unlocked by manually pushing the stop block, thus protecting the health of the staff.

[0011] Preferably, the locking assembly further includes a fixed ring, a sliding ring, an active hinge rod, a driven hinge rod, and a reset member. The fixed ring is rotatably connected to the housing. The fixed ring and the sliding ring are both coaxially and slidably connected to the rotating shaft. The fixed ring and the sliding ring are circumferentially fixed to the rotating shaft. The sliding ring is located above the fixed ring. The reset member is connected between the fixed ring and the sliding ring, and the reset member causes the sliding ring to tend to move away from the fixed ring. The lower end of the active hinge rod is connected to the fixed ring. The rings are hinged together. The hinge axis between the active hinge rod and the fixed ring is horizontal. The upper end of the driven hinge rod is hinged to the sliding ring. The hinge axis between the driven hinge rod and the sliding ring is parallel to the hinge axis between the active hinge rod and the fixed ring. The lower end of the driven hinge rod is hinged to the upper end of the active hinge rod. The hinge axis between the driven hinge rod and the active hinge rod is parallel to the hinge axis between the active hinge rod and the fixed ring. The abutting rod includes a push rod and a connecting rod. The connecting rod is rotatably connected to the sliding ring. The push rod is connected to the connecting rod. The sliding direction of the stop is vertical. The lower end of the push rod is used to abut the upper end of the stop.

[0012] By adopting the above technical solution, the rotating shaft rotates, which drives the fixed ring to rotate, and then drives the active hinge rod to rotate. Under the action of centrifugal force, the upper end of the active hinge rod moves away from the rotating shaft, which drives the lower end of the driven hinge rod to move away from the rotating shaft. This allows the sliding ring to overcome the elastic force of the reset member three and move downward, driving the abutment rod to abut against the upper end of the stop block, thereby locking the stop block when the rotating shaft rotates.

[0013] Preferably, the locking assembly further includes a counterweight connected to the upper end of the active hinge rod.

[0014] By adopting the above technical solution, the centrifugal force is proportional to the mass of the object. The greater the centrifugal force, the greater the force of the abutment rod against the stop block, thus improving the stability of the abutment rod locking the stop block.

[0015] Preferably, the sliding seat is provided with an abutment hole, and the top rod is slidably embedded in the abutment hole.

[0016] By adopting the above technical solution, the push rod is slidably embedded in the abutment hole, thereby improving the stability of the push rod abutting the stop block.

[0017] Preferably, the sliding ring has a second annular groove on its outer periphery, and the connecting rod includes an annular plate, which is embedded in the second annular groove, and the side wall of the annular plate is in contact with the groove wall of the second annular groove.

[0018] By adopting the above technical solution, the connecting rod is circumferentially fixed relative to the sliding ring, preventing the connecting rod from moving radially relative to the sliding ring during rotation, thereby improving the stability of the abutting rod against the stop block.

[0019] Preferably, the outer circumference of the rotating shaft is provided with a groove that extends vertically, the inner wall of the sliding ring is connected to a sliding insert, the sliding insert is slidably embedded in the groove, the groove wall of the sliding insert is in contact with the groove wall, and the inner wall of the fixing ring is connected to a fixing insert, the fixing insert is slidably embedded in the groove, the groove wall of the fixing insert is in contact with the groove wall.

[0020] By adopting the above technical solution, it is convenient for the rotating shaft to drive the sliding ring to rotate on the fixed ring, thereby driving the abutment rod to abut against the stop block and locking the stop block.

[0021] Preferably, the cross-section of the hanging block perpendicular to the rotation axis is rectangular.

[0022] By adopting the above technical solution, when the hanging block rises to unlock the cabinet door, if the rotating mechanism does not stop operating, the hanging block will rotate, causing the fixed component to move back and forth in the vertical direction, indicating to the staff that the equipment is still running and that the rotating mechanism needs to be turned off before opening the cabinet door.

[0023] Preferably, the gear includes a connecting shaft, a first gear ring, and a second gear ring. The connecting shaft is rotatably connected to the housing. The first gear ring is coaxially connected to the outer circumference of the connecting shaft. The first gear ring meshes with a meshing part. The second gear ring is coaxially connected to the outer circumference of the connecting shaft. The second gear ring meshes with a rack. The outer diameter of the first gear ring is equal to the outer diameter of the second gear ring.

[0024] By adopting the above technical solution, the first gear ring and the second gear ring have the same outer diameter and are coaxially connected to the outer circumference of the connecting shaft, which facilitates processing.

[0025] In summary, this application includes at least one of the following beneficial technical effects: 1. A fixing component abuts against the side of the enclosure door furthest from the enclosure body. When the wafer basket is immersed in the etching solution and rotates, this prevents workers from opening the door at will and avoids the etching solution splashing onto workers, thus protecting their health. After the wafer is etched, the hanging block rises, and its upper end abuts against the guide ramp. This pushes the abutment block to slide, causing the fixing component to slide and release the fixing to the enclosure door, making it easier for workers to open the door and remove the wafer basket. 2. The door can be closed regardless of the position of the hanging block; 3. The rotation of the shaft drives the fixed ring to rotate, which in turn drives the active hinge rod to rotate. Under the action of centrifugal force, the upper end of the active hinge rod moves away from the shaft, which drives the lower end of the driven hinge rod to move away from the shaft. This allows the sliding ring to overcome the elastic force of the reset element three and move downward, causing the abutment rod to abut against the upper end of the stop block, thus locking the stop block when the shaft rotates. Attached Figure Description

[0026] Figure 1 This is a schematic diagram of a wafer etching apparatus.

[0027] Figure 2 This is a cross-sectional view of a wafer etching apparatus.

[0028] Figure 3 This is a structural diagram of the locking mechanism and the installation mechanism.

[0029] Figure 4 This is a partial cross-sectional view of the wafer etching apparatus.

[0030] Figure 5 This is a partial cross-sectional view of the wafer etching apparatus.

[0031] Explanation of reference numerals in the attached figures: 1. Equipment box; 11. Box body; 111. Receiving tank; 112. Liquid storage tank; 113. Abutment slide; 114. Rotation track; 115. Limiting plate; 116. Clearance track; 12. Box door; 13. Mounting bracket; 131. Mounting plate; 132. Support column; 133. Sliding plate; 2. Mounting mechanism; 21. Shaft; 211. Groove; 22. Hanging block; 221. Hanging slot; 3. Chip basket; 4. Lifting mechanism; 41. Lifting motor; 42. Lead screw; 5. Rotating mechanism; 51. Rotary motor; 6. Locking mechanism; 61. Fixing component; 611. Rack; 612. Sliding seat; 6121. Groove; 6122. Abutting hole; 613. Stop; 6131. ​​Guide slope two; 614. Reset part two; 62. Abutting block; 621. Abutting part; 6211. Guide slope one; 6212. Abutting slider; 622. Engaging part; 63. Reset part one; 64. Gear; 641. Connecting shaft; 642. First gear ring; 643. The first gear ring... 65. Two-tooth ring; 65. Locking assembly; 651. Abutment rod; 6511. Push rod; 6512. Connecting rod; 65121. Ring plate; 65122. Cross bar; 65123. Longitudinal bar; 652. Fixed ring; 6521. Ring groove one; 6522. Fixed insert; 653. Sliding ring; 6531. Ring groove two; 6532. Sliding insert; 654. Active hinge rod; 655. Driven hinge rod; 656. Reset component three; 657. Counterweight. Detailed Implementation

[0032] The present application will be further described in detail below with reference to the accompanying drawings.

[0033] Reference Figure 1 This application discloses a wafer etching apparatus including an equipment box 1. The equipment box 1 includes a box body 11 and a box door 12.

[0034] Reference Figure 1 and Figure 2 The housing 11 is provided with a receiving groove 111, and a liquid storage tank 112 is provided on the lower wall of the receiving groove 111. The liquid storage tank 112 is used to hold corrosive liquid. The door 12 is rotatably connected to the housing 11 and covers the opening of the receiving groove 111. The rotation axis of the door 12 is vertical.

[0035] A wafer etching apparatus also includes a lifting mechanism 4. The equipment housing 1 also includes a mounting frame 13. The mounting frame 13 includes a mounting plate 131, a support column 132, a sliding plate 133, and a mounting post 134. The mounting plate 131 is located above the housing 11, and the support column 132 is fixedly connected between the mounting plate 131 and the housing 11, with the length direction of the support column being vertical. The length direction of the mounting post 134 is vertical, and the lower end of the mounting post 134 is fixedly connected to the upper end of the mounting plate 131. The lifting mechanism 4 includes a lifting motor 41 and a lead screw 42. The housing of the lifting motor 41 is fixedly connected to the upper end of the mounting post 134, and the lead screw 42 is rotatably connected to the mounting frame 13. The rotation axis of the lead screw 42 is vertical, the upper end of the lead screw 42 is coaxially fixedly connected to the output shaft of the lifting motor 41, and the lower end of the lead screw 42 is rotatably connected to the upper end of the housing 11. The sliding plate 133 is vertically slidably connected to the support column 132. The sliding plate 133 is threadedly connected to the lead screw 42. The lifting mechanism 4 is used to drive the sliding plate 133 to slide.

[0036] Reference Figure 2 and Figure 3A wafer etching apparatus further includes a rotating mechanism 5, a mounting mechanism 2, and a wafer basket 3. The rotating mechanism 5 includes a rotary motor 51. The housing of the rotary motor 51 is fixedly connected to the upper end of a sliding plate 133. The mounting mechanism 2 includes a rotating shaft 21 and a hanging block 22. The output shaft of the rotary motor 51 passes through the sliding plate 133 and is fixedly connected to the upper end of the rotating shaft 21. The length direction of the rotating shaft 21 is vertical, and the lower end of the rotating shaft 21 extends into a receiving groove 111. The hanging block 22 is located in the receiving groove 111 and is fixedly connected to the lower end of the rotating shaft 21. The rotating mechanism 5 drives the mounting mechanism 2 to rotate, and the rotation axis of the mounting mechanism 2 is vertical. The cross-section of the hanging block 22 perpendicular to the rotation axis of the mounting mechanism 2 is rectangular. A hanging groove 221 is provided on the side wall of the hanging block 22 for mounting the wafer basket 3.

[0037] Reference Figure 2 and Figure 4 The wafer etching apparatus also includes a locking mechanism 6. The locking mechanism 6 includes an abutment block 62, a reset member 63, and a gear 64.

[0038] Reference Figure 3 and Figure 4 The abutment block 62 is slidably embedded in the receiving groove 111, and the sliding direction of the abutment block 62 is horizontal. The abutment block 62 includes an abutment portion 621 and an engagement portion 622. The abutment portion 621 has a guide slope 6211 at one end near the rotating shaft 21. The guide slope 6211 is located at the lower end of the abutment portion 621. The distance from any point on the guide slope 6211 to the upper end of the abutment portion 621 increases as the point approaches the other end of the abutment portion 621. The guide slope 6211 is used for the upper end of the hanging block 22 to abut. An abutment slider 6212 is connected to the side of the abutment portion 621 facing the upper wall of the receiving groove 111. The upper wall of the receiving groove 111 has an abutment groove 113, and the abutment slider 6212 is slidably embedded in the abutment groove 113. In this embodiment, the abutment slider 6212 is a dovetail block.

[0039] A reset member 63 is connected between the abutment portion 621 and the housing 11, causing the abutment portion 621 to tend towards the rotating shaft 21. In this embodiment, the reset member 63 is a spring. One end of the reset member 63 is connected to the side of the abutment slider 6212 away from the rotating shaft 21, and the other end of the reset member 63 is connected to the groove wall of the slide groove 113 away from the rotating shaft 21.

[0040] The end of the abutment portion 621 away from the rotating shaft 21 is fixedly connected to one end of the meshing portion 622. The gear 64 is rotatably connected to the housing 11, and the axis of rotation of the gear 64 is horizontal. The gear 64 includes a connecting shaft 641, a first gear ring 642, and a second gear ring 643. The connecting shaft 641 is rotatably connected to the housing 11, and the first gear ring 642 is coaxially connected to the outer circumference of the connecting shaft 641. The first gear ring 642 meshes with the meshing portion 622, and the first gear ring 642 is located above the meshing portion 622.

[0041] Reference Figure 5 The locking mechanism 6 also includes a fixing component 61. The fixing component 61 is slidably connected to the housing 11, and the side surface of the fixing component 61 facing the housing 11 is used to abut against the side surface of the door 12 away from the housing 11. The fixing component 61 includes a rack 611, a sliding seat 612, a stop 613, and a reset component 614.

[0042] Reference Figure 3 and Figure 5 The outer circumference of the connecting shaft 641 is coaxially connected to the second gear ring 643. The outer diameter of the first gear ring 642 is equal to the outer diameter of the second gear ring 643. The second gear ring 643 meshes with the rack 611. The sliding direction of the rack 611 is vertical. The rack 611 is located on the side of the second gear ring 643 away from the receiving groove 111. When the abutment block 62 moves towards the direction of the rotating shaft 21, the rack 611 moves towards the direction of the center of the door 12.

[0043] In this embodiment, the second gear ring 643 is located above the door 12, the rack 611 slides vertically, and the rack moves downward when the abutment block 62 moves toward the direction of the rotating shaft 21.

[0044] The sliding seat 612 is fixedly connected to the rack 611 on the side away from the second gear ring 643. The lower end of the sliding seat 612 has a groove 6121, in which the stop block 613 is slidably fitted. The lower end of the stop block 613 has a guide ramp 6131, located on the side of the stop block 613 away from the housing 11. The distance from any point on the guide ramp 6131 to the surface of the stop block 613 near the housing 11 increases as that point approaches the other end of the stop block 613. The guide ramp 6131 is used for the sliding contact of the housing door 12. A reset member 614 is connected between the stop block 613 and the sliding seat 612, causing the stop block 613 to have a downward tendency. In this embodiment, the reset member 614 is a spring. One end of the reset component 614 is connected to the side of the stop block 613 facing the bottom of the groove 6121, and the other end of the reset component 614 is connected to the bottom of the groove 6121.

[0045] Reference Figure 3 and Figure 4The locking mechanism 6 also includes a locking assembly 65. The locking assembly 65 includes a sliding ring 653, a driven hinge rod 655, an active hinge rod 654, a reset member 656, and a fixing ring 652. The housing 11 has a rotating groove 114. The fixing ring 652 is rotatably embedded in the rotating groove 114. The outer circumference of the fixing ring 652 has an annular groove 6521. A limiting plate 115 is provided on the groove wall of the rotating groove 114, and the limiting plate 115 is embedded in the annular groove 6521. The side wall of the limiting plate 115 is in contact with the groove wall of the annular groove 6521. The fixing ring 652 is coaxially and slidably connected to the rotating shaft 21, and is circumferentially fixed to the rotating shaft 21. The inner wall of the fixing ring 652 is connected to a fixing insert 6522, and the outer peripheral wall of the rotating shaft 21 is provided with a groove 211. The groove 211 extends vertically, and the fixing insert 6522 is slidably embedded in the groove 211. The side wall of the fixing insert 6522 is in contact with the groove wall of the groove 211.

[0046] A sliding ring 653 is coaxially slidably connected to a rotating shaft 21, and circumferentially fixed to the rotating shaft 21. A sliding insert 6532 is connected to the inner wall of the sliding ring 653, and the sliding insert 6532 is slidably embedded in a groove 211, with its sidewall fitting against the groove wall of the groove 211. The sliding ring 653 is located above the fixed ring 652 and is slidably embedded in a rotating groove 114. A reset member 656 is connected between the sliding ring 653 and the fixed ring 652, causing the sliding ring 653 to tend to move away from the fixed ring 652. In this embodiment, the reset member 656 is a spring. The reset member 656 is sleeved on the outside of the rotating shaft 21, with one end connected to the upper end of the fixed ring 652 and the other end connected to the lower end of the sliding ring 653.

[0047] The lower end of the active hinge rod 654 is hinged to the fixed ring 652, and the hinge axis between the active hinge rod 654 and the fixed ring 652 is horizontal. The upper end of the driven hinge rod 655 is hinged to the sliding ring 653, and the hinge axis between the driven hinge rod 655 and the sliding ring 653 is parallel to the hinge axis between the active hinge rod and the fixed ring 652. The upper end of the active hinge rod 654 is hinged to the lower end of the driven hinge rod 655, and the hinge axis between the active hinge rod 654 and the driven hinge rod 655 is parallel to the hinge axis between the active hinge rod and the fixed ring 652. A counterweight 657 is fixedly connected to the upper end of the active hinge rod 654.

[0048] The abutment rod 651 includes a top rod 6511 and a connecting rod 6512. The connecting rod 6512 includes a ring plate 65121, a cross rod 65122, and a longitudinal rod 65123. The outer circumference of the sliding ring 653 is provided with a second annular groove 6531, and the ring plate 65121 is embedded in the second annular groove 6531, with the sidewall of the ring plate 65121 abutting against the sidewall of the second annular groove 6531. The rotating groove 114 has a clearance groove 116 on its groove wall, and the longitudinal rod 65123 slides into the clearance groove 116, with the sliding direction of the longitudinal rod 65123 parallel to the sliding direction of the sliding ring 653. One end of the longitudinal rod 65123 extends into the rotating groove 114 and is fixedly connected to the outer circumference of the ring plate 65121, while the other end of the longitudinal rod 65123 extends out of the housing 11.

[0049] Reference Figure 3 and Figure 5 One end of the crossbar 65122 is fixedly connected to the end of the longitudinal bar 65123 away from the ring plate 65121. The groove 6121 has an abutment hole 6122 at its bottom. The push rod 6511 is slidably embedded in the abutment hole 6122, and its lower end abuts against the upper end of the stop block 613. The upper end of the push rod 6511 is fixedly connected to one end of the crossbar 65122 along its length.

[0050] The implementation principle of the wafer etching device in this application embodiment is as follows: The wafer basket 3 is installed on the hanging block 22, and the box door 12 is closed. If the hanging block 22 is located at the top of the receiving groove 111, the fixing component 61 will not obstruct the closing of the box door 12. If the hanging block 22 does not abut against the first guide slope 6211, then when the box door 12 is closed, it abuts against the second guide slope 6131, pushing the stop block 613 upward. When the box door 12 is located on the side of the stop block 613 close to the box body 11, the stop block 613 moves downward under the action of the second reset component 614, so that the side surface of the stop block 613 facing the box body 11 is in contact with the side surface of the box door 12 away from the box body 11. The lifting motor 41 operates, driving the lead screw 42 to rotate, driving the sliding plate 133 to descend.

[0051] When the wafer basket 3 is immersed in the etching solution, the lifting motor 41 stops working, and the rotary motor 51 starts, driving the mounting mechanism 2 and rotating the wafer basket 3. Under the action of centrifugal force, the anti-detachment block 23 overcomes the elastic force of the reset component 24 and extends out of the limiting groove 2221, preventing the wafer basket 3 from detaching upward from the hanging block 22. The rotating shaft 21 rotates, driving the fixed ring 652, sliding ring 653, active hinge rod 654, driven hinge rod 655 and counterweight 657 to rotate. Under the action of centrifugal force, the counterweight 657 moves away from the rotation axis of the rotating shaft 21, driving the upper end of the active hinge rod 654 and the lower end of the driven hinge rod 655 to move away from the rotation axis of the rotating shaft 21, thereby realizing the downward movement of the sliding ring 653, driving the abutment rod 651 to move downward, abutting the upper end of the stop block 613, and locking the stop block 613.

[0052] When the rotary motor 51 stops running, the sliding ring 653 moves upward under the action of the reset component 656, causing the abutment rod 651 to move upward, thereby unlocking the stop block 613. The lifting motor 41 runs, driving the lead screw 42 to rotate, causing the sliding plate 133 to move upward, so that the wafer basket 3 leaves the etching liquid. When the hanging block 22 abuts against the guide inclined surface 6211, it pushes the abutment block 62 to move away from the rotation axis of the rotating shaft 21, driving the gear 64 to rotate, causing the fixing component 61 to move upward, thereby releasing the fixation of the box door 12.

[0053] The above are all preferred embodiments of this application, and are not intended to limit the scope of protection of this application. Therefore, all equivalent changes made in accordance with the structure, shape and principle of this application should be covered within the scope of protection of this application.

Claims

1. A wafer etching apparatus, characterized in that: It includes an equipment box (1), a mounting mechanism (2), a wafer basket (3), a lifting mechanism (4), a rotating mechanism (5), and a locking mechanism (6); The equipment box (1) includes a box body (11) and a box door (12); the box body (11) is provided with a receiving groove (111); the receiving groove (111) is used to receive corrosive liquid; the box door (12) is connected to the box body (11) and covers the opening of the receiving groove (111); The lifting mechanism (4) is connected to the housing (11); the lifting mechanism (4) is used to drive the rotating mechanism (5) to slide vertically; The installation mechanism (2) includes a rotating shaft (21) and a hanging block (22); the rotating shaft (21) is vertically arranged; the upper end of the rotating shaft (21) is connected to a rotating mechanism (5); the rotating mechanism (5) is used to drive the rotating shaft (21) to rotate; the hanging block (22) is located in the receiving groove (111); the hanging block (22) is connected to the lower end of the rotating shaft (21); The wafer basket (3) is connected to the hanging block (22); the wafer basket (3) is used for placing wafers; The locking mechanism (6) includes a fixing component (61), an abutment block (62), a reset component (63), and a gear (64); the abutment block (62) is slidably embedded in the receiving groove (111); the sliding direction of the abutment block (62) is horizontal; the reset component (63) is connected between the abutment block (62) and the housing (11); the reset component (63) causes the abutment block (62) to tend to move closer to the rotating shaft (21); the abutment block (62) includes an abutment portion (621) and an engagement portion (622); the abutment portion (621) has a guide slope (6211) at one end near the rotating shaft (21); the guide slope (6211) is located at the lower end of the abutment portion (621); the distance from any point on the guide slope (6211) to the upper end of the abutment portion (621) varies with that point. The abutment (621) increases in size at the other end; the guide slope (6211) is used for the upper end of the hanging block (22) to abut; the other end of the abutment (621) is connected to the meshing part (622); the gear (64) is rotatably connected to the housing (11); the meshing part (622) meshes with the gear (64); the fixing component (61) is slidably connected to the housing (11); the side surface of the fixing component (61) facing the housing (11) is used to abut the side surface of the door (12) away from the housing (11); the fixing component (61) includes a rack (611); the rack (611) meshes with the gear (64); when the abutment (62) moves toward the direction of the rotating shaft (21); the rack (611) moves toward the center of the door (12).

2. The wafer etching apparatus according to claim 1, characterized in that: The fixing component (61) further includes a sliding seat (612), a stop (613), and a reset component (614); the sliding seat (612) is connected to the rack (611); the stop (613) is slidably connected to the sliding seat (612); the sliding direction of the stop (613) is parallel to the sliding direction of the rack (611); a guide slope (6131) is provided at one end of the stop (613) near the center of the door (12); the guide slope (6131) is located at the stop (614). 613) The side away from the box body (11); the distance from any point on the second guide slope (6131) to the surface of the stop block (613) facing the box body increases as the point gets closer to the other end of the stop block (613); the second guide slope (6131) is used for the sliding contact of the box door (12); the second reset member (614) is connected between the sliding seat (612) and the stop block (613); the second reset member (614) makes the contact block (62) tend to move closer to the center of the box door (12).

3. The wafer etching apparatus according to claim 2, characterized in that: The locking mechanism (6) further includes a locking component (65); the locking component (65) includes an abutment rod (651); the abutment rod (651) is slidably connected to the housing (11); the abutment rod (651) is used to fix the stop block (613).

4. The wafer etching apparatus according to claim 3, characterized in that: The locking assembly (65) further includes a fixed ring (652), a sliding ring (653), an active hinge rod (654), a driven hinge rod (655), and a reset component (656); the fixed ring (652) is rotatably connected to the housing (11); the fixed ring (652) and the sliding ring (653) are both coaxially slidably connected to the rotating shaft (21); the fixed ring (652) and the sliding ring (653) are both circumferentially fixed to the rotating shaft (21); The sliding ring (653) is located above the fixed ring (652); the reset member three (656) is connected between the fixed ring (652) and the sliding ring (653); the reset member three (656) causes the sliding ring (653) to tend to move away from the fixed ring (652); the lower end of the active hinge rod (654) is hinged to the fixed ring (652); the hinge axis of the active hinge rod (654) and the fixed ring (652) is horizontal; the driven hinge rod The upper end of (655) is hinged to the sliding ring (653); the hinge axis of the driven hinge rod (655) and the sliding ring (653) is parallel to the hinge axis of the active hinge rod (654) and the fixed ring (652); the lower end of the driven hinge rod (655) is hinged to the upper end of the active hinge rod (654); the hinge axis of the driven hinge rod (655) and the active hinge rod (654) is parallel to the active hinge rod (654) and the fixed ring (652). The hinge axis; the abutment rod (651) includes a top rod (6511) and a connecting rod (6512); the connecting rod (6512) is rotatably connected to the sliding ring (653); the connecting rod (6512) is circumferentially fixedly connected to the sliding ring (653); the top rod (6511) is connected to the connecting rod (6512); the sliding direction of the stop block (613) is vertical; the lower end of the top rod (6511) is used to abut the upper end of the stop block (613).

5. The wafer etching apparatus according to claim 4, characterized in that: The locking assembly (65) also includes a counterweight (657); the counterweight (657) is connected to the upper end of the active hinge rod (654).

6. The wafer etching apparatus according to claim 4, characterized in that: The sliding seat (612) is provided with an abutment hole (6122); the top rod (6511) is slidably embedded in the abutment hole (6122).

7. The wafer etching apparatus according to claim 4, characterized in that: The sliding ring (653) has an annular groove 2 (6531) on its outer periphery; the connecting rod (6512) includes an annular plate (65121); the annular plate (65121) is embedded in the annular groove 2 (6531); the side wall of the annular plate (65121) is in contact with the groove wall of the annular groove 2 (6531).

8. The wafer etching apparatus according to claim 4, characterized in that: The outer circumference of the rotating shaft (21) is provided with a groove (211); the groove (211) extends vertically; the inner wall of the sliding ring (653) is connected to a sliding insert (6532); the sliding insert (6532) is slidably embedded in the groove (211); the groove wall of the sliding insert (6532) is in contact with the groove wall of the groove (211); the inner wall of the fixing ring (652) is connected to a fixing insert (6522); the fixing insert (6522) is slidably embedded in the groove (211); the groove wall of the fixing insert (6522) is in contact with the groove wall of the groove (211).

9. The wafer etching apparatus according to claim 1, characterized in that: The cross section of the hanging block (22) perpendicular to the rotation axis of the mounting mechanism (2) is rectangular.

10. The wafer etching apparatus according to claim 1, characterized in that: The gear (64) includes a connecting shaft (641), a first gear ring (642), and a second gear ring (643); the connecting shaft (641) is rotatably connected to the housing (11); the outer circumference of the connecting shaft (641) is coaxially connected to the first gear ring (642); the first gear ring (642) meshes with the meshing part (622); the outer circumference of the connecting shaft (641) is coaxially connected to the second gear ring (643); the second gear ring (643) meshes with the rack (611); the outer diameter of the first gear ring (642) is equal to the outer diameter of the second gear ring (643).

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