High-performance mirror and preparation method and application thereof

Abstract

The application discloses a high-performance reflector and a preparation method and application thereof. The high-performance reflector comprises a Ti 49 Zr 23 Cu 12 Ni8Nb6Hf2 (at. %) amorphous alloy base, Ag 82.66 Zr 12.64 Ni 4.66 Y 0.04 (at. %) reflecting film. The high-performance reflector is prepared by PEPVD on a Ti 49 Zr 23 Cu 12 Ni8Nb6Hf2 (at. %) amorphous alloy base surface, Ag 82.66 Zr 12.64 Ni 4.66 Y 0.04 (at. %) reflecting film. The high-performance reflector provided by the application has excellent optical and mechanical properties and can be applied to the fields of biological medicine, machine vision, lighting engineering and the like with structural and functional integration, and especially has wide application prospects in radar, optical imaging and metrological detection.

Description

Technical Field

[0001] This invention belongs to the field of optical element technology, specifically relating to a high-performance reflector, its preparation method, and its application. Background Technology

[0002] As a crucial tool for humankind to observe the universe, the detection capabilities and spatial resolution of astronomical telescopes are primarily limited by the performance of their primary mirrors. Therefore, with the advancement of science and technology, high-performance primary mirrors have become a focus of industry attention. Generally, a primary mirror needs to meet two requirements: 1) high reflectivity over a wide spectral band, meaning the mirror must possess the highest possible reflectivity across a broad observation wavelength range; and 2) long service life, meaning excellent environmental stability.

[0003] Silver films, due to their superior optical properties, especially their outstanding reflectivity and extremely high reflectivity, occupy an important position in many optical applications, such as the manufacture of high-performance silver mirrors. Currently, through relatively mature vacuum deposition technology or chemical reduction reaction methods, uniform and continuous silver thin film structures can be successfully deposited on different substrate materials, thereby achieving the fabrication of high-quality silver mirrors.

[0004] The substrate material for silver reflectors can be selected based on different application scenarios and requirements; typically, a variety of materials can be used as the substrate. Common substrate materials used in optical and precision instrument manufacturing include:

[0005] Glass: such as high-purity quartz glass or borosilicate glass. These materials have high transparency, good thermal stability and strong chemical stability, making them ideal substrates for making flat or curved mirrors.

[0006] Silicon: In the semiconductor and microelectronics industry, single-crystal silicon is often used as a substrate for depositing silver films or other metal films due to its excellent mechanical properties, thermal stability and compatibility with semiconductor processes.

[0007] Polymer film: In applications requiring lightweight, flexibility, or low cost, polymer films such as PET (polyethylene terephthalate) and PC (polycarbonate) can be selected as substrates, and then silver can be deposited on them to form polymer reflectors.

[0008] Metal alloys: In some cases, other metals or alloys may also be used as the base, especially for special environments that require high temperature resistance and corrosion resistance.

[0009] However, regardless of the substrate used, the bonding strength between the silver film and the substrate is the core issue determining the long-term stability and durability of the reflector. A strong interfacial bond must be formed between the silver film and the substrate to ensure that the reflector maintains stable optical performance under various environmental conditions, such as temperature changes, humidity effects, and mechanical stress, without peeling or failure. How to fabricate high-performance reflectors with excellent optical performance, good environmental stability, and long service life has always been a technical challenge for astronomical telescope primary mirrors. Summary of the Invention

[0010] The main objective of this invention is to provide a high-performance reflector, its preparation method, and its application, in order to overcome the shortcomings of the prior art.

[0011] To achieve the aforementioned objective, the technical solution adopted by this invention includes: a high-performance reflector, comprising an amorphous alloy substrate and a silver-based reflective film deposited on the amorphous alloy substrate; wherein the amorphous alloy substrate is Ti. 49 Zr 23 Cu 12 Ni8Nb6Hf2 (at.%), the silver-based reflective film is Ag 82.66 Zr 12.64 Ni 4.66 Y 0.04 (at.%); the Ag 82.66 Zr 12.64 Ni 4.66 Y 0.04 The thickness of the reflective film is 50nm to 200nm; Ti 49 Zr 23 Cu 12 The Ni8Nb6Hf2 (at.%) amorphous alloy substrate possesses a high strength-to-weight ratio and high hardness, three times the elastic limit of traditional crystalline metal alloys; simultaneously, Ag... 82.66 Zr 12.64 Ni 4.66 Y 0.04 (at.%) The reflective film exhibits excellent reflectivity and environmental stability in the wavelength range of 400–1700 nm.

[0012] Furthermore, the Ag 82.66 Zr 12.64 Ni 4.66 Y 0.04 The thickness of the reflective film is 100nm to 150nm.

[0013] The present invention also provides a method for manufacturing the above-mentioned high-performance reflector, comprising:

[0014] At least one of the following methods should be used for Ti ion plating: evaporation ion plating, magnetron sputtering ion plating, or arc discharge ion plating. 49 Zr23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 A reflective film is used to fabricate a high-performance mirror. Ag is involved. 82.66 Zr 12.64 Ni 4.66 Y 0.04 (at.%) Non-uniform nucleation of the coating due to localized variations in surface rare earth composition, and Ti 49 Zr 23 Cu 12 The anisotropic atomic arrangement of Ni8Nb6Hf2 (at.%) amorphous alloys, where atoms or clusters diffuse across the surface to form a network of atomic chains, alters the crystal orientation diffusion mechanism, significantly increasing the activation energy and thus enhancing Ag. 82.66 Zr 12.64 Ni 4.66 Y 0.04 Reflective film and Ti 49 Zr 23 Cu 12 The bonding strength of Ni8Nb6 Hf2 (at.%) amorphous alloy substrate.

[0015] Furthermore, using IBAD in Ti 49 Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 Reflective film.

[0016] The embodiments of the present invention also provide the high-performance reflector for applications in fields such as biomedicine, machine vision, and lighting engineering where the structure and function are integrated. In particular, its reflective properties have broad application prospects in radar, optical imaging, and metrology.

[0017] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0018] (1) This invention is the first in Ti 49 Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 The reflective film effectively enhances the bonding force between the two, ensuring the long service life of the reflector.

[0019] (2) The Ti of the present invention49 Zr 23 Cu 12 Due to the unique properties of amorphous materials, the Ni8Nb6Hf2 amorphous alloy substrate will endow the mirror with many new properties, such as hardness, high strength and toughness, and mechanical stability.

[0020] (3) Ag of the present invention 82.66 Zr 12.64 Ni 4.66 Y 0.04 Due to the special properties of its materials, reflective coatings will endow mirrors with many new properties, such as high reflectivity and environmental stability.

[0021] (4) The high-performance reflector of the present invention has broad application prospects in fields such as biomedicine, machine vision, and lighting engineering due to its high reflectivity and environmental stability. Attached Figure Description

[0022] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0023] Figure 1 This is a sample image of a high-performance reflector prepared in Embodiment 1 of the present invention;

[0024] Figure 2 This is a SEM image of a high-performance reflector prepared in Embodiment 1 of the present invention; as can be seen from the image, the reflective film has a layered structure, proving that the surface of the reflective film is uniform and dense;

[0025] Figure 3 This is a surface roughness diagram of a high-performance reflector prepared in Embodiment 1 of the present invention;

[0026] Figure 4 Ti in Embodiment 1 of the present invention 49 Zr 23 Cu 12 Ni8Nb6Hf2 (at.%) amorphous alloy substrate with Ag 82.66 Zr 12.64 Ni 4.66 Y 0.04 (at.%) Bonding force diagram of reflective film to substrate;

[0027] Figure 5 This is a reflectance diagram of a high-performance mirror prepared in Embodiment 1 of the present invention in the wavelength range of 400-1700nm. Detailed Implementation

[0028] In view of the deficiencies of the prior art, the inventors of this case, through long-term research and extensive practice, have proposed the technical solution of this invention. The technical solution of this invention will be clearly and completely described below. Obviously, the described embodiments are only some, not all, of the embodiments of this invention. All other embodiments obtained by those skilled in the art based on the embodiments of this invention without creative effort are within the scope of protection of this invention.

[0029] Specifically, as one aspect of the technical solution of this invention, a high-performance reflector includes Ti 49 Zr 23 Cu 12 Ni8Nb6Hf2 (at.%) amorphous alloy substrate, Ag 82.66 Zr 12.64 Ni 4.66 Y 0.04 (at.%) reflective film. The high-performance mirror is based on Ti... 49 Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 (at.%) amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 (at.%) reflective film.

[0030] In some preferred embodiments, the Ag 82.66 Zr 12.64 Ni 4.66 Y 0.04 The thickness of the reflective film is 50nm to 200nm.

[0031] Furthermore, the Ag 82.66 Zr 12.64 Ni 4.66 Y 0.04 The thickness of the reflective film is 100nm to 150nm.

[0032] Another aspect of the present invention provides a method for fabricating the high-performance reflector, comprising:

[0033] At least one of the following methods should be used for Ti ion plating: evaporation ion plating, magnetron sputtering ion plating, or arc discharge ion plating. 49 Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 Reflective film;

[0034] In some preferred embodiments, the preparation method specifically includes: using IBAD on Ti 49 Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 Reflective film.

[0035] Another aspect of this invention provides that the high-performance reflector has broad application prospects in fields such as biomedicine, machine vision, and lighting engineering, especially in radar, optical imaging, and metrology, where its reflective properties are particularly promising.

[0036] The technical solution of the present invention will be further described in detail below with reference to several preferred embodiments and accompanying drawings. This embodiment is implemented on the premise of the technical solution of the invention, and provides detailed implementation methods and specific operation processes. However, the protection scope of the present invention is not limited to the following embodiments.

[0037] Unless otherwise specified, the experimental materials used in the examples below can be purchased from conventional biochemical reagent companies. Ag 82.66 Zr 12.64 Ni 4.66 Y 0.04 Target material and Ti 49 Zr 23 Cu 12 Ni8Nb6Hf2 amorphous alloy substrates can be obtained using mature vacuum melting and powder metallurgy methods.

[0038] Example 1

[0039] In this embodiment, the high-performance reflector uses IBAD on Ti 49 Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 (at.%) amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 The (at.%) reflective film is prepared by the following method:

[0040] Before IBAD preparation, Ag 82.66 Zr 12.64 Ni 4.66 Y 0.04 The target material is fixed to the target stage with silver paste, Ti 49 Zr 23 Cu 12The Ni8Nb6Hf2 amorphous alloy substrate was ultrasonically cleaned sequentially with acetone, ethanol, and deionized water for 10 minutes each, then fixed to the rotating sample stage with conductive adhesive. The cavity was then evacuated to a vacuum of 2 × 10⁻⁶. -4 After the pressure drops below Pa, turn on the argon gas to bring the cavity pressure to 2.2–2.6 × 10⁻⁶. -2 After a few minutes, the gas pressure stabilizes. The auxiliary source is then turned on, with an energy typically around 550 eV and a current of approximately 20 mA. Once the voltage and current stabilize, the sample baffle is opened to perform ion beam thinning and cleaning of the substrate, typically for 10–300 seconds. After cleaning, the baffle is closed, and the main source is turned on, with the energy controlled at approximately 500–850 eV and the current at 1–50 mA, to perform ion beam thinning and cleaning of the target surface, typically for 180–600 seconds. After target cleaning, the sample baffle is opened, the stage rotation speed is set to 10 r / min, and film deposition begins. The main source energy is typically 700 eV, the current is approximately 50 mA, and the deposition rate is controlled at 11.8 nm / min. 49 Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 Reflective film.

[0041] Example 2

[0042] In this embodiment, the high-performance reflector is fabricated using magnetron sputtering on Ti. 49 Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 (at.%) amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 The (at.%) reflective film is prepared by the following method:

[0043] Before magnetron sputtering, Ti was treated sequentially with acetone, ethanol, and deionized water. 49 Zr 23 Cu 12 The Ni8Nb6Hf2 amorphous alloy substrate was ultrasonically cleaned for 10 minutes and then dried with nitrogen gas. The ultrasonically cleaned Ti... 49 Zr 23 Cu 12 After the Ni8Nb6Hf2 amorphous alloy substrate is secured to the tray with screws, it is placed in the vacuum chamber, and the vacuum chamber is evacuated to 1×10⁻⁶. -4 After the pressure drops below Pa, argon gas is introduced, and the pressure inside the chamber is adjusted to 0.7 Pa. The power is turned on, and a negative bias voltage is applied to the sample substrate to generate plasma from the argon gas, which then reacts with the Ti sample. 49Zr 23 Cu 12 The Ni8Nb6Hf2 amorphous alloy substrate was etched and cleaned for 10–20 minutes. After etching and cleaning were completed, the vacuum chamber was evacuated to 8 × 10⁻⁸ ppm. -5 After Pa, it is driven by a DC power supply, and a DC negative bias voltage is applied to the substrate to control Ag. 82.66 Zr 12.64 Ni 4.66 Y 0.04 The target material undergoes etching and cleaning, typically for 15–30 minutes. After etching and cleaning, the baffle is opened, and a DC negative bias of less than 50V is applied to the substrate. The sample stage temperature is set to 400℃, the sample stage rotation speed is set to 10 r / min, and the deposition rate is controlled at 2.3 μm / h. 49 Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 Reflective film.

[0044] Example 3

[0045] In this embodiment, the high-performance reflector is fabricated using vacuum evaporation on Ti. 49 Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 (at.%) amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 The (at.%) reflective film is prepared by the following method:

[0046] Before vacuum evaporation, Ti was treated sequentially with acetone, ethanol, and deionized water. 49 Zr 23 Cu 12 The Ni8Nb6Hf2 amorphous alloy substrate was ultrasonically cleaned for 10 minutes and then dried with nitrogen gas. The ultrasonically cleaned Ti... 49 Zr 23 Cu 12 After the Ni8Nb6Hf2 amorphous alloy substrate is secured to the tray with screws, it is placed in a vacuum chamber. High-purity Ag, Zr, Ni, and Y particles (99.99% purity) with a size of 2-3 mm are placed in a quartz crucible as raw materials. The vacuum chamber is then evacuated to a vacuum level of 2 × 10⁻⁶. -4 After Pa, the crucible temperature is approximately 1400–1600 °C, and the evaporation rate remains at [a certain level]. Heating a quartz crucible from left to right to evaporate Ag, Zr, Ni, Y particles and in Ti 49Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 Reflective film.

[0047] Example 4

[0048] In this embodiment, the high-performance reflector uses a PLD on a Ti... 49 Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 (at.%) amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 The (at.%) reflective film is prepared by the following method:

[0049] Before PLD preparation, Ti was ultrasonically cleaned sequentially with acetone, ethanol, and deionized water for 10 minutes. 49 Zr 23 Cu 12 The Ni8Nb6Hf2 amorphous alloy substrate was fixed on the sample stage, and then the cavity was evacuated to 1×10⁻⁶. -5 Below Pa, the laser energy was adjusted to approximately 350–420 mJ under safe conditions, with a pulse frequency of 1–10 pulses per second. After the laser stabilized, the window baffle was removed to introduce the laser into the Ag cavity. 82.66 Zr 12.64 Ni 4.66 Y 0.04 The target is positioned at its exact center, ensuring that the plasma tail flame ejected from the target surface lands precisely on Ti. 49 Zr 23 Cu 12 On a Ni8Nb6Hf2 amorphous alloy substrate, thus on Ti 49 Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 Reflective film.

[0050] Comparative Example 1

[0051] This example is the same as Example 1, except that the substrate used is Zr. 50 Cu 25 Al 25 Amorphous alloy substrate.

[0052] Comparative Example 2

[0053] This example is the same as Example 1, except that the target material used is Ag. 82.66 Zr 12.64 Ni 4.66 Sn 0.04 .

[0054] The reflectors obtained in Examples 1-4 and Comparative Examples 1-2 were tested in an extreme environment (air environment) with a temperature of -50℃. The test results are shown in Table 1.

[0055] Table 1

[0056]

[0057]

[0058] Note: Thickness was obtained by measuring with a profilometer.

[0059] As can be seen from the above, the reflective film of the present invention, through non-uniform nucleation on the surface of amorphous alloy of a specific composition, reacts with Ti. 49 Zr 23 Cu 12 The anisotropic atomic arrangement of Ni8Nb6Hf2 (at.%) amorphous alloy, where atoms or clusters diffuse on the surface to form a network of atomic chains, alters the crystal orientation diffusion mechanism and significantly increases the activation energy. This not only reduces reflectivity loss due to oxidation but also enhances Ag... 82.66 Zr 12.64 Ni 4.66 Y 0.04 Reflective film and Ti 49 Zr 23 Cu 12 The bonding strength of the Ni8Nb6Hf2(at.%) amorphous alloy substrate significantly improves service life in extreme environments.

[0060] It should be understood that the technical solutions of the present invention are not limited to the specific embodiments described above. Any technical modifications made to the technical solutions of the present invention without departing from the spirit and scope of the claims are within the scope of protection of the present invention.

Claims

1. A high-performance reflector, characterized in that, It includes an amorphous alloy substrate and a silver-based reflective film deposited on the amorphous alloy substrate; the amorphous alloy substrate is Ti. 49 Zr 23 Cu 12 Ni8Nb6Hf2 (at.%), the silver-based reflective film is Ag 82.66 Zr 12.64 Ni 4.66 Y 0.04 (at.%); the Ag 82.66 Zr 12.64 Ni 4.66 Y 0.04 The thickness of the reflective film (at.%) is 50 nm to 200 nm.

2. The high-performance reflector according to claim 1, characterized in that... The Ag 82.66 Zr 12.64 Ni 4.66 Y 0.04 The thickness of the reflective film (at.%) is 100 nm to 150 nm.

3. The method for preparing the high-performance reflector according to any one of claims 1-2, characterized in that, include: At least one of the following methods should be used for Ti ion plating: evaporation ion plating, magnetron sputtering ion plating, or arc discharge ion plating. 49 Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 (at.%) amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 (at.%) reflective film; thereby obtaining a high-performance reflective mirror.

4. The preparation method according to claim 3, characterized in that... Specifically, this includes: using IBAD in Ti 49 Zr 23 Cu 12 Ag deposition on the surface of Ni8Nb6Hf2 (at.%) amorphous alloy substrate 82.66 Zr 12.64 Ni 4.66 Y 0.04 (at.%) reflective film.

5. The application of the high-performance reflector according to any one of claims 1-2 in biomedicine, machine vision, lighting engineering, radar, optical imaging, and metrology.

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