Optimized divergence and luminous flux double-slit collimation system and design method thereof

Abstract

The present application relates to a kind of optimization divergence and light flux double-slit collimation system and its design method, the design scheme is after initially determining peripheral parameter design slit pitch;Different pitch corresponding divergence angle value and light source intensity proportion value at sample are obtained by changing slit pitch, using curve is fitted to obtain slit pitch-diffusion angle curve and slit pitch-light source intensity proportion curve;Two different intervals of slit pitch are obtained by respectively taking the straight line of suitable slope intercepting corresponding curve, the overlapping part of two different intervals is determined as the design interval of slit pitch, slit pitch is determined in the design interval;Then design slit opening degree.The optimization method realizes the contradiction between the demand of small divergence angle and the demand of large light flux by suitable fitting method and interval determination method, so as to provide more balanced X-ray imaging effect without changing light source.

Description

Technical Field

[0001] This invention relates to the field of double-slit collimation technology for optical systems, and more specifically to a double-slit collimation system and its design method for optimizing divergence and luminous flux. Background Technology

[0002] Typical X-ray sources have large divergence angles; for example, the divergence angle of a conventional copper target X-ray tube is generally 12° or even higher. However, almost all industrial X-ray applications require sources with smaller divergence. This practical contradiction is a real problem that must be faced in the design of X-ray equipment. Current designs often use collimation or focusing optical path processing to obtain X-rays with smaller divergence angles. Using slits to control the light beam to achieve smaller divergence is a common approach in X-ray optical path design. Based on this, a technical solution using double slits to reduce X-ray divergence has also emerged. The slit-based solution typically involves installing a lead slit in the optical path to obtain X-rays with a limited divergence angle that only passes through the slit. Based on this principle, we can clearly conclude that obtaining a smaller divergence angle means using a smaller slit, resulting in less X-rays passing through; that is, a smaller divergence angle often means a smaller X-ray flux. This qualitative conclusion still applies to the double-slit solution.

[0003] However, in practical applications, we generally want the X-rays reaching the sample to be sufficiently strong, or as strong as possible, to obtain better imaging performance; on the other hand, we also want the X-rays to have a smaller divergence angle to improve image quality. In other words, in practical applications, we generally want a small divergence angle while having the largest possible luminous flux. It is evident that in the dual-slit collimation technique, there is often a contradiction between the system design and the final goal in terms of divergence angle and luminous flux, making it difficult to provide a suitable design scheme that simultaneously considers both. Summary of the Invention

[0004] Given that existing dual-slit collimation system designs struggle to balance X-ray light flux and divergence, this invention provides a dual-slit collimation system and its design method that optimizes divergence and light flux.

[0005] The technical solution of the present invention is as follows:

[0006] A design method for a dual-slit collimation system that optimizes divergence and luminous flux includes the following steps:

[0007] SS1. Preliminary determination of peripheral parameters; determination of the distance between slit one and the light source in the double-slit collimation system, and preliminary determination of the opening of slit one and slit two;

[0008] SS2. Design the slit spacing; change the slit spacing to obtain the divergence angle value and the proportion of light source intensity at the sample corresponding to different spacings, and obtain the slit spacing-divergence angle curve and the slit spacing-light source intensity proportion curve through nonlinear fitting; according to the principle that the greater the light intensity and the smaller the divergence angle, take the parameter value range of the curve slope change compromise, and determine the slit spacing within this range; take the straight line with a suitable slope to intercept the corresponding curve to obtain two different ranges of slit spacing, take the overlapping part of the two different ranges to determine the design range of slit spacing, and determine the slit spacing within this design range;

[0009] SS3. Design the slit opening; Given the slit spacing and tentatively set the slit opening one slightly larger than the slit opening two; Change the slit opening two to obtain the corresponding divergence angle curve and light source intensity ratio curve under different opening values, and determine the design range of the slit opening two based on the corresponding divergence angle curve and light source intensity ratio curve under different width values, and determine the slit opening two within this design range.

[0010] Preferably, in the S2 step of designing the slit spacing, the process of obtaining two different intervals of the slit spacing by taking straight lines with appropriate slopes and intercepting corresponding curves is as follows:

[0011] The straight line corresponding to the divergence angle curve under different spacing values ​​is the first oblique intercept; within the divergence angle range, a divergence angle target value divA is selected, and the point (d2A, divA) corresponding to the divergence angle target value divA is determined in the divergence angle curve. The slope of the tangent at this target point is taken as the slope of the first oblique intercept. The first oblique intercept is translated to obtain two intersection points with the divergence angle curve. The range between the intersection points is the first interval of the slit spacing.

[0012] The straight line of the corresponding light source intensity ratio curve under different spacing values ​​is the second oblique line; within the divergence angle range, a target value of light source intensity ratio perA is taken, and the point (d2B, perB) corresponding to the target value of light source intensity ratio perB is determined in the light source intensity ratio curve. The slope of the tangent at this target point is taken as the slope of the second oblique line. The second oblique line is translated to obtain two intersection points with the divergence angle curve. The range between the intersection points is the second interval of the slit spacing.

[0013] The overlapping portion of the first interval and the second interval is taken as the design interval for the slit spacing.

[0014] Preferably, the translation starting point of the first oblique line passes through point (d2A, divA), and the translation starting point of the second oblique line passes through point (d2B, perB); the first oblique line and the second oblique line are translated by the same distance along the axis containing the slit spacing.

[0015] Preferably, the fitting model used in obtaining the slit spacing-divergence angle curve and the slit spacing-light source intensity ratio curve through nonlinear fitting is y = a * x^b, where a and b are coefficients, and b is less than 0.

[0016] Preferably, it also includes an SS4 slit spacing verification step located after the SS3 slit opening design step;

[0017] SS4, Slit Spacing Verification: Repeat the SS2 slit spacing design step and perform a second verification on the result after determining the slit opening in the SS3 slit opening design step. If the expected divergence angle and light source intensity ratio can still be obtained by changing the slit spacing d2, retain the design result; otherwise, repeat the SS2 slit spacing design step and the SS3 slit opening design step based on the existing results.

[0018] Preferably, in the SS3 slit opening design step, the process of determining the design range of the slit second opening based on the corresponding divergence angle curve and the light source intensity ratio curve under different width values ​​is as follows: when there is an overlap between the range of the slit second opening corresponding to the required divergence angle range and the range of the slit second opening corresponding to the luminous flux range, the overlapping part is taken as the design range when designing the slit.

[0019] The present invention also provides a dual-slit collimation system for optimizing divergence and luminous flux, comprising a first slit and a second slit arranged along the optical path, characterized in that the distance between the first slit and the light source is 10cm, the distance between the first slit and the second slit is 40cm-80cm, and the width of the second slit is 0.012cm-0.016cm.

[0020] Preferably, the opening of the first slit is equal to the opening of the second slit.

[0021] The optimization method of this invention takes into account both divergence angle and light flux requirements through step-by-step optimization, simplifies the optimization design of the dual-slit collimation system, and achieves a balance between the requirements for small divergence angle and large light flux through appropriate fitting and interval determination methods. Thus, without changing the light source, it provides a more balanced X-ray imaging effect, ensuring the dual goals of small divergence and high photon transmission efficiency while maintaining the collimation system, thereby improving measurement efficiency and resolution. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of the dual-slit collimation system of the present invention;

[0023] Figure 2 This is a flowchart illustrating the design method of the dual-slit collimation system of the present invention;

[0024] Figure 3 This is a schematic diagram simulating a light source during the design of the dual-slit collimation system of the present invention;

[0025] Figure 4 This is a schematic diagram showing the results of changing the slit spacing in the dual-slit collimation system of the present invention;

[0026] Figure 5 This is a schematic diagram showing the result of the double slit collimation system of the present invention when the slit opening changes.

[0027] Figure 6 The image shows the normalized relationship between the slit opening and light intensity and divergence angle of the dual-slit collimation system of the present invention.

[0028] Figure 7 This is a schematic diagram showing the result of a change in the slit opening of the dual-slit collimation system of the present invention.

[0029] Figure 8 This is a comparison image of the sample before and after optimization of the dual-slit collimation system of the present invention. Detailed Implementation

[0030] The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments. In this specification, the dimensions of the drawings do not represent the actual dimensions. They are only used to illustrate the relative positional and connection relationships between the components. Components with the same name or the same reference numeral represent similar or identical structures and are limited to illustrative purposes.

[0031] Double slit collimation system, such as Figure 1 As shown, two controllable slits are sequentially placed in the X-ray beam path to obtain X-rays with smaller divergence after passing through the two slits. This typically yields X-rays with smaller divergence angles, but it also reduces the X-ray flux reaching the target. Existing double-slit designs primarily focus on reducing the X-ray divergence angle, and the beam-catching effect of double-slit collimation systems often exhibits nonlinear effects, making theoretical design difficult. Therefore, the latter is rarely considered in practical design processes. However, this is insufficient for applications requiring higher imaging performance. For example, in X-ray diffraction-based microstructure analysis, insufficient flux leads to low contrast in the diffraction pattern, failing to clearly reveal structural details.

[0032] In order to determine suitable design parameters in the above-mentioned dual-slit collimation system to take into account the requirements of divergence angle and light flux, this application provides a design method for a dual-slit collimation system. Figure 2 This is a simplified flowchart illustrating the design method of this application. The steps include:

[0033] SS1. Preliminary determination of peripheral parameters.

[0034] according to Figure 1 As shown in the schematic diagram, the structural parameters of a typical double-slit collimation system include: the distance from slit one to the light source, called the first distance d1; the distance between the two slits, called the slit spacing d2; the distance between slit two and the sample, called the third distance d3; the opening of slit one is S1; and the opening of slit two is S2. In practice, regarding the slit width, if the slit is only one-dimensionally adjustable, it can refer only to its width; if the slit is a two-dimensionally adjustable rectangular slit, then the opening S1 of slit one and the opening S2 of slit two also refer to the slit widths of both when they are square.

[0035] Based on the preliminary equipment architecture, the first spacing d1 and the third spacing d3 are determined. The slit opening S1 and the slit opening S2 are tentatively determined within a suitable range. The suitable range can be determined based on existing conventional designs. For example, the slit openings S1 and Slit Opening S2 obtained through existing technology using divergence angle optimization design, or the actual values ​​applied on existing equipment. The purpose is to provide a basis for optimizing step S2.

[0036] SS2, Design the slit spacing.

[0037] The effect of the slit spacing d2 on the double-slit collimation system is nonlinear. Furthermore, as mentioned earlier, the influence of the double-slit collimation system on the X-ray flux and divergence angle often contradicts our optimization objectives. Therefore, determining a reasonable slit spacing value based on the flux intensity and divergence angle is crucial for slit spacing design.

[0038] SS21, Curve Fitting Experiment Results. To achieve this, multiple sets of corresponding divergence angle (div) values ​​and the percentage of light source intensity (per) at the sample (characterizing the magnitude of luminous flux) can be obtained by changing the slit spacing d2. Appropriate curves are then used to fit these curves, yielding the slit spacing d2-div curve and the slit spacing d2-light source intensity percentage curve. Nonlinear fitting is generally used depending on the actual image conditions.

[0039] SS22. Nonlinear fitting yields the slit spacing-divergence angle curve and the slit spacing-light source intensity ratio curve. Based on the principle that the greater the light intensity and the smaller the divergence angle, a parameter value range with a compromise in the curve slope is selected, and the slit spacing is determined within this range. Specifically, two different ranges of slit spacing are obtained by taking lines with appropriate slopes to intercept the corresponding curves. The overlapping part of the two different ranges is determined as the design range of the slit spacing, and the slit spacing is determined within this design range. Lines with appropriate slopes are used to intercept the corresponding curves in the slit spacing d2-divergence angle div curve and the slit spacing d2-light source intensity ratio per curve, and these lines are defined as the first and second slope intercepts, respectively.

[0040] For the first oblique line, the divergence angle range [div1, div2] and the corresponding slit spacing range [d21, d22] are obtained by intercepting the slit spacing d2-div angle div curve. For the second oblique line, the range of light source intensity ratio [per1, per2] and the corresponding slit spacing range [d23, d24] are obtained by intercepting the slit spacing d2-light source intensity ratio per curve.

[0041] Translate the first and second oblique sections so that there is an overlap between [d21, d22] and [d23, d24] (at least one endpoint overlaps). Define the overlap range between [d21, d22] and [d23, d24] as the target slit spacing range [d2min, d2max], and use this target slit spacing range as the selection range for the preliminary design slit spacing. Simultaneously, the range of divergence angle and light source intensity ratio within the preliminary design range can be determined, that is, the performance range of the collimation system under this design can be determined. The values ​​within this range can be used as the design values ​​for the slit spacing.

[0042] The following are some operational details regarding the above steps. The first is determining the slopes of the first and second oblique sections, and the second is determining the translation scheme.

[0043] The slopes of the first and second oblique sections can be determined according to the needs of the application scenario. X-ray application system designs typically provide required divergence angle and luminous flux ranges, usually specified as upper and lower limits in general design specifications. Therefore, at least one target divergence angle value, divA, can be selected within the divergence angle range. The point (d2A, divA) corresponding to the target divergence angle value divA is determined on the slit spacing d2-divergence angle div curve. The slope of the tangent at this target point can be used as the slope of the first oblique section. The slope of the second oblique section can be determined using a similar method: a reasonable value representing a percentage of the light source intensity is determined, corresponding to the target point (d2B, perB) of the target light source intensity value. The slope of the tangent at this target point can be used as the slope of the second oblique section. Correspondingly, the translation can be performed from the aforementioned target point using equal slit spacing. In the slit spacing d2-div angle div curve, the first oblique line originates from the point (d2A,divA), and its translational velocity is specified by Δd2, which is its velocity on the axis containing the slit spacing d2. Similarly, in the slit spacing d2-light source intensity percentage per curve, the second oblique line originates from the point (d2B,perB), and its translational velocity is specified by Δd2, which is its velocity on the axis containing the slit spacing d2.

[0044] SS3, Design the slit opening.

[0045] A slit spacing is selected from the aforementioned target slit spacing range [d2min, d2max]. The slit opening is tentatively set to be approximately equal to the slit opening 1. Multiple sets of divergence angle (div) and light source intensity ratio (per) curves are obtained through experiments or simulations for different values ​​of the slit opening 2 (S2). When there is an overlap between the range of the slit opening 2 (S2) corresponding to the required divergence angle range and the range of the slit opening 2 (S2) corresponding to the luminous flux range, the overlapping portion is used as the design range for slit S2. When the two ranges do not overlap, values ​​near adjacent endpoints are taken. Furthermore, the endpoint values ​​with better linearity at adjacent endpoints can be considered.

[0046] The width of S1 is generally slightly larger than that of S2. The deviation between the two is generally no more than 0.005cm.

[0047] SS4, Slit Spacing Verification.

[0048] Since SS2 and SS3 consider the slit spacing d2 and the second slit opening sequentially, they essentially simplify the effects of these two factors on X-ray emission to be independent, which may differ from reality. To ensure the final design is optimized as much as possible, step S2 can be repeated to perform a second verification on the result after determining the width of the second slit in S3. If, at this point, changing the slit spacing d2 still yields the expected divergence angle div and the light source intensity ratio per, and the expected divergence angle div and the light source intensity ratio per can be within the range determined in S2, then the design values ​​of S2 and S3 can be retained. Otherwise, step S2 can be repeated.

[0049] The following is a specific implementation process.

[0050] SS1. Preliminary determination of peripheral parameters. Based on the equipment architecture, the first spacing is determined to be 10cm and the third spacing to be 10cm. The initial setting is that the slit opening S1 is slightly larger than the slit opening S2, with a deviation of approximately 0-0.003cm. In this embodiment, the deviation of slit opening S1 being larger than slit opening S2 is taken as 0.003cm. Based on this, S2 is set to 0.005cm.

[0051] SS2. Design the slit spacing. Using the parameters initially determined in step S1, conduct multiple experiments by changing the value of d2. This experiment is based on Monte Carlo optical tracing simulation. The experimental light source is as follows: Figure 3 As shown, it is a Gaussian light source with a divergence angle that also exhibits a Gaussian distribution. Its full width at half maximum (FWHM) parameters are 46 μm and 1.12 mrad, respectively.

[0052] Multiple sets of data were obtained through various experiments, including slit spacing d2 - divergence angle div and slit spacing d2 - light source intensity percentage per. Figure 4As shown, the fitted curve can be obtained by fitting the above data using a polynomial curve. The left figure shows the slit spacing d² - divergence angle div curve, and the right figure shows the slit spacing d² - light source intensity percentage per curve. Combining the scene and empirical data (typically, target values ​​under existing schemes can also be selected), a preliminary optimal divergence angle value and light source intensity percentage value can be determined.

[0053] In this implementation, a polynomial function is used to fit the obtained data. The data distribution shows that the exponent is less than 1. Ignoring higher-order terms and retaining only one term, the resulting fitting model is y = a*x^b, where b is less than 0. This model is applicable to both sets of data. The fitting formula between the slit spacing d² and the divergence angle div is div = a⁴·d². b4 The fitting formula between the slit spacing d2 and the light source intensity ratio per curve is per=a3·d2 b3 The calculated values ​​are: a3 = 16.749; b3 = -1.684; a4 = 6131.4; b4 = -0.895.

[0054] To determine the slit spacing range of the target based on the data and the fitted curve, the following operations are performed on both sets of curves.

[0055] In the slit spacing d2-divergence angle div curve in the left figure, an initial value of 200 urad for the divergence angle is taken, and a point is determined at approximately (45, 200). The tangent line drawn at this point yields a tangent line with a slope of k1, which serves as the starting point of the first oblique intercept. Similarly, in the slit spacing d2-light source intensity percentage per curve in the right figure, an initial value of 0.015 for the light source intensity percentage is taken, and a point is determined at approximately (60, 0.017). The tangent line drawn at this point yields a tangent line with a slope of k2, which serves as the starting point of the second oblique intercept.

[0056] The first and second oblique lines are translated along the slit spacing d2 axis at the same speed or by the same distance, so that the first oblique line intersects the slit spacing d2-divergence angle curve (div) and the second oblique line intersects the slit spacing d2-light source intensity percentage (per) curve (per). In each image, the two intersection points define two intervals for the slit spacing: [20, 80] and [40, 120]. The common interval between these two intervals can be used as the design range for the slit spacing, i.e., [40, 80].

[0057] SS3, Design the slit opening.

[0058] Based on the above design range, d2 = 80cm can be used to further determine the width S2 of slit two. The opening of slit one is kept equal to that of slit two. Through experiments or simulations, multiple sets of divergence angle div and light source intensity ratio per data are obtained for different values ​​of the slit two opening S2. The fitted results are as follows... Figure 5 As shown, the fitted curves are per=a1·S2^2+b1·S2+A1 and div=a2·S2+A2, respectively. The calculated coefficients are a1=50.88; b1=0.019; A1=0.00007; a2=7081.3; A2=1.9177. Evaluation functions MTF1=(a1*S2^2+b1*S2+A1)·(a3*d2^b3) and MTF2=(a2*S2+A2)(a4*d2^b4) are used to evaluate the relationship between light intensity, divergence angle, and slit opening s2. For ease of comparison, both evaluation functions are normalized simultaneously, and the results are shown below. Figure 6 The intersection point S2 = 0.013cm in the diagram is the balance point between divergence angle and light intensity. As S2 increases, MTF1 (light intensity) dominates; as S2 decreases, MTF1 (divergence angle) dominates. This method can still be used to handle different slit spacings. Therefore, the reasonable range for S2 is determined to be around S2 = 0.013cm, and this application uses the range [0.012, 0.016]. Furthermore, when there is an overlap between the range of slit opening S2 corresponding to the required divergence angle range and the range of slit opening S2 corresponding to the light flux range, the overlapping portion is used as the design range for slit S2.

[0059] Based on experience, the width of S1 is generally taken to be slightly larger than S2 within a suitable error range. To confirm this, further verification was conducted. The effect of d2 = 50cm on the slit opening was confirmed, and the following results were obtained. Figure 7 The data shows that within the design range, the change in the slit opening S1 has a very limited impact on the final effect. Therefore, it is feasible to simply set the slit opening S1 and the slit opening S2 to be basically equal or slightly larger.

[0060] The above embodiments of this application also provide a specific design for a dual-slit collimation system, wherein the distance from slit one to the light source is 10 cm, and the distance between the two slits ranges from [40, 80] in centimeters. The opening S2 of slit two ranges from [0.012, 0.016] in millimeters. Optionally, the opening of slit one is equal to the opening of slit two. The distance from slit two to the sample is 10 cm, but it should be noted that this distance does not affect the design of the collimation system and can therefore be ignored during design.

[0061] Figure 8To optimize the X-ray imaging performance at the sample before and after optimization, the left image shows the sample image under the initial state before optimization, and the right image shows the image result after optimization. The parameters before optimization were S1 = 0.007 cm, S2 = 0.005 cm, d2 = 80 cm, and the parameters after optimization were S1 = 0.014 cm, S2 = 0.012 cm, d2 = 80 cm. It can be seen that the light intensity at the sample is nearly doubled, and the pixel width of the diffraction ring is reduced, indicating a decrease in the divergence angle of the emitted light. This demonstrates that the above optimization method can achieve a better balance between light flux and divergence angle in existing slit collimation systems, thus improving image quality.

[0062]

[0063] The above description is merely a preferred embodiment of the present invention and is not intended to limit the scope of the present invention. Various modifications and improvements made by those skilled in the art to the technical solutions of the present invention without departing from the spirit of the present invention should fall within the protection scope defined by the claims of the present invention.

Claims

1. A design method for a dual-slit collimation system that optimizes divergence and luminous flux, characterized in that, Includes the following steps: SS1. Preliminary determination of peripheral parameters; determination of the distance between slit one and the light source in the double-slit collimation system, and preliminary determination of the opening of slit one and slit two; SS2, Design the slit spacing; By changing the slit spacing, the divergence angle value and the proportion of light source intensity at the sample corresponding to different spacings are obtained. Nonlinear fitting yields the slit spacing-divergence angle curve and the slit spacing-light source intensity proportion curve. Based on the principle that the greater the light intensity and the smaller the divergence angle, a parameter value range with a compromise in the curve slope is selected, and the slit spacing is determined within this range. Straight lines with appropriate slopes are taken to intercept the corresponding curves to obtain two different ranges of slit spacing. The overlapping part of the two different ranges is determined as the design range of slit spacing, and the slit spacing is determined within this design range. The fitting model used in the nonlinear fitting to obtain the slit spacing-divergence angle curve and the slit spacing-light source intensity proportion curve is y=a*x^b, where a and b are coefficients, and b is less than 0. SS3, Design the slit opening; Given the slit spacing, and tentatively setting the slit opening one to be slightly greater than or equal to the slit opening two; By changing the slit opening, the corresponding divergence angle curve and light source intensity ratio curve are obtained under different opening values. Based on the corresponding divergence angle curve and light source intensity ratio curve under different width values, the design range of the slit opening is determined, and the slit opening is determined within this design range. In the SS3 slit opening design step, the process of determining the design range of the slit second opening based on the corresponding divergence angle curve and the light source intensity ratio curve under different width values ​​is as follows: when there is an overlap between the range of the slit second opening corresponding to the required divergence angle range and the range of the slit second opening corresponding to the luminous flux range, the overlapping part is taken as the design range when designing the slit.

2. The design method for a dual-slit collimation system with optimized divergence and luminous flux as described in claim 1, characterized in that, In the S2 design slit spacing step, the process of obtaining two different intervals of slit spacing by taking straight lines with appropriate slopes and intercepting the corresponding curves is as follows: The straight line corresponding to the divergence angle curve under different spacing values ​​is the first oblique intercept; within the divergence angle range, a divergence angle target value divA is taken, and the point (d2A, divA) corresponding to the divergence angle target value divA is determined in the divergence angle curve. The slope of the tangent at this target point is taken as the slope of the first oblique intercept. The first oblique intercept is translated to obtain two intersection points with the divergence angle curve. The range between the intersection points is the first interval of the slit spacing. The straight line of the corresponding light source intensity ratio curve under different spacing values ​​is the second oblique line; within the divergence angle range, a target value of light source intensity ratio perA is taken, and the point (d2B, perB) corresponding to the target value of light source intensity ratio perB is determined in the light source intensity ratio curve. The slope of the tangent at this target point is taken as the slope of the second oblique line. The second oblique line is translated to obtain two intersection points with the divergence angle curve. The range between the intersection points is the second interval of the slit spacing. The overlapping portion of the first interval and the second interval is taken as the design interval for the slit spacing.

3. The design method for a dual-slit collimation system with optimized divergence and luminous flux as described in claim 2, characterized in that, The translation starting point of the first oblique line passes through point (d2A, divA), and the translation starting point of the second oblique line passes through point (d2B, perB); the first oblique line and the second oblique line are translated by the same distance along the axis containing the slit spacing.

4. The design method for a dual-slit collimation system with optimized divergence and luminous flux as described in claim 1, characterized in that, It also includes the SS4 slit spacing verification step, which is located after the SS3 slit opening design step; SS4, Slit Spacing Verification: Repeat the SS2 slit spacing design step and perform a second verification on the result after determining the slit opening in the SS3 slit opening design step. If the expected divergence angle and light source intensity ratio can still be obtained by changing the slit spacing d2, retain the design result; otherwise, repeat the SS2 slit spacing design step and the SS3 slit opening design step based on the existing results.

5. A dual-slit collimation system employing the design method of any one of claims 1-4, comprising a first slit and a second slit arranged along the optical path, characterized in that, The distance between the first slit and the light source is 10cm, the distance between the first slit and the second slit is 40cm-80cm, and the width of the second slit is 0.012cm-0.016cm.

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