一种蒸镀方法、FMM Sheet的制作方法及掩膜版
By adjusting the thickness of the dividing area and the design of the double-sided thinning area of the FMM Sheet, the problem of uneven thickness and size of the vapor-deposited film was solved, and the quality of high-end products was improved.
CN118028744BActive Publication Date: 2026-07-17CHENGDU TOPWAY HIGH-TECH PHOTOELECTRIC TECH CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- CHENGDU TOPWAY HIGH-TECH PHOTOELECTRIC TECH CO LTD
- Filing Date
- 2024-02-21
- Publication Date
- 2026-07-17
AI Technical Summary
Technical Problem
The existing FMM sheet causes uneven thickness and size of the vapor-deposited film during the vapor deposition process, which cannot meet the requirements of high-end customers.
Method used
By adjusting the thickness of the separator area of the FMM Sheet and adopting a double-sided thinning area design, the influence of thermal stress is eliminated, and a uniform vapor-deposited film is formed.
Benefits of technology
It achieves uniformity in the thickness and size of the vapor-deposited film on the substrate after vapor deposition, improving product quality and performance, and is suitable for high-end customers.
✦ Generated by Eureka AI based on patent content.
Smart Images
Figure CN118028744B_ABST
Abstract
本申请公开了一种蒸镀方法、FMM Sheet的制作方法及掩膜版，该蒸镀方法在蒸镀时抵消或补偿蒸镀系统内热应力。本发明蒸镀后，基板上形成厚度及大小均基本均匀的沉积蒸镀膜，从而提高了产品的质量性能，生产出的产品可供高端客户使用。
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