Wafer fixing device for chamfering small-size rectangular gallium oxide substrate
CN118046315BActive Publication Date: 2026-08-28BEIJING MING GALLIUM SEMICON CO LTD
Patent Information
- Application Number
- CN202410359981.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-03-27
- Publication Date
- 2026-08-28
- Estimated Expiration
- 2044-03-27
AI Technical Summary
Technical Problem
[0006]为了改善氧化镓衬底受力不均匀的问题，本申请提供一种研磨小尺寸矩形氧化镓衬底倒角用晶片固定装置
Benefits of technology
1、在磁力座与磁力盖的吸力作用下，磁力盖将衬底抵紧于磁力座上，衬底双侧受力，受力均匀，固定稳固，提升了加工质量。
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Smart Images
Figure CN118046315B_ABST
Abstract
The application relates to a wafer fixing device for chamfering small-size rectangular gallium oxide substrates, belonging to the field of semiconductor processing, and comprising a magnetic base arranged on a rack and a magnetic cover, wherein the magnetic cover is located above the magnetic base, the magnetic base and the magnetic cover are attracted to each other, the magnetic base is used for bearing the substrate, and the magnetic cover is used for pressing the substrate on the magnetic base. When the application is used, the magnetic cover tightly abuts the substrate on the magnetic base under the action of the suction force of the magnetic base and the magnetic cover, the substrate is subjected to force on both sides, the force is uniform, the fixing is stable, and the processing quality is improved.
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Citation Information
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