A high-scandium aluminum-scandium alloy target and its preparation method

Abstract

This invention relates to the technical field of aluminum alloy target material processing and preparation, and particularly to a high-scandium aluminum-scandium alloy target material and its preparation method. The preparation method of the high-scandium aluminum-scandium alloy target material comprises the following steps: weighing 5-50% scandium metal and 50-95% aluminum metal by mass percentage; the purity of the scandium metal is greater than 99.99%, and the purity of the aluminum metal is greater than 99.99%; placing a portion of the aluminum metal on the scandium metal for melting, then adding the remaining aluminum metal for melting to obtain an aluminum-scandium alloy; casting the aluminum-scandium alloy into a mold to obtain an aluminum-scandium alloy target blank; annealing the aluminum-scandium alloy target blank in a vacuum annealing furnace to obtain a high-scandium aluminum-scandium alloy target material. This application, through improvements to the preparation process, prepares a high-scandium aluminum-scandium alloy target material with low oxygen content, uniform distribution of aluminum-scandium alloy elemental composition, no cracking, and homogenization.

Description

Technical Field

[0001] This invention relates to the technical field of aluminum alloy target material processing and preparation, and in particular to a high scandium aluminum scandium alloy target material and its preparation method. Background Technology

[0002] Cast aluminum alloys are traditional metallic materials, widely used in aerospace, automotive, and machinery industries due to their low density and high specific strength. Sc, as a microalloying element, can significantly improve the microstructure and properties of aluminum alloys by adding trace amounts of Sc.

[0003] Due to its unique properties, scandium (Sc) is the most effective alloying element for aluminum alloys discovered to date. Its alloying effect on aluminum alloys is very significant. Adding just a few parts per thousand of scandium can have a strong modifying effect on aluminum alloys, causing significant changes in the structure and properties of the alloy. Therefore, the development and utilization of scandium has progressed rapidly in the past 20 years. Adding scandium to aluminum or aluminum-based alloys gives them superior comprehensive physical and chemical properties such as high strength, high toughness, superplasticity, heat resistance, stability, corrosion resistance, weldability, and resistance to neutron radiation.

[0004] In related technologies, most aluminum-scandium alloy targets are disc-shaped and require processing to form. However, due to the high oxygen content, poor toughness, and uneven distribution of aluminum-scandium alloy elements, direct rolling is prone to cracking, which increases the loss rate of subsequent processing of the target. Furthermore, the high price of scandium leads to increased costs.

[0005] Therefore, how to effectively solve the problem of easy cracking during direct rolling of aluminum-scandium alloy targets, and to prepare high-scandium aluminum-scandium alloy targets with low oxygen content, uniform distribution of aluminum-scandium alloy elements, no cracking, and homogeneity, has become an urgent problem to be solved. Summary of the Invention

[0006] To address the shortcomings of existing technologies, this application provides a high-scandium aluminum-scandium alloy target and its preparation method.

[0007] In a first aspect, this application provides a method for preparing a high-scandium aluminum-scandium alloy target, which adopts the following technical solution: A method for preparing a high-scandium aluminum-scandium alloy target, comprising the following steps: Weigh out 5-50% scandium metal and 50-95% aluminum metal by mass; the purity of scandium metal is greater than 99.99%, and the purity of aluminum metal is greater than 99.99%. A portion of metallic aluminum is placed on metallic scandium and melted, then the remaining portion of metallic aluminum is added and melted again to obtain an aluminum-scandium alloy; the aluminum-scandium alloy is then cast into a mold to obtain an aluminum-scandium alloy target blank. The aluminum-scandium alloy target blank was annealed in a vacuum annealing furnace to obtain a high-scandium aluminum-scandium alloy target material.

[0008] Preferably, the smelting steps are as follows: 1 / 3 to 2 / 3 of the metallic aluminum is placed on metallic scandium for smelting, and then the remaining metallic aluminum is added for smelting to obtain an aluminum-scandium alloy.

[0009] Preferably, the smelting reaction conditions are as follows: the smelting is carried out in a suspension furnace under a vacuum of 1 Pa and an inert gas protection.

[0010] By adopting the above technical solution, since scandium and aluminum have different melting points, aluminum melts first than scandium. The molten aluminum completely covers the surface of scandium. Then, the remaining aluminum is added to continue melting. The molten aluminum and scandium are fully mixed to obtain a binary alloy. In addition, adding aluminum separately can prevent a small amount of aluminum from floating on scandium and not melting completely.

[0011] Since scandium and aluminum are difficult to mix evenly, this application improves the smelting method by adding aluminum separately and ensuring that scandium and aluminum are fully mixed, thereby effectively improving the mixing efficiency.

[0012] Preferably, the aluminum-scandium alloy target blank is heat-treated before annealing, and the steps are as follows: (1) Inert gas is introduced and silicon carbide is sprayed onto the surface of the aluminum-scandium alloy target blank at 450-520℃; (2) Continue to introduce inert gas and heat to 520-580℃, spray boron nitride onto the surface of the aluminum scandium alloy target blank to obtain the heat-treated aluminum scandium alloy target blank.

[0013] By adopting the above technical solution, this application improves the heat treatment process by spraying silicon carbide onto the surface of the aluminum-scandium alloy target blank before annealing. Silicon carbide has advantages such as high-temperature oxidation resistance, good thermal conductivity, and small coefficient of expansion, while also possessing certain strength and toughness. Spraying silicon carbide onto the surface of the aluminum-scandium alloy target blank allows it to adhere to the surface and form a smooth protective layer, thereby improving the toughness of the aluminum-scandium alloy target material. This effectively solves the problem of cracking during the forming process of the aluminum-scandium alloy target material and improves its performance.

[0014] This application improves the heat treatment process by spraying silicon carbide onto the surface of the aluminum-scandium alloy target blank before annealing. Boron nitride has toughness, lubricity, and wear resistance. The added boron nitride adheres to the surface of the aluminum-scandium alloy target blank and forms a wear-resistant layer on the alloy surface, which solves the problem of cracking of aluminum-scandium alloy target material during the forming process, significantly improves the utilization rate of the target blank, saves material costs, and improves production efficiency.

[0015] In this application, during heat treatment, the reaction temperature is controlled. First, the temperature is adjusted to 450-520℃ to refine the grains of the aluminum-scandium alloy target, homogenizing the microstructure and eliminating internal stress. This allows silicon carbide to be sprayed more evenly onto the surface of the aluminum-scandium alloy target blank. After spraying, the temperature is raised to 520-580℃. This temperature increase reduces the internal stress generated in the aluminum-scandium alloy target blank during spraying, homogenizing the microstructure and allowing boron nitride to be sprayed more evenly onto the surface of the aluminum-scandium alloy target blank. By controlling the reaction temperature and homogenizing the aluminum-scandium alloy target blank, this application improves the performance of the aluminum-scandium alloy target blank and effectively solves the problem of cracking during the forming process of the aluminum-scandium alloy target.

[0016] Preferably, the inert gases introduced in steps (1) and (2) are nitrogen and argon, and the ratio of nitrogen to argon is (12-17):(2-4); more preferably, the ratio of nitrogen to argon is 15:3.

[0017] Preferably, the spraying speed in step (1) is 1-5 g / min; the spraying time is 20-40 minutes.

[0018] Preferably, the spraying speed in step (2) is 1-5 g / min; the spraying time is 30-50 minutes.

[0019] By adopting the above technical solution, since aluminum and scandium are relatively easy to oxidize, the aluminum-scandium alloy target needs to be reacted in an inert gas during the preparation process to avoid oxidation of aluminum and scandium. The introduced nitrogen and argon gases are used to collide with aluminum and scandium atoms to achieve energy exchange, thereby allowing silicon carbide and boron nitride to be sprayed onto the surface of the aluminum-scandium alloy target blank.

[0020] The ratio of inert gas nitrogen to argon plays a crucial role in the heat treatment reaction. The amount of nitrogen and argon added cannot be too much or too little. If the reaction amount is too low, the silicon carbide and boron nitride will not be sprayed completely. If it is too high, nitrogen will be deposited on the surface of the aluminum-scandium alloy target, making it impossible to obtain a uniform high-scandium aluminum-scandium alloy target, which makes the prepared high-scandium aluminum-scandium alloy target prone to cracking.

[0021] Secondly, this application provides a high-scandium aluminum-scandium alloy target material, which adopts the following technical solution: A high scandium aluminum scandium alloy target material is prepared by the above method.

[0022] Preferably, the scandium content of the high scandium aluminum scandium alloy target is 5-50%.

[0023] In summary, this application includes at least one of the following beneficial technical effects: This application discloses a high scandium aluminum scandium alloy target and its preparation method. By improving the preparation process, a high scandium aluminum scandium alloy target with low oxygen content, uniform distribution of aluminum scandium alloy elements, no cracking, and homogenization is obtained, which significantly improves the utilization rate of the high scandium aluminum scandium alloy target, saves material costs and improves production efficiency. Detailed Implementation

[0024] The technical solution of the present invention is further illustrated below through specific embodiments. These specific embodiments do not represent a limitation on the scope of protection of the present invention. Some non-essential modifications and adjustments made by others based on the concept of the present invention still fall within the scope of protection of the present invention.

[0025] All raw materials used in this application are commercially available products. Hexagonal boron nitride powder, produced by Shanghai Naio Nanotechnology Co., Ltd., has a purity of ≥99.9% and a particle size of 0.8-1μm.

[0026] Silicon carbide, purity > 99.9%, size Φ50×3mm, Beijing Gaodewei Metal Technology Development Co., Ltd.

[0027] The present application will be further described in detail below with reference to embodiments and comparative examples.

[0028] Example 1: A method for preparing a high-scandium aluminum-scandium alloy target, comprising the following steps: (1) Weigh out 20% scandium metal and 80% aluminum metal by mass; the purity of scandium metal is greater than 99.99% and the purity of aluminum metal is greater than 99.99%; (2) First, place 2 / 3 of the aluminum metal on the scandium metal and melt it in a levitation furnace under 1Pa vacuum and inert gas protection. After the aluminum metal melts, add the remaining 1 / 3 of the aluminum metal. Vacuum magnetic levitation melting is carried out at a heating rate of 4℃ / min to 1600℃ and held for 0.5h. Repeat this process 8 times to obtain aluminum-scandium alloy. (3) Cast the aluminum-scandium alloy into a mold to obtain an aluminum-scandium alloy target blank; (4) The aluminum scandium alloy target billet is subjected to heat treatment, and the steps are as follows: (a) Inert gas is introduced and silicon carbide is sprayed onto the surface of the aluminum-scandium alloy target blank at 480°C; (b) Continue to introduce inert gas, raise the temperature to 550°C, and spray boron nitride onto the surface of the aluminum scandium alloy target blank to obtain the heat-treated aluminum scandium alloy target blank. Specifically, the inert gases introduced are nitrogen and argon; the nitrogen flow rate is 15 sccm and the argon flow rate is 3 sccm.

[0029] In step (a), the spraying speed is 3g / min; the spraying time is 30 minutes; and the spraying power is 300W.

[0030] In step (b), the spraying speed is 4 g / min; the spraying time is 40 minutes; and the spraying power is 300 W.

[0031] (5) Anneal the aluminum-scandium alloy target blank in a vacuum annealing furnace, evacuate and purge with argon, and hold at 400°C for 30 min to obtain a high-scandium aluminum-scandium alloy target.

[0032] Example 2: A method for preparing a high-scandium aluminum-scandium alloy target, comprising the following steps: (1) Weigh out 20% scandium metal and 80% aluminum metal by mass; the purity of scandium metal is greater than 99.99% and the purity of aluminum metal is greater than 99.99%; (2) First, place 2 / 3 of the aluminum metal on the scandium metal and melt it in a levitation furnace under 1Pa vacuum and inert gas protection. After the aluminum metal melts, add the remaining 1 / 3 of the aluminum metal. Vacuum magnetic levitation melting is carried out at a heating rate of 4℃ / min to 1600℃ and held for 0.5h. Repeat this process 8 times to obtain aluminum-scandium alloy. (3) Cast the aluminum-scandium alloy into a mold to obtain an aluminum-scandium alloy target blank; (4) The aluminum scandium alloy target billet is subjected to heat treatment, and the steps are as follows: (a) Inert gas is introduced and silicon carbide is sprayed onto the surface of the aluminum-scandium alloy target blank at 450°C; (b) Continue to introduce inert gas, raise the temperature to 520°C, and spray boron nitride onto the surface of the aluminum scandium alloy target blank to obtain the heat-treated aluminum scandium alloy target blank. Specifically, the inert gases introduced are nitrogen and argon; the nitrogen flow rate is 15 sccm and the argon flow rate is 3 sccm.

[0033] In step (a), the spraying speed is 1 g / min; the spraying time is 20 minutes; and the spraying power is 300 W.

[0034] In step (b), the spraying speed is 1 g / min; the spraying time is 30 minutes; and the spraying power is 300 W.

[0035] (5) Anneal the aluminum-scandium alloy target blank in a vacuum annealing furnace, evacuate and purge with argon, and hold at 400°C for 30 min to obtain a high-scandium aluminum-scandium alloy target.

[0036] Example 3: A method for preparing a high-scandium aluminum-scandium alloy target, comprising the following steps: (1) Weigh out 20% scandium metal and 80% aluminum metal by mass; the purity of scandium metal is greater than 99.99% and the purity of aluminum metal is greater than 99.99%; (2) First, place 2 / 3 of the aluminum metal on the scandium metal and melt it in a levitation furnace under 1Pa vacuum and inert gas protection. After the aluminum metal melts, add the remaining 1 / 3 of the aluminum metal. Vacuum magnetic levitation melting is carried out at a heating rate of 4℃ / min to 1600℃ and held for 0.5h. Repeat this process 8 times to obtain aluminum-scandium alloy. (3) Cast the aluminum-scandium alloy into a mold to obtain an aluminum-scandium alloy target blank; (4) The aluminum scandium alloy target billet is subjected to heat treatment, and the steps are as follows: (a) Inert gas is introduced and silicon carbide is sprayed onto the surface of the aluminum-scandium alloy target blank at 520°C; (b) Continue to introduce inert gas, raise the temperature to 580°C, and spray boron nitride onto the surface of the aluminum scandium alloy target blank to obtain the heat-treated aluminum scandium alloy target blank. Specifically, the inert gases introduced are nitrogen and argon; the nitrogen flow rate is 15 sccm and the argon flow rate is 3 sccm.

[0037] In step (a), the spraying speed is 5 g / min; the spraying time is 40 minutes; and the spraying power is 300 W.

[0038] In step (b), the spraying speed is 5 g / min; the spraying time is 50 minutes; and the spraying power is 300 W.

[0039] (5) Anneal the aluminum-scandium alloy target blank in a vacuum annealing furnace, evacuate and purge with argon, and hold at 400°C for 30 min to obtain a high-scandium aluminum-scandium alloy target.

[0040] Example 4: The difference from Example 1 is that the flow rate of the inert gas is different; the flow rate of nitrogen is 12 sccm and the flow rate of argon is 3 sccm.

[0041] Example 5: The difference from Example 1 is that the flow rate of the inert gas is different; the flow rate of nitrogen is 17 sccm and the flow rate of argon is 3 sccm.

[0042] Example 6: The difference from Example 1 is that the flow rate of the inert gas is different; the flow rate of nitrogen is 15 sccm and the flow rate of argon is 2 sccm.

[0043] Example 7: The difference from Example 1 is that the flow rate of the inert gas is different; the flow rate of nitrogen is 15 sccm and the flow rate of argon is 4 sccm.

[0044] Example 8: The difference from Example 1 lies in the heat treatment process of the aluminum-scandium alloy target blank, the specific steps of which are as follows: (1) Inert gas is introduced and silicon carbide is sprayed onto the surface of the aluminum-scandium alloy target blank at 480°C; (2) Continue to introduce inert gas, raise the temperature to 520°C, and spray boron nitride onto the surface of the aluminum scandium alloy target blank to obtain the heat-treated aluminum scandium alloy target blank.

[0045] Example 9: The difference from Example 1 lies in the heat treatment process of the aluminum-scandium alloy target blank, the specific steps of which are as follows: (1) Inert gas is introduced and silicon carbide is sprayed onto the surface of the aluminum-scandium alloy target blank at 480°C; (2) Continue to introduce inert gas, raise the temperature to 580°C, and spray boron nitride onto the surface of the aluminum scandium alloy target blank to obtain the heat-treated aluminum scandium alloy target blank.

[0046] Example 10: The difference from Example 1 lies in the heat treatment process of the aluminum-scandium alloy target blank, the specific steps of which are as follows: (1) Inert gas is introduced and silicon carbide is sprayed onto the surface of the aluminum-scandium alloy target blank at 450°C; (2) Continue to introduce inert gas, raise the temperature to 550°C, and spray boron nitride onto the surface of the aluminum scandium alloy target blank to obtain the heat-treated aluminum scandium alloy target blank.

[0047] Example 11: The difference from Example 1 lies in the heat treatment process of the aluminum-scandium alloy target blank, the specific steps of which are as follows: (1) Inert gas is introduced and silicon carbide is sprayed onto the surface of the aluminum-scandium alloy target blank at 520°C; (2) Continue to introduce inert gas, raise the temperature to 550°C, and spray boron nitride onto the surface of the aluminum scandium alloy target blank to obtain the heat-treated aluminum scandium alloy target blank.

[0048] Example 12: The difference from Example 1 is that the smelting steps are different.

[0049] The smelting process is as follows: 1 / 3 of the aluminum is placed on scandium and smelted, then the remaining 2 / 3 of the aluminum is added and smelted again to obtain an aluminum-scandium alloy.

[0050] Comparative Example 1: The difference from Example 1 is that the aluminum scandium alloy target billet is not heat-treated before annealing.

[0051] Comparative Example 2: The difference from Example 1 is that aluminum is placed directly on scandium for melting.

[0052] Comparative Example 3: The difference from Example 1 is that silicon carbide is not sprayed onto the surface of the aluminum-scandium alloy target blank.

[0053] Comparative Example 4: The difference from Example 1 is that boron nitride is not sprayed onto the surface of the aluminum scandium alloy target blank.

[0054] Comparative Example 5: The difference from Example 1 is that the flow rate of the inert gas is different; the flow rate of nitrogen is 11 sccm and the flow rate of argon is 3 sccm.

[0055] Comparative Example 6: The difference from Example 1 is that the flow rate of the inert gas is different; the flow rate of nitrogen is 18 sccm and the flow rate of argon is 3 sccm.

[0056] Comparative Example 7: The difference from Example 1 is that the flow rate of the inert gas is different; the flow rate of nitrogen is 15 sccm and the flow rate of argon is 1 sccm.

[0057] Comparative Example 8: The difference from Example 1 is that the flow rate of the inert gas is different; the flow rate of nitrogen is 15 sccm and the flow rate of argon is 5 sccm.

[0058] Comparative Example 9: The difference from Example 1 is that the heat treatment process for the aluminum-scandium alloy target billet is different.

[0059] The heat treatment process involves the following steps: introducing an inert gas and spraying silicon carbide and boron nitride onto the surface of the aluminum-scandium alloy target blank at 480°C to obtain the heat-treated aluminum-scandium alloy target blank.

[0060] Comparative Example 10: The difference from Example 1 lies in the heat treatment process of the aluminum-scandium alloy target blank, the specific steps of which are as follows: (1) Inert gas is introduced and silicon carbide is sprayed onto the surface of the aluminum-scandium alloy target blank at 550°C; (2) Continue to introduce inert gas and spray boron nitride onto the surface of the aluminum scandium alloy target blank at 480°C to obtain the heat-treated aluminum scandium alloy target blank.

[0061] Comparative Example 11: The difference from Example 1 lies in the heat treatment process of the aluminum-scandium alloy target blank, the specific steps of which are as follows: (1) Inert gas is introduced and silicon carbide is sprayed onto the surface of the aluminum-scandium alloy target blank at 480°C; (2) Continue to introduce inert gas and spray boron nitride onto the surface of the aluminum scandium alloy target blank at 480°C to obtain the heat-treated aluminum scandium alloy target blank.

[0062] Performance testing: The properties of the high-scandium aluminum-scandium alloy targets prepared in Examples 1-12 and Comparative Examples 1-11 were tested, and the results are shown in Table 1: 1. Determination of oxygen content in high scandium aluminum scandium alloy targets: The determination method is mass spectrometry, and the oxygen and nitrogen content is measured using an oxygen and nitrogen content meter.

[0063] 2. The compositional uniformity of the high-scandium aluminum-scandium alloy target was determined: The determination method is as follows: samples are taken sequentially from different parts of the aluminum-scandium alloy, and the scandium content is determined using ICP-OES detection technology to obtain the overall fluctuation value of scandium.

[0064] The overall fluctuation value of scandium is the absolute value of the difference between the mass percentage of scandium in a known aluminum-scandium alloy and the measured value.

[0065] Table 1 Performance test results of high scandium aluminum scandium alloy sputtering material Referring to Table 1, Examples 1-12, and Comparative Examples 1-11, it can be seen that the oxygen content of the high scandium aluminum scandium alloy target prepared by the method of this application is 42-55 ppm, and the overall fluctuation value of scandium element is 0.4-1.8 at%. This indicates that the high scandium aluminum scandium alloy target prepared by the method of this application has low oxygen content, uniform distribution of aluminum scandium alloy element composition, no cracking, and is homogeneous.

[0066] As can be seen from Example 1 and Comparative Example 1, the oxygen content and overall fluctuation value of scandium in Example 1 are better than those in Comparative Example 1. This indicates that by performing heat treatment on the aluminum scandium alloy target blank before annealing, this application reduces the oxygen content and overall fluctuation value of scandium in the aluminum scandium alloy target material, effectively preventing cracking of the aluminum scandium alloy target material.

[0067] Based on Examples 1, 12, and Comparative Example 2, it can be seen that the oxygen content and overall fluctuation value of scandium in Examples 1 and 12 are better than those in Comparative Example 2. This indicates that by adding aluminum and scandium in batches in this application, aluminum and scandium are mixed uniformly to obtain a homogeneous high-scandium aluminum-scandium alloy target.

[0068] As can be seen from Examples 1, 3, and 4, the aluminum-scandium alloy targets prepared in Examples 3 and 4 have a high overall fluctuation value of scandium and obvious surface cracks. This indicates that by spraying silicon carbide and boron nitride onto the surface of the aluminum-scandium alloy target blank, the toughness of the aluminum-scandium alloy target is effectively improved, and cracking of the aluminum-scandium alloy target is effectively avoided.

[0069] Based on Examples 1, 4-7, and Comparative Examples 5-8, it can be seen that the oxygen content and overall fluctuation value of scandium in Examples 1 and 4-7 are better than those in Comparative Examples 5-8. This indicates that the added nitrogen and argon can effectively prevent oxidation of the aluminum-scandium alloy target during the preparation process. In addition, the amount of nitrogen and argon added should not be too much or too little. When the amount added is too low, the silicon carbide and boron nitride will not be sprayed in an incomplete manner. When the amount added is too high, nitrogen will be deposited on the surface of the aluminum-scandium alloy target, thus failing to obtain a uniform high-scandium aluminum-scandium alloy target. The prepared high-scandium aluminum-scandium alloy target is prone to cracking.

[0070] Based on Examples 1, 8-11, and Comparative Examples 9-11, it can be seen that the oxygen content and overall fluctuation value of scandium in Examples 1 and 8-11 are better than those in Comparative Examples 9-11. This indicates that by controlling the reaction temperature of heat treatment in this application, a homogeneous high-scandium aluminum-scandium alloy target material is prepared, which effectively improves the performance of the aluminum-scandium alloy target billet and effectively solves the problem of cracking of aluminum-scandium alloy target material during the forming process.

Claims

1. A method for preparing a high-scandium aluminum-scandium alloy target, characterized in that, The preparation method steps are as follows: Weigh out 5-50% scandium metal and 50-95% aluminum metal by mass; the purity of scandium metal is greater than 99.99%, and the purity of aluminum metal is greater than 99.99%. A portion of metallic aluminum is placed on metallic scandium and smelted, and then the remaining metallic aluminum is added and smelted again to obtain an aluminum-scandium alloy. The aluminum-scandium alloy is cast into a mold to obtain an aluminum-scandium alloy target blank; The aluminum-scandium alloy target billet was annealed in a vacuum annealing furnace to obtain a high-scandium aluminum-scandium alloy target material; Before annealing, the aluminum-scandium alloy target billet undergoes heat treatment, with the following steps: (1) Inert gas is introduced and silicon carbide is sprayed onto the surface of the aluminum-scandium alloy target blank at 450-520℃; (2) Continue to introduce inert gas, raise the temperature to 520-580℃, and spray boron nitride onto the surface of the aluminum scandium alloy target blank to obtain the heat-treated aluminum scandium alloy target blank. The inert gases are nitrogen and argon; The ratio of nitrogen to argon gas introduced is (12-17):(2-4). The spraying speed in step (1) is 1-5 g / min; the spraying time is 20-40 minutes. The spraying speed in step (2) is 1-5 g / min; the spraying time is 30-50 minutes.

2. The method for preparing a high-scandium aluminum-scandium alloy target according to claim 1, characterized in that, The smelting steps are as follows: 1 / 3 to 2 / 3 of the metallic aluminum is placed on metallic scandium for smelting, and then the remaining metallic aluminum is added for smelting to obtain an aluminum-scandium alloy.

3. The method for preparing a high-scandium aluminum-scandium alloy target according to claim 2, characterized in that, The smelting reaction conditions are as follows: the process is carried out in a suspension furnace under a 1 Pa vacuum and inert gas protection.

4. A high-scandium aluminum-scandium alloy target material, characterized in that, The high scandium aluminum scandium alloy target is prepared using any one of the methods in claims 1-3.

5. The aluminum-scandium alloy target material according to claim 4, characterized in that, The scandium content of the high scandium aluminum scandium alloy target is 5-50%.

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