Two-fluid centrifugal cleaning machine and method of cleaning thereof

Abstract

The application discloses a novel two-fluid centrifugal cleaning machine and a preparation method thereof, wherein the cleaning machine comprises a cleaning machine body, a centrifugal mechanism comprising a rotating part arranged on the upper surface of the cleaning machine body, a vacuum lifting platform comprising an adsorption part arranged in the central region of the rotating part of the centrifugal mechanism, and a first guide rail arranged on both sides of the rotating part of the centrifugal mechanism; a cleaning mechanism is driven by a motor to move above the rotating part of the centrifugal mechanism along the first guide rail, and the cleaning of the object to be cleaned is completed. The cleaning mechanism comprises a contact cleaning part which cleans the surface of the object to be cleaned by contact during movement along the first guide rail, a flushing part which cleans the surface of the object to be cleaned by flushing during movement along the first guide rail, and a drying part which dries the surface of the object to be cleaned by blowing during movement along the first guide rail. The cleaning machine can effectively solve the technical problem that the existing two-fluid centrifugal cleaning machine has limited cleaning effect on part of the objects to be cleaned.

Description

Technical Field

[0001] This invention relates to the field of semiconductor technology, and in particular to a two-fluid centrifugal cleaner and its cleaning method. Background Technology

[0002] In semiconductor manufacturing, after dicing wafers and individual LED chips, a two-fluid centrifugal cleaner is required to clean the dicing channels and the surfaces of the wafers and LEDs to remove dust. Currently, commonly used two-fluid centrifugal cleaners typically include: a vacuum stage for adsorbing the materials to be cleaned, a centrifugal mechanism for rotating the materials, water pipes for rinsing the surface of the materials, and air pipes for drying the surface. The vacuum stage is positioned at the center of the centrifugal mechanism, while the water and air pipes are located on the sides, completing the cleaning process through a non-contact method.

[0003] While the two-fluid centrifugal cleaner with the above-mentioned structure can effectively remove most dust and foreign matter, it is extremely easy for fine dust to adhere to the silicone surface of LED beads when the silicone is relatively soft. The two-fluid centrifugal cleaner with the above-mentioned structure cannot completely remove it, resulting in limited cleaning effect and seriously affecting the brightness of the LED beads. Summary of the Invention

[0004] The purpose of this invention is to provide a two-fluid centrifugal cleaning machine and its preparation method, which effectively solves the technical problem that existing two-fluid centrifugal cleaning machines have limited cleaning effect on some items to be cleaned.

[0005] The technical solution provided by this invention is as follows: A two-fluid centrifugal cleaning machine, comprising: The main body of the cleaning machine; A centrifugal mechanism for rotating the object to be cleaned includes a rotating part disposed on the upper surface of the cleaning machine body; A vacuum lifting platform for adsorbing objects to be cleaned includes an adsorption section disposed in the central region of the rotating part of the centrifugal mechanism. The first guide rail is disposed on both sides of the rotating part of the centrifugal mechanism; Driven by a motor, the cleaning mechanism moves along the first guide rail above the rotating part of the centrifugal mechanism to complete the cleaning of the object to be cleaned. The cleaning mechanism includes: The contact cleaning unit cleans the surface of the object to be cleaned by contact while moving along the first guide rail. The rinsing section cleans the surface of the object to be cleaned by rinsing while moving along the first guide rail. The drying section moves along the first guide rail and dries the surface of the object to be cleaned by blowing air.

[0006] More preferably, the surface of the contact cleaning section is provided with a contactable cleaning material, which cleans the surface of the object to be cleaned by rolling contact.

[0007] More preferably, the two-fluid centrifugal cleaner is further equipped with a cylinder connected to the contact cleaning part, which is used to control the height of the contact cleaning part in a direction perpendicular to the upper surface of the cleaner body.

[0008] More preferably, the two-fluid centrifugal cleaner is further equipped with: The feeding mechanism is located at one end of the upper surface of the cleaning machine body and can move in a direction perpendicular to the upper surface of the cleaning machine body; The feeding mechanism is located at the other end of the upper surface of the cleaning machine body and can move in a direction perpendicular to the upper surface of the cleaning machine body; A second guide rail is provided inside the first guide rail, connecting the feeding mechanism and the unloading mechanism, for conveying the material to be cleaned by the feeding mechanism to the centrifugal mechanism for cleaning, and for conveying the cleaned material to the unloading mechanism.

[0009] More preferably, the rotating part of the centrifugal mechanism is a circular component, and the second guide rail extends sequentially to the loading mechanism and then to the rotating part and the unloading mechanism; both sides of the rotating part include a guide rail area that overlaps with the second guide rail, and the guide rail length of the guide rail area is at least greater than the contact length between the object to be cleaned and the second guide rail.

[0010] More preferably, the two-fluid centrifugal cleaner is further equipped with: The first conveying mechanism is used to convey the items to be cleaned placed on the feeding mechanism to the second guide rail; The second conveying mechanism is used to transport the cleaned items to the unloading mechanism.

[0011] On the other hand, the present invention provides a cleaning method applied to the above-mentioned two-fluid centrifugal cleaner, the cleaning method comprising: S10 Place the object to be cleaned on the surface of the rotating part of the centrifuge mechanism; S20 controls the vacuum lifting platform to create a vacuum so that the adsorption section adsorbs the object to be cleaned. S30 controls the cleaning mechanism to move along the first guide rail, and simultaneously controls the contact cleaning part to perform contact cleaning on the surface of the object to be cleaned, and controls the rinsing part to rinse the surface of the object to be cleaned, thus completing the contact cleaning. S40 controls the centrifugal mechanism to rotate at high speed and the cleaning mechanism to move along the first guide rail. At the same time, it controls the rinsing section and the drying section to rinse and dry the surface of the object to be cleaned, thus completing the cleaning of the object.

[0012] More preferably, after step S30, the method further includes: After controlling the centrifugal mechanism to rotate to a preset angle, step S31 jumps to step S30 to complete contact cleaning of the object to be cleaned from another angle, until contact cleaning of the entire object to be cleaned is completed.

[0013] More preferably, the two-fluid centrifugal cleaner is also equipped with a cylinder connected to the contact cleaning part, which is used to control the height of the contact cleaning part to be adjusted in a direction perpendicular to the upper surface of the cleaner body; Before performing contact cleaning in step S30, the step of controlling the contact cleaning part to the cleaning position is also included. The cleaning position is a pre-set position where the contact cleaning part can contact the object to be cleaned. After step S30 completes the contact cleaning, it also includes the step of controlling the contact cleaning part to the starting position, where the starting position is a pre-set position where the contact cleaning part cannot contact the object to be cleaned.

[0014] More preferably, step S10, placing the object to be cleaned on the surface of the rotating part of the centrifuge mechanism, includes: The first conveying mechanism S11 transports the material to be cleaned, placed on the feeding mechanism, to the second guide rail; The second guide rail S12 conveys the material to be cleaned to the rotating surface of the centrifugal mechanism; Step S40 is followed by: The second guide rail S41 conveys the cleaned material to the unloading mechanism. The second conveying structure S42 transports the cleaned material to the unloading mechanism.

[0015] The two-fluid centrifugal cleaning machine and its preparation method provided by this invention can achieve at least the following: Beneficial effects

[0016] 1. In addition to the conventional rinsing and drying sections, the cleaning mechanism is also equipped with a contact cleaning section that cleans the surface of the object to be cleaned by contact, thereby improving the cleaning effect. At the same time, first guide rails are arranged on both sides of the rotating part of the centrifugal mechanism. During the cleaning process, the cleaning mechanism moves along the first rails to further improve the cleaning effect and clean the fine dust from the surface of the object to be cleaned. 2. The two-fluid centrifugal cleaning machine is equipped with a feeding mechanism, a discharging mechanism, a first conveying structure, a second conveying structure, and a second guide rail to realize automatic loading and unloading of the items to be cleaned, improve cleaning efficiency, and save manpower. Attached Figure Description

[0017] The preferred embodiments will now be described in a clear and easy-to-understand manner, with reference to the accompanying drawings, to further explain the above-mentioned characteristics, technical features, advantages, and implementation methods.

[0018] Figure 1This is a schematic diagram of an embodiment of the two-fluid centrifugal cleaning machine of the present invention; Figure 2 For the purposes of this invention Figure 1 A partial schematic diagram of the two-fluid centrifugal cleaner shown by the dashed line. Figure 3 This is a schematic diagram of another example of the two-fluid centrifugal cleaning machine of the present invention.

[0019] Figure label: 10-Washing machine body, 20-Rotating part, 30-Adsorption part; 40-First guide rail, 50-Washing mechanism, 51-Contact washing part, 52-Rinsing part, 53-Drying part, 60-Feeding mechanism, 70-Discharging mechanism, 80-Second guide rail. Detailed Implementation

[0020] The present invention will be further described below with reference to the accompanying drawings and examples, but the content of the present invention is not limited thereto.

[0021] A first embodiment of the present invention provides a two-fluid centrifugal cleaning machine, such as... Figure 1 and Figure 2 ( Figure 2 for Figure 1 As shown in the partial schematic diagram (with dashed lines), the system includes: a cleaning machine body 10; a centrifugal mechanism for rotating the object to be cleaned, including a rotating part 20 disposed on the upper surface of the cleaning machine body 10; a vacuum lifting platform for adsorbing the object to be cleaned, including an adsorption part 30 disposed in the central region of the rotating part 20 of the centrifugal mechanism; a first guide rail 40 disposed on both sides of the rotating part 20 of the centrifugal mechanism; and a cleaning mechanism 50, which moves along the first guide rail 40 above the rotating part 20 of the centrifugal mechanism under the drive of a motor to complete the cleaning of the object to be cleaned. The cleaning mechanism 50 includes: a contact cleaning part 51, which cleans the surface of the object to be cleaned by contact while moving along the first guide rail 40; a rinsing part 52, which cleans the surface of the object to be cleaned by rinsing while moving along the first guide rail 40; and a drying part 53, which dries the surface of the object to be cleaned by blowing air while moving along the first guide rail 40.

[0022] In this embodiment, the cleaning machine body 10 is a shell made of any material, such as iron, and is placed on a flat surface such as the ground. The adsorption part 30 of the vacuum lifting platform is located at the center of the centrifugal mechanism rotating part 20. It adsorbs the items to be cleaned from its surface by drawing a vacuum. The items to be cleaned can be any items with foreign matter such as dust attached to their surface that need to be cleaned, such as cut wafers, single LED beads cut after the entire board of LED beads has been packaged, etc., especially for items with dust on their surface that is difficult to clean with conventional two-fluid centrifugal cleaning machines. When cleaning is required, it is only necessary to attach the items to a medium that can be adsorbed onto the adsorption part 30 of the vacuum lifting platform, such as the surface of a blue film.

[0023] The first guide rail 40 is disposed on both sides of the rotating part 20 of the centrifugal mechanism. The cleaning mechanism 50 moves along the first guide rail 40 to complete the cleaning operation. Therefore, the length of the first guide rail 40 should at least cover the length of the object to be cleaned on the surface of the rotating part 20, ensuring that the cleaning range of the cleaning mechanism 50 can cover the object to be cleaned. The cleaning mechanism 50 includes a contact cleaning part 51, a rinsing part 52, and a drying part 53, wherein... The surface of the contact cleaning section 51 is equipped with a contactable cleaning material to clean the surface of the object to be cleaned through contact. This contactable cleaning material can be selected according to the actual application, as long as it achieves a cleaning effect without damaging the surface of the object, such as ultra-fine soft bristles. Since the contact cleaning section performs the cleaning work through contact, to improve the cleaning effect, it is further configured to clean the surface of the object to be cleaned through rolling contact. In one example, the contact cleaning section is a soft-bristled roller brush. The width of the contact cleaning section 51 between the two first guide rails 40 should at least cover the surface of the object to be cleaned to ensure a cleaning effect. When the contact cleaning section cleans the surface of the object to be cleaned, it should be used in conjunction with the rinsing section 52. At this time, the rinsing section 52 serves to lubricate, cool, and clean the contactable cleaning material (such as ultra-fine soft bristles).

[0024] The rinsing unit 52 rinses the object to be cleaned as it moves along the first track. In practical applications, the rinsing unit 52 can be a water pipe extending between the two first guide rails 40. To improve the rinsing effect, several through holes are provided in the water pipe facing the object to be cleaned to ensure that the water flow can be perpendicular to the surface of the object. To further improve the rinsing effect, a certain proportion of wafer cutting fluid can be mixed into the water pipe.

[0025] As the drying section 53 moves along the first track, it dries the object to be cleaned. In practical applications, the drying section 53 can be a compressed air pipe extending between the two first guide rails 40. Similar to the rinsing section 52, several through holes can be provided in the compressed air pipe facing the object to be cleaned to ensure that air is blown toward the surface of the object to be cleaned to dry it.

[0026] In this embodiment, the contact cleaning unit 51, the rinsing unit 52, and the drying unit 53 are integrated as a whole, moving along the first guide rail 40 under the drive of a motor. That is, during contact cleaning, rinsing, and drying processes, the contact cleaning unit 51, the rinsing unit 52, and the drying unit 53 move as a single unit. In other embodiments, appropriate structures can be configured to control the individual movement of the contact cleaning unit 51, the rinsing unit 52, or the drying unit 53.

[0027] In another embodiment, the two-fluid centrifugal cleaner is further equipped with a cylinder connected to the contact cleaning section, used to control the height adjustment of the contact cleaning section in a direction perpendicular to the upper surface of the cleaner body 10. The specific control height can be adjusted according to the actual situation (cleaning process requirements) to achieve the best cleaning effect. In one example, the height position of the contact cleaning section is controlled as a starting position and a cleaning position, where the cleaning position is a pre-set position where the contact cleaning section can contact the object to be cleaned; the starting position is a pre-set position where the contact cleaning section cannot contact the object to be cleaned. When the contact cleaning section is a soft-bristled roller brush and the object to be cleaned is an LED bead with a soft silicone coating on its surface, when in the cleaning position, the soft-bristled roller brush can slightly contact the surface of the LED bead to perform contact cleaning of the dust on its surface.

[0028] Improvements can be made to the above embodiments, such as... Figure 3 As shown, the two-fluid centrifugal cleaner is further equipped with: a feeding mechanism 60, disposed at one end of the upper surface of the cleaner body 10, which can move in a direction perpendicular to the upper surface of the cleaner body 10; a discharging mechanism 70, disposed at the other end of the upper surface of the cleaner body 10, which can move in a direction perpendicular to the upper surface of the cleaner body 10; and a second guide rail 80 disposed inside the first guide rail 40, connecting the feeding mechanism 60 and the discharging mechanism 70, for conveying the object to be cleaned conveyed by the feeding mechanism 60 to the centrifugal mechanism for cleaning, and for conveying the cleaned object to be cleaned to the discharging mechanism 70. To achieve automatic loading and unloading, a first conveying mechanism and a second conveying structure are configured simultaneously, wherein the first conveying mechanism is used to convey the object to be cleaned placed on the feeding mechanism 60 to the second guide rail 80, and the second conveying mechanism is used to convey the cleaned object to be cleaned to the discharging mechanism 70.

[0029] In this embodiment, the feeding mechanism 60 and the unloading mechanism 70 are arranged on both sides of the centrifugal mechanism, with one side for automatic feeding and the other for automatic unloading. During the feeding and unloading process, the material to be cleaned is first placed on the feeding mechanism 60 and conveyed to the second guide rail 80 by the first conveying mechanism until it reaches the surface of the rotating part 20 of the centrifugal mechanism. After the adsorption part 30 on the surface of the vacuum lifting platform adsorbs and cleans it, it is further conveyed to the front end of the unloading mechanism 70 by the second guide rail 80, and then transferred to the unloading mechanism 70 by the second conveying mechanism.

[0030] In the semiconductor field, the objects to be cleaned are wafers or LED beads. These are attached to a support substrate (hereinafter referred to as materials) and placed in a basket. To improve cleaning efficiency, multiple slots for placing materials are arranged in the basket parallel to the upper surface of the cleaning machine body 10. Simultaneously, a loading mechanism 60 and a unloading mechanism 70 are configured to move up and down perpendicular to the upper surface of the cleaning machine body 10, with each movement distance matching the spacing of the slots in the basket. Thus, during the cleaning process, the first conveying mechanism continuously transports the materials in the basket of the loading mechanism 60 to the second track, and the second conveying mechanism continuously transports the cleaned materials to the basket of the unloading mechanism 70, achieving automatic loading and unloading and improving manual efficiency. Here, the specific functions of the first and second conveying mechanisms are to push the materials in the basket to the second track and the materials on the second track to the basket. Therefore, the structure of the first and second conveying mechanisms is not specifically limited; any structure capable of achieving the above objectives is included in this embodiment, such as a motor-controlled robotic arm.

[0031] Since the material to be cleaned needs to be transferred to the rotating part 20 of the centrifugal mechanism via the second track, in order to ensure that the centrifugal part can smoothly rotate without being affected by the second track after the adsorption part 30 adsorbs the material, the rotating part 20 of the centrifugal mechanism is configured as a circular component. The second guide rail 80 and the feeding mechanism 60 extend sequentially to the rotating part 20 and the unloading mechanism 70. Both sides of the rotating part 20 include guide rail areas that overlap with the second guide rail 80, and the guide rail length of the guide rail area is at least greater than the contact length between the material to be cleaned and the second guide rail 80. That is, the part of the rotating part 20 of the centrifugal mechanism that overlaps with the second track is part of the second track. The track part on the rotating part 20 and the track parts on other parts of the surface of the washing machine body 10 constitute the second track. The two track parts are separated from each other. Before cleaning, the rotating part 20 is placed in the initial position where the tracks overlap. After the material to be cleaned is transferred to the rotating part 20 along the track on the surface of the washing machine body 10, it is placed on the track of the rotating part 20, which facilitates the adsorption part 30 to adsorb it while ensuring stability. After cleaning is completed, the rotating part 20 also stays at the initial position where the track overlaps, which makes it easy to transfer the material to the unloading mechanism 70.

[0032] For safety, in the above embodiments, a protective cover that can at least accommodate the rotating part, the first guide rail, and other components can be configured to provide protection during the cleaning process.

[0033] In another embodiment of the present invention, a cleaning method is applied to the above-mentioned two-fluid centrifugal cleaner. The cleaning method includes: S10 placing the object to be cleaned on the surface of the rotating part of the centrifugal mechanism; S20 controlling the vacuum lifting platform to draw a vacuum so that the adsorption part adsorbs the object to be cleaned; S30 controlling the cleaning mechanism to move along the first guide rail, while controlling the contact cleaning part to perform contact cleaning on the surface of the object to be cleaned, and controlling the rinsing part to rinse the surface of the object to be cleaned, thereby completing the contact cleaning; S40 controlling the centrifugal mechanism to rotate at high speed and the cleaning mechanism to move along the first guide rail, while controlling the rinsing part and the drying part to rinse and dry the surface of the object to be cleaned, thereby completing the cleaning of the object to be cleaned.

[0034] In this embodiment, the vacuum lifting platform and the centrifugal mechanism are integrated. After the adsorption unit adsorbs the object to be cleaned, the centrifugal mechanism drives it to rotate. During the cleaning process, the cleaning mechanism is controlled by a motor to move along the first guide rail, simultaneously controlling the contact cleaning unit and the rinsing unit to perform contact cleaning on the object to be cleaned; then, the rinsing unit and the drying unit are controlled to rinse and dry the surface of the object to be cleaned.

[0035] The first guide rail is positioned on both sides of the rotating part of the centrifugal mechanism. The cleaning mechanism moves along the first guide rail to complete the cleaning operation. Therefore, the length of the first guide rail should at least cover the length of the object to be cleaned on the surface of the rotating part, ensuring that the cleaning range of the cleaning mechanism can cover the object to be cleaned. The cleaning mechanism includes a contact cleaning section, a rinsing section, and a drying section. The contact cleaning section is equipped with a contactable cleaning material to clean the surface of the object to be cleaned through contact. This contactable cleaning material can be selected according to the actual application, as long as it achieves a cleaning effect without damaging the surface of the object, such as ultra-fine soft bristles. Since the contact cleaning section performs the cleaning work through contact, to improve the cleaning effect, it is further configured to clean the surface of the object to be cleaned through rolling contact. In one example, the contact cleaning section is a soft-bristled roller brush. The width of the contact cleaning section between the two first guide rails should at least cover the surface of the object to be cleaned to ensure a cleaning effect. When the contact cleaning section cleans the surface of the object to be cleaned, it should work simultaneously with the rinsing section 52. At this time, the rinsing section 52 serves to lubricate, cool, and clean the contactable cleaning material (such as ultra-fine soft bristles).

[0036] The rinsing section rinses the object to be cleaned as it moves along the first track. In practical applications, this rinsing section can be a water pipe extending between the two first guide rails. To improve the rinsing effect, several through holes are provided in the water pipe facing the object to be cleaned, ensuring that the water flow is perpendicular to the surface of the object. The drying section dries the object to be cleaned as it moves along the first track. In practical applications, this drying section can be a compressed air pipe extending between the two first guide rails. Similar to the rinsing section, several through holes can be provided in the compressed air pipe facing the object to be cleaned, ensuring that air is blown onto the surface of the object to dry it.

[0037] In this embodiment, the contact cleaning section, rinsing section, and drying section are integrated and move along the first guide rail under the drive of a motor. In other embodiments, appropriate structures can be configured to control the movement of the contact cleaning section, rinsing section, or drying section individually.

[0038] This embodiment is obtained by improving the above embodiment. In this embodiment, after step S30, it further includes: after controlling the centrifugal mechanism to rotate by a preset angle, step S31 jumps to step S30 to complete contact cleaning of the object to be cleaned from another angle, until the contact cleaning of the entire object to be cleaned is completed.

[0039] In this embodiment, the cleaning effect is improved by rotating the centrifuge mechanism to clean the object at different angles. In one example, two positions, 0° and 90°, are configured for contact cleaning of the object. Assuming that the angle of the centrifuge mechanism is 0° when the object reaches the rotating surface, after step S30 to perform contact cleaning of the object surface, the centrifuge mechanism is automatically rotated 90° (clockwise or counterclockwise), and the contact cleaning step S30 is repeated. After completing the contact cleaning steps at both angles, step S40, rinsing and drying, is performed. In other examples, the number of contact cleaning cycles and the cleaning angle can be adjusted according to actual needs, and no specific limitations are made here.

[0040] In the above cleaning process, in order to control different cleaning steps, the two-fluid centrifugal cleaner is also equipped with a cylinder connected to the contact cleaning part, which is used to control the height of the contact cleaning part in a direction perpendicular to the upper surface of the cleaner body; before the contact cleaning in step S30, there is also a step of controlling the contact cleaning part to the cleaning position, which is a pre-set position where the contact cleaning part can contact the object to be cleaned; after the contact cleaning is completed in step S30, there is also a step of controlling the contact cleaning part to the starting position, which is a pre-set position where the contact cleaning part cannot contact the object to be cleaned.

[0041] During the cleaning process, after the contact cleaning part reaches the cleaning position, the motor is further controlled to drive the contact cleaning part to rotate and the cleaning mechanism to move along the first guide rail, executing step S30 to complete the contact cleaning of the object to be cleaned; after completion, it returns to the starting position, and the centrifugal mechanism is controlled to rotate at high speed to execute the rinsing and drying steps of S40. In embodiments where multiple contact cleaning operations are required, after executing step S30 once, the cleaning mechanism is controlled to return to the starting position, the centrifugal mechanism automatically rotates by a preset angle, and then the contact cleaning part is further controlled to reach the cleaning position to execute the contact cleaning step S30.

[0042] This embodiment is obtained by improving the above embodiment. In this embodiment, before rinsing and drying the object to be cleaned in step S40, the method further includes: S32 controlling the centrifugal mechanism to rotate at high speed and the cleaning mechanism to move along the first guide rail.

[0043] In this embodiment, to improve the cleaning effect, after completing the contact cleaning, a rinsing step is performed on the object to be cleaned, followed by rinsing and drying steps. During the cleaning process, after the contact cleaning part reaches the cleaning position, the motor is further controlled to drive the contact cleaning part to rotate and drive the cleaning mechanism to move along the first guide rail, executing step S30 to complete the contact cleaning of the object to be cleaned; after completion, it returns to the starting position, and the centrifugal mechanism is controlled to rotate at high speed to sequentially execute the rinsing and drying steps of S40.

[0044] In other embodiments, the execution order of contact cleaning, rinsing, and drying steps can be set according to actual conditions. To improve the cleaning effect, one step can be executed multiple times or multiple steps can be executed sequentially. For example, in one instance, the cleaning steps are configured as contact cleaning, rinsing, drying, rinsing, contact cleaning, and drying, and the corresponding control program can be pre-configured according to the cleaning steps.

[0045] This embodiment is an improvement on the above embodiment. In this embodiment, step S10, placing the object to be cleaned on the rotating surface of the centrifugal mechanism, includes: S11, the first conveying mechanism conveys the object to be cleaned, placed on the feeding mechanism, to the second guide rail; S12, the second guide rail conveys the object to be cleaned to the rotating surface of the centrifugal mechanism. After step S40, the embodiment further includes: S41, the second guide rail conveys the cleaned object to the unloading mechanism; S42, the second conveying structure conveys the cleaned object to the unloading mechanism.

[0046] In this embodiment, the feeding mechanism and the unloading mechanism are arranged on both sides of the centrifugal mechanism, with one side for automatic feeding and the other side for automatic unloading. During the feeding and unloading process, the material to be cleaned is first placed on the feeding mechanism and conveyed to the second guide rail by the first conveying mechanism until it reaches the surface of the rotating part of the centrifugal mechanism. The adsorption part on the surface of the vacuum lifting platform adsorbs and cleans the material, and then it is further conveyed to the front end of the unloading mechanism by the second guide rail. After that, it is transferred to the unloading mechanism by the second conveying mechanism.

[0047] In the semiconductor field, the objects to be cleaned are wafers or LED beads. These are attached to a support substrate (hereinafter referred to as materials) and placed in a basket. To improve cleaning efficiency, multiple slots for placing materials are arranged in the basket parallel to the upper surface of the cleaning machine body. Simultaneously, a loading mechanism and a unloading mechanism are configured to move up and down perpendicular to the upper surface of the cleaning machine body, with each movement distance matching the spacing of the slots in the basket. Thus, during the cleaning process, the first conveying mechanism continuously transports the materials from the basket of the loading mechanism to the second track, and the second conveying mechanism continuously transports the cleaned materials to the basket of the unloading mechanism, achieving automatic loading and unloading and improving manual efficiency. Here, the specific functions of the first and second conveying mechanisms are to push the materials in the basket to the second track and the materials on the second track to the basket. Therefore, the structure of the first and second conveying mechanisms is not specifically limited; any structure capable of achieving the above objectives is included in this embodiment, such as a motor-controlled robotic arm.

[0048] Because the material to be cleaned needs to be transferred to the rotating part of the centrifugal mechanism via a second track, to ensure that the centrifugal mechanism can smoothly rotate without being affected by the second track after the adsorption part adsorbs the material, the rotating part of the centrifugal mechanism is configured as a circular component. The second guide rail extends sequentially from the feeding mechanism to the rotating part and the unloading mechanism. Both sides of the rotating part include guide rail areas that overlap with the second guide rail, and the guide rail length of the guide rail area is at least greater than the contact length between the material to be cleaned and the second guide rail. That is, the part of the rotating part of the centrifugal mechanism that overlaps with the second track is part of the second track. The track part on the rotating part and the track parts on other parts of the washing machine body surface constitute the second track. The two track parts are separate from each other. Before cleaning, the rotating part is placed in the initial position where the tracks overlap. After the material to be cleaned is transferred to the rotating part along the track on the surface of the washing machine body, it is placed on the track of the rotating part, which facilitates adsorption by the adsorption part while ensuring stability. After cleaning, the rotating part also stays in the initial position where the tracks overlap, which facilitates the transfer of the material to the unloading mechanism.

[0049] For safety, a protective cover is also provided that can accommodate at least the rotating part, the first guide rail, and other components. This protective cover is installed to protect the parts throughout the cleaning process described in the above embodiment.

[0050] It should be noted that the above embodiments can be freely combined as needed. The above description is only a preferred embodiment of the present invention. It should be pointed out that for those skilled in the art, several improvements and modifications can be made without departing from the principle of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention.

Claims

1. A two-fluid centrifugal cleaning machine, characterized in that, include: The main body of the cleaning machine; A centrifugal mechanism for rotating the object to be cleaned includes a rotating part disposed on the upper surface of the cleaning machine body; A vacuum lifting platform for adsorbing objects to be cleaned includes an adsorption section disposed in the central region of the rotating part of the centrifugal mechanism. The first guide rail is disposed on both sides of the rotating part of the centrifugal mechanism; Driven by a motor, the cleaning mechanism moves along the first guide rail above the rotating part of the centrifugal mechanism to complete the cleaning of the object to be cleaned. The cleaning mechanism includes: The contact cleaning unit cleans the surface of the object to be cleaned by contact while moving along the first guide rail. The rinsing section cleans the surface of the object to be cleaned by rinsing while moving along the first guide rail. The drying section dries the surface of the object to be cleaned by blowing air as it moves along the first guide rail. The two-fluid centrifugal cleaner is also equipped with: The feeding mechanism is located at one end of the upper surface of the cleaning machine body and can move in a direction perpendicular to the upper surface of the cleaning machine body; The feeding mechanism is located at the other end of the upper surface of the cleaning machine body and can move in a direction perpendicular to the upper surface of the cleaning machine body; A second guide rail is provided inside the first guide rail, connecting the feeding mechanism and the unloading mechanism, for conveying the material to be cleaned by the feeding mechanism to the centrifugal mechanism for cleaning, and for conveying the cleaned material to the unloading mechanism. The rotating part of the centrifugal mechanism is a circular component. The second guide rail extends sequentially to the loading mechanism and then to the rotating part and the unloading mechanism. Both sides of the rotating part include a guide rail area that overlaps with the second guide rail, and the guide rail length of the guide rail area is at least greater than the contact length between the object to be cleaned and the second guide rail.

2. The two-fluid centrifugal cleaning machine as described in claim 1, characterized in that, The surface of the contact cleaning section is equipped with contactable cleaning material, which cleans the surface of the object to be cleaned by rolling contact.

3. The two-fluid centrifugal cleaning machine as described in claim 1, characterized in that, The two-fluid centrifugal cleaner is also equipped with a cylinder connected to the contact cleaning part, which is used to control the height of the contact cleaning part in a direction perpendicular to the upper surface of the cleaner body.

4. The two-fluid centrifugal cleaning machine as described in claim 1, characterized in that, The two-fluid centrifugal cleaner is also equipped with: The first conveying mechanism is used to convey the items to be cleaned placed on the feeding mechanism to the second guide rail; The second conveying mechanism is used to transport the cleaned items to the unloading mechanism.

5. A cleaning method, characterized in that, The cleaning method, applied to the two-fluid centrifugal cleaner as described in any one of claims 1-4, comprises: S10 Place the object to be cleaned on the surface of the rotating part of the centrifuge mechanism; S20 controls the vacuum lifting platform to create a vacuum so that the adsorption section adsorbs the object to be cleaned. S30 controls the cleaning mechanism to move along the first guide rail, and simultaneously controls the contact cleaning part to perform contact cleaning on the surface of the object to be cleaned, and controls the rinsing part to rinse the surface of the object to be cleaned, thus completing the contact cleaning. S40 controls the centrifugal mechanism to rotate at high speed and the cleaning mechanism to move along the first guide rail. At the same time, it controls the rinsing section and the drying section to rinse and dry the surface of the object to be cleaned, thus completing the cleaning of the object.

6. The cleaning method as described in claim 5, characterized in that, Step S30 is followed by: After controlling the centrifugal mechanism to rotate to a preset angle, step S31 jumps to step S30 to complete contact cleaning of the object to be cleaned from another angle, until contact cleaning of the entire object to be cleaned is completed.

7. The cleaning method as described in claim 5 or 6, characterized in that, The two-fluid centrifugal cleaner is also equipped with a cylinder connected to the contact cleaning part, which is used to control the height of the contact cleaning part in a direction perpendicular to the upper surface of the cleaner body; Before performing contact cleaning in step S30, the step of controlling the contact cleaning part to the cleaning position is also included. The cleaning position is a pre-set position where the contact cleaning part can contact the object to be cleaned. After step S30 completes the contact cleaning, it also includes the step of controlling the contact cleaning part to the starting position, where the starting position is a pre-set position where the contact cleaning part cannot contact the object to be cleaned.

8. The cleaning method as described in claim 5 or 6, characterized in that, Step S10, placing the object to be cleaned on the surface of the rotating part of the centrifuge mechanism, includes: The first conveying mechanism S11 transports the material to be cleaned, placed on the feeding mechanism, to the second guide rail; The second guide rail S12 conveys the material to be cleaned to the rotating surface of the centrifugal mechanism; Step S40 is followed by: The second guide rail S41 conveys the cleaned material to the unloading mechanism. The second conveying structure S42 transports the cleaned material to the unloading mechanism.

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