Electrochromic device and manufacturing method thereof, electrochromic apparatus, terminal product

Abstract

This application relates to the field of electrochromic technology, and more particularly to an electrochromic device and its manufacturing method, an electrochromic apparatus, and an end product. In the electrochromic device manufactured by the method described above, the first conductive region and the second conductive region are mutually insulated, and the first conductive region and the second conductive layer are electrically connected through a conductive layer. This allows the electrical conductivity of the first and second conductive layers to be led to the same side of the electrochromic device. Therefore, lead-out electrodes can be arranged on the same side of the first and second conductive regions, eliminating the need for separate leads on both sides. This solves the technical problem of requiring separate leads on both sides in the prior art, and has advantages such as simplifying the electrical connection method of the electrochromic device and facilitating production by simplifying the production process.

Description

Technical Field

[0001] This application relates to the field of electrochromic technology, and in particular to an electrochromic device and its manufacturing method, an electrochromic apparatus, and an end product. Background Technology

[0002] Electrochromism is a phenomenon in which the optical properties (reflectivity, transmittance, absorptivity, etc.) of a material undergo stable and reversible color changes under the influence of an applied electric field. Visually, this manifests as reversible changes in color and transparency. In recent years, electrochromic technology has been widely applied in products such as vehicle rearview mirrors, sunroofs, side windows, building curtain walls, window and door systems, and display devices.

[0003] In related technologies, electrochromic devices include two conductive substrates and an electrochromic layer group disposed between the two conductive substrates. When leading out electrodes in an electrochromic device, a groove needs to be formed on each of the conductive substrates on both sides of the thickness direction in the electrochromic device during the setting of the lead-out structure. The groove penetrates the substrate and conductive layer on the conductive substrate on the same side and exposes the conductive layer on the opposite conductive substrate at the groove opening. Since the groove openings on the two conductive substrates face opposite directions, electrodes need to be led out on both sides of the electrochromic device. That is, the conductive areas on the two conductive layers need to be electrically connected to an external power supply through two FPCs (Flexible Printed Circuits), which makes the electrical connection method of the electrochromic device relatively complex. Summary of the Invention

[0004] The purpose of this application is to provide an electrochromic device and its manufacturing method, electrochromic apparatus, and end product. The electrochromic device can lead out an electrode on one side to solve the problem of the relatively complex electrical connection method of electrochromic devices in related technologies.

[0005] To achieve the above objectives, the technical solution adopted in the first aspect of this application is: a method for manufacturing an electrochromic device, comprising:

[0006] A first conductive layer is provided, on which a first conductive region and a second conductive region that are mutually insulated are formed, and a first base material layer is formed at least on a portion of the surface of the second conductive region.

[0007] A second conductive layer is provided, and a second base material layer is formed on at least a portion of the surface of the second conductive layer;

[0008] The first base material layer and the second base material layer are positioned opposite each other, wherein at least a portion of the surface of the first conductive region is opposite to the second conductive layer;

[0009] An electro-optic dielectric layer is formed between the first base material layer and the second base material layer, and a conductive layer is formed between the first conductive region and the second conductive layer to conduct the first conductive region and the second conductive layer.

[0010] The beneficial effects of the method for manufacturing an electrochromic device provided in this application are as follows: In the electrochromic device manufactured by this method, the first conductive region and the second conductive region are insulated from each other, and the first conductive region and the second conductive layer are electrically connected through a conductive layer. This allows the electrical conductivity of the first and second conductive layers to be led to the same side of the electrochromic device. Therefore, lead-out electrodes can be arranged on the same side of the first and second conductive regions, eliminating the need for separate leads on both sides. This solves the technical problem of requiring separate leads on both sides in the prior art, and has advantages such as simplifying the electrical connection method of the electrochromic device and facilitating production by simplifying the production process.

[0011] In some embodiments, the electro-optic dielectric layer and the conductive layer are integrally formed.

[0012] In some embodiments, forming an electro-optic dielectric layer between the first base material layer and the second base material layer, and forming a conductive layer between the first conductive region and the second conductive layer to conduct the first conductive region and the second conductive layer, includes:

[0013] A first mixed solution comprising conductive particles is disposed between at least a portion of the surface of the first conductive region and the second conductive layer; an electro-optic dielectric solution is disposed between the first base material layer and the second base material layer;

[0014] Alternatively, the conductive particles are mixed with an electro-optic dielectric solution to form a second mixed solution; the second mixed solution is disposed between the first base material layer and the second base material layer, and the second mixed solution extends to the space between the first conductive region and the second conductive layer.

[0015] In some embodiments, the distance between the first base material layer and the second base material layer is L, where L > the particle size of the conductive particles.

[0016] In some embodiments, L ≥ 2 times the particle size of the conductive particles, or L ≥ the particle size of the conductive particles + 2 μm.

[0017] In some embodiments, the distance between the first conductive region and the second conductive layer is H, where H ≤ the particle size of the conductive particles.

[0018] In some embodiments, H < the particle size of the conductive particles - 2 μm, or H < the particle size of the conductive particles / 2.

[0019] In some embodiments, the particle size of the conductive particles ranges from 7µm to 100µm.

[0020] In some embodiments, the density of the conductive particles in the electro-optic dielectric layer is 1000 particles / cm³. 2 -100,000 particles / cm 2 .

[0021] In some embodiments, providing a first conductive layer, forming a first conductive region and a second conductive region that are mutually insulated on the first conductive layer, and forming a first base material layer on at least a portion of the surface of the second conductive region, includes: disposing the first base material layer on the first conductive layer, and removing the first base material layer from at least a portion of the surface of the first conductive region to expose at least a portion of the first conductive region.

[0022] And / or, the provision of the second conductive layer and the formation of a second base material layer on at least a portion of the surface of the second conductive layer includes: depositing the second base material layer on the second conductive layer, and removing a portion of the second base material layer on a portion of the surface of the second conductive layer corresponding to the first conductive region to expose a portion of the second conductive layer.

[0023] In some embodiments, the step of positioning the first base material layer and the second base material layer relative to each other further includes:

[0024] A first bus layer is formed on at least a portion of the surface of the first conductive region;

[0025] And / or, a second bus layer is disposed on at least a portion of the surface of the second conductive layer corresponding to the first conductive region.

[0026] In some embodiments, forming an electro-optic dielectric layer between the first base material layer and the second base material layer, and forming a conductive layer between the first conductive region and the second conductive layer to conduct the first conductive region and the second conductive layer, further includes:

[0027] A pressure is applied toward the second conductive layer at a location on the first conductive layer corresponding to the conductive layer, and / or a pressure is applied toward the first conductive layer at a location on the second conductive layer corresponding to the conductive layer.

[0028] In some embodiments, the pressure ranges from 1 MPa to 3 MPa.

[0029] In some embodiments, the method for manufacturing the electrochromic device further includes:

[0030] A through groove is formed from the second conductive layer to the surface of the first conductive layer, so that the first conductive area and the second conductive area are exposed through the through groove.

[0031] In some embodiments, the method for manufacturing the electrochromic device further includes:

[0032] A sealing groove is formed that penetrates the second conductive layer;

[0033] A sealing element is provided in the sealing groove; the sealing groove is an annular groove, and the orthographic projection of the conductive groove on the first conductive layer is located outside the outer contour of the orthographic projection of the sealing groove on the first conductive layer.

[0034] In some embodiments, the method for manufacturing the electrochromic device further includes:

[0035] A lead-out component is provided, the lead-out component including a first lead-out structure and a second lead-out structure;

[0036] The first lead-out structure is electrically connected to the first conductive area via the conductive groove;

[0037] The second lead-out structure is electrically connected to the second conductive area via the conductive groove.

[0038] To achieve the above objectives, the technical solution adopted in the second aspect of this application is: an electrochromic device, comprising a first conductive layer, a first base material layer, a conductive layer, an electro-optic dielectric layer, a second base material layer, and a second conductive layer stacked together.

[0039] The first conductive layer includes a first conductive region and a second conductive region that are mutually insulated from each other. A first base material layer is disposed on the first conductive layer, and at least a portion of the first conductive region is exposed on the first base material layer. The second conductive layer has a first surface and a second surface facing the first conductive layer. The second base material layer is disposed on the second conductive layer, and at least a portion of the first surface is exposed on the second base material layer. The first surface exposed on the second base material layer is at least partially opposite to the first conductive region exposed on the first base material layer. The conductive layer is located between a portion of the first surface exposed on the second base material layer and a portion of the first conductive region exposed on the first base material layer, and the conductive layer conducts between the first surface and the first conductive region. The electro-optic dielectric layer is located between the first base material layer and the second base material layer.

[0040] The beneficial effects of the electrochromic device provided in this application are as follows: Since the first conductive region and the second conductive region are mutually insulated, and the first conductive region and the second conductive layer are electrically connected through a conductive layer, the lead-out electrodes can be arranged on the same side of the first and second conductive regions, eliminating the need for separate leads on both sides. This solves the technical problem of requiring separate leads on both sides in the prior art, and has advantages such as simplifying the electrical connection method of the electrochromic device and facilitating production and streamlining the production process.

[0041] In some embodiments, the distance between the first conductive region and the first surface is H, the conductive layer includes conductive particles with a particle size of D, and H≤D.

[0042] In some embodiments, H < D - 2um, or H < D / 2.

[0043] In some embodiments, the distance between the first base material layer and the second base material layer is L, where L > D.

[0044] In some embodiments, L≥2D, or L≥D+2um.

[0045] In some embodiments, the value of D ranges from 7um to 100um.

[0046] In some embodiments, the electrochromic device further includes a first bus layer, and the first bus layer is located between the first conductive region and the conductive layer;

[0047] And / or, the electrochromic device further includes a second bus layer, and the second bus layer is located between the first surface and the conductive layer.

[0048] In some embodiments, the electrochromic device is provided with a conductive groove that penetrates the second conductive layer, the second base material layer, the conductive layer, the electro-optic dielectric layer, and the first base material layer to expose a portion of the first conductive area and a portion of the second conductive area. The exposed portion of the first conductive area and the portion of the second conductive area are electrically connected to the positive and negative terminals of an external power supply, respectively, through the conductive groove.

[0049] In some embodiments, the electrochromic device further includes a sealing element, and the electrochromic device is provided with a sealing groove. The sealing groove penetrates at least the second conductive layer, the first base material layer, the electro-optic dielectric layer, and the second base material layer. The sealing element is housed within the sealing groove, and the sealing element, the second conductive layer, and the second conductive region enclose a closed space to seal the first base material layer, the electro-optic dielectric layer, and the second base material layer located within the closed space.

[0050] In some embodiments, the sealing groove is an annular groove, the conductive groove is located outside the enclosed space, and at least a portion of the conductive layer is located inside the enclosed space.

[0051] In some embodiments, the electrochromic device further includes a first lead-out structure and a second lead-out structure;

[0052] The first lead-out structure is electrically connected to the first conductive area, and the first lead-out structure is used to be electrically connected to one of the positive and negative terminals of an external power source.

[0053] The second lead-out structure is electrically connected to the second conductive area; the second lead-out structure is used to electrically connect to the other of the positive and negative terminals of an external power source.

[0054] In some embodiments, the electrochromic device further includes a carrier plate, wherein the first lead-out structure and the second lead-out structure are disposed on the same surface of the carrier plate.

[0055] To achieve the above objectives, the technical solution adopted in the third aspect of this application is: an electrochromic device, including a substrate layer and the electrochromic device of the second aspect embodiment described above.

[0056] The substrate layer is located on the side of the second conductive layer opposite to the first conductive layer; and / or, the substrate layer is located on the side of the first conductive layer opposite to the second conductive layer.

[0057] The beneficial effect of the electrochromic device provided in this application is that by applying the electrochromic device of the first aspect embodiment above to the electrochromic device, the electrochromic device can lead out an electrode on one side, thereby simplifying the electrical connection method of the electrochromic device.

[0058] To achieve the above objectives, the technical solution adopted in the fourth aspect of this application is: a product terminal, including the electrochromic device of the second aspect embodiment or the electrochromic apparatus of the third aspect embodiment, wherein the terminal product includes any one of a rearview mirror, a curtain wall, a car sunroof, a car side window, a car windshield, a housing of an electronic product, glasses, a vehicle, and a display panel.

[0059] The beneficial effect of the product terminal provided by this application is that by applying the electrochromic device of the first aspect embodiment or the electrochromic device of the second aspect embodiment to the product terminal, the electrical connection method of the product terminal can be simplified, and it has all the advantages of the electrochromic device. Attached Figure Description

[0060] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0061] Figure 1 This is a schematic diagram of the structure of an electrochromic device in one embodiment of this application;

[0062] Figure 2 This is a schematic diagram of the structure of an electrochromic device in one embodiment of this application;

[0063] Figure 3 This is a cross-sectional structural schematic diagram of an electrochromic device in one embodiment of this application;

[0064] Figure 4 This is a cross-sectional structural schematic diagram of an electrochromic device in one embodiment of this application;

[0065] Figure 5 This is a cross-sectional structural schematic diagram of an electrochromic device in one embodiment of this application;

[0066] Figure 6 This is a cross-sectional structural schematic diagram of an electrochromic device in one embodiment of this application;

[0067] Figure 7 This is a cross-sectional structural schematic diagram of an electrochromic device in one embodiment of this application;

[0068] Figure 8 This is a cross-sectional structural schematic diagram of an electrochromic device in one embodiment of this application;

[0069] Figure 9 This is a cross-sectional structural schematic diagram of an electrochromic device in one embodiment of this application;

[0070] Figure 10 This is a cross-sectional structural schematic diagram of an electrochromic device in one embodiment of this application;

[0071] Figure 11 This is a cross-sectional structural schematic diagram of an electrochromic device in one embodiment of this application;

[0072] Figure 12 yes Figure 1 A schematic diagram of the structure of the first conductive layer in the electrochromic device shown;

[0073] Figure 13 This is a flowchart of a method for manufacturing an electrochromic device according to one embodiment of this application.

[0074] Figure label:

[0075] 1. First conductive layer; 11. First conductive region; 111. First exposed surface; 112. Electrical connection surface; 12. Second conductive region; 121. Second exposed surface; 122. Electrode surface; 13. First busbar layer; 14. Circular etch line;

[0076] 2. Second conductive layer; 21. Second busbar layer; 22. First surface; 23. Second surface;

[0077] 3. Conductive layer; 31. Conductive particles;

[0078] 4. First substrate; 5. Second substrate;

[0079] 61. First base material layer; 62. Electro-optic dielectric layer; 63. Second base material layer;

[0080] 7. Conductive groove;

[0081] 8. Seals;

[0082] 9. First lead-out structure;

[0083] 10. Second lead-out structure. Detailed Implementation

[0084] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of this application.

[0085] It should be noted that when a component is referred to as being "fixed to" or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as being "connected to" another component, it can be directly connected to or indirectly connected to that other component.

[0086] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0087] In this specification, references to "one embodiment," "some embodiments," or simply "embodiment" mean that one or more embodiments of this application include a specific feature, structure, or characteristic described in connection with that embodiment. Therefore, the phrases "in one embodiment," "in some embodiments," "in other embodiments," "in still other embodiments," etc., appearing in different parts of this specification do not necessarily refer to the same embodiment, but rather mean "one or more, but not all, embodiments," unless otherwise specifically emphasized. Furthermore, in one or more embodiments, specific features, structures, or characteristics may be combined in any suitable manner.

[0088] Electrochromism is a phenomenon in which the optical properties (reflectivity, transmittance, absorptivity, etc.) of a material undergo stable and reversible color changes under the influence of an applied electric field. Visually, this manifests as reversible changes in color and transparency. In recent years, electrochromic technology has been widely applied in products such as vehicle rearview mirrors, sunroofs, side windows, building curtain walls, window and door systems, and display devices.

[0089] In related technologies, electrochromic devices include two conductive substrates and an electrochromic layer group disposed between the two conductive substrates. When setting up electrode leads in an electrochromic device, a groove needs to be opened on each of the conductive substrates on both sides of the thickness direction in the electrochromic device. The groove penetrates the substrate and conductive layer on the conductive substrate on the same side and exposes the conductive layer on the opposite conductive substrate at the groove opening. Since the groove openings on the two conductive substrates face opposite directions, electrodes need to be led out on both sides of the electrochromic device. That is, the conductive areas on the two conductive layers need to be electrically connected to an external power supply through two FPCs (Flexible Printed Circuits), which makes the electrical connection method of the electrochromic device relatively complex.

[0090] In view of the above problems, this application provides an electrochromic device and its manufacturing method, an electrochromic apparatus, and an end product. The electrochromic device can lead out an electrode on one side to solve the problem of the relatively complex electrical connection method of electrochromic devices in related technologies.

[0091] To illustrate the technical solution of this application, the following description is provided in conjunction with specific accompanying drawings and embodiments.

[0092] Please refer to Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 13 This application provides a method for manufacturing an electrochromic device, comprising:

[0093] S100: A first conductive layer 1 is provided, on which a first conductive region 11 and a second conductive region 12, which are mutually insulated, are formed, and a first base material layer 61 is formed at least on a portion of the surface of the second conductive region 12.

[0094] S200: Provide a second conductive layer 2 and form a second base material layer 63 on at least a portion of the surface of the second conductive layer 2.

[0095] It should be noted that the first base material layer 61 is one of the electrochromic layer and the ion storage layer, and the second base material layer 63 is the other of the electrochromic layer and the ion storage layer.

[0096] S300: The first base material layer 61 and the second base material layer 63 are positioned opposite each other, wherein at least a portion of the surface of the first conductive region 11 is opposite to the second conductive layer 2.

[0097] S400: An electro-optic dielectric layer 62 is formed between the first base material layer 61 and the second base material layer 63, and a conductive layer 3 is formed between the first conductive region 11 and the second conductive layer 2 to conduct the first conductive region 11 and the second conductive layer 2.

[0098] In the electrochromic device manufactured by the method provided in this application, the first conductive region 11 and the second conductive region 12 are electrically insulated from each other, and the first conductive region 11 and the second conductive layer 2 are electrically connected through the conductive layer 3. This allows the electrical conductivity of the first conductive layer 1 and the second conductive layer 2 to be led to the same side of the electrochromic device. Therefore, lead-out electrodes can be arranged on the same side of the first conductive region 11 and the second conductive region 12, eliminating the need for separate leads on both sides. This solves the technical problem of requiring separate leads on both sides in the prior art, and has advantages such as simplifying the electrical connection method of the electrochromic device and facilitating production by simplifying the production process.

[0099] It should be noted that the first conductive layer 1 and the second conductive layer 2 described above can be provided by unwinding.

[0100] For example, a first conductive layer 1 is attached to a first substrate 4 to form a first conductive substrate, and a second conductive layer 2 is attached to a second substrate 5 to form a second conductive substrate. The first conductive substrate and the second conductive substrate are respectively released from the unwinding roller, wherein the first conductive substrate includes the first substrate 4 and the first conductive layer 1. Similarly, the second conductive substrate has the same structure as the first conductive substrate, and the second conductive substrate includes the second substrate 5 and the second conductive layer 2.

[0101] For example, the first conductive layer 1 and the second conductive layer 2 are both ITO (Indium-Tin Oxide) conductive films. In other embodiments, the first conductive layer 1 and the second conductive layer 2 may also be other transparent conductive oxides.

[0102] For example, the first substrate 4 and the second substrate 5 are both PET (Polyethylene terephthalate) sheets. In other embodiments, the first substrate 4 and the second substrate 5 may also be other flexible transparent materials.

[0103] Optionally, the conductive solution can be applied to the first substrate 4 using methods such as blade coating, sheet coating, inkjet printing, transfer printing, drop coating, or roll-to-roll coating. After the conductive solution cures, a first conductive layer 1 is formed on the first substrate. Alternatively, the first conductive layer 1 can be formed on the first substrate 4 using methods such as physical vapor deposition or chemical vapor deposition.

[0104] Similarly, optionally, the conductive solution can be applied to the second substrate 5 using methods such as blade coating, sheet coating, inkjet printing, transfer printing, drop coating, or roll-to-roll coating. After the conductive solution cures, a second conductive layer 2 is formed on the first substrate. Alternatively, the second conductive layer 2 can be formed on the second substrate 5 using methods such as physical vapor deposition or chemical vapor deposition.

[0105] Optionally, in the actual production process, a first conductive substrate with a first conductive layer 1 and a second conductive substrate with a second conductive layer 2 can be directly purchased.

[0106] Both the first conductive substrate and the second conductive substrate are flexible materials. After forming a first basic structure by setting a first base material layer 61 on the surface of the first conductive layer 1 of the first conductive substrate, the substrate is wound up. After forming a second basic structure by setting a second base material 63 on the surface of the second conductive layer 2 of the second conductive substrate, the substrate is wound up.

[0107] In related technologies, an electro-optic dielectric layer 62, such as an electrolyte layer, needs to be provided between the first basic structure and the second basic structure so that the first basic material layer 61 and the second basic material layer 63 can undergo reversible and stable electrochemical changes after being energized.

[0108] In related technologies, the preparation method of electrochromic devices further includes: unwinding a first base structure and a second base structure respectively, placing the first base material layer 61 and the second base material layer 63 opposite to each other, passing the first base structure and the second base structure through a pair of opposing rolling rollers, and dripping an electrolyte solution between the first base material layer 61 and the second base material layer 63, and then curing the electrolyte solution to form an electrochromic film.

[0109] In this application, the electro-optic dielectric layer 62 and the conductive layer 3 are integrally formed. This allows the electrochromic device of this embodiment to be manufactured using the equipment and production processes described above, with only changes to the material disposed between the first base material layer 61 and the second base material layer 63, and adjustments to the distance between the first base material layer 61 and the second base material layer 63. This requires minimal modification, thereby reducing the production cost and improving production efficiency of the electrochromic device of this embodiment. Specifically, in the embodiments of this application, the distance between the first base material layer 61 and the second base material layer 63 is limited by defining the distance between the two rollers.

[0110] In some embodiments, an electro-optic dielectric layer 62 is formed between a first base material layer 61 and a second base material layer 63, and a conductive layer 3 is formed between a first conductive region 11 and a second conductive layer 2 to conduct the first conductive region 11 and the second conductive layer 2, including:

[0111] The conductive particles 31 are mixed with the electro-optic dielectric solution to form a second mixed solution; the second mixed solution is disposed between the first base material layer 61 and the second base material layer 63, and the second mixed solution extends to the space between the first conductive region 11 and the second conductive layer 2.

[0112] Through the above steps, after the second mixed solution solidifies, a conductive layer 3 is formed between the first conductive region 11 and the second conductive layer 2, and an electro-optic dielectric layer 62 is formed between the first base material layer 61 and the second base material layer 63. The electro-optic dielectric layer 62 and the conductive layer 3 are integrally formed. Based on the above analysis, it can be seen that through the above steps, the electrochromic device of this embodiment can be manufactured using the equipment and production process described in the related technologies, by only changing the material disposed between the first base material layer 61 and the second base material layer 63, and adjusting the distance between the first base material layer 61 and the second base material layer 63. This requires minimal modification, thereby reducing the production cost of the electrochromic device of this embodiment and improving production efficiency.

[0113] In this embodiment, by adding conductive particles 31 to the electro-optic dielectric solution, the electro-optic dielectric layer 62 and the conductive layer 3 can be integrally formed by drop coating and rolling, which speeds up the production process.

[0114] Optionally, the electro-optic dielectric solution can be an electrolyte solution.

[0115] In some embodiments, an electro-optic dielectric layer 62 is formed between a first base material layer 61 and a second base material layer 63, and a conductive layer 3 is formed between a first conductive region 11 and a second conductive layer 2 to conduct the first conductive region 11 and the second conductive layer 2, including:

[0116] A first mixed solution containing conductive particles 31 is disposed between at least a portion of the surface of the first conductive region 11 and the second conductive layer 2; an electro-optic dielectric solution is disposed between the first base material layer 61 and the second base material layer 63.

[0117] Through the above steps, after the first mixed solution cures, a conductive layer 3 electrically connected to the first conductive region 11 and the second conductive layer 2 can be formed between at least a portion of the surface of the first conductive region 11 and the second conductive layer 2; after the electro-optic dielectric solution cures, an electro-optic dielectric layer 62 can be formed between the first base material layer 61 and the second base material layer 63; and the conductive layer 3 and the electro-optic dielectric layer 62 are formed separately. The electro-optic dielectric layer 62 is non-conductive, which can prevent a short circuit from occurring because the electro-optic dielectric layer 62 conducts through the first conductive layer 1 and the second conductive layer 2.

[0118] It should be noted that the above two steps are performed separately, and the order in which they are performed is not restricted.

[0119] The first mixed solution containing conductive particles 31 can be drop-coated between at least a portion of the surface of the first conductive area 11 and the second conductive layer 2. After the first mixed solution is cured by ultraviolet light or heating, a conductive layer 3 is formed. Then, the electro-optic dielectric solution is drop-coated between the first base material layer 61 and the second base material layer 63. After the electro-optic dielectric solution is cured by ultraviolet light or heating, an electro-optic dielectric layer 62 is formed.

[0120] Alternatively, the electro-optic dielectric solution can be drop-coated between the first base material layer 61 and the second base material layer 63. After the electro-optic dielectric solution cures, an electro-optic dielectric layer 62 is formed. Then, a first mixed solution containing conductive particles 31 is placed between at least a portion of the surface of the first conductive region 11 and the second conductive layer 2. After the first mixed solution cures, a conductive layer 3 is formed.

[0121] In this embodiment, since insulation is required between the first base material layer 61 and the second base material layer 63, the electro-optic dielectric layer 62 and the conductive layer 3, which require insulation, are set separately to improve the reliability of production.

[0122] In other embodiments of this application, an electro-optic dielectric solution may be first drop-coated between the first base material layer 61 and the second base material layer 63, and a first mixed solution may be drop-coated between the first conductive region 11 and the second conductive layer 2, and then the electrochromic film semi-finished product may be placed together in an ultraviolet environment for curing.

[0123] On the one hand, the conductive layer 3 can conduct the second conductive layer 2 and the first conductive region 11; on the other hand, the layer structure of the conductive layer 3 plays a role in spacing and supporting, separating the second conductive layer 2 and the second conductive region 12, avoiding short circuits caused by contact between the second conductive layer 2 and the second conductive region 12, and supporting the first conductive region 11 and part of the second conductive layer 2, making the structure of the entire device more stable.

[0124] It should be noted that the conductive particles 31 can contact two objects whose distance is smaller than the particle size of the conductive particles 31. When the conductive particles 31 contact two objects, the two objects can be electrically connected to each other through the conductive particles 31. That is, the conductive layer 3 can conduct electricity between two objects whose distance is smaller than the particle size of the conductive particles 31, but will not conduct electricity between two objects whose distance is larger than the particle size of the conductive particles 31.

[0125] Therefore, please refer to Figure 3 , Figure 4 and Figure 5 Based on any of the above embodiments, improvements are made. In some embodiments of this application, the distance (L) between the first base material layer 61 and the second base material layer 63 is controlled to be greater than the particle size (D) of the conductive particles 31 by limiting the distance between the two rollers, so as to prevent the conductive particles 31 in the electro-optic dielectric layer 62 from contacting the first base material layer 61 and the second base material layer 63, resulting in a short circuit between the second conductive area 12 and the second conductive layer 2.

[0126] In some embodiments, the distance L between the first base material layer 61 and the second base material layer 63 is ≥2*D, or L≥D+2µm. The distance between the first base material layer 61 and the second base material layer 63 is greater than twice the particle size of the conductive particles 31, reducing the possibility of conductive particles 31 stacking and thus making the first base material layer 61 and the second base material layer 63 conductive, thereby further improving the reliability of the electrochromic device.

[0127] It should be noted that, please refer to Figure 3 , Figure 4 and Figure 5 The distance between the first conductive layer 1 and the second conductive layer 2 is controlled such that the distance (H) between the first conductive region 11 and the second conductive layer 2 is less than or equal to the particle size (D) of the conductive particles 31, so that the conductive particles 31 in the conductive layer 3 can conduct electricity between the first conductive region 11 and the second conductive layer 2.

[0128] By defining the relationship between the particle size of the conductive particles 31 in the conductive layer 3 and the distance between the first conductive region 11 and the second conductive layer 2, the conductive particles 31 in the conductive layer 3 can contact the surfaces of the first conductive region 11 and the second conductive layer 2 respectively, so that the first conductive region 11 and the second conductive layer 2 are electrically connected.

[0129] It should be noted that, in order to ensure the stability of the electrical connection relationship between the first conductive region 11 and the second conductive layer 2, the distance between the first conductive layer 1 and the second conductive layer 2 can be further reduced to increase the contact area between the conductive particles 31 and the first conductive region 11, and between the conductive particles 31 and the second conductive layer 2, thereby increasing the probability of conduction.

[0130] Optionally, H < D - 2um, or, H < D / 2.

[0131] The proportional relationship between the particle size of the conductive particles 31 and the distance between the first conductive region 11 and the second conductive layer 2 needs to be maintained within a suitable range; generally, the gap between the first conductive region 11 and the second conductive layer 2 is less than half of the particle size of the conductive particles 31, or less than a preset value (such as the particle size of the conductive particles 31 - 2um). This enables the conductive particles 31 to effectively conduct between the first conductive region 11 and the second conductive layer 2, and also prevents the particle size of the conductive particles 31 from being too large and piercing through the second conductive layer 2 and the first conductive region 11, thereby affecting the conductive performance.

[0132] In some embodiments, D = 7um - 100um.

[0133] In one embodiment, L = 30um, D is 4um - 15um, and H is 2um - 13um.

[0134] Optionally, the first mixed solution can be various types of glue solutions such as an acrylic resin system, an epoxy resin system, a silicone system, etc. containing the conductive particles 31, or the first mixed solution is an electro-optical medium solution containing the conductive particles 31, such as an electrolyte solution.

[0135] The conductive particles 31 are conductive spheres, which can be pure metal spheres made of good conductive metals such as gold, silver, nickel, copper, or their alloys, or spheres with a plastic core and a metal outer layer.

[0136] In some embodiments, in the conduction layer 3 and / or the electro-optical medium layer 62, the density of the conductive particles 31 is 1000 particles / cm 2 - 100000 particles / cm 2 .

[0137] It should be noted that the density of the conductive particles 31 refers to the number of particles of the conductive particles 31 included in each square centimeter of the conduction layer 3 or each square centimeter of the electro-optical medium layer 62.

[0138] Please refer to Figure 3If the density of conductive particles 31 is too high, the conductive particles 31 will overlap, forming a conductor. This can easily lead to the overlap of conductive particles 31 in the electro-optic dielectric layer 62, causing the electro-optic dielectric layer 62 to conduct through the first base material layer 61 and the second base material layer 63, which in turn will conduct through the second conductive region 12 and the second conductive layer 2, causing a short circuit. However, if the density of conductive particles 31 is too low, the conductive layer 3 will not be able to effectively conduct through the first conductive region 11 and the second conductive layer 2.

[0139] Therefore, by limiting the density of conductive particles 31, the conductive layer 3 can effectively conduct the first conductive region 11 and the second conductive layer 2, and the electro-optic dielectric layer 62 does not conduct the first base material layer 61 and the second base material layer 63.

[0140] It should be noted that the density of the conductive particles 31 can be adjusted by combining the particle size of the conductive particles 31 with the thickness of the conductive layer 3 (the distance between the first conductive region 11 and the second conductive layer 2) and the thickness of the electro-optic dielectric layer 62 (the distance between the first base material layer 61 and the second base material layer 63).

[0141] In some embodiments, a first conductive layer 1 is provided, and a first conductive region 11 and a second conductive region 12 that are mutually insulated are formed on the first conductive layer 1 by laser etching, and a first base material layer 61 is formed on at least a portion of the surface of the second conductive region 12, including: setting the first base material layer 61 on the first conductive layer 1, and removing the first base material layer 61 on at least a portion of the surface of the first conductive region 11 to expose at least a portion of the first conductive region 11.

[0142] Please refer to Figure 12 It should be noted that the method for forming mutually insulated first conductive regions 11 and second conductive regions 12 on the first conductive layer 1 can be: forming at least one closed annular etch line 14 on the first conductive layer 1 of the first conductive substrate by laser etching, wherein the first conductive layer 1 inside the annular etch line 14 is the first conductive region 11, and the first conductive layer 1 outside the annular etch line 14 is the second conductive region 12.

[0143] In some other embodiments, in order to ensure the insulation between the first conductive region 11 and the second conductive region 12, the width of the annular etch line 14 can be widened, or multiple annular etch lines 14 can be provided, in order to reduce the risk of conduction between the second conductive region 12 and the first conductive region 11.

[0144] Specifically, the width of the annular etched line 14 can be 0.1um-1000mm.

[0145] It is worth noting that the order in which the first conductive region 11 and the second conductive region 12 forming insulation are formed, and the order in which the first base material layer 61 is formed on a portion of the surface of the second conductive region 12, is not limited in this application. Those skilled in the art can adjust the order according to actual production needs.

[0146] Specifically, in one embodiment, at least one closed annular etch line 14 is first formed on the first conductive layer 1 of the first conductive substrate by laser etching, and then a first base material solution is applied to the first conductive layer 1. Optionally, the first base material solution can be wiped off at least a portion of the surface of the first conductive region 11, and after the first base material solution solidifies, a first base material layer 61 can be formed on the first conductive layer 1. Optionally, the first base material layer 61 can be etched off at least a portion of the surface of the first conductive region 11 after the first base material solution has solidified to form the first base material layer 61.

[0147] Specifically, in one embodiment, a first base material solution is first applied to the first conductive layer 1 of the first conductive substrate. Part of the first base material solution can be wiped away, and after the first base material solution solidifies, a portion of the surface of the first conductive layer 1 is exposed to the first base material layer 61. Alternatively, after the first base material solution solidifies to form the first base material layer 61, a portion of the first base material layer 61 corresponding to the first conductive region 11 can be etched and wiped away, exposing a portion of the surface of the first conductive layer 1 to the first base material layer 61. The edges of the first conductive layer 1 exposed to the first base material layer 61 are etched to form the aforementioned annular etch line 14.

[0148] Optionally, the first base material solution can be applied to the first conductive layer 1 of the first conductive substrate by means of scraping, sheet coating, inkjet printing, transfer, drop coating, roll-to-roll coating, etc.

[0149] In some embodiments, a second conductive layer 2 is provided, and a second base material layer 63 is formed on at least a portion of the surface of the second conductive layer 2, including: disposing the second base material layer 63 on the second conductive layer 2, and removing a portion of the second base material layer 63 on a portion of the surface of the second conductive layer 2 corresponding to the first conductive region 11 to expose a portion of the second conductive layer 2.

[0150] In one embodiment, a second base material layer 63 is disposed on the second conductive layer 2. The method for removing a portion of the second base material layer 63 on the surface of the second conductive layer 2 corresponding to the first conductive region 11 to expose a portion of the second conductive layer 2 can be as follows: First, a second base material solution is disposed on the second conductive layer 2 of the second conductive substrate. The second base material solution on the surface of the second conductive layer 2 corresponding to the first conductive region 11 is wiped away. After the second base material solution solidifies, a portion of the surface of the second conductive layer 2 is exposed to the second base material layer 63. Alternatively, after the second base material solution solidifies to form the second base material layer 63, a portion of the second base material layer 63 is etched away, exposing a portion of the surface of the second conductive layer 2 to the second base material layer 63. This method of first disposing of a base material layer covering the entire surface and then removing localized base material using methods such as wiping is less demanding, as the area where the base material is wiped is relatively small, eliminating the need for precision instruments for coating and reducing equipment requirements.

[0151] Optionally, the second base material solution can be applied to the second conductive layer 2 of the second conductive substrate by means of methods such as scraping, sheet coating, inkjet printing, transfer, drop coating, roll-to-roll coating, etc.

[0152] It should be noted that the electrical connection between the first conductive region 11 and the second conductive layer 2 is achieved by the conductive particles 31 in the conductive layer 3. That is, the conductive particles 31 contact the first conductive region 11 and the second conductive layer 2 respectively, thereby making the first conductive region 11 and the second conductive layer 2 electrically connected.

[0153] To ensure the stability of the electrical connection between the first conductive region 11 and the second conductive layer 2, the distance between the first conductive layer 1 and the second conductive layer 2 can be further reduced to increase the contact area between the conductive particles 31 and the first conductive region 11 and the second conductive layer 2.

[0154] However, if the distance between the first conductive layer 1 and the second conductive layer 2 is too small, the thickness of the first base material layer 61, the second base material layer 63, or the electro-optic dielectric layer 62 disposed between the first conductive layer 1 and the second conductive layer 2 will be too thin, which will affect the color-changing effect of the electrochromic device.

[0155] To address the aforementioned issues, in some embodiments, before aligning the first base material layer 61 and the second base material layer 63, the following further steps are included:

[0156] A first bus layer 13 is provided on at least a portion of the surface of the first conductive region 11; and / or a second bus layer 21 is provided on the second conductive layer 2 corresponding to at least a portion of the surface of the first conductive region 11.

[0157] Specifically, a first busbar layer 13 is formed before the first base material layer 61 is set, and a second busbar layer 21 is formed before the second base material layer 63 is set.

[0158] By following the above steps, the thickness of the conductive layer 3 can be reduced while ensuring that the distance between the first conductive layer 1 and the second conductive layer 2 is not too small. Increasing the thickness difference between the conductive layer 3 and the electro-optic dielectric layer 62 prevents the conductive layer 3 from conducting through the first base material layer 61 and the second base material layer 63.

[0159] Please refer to Figure 7 and Figure 8 A first bus layer 13 can be disposed on the surface of the first conductive region 11 near the second conductive layer 2. The first bus layer 13 protrudes from the surface of the first conductive layer 1.

[0160] Specifically, when the first base material layer 61 and the second base material layer 63 are placed opposite each other, it is necessary to control the distance between the first busbar layer 13 and the second conductive layer 2 so that the distance between the first busbar layer 13 and the second conductive layer 2 is less than or equal to the particle size of the conductive particles 31.

[0161] Alternatively, please refer to Figure 5 and Figure 6 A second bus layer 21 can be disposed on the second conductive layer 2. The second bus layer 21 protrudes from the surface of the second conductive layer 2.

[0162] Specifically, when the first base material layer 61 and the second base material layer 63 are placed opposite each other, it is necessary to control the distance between the first conductive region 11 and the second busbar layer 21 so that the distance between the first conductive region 11 and the second busbar layer 21 is less than or equal to the particle size of the conductive particles 31.

[0163] Alternatively, please refer to Figure 3 and Figure 4 A first bus layer 13 can be disposed on the surface of the first conductive region 11 near the second conductive layer 2, and a second bus layer 21 can be disposed on the second conductive layer 2 at the same time.

[0164] Specifically, when the first base material layer 61 and the second base material layer 63 are placed opposite each other, it is necessary to control the distance between the first busbar layer 13 and the second busbar layer 21 so that the distance between the first conductive region 11 and the second busbar layer 21 is less than or equal to the particle size of the conductive particles 31.

[0165] Optionally, the material of the first bus layer 13 can be silver, copper, aluminum, etc., or the material of the first bus layer 13 can be the same as the material of the first conductive layer 1.

[0166] Optionally, the material of the second bus layer 21 can be silver, copper, aluminum, etc., or the material of the second bus layer 21 can be the same as that of the second conductive layer 2.

[0167] In some embodiments, an electro-optic dielectric layer 62 is formed between the first base material layer 61 and the second base material layer 63, and a conductive layer 3 is formed between the first conductive region 11 and the second conductive layer 2 to conduct the first conductive region and the second conductive layer, further comprising:

[0168] Pressure is applied toward the second conductive layer 2 at the position of the first conductive layer 1 corresponding to the conductive layer 3, and / or pressure is applied toward the first conductive layer 1 at the position of the second conductive layer 2 corresponding to the conductive layer 3.

[0169] Through the above steps, it is easy to control the thickness of the conductive layer 3 to be less than or equal to the particle size of the conductive particles 31, so that the electrical connection between the first conductive region 11 and the second conductive layer 2 in the finished electrochromic device is relatively stable.

[0170] In some embodiments, the pressure applied to the first conductive layer 1 and the second conductive layer 2 ranges from 1 MPa to 3 MPa.

[0171] Specifically, the pressure applied to the first conductive layer 1 and the second conductive layer 2 is preferably 2 MPa, and the compression time is preferably 3 minutes. Compression ensures effective conductivity between the first conductive area 11 and the second conductive layer 2.

[0172] In some embodiments, the method for manufacturing an electrochromic device further includes:

[0173] A conductive groove 7 is formed from the second conductive layer 2 through the surface of the first conductive layer 1, so that the first conductive area 11 and the second conductive area 12 are exposed through the conductive groove 7.

[0174] Through the above steps, the surfaces of the first conductive region 11 and the second conductive region 12 facing the second conductive layer 2 can be exposed through the conductive groove 7, and electrically connected to the positive and negative terminals of the external power supply respectively through the conductive groove 7.

[0175] Specifically, a conductive groove 7 is formed on the electrochromic film, and the conductive groove 7 penetrates the second substrate 5, the second conductive layer 2, the second base material layer 63, the electro-optic dielectric layer 62, the first base material layer 61 and the conductive layer 3.

[0176] In some embodiments, the method for manufacturing an electrochromic device further includes:

[0177] A sealing groove is opened that penetrates the second conductive layer 2.

[0178] A sealing element 8 is provided within the sealing groove; the sealing groove is an annular groove, and a conductive groove 7 connects to the sealing groove. The sealing element fills the sealing groove and extends into the conductive groove 7, covering the first lead-out structure 9 and the second lead-out structure 10. The exposed first conductive area 11 and second conductive area 12 extend away from the sealing groove, and the orthographic projection of the conductive groove 7 on the first conductive layer 1 is located outside the outer contour of the orthographic projection of the sealing groove on the first conductive layer 1.

[0179] Through the above steps, the sealing element 8 is made into a ring structure, and part of the first base material layer 61, the electro-optic dielectric layer 62 and the second base material layer 63 are confined within the closed space formed by the sealing element 8, the first conductive layer 1 and the second conductive layer 2, so as to enhance the sealing effect of the electrochromic device.

[0180] Please refer to the following: Figure 9 and Figure 10 Specifically, the sealing groove penetrates the second substrate 5, the second conductive layer 2, the second base material layer 63, the electro-optic dielectric layer 62, and the first base material layer 61.

[0181] It should be noted that there is no specific order in which the sealing groove and the conductive groove 7 are opened.

[0182] A sealing groove is formed on the aforementioned electrochromic film.

[0183] Please refer to Figure 2 In some embodiments, the method for fabricating an electrochromic device further includes: cutting excess second conductive layer 2, first base material layer 61, electro-optic dielectric layer 62 and second base material layer 63 along the edge of the seal to form an electrochromic device.

[0184] Please refer to Figure 2 It should be noted that when cutting along the edge of the seal, a portion of the first conductive layer 1 needs to be retained, so that a portion of the first conductive area 11 and a portion of the second conductive area 12 are exposed to the seal 8.

[0185] In some embodiments, the method for manufacturing an electrochromic device further includes:

[0186] Provide an outgoing component, which includes a first outgoing structure 9 and a second outgoing structure 10.

[0187] The first lead-out structure 9 is electrically connected to the first conductive area 11 via the conductive groove 7.

[0188] The second lead-out structure 10 is electrically connected to the second conductive area 12 via the conductive groove 7.

[0189] By providing the first lead-out structure 9 and the second lead-out structure 10, it is convenient to electrically connect the first conductive region 11 and the second conductive region 12 in the first conductive layer 1 to the positive and negative terminals of an external power supply. Especially... Figure 9 In the embodiment shown, a portion of the surface of the first conductive region 11 and a portion of the surface of the second conductive region 12 are located inside the conductive groove 7, making it difficult for the positive and negative terminals of the external power supply to extend into the conductive groove 7 and connect with the first conductive region 11 and the second conductive region 12.

[0190] It should be noted that the first lead-out structure 9 and the second lead-out structure 10 can be separately configured. In this embodiment, the first lead-out structure 9 and the second lead-out structure 10 can be two independent FPCs.

[0191] However, since the electrochromic device of this application embodiment can lead out electrodes on one side, the first lead-out structure 9 and the second lead-out structure 10 can be disposed on the same surface of the same carrier plate (such as a circuit board), and the first lead-out structure and the second lead-out structure are integrally disposed. Specifically, the conductive ends of the first lead-out structure 9 and the second lead-out structure 10 are disposed on the same surface of the same carrier plate, so as to facilitate the removal of the first lead-out structure 9 and the second lead-out structure 10 from the positive and negative terminals of the external power supply. Moreover, the conductive ends of the first lead-out structure 9 and the second lead-out structure 10 face the same surface, and can be directly bonded to the first conductive area 11 and the second conductive area 12, simplifying the manufacturing process of the electrochromic device of this application embodiment.

[0192] Please refer to Figures 1 to 4 This application provides an electrochromic device, comprising a first conductive layer 1, a first base material layer 61, a conductive layer 3, an electro-optic dielectric layer 62, a second base material layer 63, and a second conductive layer 2, stacked together; wherein,

[0193] The first conductive layer 1 includes a first conductive region 11 and a second conductive region 12 that are insulated from each other. A first base material layer 61 is disposed on the first conductive layer 1, and at least part of the first conductive region 11 is exposed on the first base material layer 61.

[0194] The second conductive layer 2 has a first surface 22 and a second surface 23 facing the first conductive layer 1. The second base material layer 63 is disposed on the second conductive layer 2, and at least part of the first surface 22 is exposed on the second base material layer 63. The first surface 22 exposed on the second base material layer 63 is at least partially opposite to the first conductive region 11 exposed on the first base material layer 61.

[0195] The conductive layer 3 is located between a portion of the first surface 22 exposed on the second base material layer 63 and a portion of the first base material layer 61 exposed on the second base material layer 63. The conductive layer 3 connects the first surface 22 with the first conductive area 11.

[0196] The electro-optic dielectric layer 62 is located between the first base material layer 61 and the second base material layer 63.

[0197] In the electrochromic device provided in this application, the first conductive region 11 and the second conductive region 12 are electrically insulated from each other, and the first conductive region 11 and the second conductive layer 2 are electrically connected through the conductive layer 3. This allows the electrical conductivity of the first conductive layer 1 and the second conductive layer 2 to be led to the same side of the electrochromic device. Therefore, lead-out electrodes can be arranged on the same side of the first conductive region 11 and the second conductive region 12, eliminating the need for separate leads on both sides. This solves the technical problem of requiring separate leads on both sides in the prior art, and has advantages such as simplifying the electrical connection method of the electrochromic device and facilitating production and streamlining the production process.

[0198] On the one hand, the conductive layer 3 can conduct the second conductive layer 2 and the first conductive region 11. On the other hand, the layer structure of the conductive layer 3 plays a role in spacing and supporting, separating the second conductive layer 2 and the second conductive region 12 to prevent the second conductive layer 2 and the second conductive region 12 from contacting and causing a short circuit. The conductive layer 3 supports the first conductive region 11 and part of the second conductive layer 2, making the structure of the entire device more stable.

[0199] The first base material layer 61 is one of an electrochromic layer and an ion storage layer, and the second base material layer 63 is the other of an electrochromic layer and an ion storage layer.

[0200] Please refer to Figure 11 It should be noted that both the first conductive layer 1 and the second conductive layer 2 are ITO (Indium-TinOxide) conductive films or other transparent conductive oxide films. The first conductive layer 1 and the second conductive layer 2 are relatively soft and cannot exist independently. Generally, both the first conductive layer 1 and the second conductive layer 2 are disposed on a substrate. The substrate serves to support and protect the first conductive layer 1 and the second conductive layer 2, and facilitates their transportation and storage. Therefore, the electrochromic device in this embodiment further includes a first substrate 4 and a second substrate 5; the first conductive layer 1 is disposed on the first substrate 4, and the first conductive layer 1 and the first substrate 4 together form the first conductive substrate; the second conductive layer 2 is disposed on the second substrate 5, and the second conductive layer 2 and the second substrate together form the second conductive substrate.

[0201] Generally, the substrate is PET (Polyethylene terephthalate) sheet or other transparent flexible substrate.

[0202] Specifically, the first conductive region 11 and the second conductive region 12 are arranged on one surface of the first substrate 4.

[0203] Specifically, one of the partial surface of the first conductive region 11 and the partial surface of the second conductive region 12 is used for electrical connection with the positive terminal of an external power supply, and the other is used for electrical connection with the negative terminal of an external power supply.

[0204] Please refer that the stacking direction of the first conductive layer 1, the first base material layer 61, the electro-optical dielectric layer 62, the second base material layer 63 and the second conductive layer 2 is parallel to the X direction in the figure.

[0205] In some embodiments, in the X direction, the distance H between the first conductive region 11 and the first surface 22, the conduction layer 3 includes conductive particles 31, the particle size of the conductive particles 31 is D, and H≤D.

[0206] It should be noted that the conductive particles 31 can respectively contact two objects with a distance less than the particle size of the conductive particles 31. When the conductive particles 31 respectively contact the two objects, the two objects can be electrically connected to each other through the conductive particles 31, that is, the conduction layer 3 can conduct two objects with a distance less than the particle size of the conductive particles 31, and will not conduct two objects with a distance greater than the particle size of the conductive particles 31.

[0207] Therefore, in the present application, since the distance between the first conductive region 11 and the first surface 22 is less than or equal to the particle size of the conductive particles 31, the conductive particles 31 in the conduction layer 3 can respectively contact the first conductive region 11 and the first surface 22, so that the conduction layer 3 can conduct the first conductive region 11 and the second conductive layer 2.

[0208] Specifically, the conduction layer 3 is formed by curing a solution mixed with the conductive particles 31 and an insulating material.

[0209] Optionally, the insulating material can be various types of glue solutions such as acrylic resin systems, epoxy resin systems, silicone systems, etc.; or the insulating material is an electro-optical dielectric solution, such as an electrolyte solution.

[0210] It should be noted that the conductive particles 31 are conductive spheres. The conductive particles 31 can be pure metal spheres made of good conductor metals such as gold, silver, nickel, copper or their alloys, or spheres with a plastic core and a metal outer layer.

[0211] It should be noted that in order to ensure the stability of the electrical connection relationship between the first conductive region 11 and the second conductive layer 2, the distance between the first conductive layer 1 and the second conductive layer 2 can be further reduced to increase the contact area between the conductive particles 31 and the first conductive region 11, and between the conductive particles 31 and the second conductive layer 2.

[0212] Optionally, H<D-2um, or, H<D / 2.

[0213] The ratio between the particle size of the conductive particles 31 and the distance between the first conductive region 11 and the first surface 22 needs to be maintained within a suitable range. Generally, the gap between the first conductive region 11 and the second conductive layer 2 is less than half the particle size of the conductive particles 31, or less than a preset value (e.g., the particle size of the conductive particles 31 is -2 μm). This ensures that the conductive particles 31 can effectively conduct electricity between the first conductive region 11 and the second conductive layer 2, while also preventing the conductive particles 31 from being too large and penetrating the second conductive layer 2 and the first conductive region 11, thereby affecting the conductivity.

[0214] In some embodiments, D = 7um-100um.

[0215] It should be noted that in some embodiments, during actual production, the electro-optic dielectric layer 62 and the conductive layer 3 are formed by curing the same material, allowing them to be integrally molded during the fabrication of the electrochromic device. This simplifies the production process by requiring only a solution between the first conductive layer 1 and the second conductive layer 2. Furthermore, it should be noted that the conductive layer 3 connects the second conductive layer 2 and the first conductive region 11, while the electro-optic dielectric layer 62 does not connect the second conductive region 12 and the second conductive layer 2.

[0216] The distance between the first base material layer 61 and the second base material layer 63 needs to be controlled within a range larger than the particle size of the conductive particles 31, so as to ensure that the electro-optic dielectric layer 62 does not conduct electricity to the second conductive region 12 and the second conductive layer 2. That is, in the X direction, the distance (L) between the first base material layer 61 and the second base material layer 63 is greater than D.

[0217] In some embodiments, L≥2D, or L≥D+2um.

[0218] In one embodiment, L = 30 μm, D = 4-15 μm, and H = 2-13 μm.

[0219] It should be noted that by reducing the distance between the first conductive layer 1 and the second conductive layer 2, the distance between the first conductive region 11 and the first surface 22 can be further reduced, thereby ensuring the stability of the electrical connection between the first conductive region 11 and the second conductive layer 2. However, if the distance between the first conductive layer 1 and the second conductive layer 2 is too small, the thickness of the first base material layer 61, the second base material layer 63, or the electro-optic dielectric layer 62 disposed between the first conductive layer 1 and the second conductive layer 2 will be too thin, which will affect the color-changing effect of the electrochromic device.

[0220] In view of the above issues, please refer to Figures 3 to 8In some embodiments, the electrochromic device further includes a first bus layer 13, which is located between the first conductive region 11 and the conductive layer 3; and / or, the electrochromic device further includes a second bus layer 21, which is located between the first surface 22 and the conductive layer 3.

[0221] Please refer to Figure 7 and Figure 8 A first busbar 13 can be disposed on the surface of the first conductive region 11 near the second conductive layer 2; or, please refer to Figure 5 and Figure 6 A second busbar layer 21 can be disposed on the first surface 22; or, please refer to Figure 3 and Figure 4 A first bus layer 13 can be disposed on the surface of the first conductive region 11 near the second conductive layer 2, and a second bus layer 21 can be disposed on the first surface 22 at the same time, so as to reduce the thickness of the conductive layer 3 while ensuring that the distance between the first conductive region 11 and the first surface 22 is not too small.

[0222] Please refer to Figure 7 and Figure 8 In the illustrated embodiment, it should be noted that on a projection plane perpendicular to the X direction, the orthographic projection of the first busbar 13 and the orthographic projection of the second conductive layer 2 at least partially overlap. The conductive layer 3 is located between the first busbar 13 and the second conductive layer 2, and the two opposing surfaces of the conductive layer 3 are in contact with the first busbar 13 and the second conductive layer 2, respectively.

[0223] Please refer to Figure 5 and Figure 6 In the illustrated embodiment, it should be noted that on a projection plane perpendicular to the X direction, the orthographic projection of the second bus layer 21 at least partially overlaps with the orthographic projection of the first conductive region 11. The conductive layer 3 is located between the second bus layer 21 and the first conductive region 11, and the two opposing surfaces of the conductive layer 3 are in contact with the second bus layer 21 and the first conductive region 11, respectively.

[0224] Please refer to Figure 3 and Figure 4 In the illustrated embodiment, it should be noted that on a projection plane perpendicular to the X direction, the orthographic projection of the first bus layer 13 and the orthographic projection of the second bus layer 21 at least partially overlap. The arrangement of the first bus layer 13 and the second bus layer 21 results in a more uniform thickness of the electrochromic device, preventing excessive protrusion that could affect storage and transportation. The conductive layer 3 is located between the first bus layer 13 and the second bus layer 21, and its two opposing surfaces are in contact with the first bus layer 13 and the second bus layer 21, respectively.

[0225] Optionally, the material of the first bus layer 13 can be silver, copper, aluminum, etc., or the material of the first bus layer 13 can be the same as the material of the first conductive layer 1.

[0226] Optionally, the material of the second bus layer 21 can be silver, copper, aluminum, etc., or the material of the second bus layer 21 can be the same as that of the second conductive layer 2.

[0227] The first busbar 13 can extend circumferentially along the first conductive region 11, and the second busbar 21 can also extend circumferentially along the second conductive layer 2, forming a busbar strip. By setting the busbar strip, the current from the external power source is quickly conducted to the conductive layer, which has the beneficial effect of accelerating the color change.

[0228] Please refer to Figure 3 and Figure 4 In other embodiments, the electrochromic device is provided with a conductive groove 7, which penetrates the second conductive layer 2, the second base material layer 63, the conductive layer 3, the electro-optic dielectric layer 62 and the first base material layer 61 to expose a portion of the first conductive region 11 and a portion of the second conductive region 12. The exposed portion of the first conductive region 11 and the portion of the second conductive region 12 are electrically connected to the positive and negative terminals of an external power supply through the conductive groove 7, respectively.

[0229] By providing the conductive groove 7, the surfaces of the first conductive area 11 and the second conductive area 12 facing the second conductive layer 2 can be exposed through the conductive groove 7, so that the surfaces of the first conductive area 11 and the second conductive area 12 facing the second conductive layer 2 can be electrically connected to the positive and negative terminals of the external power supply, respectively.

[0230] Please refer to Figure 4 Specifically, the conductive groove 7 can be located at the edge of the electrochromic device. Please refer to [reference needed]. Figure 3 Specifically, the conductive groove 7 can be located inside the electrochromic device.

[0231] exist Figure 3 and Figure 4 In the embodiment shown, the first conductive region 11 has a first exposed surface 111 and an electrical connection surface 112 facing the second conductive layer 2, and the second conductive region 12 has a second exposed surface 121 and an electrode surface 122 facing the second conductive layer 2. The first exposed surface 111 and the second exposed surface 121 are located in the conductive groove 7, and the first exposed surface 111 and the second exposed surface 121 are used to be electrically connected to the positive and negative terminals of an external power source through the conductive groove 7, respectively.

[0232] The second conductive layer 2 has a first surface 22 and a second surface 23 facing the first conductive layer 1. The first surface 22 is opposite to the first conductive region 11, and the second surface 23 is opposite to the second conductive region 12. A first base material layer 61 is disposed on the second conductive region 12, a second base material layer 63 is disposed on the second surface 23, and a conductive layer 3 is disposed between the first conductive region 11 and the first surface 22.

[0233] The conductive groove 7 penetrates the second substrate 5, the second conductive layer 2, the second base material layer 63, the conductive layer 3, the electro-optic dielectric layer 62, and the first base material layer 61, so that the first exposed surface 111 and the second exposed surface 121 are exposed through the conductive groove 7, and the first base material layer 61, which is not penetrated by the conductive groove 7, remains on the electrode surface 122, and the conductive layer 3, which is not penetrated by the conductive groove 7, remains on the electrical connection surface 112.

[0234] In some embodiments, the electrochromic device further includes a sealing member 8. The electrochromic device has a sealing groove that penetrates at least through the second conductive layer 2, the first base material layer 61, the electro-optic dielectric layer 62, and the second base material layer 63. The sealing member 8 is housed within the sealing groove, and the sealing member 8, the second conductive layer 2, and the second conductive region 12 enclose a closed space to seal the first base material layer 61, the electro-optic dielectric layer 62, and the second base material layer 63 located within the closed space.

[0235] The above settings prevent moisture from entering the first base material layer 61, electro-optic dielectric layer 62, and second base material layer 63 within the sealed space, thereby avoiding problems such as failure of the first base material layer 61, electro-optic dielectric layer 62, and second base material layer 63 within the sealed space, making the electrochromic device less prone to damage.

[0236] Please refer to Figure 2 , Figure 9 , Figure 10 and Figure 11 In some embodiments, the sealing groove is an annular groove that extends from the second substrate 5 to the surface of the first conductive layer 1. The sealing member 8, in conjunction with the second conductive layer 2 and the first conductive layer 1, seals a portion of the first base material layer 61, a portion of the electro-optic dielectric layer 62, and a portion of the second base material layer 63. The sealing member 8 forms the outline of the electrochromic device.

[0237] Please refer to Figure 1 , Figure 2 and Figure 11 In some embodiments, the conductive groove 7 is located outside the enclosed space, and at least part of the conductive layer 3 is located inside the enclosed space.

[0238] In other words, the projection of the sealing groove onto the plane of the electrochromic device passes through the projection of the first conductive area 11 onto the plane of the electrochromic device. A portion of the conductive layer 3 between the first conductive area 11 and the second conductive area 12 is located inside the sealing groove, which is also the side of the sealing groove facing the center. The other portion of the first conductive area 11 is located outside the sealing groove, that is, at the edge. Through this arrangement, at least a portion of the conductive layer 3, a portion of the first base material layer 61, a portion of the electro-optic dielectric layer 62, and a portion of the second base material layer 63 are confined within the sealed space between the sealant 8, the first conductive layer 1, and the second conductive layer 2. The conductive groove 7 is located outside the sealed space, achieving conductivity while preventing moisture from entering the sealed space.

[0239] In some embodiments, the electrochromic device further includes a first lead-out structure 9 and a second lead-out structure 10; the first lead-out structure 9 is electrically connected to the first conductive region 11 and is used to be electrically connected to one of the positive and negative terminals of an external power source; the second lead-out structure 10 is electrically connected to the second conductive region 12 and is used to be electrically connected to the other of the positive and negative terminals of an external power source.

[0240] By providing an outlet structure, it is convenient to electrically connect the first conductive region 11 and the second conductive region 12 in the first conductive layer 1 to the positive and negative terminals of an external power supply. In particular, in the illustrated embodiment, the first exposed surface 111 of the first conductive region 11 and the second exposed surface 121 of the second conductive region 12 are both located inside the conductive groove 7, making it difficult for the positive and negative terminals of the external power supply to extend into the conductive groove 7 and connect to the first exposed surface 111 and the second exposed surface 121.

[0241] It should be noted that the first lead-out structure 9 and the second lead-out structure 10 can be separately configured. In this embodiment, the first lead-out structure 9 and the second lead-out structure 10 can be two independent FPCs.

[0242] However, since the electrochromic device of this application embodiment can lead out electrodes on one side, the first lead-out structure 9 and the second lead-out structure 10 can be disposed on the same surface of the same carrier plate (such as a circuit board). Specifically, the conductive end of the first lead-out structure 9 and the conductive end of the second lead-out structure 10 are disposed on the same surface of the same carrier plate, so as to facilitate the removal of the first lead-out structure 9 and the second lead-out structure 10 from the positive and negative terminals of the external power supply. Moreover, the conductive ends of the first lead-out structure 9 and the second lead-out structure 10 face the same surface and can be directly bonded to the first conductive area 11 and the second conductive area 12, simplifying the manufacturing process of the electrochromic device of this application embodiment.

[0243] The technical solution adopted in the third aspect of this application is: an electrochromic device, including a substrate layer and the electrochromic device of the first aspect embodiment described above.

[0244] The substrate layer is located on the side of the second conductive layer 2 away from the first conductive layer 1; and / or, the substrate layer is located on the side of the first conductive layer 1 away from the second conductive layer 2.

[0245] By applying the electrochromic device of the first aspect embodiment described above to the electrochromic apparatus, the electrochromic apparatus can have an electrode led out from one side, thereby simplifying the electrical connection method of the electrochromic apparatus.

[0246] Specifically, the electrochromic device includes two substrate layers, namely a first substrate layer and a second substrate layer. The first substrate layer is located on the side of the first conductive layer 1 away from the second conductive layer 2, and the second substrate layer is located on the side of the second conductive layer 2 away from the first conductive layer 1. The second substrate layer is provided with a first through hole communicating with the conductive groove 7, and the second substrate layer is provided with a second through hole communicating with the sealing groove.

[0247] The technical solution adopted in the fourth aspect of this application is: a product terminal, including the electrochromic device of the first aspect embodiment or the electrochromic device of the second aspect embodiment, wherein the terminal product includes any one of rearview mirror, curtain wall, car sunroof, car side window, car windshield, electronic product casing, glasses, vehicle and display panel.

[0248] By applying the electrochromic device of the first aspect embodiment or the electrochromic apparatus of the second aspect embodiment to the product terminal, the electrical connection method of the product terminal can be simplified.

[0249] The technical solution adopted in the third aspect of this application is: a product terminal, including the electrochromic device of the first aspect embodiment or the electrochromic apparatus of the second aspect embodiment, wherein the terminal product includes any one of a rearview mirror, a curtain wall, a car sunroof, a car side window, a car windshield, a housing of an electronic product, glasses, a vehicle, and a display panel.

[0250] By applying the electrochromic device of the first aspect embodiment or the electrochromic apparatus of the second aspect embodiment to the product terminal, the electrical connection method of the product terminal can be simplified, and all the advantages of the electrochromic device can be obtained.

[0251] The above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of this application, and should all be included within the protection scope of this application.

Claims

1. A method for manufacturing an electrochromic device, characterized in that, include: A first conductive layer is provided, on which a first conductive region and a second conductive region that are mutually insulated are formed, and a first base material layer is formed at least on a portion of the surface of the second conductive region. A second conductive layer is provided, and a second base material layer is formed on at least a portion of the surface of the second conductive layer; The first base material layer and the second base material layer are positioned opposite each other, wherein at least a portion of the surface of the first conductive region is opposite to the second conductive layer; An electro-optic dielectric layer is formed between the first base material layer and the second base material layer, and a conductive layer is formed between the first conductive region and the second conductive layer to conduct the first conductive region and the second conductive layer; the electro-optic dielectric layer and the conductive layer are integrally formed.

2. The method for manufacturing the electrochromic device according to claim 1, characterized in that, The step of forming an electro-optic dielectric layer between the first base material layer and the second base material layer, and forming a conductive layer between the first conductive region and the second conductive layer to conduct the first conductive region and the second conductive layer, includes: A first mixed solution comprising conductive particles is disposed between the first conductive region and the second conductive layer; an electro-optic dielectric solution is disposed between the first base material layer and the second base material layer; Alternatively, the conductive particles are mixed with an electro-optic dielectric solution to form a second mixed solution; the second mixed solution is disposed between the first base material layer and the second base material layer, and the second mixed solution extends to the space between the first conductive region and the second conductive layer.

3. The method for manufacturing the electrochromic device according to claim 2, characterized in that, The density of the conductive particles in the electro-optic dielectric layer is 1000 particles / cm³. 2 -100,000 particles / cm 2 .

4. The method for manufacturing an electrochromic device according to any one of claims 1 to 3, characterized in that, The provision of a first conductive layer, forming a first conductive region and a second conductive region that are mutually insulated on the first conductive layer, and forming a first base material layer on at least a portion of the surface of the second conductive region, includes: depositing the first base material layer on the first conductive layer, and removing the first base material layer on at least a portion of the surface of the first conductive region to expose at least a portion of the first conductive region. And / or, the provision of the second conductive layer and the formation of a second base material layer on at least a portion of the surface of the second conductive layer includes: depositing the second base material layer on the second conductive layer, and removing a portion of the second base material layer on the surface of the second conductive layer corresponding to the first conductive region to expose a portion of the second conductive layer.

5. The method for manufacturing the electrochromic device according to any one of claims 1 to 3, characterized in that, The step of placing the first base material layer and the second base material layer relative to each other further includes: A first bus layer is formed on at least a portion of the surface of the first conductive region; And / or, a second bus layer is disposed on at least a portion of the surface of the second conductive layer corresponding to the first conductive region.

6. The method for manufacturing an electrochromic device according to any one of claims 1 to 3, characterized in that, The method of forming an electro-optic dielectric layer between the first base material layer and the second base material layer, and forming a conductive layer between the first conductive region and the second conductive layer to conduct the first conductive region and the second conductive layer, further includes: A pressure is applied toward the second conductive layer at a location on the first conductive layer corresponding to the conductive layer, and / or a pressure is applied toward the first conductive layer at a location on the second conductive layer corresponding to the conductive layer.

7. The method for manufacturing the electrochromic device according to claim 6, characterized in that, The pressure range is 1 MPa to 3 MPa.

8. An electrochromic device, characterized in that, include: The system comprises a first conductive layer, a first base material layer, a conductive layer, an electro-optic dielectric layer, a second base material layer, and a second conductive layer, stacked together; wherein... The first conductive layer includes a first conductive region and a second conductive region that are insulated from each other. The first base material layer is disposed on the first conductive layer, and at least a portion of the first conductive region is exposed to the first base material layer. The second conductive layer has a first surface and a second surface facing the first conductive layer, the second base material layer is disposed on the second conductive layer, and at least a portion of the first surface is exposed to the second base material layer, the first surface exposed to the second base material layer is at least partially opposite to the first conductive region exposed to the first base material layer; The conductive layer is located between a portion of the first surface exposed on the second base material layer and a portion of the first surface exposed on the second base material layer, and the conductive layer connects the first surface to the first conductive area; The electro-optic dielectric layer is located between the first base material layer and the second base material layer; The electro-optic dielectric layer and the conductive layer are integrally formed.

9. The electrochromic device according to claim 8, characterized in that, The distance between the first conductive region and the first surface is H, and the conductive layer includes conductive particles with a particle size of D, where H ≤ D.

10. The electrochromic device according to claim 9, characterized in that, H < D - 2um, or H < D / 2.

11. The electrochromic device according to claim 10, characterized in that, The distance between the first base material layer and the second base material layer is L, where L > D.

12. The electrochromic device according to claim 11, characterized in that, L≥2D, or L≥D+2um.

13. The electrochromic device according to any one of claims 8 to 12, characterized in that, The value of D ranges from 7um to 100um.

14. The electrochromic device according to any one of claims 8 to 12, characterized in that, The electrochromic device further includes a first bus layer, and the first bus layer is located between the first conductive region and the conductive layer; And / or, the electrochromic device further includes a second bus layer, and the second bus layer is located between the first surface and the conductive layer.

15. The electrochromic device according to any one of claims 8 to 12, characterized in that, The electrochromic device is provided with a conductive groove that penetrates the second conductive layer, the second base material layer, the conductive layer, the electro-optic dielectric layer and the first base material layer, so as to expose a portion of the first conductive area and a portion of the second conductive area. The exposed portion of the first conductive area and the portion of the second conductive area are electrically connected to the positive and negative terminals of an external power supply through the conductive groove, respectively.

16. The electrochromic device according to claim 15, characterized in that, The electrochromic device further includes a sealing element, and the electrochromic device is provided with a sealing groove. The sealing groove penetrates at least the second conductive layer, the first base material layer, the electro-optic dielectric layer and the second base material layer. The sealing element is housed in the sealing groove, and the sealing element, the second conductive layer and the second conductive area enclose a closed space to seal the first base material layer, the electro-optic dielectric layer and the second base material layer located in the closed space.

17. The electrochromic device according to any one of claims 8 to 12, characterized in that, The electrochromic device further includes a first lead-out structure and a second lead-out structure; The first lead-out structure is electrically connected to the first conductive area, and the first lead-out structure is used to be electrically connected to one of the positive and negative terminals of an external power source. The second lead-out structure is electrically connected to the second conductive area; the second lead-out structure is used to electrically connect to the other of the positive and negative terminals of an external power source.

18. The electrochromic device according to claim 17, characterized in that, The electrochromic device further includes a carrier plate, and the first lead-out structure and the second lead-out structure are disposed on the same surface of the carrier plate.

19. An electrochromic device, characterized in that, Includes a substrate layer and the electrochromic device according to any one of claims 8 to 18; The substrate layer is located on the side of the second conductive layer that is opposite to the first conductive layer; And / or, the substrate layer is located on the side of the first conductive layer opposite to the second conductive layer.

20. A terminal product, characterized in that, The electrochromic device according to any one of claims 8 to 18 or the electrochromic apparatus according to claim 19 is included, wherein the end product includes any one of rearview mirror, curtain wall, car sunroof, car side window, car windshield, housing of electronic product, eyeglasses, vehicle and display panel.

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