一种半导体设备的管道清洁控制系统
By introducing a high-energy plasma cleaning system into semiconductor equipment, gas pipelines and valves are cleaned with high-pressure jets, solving the problems of blockage and jamming caused by residual films, extending the service life of the equipment, and reducing cleaning costs.
CN118268330BActive Publication Date: 2026-07-17大连皓宇电子科技有限公司
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 大连皓宇电子科技有限公司
- Filing Date
- 2024-04-23
- Publication Date
- 2026-07-17
AI Technical Summary
Technical Problem
Gas lines and valves in semiconductor equipment are prone to having a thin film residue after cleaning, which can cause blockages and jams. Manual cleaning is inefficient, costly, and difficult to clean thoroughly.
Method used
The high-energy plasma cleaning system uses components such as a signal selector, a cleaning system controller, and a reaction emitter to perform targeted cleaning of the inner walls of pipes and valves using high-pressure jet cleaning gas, achieving comprehensive deep cleaning.
Benefits of technology
It increases the lifespan and capacity of semiconductor equipment, reduces the time and cost of manual cleaning, and improves cleaning efficiency.
✦ Generated by Eureka AI based on patent content.
Smart Images
Figure CN118268330B_ABST
Abstract
本发明公开了一种半导体设备的管道清洁控制系统，涉及管道清洁技术领域；包括：信号选择器，用于传递信号；清洁系统控制器，用于控制信号选择器接收设备端控制器的信号；清洁系统反应发射器，用于将清洁气体以高压喷射方式送入待清洁管路内；设备端反应发射器，用于将清洁气体以高压喷射方式送入待清洁工艺腔体内；阀门开关控制器，用于执行阀门开启与关闭动作；第一气动隔膜阀，用于控制清洁气体是否进入清洁系统反应发射器；第二气动隔膜阀，用于控制清洁气体是否进入设备端反应发射器。本发明利用高能等离子体对管道内壁及阀门进行定向清洁，可以实现全面深层清洁，延长半导体设备使用周期及增加产能。
Need to check novelty before this filing date? Find Prior Art