Alkali throwing solution for thinning microcrystalline glass and application method thereof, and microcrystalline glass

Abstract

The embodiment of the present application provides an alkali etching solution for thinning microcrystalline glass, an application method thereof and the microcrystalline glass, wherein the alkali etching solution comprises strong alkali, inorganic phosphate, hydroxyl carboxylate, polyacid chelating agent, organic phosphonate and water. The alkali etching solution provided by the embodiment of the present application keeps the glass phase and the crystal phase in the microcrystalline glass at similar breaking speed through the combined action of multiple components, prevents the color difference caused by the micro-porous structure due to the uneven etching speed, in addition, the alkali etching solution provided by the embodiment of the present application uses water as a solvent, the solution ratio is simple and the performance is stable, the product non-processing surface does not need to be protected, the production cost is saved, and the waste solution treatment is simple.

Description

Technical Field

[0001] This invention relates to the field of glass-ceramic technology, and in particular to an alkaline polishing solution for thinning glass-ceramic, its application method, and glass-ceramic. Background Technology

[0002] Unlike ordinary glass, glass-ceramics include both amorphous and crystalline phases. This change in phase composition makes it easy for the crystalline and amorphous phases to be corroded at different rates when using the same chemical polishing solution (hydrofluoric acid) for ordinary glass to chemically polish and thin the glass. This results in changes in light refraction and scattering, leading to discoloration.

[0003] To address the above situation, existing technology involves using hydrofluoric acid in combination with sulfuric acid and phosphoric acid, and then chemically polishing the microcrystalline glass at a certain temperature. This utilizes the bond-breaking effect of HF, as well as the strong acid environment and heating to accelerate the H2O process. + R in crystalline and amorphous phases x+ The exchange rate is improved, and the combination of sulfuric acid and phosphoric acid can effectively inhibit pitting corrosion and expand surface corrosion, thereby alleviating the discoloration problem of microcrystalline glass.

[0004] However, even after being treated in the above way, the microcrystalline glass still exhibits color variations. Summary of the Invention

[0005] The technical problem to be solved by the present invention is to provide an alkaline polishing solution for thinning microcrystalline glass and its application method, as well as microcrystalline glass, so as to solve the technical problem that existing chemical polishing solutions easily cause discoloration of microcrystalline glass.

[0006] To solve the above problems, the present invention is achieved through the following technical solution:

[0007] This invention proposes an alkaline polishing solution for thinning microcrystalline glass, comprising a strong alkali, an inorganic phosphate, a hydroxycarboxylate, a polyacid chelating agent, an organophosphonate, and water.

[0008] Furthermore, in the alkaline sintering solution, the mass percentages of strong alkali, inorganic phosphate, hydroxycarboxylate, polyacid chelating agent, organophosphonate, and water are 45-60%, 3-8%, 1-2%, 1-2%, 2-4%, and 23.4-47.9%, respectively.

[0009] Furthermore, in the alkaline sintering solution, the strong alkali includes one or more of KOH, NaOH, and RbOH.

[0010] Furthermore, in the alkaline sintering solution, the inorganic phosphate includes one or more of lithium phosphate, sodium phosphate, potassium phosphate, rubidium phosphate, cesium phosphate, and zinc phosphate.

[0011] Furthermore, in the alkaline scouring solution, the hydroxycarboxylic acid salt includes at least one of gluconate, sodium citrate, sodium alginate, sodium tartrate, and potassium tartrate.

[0012] Furthermore, in the alkaline sintering solution, the gluconate includes one or more of lithium gluconate, sodium gluconate, potassium gluconate, and zinc gluconate.

[0013] Furthermore, in the alkaline polishing solution, the polyacid chelating agent includes one or more of acrylic acid-maleic anhydride copolymer, polymaleic anhydride, and acrylic acid-acrylate-phosphonic acid-sulfonate terpolymer.

[0014] Furthermore, in the alkaline sparging solution, the organophosphonate includes one or more of ethylenediaminetetramethylenephosphonic acid, 1-hydroxyethylidene-1,1-diphosphonic acid, and diethylenetriaminepentamethylenephosphonic acid.

[0015] Furthermore, the alkaline blasting solution also includes a reducing agent.

[0016] Furthermore, in the alkaline blasting solution, the reducing agent includes one or more of tin dichloride, sodium sulfite, and potassium sulfite.

[0017] Furthermore, in the alkaline polishing solution, the mass percentage of the reducing agent is 0.1% to 0.6%.

[0018] The present invention also proposes an application method for the alkaline sintering solution as described above, wherein:

[0019] The microcrystalline glass to be treated is placed in the alkaline polishing solution for alkaline polishing treatment; wherein the temperature of the alkaline polishing treatment is 100-200℃ and the treatment time is 4000-10800s.

[0020] The present invention also provides a microcrystalline glass, wherein it is obtained by the application method described above.

[0021] Compared with the prior art, the embodiments of the present invention have the following advantages:

[0022] In this embodiment of the invention, the provided alkaline polishing solution includes a strong alkali, inorganic phosphate, hydroxycarboxylate, polyacid chelating agent, organophosphonate, and water. Water is used as a solvent to provide a strongly alkaline environment, enabling the etching of the microcrystalline glass using OH- ions, breaking the silicon-oxygen bonds in both the glass and crystalline phases, and generating [SiO3] on the surface of the microcrystalline glass. 2- [SiO4] - [SiO3] + R x+A series of silicate groups and cations, polyacid chelating agents, organophosphonates and hydroxycarboxylates are combined to chelate the metal cations R on the surface. x+ , inhibiting R(OH) x R x (SiO3) y R m (SiO4) n The formation and deposition of crystals, along with the effective reduction of surface tension in the solution by inorganic phosphates to enhance the chelating ability of the chelating agent and inhibit the aggregation of chelates, while simultaneously dispersing and suspending particulate matter and other impurities adhering to the glass surface, ensures the cleanliness of the microcrystalline glass surface and guarantees the continuous and rapid etching reaction. The combined effect of the above components keeps the glass phase and crystalline phase in the microcrystalline glass at similar bond-breaking rates, preventing discoloration caused by uneven etching rates and resulting microporous structures. In addition, the micro-alkali polishing solution provided in this embodiment of the invention uses water as a solvent, has a simple solution ratio and stable performance, does not require protection of the non-treated surface of the product, saves production costs, and its waste solution is easy to dispose of.

[0023] It should be understood that the above general description and the following detailed description are exemplary and explanatory only, and do not limit this application. Attached Figure Description

[0024] Figure 1 This is a photograph of the sample surface in Example 1 of the present invention before alkaline polishing treatment;

[0025] Figure 2 This is a micrograph of the sample surface in Example 1 of the present invention before alkaline polishing treatment;

[0026] Figure 3 This is a photograph of the sample surface after alkaline polishing treatment in Example 1 of this invention;

[0027] Figure 4 This is a micrograph of the sample surface after alkaline polishing treatment in Example 1 of the present invention;

[0028] Figure 5 This is a photograph of the non-sandblasted surface of the sample in Example 1 of this invention after alkaline polishing treatment;

[0029] Figure 6 This is a micrograph of the non-sandblasted surface of the sample in Example 1 of this invention after alkaline polishing treatment;

[0030] Figure 7 This is a photograph of the sample surface in Example 2 of the present invention before alkaline polishing treatment;

[0031] Figure 8 This is a micrograph of the sample surface in Example 2 of the present invention before alkaline polishing treatment;

[0032] Figure 9 This is a photograph of the sample surface after alkaline polishing treatment in Example 2 of this invention;

[0033] Figure 10 This is a micrograph of the sample surface after alkaline polishing treatment in Example 2 of the present invention;

[0034] Figure 11 This is a photograph of the non-sandblasted surface of the sample in Example 2 of the present invention after alkaline polishing treatment;

[0035] Figure 12 This is a micrograph of the non-sandblasted surface of the sample in Example 2 of the present invention after alkaline polishing treatment;

[0036] Figure 13 This is a photograph of the sample surface after alkaline polishing treatment in Example 2 of this invention;

[0037] Figure 14 This is a micrograph of the sample surface after alkaline polishing treatment in Example 2 of the present invention. Detailed Implementation

[0038] To make the above-mentioned objects, features and advantages of the present invention more apparent and understandable, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0039] The present invention provides an alkaline polishing solution for thinning microcrystalline glass, comprising a strong alkali, inorganic phosphate, hydroxycarboxylate, polyacid chelating agent, organophosphonate and water.

[0040] In this process, water is used as a solvent to dissolve the added solute, ensuring its ionization after dissolution. A strong base provides this alkaline environment, allowing OH- ions to etch the glass-ceramic glass, breaking the silicon-oxygen bonds in both the glass and crystalline phases, and generating [SiO3] on the surface of the glass-ceramic glass. 2- [SiO4] - [SiO3] + R x+ A series of silicate groups and cations, polyacid chelating agents, organophosphonates and hydroxycarboxylates are combined to chelate the metal cations R on the surface. x+ , inhibiting R(OH) x R x (SiO3) y R m (SiO4) nThe formation and deposition of crystals, along with the effective reduction of surface tension in the solution by inorganic phosphates to enhance the chelating ability of the chelating agent and inhibit the aggregation of chelates, while simultaneously dispersing and suspending particulate matter and other impurities adhering to the glass surface, ensures the cleanliness of the microcrystalline glass surface and guarantees the continuous and rapid etching reaction. The combined effect of the above components keeps the glass phase and crystalline phase in the microcrystalline glass at similar bond-breaking rates, preventing discoloration caused by uneven etching rates and resulting microporous structures. In addition, the micro-alkali polishing solution provided in this embodiment of the invention uses water as a solvent, has a simple solution ratio and stable performance, does not require protection of the non-treated surface of the product, saves production costs, and its waste solution is easy to dispose of.

[0041] Optionally, in the alkaline polishing solution provided in this embodiment of the invention, the mass percentages of strong alkali, inorganic phosphate, hydroxycarboxylate, polyacid chelating agent, organophosphonate, and water are 45-60%, 3-8%, 1-2%, 1-2%, 2-4%, and 23.4-47.9%, respectively. This is because when using the alkaline polishing solution provided in this embodiment of the invention to chemically polish microcrystalline glass, it is the combined action of the strong alkali, inorganic phosphate, hydroxycarboxylate, polyacid chelating agent, and organophosphonate that maintains similar bond-breaking rates between the glass phase and the crystalline phase in the microcrystalline glass, preventing discoloration caused by uneven etching rates and resulting microporous structures. At the above mass percentage ratios, this not only achieves the goals of thinning, passivating microcracks, and improving optical performance, but also achieves the goal of eliminating discoloration after chemical polishing of microcrystalline glass, thereby improving product yield.

[0042] In this embodiment of the invention, a strong alkali is used as an etching agent to provide a large amount of OH-. - Ions are one of the main components of alkaline ionizing solutions. Optionally, in one embodiment, the strong alkali includes one or more of KOH, NaOH, and RbOH, all of which can ionize in water to form OH- ions. - It can break the bonds of -Si-O-Si- in the glass phase and crystalline phase on the surface of glass-ceramics, generating [SiO3]. 2- [SiO4] - [SiO3] + R x+ A series of silicate groups and cations enable chemical polishing and thinning of microcrystalline glass.

[0043] In this embodiment of the invention, the inorganic phosphate serves to continuously clean the glass surface in a strongly alkaline environment, preventing crystalline particles and other impurities from adhering to the glass surface and affecting the reaction rate. The aforementioned inorganic phosphate should not generate hydroxide precipitates under strongly alkaline conditions. Optionally, in one embodiment, the inorganic phosphate includes one or more of lithium phosphate, sodium phosphate, potassium phosphate, rubidium phosphate, cesium phosphate, and zinc phosphate.

[0044] In the above embodiments of the present invention, polyacid chelating agents have good dispersibility and chelating ability, which can make their own copolymers and organophosphonates disperse more uniformly. At the same time, they have a good chelating effect on metal ions to prevent the formation of silicates and crystallization and precipitation.

[0045] Optionally, in one embodiment, the polyacid chelating agent includes one or more of acrylic acid-maleic anhydride copolymer, polymaleic anhydride, and acrylic acid-acrylate-phosphonic acid-sulfonate terpolymer. The polyacid chelating agent does not decompose at high temperatures and exhibits good chelating properties in alkaline environments.

[0046] Optionally, in one specific embodiment, the polyacid chelating agent is an acrylic acid-maleic anhydride copolymer.

[0047] In this embodiment of the invention, organophosphonates, as complexing agents, can dissociate into multiple negative ions in solution as ligands. During alkaline polishing of microcrystalline glass, they can pair with metal ions that have been stripped of crystals and amorphous materials from the microcrystalline glass to form a network chelate. They also have the advantage of high temperature resistance and still perform well in high-temperature and strong alkaline environments.

[0048] Optionally, in one embodiment, the organophosphonate includes one or more of ethylenediaminetetramethylenephosphonic acid, 1-hydroxyethylidene-1,1-diphosphonic acid, and diethylenetriaminepentamethylenephosphonic acid; in some specific embodiments, the organophosphonate is ethylenediaminetetramethylenephosphonic acid.

[0049] In this embodiment of the invention, the selected chelating agent is a combination. The polycarboxylic acid chelating agent, in addition to its own chelating ability for metal ions, also has strong dispersing ability, which can help disperse easily agglomerated chelating agents. The organophosphonate, on the other hand, has a strong chelating ability for Ca... 2+ Fe 3+ Fe 2+ Mg 2+ 、(SiO x ) y- (CO3) 2- The deposition of this type of substance has a good inhibitory effect, and when used in combination, it can achieve better complexing and chelation effects, and prolong the use time of the drug solution.

[0050] In this embodiment of the invention, because the hydroxyl functional group -COOH contained in the hydroxycarboxylate can form a complex salt with the metal ions on the surface of the microcrystalline glass, the formation rate of the crystallized salt is slowed down, and the aggregation of the chelate is slowed down, thus inhibiting the interference of the chelate aggregation on the chemical polishing reaction.

[0051] Optionally, in one embodiment, the hydroxycarboxylate includes at least one selected from gluconate, sodium citrate, sodium alginate, sodium tartrate, and potassium tartrate. In some embodiments, the gluconate includes one or more selected from lithium gluconate, sodium gluconate, potassium gluconate, and zinc gluconate; in some specific embodiments, the gluconate is sodium gluconate.

[0052] Gluconate can act as a solubilizer, increasing the solubility of strong bases, polyacid chelating agents, and organophosphonates under a solvent-water ratio. Higher solubility leads to greater ionization, resulting in a faster reaction rate. Secondly, as the reaction proceeds, the constituent elements of glass continuously enter the solution, generating a large amount of R(OH)₂. x and R x (SiO3) y The formation of crystalline precipitates slows down the ion migration and exchange rate, significantly affecting the reaction rate. Furthermore, the increasing aggregation of chelates on the surface of the glass-ceramic into flocculent substances also reduces the exchange rate, and the exchanged metal ions fail to chelate in time, leading to crystal deposition. Gluconate itself is a hydroxycarboxylate, and its hydroxyl functional group -COOH can form complex salts with metal ions on the surface of the glass-ceramic, slowing down the formation of crystal salts and reducing chelate aggregation, thus inhibiting the interference of chelate aggregation on the chemical polishing reaction. In addition, gluconate is a chelating agent whose complexing effect improves with higher pH and higher temperature. When used in conjunction with polyacid chelating agents and organophosphonates, it can expand the chelation range, improve the chelation effect, and prolong the action time of the chelating agents.

[0053] Optionally, in one embodiment, the alkaline polishing solution provided in this invention further includes a reducing agent. By adding a reducing agent, electrons can be quickly provided to the cations stripped from the microcrystalline glass. Because electrons are smaller than anions and cations, their diffusion rate is much greater than that of silicate groups and metal ions, allowing the cations on the surface of the microcrystalline glass to quickly combine with electrons and detach, thereby greatly increasing the reaction rate.

[0054] Optionally, in some embodiments, the reducing agent includes one or more of tin dichloride, sodium sulfite, and potassium sulfite. This reducing agent not only does not decompose in high-temperature, strongly alkaline environments but also possesses strong reducing power.

[0055] Optionally, in one specific embodiment, the reducing agent is tin dichloride.

[0056] Optionally, in the alkaline polishing solution provided in the embodiments of the present invention, the mass percentage of the reducing agent is 0.1% to 0.6%, for example, it can be one or any two of 0.1%, 0.2%, 0.3%, 0.4%, 0.5%, and 0.6%.

[0057] The alkaline polishing solution provided in this invention can treat various types of microcrystalline glass, such as silicate microcrystalline glass, aluminosilicate microcrystalline glass, and borosilicate microcrystalline glass. It can adjust the transmittance and haze of the sandblasted surface, thereby improving microcracks and enhancing glass performance. Furthermore, it causes minimal damage to the microstructure of the non-treated smooth surface during use, thus eliminating the need to protect the non-treated smooth surface.

[0058] Optionally, the alkaline blasting solution preparation process provided in this embodiment of the invention is as follows:

[0059] Under normal temperature conditions, polyacid chelating agent, organophosphonate, hydroxycarboxylate and strong alkali are added to water in sequence according to the above mass percentages, mixed evenly, and then a reducing agent is added. The mixture is then heated and mixed to obtain the above-mentioned alkali scouring solution.

[0060] The heating and mixing temperature can be 50–90°C, and the time can be 60–6000 s. For example, the mixture can be stirred at 80°C using a stirring rod that rotates and moves up and down repeatedly for 3600 s.

[0061] This invention also provides a method for applying the alkaline polishing solution as described above, comprising the steps of: placing the microcrystalline glass to be treated in the alkaline polishing solution for alkaline polishing treatment; wherein the temperature of the alkaline polishing treatment is 100-200°C and the treatment time is 4000-10800s.

[0062] In this embodiment of the invention, after the microcrystalline glass to be treated is soaked in warm water, it is placed in the above-mentioned alkaline polishing solution and subjected to alkaline polishing treatment at a temperature of 100-200°C. This process utilizes OH- to etch the microcrystalline glass, causing the silicon-oxygen bonds in its glass phase and crystalline phase to break, and the constituent elements to form [SiO3] on the surface of the microcrystalline glass. 2- [SiO4] - [SiO3] + R x+ A series of silicate groups and cations, polyacid chelating agents, organophosphonates and hydroxycarboxylates are combined to chelate the metal cations R on the surface. x+ , inhibiting R(OH) x R x (SiO3) y R m (SiO4) nThe formation and deposition of crystals, along with the effective reduction of surface tension in the solution by inorganic phosphonates to enhance the chelating ability of the chelating agent and inhibit the aggregation of chelates, while also dispersing and suspending particulate matter and other impurities adhering to the glass surface, ensures the cleanliness of the glass-ceramic surface and guarantees the continuous and rapid etching reaction. The combined effect of these components keeps the glass phase and crystalline phase in the glass-ceramic at similar bond-breaking rates, preventing uneven etching rates from causing discoloration due to microporous structures, thus forming a glass-ceramic with a uniform color.

[0063] The microcrystalline glass to be processed can be silicate microcrystalline glass, aluminosilicate microcrystalline glass, borosilicate microcrystalline glass, etc.

[0064] In this embodiment of the invention, the microcrystalline glass is subjected to alkaline polishing treatment with the above-mentioned alkaline polishing solution for 4000-10800s at a temperature of 100-200℃, which can effectively achieve the thinning treatment of the microcrystalline glass, complete the transmission rate and haze of the sandblasted surface, thereby improving microcracks, enhancing glass performance, and avoiding excessive side reactions.

[0065] Optionally, in one embodiment, the alkaline polishing temperature can be a range of one or any two of 100°C, 110°C, 120°C, 130°C, 140°C, 150°C, 160°C, 170°C, 180°C, 190°C, and 200°C; and the alkaline polishing duration can be a range of one or any two of 4000s, 5000s, 6000s, 7000s, 8000s, 9000s, 10000s, and 10800s.

[0066] Optionally, the glass-ceramic can be pre-cleaned before being placed in the alkaline polishing solution to remove surface oil and impurities, so as to avoid affecting the alkaline polishing reaction.

[0067] Optionally, after cleaning, the microcrystalline glass is immersed in hot water to further remove impurities and wet the glass surface, preventing defects caused by uneven alkaline etching when subsequently exposed to alkaline polishing solution. Optionally, the immersion temperature is 50–90°C, for example, a range of 50°C, 60°C, 70°C, 80°C, 90°C, or any two of these values; the immersion time is 50–500 seconds, for example, a range of 50 seconds, 80 seconds, 100 seconds, 150 seconds, 200 seconds, 300 seconds, 400 seconds, 500 seconds, or any two of these values.

[0068] The present invention will be described in detail below through embodiments.

[0069] Performance testing methods:

[0070] (1) Appearance test: The sample was photographed and its color and surface morphology were observed by laser spectroscopy confocal microscopy.

[0071] (2) Roughness test: The roughness test was carried out using a profilometer according to the test standard GB / T1031-1995;

[0072] (3) Optical testing: The optical values ​​of the samples were tested according to the test standard GB / T2410 using a CS-720 color haze meter.

[0073] (4) Lower reduction test: Using a digital thickness gauge, test the thickness H1 of the sample before alkaline polishing and the thickness H2 after alkaline polishing according to the test standard GB / T11614-1999, and then calculate the lower reduction = H1-H2;

[0074] (5) Color difference rate test: Observe the sample surface with the naked eye to see if there are any areas with different colors.

[0075] Example 1

[0076] (1) Provide alkaline blasting solution

[0077] By weight, it includes 60% potassium hydroxide (KOH), 8% sodium phosphate (Na3PO4), 0.6% tin dichloride (SnCl2), and 2% sodium gluconate (C6H2O). 11 NaO7), 2% acrylic acid-maleic anhydride copolymer (PAA-PMA), 4% ethylenediaminetetramethylenephosphonic acid (C6H 20 N2O 12 P4), 23.4% pure water (H2O).

[0078] Its manufacturing process is as follows: PAA-PMA is added to H2O at room temperature and stirred until homogeneous according to the above-mentioned mass percentages, then C6H is added. 20 N2O 12 P4 and mix well, then add C6H 11 Add NaO7 and stir until homogeneous, then add KOH and stir until homogeneous, then add Na3PO4 and stir until homogeneous, and finally add SnCl2 and stir until homogeneous. Then heat the solution to 80℃ and simultaneously rotate the stirring rod up and down repeatedly for 3600s.

[0079] (2) Thinning treatment of microcrystalline glass

[0080] After cleaning, the aluminosilicate microcrystalline glass is immersed in water at 80°C for 300 seconds, then immersed in an alkaline polishing solution at 150°C for 4000 seconds. After rinsing with clean water and drying, the thinned microcrystalline glass is obtained.

[0081] Example 2

[0082] The difference between Example 2 and Example 1 is that the processing time in the thinning process (2) of the microcrystalline glass is adjusted to 10800s.

[0083] Example 3

[0084] The difference between Example 3 and Example 1 is that the processing time in the thinning process (2) of the microcrystalline glass is adjusted to 8000s.

[0085] Example 4

[0086] The difference between Example 4 and Example 1 is that in the thinning process (2) of the microcrystalline glass, the temperature of the alkaline polishing solution is adjusted to 100°C.

[0087] Example 5

[0088] The difference between Example 5 and Example 1 is that in the thinning process (2) of the microcrystalline glass, the temperature of the alkaline polishing solution is adjusted to 200°C.

[0089] Example 6

[0090] The difference between Example 6 and Example 2 is that the mass percentages of potassium hydroxide (KOH), sodium phosphate (Na3PO4), tin dichloride (SnCl2), and sodium gluconate (C6H2O) in the alkaline scouring solution were adjusted to 45%, 3%, 0.1%, and 0.1%, respectively. 11 The mass percentages of NaO7 are 1%, acrylic acid-maleic anhydride copolymer (PAA-PMA) are 1%, and ethylenediaminetetramethylene phosphoric acid (C6H) is 1%. 20 N2O 12 The mass percentage of P4 is 2%, and the mass percentage of pure water (H2O) is 47.9%.

[0091] Example 7

[0092] The difference between Example 7 and Example 1 is that the composition of the alkaline scouring solution was adjusted to include 60% potassium hydroxide (KOH), 8% sodium phosphate (Na3PO4), and 2% sodium gluconate (C6H4PO4). 11 NaO7), 2% acrylic acid-maleic anhydride copolymer (PAA-PMA), 4% ethylenediaminetetramethylene phosphoric acid (C6H 20 N2O 12 P4) 24% pure water (H2O).

[0093] Example 8

[0094] The difference between Example 8 and Example 1 is that the tin dichloride (SnCl2) in the alkaline scouring solution is changed to sodium sulfite.

[0095] Example 9

[0096] The difference between Example 9 and Example 1 is that the tin dichloride (SnCl2) in the alkaline blasting solution is changed to potassium sulfite.

[0097] Example 10

[0098] The difference between Example 10 and Example 1 is that the sodium phosphate in the alkaline blasting solution is replaced with potassium phosphate.

[0099] Example 11

[0100] The difference between Example 11 and Example 1 is that sodium gluconate in the alkaline blasting solution is replaced with zinc gluconate.

[0101] Example 12

[0102] The difference between Example 12 and Example 1 is that the acrylic acid-maleic anhydride copolymer in the alkaline polishing solution is changed to polymaleic anhydride.

[0103] Comparative Example 1

[0104] (1) Provide an acidic thinning solution comprising 10% hydrofluoric acid (HF), 15% sulfuric acid (H2SO4), 20% phosphoric acid (H3PO4), 5% citric acid (C6H8O7), and 50% pure water (H2O) by mass.

[0105] (2) After cleaning the aluminosilicate microcrystalline glass, immerse it in water at 80°C for 300 seconds, then immerse it in an acidic thinning solution at 80°C for 900 seconds. Then wash the chemically polished microcrystalline glass with clean water and blow it dry to obtain thinned microcrystalline glass.

[0106] Sample performance testing:

[0107] The thinned microcrystalline glass prepared in Examples 1, 2, and 6 above were subjected to appearance tests in sequence, and the results are as follows: Figures 1-14 As shown, the thinned microcrystalline glass prepared in the above embodiments was subjected to optical tests, roughness tests, reduction tests, and color difference tests in sequence. The test results are shown in Table 1 below:

[0108] Table 1

[0109]

[0110]

[0111] Through Table 1 and Figures 1-6It can be seen that there is no difference in color between the untreated and treated surfaces when observed with the naked eye. The original pits become smaller and smoother, which indicates that alkaline polishing can also achieve the thinning of microcrystalline glass and help improve glass defects.

[0112] Through Table 1 and Figures 7-12 Comparing Examples 1 and 2, it can be seen that there is no difference in color observed by the naked eye before and after the non-sandblasted surface treatment. The original pits become smaller and smoother, which indicates that alkaline polishing can also achieve the thinning of microcrystalline glass and help improve glass defects. The reduction increases with the extension of time, and the microstructure is more regular.

[0113] Through Table 1 and Figures 13-14 Comparing Examples 1 and 6, it can be seen that using the alkaline polishing solution provided in the embodiments of the present invention for low-concentration, long-term treatment can also achieve the thinning of microcrystalline glass and improve its microstructure.

[0114] Furthermore, as can be seen from the table above, after treatment with the alkaline polishing solution provided in the embodiments of the present invention, the discoloration rate is significantly reduced, and the roughness value of the microcrystalline glass increases, which is consistent with the microscopic observation results of the sandblasted surface transforming from fibrous to granular. Moreover, after alkaline polishing, the L brightness value increases, the a value decreases, the red phase value weakens, the b value increases, and the blue phase value increases, indicating that the disordered fibers on the surface of the microcrystalline glass are transformed into regular and ordered round particles, which reduces the diffuse reflection of the microcrystalline glass surface, increases the transmittance, increases the red phase light reflection, and decreases the blue phase light reflection.

[0115] In summary, in this embodiment, the provided alkaline polishing solution includes a strong alkali, inorganic phosphate, hydroxycarboxylate, polyacid chelating agent, organophosphonate, and water. Through the combined action of multiple components, the glass phase and crystalline phase in the glass-ceramic maintain similar bond-breaking rates, preventing discoloration caused by uneven etching rates and resulting microporous structures. In addition, the alkaline polishing solution provided in this embodiment uses water as a solvent, has a simple solution ratio, and stable performance. It does not require protection of the non-treated surfaces of the product, saving production costs, and its waste solution is easy to dispose of.

[0116] Although preferred embodiments of the present invention have been described, those skilled in the art, upon learning the basic inventive concept, can make other changes and modifications to these embodiments. Therefore, the claims are intended to be interpreted as including the preferred embodiments as well as all changes and modifications falling within the scope of the embodiments of the present invention.

[0117] The present invention provides a detailed description of an alkaline polishing solution for thinning microcrystalline glass, its application method, and the microcrystalline glass itself. Specific examples have been used to illustrate the principles and implementation methods of the present invention. The descriptions of the above embodiments are only for the purpose of helping to understand the method and core ideas of the present invention. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of the present invention. Therefore, the content of this specification should not be construed as a limitation of the present invention.

Claims

1. An alkaline polishing solution for thinning microcrystalline glass, characterized in that, It includes strong bases, inorganic phosphates, hydroxycarboxylate salts, polyacid chelating agents, organophosphonates, reducing agents, and water; the reducing agent includes one or more of tin dichloride, sodium sulfite, and potassium sulfite; In the alkaline blasting solution, the reducing agent has a mass percentage of 0.1-0.6%.

2. The alkaline polishing solution according to claim 1, characterized in that, In the alkaline sintering solution, the mass percentages of the strong alkali, the inorganic phosphate, the hydroxycarboxylate, the polyacid chelating agent, the organophosphonate, and water are 45-60%, 3-8%, 1-2%, 1-2%, 2-4%, and 23.4-47.9%, respectively.

3. The alkaline polishing solution according to claim 1, characterized in that, The strong base includes one or more of KOH, NaOH, and RbOH.

4. The alkaline blasting solution according to claim 1, characterized in that, The inorganic phosphate includes one or more of lithium phosphate, sodium phosphate, potassium phosphate, rubidium phosphate, cesium phosphate, and zinc phosphate.

5. The alkaline polishing solution according to claim 1, characterized in that, The hydroxycarboxylic acid salt includes at least one of gluconate, sodium citrate, sodium alginate, sodium tartrate, and potassium tartrate.

6. The alkaline polishing solution according to claim 5, characterized in that, The gluconate includes one or more of sodium gluconate, potassium gluconate, zinc gluconate, and lithium gluconate.

7. The alkaline polishing solution according to claim 1, characterized in that, The polyacid chelating agent includes one or more of the following: acrylic acid-maleic anhydride copolymer, polymaleic anhydride, and acrylic acid-acrylate-phosphonic acid-sulfonate terpolymer.

8. The alkaline polishing solution according to claim 1, characterized in that, The organophosphonates include one or more of ethylenediaminetetramethylenephosphonic acid, 1-hydroxyethylidene-1,1-diphosphonic acid, and diethylenetriaminepentamethylenephosphonic acid.

9. A method for applying the alkaline sintering solution as described in any one of claims 1 to 8, characterized in that, include: The microcrystalline glass to be treated is placed in the alkaline polishing solution for alkaline polishing treatment; wherein the temperature of the alkaline polishing treatment is 100~200℃ and the treatment time is 4000~10800s.

10. A microcrystalline glass, characterized in that, It is obtained by the application method described in claim 9.

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