热喷涂层的制备方法及使用其制备的钇基热喷涂层
By adding silica particles to yttrium-based thermal spray coatings, high-density, uniformly colored thermal spray coatings are prepared using atmospheric plasma thermal spraying, solving the problems of particle generation and uneven color in semiconductor manufacturing and improving the durability and etching performance of the coating.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- KOMICO CO LTD
- Filing Date
- 2023-12-12
- Publication Date
- 2026-07-17
AI Technical Summary
Existing technologies struggle to produce high-density, uniformly colored thermally sprayed coatings with excellent plasma resistance in semiconductor manufacturing, especially in dry etching processes where particle size and color inconsistencies can lead to variations in etching rate and thermal expansion differences.
Yttrium-based particle powder containing silica particles is used to form a yttrium-based thermal spray coating on a substrate through atmospheric plasma thermal spraying. The addition ratio of silica is adjusted to improve melting efficiency, reduce porosity, and uniformly adjust color.
The prepared yttrium-based thermal spray coating inhibits the formation of black spots or black spots, has uniform color, improves durability, reduces particle generation, and enhances etch resistance and durability within the semiconductor cavity.
Smart Images
Figure CN118326314B_ABST