Electro-rheological polishing device and polishing method based on wire electrode or group wire electrode

Abstract

The application relates to a kind of electrorheological polishing devices and polishing methods based on wire electrode or group wire electrode, including workpiece clamp, workpiece, workbench, liquid tank, polishing liquid, wire electrode, electrode chuck and alternating current power supply.Liquid tank is connected with workbench, and polishing liquid is filled in the liquid tank.Workpiece clamp is fixedly installed on the workbench through connecting piece, and can be designed and replaced according to the different shapes of workpiece to ensure that the position of workpiece does not move during polishing.The application applies electrorheological effect during polishing, so that the electrorheological fluid between the two wire electrodes generates chain structure along the direction of electric field.The wire electrode clamped by electrode chuck can move back and forth along the specified path.The solidified electrorheological fluid rubs against the surface of workpiece when the wire electrode moves, so that the material removal of workpiece surface is realized.The final workpiece surface is smooth and flat, with low roughness, and without obvious scratches or deformation.

Description

Technical Field

[0001] This invention relates to the field of polishing technology, and in particular to an electrorheological polishing device and method based on line electrodes or groups of line electrodes. Background Technology

[0002] Polishing is a widely used surface treatment technique applied to various materials and devices. Its primary function is to improve surface quality and enhance product performance. Polishing removes burrs, scratches, and uneven areas from product surfaces, resulting in a smoother, more even surface and improved appearance. Furthermore, polishing can enhance a product's corrosion resistance, wear resistance, and electrical conductivity, thereby extending its lifespan.

[0003] Common polishing methods include mechanical polishing, chemical polishing, and magnetorheological polishing, each with inherent problems. Mechanical polishing often relies on friction between the grinding head and the polishing cloth, which is not only inefficient but also produces inconsistent polishing quality, easily resulting in scratches and surface damage. While chemical polishing can efficiently remove surface materials, it is expensive and has a greater potential for environmental pollution. Magnetorheological polishing is a method that utilizes electromagnetic forces for polishing. It can reduce surface damage and the heat-affected zone, improving the surface quality and performance of the workpiece. However, in practice, it suffers from problems such as uneven magnetic field distribution and unstable polished surface quality.

[0004] Electrorheological polishing (EMF) is an emerging polishing technology primarily used for surface machining of spherical and aspherical surfaces in optical devices, as well as narrow slits in precision parts. EMF offers several advantages over magnetorheological polishing (MER). First, EMF allows for better control of the polishing process, improving both quality and efficiency. Second, EMF requires less precise current control, making it simpler and more convenient to operate, while simultaneously enhancing the surface quality and performance of the workpiece. Furthermore, EMF generates less stress during the process, reducing workpiece deformation and making it more suitable for complex shapes and smaller dimensions, thus broadening its application range. Existing polishing technologies struggle to guarantee machining accuracy for smaller parts and narrow grooves; therefore, EMF is a more promising and advantageous choice when selecting a polishing technology.

[0005] In electrorheological polishing (EMF), traditional bulk electrodes are limited in their application to polishing slender curved surfaces and narrow slits due to their large size and the significant stress generated during processing, failing to achieve ideal results. To fully leverage the advantages of EMF, suitable electrodes and polishing methods need to be designed. Therefore, developing a novel wire electrode EMF technique that can overcome existing problems, improve polishing efficiency and surface quality, and simultaneously reduce costs is a crucial need in the field.

[0006] Chinese patent CN116985026A discloses a waterwheel-type electrorheological polishing electrode and a polishing machine. The waterwheel-type electrorheological polishing electrode includes a polishing electrode with multiple protrusions on its outer surface. This patent overcomes the shortcomings of existing technologies where suspended particles in the polishing fluid agglomerate on the surface of conductive workpieces, reducing polishing efficiency. By setting protrusions on the surface of the polishing electrode, suspended particles on the surface of the conductive workpiece are adsorbed onto the protruding surfaces, thus preventing the polishing fluid from agglomerating on the conductive workpiece surface and improving the polishing efficiency. Furthermore, the protrusions can lift the polishing fluid, so the workpiece can be installed not only below the polishing electrode and immersed in the polishing fluid, but also above the polishing electrode, with the polishing electrode lifting the polishing fluid to the workpiece surface for polishing. This facilitates workpiece installation and cleaning, and also makes it easier to observe the polishing condition of the workpiece surface. This patent, by using a polishing electrode with protrusions, is suitable for processing curved surfaces. Although this patent improves polishing efficiency, it generates significant stress during the processing, which may cause structural deformation and damage when polishing fine structures. Therefore, it cannot be used for polishing microstructures such as narrow slits and can only be used for polishing metal workpieces, thus limiting its application range.

[0007] Chinese patent CN116587074A discloses an electrorheological polishing tool and method. The polishing tool includes an electrode mounting structure, integrated positive and negative electrode metal plates, an array of positive and negative electrode metal plates, an array of insulating plates, and an electrode integrated clamping and positioning module. The integrated positive and negative electrode metal plates are connected to the electrode mounting structure. The positive and negative electrode integrated metal plates are electrically connected to the positive and negative electrodes of the electrorheological system sub-assembly, respectively. The array of positive and negative electrode metal plates are arranged alternately and electrically connected to the integrated positive and negative electrode metal plates, respectively. The array of insulating plates is disposed between the array of positive and negative electrode metal plates. The electrorheological polishing tool in this patent is not limited by materials and is applicable to both metallic and non-metallic materials. Compared to single electrodes, integrated electrodes offer higher polishing efficiency. This patent, by employing integrated polishing electrodes, is suitable for processing narrow grooves and polishing flat surfaces. The overall structure of the patented electrode is relatively complex and large in size. Because it uses an alternating array of electrodes and insulating plates, any inadequate insulation measures at any point can cause a short circuit or even damage to the equipment, and troubleshooting is also very difficult. Summary of the Invention

[0008] The purpose of this invention is to provide an electrorheological polishing device and method based on wire electrodes or multiple wire electrodes for polishing slender curved surfaces and narrow slits. This invention, by applying electrorheological polishing technology, minimizes material damage and achieves high precision; using wire electrodes as polishing tools results in smaller size, greater convenience and flexibility, lower stress generation, and less deformation of the workpiece, offering significant advantages in polishing slender curved surfaces and narrow slits; it can be applied to the polishing of various metallic or non-metallic materials, and offers advantages such as convenience, controllability, and energy saving.

[0009] The objective of this invention can be achieved through the following technical solutions:

[0010] The first objective of this invention is to provide a current-ratio polishing apparatus based on a wire electrode, the current-ratio polishing apparatus being used for polishing a workpiece, the current-ratio polishing apparatus comprising:

[0011] Workbench;

[0012] AC power supply: It is located inside the workbench;

[0013] First liquid tank: It is located above the workbench, and the first liquid tank contains polishing liquid and is used to place the workpiece to be processed.

[0014] First wire electrode: Its two ends are slidably connected to the worktable, and the first wire electrode is connected to the positive terminal of the AC power supply;

[0015] The second wire electrode has two ends that are slidably connected to the worktable. The second wire electrode is connected to the negative terminal of the AC power supply. The second wire electrode and the first wire electrode are used together to polish the workpiece.

[0016] Furthermore, the workpiece contains structures such as grooves and narrow slits.

[0017] The electrorheological polishing device is used to polish the inner and outer surfaces of structures such as grooves and narrow slits, for example, the inner and outer surfaces of slender axial curved surfaces and narrow slits of workpieces;

[0018] The material of the workpiece may be metal or non-metal.

[0019] Furthermore, the workbench includes a base plate, a top plate, and a connecting plate.

[0020] The top plate and the bottom plate are connected by a connecting plate, and the two ends of the first and second wire electrodes are slidably connected to the top plate and the bottom plate, respectively.

[0021] Furthermore, the first and second wire electrodes are clamped onto the top or bottom plate by electrode chucks. Driven by the electrode chucks, the first and second wire electrodes move back and forth along the grooves, slits, and other structures on the workpiece according to the path plan to complete the polishing.

[0022] Furthermore, the electrode chuck immersed in the polishing solution is made of a non-metallic material, and the connection between the electrode chuck and the first and second wire electrodes is insulated. The two interfaces of the electrode chuck are internally connected to the positive and negative terminals of an AC power supply via wires, respectively.

[0023] The electrode chuck is used to ensure that the first and second wire electrodes are always taut during the processing, and to drive the first and second wire electrodes to move back and forth along the grooves, narrow slits and other structures on the workpiece.

[0024] As a preferred technical solution, the first and second line electrodes are made of conductive materials;

[0025] The diameter of the first and second wire electrodes is 0.5-1 mm;

[0026] The distance between the first wire electrode and the second wire electrode is 0.3-0.5 cm;

[0027] The distance between the first and second line electrodes and the surface of the workpiece is 0.3-1 cm.

[0028] Furthermore, the first liquid tank includes a front side plate, a rear side plate, a left side plate, and a right side plate. The front side plate, rear side plate, left side plate, and right side plate are all fixed above the bottom plate. The front side plate, left side plate, rear side plate, and right side plate are connected in sequence. The front side plate, left side plate, rear side plate, and right side plate are all connected to the bottom plate to form the first liquid tank.

[0029] Furthermore, the portions of the front side plate, rear side plate, left side plate, right side plate, and bottom plate that come into contact with the polishing liquid are provided with an insulating layer.

[0030] As a preferred technical solution, the front side panel, rear side panel, left side panel, and right side panel are made of insulating transparent material, which facilitates real-time observation of the processing process;

[0031] The joints between the front panel, rear panel, left panel, right panel, and bottom panel are sealed to prevent liquid leakage.

[0032] Furthermore, the base plate is provided with a waste liquid collection assembly, which includes a waste liquid hole, a connecting pipe, and a waste liquid tank. The portion of the base plate that contacts the polishing liquid has a waste liquid hole, which is connected to the waste liquid tank via the connecting pipe. A valve is provided on the waste liquid hole.

[0033] Furthermore, the electrorheological polishing device also includes a workpiece clamp, which fixes the workpiece above the base plate.

[0034] Furthermore, the workpiece fixture is fixedly installed on the base plate via a connector. The workpiece fixture can be designed and replaced according to the different shapes of the workpiece to ensure that the workpiece does not move during polishing.

[0035] Furthermore, the connecting plate is equipped with a control system, and the outer side of the connecting plate is equipped with a control panel. The control system is connected to the control panel, the electrode clamp, the AC power supply, and the valve. The control system is used to control the movement path of the electrode clamp, the power supply of the AC power supply, and the opening and closing of the valve.

[0036] The second objective of this invention is to provide a current-ratio polishing method based on wire electrodes, using the aforementioned current-ratio polishing apparatus based on wire electrodes, with the following specific steps:

[0037] S1. Connect the first electrode to the positive terminal of the AC power supply and the second electrode to the negative terminal of the AC power supply.

[0038] S2. Fix the workpiece to be processed in the first liquid tank and inject polishing liquid into the first liquid tank;

[0039] S3. Set the polishing path according to the shape of the polishing surface of the workpiece;

[0040] S4. When the AC power is turned on, the polishing fluid between the first and second wire electrodes undergoes a rheological effect, producing a chain-like structure.

[0041] S5. The first and second line electrodes move along a preset path, and a semi-solid polishing slurry with a chain-like structure is generated between the first and second line electrodes to polish the part of the workpiece that comes into contact with the polishing slurry.

[0042] Furthermore, in step S2, the polishing liquid is at least 5 cm above the workpiece.

[0043] Furthermore, in step S2, the polishing liquid contains dielectric particles embedded with nano-conductor particles, which can generate high strength under an electric field and withstand durable friction and temperature changes well.

[0044] Furthermore, the nanoconductor particles are carbon nanoparticles.

[0045] Furthermore, in step S4, the voltage of the AC power supply is approximately 1-2kV, and the frequency is approximately 0.8Hz.

[0046] Furthermore, in step S5, the control panel includes buttons such as start and stop buttons, which can control the movement path of the electrode clamp.

[0047] Furthermore, after step S5, there is step S6: after polishing is completed, the workpiece is removed and the polishing fluid is replaced.

[0048] A third objective of this invention is to provide a current-ratio polishing apparatus based on multi-wire electrodes, the current-ratio polishing apparatus being used for polishing a workpiece, the current-ratio polishing apparatus comprising:

[0049] Support unit;

[0050] AC power supply: It is located within the support unit;

[0051] Second liquid tank: It contains polishing liquid and is used to hold the workpiece.

[0052] Positive electrode plate: It is disposed in the second liquid tank and is connected to the positive terminal of the AC power supply;

[0053] Negative electrode plate: It is located in the second liquid tank and is connected to the positive terminal of the AC power supply;

[0054] Group of wire electrodes: These are disposed in the second liquid tank and are connected to the positive and negative electrode plates in an alternating manner. The group of wire electrodes are used to polish the workpiece.

[0055] Furthermore, the workpiece contains structures such as grooves and narrow slits, and the electrorheological polishing device is used to polish the inner and outer surfaces of the grooves, narrow slits, and other structures;

[0056] The material of the workpiece may be metal or non-metal.

[0057] Furthermore, the support unit includes a column, a sliding assembly, and a connecting frame. One end of the connecting frame is slidably connected to the column via the sliding assembly, and the other end of the connecting frame is located above the second liquid tank.

[0058] Furthermore, the sliding assembly includes a first slider and a second slider, one end of the first slider is slidably connected to the column, the other end of the first slider is slidably connected to the second slider, and the second slider is fixedly connected to the connecting frame.

[0059] Furthermore, the column is provided with a guide rail, which matches the first slider, and the first slider slides up and down along the guide rail.

[0060] Furthermore, the first slider is provided with a deep groove ball bearing and a screw, with both ends of the screw passing through the deep groove ball bearing. The second slider is slidably connected to the screw, and the forward and reverse rotation of the screw drives the second slider to move left and right.

[0061] Furthermore, the screw is externally connected to a motor, which drives the screw to rotate in both directions.

[0062] Furthermore, the bottom of the connecting frame is symmetrically provided with two supports, the bottom of which is located in the second liquid tank, and the positive electrode plate and the negative electrode plate are respectively fixed on one support.

[0063] Furthermore, from top to bottom, one end of the singular group of electrodes is connected to the positive electrode plate, and the other end of the singular group of electrodes is connected to the support.

[0064] One end of each of the even-numbered group electrodes is connected to the negative electrode plate from top to bottom, and the other end of each of the even-numbered group electrodes is connected to the support. There is no connection between adjacent group electrodes.

[0065] Furthermore, the connecting frame and the bracket are connected by hexagonal nuts and hexagonal bolts.

[0066] As a preferred technical solution, the group line electrode is made of a conductive material;

[0067] The diameter of the group of wire electrodes is 0.5-1 mm;

[0068] The spacing between the individual wire electrodes of the group of wire electrodes is 0.3-0.5 cm;

[0069] The distance between the group of wire electrodes and the surface of the workpiece is 0.3-1cm.

[0070] Furthermore, the column is equipped with a control system, and the outer side of the column is equipped with a control panel. The control system is connected to the control panel, the motor, and the AC power supply. The control system is used to control the motor and the AC power supply.

[0071] The fourth objective of this invention is to provide a current-ratio polishing method based on multi-line electrodes, using the aforementioned current-ratio polishing apparatus based on multi-line electrodes, with the following specific steps:

[0072] S1. Connect the group of line electrodes to the positive and negative electrode plates in an alternating manner;

[0073] S2. Fix the workpiece in the second liquid tank and inject polishing liquid into the second liquid tank;

[0074] S3. Set the polishing path according to the shape of the polishing surface of the workpiece;

[0075] S4. When the AC power is turned on, the polishing fluid between the individual wire electrodes of the group of wire electrodes undergoes a rheological effect, producing a chain-like structure.

[0076] S5. The group of wire electrodes moves along a preset path, and a semi-solid polishing slurry with a chain-like structure is generated between the individual wire electrodes of the group of wire electrodes to polish the part of the workpiece that comes into contact with the polishing slurry.

[0077] Further, in step S1, the group of wire electrodes are arranged in a top-down order, with one end of each group of wire electrodes connected to the positive electrode plate and the other end of each group of wire electrodes connected to the support.

[0078] One end of each of the even-numbered group electrodes is connected to the negative electrode plate from top to bottom, and the other end of each of the even-numbered group electrodes is connected to the support. There is no connection between adjacent group electrodes.

[0079] Furthermore, in step S2, the polishing liquid is at least 5 cm above the workpiece.

[0080] Furthermore, in step S2, the polishing liquid contains dielectric particles embedded with nano-conductor particles, which can generate high strength under an electric field and withstand durable friction and temperature changes well.

[0081] Furthermore, the nanoconductor particles are carbon nanoparticles.

[0082] Furthermore, in step S4, the voltage of the AC power supply is approximately 1-2kV, and the frequency is approximately 0.8Hz.

[0083] Furthermore, in step S5, the control panel includes buttons such as start and stop buttons, which can control the movement path of the electrode clamp.

[0084] The principle of this invention is as follows:

[0085] Wire electrode electrorheological polishing is an advanced polishing technology based on the electrorheological effect. Its processing principle is that the electrorheological fluid, mainly composed of a dispersed phase and a dispersion medium, undergoes changes in its flow state and fluid properties under the action of an applied electric field. A high-strength chain-like structure is formed between the two wire electrodes along the direction of the electric field, exhibiting a solidification tendency. The solidified electrorheological fluid rubs against the surface of the workpiece as the wire electrodes move, achieving material removal from the workpiece surface.

[0086] In practical applications, it is necessary to select appropriate AC voltage and frequency. By controlling the distance δ1 between the line electrodes and the distance δ2 between the electrodes and the workpiece surface, polarization is generated between the two electrodes, and the chain-like structure generated by the electrorheological effect can make good contact with the workpiece surface. Furthermore, when the workpiece is metal, breakdown will not occur between the electrodes and the workpiece to form a circuit.

[0087] The wire electrode moves back and forth along the workpiece surface via path control until the workpiece surface achieves the required polishing quality or polishing time. The final workpiece surface is smooth and flat, with low roughness and no obvious scratches or deformation.

[0088] This invention is based on the electro-adhesion effect. An AC power supply is applied to two electrode lines, causing the electrorheological fluid containing dielectric particles to form a chain-like structure under the action of an external electric field. This produces a semi-cured electrorheological fluid that polishes the surface of the workpiece.

[0089] This invention is applicable to the processing of both metallic and non-metallic materials. It is particularly noteworthy that the wire electrodes described in this invention can have various designs. When the processing surface is a large plane, a multi-wire electrode design can be used. By arranging the wire electrodes in alternating positive and negative positions, the solidification volume of the electrorheological fluid is increased, improving processing efficiency. When the workpiece is metallic, the polishing system can be simplified by using a single wire electrode. The workpiece is connected to the negative terminal of the power supply, causing the electrorheological fluid between the wire electrode and the workpiece to solidify. The workpiece surface is polished as the wire electrode moves.

[0090] Depending on the shape of the workpiece surface, the wire electrode provided by this invention can be bent to a corresponding degree. This modification makes the wire electrode machining more suitable for workpiece surfaces with a certain curvature, achieving better results and improving machining efficiency when machining mirror surfaces with high polishing requirements, such as aspherical surfaces, slightly concave surfaces, and slightly convex surfaces. A wire electrode bent at a certain angle can also be used to polish two planes simultaneously. This method makes electrode shape machining easier and improves machining efficiency. In actual machining, it can be used according to the specific requirements of the workpiece.

[0091] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0092] 1. This invention applies electrorheological effect during polishing, causing the electrorheological fluid between the two wire electrodes to generate a chain-like structure along the electric field direction. The wire electrodes clamped by the electrode chuck can move back and forth along a specified path. When the solidified electrorheological fluid moves, it rubs against the surface of the workpiece, thereby removing material from the workpiece surface. The final workpiece surface is smooth and flat with low roughness and no obvious scratches or deformation.

[0093] 2. This invention applies electrorheological polishing technology, which has good temperature stability and can reduce damage to the polishing material, thereby improving polishing quality and achieving higher polishing precision.

[0094] 3. The present invention uses a wire electrode as a polishing tool. The electrode size is small, the stress generated is small, and the deformation of the workpiece is very small. It has obvious advantages in polishing slender curved surfaces and narrow slits.

[0095] 4. This device has a compact structure, high integration, and is easy to implement. The polishing rate can be controlled by controlling the electrode movement speed and power supply voltage frequency.

[0096] 5. This invention can use dual-wire electrodes or multi-wire electrodes for polishing, resulting in a more stable removal effect and the ability to polish non-metallic workpieces.

[0097] 6. This invention has a certain degree of general applicability and does not specify specific processing parameters. For example, the workpiece can have different shapes and structures, and can be made of various materials. The number or shape of the wire electrodes can be appropriately increased or decreased depending on the specific dimensions of the workpiece. The number and type of conductive material of the wire electrodes can be selected according to requirements. For example, when processing metal workpieces, a single wire electrode can be connected to the positive terminal of the power supply, and the workpiece can be connected to the negative terminal. The composition and ratio of the electrorheological fluid can be changed according to specific circumstances.

[0098] 7. The purpose of this invention is to solve the problem of polishing microstructures such as slender shafts and narrow slits. It is necessary to select the electrode wire diameter and spacing δ1 and δ2 according to the specific geometric dimensions of the workpiece to ensure that the polishing effect is not achieved due to excessive spacing or that the breakdown effect occurs due to insufficient spacing.

[0099] 8. Compared with the existing patent CN116985026A, the electrode structure of this invention is simple, the manufacturing cost is low, it can process non-metallic parts, and it can be applied to polishing in various situations, especially suitable for polishing narrow slits and slender shafts. Compared with the existing patent CN116587074A, this invention can also use array electrodes to increase processing efficiency, but there is no need to consider the insulation problem between electrodes. The overall structure is simple, the manufacturing cost is low, and the wire electrodes can be easily processed into a shape that fits the workpiece surface, enabling better polishing of complex curved surfaces. Attached Figure Description

[0100] Figure 1 This is a schematic diagram of the electrorheological polishing device based on a wire electrode in Embodiment 1 of the present invention;

[0101] Figure 2 This is a partial schematic diagram of the processing of the electrorheological polishing device based on wire electrodes in Embodiment 1 of the present invention;

[0102] Figure 3 This is a schematic diagram of the electrorheological polishing device based on group line electrodes in Embodiment 2 of the present invention;

[0103] Figure 4 This is a partial schematic diagram of the processing of the electrorheological polishing device based on multi-line electrodes in Embodiment 2 of the present invention;

[0104] Figure 5 This is a diagram showing the arrangement of the group line electrodes in the electrorheological polishing device based on group line electrodes in Embodiment 2 of the present invention;

[0105] Figure 6 Schematic diagram illustrating the formation principle of chain-like structures in rheological fluids;

[0106] Figure 7 This is a schematic diagram of the shape of the line electrode in Example 3.

[0107] Explanation of the attached figures: 1. Workpiece fixture; 2. Workpiece; 3. Worktable; 4. First liquid tank; 5. Polishing fluid; 6. First wire electrode; 7. Electrode chuck; 8. Second wire electrode; 9. AC power supply; 10. Connecting frame; 11. Hex nut; 12. Hex bolt; 13. Column; 14. Deep groove ball bearing; 15. Screw; 16. Guide rail; 17. Group of wire electrodes; 18. Positive electrode plate; 19. Negative electrode plate; 20. Support; 21. Chain structure; 22. Second liquid tank; 23. First slider; 24. Second slider; δ1. Spacing between wire electrodes; δ2. Distance between wire electrode and workpiece surface. Detailed Implementation

[0108] The present invention will now be described in detail with reference to the accompanying drawings and specific embodiments. These embodiments are based on the technical solution of the present invention and provide detailed implementation methods and specific operating procedures. However, the scope of protection of the present invention is not limited to the following embodiments.

[0109] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0110] In the description of this invention, it should be noted that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing the invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0111] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0112] The following detailed description of some embodiments of the present invention is provided in conjunction with the accompanying drawings. Unless otherwise specified, the following embodiments and features described herein can be combined with each other.

[0113] Example 1

[0114] See Figure 1 , Figure 2 and Figure 6 This embodiment provides a current-ratio polishing device based on a wire electrode. The current-ratio polishing device is used to polish a workpiece 2, which has a narrow slit structure. The current-ratio polishing device includes:

[0115] Workbench 3;

[0116] AC power supply 9: It is located inside the workbench 3;

[0117] First liquid tank 4: It is located above the workbench 3. The first liquid tank 4 contains polishing liquid 5 and is used to place the workpiece 2.

[0118] First wire electrode 6: Its two ends are slidably connected to the worktable 3, and the first wire electrode 6 is connected to the positive terminal of the AC power supply 9.

[0119] Second wire electrode 8: Its two ends are slidably connected to the worktable 3. The second wire electrode 8 is connected to the negative terminal of the AC power supply 9. The second wire electrode 8 and the first wire electrode 6 are used together to polish the workpiece 2.

[0120] In this embodiment, the material of the workpiece 2 includes metal or non-metal.

[0121] In this embodiment, the workbench 3 includes a base plate, a top plate, and a connecting plate. The top plate and the base plate are connected by the connecting plate, and the first wire electrode 6 and the second wire electrode 8 are slidably connected to the top plate and the base plate, respectively.

[0122] In this embodiment, the first wire electrode 6 and the second wire electrode 8 are clamped on the top plate or the bottom plate by the electrode chuck 7. Driven by the electrode chuck 7, the first wire electrode 6 and the second wire electrode 8 move back and forth along the narrow slit structure on the workpiece 2 according to the path planning to complete the polishing.

[0123] In this embodiment, the electrode chuck 7 immersed in the polishing liquid 5 is made of non-metallic material, and the connection between the electrode chuck 7 and the first wire electrode 6 and the second wire electrode 8 is insulated. The mounting material at the interface is a rubber insulating sleeve.

[0124] The two interfaces of the electrode clamp 7 are internally connected to the positive and negative terminals of the AC power supply 9 via wires.

[0125] The electrode chuck 7 is used to ensure that the first wire electrode 6 and the second wire electrode 8 are in a taut state during the processing, and to drive the first wire electrode 6 and the second wire electrode 8 to move back and forth along the grooves, narrow slits and other structures on the workpiece 2.

[0126] In this embodiment, the first wire electrode 6 and the second wire electrode 8 are tungsten wires;

[0127] The diameter of the first wire electrode 6 and the second wire electrode 8 is 0.5 mm;

[0128] The distance δ1 between the first line electrode 6 and the second line electrode 8 is 0.5 cm;

[0129] The distance δ2 between the first line electrode 6 and the second line electrode 8 and the surface of the workpiece 2 is 0.5 cm.

[0130] In this embodiment, the first liquid tank 4 includes a front side plate, a rear side plate, a left side plate, and a right side plate. The front side plate, rear side plate, left side plate, and right side plate are all fixed above the bottom plate. The front side plate, left side plate, rear side plate, and right side plate are connected in sequence. The front side plate, left side plate, rear side plate, and right side plate are all connected to the bottom plate to form the first liquid tank 4.

[0131] In this embodiment, the portion of the base plate that contacts the polishing liquid 5 is covered with an insulating rubber layer with a thickness of approximately 5 mm.

[0132] In this embodiment, the front panel, rear panel, left panel, and right panel are made of transparent acrylic sheets, which facilitates real-time observation of the processing.

[0133] The joints between the front panel, rear panel, left panel, right panel, and bottom panel are sealed to prevent liquid leakage.

[0134] In this embodiment, the base plate is provided with a waste liquid collection assembly, which includes a waste liquid hole, a connecting pipe and a waste liquid tank. The part of the base plate that is in contact with the polishing liquid 5 is provided with a waste liquid hole. The waste liquid hole is connected to the waste liquid tank through the connecting pipe, and a valve is provided on the waste liquid hole.

[0135] In this embodiment, the electrorheological polishing device further includes a workpiece clamp 1, and the workpiece 2 is fixed above the base plate by the workpiece clamp 1. The workpiece clamp 1 is a hard rubber block that clamps the two side planes of the workpiece 2.

[0136] In this embodiment, the workpiece fixture 1 is fixedly installed on the top of the base plate by a connector. The workpiece fixture 1 can be designed and replaced according to the different shapes of the workpiece 2 to ensure that the workpiece 2 does not move during polishing.

[0137] In this embodiment, a control system is provided inside the connecting plate, and a control panel is provided on the outer side of the connecting plate. The control system is connected to the control panel, the electrode clamp 7, the AC power supply 9, and the valve. The control system is used to control the movement path of the electrode clamp 7, the power supply 9, and the opening and closing of the valve.

[0138] In this embodiment, the control system is an Estlcam controller.

[0139] The second objective of this invention is to provide a current-ratio polishing method based on wire electrodes, using the aforementioned current-ratio polishing apparatus based on wire electrodes, with the following specific steps:

[0140] S1. Install the appropriate workpiece fixture 1 on the base plate of the worktable 3, and clamp the first wire electrode 6 and the second wire electrode 8 on the electrode chuck 7. The two interfaces of the electrode chuck 7 are connected to the positive and negative terminals of the AC power supply 9 respectively through wires.

[0141] S2. Fix the workpiece 2 to be processed on the workpiece fixture 1, and inject polishing liquid 5 into the first liquid tank 4;

[0142] S3. Based on the shape of the polished surface of the workpiece 2, program using G-code, run the program through the built-in Estlcam controller, and set the polishing path;

[0143] S4. Turn on the AC power supply 9. The polishing liquid 5 between the first wire electrode 6 and the second wire electrode 8 undergoes a rheological effect, producing a chain structure 21.

[0144] S5. The first line electrode 6 and the second line electrode 8 move along a preset path, and a semi-solid polishing liquid with a chain-like structure 21 is generated between the first line electrode 6 and the second line electrode 8 to polish the part of the workpiece 2 that is in contact with the polishing liquid 5.

[0145] In this embodiment, in step S2, the polishing liquid 5 covers the workpiece by 25mm.

[0146] In this embodiment, in step S2, the main components of the polishing liquid 5 are insulating oil and dielectric particles containing embedded carbon nanoparticles, and hydrostatic processing is adopted.

[0147] In this embodiment, in step S3, the built-in Estlcam controller runs the pre-written G code, which controls the electrode chuck 7 to move in a straight line or arc through a fixed point, and repeats this movement multiple times. This drives the first wire electrode 6 and the second wire electrode 8 installed on it to move back and forth along the narrow slit structure to complete the polishing.

[0148] In this embodiment, in step S4, the voltage of the AC power supply 9 is approximately 1.5kV and the frequency is approximately 0.8Hz.

[0149] In this embodiment, in step S5, the control panel includes buttons such as start and stop buttons, which can control the movement path of the electrode chuck 7.

[0150] In this embodiment, step S6 is provided after step S5: after polishing is completed, the workpiece 2 is removed and the polishing liquid 5 is replaced.

[0151] Example 2

[0152] See Figure 1 , Figure 2 and Figure 6 This embodiment provides a current-ratio polishing device based on a group of wire electrodes. The current-ratio polishing device is used to polish a workpiece 2, which has a transverse narrow slit structure. The current-ratio polishing device includes:

[0153] Support unit;

[0154] AC power supply 9: It is located inside the support unit;

[0155] Second liquid tank 22: It is filled with polishing liquid 5 and is used to place the workpiece 2 to be processed.

[0156] Positive electrode plate 18: It is disposed in the second liquid tank 22, and the positive electrode plate 18 is connected to the positive terminal of the AC power supply 9;

[0157] Negative electrode plate 19: It is disposed in the second liquid tank 22, and the negative electrode plate 19 is connected to the positive terminal of the AC power supply 9;

[0158] Group line electrode 17: It is disposed in the second liquid tank 22. The group line electrode 17 is connected to the positive electrode plate 18 and the negative electrode plate 19 in an alternating manner. The group line electrode 17 is used to polish the workpiece 2.

[0159] In this embodiment, the material of the workpiece 2 includes metal or non-metal.

[0160] In this embodiment, the support unit includes a column 13, a sliding assembly, and a connecting frame 10.

[0161] One end of the connecting frame 10 is slidably connected to the column 13 via a sliding component, and the other end of the connecting frame 10 is located above the second liquid tank 22.

[0162] In this embodiment, the sliding component includes a first slider 23 and a second slider 24.

[0163] One end of the first slider 23 is slidably connected to the column 13, and the other end of the first slider 23 is slidably connected to the second slider 24. The second slider 24 is fixedly connected to the connecting frame 10.

[0164] In this embodiment, the column 13 is provided with a guide rail 16, which matches the first slider 23, and the first slider 23 slides up and down along the guide rail 16.

[0165] In this embodiment, the first slider 23 is provided with a deep groove ball bearing 14 and a screw 15. The two ends of the screw 15 are inserted into the deep groove ball bearing 14. The second slider 24 is slidably connected to the screw 15. The screw 15 rotates in both directions, causing the second slider 24 to move left and right.

[0166] In this embodiment, the screw 15 is connected to an external motor, which drives the screw 15 to rotate in both directions, thereby causing the second slider 24 to move left and right.

[0167] In this embodiment, two supports 20 are symmetrically provided at the bottom of the connecting frame 10. The bottom of the supports 20 is located in the second liquid tank 22. The positive electrode plate 18 and the negative electrode plate 19 are respectively fixed on one of the supports 20.

[0168] In this embodiment, one end of the single-line electrode 17 is connected to the positive electrode plate 18 from top to bottom, and the other end of the single-line electrode 17 is connected to the support 20.

[0169] One end of each of the even-numbered group line electrodes 17 from top to bottom is connected to the negative electrode plate 19, and the other end of each of the even-numbered group line electrodes 17 is connected to the support 20. There is no connection between adjacent group line electrodes 17.

[0170] In this embodiment, the connecting frame 10 and the bracket 20 are connected by a hexagonal nut 11 and a hexagonal bolt 12.

[0171] In this embodiment, the connecting frame 10 and the second slider 24 are made of aluminum alloy, and the connection between the connecting frame 10 and the second slider 24 is welded.

[0172] In this embodiment, the bracket 20 is made of insulating hard rubber.

[0173] In this embodiment, a control system is provided inside the column 13, and a control panel is provided on the outer side of the column 13. The control system is connected to the control panel, the motor and the AC power supply 9. The control system is used to control the motor and the AC power supply 9.

[0174] In this embodiment, the control system is an Estlcam controller.

[0175] In this embodiment, the material of the second liquid tank 22 is a transparent acrylic sheet.

[0176] In this embodiment, the material of the group line electrode 17 is tungsten wire.

[0177] In this embodiment, the positive electrode plate 18 and the negative electrode plate 19 are made of brass.

[0178] In this embodiment, the wire diameter of the group wire electrode 17 is 1.5 mm;

[0179] The spacing δ1 between the individual wire electrodes of the group wire electrode 17 is approximately 0.5 cm;

[0180] The distance δ2 between the group line electrode 17 and the surface of the workpiece 2 is approximately 0.5 cm.

[0181] The fourth objective of this invention is to provide a current-ratio polishing method based on multi-line electrodes, using the aforementioned current-ratio polishing apparatus based on multi-line electrodes, with the following specific steps:

[0182] S1. Connect the group line electrodes 17 alternately to the positive electrode plate 18 and the negative electrode plate 19;

[0183] S2. Fix the workpiece 2 in the second liquid tank 22, and inject polishing liquid 5 into the second liquid tank 22;

[0184] S3. Mount the group line electrode 17, positive electrode plate 18 and negative electrode plate 19 on the bracket 20. The bracket 20 is mounted on the connecting frame 10. The second slider 24 connected to the connecting frame 10 is mounted on the first slider 23 through the screw 15. It can move left and right according to the forward and reverse rotation of the screw 15.

[0185] S4. Adjust the first slider 23 to a suitable height on the column 13 according to the position of the surface to be polished of the workpiece 2;

[0186] S5. Based on the shape of the polished surface of the workpiece 2, program using G-code, run the program through the built-in Estlcam controller, and set the polishing path;

[0187] S6. Turn on the AC power supply 9. The polishing fluid 5 between the individual wire electrodes of the group wire electrode 17 undergoes a rheological effect, producing a chain structure 21 and forming protrusions.

[0188] S7. The group of wire electrodes 17 moves along a preset path, and a semi-solid polishing liquid with a chain-like structure 21 is generated between the individual wire electrodes of the group of wire electrodes 17 to polish the part of the workpiece 2 that is in contact with the polishing liquid 5.

[0189] In this embodiment, in step S1, the group of wire electrodes 17 are arranged in a top-to-bottom order, with one end of each group of wire electrodes 17 connected to a hole in the positive electrode plate 18 and the other end of each group of wire electrodes 17 connected to a hole in the bracket 20.

[0190] One end of the even-numbered group line electrodes 17 from top to bottom is connected to the hole of the negative electrode plate 19, and the other end of the even-numbered group line electrodes 17 is connected to the hole of the bracket 20. There is no connection between adjacent group line electrodes 17.

[0191] In this embodiment, in step S2, the polishing liquid 5 covers the workpiece by 25mm.

[0192] In this embodiment, in step S2, the main components of the polishing liquid 5 are insulating oil and dielectric particles containing embedded carbon nanoparticles, and hydrostatic processing is adopted.

[0193] In this embodiment, in step S5, the built-in Estlcam controller runs the pre-written G code, which controls the electrode chuck 7 to move in a straight line or arc through a fixed point, and repeats this multiple times, thereby driving the first wire electrode 6 and the second wire electrode 8 installed on it to move back and forth along the narrow slit structure to complete the polishing.

[0194] In this embodiment, in step S6, the voltage of the AC power supply 9 is approximately 1.5kV and the frequency is approximately 0.8Hz.

[0195] In this embodiment, in step S7, the control panel includes buttons such as start and stop buttons, which can control the movement path of the electrode chuck 7.

[0196] In this embodiment, in step S7, the motor drives the screw 15 to rotate back and forth at a certain speed, driving the connecting frame 10 to move left and right at a certain speed, generating a chain structure 21 between the individual wire electrodes of the group electrode 17, and the solidified polishing liquid polishes the part that contacts the workpiece 2.

[0197] Example 3

[0198] See Figure 7 This embodiment provides an electrorheological polishing device based on line electrodes. Except that the first line electrode 6 and the second line electrode 8 are zigzag-shaped, which can polish two planes of the workpiece 2 at the same time, the rest is the same as in embodiment 1.

[0199] The above description of the embodiments is provided to enable those skilled in the art to understand and use the invention. It will be apparent to those skilled in the art that various modifications can be made to these embodiments, and the general principles described herein can be applied to other embodiments without inventive effort. Therefore, the present invention is not limited to the above embodiments, and any improvements and modifications made by those skilled in the art based on the disclosure of the present invention without departing from the scope of the invention should be within the protection scope of the present invention.

Claims

1. A current-ratio polishing device based on a group of wire electrodes, characterized in that, The electrorheological polishing device is used to polish the workpiece (2), and the electrorheological polishing device includes: Support unit; AC power supply (9): It is located inside the support unit; Second liquid tank (22): It is filled with polishing liquid (5) and the workpiece (2) is placed in the second liquid tank (22); Positive electrode plate (18): It is located in the second liquid tank (22) and the positive electrode plate (18) is connected to the positive terminal of the AC power supply (9); Negative electrode plate (19): It is located in the second liquid tank (22) and the negative electrode plate (19) is connected to the negative terminal of the AC power supply (9); Group line electrode (17): It is disposed in the second liquid tank (22). The group line electrode (17) is connected to the positive electrode plate (18) and the negative electrode plate (19) in an alternating manner. The group line electrode (17) is used to polish the workpiece (2). The support unit includes a column (13), a sliding component and a connecting frame (10). One end of the connecting frame (10) is slidably connected to the column (13) through the sliding component, and the other end of the connecting frame (10) is located above the second liquid tank (22). The sliding assembly includes a first slider (23) and a second slider (24). One end of the first slider (23) is slidably connected to the column (13), and the other end of the first slider (23) is slidably connected to the second slider (24). The second slider (24) is fixedly connected to the connecting frame (10). The column (13) is provided with a guide rail (16), which is matched with the first slider (23), and the first slider (23) slides up and down along the guide rail (16); The first slider (23) is provided with a deep groove ball bearing (14) and a screw (15). The two ends of the screw (15) are inserted into the deep groove ball bearing (14). The second slider (24) is slidably connected to the screw (15). The screw (15) rotates in both directions, causing the second slider (24) to move left and right. The screw (15) is connected to an external motor, which is used to drive the screw (15) to rotate in both directions; The bottom of the connecting frame (10) is symmetrically provided with two supports (20), the bottom of the supports (20) is located in the second liquid tank (22), and the positive electrode plate (18) and the negative electrode plate (19) are respectively fixed on one support (20); One end of the single-line electrode (17) from top to bottom is connected to the positive electrode plate (18), and the other end of the single-line electrode (17) is connected to the support (20). One end of each of the even-numbered group line electrodes (17) from top to bottom is connected to the negative electrode plate (19), and the other end of each of the even-numbered group line electrodes (17) is connected to the support (20). There is no connection between adjacent group line electrodes (17). The diameter of the group line electrode (17) is 0.5-1 mm.

2. The electrorheological polishing device based on multi-wire electrodes according to claim 1, characterized in that, The column (13) is equipped with a control system, and the column (13) is equipped with a control panel on its outer side. The control system is connected to the control panel, the motor and the AC power supply (9) at the same time. The control system is used to control the motor and the AC power supply (9).

3. A current-ratio polishing method based on multi-line electrodes, characterized in that, The polishing is performed using the electrorheological polishing apparatus based on group-line electrodes as described in any one of claims 1-2, and the specific steps are as follows: S1. Connect the group line electrodes (17) alternately to the positive electrode plate (18) and the negative electrode plate (19); S2. Fix the workpiece (2) in the second liquid tank (22) and inject polishing liquid (5) into the second liquid tank (22); S3. Set the polishing path according to the shape of the polishing surface of the workpiece (2); S4. Turn on the AC power supply (9). The polishing liquid (5) between the single wire electrodes of the group wire electrode (17) undergoes a rheological effect, producing a chain structure (21). S5. The group of wire electrodes (17) moves along a preset path, and a semi-solid polishing liquid with a chain structure (21) is generated between the individual wire electrodes of the group of wire electrodes (17) to polish the part of the workpiece (2) that is in contact with the polishing liquid (5).

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